KR101376850B1 - Substrate processing apparatus and method of providing processing solution - Google Patents

Abstract

By providing a technique capable of suppressing fluctuations in the flow rate of the processing liquid discharged from the moving nozzle, the substrate processing apparatus 20 includes a substrate holding part 30 that holds the substrate 200 substantially horizontally, and a substrate. A main scan mechanism having a main scan mechanism guide portion 42 extending in a main scan direction substantially parallel to the 200 and a slider 44 movably supported in the main scan direction by the main scan mechanism guide portion 42 ( 40 and a discharge part 50 which is supported by the slider 44 so as to be movable along the main scanning direction and discharges the coating liquid onto the substrate 200, and is connected to the discharge part 50 and discharge part 50. The flexible coating liquid pipe 80b for guiding the coating liquid and the portion in the middle of the coating liquid pipe 80b is supported, and following the periodic movement of the slider 44 due to the repetition of the main injection is carried out in the direction thereof. This periodically changing movable pipe support ( 100).

Description

Substrate processing apparatus and processing liquid provision method {SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROVIDING PROCESSING SOLUTION}

Industrial Applicability The present invention relates to various materials such as semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for plasma display panels (PDPs), glass substrates for organic EL display panels, solar cell substrates, glass or ceramic substrates for magnetic or optical disks, and the like. The present invention relates to a technique for maintaining a constant flow rate of a processing liquid applied to a processing substrate.

The technique which apply | coats the pixel formation material like organic EL as a coating liquid, scanning the surface of the board | substrate with which the ejection nozzle formed the array of partitions on the surface is known. In this case, the flexible pipe is connected to the discharge nozzle for scanning movement, and the coating liquid flowing through the pipe is discharged from the discharge nozzle.

As such a technique, for example, Patent Document 1 includes a guide portion extending along the main scanning direction, a slider supported by the guide portion to be movable along the main scanning direction with an air layer interposed between the guide portion, Disclosed is a coating apparatus including a nozzle supported by a slider and discharging a coating liquid, and a pipe support member supporting a slider and a part of a pipe connected to the nozzle.

Further, Patent Document 2 has a slider which is engaged with the guide part and is movably supported in the main scanning direction, and has a nozzle supported by the slider, and the slider and a plurality of pipes for drawing fluid to the nozzle are provided with respect to the nozzle and the slider. Disclosed is a coating device having a configuration in which a shaft is sandwiched between two sides and fixed.

Japanese Patent Publication 2011-072974 Japanese Patent Publication No. 2011-072975

However, since these pipings disclosed in Patent Document 1 or Patent Document 2 have crosslinking properties, deformations such as twisting or the like are likely to occur in a part of the piping due to the movement or vibration of the slider. Depending on the shape of the pipe after deformation, since the coating liquid flows in the pipe in the reverse direction to the original flow direction during the scanning movement of the slider, the flow rate of the coating liquid discharged from the discharge nozzle may vary.

This invention is made | formed in view of the said subject, and an object of this invention is to provide the technique by which the fluctuation | variation of the flow volume of the processing liquid discharged from a moving nozzle is suppressed.

According to a first aspect of the present invention, there is provided a substrate processing apparatus comprising: a substrate holding portion for holding a substrate substantially horizontally, a guide portion extending in a main scanning direction substantially parallel to the substrate, and a guide portion along the main scanning direction; A main scanning mechanism having a movable part that is movably supported, a discharge part which is movably supported along the main scanning direction by the moving part, discharges a processing liquid onto the substrate, and is connected to the discharge part and is discharged The flexible pipe which guides a process liquid, and the movable pipe support part which support the part of the middle part of the said pipe | tube, and whose direction changes periodically according to the periodic movement of the said moving part by repetition of a main injection are provided.

2nd invention is a substrate processing apparatus which concerns on 1st invention, Comprising: The section between the support part by the said movable piping support part, and the connection part to the said discharge part is formed in arch shape in the perpendicular | vertical surface among the said piping, have.

3rd invention is a substrate processing apparatus which concerns on 2nd invention, Comprising: The said section of the said pipe | tube becomes an arch shape convex upward.

4th invention is a substrate processing apparatus which concerns on 1st invention, Comprising: The auxiliary scanning part which extends along the said guide part, and the auxiliary scanning part supported by the said auxiliary guide part so that a movement along the main scanning direction is possible is carried out. A mechanism is further provided, and a predetermined part between the support point by the movable pipe support part and the connection point to the discharge part is supported by the auxiliary moving part in the pipe.

5th invention is a substrate processing apparatus which concerns on 4th invention, The said movable piping support part is connected to the said auxiliary moving part, It is characterized by the above-mentioned.

6th invention is a substrate processing apparatus which concerns on 4th invention, Comprising: The section between the support part by the said movable piping support part, and the connection part to the said auxiliary moving part is formed in arch shape in the perpendicular | vertical plane among the said piping. It is.

7th invention is a substrate processing apparatus which concerns on 4th invention, The said main scanning mechanism is arrange | positioned below the said auxiliary scanning mechanism, It is characterized by the above-mentioned.

8th invention is a substrate processing apparatus which concerns on any one of 1st invention-7th invention, Comprising: It further includes the drive part which adjusts the direction of the said movable piping support part.

According to a ninth aspect of the present invention, there is provided a process liquid applying method, which includes: a step of holding a substrate substantially horizontally; And a step of periodically changing the direction of the movable pipe support part supporting the middle portion of the flexible pipe leading the processing liquid to the discharge part, following the moving part scanning-moving.

In the first to ninth inventions, the movable pipe support portion supports a portion in the middle of the pipe, and changes its direction periodically following the periodic movement of the moving portion. For this reason, even if a moving part moves, since the direction of a movable pipe support part changes following it, the generation of the distortion in the part of the pipe supported by the movable pipe support part is suppressed. As a result, the fluctuation of the flow volume of the process liquid discharged | emitted from a discharge part is suppressed.

In particular, in the second invention, a section between the support point by the movable pipe support part and the connection point to the discharge part is formed in an arch shape in the vertical plane. Therefore, since the piping becomes long, the instability and the shaking of the piping are smoothed in the whole piping, and the influence can be made small. Thereby, the fluctuation of the flow volume of the process liquid discharged | emitted from a discharge part is suppressed.

In particular, in the third invention, the section of the pipe has an arch shape with convex upwards. For this reason, since the terminal of the pipe extended from the discharge part connected to the main scanning mechanism is erected upward, even if the moving part moves, the force hardly arises in the direction in which the processing liquid flows back inside the pipe. Thereby, the fluctuation of the flow volume of the process liquid discharged | emitted from a discharge part is suppressed.

In particular, in the fourth invention, the predetermined portion between the support point by the movable pipe support part and the connection point to the discharge part is supported by the auxiliary moving part. Therefore, even if the pipe shakes or becomes unstable, since it is hardly transmitted to the discharge part, the variation of the flow rate of the coating liquid discharged from the discharge part is suppressed.

In particular, in the fifth invention, the movable pipe support part is connected to the auxiliary moving part. Therefore, the drive of the auxiliary moving part can reliably change the direction of the movable pipe support part.

In particular, in the sixth invention, a section between the support point by the movable pipe support part and the connection point to the auxiliary moving part is formed in an arch shape in the vertical plane. Therefore, since the piping becomes long, the shaking and instability of the piping can be smoothed in the entire arch-shaped piping, and the influence can be reduced.

In particular, in the seventh invention, the main scanning mechanism is disposed below the auxiliary scanning mechanism. Therefore, the terminal of the pipe connected to the discharge portion can be easily maintained in an upright position. Therefore, even if the moving part moves, a force is hardly generated in the direction in which the processing liquid flows backward, and the variation in the flow rate of the processing liquid is suppressed.

In particular, in the eighth invention, the movable pipe support portion reliably follows the moving portion and the direction is adjusted by the drive portion that adjusts the direction of the movable pipe support portion.

1 is a schematic plan view of a substrate processing apparatus according to an embodiment.
2 is a schematic front view showing a substrate processing apparatus on the same phase.
3 is a schematic cross-sectional view taken along the line II in FIG. 2.
It is a schematic perspective view which shows the arrangement relationship of the main component of the substrate processing apparatus which concerns on embodiment.
5 is a flowchart showing the flow of processing.
It is a schematic perspective view which shows the arrangement relationship of the main component of the substrate processing apparatus in a modification.
It is a schematic perspective view which shows the arrangement relationship of the main component of the substrate processing apparatus in a modification.
It is a schematic perspective view which shows the arrangement relationship of the main component of the substrate processing apparatus in a modification.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described, referring an accompanying drawing. The following embodiment is an example which actualized this invention, and is not the case which limits the technical scope of this invention.

1 is a schematic plan view of the substrate processing apparatus 20 according to the present embodiment. 2 is a schematic front view of the substrate processing apparatus 20. FIG. 3 is a schematic cross-sectional view taken along a line II of the substrate processing apparatus 20 shown in FIG. 2. 4 is a schematic perspective view schematically illustrating the arrangement relationship of main parts of the substrate processing apparatus 20.

In addition, in the following description, when showing a direction and a direction, XYZ rectangular coordinates shown in drawing are used suitably. Here, the X-axis and Y-axis directions indicate the horizontal direction, and the Z-axis direction indicates the vertical direction (the + Z side is upper side and the -Z side is lower side). Moreover, for convenience, the Y-axis direction is made into the conveyance direction of a board | substrate (+ Y side is downstream, -Y side is upstream), and the X-axis direction is made into the main scanning direction (+ X side, -X side) of a moving part.

The substrate processing apparatus 20 is an apparatus which apply | coats a coating liquid to a board | substrate 200 as a processing liquid. As the board | substrate 200, a rectangular board | substrate, for example, the glass substrate for flat display devices, etc. are assumed. In addition, as a coating liquid, when forming material, such as a pattern which should be formed in the board | substrate 200, for example, manufacture of an organic electroluminescence display, the liquid containing the organic electroluminescent material, its solvent, etc. are mentioned. It is assumed.

The substrate processing apparatus 20 includes a substrate holding unit 30 holding a substrate 200, a main scanning mechanism 40, a discharge unit 50 for discharging a coating liquid, an auxiliary scanning mechanism 60, And a movable pipe support part 100 for supporting the coating liquid pipe 80b composed of a flexible resin tube or the like.

The board | substrate holding part 30 is comprised so that the board | substrate 200 can be hold | maintained in substantially horizontal attitude | position. Here, the board | substrate holding part 30 has the stage 32 which arrange | positioned the main surface in the substantially horizontal position upward at the predetermined height position. And the board | substrate 200 is comprised on the stage 32 so that the main surface of the board | substrate 200 may contact the upward main surface of the stage 32, and the board | substrate 200 is comprised so that it can hold | maintain in a fixed position and attitude | position. In addition, the board | substrate holding part may hold | maintain the said board | substrate by holding the periphery of a board | substrate.

Moreover, below the board | substrate holding part 30, the board | substrate movement mechanism 34 which moves the board | substrate 200 relative to the discharge part 50 along a Y direction (sub-scan direction) is provided. Here, the board | substrate movement mechanism 34 has the base 36 which supports the stage 32 above, and a pair of slide support parts 37. As shown in FIG. The slide support part 37 is provided in the lower end part of the large part 36, and is comprised so that a slide movement on the pair of sub scanning direction guide parts 39 extended along a Y direction is possible. Subsequently, the substrate moving mechanism 34 moves along the Y direction together with the stage 32 and the substrate 200 by receiving a driving force from a substrate moving driver (not shown) such as a linear motor. have. In addition, instead of moving the board | substrate 200 along a Y direction, the structure which moves the main scanning mechanism 40 and the discharge part 50 with respect to the board | substrate 200 along a Y direction may be sufficient. In addition, the stage 32 may be configured to be rotatable about the vertical axis with respect to the substrate movement mechanism 34.

The main scanning mechanism 40 has a main scanning mechanism guide portion 42 and a slider 44 that moves along the main scanning mechanism guide portion 42. The main scanning mechanism guide part 42 is formed in the elongate member extended in the main scanning direction (X direction) substantially parallel with respect to the board | substrate 200 in the upper position of the board | substrate 200. As shown in FIG. The slider 44 is a member having an internal space in which the main scan mechanism guide portion 42 can be inserted and disposed, and is supported by the main scan mechanism guide portion 42 so as to be movable along the X direction. In addition, in this embodiment, the slider 44 is corresponded to a moving part. The moving part is not limited to the slider, but may be a member movable along the main scanning mechanism guide part 42.

More specifically, the main scan mechanism guide portion 42 is formed of a substantially rectangular bar member. The outer shape of the slider 44 is formed in substantially rectangular parallelepiped shape, as shown in FIG. Moreover, inside the slider 44, the internal space 44S which can surround the outer peripheral surface of the main scanning mechanism guide part 42 at intervals is formed. A part of air supplied from the air supply source 86 mentioned later through the air piping 80a is discharged toward the inner peripheral surface of the slider 44. As shown in FIG. As a result, the slider 44 is in a state of being supported to be movable along the X direction in a state where an air layer is interposed between the outer peripheral surface of the main scanning mechanism guide portion 42. As a result, the slider 44 is supported by the aspect which can be moved at high speed and high acceleration, and is excellent in durability.

In addition, as shown in FIG. 3, in the upper surface of the main scanning mechanism guide part 42, the recessed groove 43 which opens upward and extends along an X direction is formed, and the upper width direction of the slider 44 here is formed. (Y direction) The slit 45a of the width | variety corresponding to the said recessed groove 43 is formed in the intermediate part. A belt attachment bracket 45 is attached to the slit 45a portion, and a drive belt 74 for driving the slider 44 is attached to the belt attachment bracket 45 in the recessed groove 43. Attached.

However, these configurations are not essential. For example, the main scanning mechanism guide part may have a simple rectangular bar shape or a round bar shape, and a configuration in which a larger inner space is formed in the slider than the simple rectangular bar shape or round bar shape. In addition, the main scanning mechanism guide portion may have a plurality of rod-shaped members. In addition, the slider does not need to be movably supported with the main scanning mechanism guide portion interposed therebetween. For example, the slider may be configured to be movable so as to be in contact with the long main scanning mechanism guide portion via another low friction member, a rolling element, or the like.

In addition, the counter guide part 46 and the counter slider 48 are provided above the main scanning mechanism guide part 42 here.

The counter guide portion 46 is formed of a long rod-shaped member extending along the X direction. The counter slider 48 is a member having an internal space in which the counter guide portion 46 can be inserted and disposed, and is supported by the counter guide portion 46 so as to be movable along the X direction.

Here, the counter guide parts 46 are formed in substantially round bar shape, and two are provided in the substantially parallel state above the said main scanning mechanism guide part 42. As shown in FIG. Moreover, inside the counter slider 48, the round hole-shaped inner space 48S which can surround the outer peripheral surface of each counter guide part 46 at intervals is formed. A part of air supplied from the air supply source 86 mentioned later through the air piping 80a is discharged toward the inner peripheral surface of the slider 48 for a counter. As a result, the counter slider 48 is in a state of being supported to be movable along the X direction while interposing the air layer between the outer circumferential surface of the counter guide portion 46.

Here, the configuration in which the counter slider is movably supported with respect to the counter guide portion can adopt various configurations, as described with respect to the main scanning mechanism 40. That is, the counter slider need not be supported to be movable in the state which interposed the air layer with respect to the counter guide part as mentioned above. For example, the counter slider may be configured to be movable so as to be in contact with the elongated counter guide portion via another low friction member, a rolling element, or the like.

The discharge unit 50 is supported by the slider 44 so as to be movable along the X direction and is configured to discharge the coating liquid onto the substrate 200. Here, the discharge part 50 has the nozzle support part 52 and the at least 1 nozzle 54. In the present embodiment, three nozzles 54 are provided for convenience of illustration.

The nozzle support part 52 has the base end part 52a attached to one side surface of the slider 44, and the nozzle mounting plate part 52b extended toward the outer side rather than the lower end part of the base end part 52a. And the some nozzle 54 is attached and fixed to the nozzle mounting plate part 52b, shifting a position to a X direction and a Y direction. Each nozzle 54 has a discharge port which can discharge a coating liquid, respectively, and is fixed to the nozzle mounting plate part 52b in the attitude | position which made the said discharge port downward of the nozzle mounting plate part 52b. Then, by discharging the coating liquid from each nozzle 54 while moving the slider 44 in the X direction, the coating liquid is applied to the substrate 200 placed on the stage 32.

Further, a nozzle counter 44C is provided on the side of the slider 44 opposite to the discharge part 50.

The auxiliary injection mechanism 60 is provided with the auxiliary injection mechanism guide part 62 and the auxiliary slider 65 which moves along the auxiliary injection mechanism guide part 62. As shown in FIG. The auxiliary slider 65 of the auxiliary scanning mechanism 60 is configured to be movable along the X direction following the slider 44. Here, this auxiliary scanning mechanism 60 is provided above the main scanning mechanism 40, and is provided in the conveyance direction downstream of the board | substrate 200 rather than the main scanning mechanism 40. In addition, the auxiliary slider 65 is corresponded to the auxiliary moving part in this embodiment. The auxiliary moving part is a member that can move along the auxiliary injection mechanism guide part.

The auxiliary scanning mechanism guide part 62 is formed in the elongate member extended along the X direction in the upper position of the board | substrate 200. As shown in FIG. That is, the auxiliary injection mechanism guide part 62 is formed so that the main scanning mechanism guide part 42 may be extended. The auxiliary slider 65 is a member having an internal space in which the auxiliary injection mechanism guide portion 62 can be inserted and disposed, and is supported by the auxiliary injection mechanism guide portion 62 so as to be movable along the X direction. . This auxiliary scanning mechanism 60 is driven synchronously with the main scanning mechanism 40, which will be described later.

More specifically, the auxiliary injection mechanism guide part 62 is formed in the substantially rectangular bar-shaped member. The external shape of the auxiliary slider 65 is formed in substantially rectangular parallelepiped shape, and the internal slider 64S is formed in the auxiliary slider 65 which can surround the outer peripheral surface of the auxiliary injection mechanism guide part 62 at intervals. have. A part of air supplied from the air supply source 86 mentioned later through the air piping 80a is discharged toward the inner peripheral surface of the auxiliary slider 65. As shown in FIG. As a result, the auxiliary slider 65 is in a state of being supported to be movable along the X direction while interposing the air layer between the outer peripheral surface of the auxiliary injection mechanism guide portion 62.

In addition, here, the structure which the auxiliary slider 65 is movable so that it may be supported with respect to the auxiliary injection mechanism guide part 62 can be employ | adopted in various ways similarly to what was described about the said main scanning mechanism 40. As shown in FIG. However, this auxiliary slider need not be movably supported in the state which interposed the air layer with respect to the piping support guide part as mentioned above. For example, the auxiliary slider may be configured to be movable so as to be in contact with the elongated auxiliary injection mechanism guide portion via another low friction member, a rolling element, or the like.

The movable piping support part 100 is provided above the stage 32, and is a movable member which can change the direction according to the position of the slider 44 and the auxiliary slider 65 which move along an X direction. This movable pipe support part 100 is fixed to the large part 69 provided so that one end 61a may cross the path | route which the board | substrate 200 is conveyed, and the other end part 61b is a free end. Rotatable swing shaft 61, a plate-shaped plate portion 63 connected to the swing shaft 61, and an arm member extending in a substantially horizontal direction from the plate portion 63 and connected to the auxiliary slider 65. (67) is provided.

The plate part 63 has the support mechanism 630 which supports the part of the coating liquid piping 80b mentioned later on the main surface. The support mechanism 630 has, for example, a diameter of the coating liquid piping 80b such as a belt-shaped binding member or a clip-in fitting member that binds the coating liquid piping 80b to the plate portion 63. As long as it does not affect, various forms are employable.

One end of the plate portion 63 is connected to the outer circumferential surface of the movable portion 61b of the swing shaft 61 which is arranged so that the axial direction is along the vertical direction. That is, the plate part 63 is arrange | positioned so that it could oscillate according to the operation | movement of the oscillation shaft 61, and it can change the direction freely in the surface prescribed | regulated in the X direction and the Y direction.

The arm member 67 is a member having rigidity that connects the end portion 63b of the plate portion 63 on the side opposite to the connecting portion 63a to the swing shaft 61 and the auxiliary slider 65. Therefore, when the auxiliary slider 65 reciprocates along the auxiliary injection mechanism guide part 62, the plate part 63 and the oscillation shaft 61 follow through the arm member 67, and the plate part 63 It swings about the oscillation shaft 61 around it. In other words, the auxiliary scanning mechanism 60 functions as a driving source of the plate portion 63.

More specifically, in response to the movement of the auxiliary slider 65 of the auxiliary injection mechanism 60, the arm member 67 receives a tensile force or a pressing force from the auxiliary slider 65. By the component of the force acting along the X direction among these forces, the direction of the plate part 63 changes periodically following the auxiliary slider 65.

In addition, a member of another shape may be used instead of the plate-shaped plate portion 63. For example, as long as the coating liquid piping 80b, such as a rod-shaped member, can be supported, various forms can be employ | adopted for the shape. In addition, the plate part 63 and the arm member 67 may be comprised as a rigid body.

Further, depending on the position of the auxiliary slider 65, more specifically, when the auxiliary slider 65 is located in the middle of the auxiliary injection mechanism guide portion 62, and at both ends of the auxiliary injection mechanism guide portion 62. When positioned, the distance between the auxiliary slider 65 and the movable pipe support portion 100 varies. Therefore, as the arm member 67, for example, a telescopic structure in which a pair of cylindrical members 67a and 67b having different diameters can be elastically combined can be adopted, and a pantograph structure or the like can also be used. In addition, as an alternative to these, the auxiliary slider 65 and the movable piping support part 100 are connected to the connection part of the arm member 67 and the auxiliary slider 65, or the connection part of the arm member 67 and the plate part 63, etc. The structure which can adjust the distance between) may be employ | adopted. Thereby, the length of the arm member 67 is adjusted according to the position of the auxiliary slider 65 which moves straight.

The piping 80 includes the air piping 80a and the coating liquid piping 80b. The pipes 80a and 80b are connected to the air supply source 86 or the coating liquid supply source 88 on the upstream side of the air or the coating liquid and are supported to be suspended above the substrate processing apparatus 20. have. In the following description, when distinguishing both piping, it may be called the air piping 80a or the coating liquid piping 80b, and when calling generically, it may be called the piping 80. FIG. In addition, description of the air piping 80a is abbreviate | omitted in FIG.

The air piping 80a is comprised by the tube of flexible resin etc. which draws air from the air supply source 86, and has two air piping 80a here. One end of the two air pipes 80a is connected to the air supply source 86, respectively. The other end of one air pipe 80a is connected to the slider 44 so that air can be supplied, and the other end of the other air pipe 80a is connected to the auxiliary slider 65 so that air can be supplied. The other end of one air pipe 80a may be directly fixed to the slider 44, or may be connected to the slider 44 via a fixed location of the discharge part 50.

The coating liquid piping 80b is comprised by the tube of flexible resin etc. which lead the coating liquid from the coating liquid supply source 88, and is provided in the same number as the nozzle 54. As shown in FIG. One end of each coating liquid pipe 80b is connected to the coating liquid supply source 88, and the other end thereof is connected to the nozzle 54 so that the coating liquid can be supplied. The other end of the coating liquid pipe 80b may be directly fixed to the discharge part 50, or may be connected to the nozzle 54 via a fixed position to the slider 44 or the nozzle support part 52.

The coating liquid pipe 80b is housed in the coating liquid pipe protecting member 85 in a state where a plurality of coating liquid pipes 80b are bundled. This coating liquid piping protection member 85 is comprised from the material which has flexibility, such as resin, and the some coating liquid piping 80b is hold | maintained collectively. Here, as shown in FIG. 3, each coating liquid piping 80b is connected to each nozzle 54 via the fixed location of the nozzle support part 52. As shown in FIG. Also with respect to the mechanism in which the coating liquid piping protection member 85 is fixed in the nozzle support portion 52, various forms similar to the support mechanism 630 in the plate portion 63 of the substrate can be employed.

A portion of the coating liquid piping 80b on the upstream side in the flow direction of the coating liquid is fixed to the auxiliary slider 65 rather than the fixed position at the discharge portion 50 or the fixed position at the slider 44 or the nozzle support 52. It is supported by the auxiliary slider holding part 621. Also for the mechanism which supports the coating liquid piping 80b which this auxiliary slider holding part 621 has, the various forms similar to the support mechanism 630 in the plate part 63 of the said base material can be employ | adopted.

Here, the auxiliary scanning mechanism 60 is located above the main scanning mechanism 40. Therefore, about the coating liquid piping 80b, the state which rose upward from the fixed location in the discharge part 50 or the fixed location in the slider 44 or the nozzle support part 52 becomes easy to be maintained.

And a part of the coating liquid piping 80b of the flow direction upstream of a coating liquid is being fixed by the plate part 63 like the said base material rather than the fixed location in this auxiliary slider 65. Thus, in this embodiment, the middle part of the coating liquid piping 80b is supported by two places of the auxiliary slider 65 and the plate part 63. As shown in FIG.

Here, while the part of the coating liquid piping 80b located between the part supported by the auxiliary slider 65 and the part supported by the plate part 63 is hold | maintained by the coating liquid piping protection member 85, FIG. As shown in 3, it is formed in the upward convex arch shape. Therefore, the length of the coating liquid piping 80b in the said part becomes longer than the length between the auxiliary slider 65 and the plate part 63. FIG. In addition, the coating liquid piping 80b may be formed in the downward convex arch shape. That is, it is preferable in the coating liquid piping 80b that the section between the support point by the movable pipe support part 100, and the connection point to the discharge part 50 is formed in arch shape in the perpendicular surface.

This substrate processing apparatus 20 is equipped with the scanning drive mechanism 70 which drives synchronously the slider 44 and the auxiliary slider 65 periodically along an X direction. Here, synchronously driving the slider 44 and the auxiliary slider 65 means moving and driving the slider 44 and the auxiliary slider 65 at approximately the same speed and approximately the same range of movement. Here, the scan drive mechanism 70 includes a slider drive mechanism 72 for driving the slider 44 and an auxiliary slider drive mechanism 76 for driving the auxiliary slider 65.

The slider drive mechanism 72 includes a pair of pulleys 73 and 73 provided at both ends of the main scan mechanism guide portion 42, a drive belt 74 wound around the pair of pulleys 73 and 73, and one side. The pulley body 73 has a motor 75 capable of rotationally driving in both directions. The belt attachment bracket 45 of the slider 44 is fixedly fixed to one side (lower side) of the drive belts 74 in two paths that travel between the pair of pulleys 73 and 73. Further, the counter slider 48 is fixed to the other side (upper side) of the drive belts 74 in two paths that travel between the pair of pulleys 73 and 73. In addition, the counter slider 48 is substantially symmetrical with the slider 44 with the center position (usually the center position of a pair of pulley bodies 73 and 73) of the reciprocating range of the slider 44 interposed. It is fixedly connected to the drive belt 74 so as to be disposed at. Then, by rotating the motor 75 while controlling the rotation direction, the rotation speed, the rotation amount, and the like, the slider 44 and the discharge part 50 are reciprocally driven along the X direction. At this time, the counter slider 48 is reciprocated along the X direction while maintaining the symmetrical position between the slider 44 with the center positions of the pair of pulleys 73 and 73 interposed therebetween. have.

The auxiliary slider drive mechanism 76 includes a pair of pulleys 77 and 77 provided at both ends of the auxiliary scan mechanism guide portion 62, and a drive belt 78 wound around the pair of pulley bodies 77 and 77; And a motor 79 capable of rotationally driving one pulley 77 in both the forward and reverse directions. The auxiliary slider 65 is fixed to one side (lower side) of the drive belts 78 in two paths that travel between the pair of pulleys 77 and 77. Then, the auxiliary slider 65 is driven along the X direction by rotating the motor 79 so as to synchronously drive the slider 44 and the auxiliary slider 65, that is, control the rotation direction, the rotation speed, the amount of rotation, and the like. Reciprocating movement is driven. However, the auxiliary slider 65 and the slider 44 in the X direction are within the range in which large tensile force can be suppressed from being applied to the pipe 80 passing between the slider 44 and the auxiliary slider 65. It may be slightly different along the way.

In this example, the slider 44 and the auxiliary slider 65 are driven by the respective motors 75 and 79, but the rotational driving force from the common motor is transmitted using a gear, a pulley, a belt, or the like. You may drive by dividing into two by a mechanism. In addition, the synchronous drive may be performed by connecting the slider 44 and the auxiliary slider 65 to a common drive belt. In addition, the mechanism which drives the slider 44 or the auxiliary slider 65, especially the mechanism which drives the auxiliary slider 65 is not limited to the said example, In addition, even if it uses various linear actuators, such as a linear motor, do.

The hardware configuration of the control unit 90 is the same as that of a general computer. That is, the control unit 90 includes a CPU that performs various arithmetic processing, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, a control software, a magnetic disk that stores data, and the like. It is configured by connecting inputs such as a keyboard and a mouse to a bus line. Operation control of the substrate processing apparatus 20 is performed in accordance with a software program stored in advance in the control unit 90. The coating liquid supply source 88, the air supply source 86, and the motors 75, 79 are connected to the bus line. The control unit 90 supplies air from the air supply source 86, starts the supply of the coating liquid from the coating liquid supply source 88, and discharges the coating liquid from each nozzle 54. And the auxiliary slider 65 are synchronously driven so as to perform a process of driving control of the respective motors 75 and 79.

In the substrate processing apparatus 20 configured as described above, when the slider 44 and the auxiliary slider 65 periodically reciprocate along the X direction, the plate portion 63 connected to the auxiliary slider 65 through the arm member 67. ) Periodically reciprocates around the swing shaft 61. That is, the direction of the plate part 63 changes periodically by following the slider 44 which drives synchronously with the auxiliary slider 65. FIG. The horizontal swing of the arm member 67 at this time is illustrated in FIG. 1 as another state 67m of the arrow SW and the arm member 67.

Below, the flow of the process using this substrate processing apparatus 20 is demonstrated using the flowchart shown in FIG.

Initially, the substrate 200 subjected to the processing in all the steps is conveyed to the substrate processing apparatus 20 at a predetermined speed while being held on the stage 32 of the substrate holding unit 30 (step S1). ). When the control part 90 detects that the board | substrate 200 has conveyed, for example by a sensor etc., it transmits a signal also to the coating liquid supply source 88, and starts supply of a coating liquid (step S2).

Moreover, the control part 90 transmits a signal to the motor 75 which is a drive mechanism of the main scanning mechanism 40, and the motor 79 which is a drive mechanism of the auxiliary scanning mechanism 60. As shown in FIG. In response to this signal, the slider 44 of the main scanning mechanism 40 and the auxiliary slider 65 of the auxiliary scanning mechanism 60 perform scanning movement while synchronizing along the X direction (step S3). By repeatedly performing this scanning movement, the area | region of coating liquid is formed in the surface of the board | substrate 200. FIG.

As the auxiliary slider 65 of this auxiliary scanning mechanism 60 scan-moves, the plate part 63 of the movable piping support part 100 oscillates through the arm member 67 connected to the auxiliary slider 65. That is, the direction of the plate part 63 of the movable pipe support part 100 changes following the auxiliary slider 65 and the slider 44 which synchronously drives the auxiliary slider 65 (step S4).

As described above, in the state where the coating liquid is discharged from the nozzle 54, the main scanning in the X-axis direction by the main scanning mechanism 40 and the movement in the Y-axis direction of the substrate 200 are repeatedly performed, whereby the surface of the substrate 200 is obtained. The coating liquid is discharged in its entirety.

The control unit 90 determines whether the coating liquid is applied to the entire surface of the substrate 200 (step S5), and the substrate 200 coated with the coating liquid is conveyed to the downstream process by the substrate holding unit 30.

As described above, the substrate processing apparatus 20 supports the portion in the middle of the coating liquid pipe 80b and follows the periodic movement of the slider 44 due to the repetition of the main scanning, and the direction thereof changes periodically. The movable piping support part 100 is provided. That is, the direction of the movable pipe support part 100 is not maintained in a fixed direction but periodically changes in accordance with the movement of the slider 44. For this reason, it can suppress that a distortion generate | occur | produces in the part of the coating liquid piping 80b supported by the movable piping support part 100. FIG. In addition, since a force is hardly applied to the part of the coating liquid pipe 80b supported by the movable pipe support part 100 from the outside, the posture of the coating liquid pipe 80b in an initial state becomes easy to be maintained. That is, instability of the coating liquid piping 80b does not arise easily. As a result, the fluctuation of the flow volume of the coating liquid discharged from the discharge part 50 is suppressed.

In particular, when the substrate processing apparatus is enlarged with the increase in size of the substrate used in the product, the number of nozzles increases and the number of coating liquid piping increases, so that the instability of the coating liquid piping increases. Therefore, it is more effective to apply this invention to a larger substrate processing apparatus than before.

The substrate processing apparatus 20 further includes an auxiliary scanning mechanism 60, and a portion of the coating liquid pipe 80b is supported by the auxiliary slider 65 of the auxiliary scanning mechanism 60. Therefore, the shaking and instability of the coating liquid pipe 80b are not transmitted directly to the discharge part 50. Moreover, since the location which supports the coating liquid piping 80b increases, the attitude | position of the coating liquid piping 80b becomes more stable. Thereby, the fluctuation of the flow volume of the coating liquid discharged | emitted from the discharge part 50 is suppressed.

In addition, the movable pipe support part 100 is connected to the auxiliary slider 65 via the arm member 67. The movable piping support part 100 can change the direction reliably by the drive of the arm member 67. FIG.

In addition, the coating liquid piping 80b is formed in the convex arch shape between the support part by the movable piping support part 100, and the connection place of the auxiliary slider 65. As shown in FIG. Therefore, since the coating liquid piping 80b in the said location becomes long, the shake of the auxiliary injection mechanism 60 is smoothed in the whole arch-shaped coating liquid piping 80b, and the influence can be made small. Moreover, since the part 801 of the coating liquid piping 80b extended from the connection point of the auxiliary slider 65 rises upwards, even if the slider 44 of the auxiliary scanning mechanism 60 reciprocates, a coating liquid will A force hardly arises in the direction which flows back inside the coating liquid piping 80b. Thereby, the fluctuation of the flow volume of the coating liquid discharged | emitted from the discharge part 50 is suppressed.

About the smoothing effect of the shaking of the coating liquid piping 80b, the arch of the coating liquid piping 80b between the support point by the movable piping support part 100, and the connection point of the auxiliary slider 65 is convex down. Even if it is formed in a shape, it is achieved. Therefore, when paying attention to such a smoothing effect, generally, it is preferable that the said section in the coating liquid piping 80b (flexible process liquid piping) is provided in arch shape in the perpendicular surface. The arch shape here refers to the coating liquid piping rather than the minimum required length (that is, the minimum distance required between the supporting portion of the movable piping support portion 100 and the connecting portion of the auxiliary slider 65 in consideration of the minimum main scan amplitude). (80b) is long and says to have redundancy.

In addition, the main scanning mechanism 40 is disposed below the auxiliary scanning mechanism 60. Therefore, the terminal 802 of the coating liquid piping 80b connected to the discharge part 50 which the main scanning mechanism 40 has is easy to be maintained upward. Therefore, even if the slider 44 which the main scanning mechanism 40 has reciprocated moves, it is hard to produce a force in the direction which a coating liquid flows backward, and the fluctuation of the flow volume of a coating liquid is suppressed.

<Modifications>

Hereinafter, various modifications will be described.

First, in the said embodiment, although the section between the support part by the movable piping support part 100, and the connection part to the discharge part 50 is formed in convex arch shape among the coating liquid piping 80b, It is not limited to form. In FIG. 6, the section between the support point by the movable tube support part 100 and the connection point to the discharge part 50 is shown along the arm member 67. As shown in FIG. As shown in FIG. 6, the coating liquid piping 80b in the said section may be provided in contact with the arm member 67 along the extension direction of the arm member 67. As shown in FIG. In addition, the coating liquid piping 80b may have a configuration wound around the arm member 67. In these cases, since the coating liquid piping 80b in the section of the substrate is reliably supported by the arm member 67, the shaking and instability of the coating liquid piping 80b in the section are reliably suppressed. Thereby, fluctuation of the flow volume of the coating liquid discharged from the discharge part 50 is suppressed.

In the above embodiment, the auxiliary scanning mechanism 60 is provided with a driving mechanism, but is not necessarily limited to this embodiment. The auxiliary slider 65 of the auxiliary scanning mechanism 60 may be a mechanism that operates by driving the slider 44 of the main scanning mechanism 40 by the drive mechanism and reciprocates. That is, the form which makes the main scanning mechanism 40 follow the auxiliary scanning mechanism 60 and the movable piping support part 100 may be sufficient.

In addition, the movable pipe support part 100 is not limited to the form which is driven by the auxiliary scanning mechanism 60 or the main scanning mechanism 40. FIG. The movable pipe support part 100 may have a drive mechanism, such as a motor, for example. When the movable pipe support part 100 itself is equipped with the drive mechanism which adjusts the direction, the direction of the movable pipe support part 100 can reliably follow the slider 44 and the auxiliary slider 65, and can change it periodically. Do.

In addition, when a movable pipe support part has a drive mechanism, the movable pipe support part may be a form comprised from the arm member which has a rotation mechanism and the link mechanism connected to the rotation motor. In this case, the arm member having the link mechanism is given a rotational driving force from the rotary motor to linearly move the auxiliary slider and the slider connected to the arm member having the link mechanism.

In addition, in FIG. 7, the arrangement relationship of the main part of the substrate processing apparatus in the state in which the arm member 67 is not installed between the plate part 63 and the auxiliary slider 65 is shown. The movable piping support part 100b shown in FIG. 7 does not have the arm member 67. FIG. This form may be sufficient. In this case, it is preferable that the drive mechanism for changing the direction of the plate part 63 of the movable pipe support part 100b, for example, the motor 68, is provided. The motor 68 is controlled by the control unit 90, and the control unit 90 periodically changes the direction of the plate unit 63 to follow the slider 44 and the auxiliary slider 65 that reciprocate, The motor 68 is driven to swing the movable portion 61b of the swing shaft 61.

Thus, when the movable pipe support part 100 itself is equipped with the drive mechanism which adjusts the direction, the direction of the movable pipe support part 100 reliably follows the slider 44 and the auxiliary slider 65, and changes it periodically. It is possible.

In addition, the movable pipe support part 100b does not necessarily need to be provided with the drive mechanism. As the auxiliary slider 65 moves, the coating liquid pipe 80b may be configured to change the direction of the movable pipe support part 100b by pulling the movable pipe support part 100b.

The substrate processing apparatus 20 may not necessarily include the auxiliary scanning mechanism 60. That is, the substrate processing apparatus which has the main scanning mechanism 40 and the movable piping support part 100c as a main structure may be sufficient.

8, the arrangement relationship of the principal part in this case is outlined. Following the reciprocating movement of the slider 44 of the main scanning mechanism 40, the direction of the plate portion 63 changes periodically. Here, the movable pipe support part 100c is equipped with the motor 68 as a drive mechanism. In addition, it is preferable that the coating liquid piping 80b is formed in arch shape in the section between the movable piping support part 100c and the discharge part 50 like the said base material. More preferably, this section becomes an arch shape with convex upwards. The reason is the same as the reason described about embodiment shown in FIGS. Moreover, the form in which the movable pipe support part 100c is equipped with the arm member may be sufficient. That is, even if the movable pipe support part 100c is connected to the slider 44, it is not cared about.

The present invention is generally applicable to not only a coating liquid but also a substrate processing apparatus and a processing liquid applying method for applying a processing liquid to a substrate having a substantially horizontal posture.

20: substrate processing apparatus 30: substrate holding unit
40: shareholders 'organization 42: shareholders' organization guide
44: slider 50: discharge part
54 nozzle 60 auxiliary injection mechanism
61: oscillation shaft 62: auxiliary injection mechanism guide portion
63: plate portion 65: auxiliary slider
67: arm member 80b: coating liquid piping
86: air source 88: coating liquid supply source
90 control unit 100 movable pipe support
200: substrate

Claims (9)

A substrate holding unit for holding the substrate horizontally,
A main scanning mechanism having a guide part extending in a main scanning direction parallel to the substrate, and a moving part supported by the guide part to be movable in the main scanning direction;
A discharge part which is movably supported in the main scanning direction by the moving part and discharges the processing liquid onto the substrate;
A flexible pipe connected to the discharge part and leading a processing liquid to the discharge part;
A substrate processing apparatus comprising a movable pipe support portion that supports a portion in the middle of the pipe and that changes in direction periodically following the periodic movement of the moving portion due to repetition of main scanning. The method according to claim 1,
The substrate processing apparatus in which the section between the support part by the said movable piping support part, and the connection point to the said discharge part is formed in arch shape in the perpendicular surface among the said piping. The method according to claim 2,
The said processing part of the said piping becomes a convex arch shape which is convex upward. The method according to claim 1,
And an auxiliary injection mechanism having an auxiliary guide portion extending along the guide portion and an auxiliary moving portion supported by the auxiliary guide portion to be movable along the main scanning direction.
The substrate processing apparatus in which the predetermined part between the support part by the said movable piping support part, and the connection point to the said discharge part is supported by the said auxiliary moving part among the said piping. The method of claim 4,
And the movable pipe support part is connected to the auxiliary moving part. The method of claim 4,
The substrate processing apparatus in which the section between the support point by the said movable pipe support part, and the connection point to the said auxiliary moving part is formed in an arch shape in the perpendicular surface among the said piping. The method of claim 4,
The main scanning mechanism is disposed below the auxiliary scanning mechanism. The method according to any one of claims 1 to 7,
And a driving part for adjusting the direction of the movable pipe support part. Holding the substrate horizontally,
Periodically scanning moving the substrate on the substrate along the main scanning direction while discharging the processing liquid from the discharge unit;
And a step of periodically changing the direction of the movable pipe support part supporting the portion in the middle of the flexible pipe that leads the processing liquid to the discharge part, following the moving part that scans and moves periodically.

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