KR101485842B1 - 기판의 국부적인 진공 증착을 위한 전사 마스크 및 이 전사 마스크의 제조 공정 - Google Patents
기판의 국부적인 진공 증착을 위한 전사 마스크 및 이 전사 마스크의 제조 공정 Download PDFInfo
- Publication number
- KR101485842B1 KR101485842B1 KR1020147010458A KR20147010458A KR101485842B1 KR 101485842 B1 KR101485842 B1 KR 101485842B1 KR 1020147010458 A KR1020147010458 A KR 1020147010458A KR 20147010458 A KR20147010458 A KR 20147010458A KR 101485842 B1 KR101485842 B1 KR 101485842B1
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- South Korea
- Prior art keywords
- layer
- transfer mask
- substrate
- intermediate support
- vacuum deposition
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011082956.3 | 2011-09-19 | ||
| DE102011082956.3A DE102011082956B4 (de) | 2011-09-19 | 2011-09-19 | Transfermasken zur lokalen Bedampfung von Substraten und Verfahren zu deren Herstellung |
| PCT/EP2012/066798 WO2013041336A1 (de) | 2011-09-19 | 2012-08-29 | Transfermasken zur lokalen bedampfung von substraten und verfahren zu deren herstellung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20140066769A KR20140066769A (ko) | 2014-06-02 |
| KR101485842B1 true KR101485842B1 (ko) | 2015-01-26 |
Family
ID=46763087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147010458A KR101485842B1 (ko) | 2011-09-19 | 2012-08-29 | 기판의 국부적인 진공 증착을 위한 전사 마스크 및 이 전사 마스크의 제조 공정 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5685350B2 (de) |
| KR (1) | KR101485842B1 (de) |
| CN (1) | CN103958724B (de) |
| DE (1) | DE102011082956B4 (de) |
| WO (1) | WO2013041336A1 (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012110343A1 (de) | 2012-10-29 | 2014-04-30 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur lokal differenzierbaren Bedampfung von Substraten |
| DE102013108315B4 (de) * | 2013-08-01 | 2016-08-04 | Von Ardenne Gmbh | Beschichtungsvorrichtung und Verfahren zum Herstellen einer Beschichtungsvorrichtung |
| DE102014109046A1 (de) | 2014-06-27 | 2015-12-31 | Von Ardenne Gmbh | Transferlithographiemaske und Transferlithographieanlage |
| KR102181239B1 (ko) | 2014-09-03 | 2020-11-23 | 삼성디스플레이 주식회사 | 박막 형성 장치 및 그를 이용한 박막 형성 방법 |
| DE102014113944A1 (de) | 2014-09-26 | 2016-04-14 | Von Ardenne Gmbh | Transfermaske mit hohem Auflösungsvermögen und Verfahren zu deren Herstellung |
| DE102016105796B4 (de) | 2016-03-30 | 2024-09-26 | Leander Kilian Gross | Verfahren zur lokal differenzierten Abscheidung eines Materials auf ein Substrat und Verwendung eines solchen Verfahrens |
| CN116180035B (zh) * | 2023-04-20 | 2023-07-28 | 上海传芯半导体有限公司 | Euv空白掩模版制造方法和监控系统、euv空白掩模版制造系统 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060034575A (ko) * | 2004-10-19 | 2006-04-24 | 삼성에스디아이 주식회사 | 도너 기판 및 그를 사용한 유기전계발광표시장치의 제조방법 |
| JP2008066147A (ja) | 2006-09-07 | 2008-03-21 | Fuji Electric Holdings Co Ltd | 蒸着によるパターン形成方法、該方法を含む色変換フィルタ基板およびカラー有機ｅｌ素子の製造方法 |
| US20090197017A1 (en) * | 2008-02-04 | 2009-08-06 | Semiconductor Energy Laboratory Co., Ltd. | Deposition Method and Method for Manufacturing Light-Emitting Device |
| EP2299784A1 (de) * | 2008-06-16 | 2011-03-23 | Toray Industries, Inc. | Strukturierungsverfahren, verfahren zur herstellung von bauelementen mit dem strukturierungsverfahren und gerät |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101689519B1 (ko) * | 2007-12-26 | 2016-12-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판, 증착용 기판의 제조방법, 및 발광장치의 제조방법 |
| DE102009041324A1 (de) * | 2009-09-15 | 2011-03-24 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Herstellung von organischen photoaktiven Bauelementen, insbesondere von organischen Leuchtdioden |
| JP5323784B2 (ja) * | 2009-09-15 | 2013-10-23 | フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング | 微細構造を製造するための方法及び装置 |
| DE102010043204A1 (de) * | 2010-08-10 | 2012-02-16 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Verwendung einer Vorrichtung zur Erzeugung einer Schicht eines organischen Materials auf einem Substrat |
-
2011
- 2011-09-19 DE DE102011082956.3A patent/DE102011082956B4/de not_active Expired - Fee Related
-
2012
- 2012-08-29 CN CN201280045652.6A patent/CN103958724B/zh not_active Expired - Fee Related
- 2012-08-29 JP JP2014530145A patent/JP5685350B2/ja not_active Expired - Fee Related
- 2012-08-29 WO PCT/EP2012/066798 patent/WO2013041336A1/de active Application Filing
- 2012-08-29 KR KR1020147010458A patent/KR101485842B1/ko not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060034575A (ko) * | 2004-10-19 | 2006-04-24 | 삼성에스디아이 주식회사 | 도너 기판 및 그를 사용한 유기전계발광표시장치의 제조방법 |
| JP2008066147A (ja) | 2006-09-07 | 2008-03-21 | Fuji Electric Holdings Co Ltd | 蒸着によるパターン形成方法、該方法を含む色変換フィルタ基板およびカラー有機ｅｌ素子の製造方法 |
| US20090197017A1 (en) * | 2008-02-04 | 2009-08-06 | Semiconductor Energy Laboratory Co., Ltd. | Deposition Method and Method for Manufacturing Light-Emitting Device |
| EP2299784A1 (de) * | 2008-06-16 | 2011-03-23 | Toray Industries, Inc. | Strukturierungsverfahren, verfahren zur herstellung von bauelementen mit dem strukturierungsverfahren und gerät |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140066769A (ko) | 2014-06-02 |
| DE102011082956A1 (de) | 2013-03-21 |
| DE102011082956B4 (de) | 2015-10-15 |
| WO2013041336A9 (de) | 2013-05-30 |
| WO2013041336A1 (de) | 2013-03-28 |
| JP5685350B2 (ja) | 2015-03-18 |
| JP2014531512A (ja) | 2014-11-27 |
| CN103958724B (zh) | 2016-05-11 |
| CN103958724A (zh) | 2014-07-30 |
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