KR101395183B1 - Interface panel for display and method of fabricating thereof - Google Patents

Interface panel for display and method of fabricating thereof Download PDF

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Publication number
KR101395183B1
KR101395183B1 KR20120051141A KR20120051141A KR101395183B1 KR 101395183 B1 KR101395183 B1 KR 101395183B1 KR 20120051141 A KR20120051141 A KR 20120051141A KR 20120051141 A KR20120051141 A KR 20120051141A KR 101395183 B1 KR101395183 B1 KR 101395183B1
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transparent insulating
base material
insulating base
electrode layer
insulating substrate
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KR20120051141A
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Korean (ko)
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KR20130127313A (en
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최은희
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최은희
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Priority to KR20120051141A priority Critical patent/KR101395183B1/en
Priority to PCT/KR2012/006226 priority patent/WO2013172508A1/en
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Nonlinear Science (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)

Abstract

The present invention relates to a display interface panel and a method of manufacturing the same, and more particularly, to a display interface panel in which a cover glass and a transparent insulating substrate are integrated, and a manufacturing method thereof. To this end, the present invention relates to a cover glass; A first transparent insulating substrate laminated on the cover glass; A second transparent insulating substrate laminated on the first transparent insulating substrate; A first electrode layer formed on the first transparent insulating substrate along a first direction; And a second electrode layer formed along the second direction on the second transparent insulating substrate, wherein the first transparent insulating substrate and the second transparent insulating substrate include a curable resin, and a method of manufacturing the same to provide.

Description

TECHNICAL FIELD [0001] The present invention relates to an interface panel for a display,

The present invention relates to a display interface panel and a method of manufacturing the same, and more particularly, to a display interface panel in which a cover glass and a transparent insulating substrate are integrated, and a manufacturing method thereof.

The interface panel for display has a device attached to the front of the display to receive a user's touch input. The touch of the interface panel for display is rapidly changing from the static pressure resistance film type to the electrostatic capacity type. This electrostatic capacity type is classified into a film type and a glass type. Conventional film types and glass types are based on ITO.

The existing process consists of ITO film and OCA as main materials of interface panel for display. ITO is composed of indium oxide (In 2 O 3 ) and tin oxide (SnO 2 ). Indium is a group 13 of the periodic table, with an atomic number of 49, an atomic mass of 114.82, and a presence in the crust of 0.1 ppm. In the case of an ITO film or glass, it has an amorphous structure in the case of a laminated ITO layer. In order to crystallize the amorphous material, a heat treatment process is also required at a temperature of 135 to 155 캜 for 2 hours or less in order to have a low resistance value.

Conventional display interface panels are composed of two or more layers of ITO film and OCA, and thus have many problems in the productivity of products such as heat treatment equipment and heat treatment time due to the heat treatment process of ITO. In addition, many additional costs such as etching equipment, etching time, and drying have been accompanied by patterning for ITO.

In particular, in the case of the conventional interface panel for a capacitive display, many problems such as an etching problem of an ITO layer and an etching condition generated therefrom, appearance quality problems such as cleaning and drying occur. In addition, there is a problem that defects are generated due to appearance quality problems due to the problem that bubbles generated in the bonding process of attaching the lens and ITO remain.

On the other hand, as a recent technological trend, a method using silver nanowires, a method using carbon nanotubes, a conductive polymer, etc. are used instead of the transparent conductive film.

However, in the method of implementing the fine pattern developed so far, there is a limit to early application because the transparent conductive film as the raw material is expensive, the implementation method is complicated, and the feasibility of mass production is insufficient. In addition, these techniques have to be re-etched after coating, which causes problems such as an increase in manufacturing cost, complicated processes, and manufacturing process conditions related to visibility.

SUMMARY OF THE INVENTION It is an object of the present invention to provide an interface panel for a display in which a cover glass and a transparent insulating substrate are integrated, and a method of manufacturing the same.

Another object of the present invention is to provide a display interface panel and a method of manufacturing the same that can improve the transmittance and visibility, simplify the manufacturing process, and reduce the manufacturing cost.

It is another object of the present invention to reduce the line width and the line distance of the metal wiring formed in the bezel portion of the display interface panel so as to substantially extend the effective display region of the display interface panel, And can contribute to enhancement of product competitiveness.

It is still another object of the present invention to provide a display interface panel that can reduce manufacturing cost and realize equivalent or better optical characteristics because expensive ITO is not used.

Another object of the present invention is to provide a method of manufacturing an interface panel for a display, which can simplify a manufacturing process by omitting the conventional pattern formation process such as lithography.

To this end, the present invention relates to a cover glass; A first transparent insulating substrate laminated on the cover glass; A second transparent insulating substrate laminated on the first transparent insulating substrate; A first electrode layer formed on the first transparent insulating substrate along a first direction; And a second electrode layer formed on the second transparent insulating substrate along a second direction, wherein the first transparent insulating substrate and the second transparent insulating substrate include a curable resin.

Here, the third transparent insulating substrate may be further laminated on the second transparent insulating substrate.

Wherein the first electrode layer is formed on the interface between the first transparent insulating base material and the second transparent insulating base material at a positive or negative angle in the direction of the first transparent insulating base material and the second electrode layer is formed between the second transparent insulating base material and the second transparent insulating base material, 3 transparent insulating substrate in the direction of the second transparent insulating substrate.

The first to third transparent insulating base materials may be made of an ultraviolet curable resin or a thermosetting resin.

The first to third transparent insulating substrates may include any one selected from the group consisting of olefinic, epoxy, acrylic, urethane, and silicone resins.

Each of the first electrode layer and the second electrode layer may be formed in a stripe pattern.

The cross section of the stripe pattern may be formed in any shape of triangle, quadrangle, semicircle and trapezoid.

The width of the stripe pattern may be less than 10 탆.

Either one of the stripe patterns of the first electrode layer and the stripe pattern of the second electrode layer may be electrically connected.

The first electrode layer and the second electrode layer may include conductive particles and a binder for fixing the conductive particles.

The conductive particles may be formed of any one or a combination of two or more selected from the group consisting of nickel, palladium, silver, copper, gold, tin, platinum, aluminum, indium oxide, carbon nanotube, graphene, conductive polymer and cobalt .

It is preferable that the binder has a small difference in refractive index from the first to third transparent insulating base materials. For example, a material having a refractive index difference of 0.5 or less, preferably 0.05 or less, more preferably 0.005 or less.

A bezel portion for partitioning the effective display region may be formed at the edge of the cover glass.

On the other hand, the present invention provides: (a) preparing a cover glass; (b) stacking a first transparent insulating substrate on the cover glass, the first transparent insulating substrate having a plurality of first trenches spaced apart from each other along a first direction; (c) filling the plurality of first trenches with a conductive material to form a first electrode layer on the first transparent insulating substrate; (d) depositing a second transparent insulating base material on the first transparent insulating base material, the second transparent insulating base material having a plurality of second trenches spaced apart from each other along a second direction; And (e) filling the plurality of second trenches with the conductive material to form a second electrode layer on the second transparent insulating substrate.

Here, after step (e), the method may further include the step of (f) depositing a third transparent insulating substrate on the second transparent insulating substrate.

The first to third transparent insulating substrates may be made of a curable resin.

The step (b) includes the steps of covering an upper portion of a mold having a concavo-convex pattern on a bottom surface thereof with the cover glass, filling the resin with the curable resin, curing the resin, And a step of releasing the transparent insulating base material and the resin material cured and attached to the first transparent insulating base material from the mold.

Wherein each of the steps (c) and (e) includes the steps of: preparing a conductive paste containing conductive particles and a binder as an electrically conductive material; forming the conductive material in the plurality of first trenches or the plurality of second trenches, A filling process, and a process of curing the conductive material.

The step (d) includes the steps of covering an upper portion of a mold having a concavo-convex pattern on a bottom surface thereof with the first transparent insulating base material attached to the cover glass, and then filling the resin made of the curable resin, And a step of releasing the cover glass, the first transparent insulating substrate, and the resin material cured and adhered to the first transparent insulating substrate from the mold.

The first electrode layer may be formed at an interface between the first transparent insulating base material and the second transparent insulating base material, and the second electrode layer may be formed at an interface between the second transparent insulating base material and the third transparent insulating base material.

The concavo-convex pattern may be formed through lithography or metal working.

According to the present invention, by covering the cover glass with the transparent insulating substrate to integrate them and patterning the electrodes directly on the transparent insulating substrate, it is possible to prevent the occurrence of air bubbles or the like that may occur in the adhesive layer during bonding of the conventional cover glass, It is possible to reduce defects and simplify the process, and to reduce the manufacturing cost. Further, according to the present invention, it is possible to reduce the line width and the line-to-line distance of the metal wiring formed in the bezel portion of the display interface panel, thereby substantially expanding the effective display region of the display interface panel, Function, which contributes to enhancing product competitiveness. According to the present invention, since the expensive ITO is not used, the manufacturing cost can be reduced, and the optical characteristics equivalent to or higher than that of the prior art can be realized. By omitting the conventional pattern formation process such as lithography , The manufacturing process can be simplified.

1 is a cross-sectional view illustrating a display interface panel according to an embodiment of the present invention;
BACKGROUND OF THE INVENTION 1. Field of the Invention [0001]
FIGS. 3 to 10 are process diagrams illustrating a method of manufacturing a display interface panel according to an embodiment of the present invention in the order of processes.

Hereinafter, a display interface panel and a method of manufacturing the same according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

Referring to FIG. 1, a display interface panel 100 according to an exemplary embodiment of the present invention may be, for example, a touch screen panel attached to a front surface of a display and receiving a user's touch input. Such a display interface panel 100 includes a cover glass 110, a first transparent insulating substrate 120, a second transparent insulating substrate 130, a first electrode layer 150 and a second electrode layer 160.

The cover glass 110 is disposed on the front surface of the display interface panel 100 to protect the display interface panel 100 and transmit the light. The cover glass 110 preferably has high transparency and heat resistance. As for the transparency of the cover glass 110, it is preferable that the visible light transmittance is 80% or more, and the glass transition temperature is preferably 50 ° C or more with respect to heat resistance. The first transparent insulating base material 120 is bonded to the lower surface (reference drawing) of the cover glass 110, and the bonding method will be described in detail in the following manufacturing method of a display interface panel. A bezel 111 for defining an effective display area of the display interface panel 100 may be formed by black coating on the cover glass 110 at the edge of the cover glass 110.

The first transparent insulating substrate 120 is directly bonded to the lower surface of the cover glass 110 and integrated with the cover glass 110. A first electrode layer 150 is formed on the first transparent insulating substrate 120. The second transparent insulating base material 130 is laminated or integrally bonded to the lower surface of the first transparent insulating base material 120.

In an embodiment of the present invention, the first transparent insulating substrate 120 includes a curable resin. For example, the first transparent insulating substrate 120 may include an ultraviolet curable resin or a thermosetting resin. Specifically, the first transparent insulating substrate 120 may include any one selected from the group consisting of olefinic, epoxy, acrylic, urethane, and silicone resins. The first transparent insulating base material 120 is formed by filling the mold with a resin material, which will be described in detail in the following manufacturing method of the display interface panel.

The second transparent insulating base material 130 is successively laminated on the lower surface of the first transparent insulating base material 120 in such a manner as to fill and cure the resin in the mold with the first transparent insulating base material 120 as the cover. A second electrode layer 160 is formed on the second transparent insulating substrate 130. This second transparent insulating base material 130, like the first transparent insulating base material 120, includes a curable resin. For example, the second transparent insulating substrate 130 may include an ultraviolet curable resin or a thermosetting resin. Specifically, the second transparent insulating base material 130 may include any one selected from the group consisting of an olefin-based, epoxy-based, acrylic-based, urethane-based and silicone-based resin.

A third transparent insulating substrate 140 is laminated or bonded to the lower surface of the second transparent insulating substrate 130 to form a first transparent insulating substrate 120, a first electrode layer 150, a second transparent insulating substrate 130 And the second electrode layer 160, as shown in FIG.

The first electrode layer 150 may be formed on a lower surface (reference plane) of the first transparent insulating substrate 120 along a first direction, e.g., a transverse direction. At this time, the first electrode layer 150 may be formed on the lower surface of the first transparent insulating substrate 120 in a negative or angled form. Here, in the case where the first electrode layer 150 is formed in a relief shape, since a complicated process such as an etching process or a photolithography process is performed, the first electrode layer 150 can be easily formed by a simpler imprinting process. It is more preferable that the protrusions 150 are formed in a negative shape. Accordingly, in the embodiment of the present invention, the first electrode layer 150 is embossed in the inward direction of the first transparent insulating substrate 120 at the interface between the first transparent insulating substrate 120 and the second transparent insulating substrate 130, Or engraved.

Although not shown, the planar structure of the first electrode layer 150 formed on the lower surface of the first transparent insulating substrate 120 may form a stripe pattern. At this time, the cross-section of the stripe pattern may be formed in any shape of triangle, quadrangle, semicircle and trapezoid, or may be formed in various shapes.

Here, it is preferable that the width of the unit pattern in the stripe pattern constituting the first electrode layer 150 is approximately 5 mu m or less. If the width of the pattern is more than 5 占 퐉, the width of the pattern formed in the effective display area of the display interface panel 100 may be exposed to the outside, resulting in a decrease in visibility, The quality of the display interface panel 100 may be lowered as a whole. Preferably, the width of the unit pattern is 0.01 to 10 mu m.

Meanwhile, the first electrode layer 150 may include conductive particles and a binder for fixing the conductive particles. Here, the conductive particles may be conductive metals, alloys of the metals, conductive polymers, carbon particles, and the like, but are not limited thereto. In an embodiment, the conductive particles are selected from the group consisting of nickel, palladium, silver, copper, gold, tin, platinum, aluminum, indium oxide, carbon nanotubes, graphene, conductive polymers and cobalt Lt; / RTI >

It is preferable to use a material having an index matching with the first transparent insulating base material 120 in order to secure the same or higher transmittance as compared with a display interface panel using ITO as a transparent electrode in the prior art A material having a refractive index difference of about 0.5 or less, preferably 0.05 or less, more preferably 0.005 or less with the first transparent insulating base material 120 is used as a lane. The method of forming the first electrode layer 150 formed by using the conductive particles and the polymer will be described in detail below with reference to the method of manufacturing the display interface panel described below.

The second electrode layer 160 serves to generate an electrical signal for external contact with the first electrode layer 150 when the display interface panel 100 according to an embodiment of the present invention is applied as a touch panel do. At this time, one of the first electrode layer 150 and the second electrode layer 160 senses the X-axis input coordinate and the other Y-axis input coordinate.

The second electrode layer 160 may be formed on the lower surface of the second transparent insulating substrate 130 in the second direction, e.g., the longitudinal direction. Accordingly, the second electrode layer 160 and the first electrode layer 150 may be formed to be perpendicular to each other on a plane. However, the first electrode layer 150 and the second electrode layer 160 may be formed at various angles according to the design purpose. In the embodiment of the present invention, the first electrode layer 150 and the second electrode layer 160 The arrangement form is not particularly limited. The first electrode layer 150 and the second electrode layer 160 arranged in this manner are disposed in a state insulated from each other by the second transparent insulating base material 130.

Like the first electrode layer 150, the second electrode layer 160 may be formed in a negative or positive shape. In order to simplify the manufacturing process, reduce the manufacturing cost, and make the display device compact and slim, Do. Accordingly, in the embodiment of the present invention, the second electrode layer 160 is formed on the interface between the second transparent insulating base material 130 and the third transparent insulating base material 140 in the inward direction of the second transparent insulating base material 130, .

Like the first electrode layer 150, the second electrode layer 160 may be formed in a stripe pattern, and its cross section may be selected from a variety of shapes including triangular, rectangular, semicircular, and trapezoidal shapes. At this time, the cross-sectional shapes of the unit patterns in the stripe pattern of the second electrode layer 160 are not necessarily the same, and may be formed differently from the pattern form of the first electrode layer 150. However, the width of the unit pattern in the stripe pattern constituting the second electrode layer 160 is preferably about 10 탆 or less, for example, 0.01 to 9.5 탆, for the reasons described above.

Meanwhile, the second electrode layer 160 may be formed of the same material as the first electrode layer 150. That is, the second electrode layer 160 may include conductive particles and a binder for fixing the conductive particles. The conductive particles may be selected from the group consisting of conductive metals, alloys of the metals, conductive polymers, and carbon particles. Examples of the conductive particles include nickel, palladium, silver, copper, gold, tin, platinum, aluminum, indium oxide, , A graphene, a conductive polymer, and cobalt, or a combination of two or more thereof. Likewise, it is preferable to use a material having a refractive index difference of about 0.5, preferably 0.05, more preferably 0.005 or less, with the second transparent insulating substrate 130.

Although not shown, the first electrode layer 150 and the second electrode layer 160 are insulated by the second transparent insulation substrate 130, and any one of the stripe patterns of the first electrode layer 150, for example, The outline pattern and the outermost pattern of the second electrode layer 160 can be electrically connected to each other. As described above, the patterns electrically connected to each other are patterns of a portion covered by the bezel 111 when the display interface panel 100 according to the embodiment of the present invention is used as a touch panel, Is used as a metal wiring of the panel 100 and is connected to a circuit part such as an FPCB and serves to transmit an electrical signal generated by external contact to a circuit part.

Hereinafter, a method of manufacturing a display interface panel according to an embodiment of the present invention will be described.

Referring to FIG. 2, a method of manufacturing an interface panel for a display according to an embodiment of the present invention includes a cover glass preparing step S1, a first transparent insulating substrate stacking step S2, a first electrode layer forming step S3, A second transparent insulating base material stacking step (S4), and a second electrode layer forming step (S5).

First, the cover glass preparation step S1 is a step of preparing a cover glass 110 disposed on the front surface of the display interface panel 100 to protect the display interface panel 100 and transmit light. Here, in this step S1, it is preferable to prepare the cover glass 110 having high transparency and heat resistance. It is preferable to prepare a cover glass 110 having a visible light transmittance of 80% or more and a glass transition temperature of 50 ° C or more.

3 and 4, the first transparent insulating substrate stacking step S2 includes a first transparent insulating substrate 120 having a plurality of first trenches 121 spaced apart from each other along the first direction, And then laminated on the lower surface of the cover glass 110. In this step S2, the upper portion of the mold 50 having the concavo-convex pattern 51 formed on the bottom surface thereof is covered with the cover glass 110, and then the resin 125 made of the curable resin is filled. At this time, the concavo-convex pattern 51 of the mold 50 can be formed in various forms through a known lithography method or metal working. The resin material 101 to be used may include an ultraviolet curable resin or a thermosetting resin. Specifically, the resin material 101 may include any one selected from the group consisting of olefin-based, epoxy-based, acrylic-based, urethane-based and silicone-based resins. At this time, when a thermosetting resin is used, a long curing time is required, and therefore, it is preferable to use an ultraviolet-setting resin as the resin 101. [ 4, when the resin material 125 bonded to the cover glass 110 is detached from the mold 50 as the resin material 125 is cured and then hardened, The first trench 121 is formed on the lower surface of the first transparent insulating base material 120 by the uneven pattern 51. The first trench 121 provides a filling space for the conductive material forming the first electrode layer 150. The first trenches 121 serve to control the shape of the first electrode layer 150. Since the first electrode layer 150 according to the embodiment of the present invention is formed in a stripe pattern, the first trenches 121 must be formed in a stripe pattern, And is determined by the pattern 51. At this time, the line width or line distance of the concavo-convex pattern 51 forming the metal wiring disposed on the bezel 111 can be easily adjusted.

5, the first electrode layer forming step S3 includes filling a plurality of first trenches 121 with a conductive material to form a first electrode layer 150 on the lower surface of the first transparent insulating substrate 120, . In this step S3, first, a conductive paste containing conductive particles and a binder is prepared as a conductive material. Here, as the conductive particles, any one or two or more selected from the group consisting of nickel, palladium, silver, copper, gold, tin, platinum, aluminum, indium oxide, carbon nanotubes, graphene, conductive polymer and cobalt And a material having a refractive index difference of about 0.5 or less, preferably 0.05 or less, more preferably 0.005 or less, with respect to the first transparent insulating base material 120 is preferably used as the binder. Then, as shown in the figure, the conductive material prepared in the plurality of first trenches 121 is filled. For example, a doctor blade may be used to apply a conductive material to the lower surface of the first transparent insulating substrate 120 on which the first trench 121 is formed, and then to coat the first transparent insulating insulating substrate 120 other than the first trench 121 The conductive material applied on the bottom surface may be scraped off or removed by other means so that the conductive material may be filled only in the first trench 121. In this way, the surface of the conductive material filled in the first trenches 121 can be flattened simultaneously. As another example, conductive material may be filled in only the first trench 121 from the beginning by using an injection means such as a nozzle. Then, when the conductive material is cured by heating with a heating device such as a hot plate or an oven, the first electrode layer 150 having a stripe pattern is formed on the lower surface of the first transparent insulating substrate 120.

6 and 7, the second transparent insulating base material stacking step S4 includes a second transparent insulating base material 130 having a plurality of second trenches 131 spaced apart from each other along the second direction, Is laminated on the lower surface of the first transparent insulating base material 120. In this step S4, the upper part of the mold 50 in which the concavo-convex pattern 51 is formed on the bottom surface is covered with a laminate in which the cover glass 110 and the first transparent insulating base material 120 are integrally laminated The resin 125 made of a curable resin is filled. At this time, the resin material 125 is the same as the resin material 125 used for forming the first transparent insulating base material 120. The concavo-convex pattern 51 of the mold 50 can be formed in various forms through a known lithography method or metal working. The mold 50 used in this step S4 is formed by a first transparent insulating- The mold 50 and the concavo-convex pattern 51 used in the step S2 may have different shapes. 7, when the resin material 125 bonded to the laminate is released from the mold 50 as the resin material 125 is cured after the resin material 125 is cured, The second trench 131 is formed on the lower surface of the second transparent insulating base material 131 by the pattern 51.

8, forming the second electrode layer 160 may include filling a plurality of second trenches 131 with a conductive material to form a second electrode layer 160 (see FIG. 8) on the second transparent insulating substrate 130, ). This step S5 proceeds to the same step as the first electrode layer forming step S3. That is, in this step S5, first, a conductive paste containing conductive particles and a binder is prepared as a conductive material. Here, as the conductive particles, any one or two or more selected from the group consisting of nickel, palladium, silver, copper, gold, tin, platinum, aluminum, indium oxide, carbon nanotubes, graphene, conductive polymer and cobalt And a material having a refractive index difference of about 0.5 or less, preferably 0.05 or less, more preferably 0.005 or less, with respect to the second transparent insulating base material 130 is preferably used as the binder. Then, as shown in the figure, the conductive material prepared in the plurality of second trenches 131 is filled. Next, when the conductive material is cured by heating with a heating device such as a hot plate or an oven, a stripe pattern of a stripe pattern orthogonal to or crossing the stripe pattern of the first electrode layer 150 is formed on the lower surface of the second transparent insulation substrate 130 A two-electrode layer 160 is formed.

9 and 10, the third transparent insulating base material lamination step S6 is a step of laminating the third transparent insulating base material 140 on the lower surface of the second transparent insulating base material 130. As shown in FIG. In this step S6, the upper part of the mold 50 having a flat bottom surface is covered with the integrated laminate of the cover glass 110, the first transparent insulating base material 120 and the second transparent insulating base material 130, The resin material 125 is filled and cured. At this time, the resin material 125 is the same as the resin used for forming the first transparent insulating base material 120 and the second transparent insulating base material 130. Next, when the resin material 125 attached to the laminate is released from the mold 50, a third transparent insulating substrate 140 serving as an overcoat layer is formed on the lower surface of the second transparent insulating substrate 130 Respectively.

Through the above process, the first electrode layer 150 is formed on the interface between the first transparent insulating substrate 120 and the second transparent insulating substrate 130, and the second electrode layer 160 is formed on the interface between the second transparent insulating substrate 130 ) And the third transparent insulating base material 140 are formed.

When the third transparent insulating substrate 140 is completely laminated on the lower surface of the second transparent insulating substrate 130 through the third transparent insulating substrate stacking step S6, (100) is completed.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.

Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims as well as the appended claims.

100: Interface panel for display 110: Cover glass
111: Bezel part 120: First transparent insulating substrate
121: first trench 125: resin
130: second transparent insulating substrate 131: second trench
140: Third transparent insulating substrate 150: First electrode layer
160: second electrode layer 50: mold
51: Uneven pattern

Claims (21)

Cover glass;
A first transparent insulating substrate laminated on the cover glass;
A second transparent insulating substrate laminated on the first transparent insulating substrate;
A first electrode layer formed on the first transparent insulating substrate along a first direction; And
A second electrode layer formed on the second transparent insulating base material in a second direction;
/ RTI >
Wherein the first transparent insulating base material and the second transparent insulating base material comprise a curable resin,
Wherein the first electrode layer and the second electrode layer include conductive particles and a binder for fixing the conductive particles,
Wherein the conductive particles are composed of any one or a combination of two or more selected from the group consisting of nickel, palladium, silver, copper, gold, tin, platinum, aluminum, carbon nanotubes, graphene, conductive polymer, and cobalt,
Wherein the binder is a polymer having a refractive index difference of 0.5 or less with respect to the first and second transparent insulating base materials.
The method according to claim 1,
And a third transparent insulating substrate laminated on the second transparent insulating substrate.
3. The method of claim 2,
Wherein the first electrode layer is formed at a boundary of the first transparent insulating base material and the second transparent insulating base material in a positive or negative angle in the direction of the first transparent insulating base material,
Wherein the second electrode layer is formed at a boundary of the second transparent insulating base material and the third transparent insulating base material in a positive or negative angle in the direction of the second transparent insulating base material.
The method of claim 3,
Wherein the first to third transparent insulating substrates are made of an ultraviolet curable resin or a thermosetting resin.
5. The method of claim 4,
Wherein the first to third transparent insulating substrates include any one selected from the group consisting of olefinic, epoxy, acrylic, urethane, and silicone resins.
The method according to claim 1,
Wherein the first electrode layer and the second electrode layer are formed in a stripe pattern, respectively.
The method according to claim 6,
Wherein the cross-section of the stripe pattern is formed in a shape of a triangle, a rectangle, a semicircle, or a trapezoid.
8. The method of claim 7,
Wherein the stripe pattern has a width of 10 mu m or less.
9. The method of claim 8,
Wherein any one of the stripe patterns of the first electrode layer and the second electrode layer is electrically connected.
delete delete 3. The method of claim 2,
Wherein the binder has a refractive index difference of 0.5 or less with respect to the third transparent insulating base material.
The method according to claim 1,
And a bezel portion for defining an effective display region is formed at a rim of the cover glass.
(a) preparing a cover glass;
(b) stacking a first transparent insulating substrate on the cover glass, the first transparent insulating substrate having a plurality of first trenches spaced apart from each other along a first direction;
(c) filling the plurality of first trenches with a conductive material to form a first electrode layer on the first transparent insulating substrate;
(d) depositing a second transparent insulating base material on the first transparent insulating base material, the second transparent insulating base material having a plurality of second trenches spaced apart from each other along a second direction; And
(e) filling the plurality of second trenches with the conductive material to form a second electrode layer on the second transparent insulating substrate;
Lt; / RTI >
Wherein the first electrode layer and the second electrode layer include conductive particles and a binder for fixing the conductive particles,
Wherein the conductive particles are composed of any one or a combination of two or more selected from the group consisting of nickel, palladium, silver, copper, gold, tin, platinum, aluminum, carbon nanotubes, graphene, conductive polymer, and cobalt,
Wherein the binder is a polymer having a refractive index difference of 0.5 or less with respect to the first to second transparent insulating base materials.
15. The method of claim 14,
Further comprising the step of: (f) after step (e), laminating a third transparent insulating base material on the second transparent insulating base material.
16. The method of claim 15,
Wherein the first to third transparent insulating substrates are made of a curable resin.
17. The method according to claim 15 or 16,
The step (b)
Covering the top of the mold having the concavo-convex pattern on the bottom surface with the cover glass, filling the resin with the curable resin,
A step of curing the resin material, and
Separating the first transparent insulating base material and the resin material cured and attached to the first transparent insulating base material from the mold,
And a step of forming the display panel.
18. The method of claim 17,
The step (c) and the step (e)
Preparing a conductive paste containing conductive particles and a binder as a conductive material,
Filling the plurality of first trenches or the plurality of second trenches with the conductive material; and
A step of curing the conductive material,
And a step of forming the display panel.
18. The method of claim 17,
The step (d)
Covering an upper portion of a mold having a concave-convex pattern formed on a bottom surface thereof with the first transparent insulating base material attached to the cover glass, and filling the resin made of the curable resin;
A step of curing the resin material, and
Removing the cover glass, the first transparent insulating base material, and the resin material cured and attached to the first transparent insulating base material from the mold,
And a step of forming the display panel.
16. The method of claim 15,
Wherein the first electrode layer is formed on the interface between the first transparent insulating base material and the second transparent insulating base material and the second electrode layer is formed on the interface between the second transparent insulating base material and the third transparent insulating base material A method of manufacturing a panel.
18. The method of claim 17,
Wherein the concave-convex pattern is formed through lithography or metal working.





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Citations (2)

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KR20120018059A (en) * 2010-08-20 2012-02-29 미래나노텍(주) Substrate for touch screen panel, touch screen panel and fabrication method thereof

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JP2010182137A (en) * 2009-02-06 2010-08-19 Sony Corp Touch panel and method for manufacturing the same
KR100959907B1 (en) * 2009-10-30 2010-05-26 주식회사 엔엔피 Surface with micro pattern for dimensional structure for method of manufacture
KR101728818B1 (en) * 2010-08-09 2017-04-21 미래나노텍(주) Electrostatic capacity type touch panel and manufacturing method thereof

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KR20120018059A (en) * 2010-08-20 2012-02-29 미래나노텍(주) Substrate for touch screen panel, touch screen panel and fabrication method thereof

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