KR101359826B1 - 진공성막장치 및 진공성막방법 - Google Patents

진공성막장치 및 진공성막방법 Download PDF

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Publication number
KR101359826B1
KR101359826B1 KR1020097000288A KR20097000288A KR101359826B1 KR 101359826 B1 KR101359826 B1 KR 101359826B1 KR 1020097000288 A KR1020097000288 A KR 1020097000288A KR 20097000288 A KR20097000288 A KR 20097000288A KR 101359826 B1 KR101359826 B1 KR 101359826B1
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KR
South Korea
Prior art keywords
substrate
reflectance
bias voltage
film
vacuum
Prior art date
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KR1020097000288A
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English (en)
Korean (ko)
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KR20090038866A (ko
Inventor
준페이 마루야마
야스히로 고이즈미
Original Assignee
신메이와 인더스트리즈,리미티드
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Publication of KR20090038866A publication Critical patent/KR20090038866A/ko
Application granted granted Critical
Publication of KR101359826B1 publication Critical patent/KR101359826B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
KR1020097000288A 2006-08-01 2007-07-18 진공성막장치 및 진공성막방법 KR101359826B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006210129A JP4864586B2 (ja) 2006-08-01 2006-08-01 真空成膜装置および真空成膜方法
JPJP-P-2006-210129 2006-08-01
PCT/JP2007/064188 WO2008015913A1 (fr) 2006-08-01 2007-07-18 Appareil de formage de film sous vide et procédé de formage de film sous vide

Publications (2)

Publication Number Publication Date
KR20090038866A KR20090038866A (ko) 2009-04-21
KR101359826B1 true KR101359826B1 (ko) 2014-02-07

Family

ID=38997093

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097000288A KR101359826B1 (ko) 2006-08-01 2007-07-18 진공성막장치 및 진공성막방법

Country Status (5)

Country Link
JP (1) JP4864586B2 (ja)
KR (1) KR101359826B1 (ja)
CN (1) CN101495665B (ja)
TW (1) TWI431133B (ja)
WO (1) WO2008015913A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104372296B (zh) * 2013-08-14 2016-09-21 北大方正集团有限公司 一种利用电子束蒸发制备金属薄膜的方法
TWI503433B (zh) * 2013-10-08 2015-10-11 不二越股份有限公司 成膜裝置及成膜方法
JP6379318B1 (ja) * 2017-06-14 2018-08-22 株式会社アルバック 成膜装置及び成膜方法並びに太陽電池の製造方法
CN111979517B (zh) * 2020-08-24 2022-12-20 京东方科技集团股份有限公司 温度调节方法及装置、蒸镀设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR930006119B1 (ko) * 1988-04-25 1993-07-07 가와사끼 세이데쓰 가부시끼가이샤 밀착성, 평활성 및 내식성에 뛰어난 치밀한 세라믹 피막을 갖춘 강판 및 그 제조방법
US20030042131A1 (en) 2000-02-25 2003-03-06 Johnson Wayne L. Method and apparatus for depositing films
JP2007031743A (ja) * 2005-07-22 2007-02-08 Kobe Steel Ltd 光情報記録媒体用Ａｇ合金反射膜及び光情報記録媒体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3882483B2 (ja) * 2000-02-01 2007-02-14 三菱化学メディア株式会社 光記録媒体の製造方法
JP2002339084A (ja) * 2001-03-13 2002-11-27 Kiyousera Opt Kk 金属膜および金属膜被覆部材
JP3655907B2 (ja) * 2002-08-20 2005-06-02 株式会社神戸製鋼所 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体
JP4009564B2 (ja) * 2003-06-27 2007-11-14 株式会社神戸製鋼所 リフレクター用Ａｇ合金反射膜、及び、このＡｇ合金反射膜を用いたリフレクター、並びに、このＡｇ合金反射膜のＡｇ合金薄膜の形成用のＡｇ合金スパッタリングターゲット

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR930006119B1 (ko) * 1988-04-25 1993-07-07 가와사끼 세이데쓰 가부시끼가이샤 밀착성, 평활성 및 내식성에 뛰어난 치밀한 세라믹 피막을 갖춘 강판 및 그 제조방법
US20030042131A1 (en) 2000-02-25 2003-03-06 Johnson Wayne L. Method and apparatus for depositing films
JP2007031743A (ja) * 2005-07-22 2007-02-08 Kobe Steel Ltd 光情報記録媒体用Ａｇ合金反射膜及び光情報記録媒体

Also Published As

Publication number Publication date
CN101495665A (zh) 2009-07-29
CN101495665B (zh) 2011-07-13
JP2008038161A (ja) 2008-02-21
WO2008015913A1 (fr) 2008-02-07
KR20090038866A (ko) 2009-04-21
TWI431133B (zh) 2014-03-21
JP4864586B2 (ja) 2012-02-01
TW200817527A (en) 2008-04-16

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