KR20160002562A - Continuous mask processing apparatus comprising infrared drying system - Google Patents

Abstract

The present invention relates to a continuous mask processing apparatus including an infrared drying system and, more particularly, to a continuous mask processing apparatus including an effective infrared drying system on a mask going through a cleaning process, and configured to perform a deposition process performed on the mask having a substrate attached thereon, and the cleaning process performed on the mask having the substrate detached therefrom after the deposition process is completed, in one continuous process. Accordingly, the productivity can be improved due to a reduced process time, and minimizing the number of masks used for a process can be maintained. Also, deposition and cleaning devices are separately provided, thereby effectively reducing the contamination possibility caused by an external contamination source which may be generated when the mask is provided to the deposition device again after cleaning the mask through the cleaning device. In addition, a drying time can be reduced since a drying unit for drying the mask passing through the cleaning and rinse processes uses thermal infrared rays having larger radiant energy, thereby having a sufficient drying effect only with a relatively miniaturized drying chamber.

Description

TECHNICAL FIELD [0001] The present invention relates to a continuous mask processing apparatus including an infrared drying system,

The present invention relates to a continuous mask processing apparatus comprising an infrared drying system, and more particularly to a continuous mask processing apparatus comprising an infrared drying system, in which a deposition process and a deposition process carried out on a mask with a substrate are completed, To a continuous mask processing apparatus which is constructed to be able to be carried out in a continuous process and which comprises an efficient infrared drying system on a mask subjected to the cleaning process.

BACKGROUND ART An organic light emitting display (OLED) uses an organic light emitting layer, which is a self-luminous element that emits a phosphor by recombination of electrons and holes, and has a contrast ratio and a response time And it has been attracting attention as a next-generation display which is ideal as being easy to implement a flexible display.

In the OLED, a plurality of pixel regions are arranged in a matrix, and a micropattern, such as a driving element for driving each pixel, is formed in each pixel region. In this case, since the organic light emitting layer that emits light is made of an organic material having weak chemical resistance, the organic material is vaporized rather than the photolithography method using the conventional exposure and etching, and then the organic light emitting layer is selectively On the substrate.

However, in the deposition process, the deposition material may be deposited not only on the substrate attached to the mask but also on the surface of the mask, which increases as the number of deposition processes increases. Therefore, when the mask used for the deposition is not cleaned, the mask must be used in a state in which various deposition materials such as organic and inorganic substances are deposited on the surface, which causes not only failure of the mask but also contamination of the deposition line This is directly related to the reliability of the final product.

Therefore, in order to solve the above-mentioned problems, a discontinuous method of discarding a mask for each predetermined number of times of deposition, or collecting a predetermined amount of a mask used for a predetermined number of times of deposition, followed by cleaning is mainly used. However, these methods have been accompanied by considerable uneconomical problems in terms of time and cost.

As a part of the prior art, a photomask cleaning apparatus disclosed in Korean Patent Laid-Open No. 10-2006-0004308 also discloses a technique for extending the life of a mask by removing deposition material deposited on the mask, Since the cleaning line is separated, the above-described problems are entailed.

Conventionally, a method of supplying hot air under vacuum for drying a cleaned and / or rinsed substrate or mask has been generally applied. However, since the drying efficiency is not high, it is difficult to shorten the drying time, It is difficult to miniaturize the drying chamber because it is necessary to have a proper scale for circulation.

Korean Patent Publication No. 10-2006-0004308

The present invention relates to a process for continuously and repeatedly performing deposition and cleaning processes on an in-line basis by configuring the deposition line for performing the deposition process and the cleaning line for cleaning the mask through the deposition process to be continuously performed, It is an object of the present invention to provide an expression mask processing apparatus.

It is still another object of the present invention to provide a continuous mask processing apparatus including an efficient infrared drying system on a mask subjected to the cleaning process.

In order to solve the above technical problem,

According to an aspect of the present invention, there is provided a deposition apparatus including: a deposition line including an attaching portion for attaching a substrate to a mask, a deposition portion for performing a deposition process on the substrate, and a desorption portion for desorbing the substrate from the mask; A first chamber for supplying said mask from which a substrate is detached to a cleaning line; A cleaning line for sequentially cleaning the mask supplied from the first chamber, wherein the chemical processing part, the rinsing part, and the drying part are sequentially arranged; And a second chamber for supplying the mask having passed through the cleaning line to an attachment portion of the vapor deposition line, wherein the drying portion includes an infrared radiation portion for radiating infrared rays toward the mask, There is provided a continuous mask processing apparatus including an infrared drying system including a conveyor belt for conveying an object to be processed.

In one embodiment, the deposition line and the cleaning line are provided with a transfer unit in which the transfer path of the mask is disposed; And a driving unit for supplying power to the mask disposed on the transfer unit to be transferred in one direction.

In one embodiment, the attaching portion includes a supply portion for receiving a substrate from the outside, and the desorbing portion may include a take-out portion for carrying out a substrate having been deposited to the outside.

In one embodiment, the infrared ray radiating part includes: a first infrared ray radiating part for radiating infrared rays toward the upper surface of the mask; And a second infrared radiation unit for radiating infrared rays toward the lower surface of the mask.

In one embodiment, the infrared emitting unit includes a housing and a cover detachable from the housing, wherein the first infrared emitting unit is provided in the cover, and the second infrared emitting unit is provided in the housing.

In one embodiment, the infrared ray emitting unit includes a plurality of infrared ray plates, and the temperature of the plurality of infrared ray plates can be individually adjusted.

According to an embodiment of the present invention, a cleaning apparatus is incorporated into a return-line of an in-line type deposition apparatus to perform deposition and cleaning on an in-line basis, . ≪ / RTI > Thus, the productivity can be improved by reducing the processing time, and it is possible to keep the quantity of the mask used in the process to a minimum.

In addition, since the deposition apparatus and the cleaning apparatus are separately provided, the possibility of contamination due to external contaminants that may occur when the mask is cleaned through the cleaning apparatus and then supplied to the deposition apparatus can be effectively reduced.

Further, a more effective rinsing process can be performed by spraying a rinsing liquid onto the upper and lower surfaces of the mask, respectively, and adjusting the angle at which the rinsing liquid is sprayed, and it is possible to efficiently reuse the expensive rinsing liquid by applying the cooling system Do.

Further, by using thermal infrared rays having a large radiant energy in the drying unit for drying the mask having completed the cleaning and rinsing process, the drying time can be shortened, and accordingly, the drying chamber having a relatively small size can be provided, can do.

1 schematically shows a continuous mask processing apparatus according to an embodiment of the present invention.
2 shows a processing sequence of the continuous mask processing apparatus according to an embodiment of the present invention.
3 is a perspective view of a rinse portion according to one embodiment of the present invention.
4 is a perspective view of a rinse liquid ejection unit according to an embodiment of the present invention.
5 is a perspective view of a conveyor belt according to an embodiment of the present invention.
6 is a cross-sectional view of a rinse portion according to one embodiment of the present invention.
7 is a cross-sectional view of a rinse unit provided with a cooling unit according to an embodiment of the present invention.
8 and 9 are perspective views of a drying unit according to an embodiment of the present invention.
10 and 11 are sectional views of a drying unit according to an embodiment of the present invention.
12 is a plan view of a drying unit according to an embodiment of the present invention.

Certain terms are hereby defined for convenience in order to facilitate a better understanding of the present invention. Unless otherwise defined herein, scientific and technical terms used in the present invention shall have the meanings commonly understood by one of ordinary skill in the art. Also, unless the context clearly indicates otherwise, the singular form of the term also includes plural forms thereof, and plural forms of the term should be understood as including its singular form.

Terms including ordinals such as first, second, etc. may be used to describe various elements, but the elements are not limited by such terms. These terms are used only to distinguish one component from another.

Hereinafter, a continuous mask processing apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings.

1 schematically shows a continuous mask processing apparatus according to an embodiment of the present invention.

Referring to FIG. 1, a continuous mask processing apparatus 100 according to an embodiment of the present invention roughly comprises an evaporation line 110 and a cleaning line 120.

That is, the deposition processing and the cleaning processing can be simultaneously and repeatedly performed in one apparatus.

The deposition line 110 includes an attachment part 112 for attaching a substrate to a mask, a deposition part 111 for performing a deposition process on the substrate, and a desorption part for removing the substrate from the mask 113).

The deposition line (110) is provided with a transfer unit in which the transfer path of the mask is disposed. And a driving unit for supplying power to the mask disposed on the transfer unit to be transferred in one direction.

The conveyance unit and the driving unit may be configured as a conveyor belt.

The deposition unit 112 of the deposition line 110 is provided with a supply unit 150 for receiving a substrate from the outside and a substrate on which the deposition of the outside is completed is formed on the deposition unit 113 of the deposition line 110 And a carry-out unit 160 for carrying out can be formed.

The cleaning line 120 may be selectively applied to the dry cleaning method and / or the wet cleaning method. The dry cleaning method may include at least one cleaning agent selected from plasma, ultraviolet rays, and ozone in the cleaning line 120. The wet cleaning system is configured to include chemical processing units 121 and 122, a rinsing unit 123, and a drying unit 124.

In this case, the chemical processing units 121 and 122, the rinsing unit 123, and the drying unit 124 are desirably arranged in the specified order. The chemical treatment units 121 and 122, the rinsing unit 123, and the drying unit 124 may be directly connected to each other, but a certain area 125 may be formed therebetween.

That is, a first region 125 is provided between the chemical treatment unit 121 and the chemical treatment unit 122, a second region 125 is provided between the chemical treatment unit 122 and the rinsing unit 123, the rinsing unit 123, A third region 125 may be formed between the drying units 124.

The first to third regions 125 and 125 are regions for naturally or physically removing the cleaning liquid and / or the rinsing liquid remaining on the mask that has passed through the chemical processing units 121 and 122 or the rinsing unit 123, .

For example, the first to third regions 125 may further include an air injecting portion (not shown), and the cleaning liquid and / or the rinsing liquid remaining on the mask by the air injected from the air injecting portion Can be removed first.

Here, the chemical processing units 121 and 122 may be constituted by one cleaning tank, but may be formed by sequentially connecting a plurality of cleaning tanks as shown in FIG.

Further, when a plurality of cleaning tanks are sequentially connected (in series), each cleaning tank may contain the same or different cleaning liquids. For example, by including a plurality of cleaning tanks containing the same cleaning liquid, the cleaning effect can be maximized. Further, in another example, the chemical processing unit 121. 122 may include a first cleaning tank 121 for removing inorganic substances on the mask; And a second cleaning tank 122 for removing organic substances on the mask, but are not necessarily limited to the above order, but may be arranged in the reverse order.

In addition, the cleaning tank contains a cleaning liquid, and the cleaning liquid may be a cleaning liquid which is conventionally used for cleaning an inorganic material (e.g., metal) and / or an organic material deposited (remained) on the mask. Accordingly, the mask may be immersed more than once in the cleaning bath containing the cleaning liquid, so that the inorganic substances (e.g., metal) and / or organic substances deposited (remained) on the mask may be removed.

In another embodiment, the chemical processing units 121 and 122 may include a cleaning liquid jetting unit for jetting a cleaning liquid onto the mask. At this time, the cleaning liquid jetting unit may adopt a method of directly jetting the cleaning liquid onto the mask, jetting the cleaning liquid to a separate member, and performing an indirect jetting to flow the cleaning liquid flowing down from the member onto the mask .

Herein, as the cleaning liquid, N-methyl pyrrolidone (NMP), acetone and cyclohexanone, as well as foaming alkali or non-foaming alkaline, foaming neutral or non-foaming TFDO 7, TFD 13, TFD W, TFD LC, TFDO 4, TFDO N, TFDO 7, and TFDO W can be used as the cleaning liquid. It is preferable that the cleaning liquid has solubility and / or peelability for organic and / or inorganic substances, and static electricity is prevented on the surface of the mask after cleaning to prevent foreign matter from adhering to the surface of the mask.

In addition, the cleaning bath may further include an ultrasonic generator (not shown). (For example, metal) and / or organic matter deposited (remained) on the mask through the ultrasonic waves generated from the ultrasonic generator can be more effectively removed.

The mask with organic and / or inorganic substances removed through the chemical treatment units 121 and 122 is then transferred to the rinsing unit 123.

The rinsing unit 123 is provided to remove the cleaning liquid remaining on the mask after cleaning in the chemical processing units 121 and 122.

In one embodiment, the rinsing unit 123 may be configured as a rinsing tank containing a rinsing liquid.

That is, the rinsing unit 123 is configured to carry the mask in a rinsing tank containing the rinsing liquid to remove the cleaning liquid remaining on the mask.

In another embodiment, the rinsing unit 123 may include a rinsing liquid jetting unit for jetting the rinsing liquid onto the mask after the cleaned mask is transferred.

At this time, the rinse liquid spraying unit may adopt a method of spraying the rinse liquid directly onto the mask, or spraying the rinse liquid onto a separate member, and rinsing liquid flowing from the member flows onto the mask It is possible to adopt an indirect injection method.

The rinsing unit 123 may include a plurality of rinsing units connected in series. Here, when a plurality of rinse tanks are sequentially connected (in series), each of the rinse tanks can take the same or different rinse injection method. For example, in the first rinse tank, the direct injection method is used, while in the second rinse tank, the indirect injection method can be adopted.

The rinsing unit 123 according to an embodiment of the present invention will be described in more detail with reference to FIGS. 3 to 7 showing the rinsing unit 123 according to an embodiment of the present invention in more detail.

The rinsing unit 123 includes a rinsing liquid spraying unit 200 for spraying the rinsing liquid toward the mask 210, a conveyor belt 300 for conveying the mask 210 in one direction, And the rinsing liquid collecting unit 200 and the conveyor belt 300 are provided in the housings 401 and 402 and the rinsing liquid collecting unit is disposed in the housing 401 and 402, External and / or internal.

Hereinafter, the rinse liquid sprayer 200 will be described in more detail.

4 and 6, the rinse liquid sprayer 200 includes frames 201 and 202, rinse liquid supply pipes 203 and 204 arranged on the frame, rinse liquid supply pipes 203 and 204, A plurality of rinse liquid spray nozzles 205 and 206 for spraying the rinse liquid onto the upper surface or the lower surface of the mask and a spray angle of the rinse liquid spray nozzles 205 and 206 And angle adjusting portions 207 and 208 for adjusting the angle.

At this time, the rinse liquid sprayer 200 may be provided at the upper and lower portions of the mask so that the rinsing process on the upper and lower surfaces of the mask can be performed simultaneously.

That is, the rinse liquid sprayer 200 includes a first rinse liquid sprayer for spraying the rinse liquid toward the upper surface of the mask 210 and a second rinse liquid sprayer for spraying the rinse liquid toward the lower surface of the mask 210 And a second rinsing liquid jetting portion.

The first rinse liquid injecting unit includes a first frame 201 disposed on the upper side of the mask 210, a first rinse liquid supply pipe 203 disposed on the first frame, A plurality of first rinsing liquid jetting nozzle units 205 for jetting the rinsing liquid supplied to the first rinsing liquid jetting nozzle unit 203 toward the upper surface of the mask 210 and a second rinsing liquid jetting nozzle unit 205 for adjusting the jetting angle of the first rinsing liquid jetting nozzle unit 205 Wherein the second rinse liquid jetting unit includes a second frame 202 disposed at a lower portion of the mask 210, a second rinse liquid jetting unit disposed at a second position on the second frame, A rinsing liquid supply pipe 204, a plurality of second rinsing liquid jetting nozzle units 206 for jetting the rinsing liquid supplied to the second rinsing liquid supply pipe 204 toward the lower surface of the mask 210, And a second angle adjusting unit 208 for adjusting the spray angle of the rinse liquid spray nozzle unit 206, The.

The angle adjusters 207 and 208 adjust the angle at which the rinsing liquid is injected onto the upper and / or lower surfaces of the mask 210, So that the reliability of the rinsing process can be improved. Further, it is possible to forcibly form the flow of the rinsing liquid overflowing from the upper surface of the mask 210.

That is, the flow of the rinsing liquid can be formed in the same or opposite direction as the direction of transfer of the mask 210, and the spray angle of the spray nozzles 205 and 206 can be continuously adjusted so that the flow is repeated alternately .

The injection angle of the injection nozzle units 205 and 206 is varied by 5 to 60 degrees with respect to the vertical direction of the upper and / or lower surface of the mask 210 by the angle adjusting units 207 and 208 Lt; / RTI >

Hereinafter, the conveyor belt 300 will be described in more detail.

Referring to FIG. 5, the conveyor belt 300 includes a frame 302, a conveying unit 301 forming a conveying path of the mask on the frame, and a mask disposed on the conveying unit. And a driving unit 303 for supplying the driving signal.

Hereinafter, the rinsing liquid recovery unit (not shown) will be described in more detail.

The rinse solution collecting part recovers the rinse solution to be reused.

More specifically, the rinse solution collecting portion includes a drain portion for draining the rinsing liquid from the bottom portion of the rinse portion.

The drain portion may include a tank for storing the rinsing liquid drained by the drain portion and a drain line for communicating the rinsing portion 123 and the tank.

The drain portion is preferably disposed under the rinsing portion 123, but is not limited thereto.

The rinsing liquid drained into the tank of the drain portion includes a cleaning liquid and / or a foreign substance. Therefore, the drain portion is provided with a distillation portion for selectively distilling only the rinsing liquid.

At this time, the distillation furnace by the distillation section may be vacuum distillation, vacuum distillation or atmospheric distillation.

However, since the boiling point of the cleaning liquid used for cleaning the mask is generally higher than the boiling point of the rinsing liquid, it is possible to selectively distill only the rinsing liquid from the solution drained into the tank of the drain portion through the atmospheric distillation.

The rinsing liquid distilled by the distillation unit is transferred to and stored in a separate storage unit. The storage unit is provided with a cooling unit 403 for liquefying the distilled rinsing liquid.

At this time, the cooling unit 403 is provided in the housing of the rinse unit 123 separately from the distillation unit (not shown), so that the distilled rinse liquid supplied from the distillation unit can be liquefied.

In this case, the cooling unit 403 and the rinsing liquid supply unit 203 may be in a communicated state.

When the cooling unit 403 is provided in the housing of the rinsing unit 123, the cooling unit 403 may be provided in at least one region selected from the upper, lower and side portions of the housing .

In this case, the plurality of cooling units 403 may be in communication with any one of the rinse liquid supply units 203.

If the cooling unit 403 is provided separately from the rinsing unit 123, a reflux unit for refluxing the rinsing liquid liquefied by the cooling unit 403 to the rinsing unit is provided, And may be in a state of being in communication with the liquid supply units 203 and 204.

Further, in another embodiment, the rinsing unit 123 may further include a heat treatment unit capable of performing heat treatment to a boiling point of the rinsing liquid.

By the heat treatment to the boiling point of the rinsing liquid by the heat treatment unit, the rinsing liquid sprayed by the spraying nozzles 205 and 206 is gradually evaporated after being lowered in the gravity direction and rising in the direction opposite to the gravity direction.

At this time, the rinsing liquid evaporated by the plurality of cooling units 403 provided on the upper portion of the housing is liquefied and descended again in the direction of gravity, so that the rinsing process for the mask 210 can be performed.

The evaporated rinsing liquid can be reused by forming a circulating flow in which the evaporated rinsing liquid rises and is liquefied by the cooling unit 403 and then descends again.

The mask from which the cleaning liquid remaining on the mask has been removed through the rinsing unit 123 is then transferred to the drying unit 124.

Hereinafter, the drying unit 124 will be described in more detail with reference to FIGS. 8 to 12. FIG.

The drying unit 124 serves to dry the mask 210 transferred through a drying device inside or outside.

The drying unit 124 is configured to include a housing 520 and a cover 510 detachable from the housing. The drying unit 124 may include infrared radiation units 511 and 521 for radiating infrared rays toward the mask 210 and a conveyor belt 540 for transporting the mask 210 in one direction .

The conveyor belt 540 includes a frame similar to the conveyor belt 300 of the rinse portion 123, a transfer portion that forms a transfer path of the mask 210 on the frame, and a mask 210 To be moved in one direction.

The conveyor belt 540 serves to supply the mask 210 with the cleaning liquid remaining on the mask 210 to the drying unit 124 through the rinsing unit 123.

More specifically, the mask 210 is fed into the housing 520 of the drying unit 124 by the conveyor belt 540 while being spaced apart from the lower end of the housing 520 by a predetermined distance.

Accordingly, a guide line is provided along the moving path of the conveyor belt 540 that supplies the mask 210 to the side wall of the housing 520.

The housing 520 of the drying unit 124 may be configured to have an inlet and an outlet so that the mask 210 is opened by the conveyor belt 540 with the inlet and the outlet of the housing 520 being opened. And the drying of the mask 210 by the drying unit 124 is performed while the inlet and the outlet of the housing 520 are closed.

After the drying is completed, the inlet and the outlet of the housing 520 are opened, and the dried mask is taken out from the drying unit 124 through the outlet of the housing 520, A mask is supplied to the drying unit 124 through the opening of the housing 520.

The infrared ray radiating unit includes a first infrared ray radiating unit 511 for radiating infrared rays toward the upper surface of the mask 210 and a second infrared ray radiating unit 521 for radiating infrared rays toward the lower surface of the mask 210 ).

The infrared ray radiating part separately has a first infrared ray radiating part 511 and a second infrared ray radiating part 522 for radiating infrared rays to the upper surface and the lower surface of the mask 210, respectively, thereby achieving effective drying efficiency And at the same time, the drying time can be shortened.

In addition, unlike the hot air, since the (infrared) radiation has a large radiant energy, it is possible to reduce the size of the space in which the drying process is performed.

In another example, the drying unit 124 may maximize the drying efficiency by (heat) infrared rays by providing a reflection plate on the inner wall of the housing 520 by using the characteristic of infrared rays having a large radiant energy have.

At this time, the first infrared ray radiating part 511 is provided on the cover 510 and the second infrared ray radiating part 521 is provided on the housing 520.

A second infrared radiation unit 521 for emitting infrared rays toward the lower surface of the mask 210 is disposed at a lower end of the housing 520 and the mask 210 .

A first infrared radiation part 511 for radiating infrared rays toward the upper surface of the mask 210 is provided below the cover 510. When the cover 510 is separated from the housing 520 , And is separated from the housing 520 together with the cover 510.

9 and 10, the cover 510 may be separated from the housing 520 by a lifting unit 530 including a lifting line 531. As shown in FIG.

Referring to FIG. 12, the infrared ray emitting unit may include a plurality of infrared ray plates. For example, the infrared ray radiating unit may include a first infrared ray radiating unit 511 and a second infrared ray radiating unit 521, and at least one of the plurality of infrared ray radiating units may include a plurality of infrared ray radiating units Infrared plate.

At this time, the temperatures of the plurality of infrared plates can be individually adjusted.

For example, the temperature of the infrared ray plate of the infrared ray radiating unit may be set higher than that of the infrared ray plate disposed at the center of the infrared ray radiating unit, the infrared ray plate disposed at the rim of the infrared ray radiating unit.

The temperature of the infrared plate is preferably adjusted in consideration of opening and closing of the housing 520 and a temperature loss through the side wall of the housing 520.

As described above, the continuous mask processing apparatus 100 according to an embodiment of the present invention includes a deposition process performed on a substrate-attached mask and a cleaning process performed on a mask on which the substrate is detached, Which is accomplished by placing the cleaning line 120 in the return-line of the in-line deposition line 110, .

Accordingly, the continuous mask processing apparatus 100 includes a first chamber 130 for supplying the mask to which the substrate is detached after the deposition process is completed to the cleaning line 120, and a second chamber 130 for passing the cleaning line 120 And a second chamber 140 for supplying the cleaned mask to the attachment portion 112 of the deposition line 110.

In this case, the first chamber 130 and the second chamber 140 may be formed of a load-lock chamber. The load lock chamber is a depressurizable chamber and prevents external air and minute dust or foreign matter contained therein from being introduced into the continuous mask processing apparatus.

In addition, the first chamber 130 and the second chamber 140 may include a transfer unit in which the transfer path of the mask is disposed. And a driving unit for supplying power to the mask disposed on the transfer unit to be transferred in one direction.

The conveyance unit and the driving unit may be configured as a conveyor belt.

FIG. 2 shows a process sequence of a continuous mask according to an embodiment of the present invention.

Referring to FIG. 2, first, a substrate is supplied to the deposition line 110 (S1).

The substrate is supplied through the supply unit 150 provided at the front end of the deposition line 110 and the substrate supplied through the supply unit 150 is transferred to the deposition unit 112 of the deposition line 110 do.

The supplied substrate is attached to a mask (S2) at an attaching portion (112), then passes through a deposition portion (111) and a deposition process is performed on the substrate (S3). At this time, a deposition material including an organic material and / or an inorganic material may be deposited not only on the substrate but also on the mask.

The substrate on which the deposition is completed is detached from the mask at the desorption section 113 provided at the distal end of the deposition line 110 and the desorbed substrate is taken out through the discharge section 160 to the outside.

The mask from which the substrate is detached is supplied to the cleaning line 120 through the first chamber (S5).

In the chemical treatment units 121 and 122 of the cleaning line 120, a cleaning process is performed to remove deposition materials including organic and / or inorganic substances deposited on the mask (S6).

After the cleaning process is completed, the cleaning liquid remaining on the mask may be rinsed by the rinsing unit 123 (S7).

The finally rinsed mask is dried (S8) in the drying unit 124, and is ready for reuse.

The dried mask may be supplied to the attachment portion 112 of the deposition line again through the second chamber (S9)

That is, as described above, according to an embodiment of the present invention, a cleaning device is incorporated into an in-line type deposition apparatus at a return-line to form an in- So that deposition and cleaning can be performed continuously and repeatedly. Thus, the productivity can be improved by reducing the processing time, and it is possible to keep the quantity of the mask used in the process to a minimum. In addition, since the deposition apparatus and the cleaning apparatus are separately provided, the possibility of contamination due to external contaminants that may occur when the mask is cleaned through the cleaning apparatus and then supplied to the deposition apparatus can be effectively reduced.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined in the appended claims. Deletion, addition, or the like of the present invention may be variously modified and changed within the scope of the present invention.

Claims (6)

A deposition line including an attaching portion for attaching a substrate to a mask, a deposition portion for performing a deposition process on the substrate, and a desorption portion for desorbing the substrate from which the deposition has been completed;
A first chamber for supplying said mask from which a substrate is detached to a cleaning line;
A cleaning line for sequentially cleaning the mask supplied from the first chamber, wherein the chemical processing part, the rinsing part, and the drying part are sequentially arranged; And
And a second chamber for supplying the mask having passed through the cleaning line to an attachment portion of the deposition line,
Wherein the drying unit includes an infrared radiation unit for radiating infrared rays toward the mask and a conveyor belt for conveying the mask in one direction.
A continuous mask processing apparatus comprising an infrared drying system.
The method according to claim 1,
Wherein the deposition line and the cleaning line are provided with a transfer unit in which the transfer path of the mask is disposed; And a driving unit for supplying power to the mask disposed on the transfer unit to be transferred in one direction.
The method according to claim 1,
Wherein the attaching portion includes a supply portion for receiving a substrate from the outside, and the desorbing portion includes a carry-out portion for carrying out a substrate on which the deposition is completed to the outside. .
The method according to claim 1,
The infrared ray radiating unit includes:
A first infrared radiation part for emitting infrared rays toward an upper surface of the mask; And a second infrared radiation unit for radiating infrared rays toward the lower surface of the mask.
5. The method of claim 4,
Wherein the infrared radiation unit includes a housing and a cover detachable from the housing, wherein the first infrared radiation unit is provided in the cover, and the second infrared radiation unit is provided in the housing. Type mask processing apparatus.
The method according to claim 1,
Wherein the infrared radiation unit comprises a plurality of infrared radiation plates, the infrared radiation system being configured to be able to individually adjust the temperature of the plurality of infrared radiation plates.

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