KR101558445B1 - 리소그래피 시스템, 리소그래피 장치의 제어 방법 및 디바이스 제조 방법 - Google Patents

리소그래피 시스템, 리소그래피 장치의 제어 방법 및 디바이스 제조 방법 Download PDF

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Publication number
KR101558445B1
KR101558445B1 KR1020147003958A KR20147003958A KR101558445B1 KR 101558445 B1 KR101558445 B1 KR 101558445B1 KR 1020147003958 A KR1020147003958 A KR 1020147003958A KR 20147003958 A KR20147003958 A KR 20147003958A KR 101558445 B1 KR101558445 B1 KR 101558445B1
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KR
South Korea
Prior art keywords
substrate
pattern
lithographic apparatus
radiation
radiation beam
Prior art date
Application number
KR1020147003958A
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English (en)
Korean (ko)
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KR20140041847A (ko
Inventor
야거 피터 빌렘 허만 드
아르노 얀 블리커
뵈프 아리에 제프리 덴
에릭 로에로프 루프스트라
니테쉬 판데이
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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Publication of KR20140041847A publication Critical patent/KR20140041847A/ko
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Publication of KR101558445B1 publication Critical patent/KR101558445B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G03F7/70675—Latent image, i.e. measuring the image of the exposed resist prior to development

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020147003958A 2011-08-30 2012-07-27 리소그래피 시스템, 리소그래피 장치의 제어 방법 및 디바이스 제조 방법 KR101558445B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201161529064P 2011-08-30 2011-08-30
US61/529,064 2011-08-30
US201161546801P 2011-10-13 2011-10-13
US61/546,801 2011-10-13
US201261651449P 2012-05-24 2012-05-24
US61/651,449 2012-05-24
PCT/EP2012/064755 WO2013029893A2 (en) 2011-08-30 2012-07-27 Lithographic system, method of controlling a lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
KR20140041847A KR20140041847A (ko) 2014-04-04
KR101558445B1 true KR101558445B1 (ko) 2015-10-07

Family

ID=46582705

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147003958A KR101558445B1 (ko) 2011-08-30 2012-07-27 리소그래피 시스템, 리소그래피 장치의 제어 방법 및 디바이스 제조 방법

Country Status (5)

Country Link
JP (1) JP5793248B2 (zh)
KR (1) KR101558445B1 (zh)
NL (1) NL2009239A (zh)
TW (1) TWI490665B (zh)
WO (1) WO2013029893A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101852236B1 (ko) 2014-05-19 2018-04-25 캐논 가부시끼가이샤 노광 장치, 정렬 방법 및 디바이스 제조 방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9484188B2 (en) * 2015-03-11 2016-11-01 Mapper Lithography Ip B.V. Individual beam pattern placement verification in multiple beam lithography
WO2017102237A1 (en) 2015-12-15 2017-06-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008053687A (ja) * 2006-07-28 2008-03-06 Tokyo Electron Ltd 基板の処理方法、プログラム、コンピュータ記憶媒体及び基板の処理システム
JP2009088542A (ja) 2003-05-30 2009-04-23 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2010272606A (ja) 2009-05-20 2010-12-02 Nikon Corp パターン形成装置、パターン形成方法、デバイス製造装置、及びデバイス製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124927A (en) * 1990-03-02 1992-06-23 International Business Machines Corp. Latent-image control of lithography tools
JP2000021741A (ja) * 1998-06-30 2000-01-21 Canon Inc 露光装置、デバイス製造方法、および異物検査装置
JP2008058797A (ja) * 2006-09-01 2008-03-13 Fujifilm Corp 描画装置及び描画方法
TWI531872B (zh) * 2008-09-22 2016-05-01 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009088542A (ja) 2003-05-30 2009-04-23 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2008053687A (ja) * 2006-07-28 2008-03-06 Tokyo Electron Ltd 基板の処理方法、プログラム、コンピュータ記憶媒体及び基板の処理システム
JP2010272606A (ja) 2009-05-20 2010-12-02 Nikon Corp パターン形成装置、パターン形成方法、デバイス製造装置、及びデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101852236B1 (ko) 2014-05-19 2018-04-25 캐논 가부시끼가이샤 노광 장치, 정렬 방법 및 디바이스 제조 방법

Also Published As

Publication number Publication date
WO2013029893A3 (en) 2013-06-20
WO2013029893A2 (en) 2013-03-07
TWI490665B (zh) 2015-07-01
KR20140041847A (ko) 2014-04-04
NL2009239A (en) 2013-03-04
TW201316131A (zh) 2013-04-16
JP5793248B2 (ja) 2015-10-14
JP2014527724A (ja) 2014-10-16

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