JP2002329763A - Connecting structure between hermetic chambers - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide connecting structure for connecting between hermetic chambers which neither increases a foot-print and value of an apparatus, nor decreases a throughput, nor transmits a vibration of one hermetic chamber to the other hermetic chamber in an apparatus for manufacturing a semiconductor. SOLUTION: The connecting structure connects a plurality of hermetic chambers used in a semiconductor manufacturing apparatus. A hollow connecting component 6 consists of two flanges 6a, 6b having hermetic seals 6j, 6k on connecting surfaces 6d, 6e and a bellows 6c for joining hermetically between the two flanges 6a, 6b together, and the flange 6a of the connecting component 6 is hermetically connected to the hermetic chamber 1 and the other flange 6b is hermetically connected to the other hermetic chamber 2.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a connection structure between airtight chambers used in a semiconductor manufacturing apparatus or the like.

[0002]

2. Description of the Related Art A conventional connection structure of hermetic chambers will be described using a semiconductor manufacturing apparatus as an example. [First Prior Art] FIG. 6 is a plan view of a multi-chamber system described in Japanese Patent Application Laid-Open No. 5-304197. In this apparatus, four process chambers 23, 24, and 24 are arranged around a robot chamber 22 in which a transfer robot 21 is installed.
25 and 26 and one handling chamber 27 are arranged, each chamber is configured as an airtight chamber, and a valve box is provided between the robot chamber 22 and the process chambers 23 to 26 and the handling chamber 27, respectively. Are connected by gate valves 28, 29, 30, 31 and 32. The atmosphere in each airtight chamber is controlled by the gate valves 28 to 32.
Are integrated or separated by opening and closing. [Second Prior Art] FIG. 7 illustrates a cross-sectional configuration diagram of a multi-chamber type sputtering apparatus described in Japanese Patent Laid-Open No. 5-98434 assuming that a valve box of a gate valve is omitted. This device is a load lock chamber 3 from the left.
3, a robot room 34 and a process room 35. A transfer robot 36 is provided inside the robot chamber 34.
Is installed. The load lock chamber 33, the robot chamber 34, and the process chamber 35 are configured as airtight chambers, and are directly connected to each other. Gate valves 37 and 38 having no valve box are attached inside each airtight chamber. The atmosphere in each airtight chamber is integrated or isolated by opening and closing the gate valves 37 and 38.

[0003]

However, such prior arts have the following problems, respectively. [Problem of First Prior Art] The transfer robot 21 transfers a wafer between the hermetic chambers 22 to 26, and the gate valves 28 to 32 isolate the pressure and atmosphere between the hermetic chambers 22 to 26. The opening and closing operation of the valve body is performed. The transfer robot 21 transfers the wafer taken out of the handling chamber 27 to the process chamber 23, and the processing of the wafer starts in the process chamber 23 after the valve of the gate valve 29 installed at the entrance of the process chamber 23 is closed. Thereafter, the transfer robot 21 transfers the wafers in the order of the process chambers 24 to 26, and transfers them to the handling chamber 27 when each process is completed.
Further, a gate valve 28 installed at the entrance of the handling chamber 27 opens and closes the valve body. Thus, since each airtight chamber is connected via the gate valve,
During the wafer processing, the transfer robot 21 and the gate valve 28
Operates, vibrations generated by these operations are transmitted to the processing chamber via the valve box of the fixed gate valve in the robot room. In particular, in an exposure apparatus that draws a circuit pattern on a wafer in a process chamber, if there is vibration from another hermetic chamber, the vibration is transmitted to a drawing mechanism or a drawing stage, thereby improving the drawing accuracy of the circuit pattern. There are serious problems related to manufacturing quality such as deterioration. [Problem of the Second Prior Art] Next, in the case of the second prior art, the robot chamber 34 and the process chamber 35 are directly connected to each other. Operates, vibrations generated by these operations are transmitted directly from the outer wall of the robot chamber 34 to the outer wall of the process chamber 35. As a countermeasure, it is conceivable to stop the transfer robot 36 and the gate valve 38 during the processing so as not to generate vibration. However, since this causes a remarkable reduction in the throughput of the apparatus, it can be said that this is a realistic countermeasure. Absent. For this reason, an active damper is generally provided on a gantry supporting the process chamber. This is a method of controlling vibration by giving an opposite phase of the vibration transmitted from outside the process chamber to the processing chamber.
However, the active damper is a large and complicated device and requires a control panel. Therefore, the semiconductor device becomes large-scale, the footprint of the device increases,
There is a problem that the increase in cost is large. The present invention
In order to solve such a problem, in a semiconductor manufacturing apparatus or the like, without increasing the footprint and price of the apparatus, without decreasing the throughput, and reducing the vibration of one airtight chamber to the other. It is an object of the present invention to provide a connection structure between airtight chambers that does not transmit to the airtight chambers.

[0004]

SUMMARY OF THE INVENTION In order to solve the above problems, the present invention relates to a connecting structure for connecting a plurality of hermetic chambers used in a semiconductor manufacturing apparatus or the like, wherein the connecting surface has an airtight seal. A hollow connecting member is constituted by two flanges and a bellows that connects between the two flanges to hermetically seal and integrate, and one flange of the connecting member is closely connected to one airtight chamber, and Is tightly connected to the other airtight chamber. In addition, a gap is provided between the connection surface of one flange and the connection surface of the airtight chamber to ensure the sealing and cushioning of the airtight seal formed by the O-ring seal, and only the airtight seal is connected to the airtight chamber. The one flange and the connection surface of the airtight chamber are connected by pressing and contacting the surface.

[0005]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a side sectional view showing a first embodiment of the present invention. This FIG.
Between two airtight chambers, ie, robot room 1 and process room 2
3 shows a connection structure between the two. A transfer robot 3 having an arm 3 a is installed inside the robot chamber 1, and a wafer holder 4 is installed inside the process chamber 2. Robot room 1 and process room 2
Are facing each other, and a port 1a and a port 2a are provided as connecting portions on the surfaces facing each other. The robot chamber 1 is provided with a gate valve 5 of a direct mount type for isolating the atmosphere of the port 1a and a gate valve 5a for isolating the robot chamber 1 from the atmosphere. The robot chamber 1 and the process chamber 2 are connected by a cylindrical connecting member 6 at the port 1a and the port 2a. The connection member 6 includes two flanges 6a made of metal such as stainless steel or an aluminum alloy.
6b and a bellows 6c connecting between the flanges 6a and 6b. The flanges 6a, 6b and the bellows 6c are tightly fixed by welding or the like to form an airtight integrated component. The flange 6a
The connection surface 6d of the flange 6b is firmly connected to the connection surface 1b around the port 1a of the robot chamber 1 by a bolt 6f or the like. The connection surface 2b of the flange 6b is connected to the periphery of the port 2a of the process chamber 2. Bolt 6 on the connecting surface 6e of
It is strongly connected by g or the like. In addition, ring-shaped seal grooves 6h and 6i are provided on the connecting surfaces 6d and 6e of the flanges 6a and 6b, respectively.
h, 6i, an airtight seal 6 such as an O-ring seal
j and 6k are inserted and fixed. Therefore, the flange 6a is firmly connected to the connecting surface 1b of the robot chamber 1, and the flange 6b is firmly connected to the connecting surface 2b of the process chamber 2.
The process chamber 2 and the process chamber 2 are air-tightly connected via the connection member 6. In this connection structure, the vibration generated by the operation of the transfer robot 3 and the gate valve 5a in the robot 1 is absorbed by the bellows 6c having a large elastic deformability constituting the connection member 6, so that the robot chamber 1 It is not easily transmitted to the process chamber 2. Therefore, even during the process of drawing a circuit pattern on a wafer in the process chamber 2, the vibration from the robot chamber 1
It is hardly transmitted to the drawing mechanism section and the drawing stage section, and the drawing accuracy of the circuit pattern is maintained in a high state. Since the wafer 3 passing through the cylindrical connecting member 6 and the arm 3a of the transfer robot 3 have a flat rectangular shape, the flange 6 is used to pass them through the hollow.
Preferably, a, 6b and the bellows 6c have a rectangular cross section, and the size is preferably equal to or larger than the size of the ports 1a, 2b. [Second Embodiment] FIG. 2 is a side sectional view showing a second embodiment of the present invention. In the second embodiment, the flanges 6a and 6b of the connecting member 6 shown in the first embodiment are connected to the connecting surfaces 1b and 2 of an airtight chamber such as the robot chamber 1 and the process chamber 2.
It is designed to be floated from b and mounted in a bufferable manner. That is, as shown in FIG. 2, instead of firmly fixing at least one flange, for example, the connecting surface 6e of the flange 6b to the mating airtight chamber, for example, the connecting surface 2b of the process chamber 2, the O-ring seal is hermetically sealed. The airtight seal 6k is floated from the connection surface 2b of the process chamber 2 via the airtight seal 6k so that only the airtight seal 6k is pressed and adhered to the connection surface 2b of the process chamber 2. In this case, the connection between the flange 6b and the process chamber 2 is left between the connection surface 6e of the flange 6b and the connection surface 2b of the process chamber 2 while leaving a gap large enough to ensure the sealing and cushioning of the hermetic seal 6k. The surfaces 2b are connected. By doing so, the hermetic seal 6k can also be used as a vibration absorber, so that the vibration generated in the robot chamber 5 is less likely to be transmitted to the process chamber 6. [Third Embodiment] FIG. 3 is a side sectional view showing a third embodiment of the present invention. In the third embodiment, the structure of the connecting member in the second embodiment is different from that of the second embodiment, and the positioning of one flange is facilitated during the connection. That is, the two flanges 6a, 6b are respectively connected to the bolts 6f,
Instead of using 6 g or the like to fix to the mating airtight chamber, for example, the connecting surfaces 1 b and 2 b of the robot chamber 1 and the process chamber 2, one flange 6 a is used as a fixing flange and a bolt 6 f is used.
The other flange 6b is used as a non-fixing flange, and only the hermetic seal 6k is used as the non-fixing flange, and only the hermetic seal 6k is used in the other hermetic chamber, for example, a process. The connection is made by pressing against the connection surface 2b of the chamber 2. The connecting member 6 in the third embodiment has a configuration in which a plurality of telescopic devices 6m are arranged between the flanges 6a and 6b around the bellows 6c. The extension device 6m is, for example, a screw 6
n, 6p and a nut 6q. Screws 6n and 6p of the telescopic device 6m are flanges 6a,
6b, the distance between the flanges 6a and 6b expands and contracts by rotating the nut 6q. A plurality of telescopic devices 6m are provided on the circumference of the flanges 6a and 6b, and the bellows 6c expands and contracts by coordinating them to adjust the length of the connecting member 6. When connecting the robot room 1 and the process chamber 2 using the connecting member 6, for example, first, the telescopic device 6m is operated to make the total length of the connecting member 6 shorter than the distance between the robot room 1 and the process chamber 2. I do. In this state, the connecting member 6 is
It is inserted between the robot room 1 and the process room 2 and connected to the robot room 1 using bolts 6f. After that, the extension device 6m
Is operated to extend the entire length of the connecting member 6, and the space between the non-fixing flange 6b and the process chamber 2 is maintained in a state where the sealing property and the cushioning property of the hermetic seal 6k using the O-ring seal are ensured. Adjust so that a gap remains. At this time, as described above, one of the flanges, for example, the flange 6a on the robot chamber 1 side is connected to the connecting surface 1b of the robot chamber 1 with the bolt 6f.
The other flange, for example, the flange 6b on the process chamber 2 side is separated from the connection surface 2b of the process chamber 2 so that only the hermetic seal 6k is pressed against the connection surface 2b of the process chamber 2. To Flange 6b
The gap between the connecting surface 6e of the flange 6b and the connecting surface 2b of the process chamber 2 secured when connecting the connecting surface 6e of the process chamber 2 and the connecting surface 2b of the process chamber 2 is airtight as in the second embodiment. The dimensions are set so as to ensure the sealing performance and the cushioning performance of the seal 6k (O-ring seal). By doing so, it is possible to reduce the transmission of the vibration from the robot chamber 1 to the process chamber 2 by the hermetic seal 6k ensuring the buffering property, and to reduce the expansion and contraction device 6m.
Therefore, no matter where the one flange 6b is located, the one flange 6b can be pressed against the process chamber 2 with a sufficient pressure. 6b can be easily positioned. The operation of the telescopic device 6m is facilitated by replacing the manual type with a drive type using an air cylinder, a motor, or the like as a drive source. Further, the extension device 6
After replacing m with the drive type, the non-fixing flange 6b
A function of detecting the distance between the connecting surface 6e of the first process and the connecting surface 6e of the process chamber 2 to control the driving type telescopic device 6m, or the connecting surface of the non-fixing flange 6b and the connecting surface of the process chamber 2. By adding the function of detecting the pressing pressure between the airtight seal 6k and the driving type telescopic device 6m, the sealing property and the cushioning property of the hermetic seal 6k can be reduced.
Is maintained optimally over the entire circumference. [Fourth Embodiment] FIG. 4 is a side sectional view showing a fourth embodiment of the present invention. This fourth embodiment is different from the apparatus shown in the third embodiment in that a gate valve 5 is provided in the process chamber 2.
In addition to the letter “b”, the connecting member 6 is provided with an exhaust device 10 including a vacuum exhaust or gas replacement pipe 7, a sealing valve 8, and an exhaust pump 9. After transferring the wafer from the robot chamber 1 to the process chamber 2, the gate valves 5 and 5 b are closed, and the inside of the connecting member is opened to the atmosphere from a leak valve (not shown) of the exhaust pump 9.
By contracting the telescopic device 6m, the non-fixing flange 6
If the airtight seal 6k composed of an O-ring seal does not contact between the connecting surface 6e of the robot room 1b and the connecting surface 1b of the robot chamber 1 as an airtight chamber, the vibration generated in the robot chamber 1 is reduced. Does not reach the process chamber 2 completely. When the separated airtight chambers, for example, the robot chamber 1 and the process chamber 2 are connected again, the expansion / contraction device 6m is extended to bring the airtight seal 6k of the non-fixing flange 6b into press contact with the connection surface of the process chamber 2. And the exhaust pump 9
To exhaust to approximately the same pressure as the robot chamber 1 and the process chamber 2. Thereafter, by opening the gate valves 5 and 5b, the wafer between the robot chamber 1 and the process chamber 2 can be transferred. Thereby, it has a function of integrating and isolating the atmosphere between the hermetic chambers such as the robot chamber 1 and the process chamber 2, and does not transmit the vibration of the robot chamber 1 to the process chamber 2 without lowering the throughput. A new unit with a closed room connection is obtained. [Fifth Embodiment] FIG. 5 is a side sectional view showing a fifth embodiment of the present invention. In the fifth embodiment, a connecting member 6 shown in the third embodiment is added to a gate valve 5c having a valve box 5d disposed between the robot chamber 1 and the process chamber 2. As shown in FIG. 5, in the valve box 5d,
The exhaust device 10 shown in the fourth embodiment is attached, and the valve box 5
The gate valve 5c with d and the connecting member 6 are fastened or unitized. Accordingly, even when the process chamber 2 does not have a direct mount type gate valve, it is possible to directly attach the entire unit to the chamber outer wall of the process chamber 2. The connection and exhaust may be performed in the same manner as in the method described in the fourth embodiment. Of course, the piping 7 for vacuum evacuation or gas replacement, the sealing valve 8 and the evacuation pump 9 may be attached to the connecting member 6 side. In the first to fifth embodiments, the sealing grooves 6h and 6i are provided on the connecting surfaces 6d and 6e of the flanges 6a and 6b so that the processing is simple and the handling is easy. Alternatively, it may be formed on the connecting surfaces 6d and 6e between the robot chamber 1 and the process chamber 2.

[0006]

As described above, the present invention has the following effects. (1) Even when a wafer is being processed in the process chamber, robots and other units can operate in other hermetic chambers, so vibration from the hermetic chamber outside the process chamber can be applied to the process chamber without reducing throughput. It is possible to provide a connection structure between the airtight chambers that does not transmit. (2) Since the connection structure can be realized with a simple configuration, the cost can be reduced. (3) Since the vibration is not transmitted to the processing chamber, the processing quality of the apparatus is remarkably improved, and the maintenance of the mechanism of the processing chamber can be reduced. (4) By attaching to a gate valve with a valve box,
A gate valve integrated with a connecting member having a vibration reducing function can be easily realized.

[Brief description of the drawings]

FIG. 1 is a side sectional view showing a first embodiment of the present invention, showing an example in which a connecting member is incorporated between a robot chamber and a process chamber.

FIG. 2 is a side sectional view of a main part showing a second embodiment of the present invention.

FIG. 3 is a side sectional view of a main part showing a third embodiment of the present invention.

FIG. 4 is a side sectional view of a main part showing a fourth embodiment of the present invention.

FIG. 5 is a side sectional view of a main part showing a fifth embodiment of the present invention, showing an example in which a connecting member is incorporated between a gate valve with a valve box and a robot chamber.

FIG. 6 is a plan view showing a first conventional technique.

FIG. 7 is a front view showing a second conventional technique.

[Explanation of symbols]

 1 robot room, 1a port, 1b connecting surface, 2 process room, 2a port, 2b connecting surface, 3 transfer robot, 4 wafer holder, 5, 5a, 5b, 5c gate valve, 5d valve box, 6 connecting member, 6a, 6b Flange, 6c bellows, 6d, 6e connection surface, 6f, 6g bolt, 6h, 6i seal groove, 6j, 6k airtight seal, 6m telescopic device 6n, 6p screw, 6q nut, 7 piping, 8 sealing valve, 9 exhaust pump , 10 exhaust device, 21 transfer robot, 22 robot room, 23 to 26 process room, 27 handling room, 28 to 32 gate valve, 33 load lock room, 34 robot room, 35 process room, 36 transfer robot, 37, 38 gate valve

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Takeo Suzuki 2-1 Kurosaki Castle Stone, Yawatanishi-ku, Kitakyushu-shi, Fukuoka F-term (reference) 5F031 CA02 FA01 FA02 GA02 JA01 JA45 JA47 LA07 LA12 LA15 MA01 MA07 NA05 NA07 PA30 5F046 AA22 AA23

Claims (10)

[Claims] 1. A connecting structure for connecting a plurality of hermetic chambers used in a semiconductor manufacturing apparatus or the like, comprising: two flanges having an airtight seal on a connecting surface;
And a bellows that connects and tightly integrates the two flanges to form a hollow connection member. One flange of the connection member is closely connected to one airtight chamber, and the other flange is connected to the other airtight chamber. A connection structure between airtight chambers, which is closely connected to the airtight chamber. 2. The connection structure between airtight chambers according to claim 1, wherein the airtight seal provided on the connection surface of at least one of the flanges is an O-ring seal. 3. A gap is provided between the connecting surface of the one flange and the connecting surface of the airtight chamber so as to ensure the sealing and cushioning of the airtight seal, and only the airtight seal is provided on the connecting surface of the airtight chamber. The connection structure for an airtight chamber according to claim 2, wherein the connection surface between the one flange and the airtight chamber is connected so as to be in close contact with each other. 4. The connecting member, wherein one of the two flanges is a fixing flange,
The other flange is a non-fixing flange, and further comprises a plurality of bellows expanding / contracting devices arranged between the fixing flange and the non-fixing flange and on the outer peripheral portion of the bellows. The airtight chamber connection structure according to claim 3. 5. The airtight chamber connection structure according to claim 4, wherein the expansion and contraction device is a manual type including a screw and a nut. 6. The airtight chamber connection structure according to claim 4, wherein the expansion / contraction device is of a driving type using an air cylinder, a motor, or the like as a driving source. 7. A function of detecting a distance between a connection surface of the non-fixing flange and a connection surface of the airtight chamber to control the drive type telescopic device, or a function of detecting the distance between the connection surface of the non-fixing flange and the airtight room. 7. The connection structure for an airtight chamber according to claim 6, further comprising a function of detecting a pressing force between the connection surface and the drive type telescopic device. 8. The airtight system according to claim 1, wherein the connecting member is disposed between the airtight chamber and a gate valve provided with a valve box provided outside the airtight chamber. Closed room connection structure. 9. The connecting member or a valve box of a gate valve with a valve box, wherein a pipe for vacuum exhaust or gas replacement, a sealing valve, and an exhaust pump are attached. The connection structure of an airtight chamber according to any one of the above items. 10. The airtight chamber connection structure according to claim 1, wherein a cross-sectional shape of the bellows is rectangular.