KR101534832B1 - Wet, dry composite mask cleaning device - Google Patents

Abstract

The wet / dry composite mask cleaning apparatus of the present invention is an apparatus for cleaning an OLED deposition mask, comprising: a dry type cleaning apparatus for cleaning by using plasma, extreme ultraviolet (EUV / DUV) or ultraviolet (UV) , A plurality of settling baths which are configured to be capable of immersing all or a part of the mask of the OLED deposition, and a drying apparatus for transferring and drying the mask of the OLED deposition mask in the settling bath, wherein the dry type cleaning apparatus, The arrangement sequence of the drying apparatus is selectively performed, and the OLED deposition mask is passed through the dry type cleaning apparatus, the precipitation bath, and the drying apparatus so that the dry cleaning and the wet cleaning can be simultaneously applied, There is a beneficial effect of allowing the cleaning process to be carried out, and most of the organic deposition material is cleaned by dry cleaning, The quality can be reduced by minimizing the amount of cleaning liquid that causes a chemical reaction by precipitating in a cleaning liquid, improving the productivity by reducing the time required for cleaning the mask, and improving the productivity by using a conventional cleaning liquid, ultrasonic wave, Which is difficult to expect a complete cleaning effect, is improved, and a complete mask cleaning apparatus is provided by using a combination of dry and wet.

Description

{Wet, dry composite mask cleaning device}

More particularly, the present invention relates to a cleaning apparatus for effectively cleaning an organic material (OLED) with a dry plasma or ultraviolet (EUV, DUV) It is possible to minimize the amount of the cleaning liquid which causes a chemical reaction by taking the method of cleaning most of the organic deposition materials by dry cleaning and depositing the remaining organic deposition materials in the cleaning liquid, The present invention relates to a cleaning apparatus for a thin film deposition mask for an organic light emitting display device.

The demand for a display device for outputting image information has been increasing in various forms. Accordingly, a liquid crystal display (LCD), a plasma display panel (PDP), an organic luminescent emission diode (OLED) Device), and VFD (Vacuum Fluorescent Display) have been researched and utilized.

Among such flat panel display devices, the organic light emitting display device uses an organic light emitting layer, which is a self-luminous device for emitting phosphors by recombination of electrons and holes, and has a contrast ratio and a response time It has excellent display characteristics and is easily attracted attention as a next-generation display which is ideal as it is easy to implement a flexible display.

The organic light emitting display includes a plurality of pixel regions arranged in a matrix, and micropatterns such as driving elements for driving each pixel are formed in each pixel region.

In this case, since the organic light emitting layer that emits light is made of an organic material having weak chemical resistance, the organic material is vaporized rather than the photolithography method using the conventional exposure and etching, and then the organic light emitting display device And selectively depositing on the substrate. However, since the organic material is deposited on the surface of the mask for masking the organic light emitting display device selectively screening the substrate during the deposition process, it is essential to clean the mask for masking the organic light emitting display device after a certain number of steps. .

In the organic light emitting display, an anode electrode is formed on the substrate by lithography including an exposure and an etching process, and the organic thin film and the cathode electrode are formed on the substrate on which the anode electrode is formed by using a deposition mask made of metal.

However, when deposition is performed using the deposition mask as described above, deposition materials such as organic substances are deposited on the surface of the deposition mask, and if the deposition mask on which the deposition material is deposited is left to stand, the deposition chamber is contaminated .

Further, the vapor deposition mask made of a thin metal plate is warped by the weight of the deposited deposition material, which affects the accuracy of the pattern. Therefore, it is necessary to periodically remove the deposition material deposited on the deposition mask.

The removal operation may be performed by a dry cleaning method in which an organic substance in the mask is removed using atmospheric plasma or ultraviolet rays (EUV, DUV), or a wet cleaning method in which an immersion operation is repeated in a bath containing a chemical cleaning solution to dissolve or degrade organic materials

Or electrolysis.

As a background of the present invention, there is a patent registration No. 0728218 entitled " Cleaning apparatus and cleaning method of a deposition mask "(patent document 1). In the background art, as shown in FIG. 3, "a step of spraying a spraying liquid onto a deposition mask to clean the deposition mask in a rough manner, a step of immersing the deposition cleaning mask which has been cleaned thoroughly in a cleaning liquid, A method of cleaning a deposition mask comprising: immersing the deposition mask immersed in the water in an alcohol; and drying the deposition mask.

However, the background art requires a long processing time and increases the number of used masks. Particularly, wet cleaning uses a high-purity cleaning liquid, which causes environmental pollution.

Patent No. 0728218 "Cleaning apparatus and cleaning method of deposition mask"

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to provide a method and apparatus for treating a foreign substance on a substrate through wet cleaning and dry- And most of the organic deposition material is cleaned by dry cleaning and the remaining organic deposition material is deposited in the cleaning liquid to minimize the amount of the cleaning liquid which causes a chemical reaction. , Which is a wet and dry composite mask that can reduce the additional workload and space by forming the mask cleaning device together with the deposition equipment without putting the mask cleaning device in a separate isolated space And to provide a cleaning device.

The present invention relates to an apparatus for cleaning an OLED deposition mask, comprising: a dry type cleaning apparatus for cleaning using a plasma, ultraviolet (EUV, DUV, UV) or ozone (O ₃ ) And a drying apparatus for electrolytically washing the water in the settling bath and transferring the mask of the OLED evaporation from the settling bath to dry the same, wherein the dry type washing apparatus and the settling bath And the arrangement of the drying apparatus is selectively carried out so that the OLED deposition mask is passed through the dry type cleaning apparatus, the precipitation bath and the drying apparatus to simultaneously apply the dry cleaning and the wet cleaning method. To provide a mask cleaning apparatus.

Also, an object of the present invention is to provide a wet / dry composite mask cleaning apparatus, wherein an ultrasonic generator is additionally provided in the settling bath.

Further, an automatic transfer device for supplying the cleaned OLED deposition mask, which has been discharged through the drying device, to the dry type cleaning device or the deposition bath is constructed, and an OLED deposition mask, which is transported to the automatic transfer device through the drying device, And an automatic extraction and dispensing device for supplying the OLED deposition mask to the automatic transfer device by extracting the OLED deposition mask from the OLED deposition equipment after the deposition process is completed and the deposition process is completed.

The present invention uses a dry plasma or UV (EUV, DUV, UV) cleaning which is excellent for organic material cleaning together with a chemical solution favorable for fine cleaning. The dry cleaning method has a useful effect of performing surface treatment of an organic material, Most of the organic deposition materials are cleaned by dry cleaning and the remaining organic deposition materials are deposited in the cleaning liquid to minimize the amount of the cleaning liquid which causes a chemical reaction and the time required to clean the mask by the electrolytic cleaning method Reduce productivity.

In addition, there is a very useful effect of reducing additional space and space for manpower by constructing the apparatus for mask cleaning together with deposition equipment without placing it in a separate isolated space.

BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate exemplary embodiments of the invention and, together with the description, serve to explain the principles of the invention, Shall not be construed as limiting.
1 is a schematic view showing a wet / dry composite mask cleaning apparatus according to an embodiment of the present invention.
2 is a schematic plan view showing an embodiment in which the OLED deposition equipment 80 is further constructed in the wet and dry composite mask cleaning apparatus of FIG.
3 is a schematic view showing a cleaning apparatus of a deposition mask according to a conventional example.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to the embodiments shown in the accompanying drawings, but the present invention is not limited thereto.

 Hereinafter, the technical structure of the present invention will be described in detail with reference to the preferred embodiments.

1 is a schematic view showing a wet / dry composite mask cleaning apparatus according to an embodiment of the present invention.

The wet and dry composite mask cleaning apparatus of the present invention is an apparatus for cleaning an OLED deposition mask 20, which comprises a dry type cleaning apparatus 10, and a configuration for allowing all or a part of the OLED deposition mask 20 to be immersed And a drying device 40 for transferring and drying the OLED deposition mask 20 from the deposition bath 30. The OLED deposition mask 20 is a dry type The cleaning apparatus 10, the settling bath 30, and the drying apparatus 40 to simultaneously apply the dry cleaning method and the wet cleaning method.

The dry type cleaning apparatus 10 is a cleaning apparatus for cleaning by using any one of plasma, extreme ultraviolet (EUV, DUV) and ultraviolet (UV). The wet type cleaning apparatus includes a settling bath 30 for containing a separate cleaning liquid, And an ultrasonic generator and a drying device 40. The dry type cleaning device 10 includes a mask automatic transfer device, a cleaned mask loading cartridge, and a mask automatic loading device. The dry type cleaning device 10 includes an OLED deposition mask 20, The cleaning device 10 is a device for cleaning by using any one of plasma, extreme ultraviolet (EUV) and ozone (O ₃ ) liquid or gas.

The apparatus using plasma is a mask surface treatment apparatus using a sublimable gas and a high frequency. The apparatus is made by modifying the surface of the mask 20 for evacuating OLED and comprises a power supply unit and a reactor in which a plasma is generated.

Plasma generating devices are applied to various fields such as surface modification of metal and non-metal materials, cleaning process of electronic parts and semiconductor wafers.

When the gaseous material is continuously heated to raise the temperature, an aggregate of particles composed of ion nuclei and free electrons is produced. This is called the 'fourth state of matter' in addition to the three forms of matter, solid, liquid and gas, and the substance in this state is called plasma. That is, when high energy is applied to the gas, ionized particles different from the state transition are produced. At this time, the total number of charges of positive ions and negative ions becomes almost equal to each other. This state is an electrically neutral plasma State.

In the modern industry, plasma has been used in various fields such as high-performance materials such as high performance, high strength and high porosity, surface treatment of various materials, ion implantation, deposition and removal of organic- inorganic film, cleaning work, It is used for various purposes in various fields ranging from environmental industry.

Such a plasma can be classified into a vacuum plasma and an atmospheric plasma according to a pressure condition. However, a method of generating a plasma in a vacuum state has many difficulties in practical application. The method of generating the plasma in the vacuum state occurs in the closed space of the plasma, so that it is difficult to control the processing conditions in the material to be instantaneously processed. In the closed system, the processing in the continuous process, It is difficult to do so.

Therefore, it is preferable to use an atmospheric plasma generating apparatus.

Further, in addition to the apparatus using the atmospheric plasma, a cleaning apparatus that performs cleaning using any one of extreme ultraviolet (EUV, DUV), and ultraviolet (UV) may also be used.

Conventionally, an ultraviolet ray cleaning apparatus for a transparent substrate using ultraviolet rays has been mainly used for ultraviolet ray lamps emitting ultraviolet rays of 172 wavelengths. In order to effectively remove organic substances, ultraviolet rays having excellent cleaning effect according to the wavelength of ultraviolet rays are irradiated and cleaned.

Ozone (O ₃ ) can be used for cleaning, and ozone is sprayed with deionized ozone water or ozone gas to clean.

In addition, the dry type cleaning device 10 may be cleaned using a cleaning liquid in combination.

The settling bath 30 contains a washing liquid and can constitute a plurality of settling basins 30 in order to improve the washing effect. In the settling basins 30, the same or different washing liquids can be formed to multiply the washing ability have.

In addition, an ultrasonic generator (not shown) may be additionally provided in the sedimentation bath 30.

It is possible to remove the deposition material such as organic substances more efficiently by performing the ultrasonic cleaning by the ultrasonic generator as well as simply immersing the mask 20 of the OLED deposition mask in the cleaning liquid.

It is possible to remove foreign matter more efficiently by not only dipping the mask 20 for the OLED deposition on the cleaning liquid but also by conducting electrolytic cleaning.

The cleaning liquid may be an organic solvent having solubility or peeling property with respect to organic materials such as NMP (N-methyl pyrrolidone), acetone, cyclohexanone and the like.

The OLED deposition mask 20 washed in the drying apparatus 40 is dried to complete the cleaning. The OLED deposition mask 20 may be immersed in the IPA before drying in the drying apparatus 40 so that the water is displaced by the IPA having a relatively low boiling point so that the OLED deposition mask 20 is quickly dried have.

The OLED deposition mask 20 according to the present invention cleans most of the organic deposition material while passing through the dry type cleaning apparatus 10. The organic deposition material remaining in the OLED deposition mask 20 is completely washed by submerging in succession into the settling bath 30 containing the cleaning liquid, and is dried using the drying apparatus 40.

1, wet cleaning is performed after dry cleaning, but the combined sequence of wet cleaning consisting of the dry type cleaning device 10, the precipitation bath 30, and the drying device 40 may be dry type It may be selected and arranged in accordance with the utilization of the process without being limited thereto.

That is, the present invention is characterized in that a dry type cleaning apparatus 10 as a dry type cleaning apparatus, a wet type cleaning apparatus composed of a precipitation bath 30 and a drying apparatus 40 are sequentially or reversely configured to simultaneously apply a dry cleaning method and a wet cleaning method .

2 is a schematic plan view showing an embodiment in which the OLED deposition equipment 80 is further constructed in the wet and dry composite mask cleaning apparatus of FIG.

Figure 2 is a plan view of the OLED deposition apparatus 80 shown in Figure 1 in which the apparatus 50 for automatically extracting and transporting each OLED deposition mask 20 used in the deposition equipment 80 is used And includes a device for automatically feeding through the cleaning process of FIG. The deposition equipment (80) can be constructed on the side of the cleaning device in the traveling direction.

Both the dry cleaning and the wet cleaning have a cleaning power limit by only one method, so the mask is rinsed through two or more rinses. This takes a lot of processing time and increases the number of used masks. In particular, wet cleaning uses a cleaning liquid of high purity, which causes environmental pollution.

Accordingly, the present invention can reduce the amount of cleaning solution used to clean most of the organic deposition material by dry cleaning and to deposit the organic deposition material remaining in the cleaning solution. In addition, since it is not necessary to check an incomplete cleaning by manpower and to separately perform post-cleaning, the cleaning process time can be further remarkably reduced.

2 is a schematic plan view showing an embodiment in which the OLED deposition equipment 80 is further constructed in the wet and dry composite mask cleaning apparatus of FIG.

As shown in Fig. 2, on the side of the cleaning device composed of the dry type cleaning device 10, the settling bath 30 and the drying device 40, a cleaned OLED An automatic transfer device 50 for supplying the wear mask 20 back to the dry type cleaning device 10 is constructed.

The automatic transfer device 50 serves to transfer the cleaned OLED deposition mask 20 to the dry type cleaning device 10 or the settling bath 30 again. Since the OLED deposition mask 20 dried through the drying apparatus 40 is cleaned, the OLED deposition apparatus 80 is formed on the side surface of the automatic transfer apparatus 50, The OLED deposition mask 20 is transferred to the OLED deposition equipment 80 and the OLED deposition mask 20 after the deposition process is removed from the OLED deposition equipment 80 and transferred to the automatic transfer apparatus 50 So that the automatic extraction and dispensing apparatus 51 can be configured.

The OLED deposition mask 20 having been subjected to the deposition process is removed from the OLED deposition equipment 80 and supplied to the automatic transfer apparatus 50. In the automatic transfer apparatus 50, the dry type cleaning apparatus 10 Or the precipitation bath 30, and is repeatedly subjected to dry cleaning and wet cleaning.

As described above, since the apparatus for cleaning the mask together with the line for depositing the organic light emitting display device is formed together with the deposition equipment without placing it in a separate isolated space, it is possible to reduce additional space and extra space for manpower.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art in light of the above teachings. will be. The invention is not limited by these variations and modifications, but is limited only by the claims appended hereto.

10: Cleaning device 20: OLED vapor deposition mask
30: settling bath 40: drying device
50: Automatic transfer device for mask 51: Automatic extraction and insertion device
80: OLED deposition equipment

Claims (6)

An apparatus for cleaning an OLED, AMOLED (hereinafter referred to as OLED) vapor deposition mask 20,
A dry type cleaning apparatus 10 for cleaning using any one of plasma, extreme ultraviolet (EUV / DUV) and ultraviolet (UV)
A plurality of settling basins 30 configured to be capable of being immersed in all or part of an OLED deposition mask 20,
The arrangement order of the dry type cleaning apparatus 10, the settling bath 30, and the drying apparatus 40 is as follows. The drying apparatus 40 includes a drying apparatus 40 for drying and drying the OLED deposition mask 20 in the settling bath 30, Optionally,
A wet and dry composite mask cleaning device (not shown) for allowing the deposition mask 20 to pass through the dry type cleaning device 10, the settling bath 30 and the drying device 40 to apply the dry cleaning and the wet cleaning simultaneously In this case,
The dry type cleaning apparatus 10 may be cleaned using a cleaning liquid such as NMP (N-methyl pyrrolidone), acetone, or cyclohexanone,
An ultrasonic wave generator is formed inside the sedimentation bath 30,
Characterized in that an automatic transfer device (50) is configured to supply the cleaned OLED deposition mask (20) from the drying device (40) back to the dry type cleaning device (10) . delete delete delete delete delete

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