KR101231731B1 - 다기능 x-선 분석 시스템 - Google Patents
다기능 x-선 분석 시스템 Download PDFInfo
- Publication number
- KR101231731B1 KR101231731B1 KR1020050087778A KR20050087778A KR101231731B1 KR 101231731 B1 KR101231731 B1 KR 101231731B1 KR 1020050087778 A KR1020050087778 A KR 1020050087778A KR 20050087778 A KR20050087778 A KR 20050087778A KR 101231731 B1 KR101231731 B1 KR 101231731B1
- Authority
- KR
- South Korea
- Prior art keywords
- sample
- rays
- detector
- angle
- scattered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/2055—Analysing diffraction patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
- G01N15/0806—Details, e.g. sample holders, mounting samples for testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20075—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring interferences of X-rays, e.g. Borrmann effect
Landscapes
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Dispersion Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/946,426 | 2004-09-21 | ||
| US10/946,426 US7120228B2 (en) | 2004-09-21 | 2004-09-21 | Combined X-ray reflectometer and diffractometer |
| US11/200,857 | 2005-08-10 | ||
| US11/200,857 US7551719B2 (en) | 2004-09-21 | 2005-08-10 | Multifunction X-ray analysis system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20060051491A KR20060051491A (ko) | 2006-05-19 |
| KR101231731B1 true KR101231731B1 (ko) | 2013-02-08 |
Family
ID=36619748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020050087778A Expired - Lifetime KR101231731B1 (ko) | 2004-09-21 | 2005-09-21 | 다기능 x-선 분석 시스템 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5031215B2 (https=) |
| KR (1) | KR101231731B1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190088463A (ko) * | 2016-09-19 | 2019-07-26 | 소레크 뉴클리어 리서치 센터 | 샘플을 식별하는 xrf 시스템과 방법 |
| KR102135213B1 (ko) * | 2020-01-10 | 2020-07-17 | 주식회사 에이피엔 | 초점 조절 방식의 방사선 콜리메이터 장치 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7120228B2 (en) * | 2004-09-21 | 2006-10-10 | Jordan Valley Applied Radiation Ltd. | Combined X-ray reflectometer and diffractometer |
| KR20080015735A (ko) * | 2006-08-15 | 2008-02-20 | 조르단 밸리 세미컨덕터즈 리미티드 | X선 빔 스폿 크기 제어 |
| JP5081556B2 (ja) * | 2007-09-28 | 2012-11-28 | 株式会社リガク | デバイシェラー光学系を備えたx線回折測定装置とそのためのx線回折測定方法 |
| US8903044B2 (en) * | 2011-01-31 | 2014-12-02 | Rigaku Corporation | X-ray diffraction apparatus |
| US9588066B2 (en) * | 2014-01-23 | 2017-03-07 | Revera, Incorporated | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
| CN110567997B (zh) * | 2019-10-11 | 2024-07-12 | 中国科学院上海应用物理研究所 | 一种用于散射实验站的真空腔体组件 |
| EP3845891B1 (en) * | 2019-12-30 | 2022-02-09 | Xenocs SAS | X-ray scattering apparatus |
| CN119958472B (zh) * | 2024-12-31 | 2025-11-21 | 深圳中科飞测科技股份有限公司 | 一种x射线散射量测设备、监控方法及介质 |
| CN119915852A (zh) * | 2025-02-14 | 2025-05-02 | 深圳市埃芯半导体科技有限公司 | 一种基于x射线小角衍射的晶圆检测系统及方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004245840A (ja) * | 2003-02-12 | 2004-09-02 | Jordan Valley Applied Radiation Ltd | 小角散乱測定を含むx線反射率測定 |
| JP2004257914A (ja) * | 2003-02-27 | 2004-09-16 | Shimadzu Corp | X線透視装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0666741A (ja) * | 1992-08-24 | 1994-03-11 | Mc Sci:Kk | X線回折装置 |
| JPH08313458A (ja) * | 1995-05-17 | 1996-11-29 | Rigaku Corp | X線装置 |
| JP3519203B2 (ja) * | 1996-02-20 | 2004-04-12 | 理学電機株式会社 | X線装置 |
| JP2904191B2 (ja) * | 1997-06-23 | 1999-06-14 | 日本電気株式会社 | X線回折顕微方法およびx線回折顕微装置 |
| US6317483B1 (en) * | 1999-11-29 | 2001-11-13 | X-Ray Optical Systems, Inc. | Doubly curved optical device with graded atomic planes |
| JP3548556B2 (ja) * | 2001-12-28 | 2004-07-28 | 株式会社リガク | X線回折装置 |
| DE60334910D1 (de) * | 2002-08-02 | 2010-12-23 | X Ray Optical Sys Inc | Optische Vorrichtung aus einer Vielzahl von gekrümmten optischen Kristallen zum Fokussieren von Röntgenstrahlen |
-
2005
- 2005-09-21 JP JP2005274293A patent/JP5031215B2/ja not_active Expired - Lifetime
- 2005-09-21 KR KR1020050087778A patent/KR101231731B1/ko not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004245840A (ja) * | 2003-02-12 | 2004-09-02 | Jordan Valley Applied Radiation Ltd | 小角散乱測定を含むx線反射率測定 |
| JP2004257914A (ja) * | 2003-02-27 | 2004-09-16 | Shimadzu Corp | X線透視装置 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190088463A (ko) * | 2016-09-19 | 2019-07-26 | 소레크 뉴클리어 리서치 센터 | 샘플을 식별하는 xrf 시스템과 방법 |
| KR102426344B1 (ko) | 2016-09-19 | 2022-07-27 | 소레크 뉴클리어 리서치 센터 | 샘플을 식별하는 xrf 시스템과 방법 |
| KR102135213B1 (ko) * | 2020-01-10 | 2020-07-17 | 주식회사 에이피엔 | 초점 조절 방식의 방사선 콜리메이터 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006138837A (ja) | 2006-06-01 |
| KR20060051491A (ko) | 2006-05-19 |
| JP5031215B2 (ja) | 2012-09-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7551719B2 (en) | Multifunction X-ray analysis system | |
| US6895075B2 (en) | X-ray reflectometry with small-angle scattering measurement | |
| JP7308233B2 (ja) | 小角x線散乱計測計 | |
| US7076024B2 (en) | X-ray apparatus with dual monochromators | |
| US8731138B2 (en) | High-resolution X-ray diffraction measurement with enhanced sensitivity | |
| KR101242520B1 (ko) | 확산 반사의 측정에 의한 개량된 x선 측정장치 및측정방법 | |
| JP5009563B2 (ja) | 試料の検査方法および装置 | |
| US7130376B2 (en) | X-ray reflectometry of thin film layers with enhanced accuracy | |
| KR101231731B1 (ko) | 다기능 x-선 분석 시스템 | |
| US7035375B2 (en) | X-ray scattering with a polychromatic source | |
| JP2007285923A (ja) | 反射モードのx線回折を用いた限界寸法の測定 | |
| WO2006095467A1 (ja) | X線回折分析方法およびx線回折分析装置 | |
| JP2002005858A (ja) | 全反射蛍光x線分析装置 | |
| JP2001059825A (ja) | スリット付モノクロメータ、x線切換装置およびx線分析装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P18-X000 | Priority claim added or amended |
St.27 status event code: A-2-2-P10-P18-nap-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| D13-X000 | Search requested |
St.27 status event code: A-1-2-D10-D13-srh-X000 |
|
| D14-X000 | Search report completed |
St.27 status event code: A-1-2-D10-D14-srh-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20180126 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| FPAY | Annual fee payment |
Payment date: 20200128 Year of fee payment: 8 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 10 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 11 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 12 |
|
| PC1801 | Expiration of term |
St.27 status event code: N-4-6-H10-H14-oth-PC1801 Not in force date: 20250922 Ip right cessation event data comment text: Termination Category : EXPIRATION_OF_DURATION |