KR101405701B1 - 비-연속 피쳐의 패턴을 적용하기 위한 방법 및 장치 - Google Patents

비-연속 피쳐의 패턴을 적용하기 위한 방법 및 장치 Download PDF

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Publication number
KR101405701B1
KR101405701B1 KR1020087032035A KR20087032035A KR101405701B1 KR 101405701 B1 KR101405701 B1 KR 101405701B1 KR 1020087032035 A KR1020087032035 A KR 1020087032035A KR 20087032035 A KR20087032035 A KR 20087032035A KR 101405701 B1 KR101405701 B1 KR 101405701B1
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South Korea
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continuous
features
feature
pattern
imaged
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KR1020087032035A
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Korean (ko)
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KR20090024216A (ko
Inventor
가이 서톤
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코닥 그래픽 커뮤니케이션즈 캐나다 캄파니
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Assigned to 코닥 캐나다 유엘씨 reassignment 코닥 캐나다 유엘씨 권리의 전부이전등록 Assignors: 코닥 그래픽 커뮤니케이션즈 캐나다 캄파니
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B41M5/38221—Apparatus features
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/265—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used for the production of optical filters or electrical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/02—Dye diffusion thermal transfer printing (D2T2)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/06—Printing methods or features related to printing methods; Location or type of the layers relating to melt (thermal) mass transfer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/52—RGB geometrical arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Facsimile Heads (AREA)
  • Electronic Switches (AREA)
  • Optical Filters (AREA)
  • Image Processing (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Color Television Image Signal Generators (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
KR1020087032035A 2006-06-30 2007-06-18 비-연속 피쳐의 패턴을 적용하기 위한 방법 및 장치 Expired - Fee Related KR101405701B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80645206P 2006-06-30 2006-06-30
US60/806,452 2006-06-30
PCT/IB2007/001631 WO2008004048A2 (en) 2006-06-30 2007-06-18 Methods and apparatus for applying patterns of non-contiguous features

Publications (2)

Publication Number Publication Date
KR20090024216A KR20090024216A (ko) 2009-03-06
KR101405701B1 true KR101405701B1 (ko) 2014-06-10

Family

ID=38894930

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020087032035A Expired - Fee Related KR101405701B1 (ko) 2006-06-30 2007-06-18 비-연속 피쳐의 패턴을 적용하기 위한 방법 및 장치
KR1020087031771A Ceased KR20090024205A (ko) 2006-06-30 2007-06-18 다수의 이미지화 헤드를 사용하여 이미지를 형성하는 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020087031771A Ceased KR20090024205A (ko) 2006-06-30 2007-06-18 다수의 이미지화 헤드를 사용하여 이미지를 형성하는 방법

Country Status (8)

Country Link
US (2) US8305409B2 (https=)
JP (2) JP5334847B2 (https=)
KR (2) KR101405701B1 (https=)
CN (2) CN101522430A (https=)
DE (2) DE112007001551T5 (https=)
GB (2) GB2452205B (https=)
TW (2) TWI357856B (https=)
WO (2) WO2008004048A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101405701B1 (ko) * 2006-06-30 2014-06-10 코닥 그래픽 커뮤니케이션즈 캐나다 캄파니 비-연속 피쳐의 패턴을 적용하기 위한 방법 및 장치
WO2008004047A2 (en) * 2006-06-30 2008-01-10 Kodak Graphic Communications Canada Methods and apparatus for selecting and applying non-contiguous features in a pattern
WO2008015515A2 (en) * 2006-07-28 2008-02-07 Kodak Graphic Communications Canada Company Enhanced imaging of features
US20100128100A1 (en) * 2007-04-26 2010-05-27 Aldo Salvestro Imaging features with a plurality of scans
WO2012012875A1 (en) * 2010-07-26 2012-02-02 Kaleidoflex Technologies Inc. Method, apparatus, and system for forming filter elements on display substrates
US9269149B2 (en) 2014-05-08 2016-02-23 Orbotech Ltd. Calibration of a direct-imaging system
DE102016225484B3 (de) * 2016-12-19 2018-06-07 Carl Zeiss Industrielle Messtechnik Gmbh Verfahren und optischer Sensor zur Bestimmung mindestens einer Koordinate mindestens eines Messobjekts

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691759A (en) 1996-01-05 1997-11-25 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6037962A (en) 1998-04-03 2000-03-14 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6597388B2 (en) 2001-06-21 2003-07-22 Kodak Polychrome Graphics, Llc Laser-induced thermal imaging with masking

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US4900130A (en) 1988-10-07 1990-02-13 Eastman Kodak Company Method of scanning
US5164742A (en) 1989-12-18 1992-11-17 Eastman Kodak Company Thermal printer
US5278578A (en) 1989-12-18 1994-01-11 Eastman Kodak Company Thermal printer capable of using dummy lines to prevent banding
US5220348A (en) * 1991-08-23 1993-06-15 Eastman Kodak Company Electronic drive circuit for multi-laser thermal printer
US5517359A (en) * 1995-01-23 1996-05-14 Gelbart; Daniel Apparatus for imaging light from a laser diode onto a multi-channel linear light valve
US5724086A (en) * 1995-05-12 1998-03-03 Eastman Kodak Company Printhead having data channels with revisable addresses for interleaving scan lines
US5808655A (en) 1995-05-12 1998-09-15 Eastman Kodak Company Interleaving thermal printing with discontiguous dye-transfer tracks on an individual multiple-source printhead pass
US6271957B1 (en) * 1998-05-29 2001-08-07 Affymetrix, Inc. Methods involving direct write optical lithography
DE10031915A1 (de) 2000-06-30 2002-01-10 Heidelberger Druckmasch Ag Kompakte Mehrstrahllaserlichtquelle und Interleafrasterscanlinien-Verfahren zur Belichtung von Druckplatten
JP2002103597A (ja) * 2000-07-25 2002-04-09 Sony Corp プリンタ及びプリンタヘッド
DE10108624A1 (de) * 2001-02-22 2002-09-05 Heidelberger Druckmasch Ag Banding-reduzierende Bebilderung einer Druckform
US6582875B1 (en) * 2002-01-23 2003-06-24 Eastman Kodak Company Using a multichannel linear laser light beam in making OLED devices by thermal transfer
US6900826B2 (en) 2002-02-19 2005-05-31 Presstek, Inc. Multiple resolution helical imaging system and method
JP2003255552A (ja) * 2002-03-06 2003-09-10 Nec Corp レーザ照射装置並びに走査レーザ光を用いた露光方法及び走査レーザ光を用いたカラーフィルタの製造方法
US6957773B2 (en) 2002-05-17 2005-10-25 Creo Inc. High-speed flatbed scanner
JP4280509B2 (ja) * 2003-01-31 2009-06-17 キヤノン株式会社 投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法
TW200537259A (en) * 2004-01-28 2005-11-16 Du Pont Method for imaging regular patterns
WO2008004047A2 (en) * 2006-06-30 2008-01-10 Kodak Graphic Communications Canada Methods and apparatus for selecting and applying non-contiguous features in a pattern
KR101405701B1 (ko) * 2006-06-30 2014-06-10 코닥 그래픽 커뮤니케이션즈 캐나다 캄파니 비-연속 피쳐의 패턴을 적용하기 위한 방법 및 장치

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
US5691759A (en) 1996-01-05 1997-11-25 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6037962A (en) 1998-04-03 2000-03-14 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6597388B2 (en) 2001-06-21 2003-07-22 Kodak Polychrome Graphics, Llc Laser-induced thermal imaging with masking

Also Published As

Publication number Publication date
GB0822048D0 (en) 2009-01-07
DE112007001551T5 (de) 2009-05-14
WO2008004046A3 (en) 2008-03-13
WO2008004046A2 (en) 2008-01-10
US8199175B2 (en) 2012-06-12
WO2008004048A8 (en) 2009-02-05
CN101484320B (zh) 2012-12-05
GB2452205A (en) 2009-02-25
KR20090024216A (ko) 2009-03-06
GB2452205B (en) 2011-04-13
JP5334847B2 (ja) 2013-11-06
GB2452192A (en) 2009-02-25
CN101522430A (zh) 2009-09-02
WO2008004048A3 (en) 2008-03-13
JP2009543110A (ja) 2009-12-03
KR20090024205A (ko) 2009-03-06
US8305409B2 (en) 2012-11-06
JP2009543109A (ja) 2009-12-03
TW200811484A (en) 2008-03-01
GB0822905D0 (en) 2009-01-21
US20100188472A1 (en) 2010-07-29
TWI357856B (en) 2012-02-11
TW200817200A (en) 2008-04-16
WO2008004048A2 (en) 2008-01-10
CN101484320A (zh) 2009-07-15
US20100039490A1 (en) 2010-02-18
DE112007001591T5 (de) 2009-05-07

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