KR101258982B1 - In-line type heat treatment apparatus - Google Patents

Abstract

An inline heat treatment apparatus is disclosed. In the in-line heat treatment apparatus according to the present invention, since the communicating portions of the adjacent heating furnace and the heating furnace are sealed with the outside by the sealing member, the heat treatment atmosphere inside the continuously installed heating furnace is continuously maintained. Therefore, there is an effect that productivity is improved. Since the heating furnace is provided in a two-layer structure, the moving distance of the worker is shortened during the heat treatment of the substrate. Therefore, the productivity is further improved. Further, since the load lock part is installed in the heating furnace into which the substrate is first introduced and the heating furnace in which the substrate is finally discharged, the heat treatment atmosphere of the continuously installed heating furnace is maintained more continuously. Therefore, there is an effect that the productivity is further improved.

Description

In-line Heat Treatment Equipment {IN-LINE TYPE HEAT TREATMENT APPARATUS}

The present invention relates to an inline heat treatment apparatus capable of continuously maintaining a heat treatment atmosphere of a substrate formed inside a furnace by improving a sealing force between a continuously arranged furnace and a furnace.

The annealing apparatus used in the manufacture of a flat panel display is a heat treatment apparatus that crystallizes or phase changes a deposited film to improve the properties of the film deposited on a substrate.

A thin film transistor, which is a semiconductor layer used in a flat panel display device, deposits amorphous silicon on a substrate such as glass or quartz using a deposition apparatus, dehydrogenates the amorphous silicon layer, and then forms arsenic for forming a channel. ), Dopants such as phosphorus (Phosphorus) or boron (Boron). Then, a crystallization process is performed to crystallize the amorphous silicon layer having a low electron mobility into a polycrystalline silicon layer having a crystalline structure having a high electron mobility.

In order to crystallize an amorphous silicon layer into a polycrystalline silicon layer, there is a common feature that an energy of heat must be applied to the amorphous silicon layer.

A general method of applying heat to the amorphous silicon layer is to put a substrate in the furnace (Furnace), and heat the amorphous silicon layer by a heating means such as a heater installed in the furnace.

The conventional heat treatment apparatus performs a heat treatment process for heating and cooling a substrate using one heating furnace. However, the conventional heat treatment apparatus using a single heating furnace has a disadvantage in that the productivity takes a long time to manufacture the substrate as a product.

In order to solve the above disadvantages, in-line heat treatment apparatuses for continuously arranging a plurality of heating furnaces and transferring the substrates sequentially to the respective heating furnaces to heat-treat the substrates have been developed and used.

The conventional inline heat treatment apparatus is incompletely sealed between heating furnaces adjacent to each other. For this reason, it is difficult to continuously maintain the heat processing atmosphere of the board | substrate comprised in the inside of a heating furnace in the set state. For this reason, since the state of a heating furnace is frequently checked and the state of a heating furnace should be adjusted to the desired heat processing atmosphere state, there existed a disadvantage that productivity fell.

The present invention has been made to solve the problems of the prior art as described above, an object of the present invention is to provide an in-line heat treatment apparatus that can improve the productivity by completely sealing between adjacent heating furnaces.

Inline heat treatment apparatus according to the present invention for achieving the above object, the loading section, the heating section, the process section, the transfer section, the cooling section and the unloading section each having a furnace (Furnace) for providing a space for the substrate is heat-treated sequentially A continuously arranged inline heat treatment apparatus, wherein one of the heating furnaces adjacent to each other and the other of the heating furnaces are sealed to the outside by a sealing member.

In the inline heat treatment apparatus according to the present invention, since the communication portions of the adjacent heating furnace and the heating furnace are sealed to the outside by the sealing member, the heat treatment atmosphere inside the continuously installed heating furnace is continuously maintained. Therefore, there is an effect that productivity is improved.

Since the heating furnace is provided in a two-layer structure, the moving distance of the worker is shortened during the heat treatment of the substrate. Therefore, the productivity is further improved.

Further, since the load lock part is installed in the heating furnace into which the substrate is first introduced and the heating furnace in which the substrate is finally discharged, the heat treatment atmosphere of the continuously installed heating furnace is maintained more continuously. Therefore, there is an effect that the productivity is further improved.

1 is a front view showing a schematic configuration of an inline heat treatment apparatus according to an embodiment of the present invention.
FIG. 2 is an enlarged view of a heating furnace of the temperature increasing unit shown in FIG. 1.
Figure 3 is a side view of Figure 2;
Figure 4 is a perspective view showing the appearance of the heating furnace shown in FIG.
5 and 6 are perspective views of the conveying means shown in FIG.

DETAILED DESCRIPTION OF THE INVENTION The following detailed description of the invention refers to the accompanying drawings that illustrate specific embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. It should be understood that the various embodiments of the present invention are mutually exclusive, but need not be mutually exclusive. For example, certain shapes, structures, and specific features described herein may be embodied in other embodiments without departing from the spirit and scope of the invention in connection with one embodiment. It is also to be understood that the position or arrangement of the individual components within each disclosed embodiment may be varied without departing from the spirit and scope of the invention. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined only by the appended claims, along with the full scope of equivalents to which such claims are entitled. The length, area, thickness, and shape of the embodiments shown in the drawings may be exaggerated for convenience.

Hereinafter, an inline heat treatment apparatus according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.

1 is a front view showing a schematic configuration of an inline heat treatment apparatus according to an embodiment of the present invention.

As shown, the in-line heat treatment apparatus according to the present embodiment, the loading unit 100, the temperature raising unit 200, the process unit 300, the transfer unit 400, the cooling unit 500 and the unloading unit 600 It includes, the loading unit 100, the temperature rising unit 200, the process unit 300, the transfer unit 400, the cooling unit 500 and the unloading unit 600 are sequentially arranged in sequence.

The loading unit 100 includes a furnace 110, and the transfer unit supports the substrate 50 inside the furnace 110 and transfers it to the furnace 210 of the adjacent heating unit 200. Means are installed.

The substrate 50 is supported by a robot arm (not shown), loaded into the loading unit 100, and mounted on the transfer means. A support plate (not shown) may be interposed between the substrate 50 and the transfer means. In the case of using the support plate, the support plate may be mounted on the support plate while the support plate is mounted on the transport means, or the support plate may be mounted on the transport means while the substrate 50 is mounted on the support plate. Can be. The transfer means will be described later.

The substrate 50 may be preheated back and forth at, for example, about 150 ° C. in the loading part 100, and then transferred to the temperature raising part 200. To this end, a heater (not shown) may be installed in the heating furnace 110.

The temperature rising unit 200 will be described with reference to FIGS. 1 to 4. 2 is an enlarged view of a heating furnace of the heating unit shown in FIG. 1, FIG. 3 is a side view of FIG. 2, and FIG. 4 is a perspective view illustrating an appearance of the heating furnace illustrated in FIG. 2.

As shown in the drawing, the temperature raising part 200 heats the substrate 50 to a predetermined temperature and transfers it to the process part 300. The temperature raising unit 200 includes at least two heating furnaces 210, 260, and 270 which are independently temperature controlled. The number of heating furnaces 210, 260, and 270 of the temperature raising part 200 is appropriately provided in consideration of the heat treatment temperature of the substrate 50.

For example, when the heat processing temperature of the board | substrate 50 is about 600 degreeC, three heating furnaces 210, 260, 270 of the temperature raising part 200 are provided. Thus, the temperature of the first furnace 210 is maintained around 150 ℃ in consideration of the preheating temperature of the loading unit 100, the temperature of the second furnace 260 and the third furnace 270 is 450 ℃, respectively. It is preferable to be maintained at around and around 600 ° C.

The substrate 50 may be deformed even when the heating temperature is rapidly increased at low temperatures, but may be deformed when the heating temperature is rapidly increased at high temperatures. Therefore, it is preferable to set the heating furnaces 210, 260, and 270 of the temperature raising part 200 so that the heating temperature is quickly increased at low temperature, and the heating temperature is gradually increased at high temperature.

An inlet 211 and an outlet 213 are formed on the left side and the right side of the heating furnace 210, respectively, through which the substrate 50 is inserted and discharged, and the inlet 211 and the outlet 213 are formed to correspond to each other. And, the right side of the heating furnace 110 of the loading unit 100 is in communication with the inlet 211 of the heating furnace 210, the left side of the heating furnace 260 and the outlet 213 of the heating furnace 210 and Communicating. For this reason, the substrate 50 is discharged from the heating furnace 110 to be introduced into the heating furnace 210, and discharged from the heating furnace 210 and introduced into the heating furnace 260. Therefore, inlets (not shown) and outlets (not shown) are also formed in the heating furnaces 110 and 260 to correspond to the inlet 211 and the outlet 213 of the heating furnace 210, respectively.

If the spaces between the adjacent heating furnaces 110, 210, 210, and 260 are not completely sealed, the heat treatment atmosphere of the substrate 50 formed in the heating furnaces 110, 210, and 260 is not continuously maintained. Then, productivity falls, for example, having to re-form the heat processing atmosphere of each heating furnace 110,210, and 260.

Inline heat treatment apparatus according to the present embodiment is a sealing member between the adjacent heating furnace (110, 210) (210, 260) in order to completely seal between the adjacent heating furnace (110, 210) (210, 260) 221 (refer FIG. 4).

In detail, a protruding rail 215 is formed on the right side of the heating furnace 210 so as to surround the outlet 213 and forms a closed loop, and the protruding rail 215 is provided along the protruding rail 215. ) Forms a closed loop. The sealing member 221 is inserted into the settling groove 215a. In addition, a protruding rail (not shown) is formed on the left side of the heating furnace 210 to surround the inlet 211, and a settling groove (not shown) is formed on the protruding rail.

The heating furnace 260 is also formed in the same way as the heating furnace 210, and the left portion of the sealing member 221 interposed between the heating furnace 210 and the heating furnace 260 is settled groove ( 215a) is inserted and placed on the right side is a settling groove (not shown) formed in a shape surrounding the inlet (not shown) of the heating furnace 260. Thus, the heating furnace 210 and the heating furnace 260 are completely sealed by the sealing member 221, and the heat treatment atmosphere of the substrate 50 formed in each of the heating furnaces 210 and 260 is continuously maintained. . Therefore, productivity is improved.

The sealing structures of the heating furnace 110 and the heating furnace 210 are also the same as or similar to the sealing structures of the heating furnace 210 and the heating furnace 260.

The plurality of heaters 223 for heating the substrate 50 are installed inside the heating furnace 210 independently of each other and independently controlled. The heater 223 is formed in a tube shape and is disposed in a shape that crosses the conveying direction of the substrate 50 while having a mutual gap therebetween.

The heating furnace 210 is provided with a conveying means for mounting and supporting the substrate 50, then lifting the substrate 50 and transferring the substrate 50 to the adjacent second heating furnace 260. Then, since no friction force is generated between the transfer means and the substrate 50, particles are not generated due to wear of the transfer means or the substrate 50.

The transfer means will be described with reference to FIGS. 2 to 3 and 5 to 6. 5 and 6 are perspective views of the conveying means shown in FIG. 2, FIG. 5 is a view showing a state in which the first conveying plate 231 is raised, and FIG. 6 is a view showing a state in which the second conveying plate 235 is raised. It is also.

As shown, the transfer means has a transfer plate 230 and the support member 240.

The transfer plate 230 is provided to be capable of lifting and lowering vertically with respect to the transfer direction of the substrate 50 and to move forward or backward in parallel with the transfer direction of the substrate 50. The support member 240 is provided in plural, the lower end is coupled to the transfer plate 230 at a predetermined interval, and the substrate 50 is supported at the upper end. The support member 240 moves together with the transfer plate 230.

In more detail, the transfer plate 230 may have a first transfer plate 231 adjacent to each other with a plurality of first transfer plates 231 disposed to be parallel to the transfer direction of the substrate 50 with a distance therebetween. The plurality of second transfer plates 235 are disposed between the first transfer plates 231 in parallel with the transfer direction of the substrate 50.

The first transfer plate 231 transfers the substrate 50 while rising → moving forward → lowering → moving backward, and the second transfer plate 235 also transfers the substrate 50 while rising → moving forward → lowering → moving backward. At this time, the first transfer plate 231 and the second transfer plate 235 are moved independently. The plurality of first transfer plates 231 move in the same manner, and the plurality of second transfer plates 235 move in the same manner. To this end, the plurality of first transfer plates 231 are integrally connected to each other by the connecting member 232, and the plurality of second transfer plates 235 are integrally connected to each other by the connecting member 236.

The support member 240 has a plurality of first support members 241 respectively installed on the first transfer plate 231 and a plurality of second support members 245 respectively installed on the second transfer plate 235. In addition, the first and second support members 241 and 245 may include a pair of first and second vertical bars 241a and 245a having lower ends coupled to the first and second transfer plates 231 and 235, respectively. Each of the first and second vertical bars 241a and 245a is integrally formed with the first and second horizontal bars 241b and 245b on which the substrate 50 is mounted and supported.

Since the substrate 50 is in contact with the first and second horizontal bars 241b and 245b, the surfaces of the first and second horizontal bars 241b and 245b in contact with the substrate 50 may be rounded. . Then, scratches are prevented from occurring on the substrate 50 by the first and second horizontal bars 241b and 245b.

The first and second supporting members 241 and 245 are positioned between the heater 223 and the heater 223 which are adjacent to each other, and are raised in the gap between the heater 223 and the heater 223 which are adjacent to each other. Move forward → lower → backward.

Reference numerals 251, 253, 255 and 257 shown in FIGS. 2 and 3 are cylinders. Cylinders 251 and 253 move the first and second transfer plates 231 and 235 respectively, and cylinders 255 and 257 move the first and second transfer plates 231 and 235 forward or backward, respectively. Let's do it. In this case, the lower surfaces of the cylinders 251 and 253 are in contact with and supported by the lower surface of the heating furnace 210 to move forward or backward with the first and second transfer plates 231 and 235, respectively. The lower surface is in contact with and supported on the side of the heating furnace 210 to move up and down with the first and the first transfer plate (231, 235), respectively.

The operation of the transfer plate 230 and the support member 240 will be described with reference to FIGS. 2 to 3 and 5 to 6.

It is assumed that the first and second transfer plates 231 and 235 are positioned at the same position, and the state in which the substrate 50 is mounted and supported on the first and second support members 241 and 245 is an initial state.

In the initial state, when the substrate 50 is to be transferred, the cylinder 251 (see FIGS. 2 and 3) is operated to raise the first transfer plate 231, and then the cylinder 255 (see FIG. 2). To advance the first transfer plate 231. Then, the substrate 50 mounted on the first support member 241 is raised and then advanced and transferred in the right direction. At this time, it is natural that the first transfer plate 231 advances a distance shorter than an interval between the heater 223 and the heater 223 adjacent to each other.

Thereafter, when the cylinder 251 is operated to lower the first transfer plate 231 to the bottom dead center, the substrate 50 is simultaneously supported by the second support member 245 while being supported by the first support member 241. Mounted and supported. When the substrate 50 is mounted on the second support member 245, the cylinder 253 (see FIGS. 2 and 3) is operated to raise the second transfer plate 235.

When the second transfer plate 235 is raised to support the substrate 50 only by the second support member 245, the cylinder 255 is operated to reverse the first transfer plate 231. At the same time, the second transfer plate 235 is raised to the top dead center.

The reason why the second transfer plate 235 is first raised in a state where the substrate 50 is simultaneously supported by the first and second support members 241 and 245 is because the substrate 50 and the first support member 241 and This is to prevent the substrate 50 and the second support member 245 from rubbing.

Thereafter, when the second transfer plate 235 is advanced by operating the cylinder 257 (see FIGS. 2 and 3), the substrate 50 is also advanced and further transferred in the right direction. At this time, it is natural that the second transfer plate 235 advances a distance shorter than an interval between the heater 223 and the heater 223 adjacent to each other.

Then, when the cylinder 253 is operated to lower the second transfer plate 235 to the bottom dead center, the substrate 50 is simultaneously supported by the first support member 241 while being supported by the second support member 245. Mounted and supported. When the substrate 50 is mounted on the first support member 241, the cylinder 251 is operated to raise the first transfer plate 231.

When the first transfer plate 231 is raised to support the substrate 50 only by the first support member 231, the cylinder 257 is operated to reverse the second transfer plate 235. The reason why the first transfer plate 231 is first raised in a state in which the substrate 50 is simultaneously supported by the first and second support members 231 and 235 is, as described above, the substrate 50 and the first support. This is to prevent friction between the member 231, the substrate 50, and the second support member 235.

When the first transfer plate 231 is advanced by operating the cylinder 251, the substrate 50 is also advanced and further transferred in the right direction. As described above, the substrate 50 is transferred because the first transfer plate 231 and the second transfer plate 235 are continuously moved in an alternating manner.

In the inline heat treatment apparatus according to the present exemplary embodiment, since there is no friction between the substrate 50 and the components for transferring the substrate 50, not only particles are prevented from being generated, but also the components for transferring the substrate 50 are worn out. Is prevented.

The configuration of the first heating furnace 210 and the configuration of the second and third heating furnaces 260 and 270 shown in FIG. 1 are the same or similar. In addition, the sealing structures of the heating furnace 260 and the heating furnace 270 is the same as or similar to the sealing structures of the heating furnace 210 and the heating furnace 260.

In addition, the heater 223 and the transfer means installed in the first heating furnace 210 of the heating unit 200 may be installed in the loading unit 100.

As shown in FIG. 1, the process unit 300 includes a heating furnace 310, and heat-processes the substrate 50 transferred from the temperature raising unit 200 at a predetermined heat treatment temperature. The configuration of the heating furnace 310 of the process unit 300 is also the same as or similar to the configuration of the heating furnace 210 of the temperature raising unit 200. In addition, the sealing structures of the heating furnace 310 and the heating furnace 270 is the same as or similar to the sealing structures of the heating furnace 210 and the heating furnace 260.

As shown in FIG. 1, the transfer part 400 includes a heating furnace 410, and an inlet (not shown) is formed at an upper side of the left side to communicate with the right side of the heating furnace 310 of the processing unit 300. . The heating furnace 410 receives the substrate 50 from the process unit 300 and vertically transfers the substrate 50 downward. The substrate 50 is transported downward by lifting means such as a jig (not shown) installed in the heating furnace 410 so as to be liftable. The substrate 50 is slowly cooled while being transferred from the upper side to the lower side of the heating furnace 410.

The heater 223 and the transfer means installed in the heating furnace 210 of the heating unit 200 may also be installed in the heating furnace 410 of the transfer unit 400. The sealing structures of the heating furnace 410 and the heating furnace 310 are the same as or similar to the sealing structures of the heating furnace 210 and the heating furnace 260.

The cooling unit 500 includes a heating furnace 510 and cools the substrate 50 transferred from the transfer unit 400 to a predetermined temperature and then transfers the unloaded unit 600. The length of the heating furnace 510 of the cooling unit 500 is appropriately formed in consideration of the heat treatment temperature. In addition, the cooling unit 500 may be provided with various cooling means for uniformly cooling the substrate 50.

In the in-line heat treatment apparatus according to the present embodiment, the heating furnace 510 of the cooling unit 500 is positioned below the process unit 300 and the temperature raising unit 200. Then, since the in-line heat treatment apparatus according to the present embodiment has a two-layer structure, during the heat treatment of the substrate 50, the moving distance of the worker is shortened, and the productivity is improved.

The configuration of the heating furnace 510 of the cooling unit 500 is also the same as or similar to the configuration of the heating furnace 210 of the temperature raising unit 200. In addition, a discharge port (not shown) is formed at a lower left side of the heating surface 410 of the transfer part 400 to communicate with the heating furnace 510 of the cooling part 500. The sealing structures of the heating furnace 510 and the heating furnace 410 are the same as or similar to the sealing structures of the heating furnace 210 and the heating furnace 260.

The unloading unit 600 includes a heating furnace 610 and is configured to be the same as or similar to the loading unit 100 and positioned below the loading unit 100. The substrate 50 transferred to the unloading part 600 is uniformly cooled to, for example, 100 ° C. or less so as not to be deformed, and then transferred to the next step. In this case, the unloading unit 600 may be provided with a heater (not shown) capable of heating the upper surface of the substrate 50 to uniformly cool the substrate 50.

The sealing structures of the heating furnace 610 and the heating furnace 510 are the same as or similar to the sealing structures of the heating furnace 210 and the heating furnace 260.

In-line heat treatment apparatus according to this embodiment is between the heating furnace (110, 210) (210, 260) (260, 270) (270, 310) (310, 410) (410, 510) (510, 610) adjacent to each other Is completely sealed by the sealing member. Therefore, since the heat treatment atmosphere of the substrate 50 formed in each of the heating furnaces 110, 210, 260, 270, 310, 410, 510, and 610 is continuously maintained, productivity is improved.

In-line heat treatment apparatus according to this embodiment is between the heating furnace (110, 210) (210, 260) (260, 270) (270, 310) (310, 410) (410, 510) (510, 610) adjacent to each other Since is completely sealed, the load lock unit 700 in the loading unit 100 and the unloading unit 600 may be continuously installed, respectively.

A gate valve (not shown) is installed between the load lock part 700 and the loading part 100 and between the load lock part 700 and the unloading part 600 to mutually connect the load lock part 700 and the loading part 100. Communication or blocking, and the load lock unit 700 and the unloading unit 600 to communicate or block each other.

In the inline heat treatment apparatus according to the present exemplary embodiment, since the load lock part 700 is installed, the first state of injecting the substrate 50 into the loading part 100 and the heat treated substrate 50 to heat the substrate 50. Even in the last state discharged from the unloading unit 600, the loading unit 100, the temperature raising unit 200, the processing unit 300, the transfer unit 400, the cooling unit 500, and the unloading unit ( Since 600 is completely sealed, the heat treatment atmosphere of the substrate 50 is continuously maintained. Therefore, productivity is improved.

In-line heat treatment apparatus according to the present embodiment, the heating furnace 110, 210, 210, 260 (260, 270) (270, 310) (310, 410) (410, 510) (510, 610) adjacent to each other When the substrate 50 is transferred between the heaters 110, 210, 210, 260, 260, 270, 270, 310, 310, 510, 510, 420, 420, 510 which are adjacent to each other. It is preferable that the first conveying plates respectively installed on the same movement move, and the second conveying plates move the same.

The drawings of the embodiments of the present invention described above are schematically illustrated so as to easily understand the parts belonging to the technical idea of the present invention by omitting detailed outline lines. It should be noted that the above-described embodiments are not intended to limit the technical spirit of the present invention and are merely a reference for understanding the technical scope of the present invention.

100: loading unit 200: heating unit
300: process part 400: transfer part
500: cooling unit 600: unloading unit
700: road lock part

Claims (12)

An inline heat treatment apparatus in which a loading section, a heating section, a processing section, a conveying section, a cooling section, and an unloading section each have a heating furnace that provides a space where a substrate is heat-treated, are sequentially disposed.
An inlet through which the substrate is introduced and discharged into one side and the other side of the heating furnace of the loading part, the heating furnace of the heating part, the heating furnace of the process part, the heating furnace of the cooling part, and the heating furnace of the unloading part; And outlets are respectively formed,
An inlet for receiving the substrate from the process unit is formed in communication with the discharge port of the heating furnace of the process unit in the upper side of the heating furnace of the transfer unit, and the inlet of the heating furnace of the cooling unit in the lower side In communication there is formed an outlet for transferring the substrate to the cooling unit,
And the outlet of one of the heating furnaces adjacent to each other and the outlet of the other of the heating furnaces communicate with each other and are sealed to the outside by a sealing member. delete The method of claim 1,
In each of the heating furnace, a settling groove is formed in a form surrounding the inlet and the outlet, respectively,
One side and the other side portion of the sealing member is inline heat treatment apparatus, characterized in that each of the settled in the settling groove of the one of the heating furnace adjacent to each other and the settled groove of the other. The method of claim 3,
And each protruding rail is formed in each of the heating furnaces so as to surround the inlet and the outlet, and the settling groove is formed in the protruding rail. 5. The method of claim 4,
And the cooling unit is located under the temperature raising part and the process part, and the loading part is located under the unloading part. The method of claim 5,
In-line heat treatment apparatus, characterized in that the load lock portion (Load Lock) is continuously installed in the loading portion and the unloading portion. The method of claim 1,
In each of the heating furnace is provided with a transfer plate capable of lifting and lowering movement perpendicular to the transfer direction of the substrate and at the same time forward or backward movement parallel to the transfer direction of the substrate,
Inline heat treatment, characterized in that the transfer plate is coupled to the transfer plate one side and the other side is supported by the substrate is moved with the transfer plate is provided with a plurality of support members for transferring the substrate to another adjacent heating furnace Device. The method of claim 7, wherein
The conveying plates are arranged with a mutual gap therebetween and are equally raised → forwarded → lowered → a plurality of first conveying plates that are reversed, and are disposed between the first conveying plate and the first conveying plate adjacent to each other and are raised equally → With a plurality of second conveying plates to move forward → lower → reverse,
The first transfer plate and the second transfer plate moves independently,
And the supporting member has a plurality of first supporting members respectively provided on the first conveying plate and a plurality of second supporting members respectively provided on the second conveying plate. 9. The method of claim 8,
The first support member has a pair of first vertical bars having one end coupled to the first transfer plate and a first horizontal bar integrally formed at the other end of the first vertical bar, and supporting the substrate.
The second supporting member has a pair of second vertical bars coupled to the second transfer plate at one end thereof and integrally formed at the other end of the second vertical bar, and has a second horizontal bar supporting the substrate. Inline heat treatment device. 10. The method of claim 9,
And the portions of the first and second horizontal bars in contact with the substrate are rounded. The method of claim 10,
Each of the heating furnaces are formed in a tube shape, a plurality of heaters are arranged to have a mutually spaced and intersecting the transfer direction of the substrate, respectively,
And the first and second supporting members are positioned between the heaters adjacent to each other and the heaters to move up, forward, fall, or backward in a gap between the heaters adjacent to each other and the heaters. The method of claim 11,
When the substrate is transferred from one of the heating furnaces adjacent to each other to the other of the heating furnaces,
The first transfer plate installed in one of the heating furnaces and the first transfer plate installed in the other one of the heating furnaces move in the same manner,
And the second transfer plate installed in one of the heating furnaces and the second transfer plate installed in the other one of the heating furnaces move in the same manner.

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