KR101158961B1 - 자외선 조사 처리 장치 - Google Patents
자외선 조사 처리 장치 Download PDFInfo
- Publication number
- KR101158961B1 KR101158961B1 KR1020080086778A KR20080086778A KR101158961B1 KR 101158961 B1 KR101158961 B1 KR 101158961B1 KR 1020080086778 A KR1020080086778 A KR 1020080086778A KR 20080086778 A KR20080086778 A KR 20080086778A KR 101158961 B1 KR101158961 B1 KR 101158961B1
- Authority
- KR
- South Korea
- Prior art keywords
- discharge
- electrode
- high voltage
- processing apparatus
- ultraviolet irradiation
- Prior art date
Links
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/50—Means forming part of the tube or lamps for the purpose of providing electrical connection to it
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
- H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/245—Manufacture or joining of vessels, leading-in conductors or bases specially adapted for gas discharge tubes or lamps
- H01J9/247—Manufacture or joining of vessels, leading-in conductors or bases specially adapted for gas discharge tubes or lamps specially adapted for gas-discharge lamps
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007288462A JP4957967B2 (ja) | 2007-11-06 | 2007-11-06 | 紫外線照射処理装置 |
JPJP-P-2007-00288462 | 2007-11-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090046681A KR20090046681A (ko) | 2009-05-11 |
KR101158961B1 true KR101158961B1 (ko) | 2012-07-03 |
Family
ID=40646305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080086778A KR101158961B1 (ko) | 2007-11-06 | 2008-09-03 | 자외선 조사 처리 장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4957967B2 (zh) |
KR (1) | KR101158961B1 (zh) |
CN (1) | CN101431000B (zh) |
TW (1) | TWI416584B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5554034B2 (ja) * | 2009-08-26 | 2014-07-23 | リンテック株式会社 | 光照射装置及び光照射方法 |
JP2014049280A (ja) * | 2012-08-31 | 2014-03-17 | Ushio Inc | エキシマランプ |
CN105810554A (zh) * | 2016-05-17 | 2016-07-27 | 福州市台江区振斌高效电磁聚能科技研究所 | 平板无级灯 |
JP7327932B2 (ja) * | 2018-12-14 | 2023-08-16 | ウシオ電機株式会社 | 紫外線照射装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000260396A (ja) * | 1999-03-05 | 2000-09-22 | Quark Systems Co Ltd | エキシマランプ、エキシマ照射装置および有機化合物の分解方法 |
JP2005322632A (ja) | 2004-04-07 | 2005-11-17 | Japan Storage Battery Co Ltd | 誘電体バリア放電ランプ及び紫外線照射装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5148803B2 (ja) * | 2003-05-21 | 2013-02-20 | 株式会社Gsユアサ | 無声放電ランプ |
JP2005222905A (ja) * | 2004-02-09 | 2005-08-18 | Japan Storage Battery Co Ltd | エキシマランプ |
JP5293986B2 (ja) * | 2005-07-29 | 2013-09-18 | 株式会社Gsユアサ | 紫外線ランプおよび紫外線照射装置 |
-
2007
- 2007-11-06 JP JP2007288462A patent/JP4957967B2/ja active Active
-
2008
- 2008-08-22 TW TW097132183A patent/TWI416584B/zh active
- 2008-09-03 KR KR1020080086778A patent/KR101158961B1/ko active IP Right Grant
- 2008-11-06 CN CN2008101710765A patent/CN101431000B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000260396A (ja) * | 1999-03-05 | 2000-09-22 | Quark Systems Co Ltd | エキシマランプ、エキシマ照射装置および有機化合物の分解方法 |
JP2005322632A (ja) | 2004-04-07 | 2005-11-17 | Japan Storage Battery Co Ltd | 誘電体バリア放電ランプ及び紫外線照射装置 |
Also Published As
Publication number | Publication date |
---|---|
JP4957967B2 (ja) | 2012-06-20 |
CN101431000B (zh) | 2012-01-04 |
KR20090046681A (ko) | 2009-05-11 |
TWI416584B (zh) | 2013-11-21 |
TW200921751A (en) | 2009-05-16 |
CN101431000A (zh) | 2009-05-13 |
JP2009117161A (ja) | 2009-05-28 |
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