KR101157507B1 - 패터닝 디바이스를 조명하는 조명 시스템 및 조명 시스템을 제조하는 방법 - Google Patents
패터닝 디바이스를 조명하는 조명 시스템 및 조명 시스템을 제조하는 방법 Download PDFInfo
- Publication number
- KR101157507B1 KR101157507B1 KR1020097022941A KR20097022941A KR101157507B1 KR 101157507 B1 KR101157507 B1 KR 101157507B1 KR 1020097022941 A KR1020097022941 A KR 1020097022941A KR 20097022941 A KR20097022941 A KR 20097022941A KR 101157507 B1 KR101157507 B1 KR 101157507B1
- Authority
- KR
- South Korea
- Prior art keywords
- intermediate focus
- radiation
- optical system
- patterning device
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- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/730,751 US7889321B2 (en) | 2007-04-03 | 2007-04-03 | Illumination system for illuminating a patterning device and method for manufacturing an illumination system |
US11/730,751 | 2007-04-03 | ||
PCT/NL2008/050184 WO2008120989A1 (en) | 2007-04-03 | 2008-04-03 | Illumination system for illuminating a patterning device and method for manufacturing an illumination system |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100009563A KR20100009563A (ko) | 2010-01-27 |
KR101157507B1 true KR101157507B1 (ko) | 2012-06-20 |
Family
ID=39462596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020097022941A KR101157507B1 (ko) | 2007-04-03 | 2008-04-03 | 패터닝 디바이스를 조명하는 조명 시스템 및 조명 시스템을 제조하는 방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7889321B2 (ja) |
EP (1) | EP2132601A1 (ja) |
JP (1) | JP2010524231A (ja) |
KR (1) | KR101157507B1 (ja) |
CN (1) | CN101681115A (ja) |
TW (1) | TW200846844A (ja) |
WO (1) | WO2008120989A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008014832A1 (de) * | 2007-04-19 | 2008-10-23 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie |
KR101656534B1 (ko) * | 2008-03-20 | 2016-09-09 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피용 투영 대물렌즈 |
WO2010099807A1 (de) | 2009-03-06 | 2010-09-10 | Carl Zeiss Smt Ag | Beleuchtungsoptik sowie optische systeme für die mikrolithographie |
KR101105410B1 (ko) * | 2009-08-20 | 2012-01-17 | 주식회사 디엠에스 | 임프린트 장치 |
NL2006625A (en) | 2010-05-26 | 2011-11-29 | Asml Netherlands Bv | Illumination system and lithographic apparatus. |
JP6371869B2 (ja) * | 2014-06-23 | 2018-08-08 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置を修正する方法 |
WO2016045901A1 (en) | 2014-09-22 | 2016-03-31 | Asml Netherlands B.V. | Process window identifier |
DE102015012053A1 (de) * | 2015-09-14 | 2017-03-16 | M+W Group GmbH | Fertigungsanlage zur Herstellung von integrierten Schaltkreisen aus Halbleiter-Wafern sowie Waffelelement für eine Fertigungsanlage |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10229044A (ja) * | 1996-12-13 | 1998-08-25 | Nikon Corp | 露光装置および該露光装置を用いた半導体デバイスの製造方法 |
JP2006134974A (ja) | 2004-11-04 | 2006-05-25 | Canon Inc | 露光装置、判定方法及びデバイス製造方法 |
US20070069160A1 (en) * | 2005-09-27 | 2007-03-29 | Asml Netherlands B.V. | Ex-situ removal of deposition on an optical element |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10138313A1 (de) | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
US6195201B1 (en) | 1999-01-27 | 2001-02-27 | Svg Lithography Systems, Inc. | Reflective fly's eye condenser for EUV lithography |
EP1248288A1 (en) * | 1999-12-16 | 2002-10-09 | Nikon Corporation | Exposure method and exposure apparatus |
JP3495992B2 (ja) | 2001-01-26 | 2004-02-09 | キヤノン株式会社 | 補正装置、露光装置、デバイス製造方法及びデバイス |
US7170587B2 (en) * | 2002-03-18 | 2007-01-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4298336B2 (ja) * | 2002-04-26 | 2009-07-15 | キヤノン株式会社 | 露光装置、光源装置及びデバイス製造方法 |
JP2007088061A (ja) * | 2005-09-20 | 2007-04-05 | Canon Inc | 露光装置 |
-
2007
- 2007-04-03 US US11/730,751 patent/US7889321B2/en not_active Expired - Fee Related
-
2008
- 2008-04-03 KR KR1020097022941A patent/KR101157507B1/ko not_active IP Right Cessation
- 2008-04-03 WO PCT/NL2008/050184 patent/WO2008120989A1/en active Application Filing
- 2008-04-03 JP JP2010502046A patent/JP2010524231A/ja active Pending
- 2008-04-03 TW TW097112430A patent/TW200846844A/zh unknown
- 2008-04-03 CN CN200880010265A patent/CN101681115A/zh active Pending
- 2008-04-03 EP EP08723935A patent/EP2132601A1/en not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10229044A (ja) * | 1996-12-13 | 1998-08-25 | Nikon Corp | 露光装置および該露光装置を用いた半導体デバイスの製造方法 |
JP2006134974A (ja) | 2004-11-04 | 2006-05-25 | Canon Inc | 露光装置、判定方法及びデバイス製造方法 |
US20070069160A1 (en) * | 2005-09-27 | 2007-03-29 | Asml Netherlands B.V. | Ex-situ removal of deposition on an optical element |
Also Published As
Publication number | Publication date |
---|---|
WO2008120989A1 (en) | 2008-10-09 |
US20080246940A1 (en) | 2008-10-09 |
JP2010524231A (ja) | 2010-07-15 |
TW200846844A (en) | 2008-12-01 |
US7889321B2 (en) | 2011-02-15 |
KR20100009563A (ko) | 2010-01-27 |
CN101681115A (zh) | 2010-03-24 |
EP2132601A1 (en) | 2009-12-16 |
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GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |