KR101151621B1 - Rotatable injector - Google Patents

Abstract

The rotary gas injection device of the present invention includes a drive shaft having a first reaction fluid flow path and a first cooling fluid flow path, a housing surrounding the drive shaft, and a first reaction fluid flow path and the first reaction fluid passing through a side wall of the housing. A second reaction fluid flow path and a second cooling fluid flow path respectively connected to a cooling fluid flow path, and a third reaction fluid flow path and a third cooling connection respectively connected to the first reaction fluid flow path and the first cooling fluid flow path under the drive shaft. And an injector having a fluid flow path, wherein a plurality of reaction fluid injection holes are connected to a lower portion of the third reaction fluid flow path. The present invention is characterized by controlling the temperature of the rotary injection device and the reaction fluid by injecting a cooling fluid at the same time as the injection of the reaction fluid during the process.

Description

Rotary injector {Rotatable injector}

The present invention relates to a rotary jetting apparatus, and more particularly, to a rotary jetting apparatus used in a thin film deposition apparatus for depositing a predetermined film on a wafer surface.

In general, in order to deposit a thin film having a predetermined thickness on a substrate such as a semiconductor wafer or glass, physical vapor deposition (PVD) using physical collisions such as sputtering and chemical vapor deposition using chemical reactions ( Thin film production method using CVD (Chemical Vapor Deposition) or the like is used. Chemical vapor deposition includes atmospheric pressure chemical vapor deposition (APCVD), low pressure chemical vapor deposition (LPCVD), and plasma enhanced chemical vapor deposition (Plasma Enhanced CVD). In addition, the plasma organic chemical vapor deposition method has been widely used because of the fast film formation speed.

However, as the design rule of the semiconductor device is drastically reduced, a thin film having a fine pattern is required, and the step height of the region where the thin film is formed is also very large. As a result, the use of an atomic layer deposition (ALD) method, which is capable of forming a very fine pattern of atomic layer thickness very uniformly and has excellent step coverage, has been increasing. That is, it is used for the deposition of thin films such as gate oxide films, capacitor dielectric films and diffusion barrier films in semiconductor manufacturing processes.

The atomic layer deposition method (ALD) is similar to the conventional chemical vapor deposition (CVD) method in that it uses a chemical reaction between gas molecules. However, the conventional chemical vapor deposition method injects a plurality of gas molecules into the chamber at the same time to deposit the reaction product generated above the wafer onto the wafer, whereas the atomic layer deposition method injects one gaseous material into the chamber. It is then different in that it purges it, leaving only the gas that is physically adsorbed on top of the heated wafer, and then injecting another gaseous material to deposit the chemical reaction product that occurs only on the top of the wafer.

The thin film implemented through such an atomic layer deposition method has a very excellent step coverage characteristic, and in particular, has the advantage that it is possible to implement a pure thin film with a very low impurity content, which is widely attracting attention.

1 is a schematic diagram illustrating a general thin film deposition apparatus used for depositing a predetermined film on a wafer surface in the manner described above.

Referring to the drawings, a gas outlet 4 for discharging the internal gas is provided below the process chamber. The susceptor support 5 is horizontally installed in the process chamber. A plurality of susceptors 6 are placed on the susceptor support 5, a wafer 7 is seated on each susceptor 6, and a horizontal movement of the wafer 7 is prevented on the upper surface of the susceptor 6. Wafer chuck 8 for mounting is provided. The susceptor support 5 has at least one through hole connected to the gas outlet 4 at the portion where the susceptor 6 is not placed. In addition, in order to suppress redeposition of the thin film, a heater 9 which is a heating means of the wafer 7 arranged in a concentric manner is provided inside the susceptor 6.

In the upper part of the process chamber, there is provided a rotatable injection device composed of a drive shaft 1, a housing 2, and an injector 3. During the process, the rotary spray device is installed inside the process chamber, and by spraying the reaction fluid while rotating, it is possible to deposit a thin film uniformly on the wafer (7). In some cases, the susceptor support 5 is installed to be horizontally rotatable so that the susceptor support 5 can be horizontally rotated instead of the rotary injection device. In addition, since it is necessary to adjust the distance between the rotatable injection device and the susceptor 6 according to the process, the susceptor support 5 and the drive shaft 1 are installed so as to be able to move up and down, respectively.

2 to 4 are for explaining the conventional rotary injection device.

Referring to FIG. 2, a drive shaft 1 having a plurality of supply pipes 14 formed therein, a cylindrical housing 2 surrounding the outside of the drive shaft 1, and a part of sidewalls of the housing 2. A plurality of magnetic seals 12 formed in an annular shape between the injection hole 11 formed in the hole 11, the flange portion 10 coupling the housing 2 and the process chamber, and the drive shaft 1 and the housing 2. Magnetic Seal).

The drive shaft 1 is inserted into the inner wall of the housing 2 and inserted vertically into the process chamber. The housing 2 is flanged perpendicular to the upper outer wall of the process chamber. The housing 2 is provided with an O-ring 13 so that leakage does not occur in a portion in close contact with the process chamber.

Inside the drive shaft 1, four supply pipes 14 each extending in the longitudinal direction are formed to be spaced apart from each other by 90 degrees. Four annular grooves 15 are formed along the inner wall circumference of the housing 2. One end of each supply pipe 14 is installed to communicate with the annular groove (15). Four injection holes 11 are provided on the side wall of the housing 2 and are connected to the four annular grooves 15 through the side walls. The annular groove 15 and the supply pipe 14 are installed in the same number so as to correspond one to one.

Figure 3 is a cross-sectional perspective view showing one annular groove 15 formed in the housing of the rotary injection device and the injection hole 11 connected thereto.

The gas supply will be described with reference to the drawings. A predetermined gas is injected through the injection hole 11 formed in a part of the side wall of the housing 2. The injected gas flows into the supply pipe 14 formed in the drive shaft 1 through the annular groove 15 communicating with the injection hole 11, and through the injector 3 positioned at the end of each supply pipe 14, the process chamber. Distributed inside. Even if the drive shaft 1 rotates, since the four supply pipes 14 and the four annular grooves 15 always communicate in a one-to-one correspondence state, the gas supply is always performed regardless of the rotation of the drive shaft 1.

The drive shaft 1 is installed to be rotatable while being in close contact with the housing 2. Bearings are installed on the inner wall of the housing 2 so that the drive shaft 1 can easily rotate, and the drive shaft 1 and the housing 2 are in close contact with each other by magnetic sealing.

Figure 4 is a perspective view showing an injector connected to the drive shaft of the conventional rotary injection device.

Referring to the drawings, the injector has four injection arms 16 connected to the supply pipe 14 at the insertion end of the drive shaft 1 and branched horizontally and radially, and each of the injection arms 16 has a plurality of The injection hole 17 is provided.

The injector rotates horizontally by the rotational movement of the drive shaft 1.

The gas supplied to the injection hole 11 passes through the annular groove 15 corresponding to the injection hole 11 and the supply pipe 14 communicating with the injection hole 11, and finally through the injection hole 17 of the injector. Is sprayed on.

However, such an injector is installed inside the process chamber during the process, and the temperature of the injector is easily increased due to the high process temperature. Moreover, the rotary injection device has a disadvantage in that it is difficult to control the temperature of the injector as well as the temperature of the reaction fluid supplied through the injector due to the rotational property. Therefore, the life of the device may be shortened due to damage caused by the temperature increase of the injector. As the process temperature increases, the temperature of the drive shaft and the housing that rotates the injector also increases, causing the magnetic seal between the drive shaft and the housing to deteriorate. This causes a decrease in stability of the process.

In addition, in the case of using a rotary spraying device without temperature control, the reaction fluid is adsorbed to the sprayer as particles pass over time, and particles may fall on the process object and damage the process during a long process. Can be.

Korean Laid-Open Patent No. 2003-68366

The present invention is to solve the above problems, to provide a rotary injection device capable of appropriately controlling the temperature of the injector and the reaction fluid supplied therefrom, to suppress the generation of particles generated by the adsorbent adsorbed to the injector For the purpose of

Another object of the present invention is to provide a rotatable spray device that can diversify the process by adjusting the temperature of the reaction fluid injected from the injector.

Another object of the present invention is to maintain a constant temperature of the reaction fluid to prevent deterioration of the magnetic seal between the drive shaft and the housing, thereby increasing the stability of the process, thereby extending the life of the device The purpose is to provide.

In order to achieve the above object, the present invention provides a drive shaft having a first reaction fluid flow path and a first cooling fluid flow path, a housing surrounding the drive shaft, and a first reaction fluid flow path and the sidewall of the housing. A second reaction fluid flow path and a second cooling fluid flow path respectively connected to a first cooling fluid flow path, and a third reaction fluid flow path and a third reaction fluid flow path connected to the first reaction fluid flow path and the first cooling fluid flow path under the drive shaft, respectively. It has a cooling fluid flow path, and provides a rotary injector, characterized in that it comprises an injector in which a plurality of reaction fluid injection holes are formed. Each of the first cooling fluid flow path and the second cooling fluid flow path includes a supply pipe and an exhaust pipe. The third cooling fluid flow path has one end connected to a supply pipe of the first cooling fluid flow path and the other end of the first cooling fluid flow path. Characterized in that it is connected to the exhaust pipe.

The apparatus may further include a fourth reaction fluid flow path and a fourth cooling fluid flow path connected to the second reaction fluid flow path and the second cooling fluid flow path, respectively, and extending along an inner circumference of the housing.

The upper and lower portions of the fourth reaction fluid flow path and the fourth cooling fluid flow path between the housing and the driving shaft may further include a sealing device. The fourth reaction fluid flow path and the fourth cooling fluid flow path may be in contact with each other in the transverse direction with the start and end portions, and the fourth reaction fluid flow path and the fourth cooling fluid flow path may be annular grooves.

The housing may be divided into a first housing in which the second cooling fluid flow path is installed and a second housing in which the second reaction fluid flow path is installed. The second housing may be installed below the first housing, and a leakage cooling fluid removing device may be installed between the first housing and the second housing. The leakage cooling fluid removal device may be an air shower.

A drain port may be further included in a lower portion of the housing in which the second cooling fluid flow path is installed. The drain port includes a first drain port flow passage passing through the housing sidewall and the first drain port flow passage and extends along an inner circumference of the housing and has a start portion and a end portion communicating with each other. Characterized in that. The drain port may further include a leak detection sensor and a decompression means connected to the first drain port flow path.

A sealing device may be further included on the upper and lower portions of the fourth reaction fluid flow path and the fourth cooling fluid flow path between the housing and the driving shaft, and on the lower portion of the second drain port flow path. The sealing device may include a magnetic seal or Mechanical seals can be used.

Magnetic seals are used for the upper and lower portions of the fourth reaction fluid flow path, and mechanical seals are used for the upper and lower portions of the fourth cooling fluid flow path and the lower portion of the second drain port flow path.

The rotary spray apparatus according to the present invention controls the temperature of the rotating sprayer and the reaction fluid supplied therefrom to suppress the generation of particles caused by the adsorption of the reactants on the sprayer, and to control the temperature of the reaction fluid in various ways. There is an advantage to this. In addition, the temperature of the reaction fluid is maintained at a constant level, thereby preventing deterioration of the magnetic seal between the drive shaft and the housing. Due to the prevention of deterioration of the magnetic seal, it is possible to increase the stability of the process and to extend the life of the magnetic seal, thereby improving productivity.

1 is a schematic view showing a typical thin film deposition apparatus.
Figure 2 is a longitudinal sectional view showing a housing and a drive shaft of a conventional rotary injection device.
Figure 3 is a cross-sectional perspective view showing a housing of a conventional rotary injection device.
Figure 4 is a perspective view of the injector connected to the drive shaft of the conventional rotary injection device.
Fig. 5 is a longitudinal sectional view showing the housing and the drive shaft of the first embodiment according to the present invention;
6 to 7 are cross-sectional views showing a cross section and a longitudinal section of the injector of the rotary injector according to the present invention.
8 is a longitudinal sectional view showing a housing and a drive shaft of a second embodiment according to the present invention;
9 is a sectional perspective view showing a part of a housing and a drive shaft of a second embodiment according to the present invention;
10 is a longitudinal sectional view showing a housing and a drive shaft of a third embodiment according to the present invention;

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention in more detail. It will be apparent to those skilled in the art that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know. Like numbers refer to like elements in the figures.

The present invention forms a tube through which the cooling fluid passes in the rotary injection device to control the temperature of the injector and the reaction fluid participating in the process. The tube through which the cooling fluid passes is formed separately in the drive shaft including a plurality of reaction fluid flow paths and is connected to the injector at the bottom of the drive shaft. This surrounds the reaction fluid flow path in the injector to form a cooling fluid flow path. The cooling fluid flow path in the drive shaft connected thereto includes a supply pipe for injecting the cooling fluid and an exhaust pipe for recovering the cooling fluid after the circulation.

That is, the cooling fluid supplied from the outside through the supply pipe circulates around the cooling fluid flow path surrounding the reaction fluid flow path in which the reaction fluid is injected from the injector, and then exits through the exhaust pipe. At this time, it is possible to control the temperature of the injector and the reaction fluid by adjusting the amount and temperature of the injected cooling fluid.

Figure 5 shows a first embodiment of the rotary injection device according to the present invention, Figures 6 to 7 are cross-sectional views showing a cross section and a longitudinal section of the injector of the rotary injection device according to the present invention.

Referring to the drawings, a first embodiment of the present invention is a drive shaft 20 including at least one first reaction fluid flow path 30 and the first cooling fluid flow path 40 therein, and the outside of the drive shaft 20 And an injector 22 connected to the surrounding housing 21 and the lower portion of the drive shaft 20 and including a third reaction fluid flow path 32 and a third cooling fluid flow path 60.

In the drive shaft 20, four first reaction fluid passages 30 extending in the longitudinal direction are formed to be spaced apart from each other by 90 degrees. ) Is shown. It is not limited as shown in the figure, it can be formed in various positions and directions. In addition, in the present embodiment, four first reaction fluid flow paths 30 are provided in the drive shaft 20, but the present invention is not limited thereto. The number of first reaction fluid flow paths 30 in the drive shaft 20 may vary depending on process variables. Can be configured in various ways.

A plurality of second reaction fluid flow paths 31 for injecting reaction fluid into the first reaction fluid flow path 30 from the outside and a second cooling fluid flow path 50 for input / output of the cooling fluid are provided on the side wall of the housing 21. Include. It is connected to each of the first reaction fluid flow path 30 and the first cooling fluid flow path 40 formed in the drive shaft 20. The first cooling fluid flow path 40 and the second cooling fluid flow path 50 include supply pipes 41 and 51 and exhaust pipes 42 and 52.

In addition, the injector 22 connected to the lower portion of the drive shaft 20 includes a third reaction fluid flow path 32 which is connected to the first reaction fluid flow path 30 at the bottom of the drive shaft 20 and is branched horizontally radially. The third cooling fluid flow path 60 of the injector 22 is formed to be separated from the third reaction fluid flow path 32 so as to surround them, and both ends of the third cooling fluid flow path 60 are driven to the drive shaft 20. It is connected to the supply pipe 41 and the exhaust pipe 42 of the first cooling fluid flow path 40 at the bottom, respectively. In addition, the injector 22 further includes a plurality of injection holes 27 formed in the lower portion of the third reaction fluid flow path 32.

As described above, a plurality of second reaction fluid flow paths 31 and second cooling fluid flow paths 50 are formed on a portion of the sidewall of the housing 21 in FIG. 5. In addition, the fourth reaction fluid flow path and the fourth cooling fluid flow path which are connected to the second reaction fluid flow path 31 and the second cooling fluid flow path 50, respectively, extend along the inner circumference of the housing 21 and are installed. Include. That is, as shown in FIG. 3, each of the second reaction fluid flow passages 31 is formed through a fourth reaction fluid flow passage formed along the inner wall of the housing 21, for example, the annular groove 33. It is installed to communicate with the fluid flow path (30). In addition, the supply pipe 41 and the exhaust pipe 42 of the first cooling fluid flow path 40 are respectively connected to the supply pipe 51 and the exhaust pipe 52 of the second cooling fluid flow path 50 through the annular groove 70 as described above. It is installed to communicate. Thus, even if the drive shaft 20 rotates, the plurality of second reaction fluid flow paths 31 and the second cooling fluid flow paths 50 exist in a one-to-one correspondence with the annular grooves, so that the reaction fluid and the cooling fluid are supplied. Is always performed regardless of the rotation of the drive shaft 20.

The annular groove 33 and the second reaction fluid flow path 31 are installed in the same number so as to correspond one to one. Here, the number of the second reaction fluid flow paths 31 corresponding to each of the annular grooves 33 or the first reaction fluid flow paths 30 is illustrated as one, but may be greater than that for the smooth flow of the reaction fluid. Similarly, the supply pipe 51 and the exhaust pipe 52 of the second cooling fluid flow path 50 respectively corresponding to the supply pipe 41 and the exhaust pipe 42 of the first cooling fluid flow path 40 may be one as shown. It may be more than that for the smooth flow of the cooling fluid.

In addition, in FIG. 5, although the inlet of the plurality of reaction fluid flow paths formed on the outer circumference of the driving shaft 20, that is, the second reaction fluid flow paths 31 are vertically distributed vertically, is not limited thereto. In order to control the type of reaction fluid, supply cycle, and supply amount, the reaction fluids may be distributed to each other without being distributed on one vertical line. For example, when the driving shaft 20 rotates through this, the reaction gas and the purge gas are blocked when the source gas is introduced, and when the reaction gas is introduced, the gas is supplied by the reaction such that the source gas and the purge gas are blocked. Can be controlled.

The position of the second reaction fluid flow path 31 and the second cooling fluid flow path 50 is not limited as shown, but cooling and temperature control of not only the injector 22 but also the drive shaft 20 is provided through the flow of the cooling fluid. In order to increase the effect, it is preferable that the second cooling fluid flow path 50 in the housing 21 is installed above the second reaction fluid flow path 31. Thus, during the process, the temperature of the reaction fluid moving along the first reaction fluid flow path 30 of the drive shaft 20 can be maintained at a constant level, as well as installed above and below the fourth reaction fluid flow path 33. Deterioration of the magnetic seal between the drive shaft 20 and the housing 21 can be prevented.

The cross-sectional shape of the reaction fluid flow path and the cooling fluid flow path may be in various shapes according to process convenience, such as a rectangle and a circle.

Between the drive shaft 20 and the housing 21 includes a plurality of sealing 26 device formed to prevent leakage of the reaction fluid and the cooling fluid. Magnetic seals are preferably used on the upper and lower portions of the fourth reaction fluid flow path, and mechanical seals are used on the upper and lower portions of the fourth cooling fluid flow path. It further includes a flange portion 25 for coupling the housing 21 and the process chamber, and an o-ring 24 for the seal on the surface where the flange portion 25 and the process chamber are connected.

Referring to FIG. 6 showing a cross section of the injector of the present invention, the injector 22 is connected to each of the first reaction fluid flow paths 30 at the end of the drive shaft 20 and is formed in a radially branched horizontal direction. It extends to surround the fluid flow path 32 and the third reaction fluid flow path 32, both ends of the supply pipe 41 and the exhaust pipe 42 of the first cooling fluid flow path 40 at the lower end of the drive shaft 20. And a third cooling fluid flow path 60 connected to each other. That is, the third cooling fluid flow path 60 in the injector 22 is surrounded along the radially formed third reaction fluid flow path 32, and one end of the third cooling fluid flow path 60 is formed in the drive shaft 20. 1 is connected to the supply pipe 41 of the cooling fluid flow path 40, and the other end of the third cooling fluid flow path 60 is connected to the exhaust pipe 42 of the first cooling fluid flow path 40 in the drive shaft 20.

7 is a cross-sectional view taken along the line II ′ of FIG. 6 in the injector of the present invention, and a plurality of injection holes 27 are formed in the lower portion of the third reaction fluid flow path 32. . Since the reaction fluid injected into the third reaction fluid flow path 32 is directly injected into the process chamber through the plurality of injection holes 27 connected to the lower portion, the cooling fluid flowing into the third cooling fluid flow path 60 surrounding the reaction fluid flows. There is no direct reaction with. By adjusting the amount and temperature of the cooling fluid injected into the cooling fluid flow path, it is possible to control the temperature of the reaction fluid passing through the third reaction fluid flow path 32 surrounded by the third cooling fluid flow path 60. In addition, since the cooling fluid circulates inside the injector, it is possible to control the temperature of the injector which is installed inside the process chamber and can be easily heated due to the high process temperature. Therefore, it is possible to effectively prevent the generation of particles adsorbed to the injector, it is possible to vary the process by adjusting the temperature of the reaction fluid. In addition, it is possible to control the temperature of the rotating injector during a long process, as well as to control the temperature through the drive shaft and the inside of the injector, thereby preventing deterioration of the magnetic seal due to the high process temperature, which can be shortened. There is an advantage to improve the life of the device.

In FIG. 6, four third reaction fluid flow paths 32 are connected to each of the first reaction fluid flow paths 30 at the end of the drive shaft 20 so as to have four injection arms 23 and branched horizontally radially. However, the number of radially branched third reaction fluid flow paths 32, that is, injection arms 23 is not limited thereto, and may be variously formed according to process variables such as the type and number of reaction gases.

In addition, the cooling fluid is supplied from the supply pipe, circulated through the plurality of third reaction fluid flow paths 32, and finally exhausted to the exhaust pipe. At this time, since the cooling effect decreases as the distance from the supply pipe decreases, the third cooling fluid A plurality of flow paths 60 may be formed to surround each of the third reaction fluid flow paths 33. For example, in the injector 22 having four injection arms 23, one third cooling fluid flow path 60 is formed as shown in the drawing to sequentially form each third reaction fluid flow path 32. After being circulated and circulated, the exhaust gas may be formed, and four third cooling fluid flow paths 60 may be formed to circulate and discharge the four injection arms 23, respectively, to further increase the cooling effect. Of course, the present invention is not limited thereto, and the third cooling fluid flow path 60 may be formed based on the two injection arms 23 according to process variables, or various configurations are possible.

In addition, in order to increase the cooling effect of the injector, the shape of the third cooling fluid flow path 60 may be variously configured. In the drawing, the third cooling fluid flow path 60 surrounds the third reaction fluid flow path 32 in a 'c' shape along the periphery of each injection arm 23, but is not limited thereto. It may be formed to surround the third reaction fluid flow path 32 in a spiral along the outer periphery of 23. Further, after passing the shape of the third cooling fluid flow path 60 through a plurality of injection holes 27 formed in the lower portion of the third reaction fluid flow path 32 from the center of the injector 22, each minute It may be formed to flow centrally along the upper periphery at the end of the sandstone.

The injector 22 and the drive shaft 20 form a bolt portion 80 as shown in FIG. 6, thereby providing a sealing member such as an O-ring (not shown) between the injector 22 and the drive shaft 20. Can be interposed and assembled with bolts. In addition, the drive shaft 20 and the injector 22 may be welded and assembled.

Referring to the drawings the operation of the rotary injection device having such a configuration is as follows.

The present invention controls the temperature of the rotary injection device and the reaction fluid by injecting a cooling fluid simultaneously with the injection of the reaction fluid during the process.

First, the reaction fluid is injected from the outside through the second reaction fluid flow path 31. At this time, the reaction fluids respectively injected into the second reaction fluid flow paths 31 may be different reaction fluids, or some may be the same reaction fluids in some cases. In addition, it is possible to sequentially inject the desired reaction fluid according to the atomic layer deposition method. The injected reaction fluid is injected into the first reaction fluid flow path 30 through each annular groove 33 formed along the inner wall of the housing 21 including the respective second reaction fluid flow paths 31. The reaction fluid injected into each of the first reaction fluid flow paths 30 is transferred to the third reaction fluid flow path 32 of the injector 22 and is injected by the injection holes 27 formed under the third reaction fluid flow path 32. It is injected into the process chamber, and the injected reaction fluid is adsorbed onto the wafer surface.

Simultaneously with the injection of the reaction fluid, a cooling fluid of a predetermined temperature is injected from the outside through the supply pipe 51 of the second cooling fluid flow path 50. The injected cooling fluid is injected into the first cooling fluid flow path 40 through the annular groove 70 formed along the inner wall of the housing 21 including the second cooling fluid flow path 50 as described above. The cooling fluid injected into the first cooling fluid flow path 40 is delivered to one end of the third cooling fluid flow path 60 of the injector, and flows around the reaction fluid third flow path 32 configured to be radially branched horizontally. do. When the continuous injection of the cooling fluid at a predetermined pressure through the supply pipe 51 of the second cooling fluid flow path 50, the injected cooling fluid is transferred to the third reaction fluid flow path 32 through the third cooling fluid flow path 60. After cooling the injector 22 heated by the heat of the thin film deposition apparatus while passing through the circumference of the first cooling fluid flow path 60 connected to the exhaust pipe 42 of the first cooling fluid flow path 40, It is discharged to the outside through the exhaust pipe 52 of the second cooling fluid flow path (50). At this time, it is possible to control the injector and the reaction fluid to a desired temperature by continuously injecting the cooling fluid to adjust the amount and temperature of the cooling fluid. Therefore, even when the process is carried out for a long time, the injector is heated due to the high process temperature to prevent particles from being generated in the injector, by controlling the temperature of the injector can contribute to the improvement of its life.

8 to 9 are for explaining the second embodiment according to the present invention.

The rotary spray device according to the present invention may form a separate drain port to prevent the cooling fluid injected between the drive shaft 20 and the housing 21 from leaking into the process chamber. Can be. This is formed in the lower part of the supply pipe 51 and the exhaust pipe 52 of the second cooling fluid flow path 50 through which the cooling fluid is injected and recovered as shown in FIG. It is preferable to form the upper portion of the reaction fluid flow path so as not to be mixed into the reaction fluid flow path into the process chamber. However, this is not limited, and can be formed at various positions, and many may be applied instead of one. In addition, the lower portion of the drain port further includes a sealing device. It is preferable to use a mechanical seal.

Referring to FIG. 9, the drain port is connected to the first drain port flow path 90 passing through the side wall of the housing 21 and the first drain port flow path 90 and along an inner circumference of the housing 21. It includes an annular groove 91 formed to extend. In addition, the first drain port flow path 90 may be installed by connecting a leak detection sensor and a decompression means for detecting the leakage of the cooling fluid. By mounting the sensor at all times to check the leakage of the cooling fluid, it is possible to efficiently prevent the leaked cooling fluid from flowing into the process chamber.

The operation of the drain port is as follows. The leakage occurs in the gap between the drive shaft 20 and the housing 21 during the flow of the cooling fluid through the supply pipe 51 and the exhaust pipe 52 of the second cooling fluid flow path 50 located above the housing 21. In this case, the leaked cooling fluid moves downward and reaches the drain port. The drain port discharges the leaked cooling fluid collected in the annular groove 91 to the outside through the first drain port flow path 90. At this time, when the leak detection sensor detects a leak of the cooling fluid, the pressure reducing means is operated to generate a negative pressure in the annular groove 91 to immediately discharge the leaked cooling fluid to the outside, thereby preventing leakage of the cooling fluid more efficiently. Can be.

10 is for explaining the third embodiment according to the present invention.

Referring to the drawings, the rotary injection device according to the present invention is separated from the first housing 100 including the second cooling fluid flow path 50, the housing 21 surrounding the outside of the drive shaft 20 and the lower portion thereof; The second housing 110 may be formed and separated by a second housing 110 including a second reaction fluid flow path 31. When the cooling fluid leaks between the housing 21 and the drive shaft 20 in the first housing 100 during the process, the leaked cooling fluid moves downward and the process is performed through the second housing 110. It can be prevented from entering into the chamber and can be discharged out of the process chamber. In addition, by installing a separate processing device for removing the leaked cooling fluid, for example, an air shower for evaporating the leaked cooling fluid by the wind can be applied more effectively.

In this case, although not shown in the drawing, the above described drain port may be formed under the first housing 100 to prevent leakage of the cooling fluid more effectively. The drain port includes a first drain port flow passage passing through the side wall of the housing, and an annular groove formed to extend along an inner circumference of the housing 21 and connected to the first drain port flow passage. 50) is formed at the bottom. Leaked cooling fluid when leakage occurs in the gap between the drive shaft 20 and the housing 21 during the flow of the cooling fluid through the supply pipe 51 and the exhaust pipe 52 of the second cooling fluid flow path 50. Moves downward and collects in the annular groove of the drain port, which is discharged to the outside through the first drain port flow path.

In addition, a leak detection sensor is attached to the drain port to always check the leakage of the cooling fluid. When the leakage of the cooling fluid is detected, the pressure reducing means is operated to discharge the leaked cooling fluid to the outside. Can be efficiently prevented from entering.

While the foregoing has been described with reference to preferred embodiments of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. It will be appreciated.

1: drive shaft 2: housing
3: injector 4: gas outlet
5: susceptor support 6: susceptor
7: wafer 8: wafer chuck
9 heater 10 flange
11: injection hole 12: magnetic seal
13: O-ring 14: supply pipe
15: annular groove 16: injection arm
17: injection hole
20: drive shaft 21: housing
22: injector 23: injection arm
24: O-ring 25: Flange
26: sealing 27: injection hole
30: first reaction fluid flow path 31: second reaction fluid flow path
32: third reaction fluid flow path 33: annular groove
40: first cooling fluid flow path 50: second cooling fluid flow path
41, 51: supply pipe 42, 52: exhaust pipe
60: third cooling fluid flow path 70: annular groove
80: bolt portion 90: first drain port flow path
91: annular groove 100: the first housing
110: second housing

Claims (9)

A drive shaft having a first reaction fluid flow path;
A housing surrounding the drive shaft;
A second reaction fluid flow path passing through the sidewall of the housing and connected to the first reaction fluid flow path; And
An injector formed under the drive shaft and having a third reaction fluid flow path connected to the first reaction fluid flow path and having a plurality of reaction fluid injection holes formed therein;
The drive shaft includes a cooling fluid flow path therein, the drive shaft is a rotary injection device that rotates inside the housing.
The method according to claim 1,
And a supply pipe and an exhaust pipe formed through the side wall of the housing and connected to the cooling fluid flow path for input and output of the cooling fluid.
The method according to claim 2,
The cooling fluid flow path is a rotary injection device installed on the upper portion of the second reaction fluid flow path.
The method according to claim 1,
The cooling fluid flow path,
A supply pipe for injecting cooling fluid; And
Rotary injection device comprising an exhaust pipe for recovering the cooling fluid. delete delete delete delete delete

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