KR101359232B1 - 고정밀 현장 저항 측정방법 - Google Patents

고정밀 현장 저항 측정방법 Download PDF

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KR101359232B1
KR101359232B1 KR1020097000785A KR20097000785A KR101359232B1 KR 101359232 B1 KR101359232 B1 KR 101359232B1 KR 1020097000785 A KR1020097000785 A KR 1020097000785A KR 20097000785 A KR20097000785 A KR 20097000785A KR 101359232 B1 KR101359232 B1 KR 101359232B1
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instantaneous
voltage
measurement
circuit
measured
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KR20090054423A (ko
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케빈 비. 펙
노엘 존슨
비욘 에이. 라슨
폰터스 케이. 에이치. 닐슨
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엠알엘 인더스트리즈, 인크.
산드빅 인터렉츄얼 프로퍼티 에이비
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • G01R27/08—Measuring resistance by measuring both voltage and current

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
KR1020097000785A 2006-06-19 2007-06-04 고정밀 현장 저항 측정방법 Active KR101359232B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/454,922 2006-06-19
US11/454,922 US7825672B2 (en) 2006-06-19 2006-06-19 High accuracy in-situ resistance measurements methods
PCT/US2007/013093 WO2007149205A2 (en) 2006-06-19 2007-06-04 High accuracy in-situ resistance measurements methods

Publications (2)

Publication Number Publication Date
KR20090054423A KR20090054423A (ko) 2009-05-29
KR101359232B1 true KR101359232B1 (ko) 2014-02-05

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KR1020097000785A Active KR101359232B1 (ko) 2006-06-19 2007-06-04 고정밀 현장 저항 측정방법

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US (1) US7825672B2 (cg-RX-API-DMAC7.html)
EP (1) EP2038667B1 (cg-RX-API-DMAC7.html)
JP (1) JP5209617B2 (cg-RX-API-DMAC7.html)
KR (1) KR101359232B1 (cg-RX-API-DMAC7.html)
CN (1) CN101490573B (cg-RX-API-DMAC7.html)
WO (1) WO2007149205A2 (cg-RX-API-DMAC7.html)

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KR101182502B1 (ko) * 2008-09-30 2012-09-12 도쿄엘렉트론가부시키가이샤 기판의 이상 배치 상태의 검지 방법, 기판 처리 방법, 컴퓨터 판독 가능한 기억 매체 및 기판 처리 장치
CN102052971B (zh) * 2010-11-02 2012-07-04 深圳市海一电器有限公司 电加热的热源测温装置及方法
FR2984495B1 (fr) * 2011-12-15 2016-04-15 Valeo Systemes De Controle Moteur Procede de mesure de la temperature
WO2013158135A2 (en) 2012-04-18 2013-10-24 Ney-Li Funding, Llc Selective control for improving switched power supplies
US9568526B2 (en) * 2012-09-13 2017-02-14 Microchip Technology Incorporated Noise detection and correction routines
JP5513586B2 (ja) * 2012-11-01 2014-06-04 株式会社日本製鋼所 温度測定方法
JP6116952B2 (ja) 2013-03-19 2017-04-19 株式会社東芝 部分放電監視システムおよび部分放電監視方法
US9710863B2 (en) 2013-04-19 2017-07-18 Strategic Patent Management, Llc Method and apparatus for optimizing self-power consumption of a controller-based device
EP2809127B1 (en) * 2013-05-28 2019-01-23 IDTools B.V. Induction heating handheld power tool and method for assembling a front module to an induction heating handheld power tool
CN104569573B (zh) * 2013-10-12 2017-10-13 施耐德电气（澳大利亚）有限公司 一种功率参数的测量方法以及测量电路
CN104950009B (zh) * 2014-03-28 2018-11-20 杭州远方光电信息股份有限公司 一种热阻分析方法
JP6961025B2 (ja) * 2016-06-24 2021-11-05 東京エレクトロン株式会社 基板処理システム
JP6688172B2 (ja) * 2016-06-24 2020-04-28 東京エレクトロン株式会社 基板処理システムおよび方法
US12061228B2 (en) 2022-06-06 2024-08-13 Nxp B.V. Degradation monitor for bond wire to bond pad interfaces

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US5514129A (en) * 1993-12-03 1996-05-07 Valleylab Inc. Automatic bipolar control for an electrosurgical generator
JP2006024537A (ja) 2004-07-09 2006-01-26 Rkc Instrument Inc 電力制御装置および電力制御方法

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JP3274157B2 (ja) * 1991-11-18 2002-04-15 株式会社ナ・デックス 抵抗溶接制御における２次側抵抗測定方法及び装置
US5387909A (en) * 1993-03-25 1995-02-07 Naztec, Inc. Lamp sensing system for traffic lights
US5629869A (en) * 1994-04-11 1997-05-13 Abb Power T&D Company Intelligent circuit breaker providing synchronous switching and condition monitoring
CN1070291C (zh) * 1994-10-26 2001-08-29 华北电力学院 电力变压器直流电阻的动态测量方法及测量装置
US5864733A (en) * 1995-10-25 1999-01-26 Ricoh Company, Ltd. Developing device for image forming apparatus
US5754451A (en) * 1996-02-29 1998-05-19 Raytheon Company Preventative maintenance and diagonstic system
US5702624A (en) * 1996-10-09 1997-12-30 Taiwan Semiconductors Manfuacturing Company, Ltd Compete hot plate temperature control system for hot treatment
US5831249A (en) * 1997-01-29 1998-11-03 Advanced Micro Devices, Inc. Secondary measurement of rapid thermal annealer temperature
JP3790342B2 (ja) * 1997-10-08 2006-06-28 日置電機株式会社 抵抗測定装置
US6636012B2 (en) * 2001-09-28 2003-10-21 Rockwell Automation Technologies, Inc. Stator and rotor resistance identifier using high frequency injection
JP2003232822A (ja) * 2002-02-07 2003-08-22 Deicy Corp ４探針法による抵抗率測定方法及びその装置
JP3540311B2 (ja) * 2002-05-31 2004-07-07 松下電器産業株式会社 モータ駆動制御装置
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US5514129A (en) * 1993-12-03 1996-05-07 Valleylab Inc. Automatic bipolar control for an electrosurgical generator
JP2006024537A (ja) 2004-07-09 2006-01-26 Rkc Instrument Inc 電力制御装置および電力制御方法

Also Published As

Publication number Publication date
JP5209617B2 (ja) 2013-06-12
US20070290692A1 (en) 2007-12-20
EP2038667A2 (en) 2009-03-25
KR20090054423A (ko) 2009-05-29
US7825672B2 (en) 2010-11-02
CN101490573B (zh) 2012-12-12
EP2038667B1 (en) 2020-03-11
CN101490573A (zh) 2009-07-22
JP2009541740A (ja) 2009-11-26
EP2038667A4 (en) 2017-03-29
WO2007149205A3 (en) 2008-11-06
WO2007149205A2 (en) 2007-12-27

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