KR101319919B1 - 감광성 수지 조성물 및 이를 이용한 차광층 - Google Patents

감광성 수지 조성물 및 이를 이용한 차광층 Download PDF

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Publication number
KR101319919B1
KR101319919B1 KR1020100099925A KR20100099925A KR101319919B1 KR 101319919 B1 KR101319919 B1 KR 101319919B1 KR 1020100099925 A KR1020100099925 A KR 1020100099925A KR 20100099925 A KR20100099925 A KR 20100099925A KR 101319919 B1 KR101319919 B1 KR 101319919B1
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KR
South Korea
Prior art keywords
formula
resin composition
photosensitive resin
meth
acrylate
Prior art date
Application number
KR1020100099925A
Other languages
English (en)
Korean (ko)
Other versions
KR20120045076A (ko
Inventor
이창민
김준석
이길성
최정식
김민성
Original Assignee
제일모직주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제일모직주식회사 filed Critical 제일모직주식회사
Priority to KR1020100099925A priority Critical patent/KR101319919B1/ko
Priority to TW099146893A priority patent/TWI414539B/zh
Priority to CN201110115792.3A priority patent/CN102445842B/zh
Publication of KR20120045076A publication Critical patent/KR20120045076A/ko
Application granted granted Critical
Publication of KR101319919B1 publication Critical patent/KR101319919B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D498/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D498/04—Ortho-condensed systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
KR1020100099925A 2010-10-13 2010-10-13 감광성 수지 조성물 및 이를 이용한 차광층 KR101319919B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020100099925A KR101319919B1 (ko) 2010-10-13 2010-10-13 감광성 수지 조성물 및 이를 이용한 차광층
TW099146893A TWI414539B (zh) 2010-10-13 2010-12-30 光敏性樹脂組成物及使用該組成物的光阻隔層
CN201110115792.3A CN102445842B (zh) 2010-10-13 2011-05-05 光敏树脂组合物和使用其的挡光层

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020100099925A KR101319919B1 (ko) 2010-10-13 2010-10-13 감광성 수지 조성물 및 이를 이용한 차광층

Publications (2)

Publication Number Publication Date
KR20120045076A KR20120045076A (ko) 2012-05-09
KR101319919B1 true KR101319919B1 (ko) 2013-10-22

Family

ID=46008459

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100099925A KR101319919B1 (ko) 2010-10-13 2010-10-13 감광성 수지 조성물 및 이를 이용한 차광층

Country Status (3)

Country Link
KR (1) KR101319919B1 (zh)
CN (1) CN102445842B (zh)
TW (1) TWI414539B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9341946B2 (en) 2012-05-25 2016-05-17 Lg Chem, Ltd. Photosensitive resin composition, pattern formed using same and display panel comprising same
CN103885291A (zh) 2012-12-21 2014-06-25 第一毛织株式会社 光敏树脂组合物及使用其的光阻挡层
KR101686567B1 (ko) * 2013-10-23 2016-12-14 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR101767082B1 (ko) 2014-11-17 2017-08-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
US11774852B2 (en) * 2019-11-28 2023-10-03 Duk San Neolux Co., Ltd. Photosensitive resin composition and display device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080049681A (ko) * 2006-11-30 2008-06-04 신닛테츠가가쿠 가부시키가이샤 알칼리 가용성 수지 및 그 제조방법, 및 알칼리 가용성수지를 이용한 감광성 수지 조성물, 경화물 및 컬러필터

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1471112B1 (en) * 2002-01-25 2010-09-01 Sumitomo Bakelite Co., Ltd. Transparent composite composition
WO2010038978A2 (en) * 2008-09-30 2010-04-08 Kolon Industries, Inc. Photopolymer resin composition
US20100163811A1 (en) * 2008-12-31 2010-07-01 Cheil Industries Inc. Organic Layer Photosensitive Resin Composition and Organic Layer Fabricated Using Same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080049681A (ko) * 2006-11-30 2008-06-04 신닛테츠가가쿠 가부시키가이샤 알칼리 가용성 수지 및 그 제조방법, 및 알칼리 가용성수지를 이용한 감광성 수지 조성물, 경화물 및 컬러필터

Also Published As

Publication number Publication date
CN102445842A (zh) 2012-05-09
TW201215630A (en) 2012-04-16
TWI414539B (zh) 2013-11-11
CN102445842B (zh) 2014-10-29
KR20120045076A (ko) 2012-05-09

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