KR101161467B1 - Coating and developing apparatus, control method of coating and developing apparatus and recording medium - Google Patents
Coating and developing apparatus, control method of coating and developing apparatus and recording medium Download PDFInfo
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- KR101161467B1 KR101161467B1 KR1020070036835A KR20070036835A KR101161467B1 KR 101161467 B1 KR101161467 B1 KR 101161467B1 KR 1020070036835 A KR1020070036835 A KR 1020070036835A KR 20070036835 A KR20070036835 A KR 20070036835A KR 101161467 B1 KR101161467 B1 KR 101161467B1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
In the coating and developing apparatus in which the inspection station is provided between the cassette station and the processing station, the time for which the substrate is unnecessarily stayed by the inspection module is reduced.
The substrate transfer means in the inspection station prioritizes the transfer of the substrate between the cassette station and the processing station, transfers the substrate to the inspection module for the remaining time within the cycle time of the substrate transfer means in the processing station, and transfers the substrate from the inspection module. The carrying out of the substrate can be carried out (the substrate having a smaller processing order than the substrate having the larger processing order) can be carried out, and the transfer of the substrate to the inspection module is prohibited.
Wafer, Cassette Station, Transfer Arm, Main Arm, Transfer Module, Inspection Module
Description
1 is a plan view showing one embodiment of the coating and developing apparatus of the present invention.
Fig. 2 is an external perspective view showing the coating and developing apparatus.
Fig. 3 is a side view showing the outline of the layout of the coating and developing apparatus.
4 is an explanatory diagram illustrating a flow of a substrate of the coating and developing apparatus;
5 is an explanatory diagram showing a simulation of a conveyance schedule showing the movement of the substrate in the inspection station in the present invention.
FIG. 6 is an explanatory diagram showing a simulation of a conveyance schedule showing movement of a substrate in an inspection station in a comparative example; FIG.
Fig. 7 is an explanatory diagram in which movements of a substrate and a preparation signal of an inspection module and a delivery module are correlated in one cycle of the transfer schedule.
Fig. 8 is an explanatory diagram in which movements of a substrate and a preparation signal of an inspection module and a delivery module are correlated in one cycle of the transfer schedule.
9 is a plan view illustrating the flow of a substrate in a conventional coating and developing apparatus.
<Explanation of symbols for main parts of the drawings>
W: Wafer
C: Cassette
21: cassette station
24: delivery arm
26A, 26B: main arm
40: inspection station
4: carrier arm
TRSa to TRSd: Delivery Module
TRS1 to TRS4: Delivery Module
E1 to E3: inspection module
200: control unit
S1: processing station
[Document 1] Japanese Patent Laid-Open No. 2005-175052 (paragraph 0042, Fig. 4)
INDUSTRIAL APPLICABILITY The present invention is applied to a substrate such as a semiconductor wafer or an LCD substrate (glass substrate for liquid crystal display), for example, a coating treatment, a developing apparatus and a coating method, and a developing method for performing a cleaning treatment of a substrate, a coating treatment of a resist liquid, and a development treatment after exposure. It is about.
A series of processes of applying a resist liquid to a substrate such as a semiconductor device or an LCD substrate, exposing the resist film using a photomask, and developing it to produce a desired resist pattern on the substrate involves application or development of the resist liquid. It is performed using the system which connected the exposure apparatus to the application | coating performed and developing apparatus.
The coating and developing apparatus includes a cassette station equipped with a transfer arm for loading a wafer cassette, transferring semiconductor wafers (hereinafter referred to as wafers) between the wafer cassettes, and processing for applying or developing a resist to the wafer. The station and the interface stations connected to the exposure apparatus are arranged in a row.
Then, for the substrate on which the resist pattern is formed, predetermined inspection, for example, inspection of the line width of the resist pattern, the polymerization state of the resist pattern and the base pattern, development defects, and the like is performed, and only the substrate determined to pass is transferred to the next step. Such inspection is often performed by an independent inspection apparatus provided separately from the coating and developing apparatus, but it is more convenient to adopt an inline system in which the inspection apparatus is provided in the coating and developing apparatus.
Therefore,
Fig. 9 shows an example of the configuration when such a system is actually constructed. 9 is a schematic view of a coating and developing apparatus in plan view, with reference numeral 11 a cassette station, 12 an inspection station, 13 a processing station, and 14 an interface station connected to an exposure apparatus. In addition, C is a wafer cassette, 15 is a delivery arm in the
In the application | coating and developing apparatus of FIG. 9, the wafer in the cassette C is conveyed by the path of the
In this case, the order to be processed is determined for the wafer in the cassette C. For example, in the case of a wafer for storing 13 sheets,
On the other hand, in the wafer returned to the cassette C, the total number or selected wafers are sent out to the transfer module TRSc by the
By the way, the wafer of the transfer module TRSa needs to be placed in the transfer module (not shown) which the main arm in the
Therefore, in the
In doing so, the throughput of the inspection flow is lowered. Therefore, the present inventor is considering operating the
But even then, the following problems arise. Now, 150 sheets of treatment are required per hour in the coating and developing apparatus. On the other hand, one conveyance operation of the
As already described herein, the transfer of the wafer to the transfer modules TRSa and TRSb must be made first, so that the transfer operation that the
The reason for this is that even when the wafer is allowed to pass in the inspection station, for example, the first wafer of the next lot enters the inspection module E3, and then the last wafer of the previous lot enters. In doing so, there arises a problem that the recipe of the inspection module E3 must be changed, and consequently the conveyance remains.
However, if a situation in which the wafer cannot be taken out from the inspection module after the inspection of the wafer is created, the embodiment is shown as a comparative example, but the inspection process takes a long time.
This invention is made | formed under such a situation, The objective is to provide the technique which can reduce the time which a board | substrate stays unnecessarily by an inspection module, and can improve the throughput of application | coating and developing apparatus by this.
A cassette station having a plurality of substrates stored therein, the cassette station having a transfer means for transferring the substrates between the cassettes;
A plurality of processing modules which perform application of a resist to a substrate taken out of the cassette, development of the substrate after the resist is applied and exposed to the substrate, or a process before and after the process, and the substrates are sequentially carried out along the circulation path to these processing modules. At the same time, a processing station having a first substrate conveying means, the cycle time of circulating the circulation path is predetermined;
2nd board | substrate conveyance means which performs a test | inspection about the board | substrate which completed processing, and delivers a board | substrate with respect to the some inspection module from which the time required for inspection differs, and the board | substrate transfer between the said cassette station and a processing station, and an inspection module. An inspection station having:
A control unit for controlling the second substrate transfer means;
The said control part with respect to a 2nd board | substrate conveyance means,
a) prioritizing the transfer of the substrate between the cassette station and the processing station and the receipt of the substrate from the processing station,
b) carrying out the inspection module from a substrate having a small processing order assigned to the substrate,
c) a function of controlling the carrying out of the inspection module from the inspection module, regardless of the order of the processes assigned to the substrate.
As a specific aspect of the present invention, there is provided one transfer module and the other transfer module provided for transfer of a substrate between the transfer means in the cassette station and the second substrate transfer means,
The control unit transfers the substrate which has been processed by the processing station to the cassette, takes out the substrate from the cassette, transfers the substrate to one of the transfer modules, and transfers the finished substrate to the cassette from the other transfer module. Controlling the delivery means in the station.
In a specific aspect, the control unit controls the transfer means to take out the substrate finished by the processing station from the cassette and transfer it to the one transfer module or from the cassette conveyed for inspection from the outside of the application or developing apparatus. And a form of controlling the delivery means in the cassette station to take out the substrate and transfer it to the one delivery module.
The transfer means in the cassette station is capable of transferring the substrate once to either of the one or the other transfer module, for example, within the cycle time.
Further, when the transfer destination when the substrate is transferred from the cassette station to the processing station is a processing module, for example, a cooling module, the control unit transfers the substrate from the cassette station to the processing station; It is preferable to control a 2nd board | substrate conveyance means so that the board | substrate may be delivered to an inspection module in the remaining time which subtracted the conveyance time which receives and conveys the board | substrate from the said cycle time. In this case, if T0 is the time point at which the cycle time has elapsed from the time when the substrate from the cassette station is loaded into the processing module, even if the second conveying means is capable of delivering to the inspection module, the cassette station is transferred by performing the transfer. The transfer is suspended if it is determined that the time point at which the next substrate from is brought into the processing module has passed T0.
Another invention provides a cassette station having a cassette storing a plurality of substrates, the cassette station including transfer means for transferring substrates between cassettes;
A plurality of processing modules for applying, developing, or processing the resist before and after the substrate taken out from the cassette, and a cycle time for circulating the circulation paths while conveying the substrates sequentially in accordance with the circulation paths for these processing modules are predetermined. A processing station equipped with a first substrate conveying means,
The processing station performs inspection on the substrates that have been processed, and transfers the substrates to a plurality of inspection modules having different time required for inspection, and to transfer and inspect the substrates between the cassette station and the processing station. It is a method of controlling the application | coating and developing apparatus provided with the inspection station provided with a 2nd board | substrate conveying means,
When the preparation signal for informing the preparation for conveyance of the substrate from the cassette station to the processing station is output, or when the preparation signal for informing the preparation for conveyance of the substrate from the processing station to the conveying destination is output, the second substrate conveying means generates a substrate. The process of giving priority to conveyance,
A process of carrying out an inspection module from a substrate having a small processing order assigned to the substrate;
Irrespective of the order of the process assigned to the board | substrate, the process of carrying out the board | substrate for which inspection is complete | finished is characterized by including the process.
The storage medium according to another invention is characterized in that a computer program for implementing the method of the present invention is stored.
First, the outline of an example about application | coating and the developing apparatus of this invention is demonstrated, referring a top view of FIG. 1 and a perspective view of FIG. In Fig. 1 and Fig. 2,
An
The
The processing station S1 delivers the wafer W between three shelf modules 25 (25A, 25B, and 25C) in which the modules of the heating / cooling system are multistage in order from the front, and the liquid processing module described later. The main arms 26 (26A, 26B) which are two 1st board | substrate conveying means for carrying out are arrange | positioned alternately. The main arms 26 (26A, 26B) are each provided with two arms, and the
The shelf modules 25 (25A, 25B, 25C) and the main arms 26 (26A, 26B) are arranged in a line in front and rear as viewed from the
The liquid processing module 28 (28A, 28B) which multiplexed liquid processing apparatuses, such as an application | coating apparatus and a developing apparatus, is provided in the position to which board | substrate transfer is performed by the main arm 26 (26A, 26B). . This liquid processing module 28 (28A, 28B) is a structure in which the
For the shelf module 25 (25A, 25B, 25C), for example, as shown in FIG. 3, the transfer modules TRS1 to TRS4 forming the transfer unit for transferring the wafer and the application of the resist liquid are shown. Heating modules (LHP1, LHP2), which form a heating device for carrying out the heat treatment of the wafer after or after application of the developer, or cooling modules, which form a cooling device for performing the cooling process of the wafer before or after application of the resist liquid or before development. In addition to (CPL1, CPL2, CPL3), a heating module (PEB) or the like which performs a heating apparatus for performing a heat treatment of the wafer following the exposure treatment is assigned to, for example, 10 stages above and below. Here, the TRS1 and TRS4 are used to transfer wafers between the
In this example, the heating modules LHP1 and LHP2, the cooling modules CPL1, CPL2 and CPL3 and the heating module PEB correspond to processing modules.
The exposure apparatus S4 is connected to the inside of the
The
Here, the movement of the main arms 26 (26A, 26B) inside the processing station S1 will be described. The two main arms 26 (26A, 26B) are, for example, TRS1 as shown in FIG. → CPL1 → Coating device (COT) → TRS2 → LHP1 → CPL2 conveys wafer from
At this time, in the present embodiment, as the paths of the main arms 26 (26A, 26B) are shown in dotted lines in FIG. 4, the
Subsequently, the flow of the substrate when the substrate is processed by the processing station S1 will be described. First, when the cassette C in which the wafer W is housed from the outside is brought into the
In the 1st interface part S2, it is conveyed by the
After exposure, the wafer is conveyed through the second interface S3-> first interface portion S2 to the processing station S1 through the PEB of the processing station S1, and as described above, PEB-> CPL3-> DEV-> LHP2. It is conveyed by the path | route of TRS3 -TRS4, A predetermined developing process is performed by the developing apparatus in this way, and a predetermined resist pattern is formed.
At this time, the
Next, the
The conveying
a) Controlled to prioritize the transfer of the wafer W between the
Therefore, in the case where the cycle time described above is 24 seconds, if one conveyance operation of the conveying
In addition, when the transfer module TRS1 also serves as a processing module, since the stay time of the wafer W in the processing module is determined, such conveyance is not allowed, and the conveyance is necessarily twice in one cycle. Becomes This point is mentioned later.
Moreover, the
b) carrying-in to the inspection modules E1, E2, and E3 from the wafer W having a small processing order assigned to the wafer W;
c) Irrespective of the order of the process assigned to the wafer W, it is controlled to carry out the wafer W which the inspection is complete | finished from inspection module E1, E2, E3. Thus, for example, the wafers W from 1 to 13 are sequentially transferred from the transfer module TRSc to the inspection modules E1, E2, and E3, but at any cycle time, for example, 11 times. If the wafer W is finished, but the nine wafers W are not finished, the wafer W is overtaken the nine wafers W and the eleven wafers W are removed from the inspection modules E1, E2, and E3. Export.
Herein, the inspection module will be described. In this example, the inspection module E1 is a macro inspection module for detecting macro defects on the wafer W, and the inspection module E2 is used to determine the thickness of the film formed on the wafer W. The film thickness and line width inspection module which measures the line width of a pattern, and the inspection module E3 is a polymerization inspection module which detects the shift | offset | difference of superposition | polymerization of exposure, ie, the position shift | offset | difference of the pattern currently formed and the base pattern. In this case, the time taken for the inspection of the inspection modules E1, E2, and E3 is, for example, 30 seconds, 100 seconds, and 140 seconds, respectively. Since the inspection time in the inspection modules E1, E2, and E3 is different in this way, the inspection of the wafer (W) with the larger order of imports from the next (the faster) the wafer (W) with the smaller order of imports first It may end sooner than).
In addition, the
a) receiving the wafer W before processing from the cassette C and transferring it to the transfer module TRSa,
b) receiving the processed wafer W from the delivery module TRSb and returning to the cassette C,
c) transfer the processed wafer W from the cassette C to the transfer module TRSc,
d) has the role of returning the inspected wafer W to the cassette C from the transfer module TRSd. In addition, since conveyance of a) and b) must be performed at the said cycle time, when a cycle time is 24 second, if one conveyance operation takes 8 seconds, for example, any of c) and d) in one cycle. Only one can do it.
This apparatus is provided with the
Next, operation | movement with respect to the test |
In the following description, the uppermost number is regarded as the cycle number. In the
In the
In the
In the
In
In this manner, when the cycle progresses and the
7 (a) and 7 (b) show the output of the ready signal and the conveyance path in this
On the other hand, the transfer schedule is as shown in Fig. 6 when the wafer is carried out in the order of the number of wafers in addition to the carrying in and out of the inspection modules E1, E2 and E3 without carrying over the wafers as in the present invention. For example, paying attention to the
According to the above-described embodiment, the wafers having the smaller processing order than the wafers having the larger processing order assigned to the wafer can be carried out from the inspection modules E1, E2, and E3 first, that is, the inspection modules E1, E2, Since it is possible to overtake wafers for the removal of wafers from E3), unnecessary time for the processed wafers to wait in the inspection modules E1, E2, and E3 can be reduced, thereby improving throughput (productivity). You can. Since the overtaking of the wafer is prohibited with respect to the carrying of the wafer into the inspection modules E1, E2, and E3, the first wafer of the next lot enters a certain inspection module, and then the last wafer of the previous lot enters. There is no problem of making a recipe change.
Moreover, in addition to the transfer module which only transfers a board | substrate according to the conveyance path | route of a wafer, the cooling module which cools a board | substrate or the heating module which heats a board | substrate WHEREIN: The module which performs both cooling or heating of a board | substrate, and board | substrate delivery. May be used for the replacement of the wafer from the substrate cassette to the processing station, in which case the processing module also serves as the transfer module TRS1. In this case, although already described in the description regarding the control of the
That is, even if the wafer W can be exchanged for the inspection modules E1, E2, and E3, the operation of the wafer W from the subsequent transfer module TRSa to the TRS1 is performed by performing the operation before performing the operation. It is necessary to determine whether the end point of the exchange passes the end point of the cycle time. When the end of the cycle time has passed, it is necessary to control the transfer of the wafer W to the inspection modules E1, E2, and E3 not to be executed. This is because if the transfer is performed, the stay time (processing time) in the transfer module TRS1 of the next wafer W is shorter than the set time.
8 is an explanatory diagram showing such a state. T0 is the end of the cycle time in a cycle, and when the
In the present invention, the entire number inspection may be performed on the wafers in the cassette C or the selected wafers may be inspected. Also, instead of inspecting the wafer processed by the processing station S1 and returned to the cassette C, it is delivered to the wafer in the cassette transported to the
In the present invention, since a substrate having a smaller processing order than that of a substrate having a larger processing order assigned to the substrate can be carried out earlier from the inspection module, that is, the substrate can be overtaken for the removal of the substrate from the inspection module. In addition, unnecessary time for the processed substrate to wait in the inspection module can be reduced, thereby improving throughput (productivity). In addition, since the overtaking of the board is prohibited with respect to bringing the board into the inspection module, the problem is that a recipe change occurs as the first substrate of the next lot enters a certain inspection module and the last substrate of the previous lot enters. Does not occur.
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JP2006113331A JP2007287909A (en) | 2006-04-17 | 2006-04-17 | Application/development device, control method for application/development device, and storage medium |
JPJP-P-2006-00113331 | 2006-04-17 |
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KR20210042381A (en) * | 2018-09-20 | 2021-04-19 | 가부시키가이샤 스크린 홀딩스 | Substrate processing apparatus and substrate processing system |
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JP5275058B2 (en) * | 2009-01-23 | 2013-08-28 | 株式会社Sokudo | Substrate processing equipment |
JP5223778B2 (en) * | 2009-05-28 | 2013-06-26 | 東京エレクトロン株式会社 | Substrate processing apparatus, substrate processing method, and storage medium |
JP5187274B2 (en) * | 2009-05-28 | 2013-04-24 | 東京エレクトロン株式会社 | Substrate processing apparatus, substrate processing method, and storage medium |
TWI523134B (en) * | 2011-09-22 | 2016-02-21 | 東京威力科創股份有限公司 | Substrate treatment system, substrate transfer method and computer-readable storage medium |
JP5987796B2 (en) * | 2013-07-24 | 2016-09-07 | 東京エレクトロン株式会社 | Substrate processing apparatus, substrate processing method, and storage medium |
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JP2005093920A (en) * | 2003-09-19 | 2005-04-07 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
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JPH0786369A (en) * | 1993-09-10 | 1995-03-31 | Matsushita Electric Ind Co Ltd | Composite processing device equipped with plurality of processing means |
JPH09107012A (en) * | 1995-10-09 | 1997-04-22 | Yuasa Seisakusho:Kk | Automatic processing device of semiconductor exposure system |
JP3748193B2 (en) * | 1999-03-17 | 2006-02-22 | 株式会社日立製作所 | Vacuum processing apparatus and operation method thereof |
SG94851A1 (en) * | 2000-07-12 | 2003-03-18 | Tokyo Electron Ltd | Substrate processing apparatus and substrate processing method |
JP4744686B2 (en) * | 2000-12-06 | 2011-08-10 | ルネサスエレクトロニクス株式会社 | Operational amplifier |
JP3916468B2 (en) * | 2002-01-11 | 2007-05-16 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
JP3862596B2 (en) * | 2002-05-01 | 2006-12-27 | 東京エレクトロン株式会社 | Substrate processing method |
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- 2006-04-17 JP JP2006113331A patent/JP2007287909A/en active Pending
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Patent Citations (2)
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JPH10335416A (en) | 1997-05-30 | 1998-12-18 | Dainippon Screen Mfg Co Ltd | Wafer treating apparatus |
JP2005093920A (en) * | 2003-09-19 | 2005-04-07 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
Cited By (4)
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KR20210042381A (en) * | 2018-09-20 | 2021-04-19 | 가부시키가이샤 스크린 홀딩스 | Substrate processing apparatus and substrate processing system |
KR102519450B1 (en) | 2018-09-20 | 2023-04-10 | 가부시키가이샤 스크린 홀딩스 | Substrate processing device and substrate processing system |
KR20230048571A (en) * | 2018-09-20 | 2023-04-11 | 가부시키가이샤 스크린 홀딩스 | Substrate processing apparatus and substrate processing system |
KR102658644B1 (en) | 2018-09-20 | 2024-04-18 | 가부시키가이샤 스크린 홀딩스 | Substrate processing apparatus and substrate processing system |
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TWI335617B (en) | 2011-01-01 |
TW200809916A (en) | 2008-02-16 |
KR20070102949A (en) | 2007-10-22 |
JP2007287909A (en) | 2007-11-01 |
CN101060072A (en) | 2007-10-24 |
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