KR101390617B1 - 방사선 경화성 아미노(메트)아크릴레이트 - Google Patents

방사선 경화성 아미노(메트)아크릴레이트 Download PDF

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Publication number
KR101390617B1
KR101390617B1 KR1020087029114A KR20087029114A KR101390617B1 KR 101390617 B1 KR101390617 B1 KR 101390617B1 KR 1020087029114 A KR1020087029114 A KR 1020087029114A KR 20087029114 A KR20087029114 A KR 20087029114A KR 101390617 B1 KR101390617 B1 KR 101390617B1
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South Korea
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meth
acrylate
amino
amine
epoxy
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Korean (ko)
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KR20090023586A (ko
Inventor
프랑시스 베르지에
띠에리 랑두
Original Assignee
올넥스 벨지움 에스.에이.
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/02Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C229/30Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and unsaturated
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
KR1020087029114A 2006-06-29 2007-06-22 방사선 경화성 아미노(메트)아크릴레이트 Active KR101390617B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP20060013453 EP1876166A1 (en) 2006-06-29 2006-06-29 Radiation curable amino(meth)acrylates
EP06013453.3 2006-06-29
PCT/EP2007/056238 WO2008000696A1 (en) 2006-06-29 2007-06-22 Radiation curable amino(meth)acrylates

Publications (2)

Publication Number Publication Date
KR20090023586A KR20090023586A (ko) 2009-03-05
KR101390617B1 true KR101390617B1 (ko) 2014-05-13

Family

ID=37559336

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087029114A Active KR101390617B1 (ko) 2006-06-29 2007-06-22 방사선 경화성 아미노(메트)아크릴레이트

Country Status (6)

Country Link
US (1) US9067866B2 (https=)
EP (2) EP1876166A1 (https=)
JP (1) JP5242562B2 (https=)
KR (1) KR101390617B1 (https=)
CN (1) CN101479233B (https=)
WO (1) WO2008000696A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2143748A1 (en) 2008-07-10 2010-01-13 Cytec Surface Specialties, S.A. Aqueous radiation curable polyurethane compositions
US8618231B2 (en) * 2008-10-21 2013-12-31 Sun Chemical B.V. Acrylated epoxy-amine oligomers
GB201005060D0 (en) * 2010-03-25 2010-05-12 Davidson Robert S Synergists
EP2383254A1 (en) * 2010-04-19 2011-11-02 Cytec Surface Specialties, S.A. Radiation curable amino(meth)acrylates
JP2014518560A (ja) 2011-04-05 2014-07-31 オルネクス ベルギウム ソシエテ アノニム 輻射線硬化性組成物
EP2508574A1 (en) 2011-04-05 2012-10-10 Cytec Surface Specialties, S.A. Radiation curable compositions
EP2508575A1 (en) 2011-04-05 2012-10-10 Cytec Surface Specialties, S.A. Radiation curable compositions
CN103958460B (zh) * 2011-10-05 2016-04-06 阿克马法国公司 多羟基取代的氨基化合物、包含其的聚合物及其用途
EP2644634A1 (en) 2012-03-30 2013-10-02 Cytec Surface Specialties, S.A. Radiation curable (meth)acrylated compounds
EP2921536A1 (en) 2014-03-20 2015-09-23 ALLNEX AUSTRIA GmbH Radiation curable composition comprising inert resins
FR3022544B1 (fr) 2014-06-23 2018-01-05 Arkema France Oligomeres acryles multifonctionnels de structure ramifiee, par polyaddition entre amines et acrylates multifonctionnels.
EP3248066B1 (en) 2015-01-19 2022-04-20 HP Indigo B.V. Liquid electrophotographic varnish composition
US10626329B2 (en) * 2015-04-21 2020-04-21 United States Of America As Represented By The Secretary Of The Air Force Methods of making voxelated liquid crystal elastomers
EP3292174B1 (en) * 2015-05-07 2022-09-21 Sun Chemical Corporation Energy curable inkjet inks for the production of layered composites
WO2016186838A1 (en) 2015-05-15 2016-11-24 Sun Chemical Corporation Energy curable inkjet inks and coating compositions
US10633553B2 (en) 2015-10-16 2020-04-28 Basf Se Energy curable high reactivity multi vinylether or acrylate functional resins
EP3430093B1 (en) * 2016-03-18 2021-09-29 Sun Chemical Corporation Energy curable compositions comprising polymeric aminoacrylates
CN111278904A (zh) 2017-10-30 2020-06-12 米其林集团总公司 包含特定胺以及基于过氧化物和丙烯酸酯衍生物的交联体系的橡胶组合物
WO2019106292A1 (fr) 2017-11-29 2019-06-06 Compagnie Generale Des Etablissements Michelin Composition de caoutchouterie dont le systeme de reticulation comprend un coupage de peroxydes et un derive d'acrylate
FR3085165B1 (fr) 2018-08-23 2020-07-17 Compagnie Generale Des Etablissements Michelin Pneumatique muni d'une composition comprenant un elastomere riche en ethylene, un peroxyde et un derive d'acrylate specifique
FR3085166B1 (fr) 2018-08-23 2020-07-17 Compagnie Generale Des Etablissements Michelin Pneumatique muni d'une composition comprenant un elastomere riche en ethylene, un peroxyde et un derive d'acrylate specifique
FR3085167B1 (fr) 2018-08-23 2020-07-31 Michelin & Cie Pneumatique muni d'une composition comprenant un elastomere riche en ethylene, un peroxyde et un derive d'acrylate specifique
FR3095447B1 (fr) 2019-04-26 2021-12-24 Michelin & Cie Bandage pour roue de véhicule transportable manuellement
EP3929256B1 (en) * 2020-06-22 2024-01-24 Allnex Belgium, S.A. Polymeric amino (meth)acrylate
CN116376352B (zh) * 2023-04-28 2023-10-24 常州市正文印刷有限公司 一种uv油墨及其印刷工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6172129B1 (en) * 1999-01-29 2001-01-09 Sartomer Technologies, Inc. Cyclic amine acrylate monomers and polymers
US6706821B1 (en) * 2000-07-18 2004-03-16 Fmc Corporation Michael addition products of amine terminated polyolefins and polyfunctional acrylates

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US3844916A (en) * 1972-09-18 1974-10-29 Desoto Inc Radiation curable non-gelled michael addition reaction products
DE4415624A1 (de) * 1994-05-04 1995-11-09 Basf Ag Verfahren zur Herstellung von strahlungshärtbaren Acrylaten
JPH09143431A (ja) * 1995-11-22 1997-06-03 Nippon Zeon Co Ltd 紫外線硬化性組成物、それを用いた接着方法、および接着物
US6300388B1 (en) * 1998-10-29 2001-10-09 Agfa-Gevaert Ink compositions for ink jet printing
DE19933741A1 (de) * 1999-07-19 2001-01-25 Basf Ag Verfahren zur Haftungsverbesserung von Acrylatharzen
US6372074B1 (en) * 2000-06-14 2002-04-16 Avery Dennison Corporation Method of forming a protective coating for color filters
AU2001267930A1 (en) * 2000-06-22 2002-01-02 Dsm N.V. Radiation curable colored coating composition
US20050245636A1 (en) * 2004-04-29 2005-11-03 Ashland Inc. Radiation-curable coatings for wood substrates from multifunctional acrylate oligomers
CA2565060A1 (en) * 2004-05-02 2005-11-17 Ashland Licensing And Intellectual Property Llc Radiation-curable coatings for metal substrates from multifunctional acrylate oligomers

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6172129B1 (en) * 1999-01-29 2001-01-09 Sartomer Technologies, Inc. Cyclic amine acrylate monomers and polymers
US6706821B1 (en) * 2000-07-18 2004-03-16 Fmc Corporation Michael addition products of amine terminated polyolefins and polyfunctional acrylates

Also Published As

Publication number Publication date
KR20090023586A (ko) 2009-03-05
JP2009541553A (ja) 2009-11-26
EP2044000B1 (en) 2018-08-08
CN101479233B (zh) 2013-11-13
JP5242562B2 (ja) 2013-07-24
US9067866B2 (en) 2015-06-30
CN101479233A (zh) 2009-07-08
US20090318611A1 (en) 2009-12-24
EP2044000A1 (en) 2009-04-08
WO2008000696A1 (en) 2008-01-03
EP1876166A1 (en) 2008-01-09

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