TWI431133B - Vacuum film forming apparatus and vacuum film forming method - Google Patents

Vacuum film forming apparatus and vacuum film forming method Download PDF

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Publication number
TWI431133B
TWI431133B TW096126730A TW96126730A TWI431133B TW I431133 B TWI431133 B TW I431133B TW 096126730 A TW096126730 A TW 096126730A TW 96126730 A TW96126730 A TW 96126730A TW I431133 B TWI431133 B TW I431133B
Authority
TW
Taiwan
Prior art keywords
reflective film
substrate
bias
reflectance
vacuum
Prior art date
Application number
TW096126730A
Other languages
English (en)
Chinese (zh)
Other versions
TW200817527A (en
Inventor
Junpei Maruyama
Yasuhiro Koizumi
Original Assignee
Shinmaywa Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinmaywa Ind Ltd filed Critical Shinmaywa Ind Ltd
Publication of TW200817527A publication Critical patent/TW200817527A/zh
Application granted granted Critical
Publication of TWI431133B publication Critical patent/TWI431133B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
TW096126730A 2006-08-01 2007-07-23 Vacuum film forming apparatus and vacuum film forming method TWI431133B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006210129A JP4864586B2 (ja) 2006-08-01 2006-08-01 真空成膜装置および真空成膜方法

Publications (2)

Publication Number Publication Date
TW200817527A TW200817527A (en) 2008-04-16
TWI431133B true TWI431133B (zh) 2014-03-21

Family

ID=38997093

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096126730A TWI431133B (zh) 2006-08-01 2007-07-23 Vacuum film forming apparatus and vacuum film forming method

Country Status (5)

Country Link
JP (1) JP4864586B2 (ja)
KR (1) KR101359826B1 (ja)
CN (1) CN101495665B (ja)
TW (1) TWI431133B (ja)
WO (1) WO2008015913A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104372296B (zh) * 2013-08-14 2016-09-21 北大方正集团有限公司 一种利用电子束蒸发制备金属薄膜的方法
TWI503433B (zh) * 2013-10-08 2015-10-11 不二越股份有限公司 成膜裝置及成膜方法
JP6379318B1 (ja) * 2017-06-14 2018-08-22 株式会社アルバック 成膜装置及び成膜方法並びに太陽電池の製造方法
CN111979517B (zh) * 2020-08-24 2022-12-20 京东方科技集团股份有限公司 温度调节方法及装置、蒸镀设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68916506T2 (de) * 1988-04-25 1994-10-13 Kawasaki Steel Co Stahlfeinblech mit einer dichten keramischen beschichtung von ausgezeichnete adhäsionseigenschaft, glattheit und korrosionsbeständigkeit und verfahren zu seiner herstellung.
JP3882483B2 (ja) * 2000-02-01 2007-02-14 三菱化学メディア株式会社 光記録媒体の製造方法
TW584905B (en) 2000-02-25 2004-04-21 Tokyo Electron Ltd Method and apparatus for depositing films
JP2002339084A (ja) * 2001-03-13 2002-11-27 Kiyousera Opt Kk 金属膜および金属膜被覆部材
JP3655907B2 (ja) * 2002-08-20 2005-06-02 株式会社神戸製鋼所 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体
JP4009564B2 (ja) * 2003-06-27 2007-11-14 株式会社神戸製鋼所 リフレクター用Ａｇ合金反射膜、及び、このＡｇ合金反射膜を用いたリフレクター、並びに、このＡｇ合金反射膜のＡｇ合金薄膜の形成用のＡｇ合金スパッタリングターゲット
JP4527624B2 (ja) * 2005-07-22 2010-08-18 株式会社神戸製鋼所 Ａｇ合金反射膜を有する光情報媒体

Also Published As

Publication number Publication date
CN101495665A (zh) 2009-07-29
CN101495665B (zh) 2011-07-13
JP2008038161A (ja) 2008-02-21
KR101359826B1 (ko) 2014-02-07
WO2008015913A1 (fr) 2008-02-07
KR20090038866A (ko) 2009-04-21
JP4864586B2 (ja) 2012-02-01
TW200817527A (en) 2008-04-16

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