KR101097913B1 - Information managing method, information managing apparatus and substrate processing system - Google Patents

Information managing method, information managing apparatus and substrate processing system Download PDF

Info

Publication number
KR101097913B1
KR101097913B1 KR1020090027321A KR20090027321A KR101097913B1 KR 101097913 B1 KR101097913 B1 KR 101097913B1 KR 1020090027321 A KR1020090027321 A KR 1020090027321A KR 20090027321 A KR20090027321 A KR 20090027321A KR 101097913 B1 KR101097913 B1 KR 101097913B1
Authority
KR
South Korea
Prior art keywords
device information
information
substrate processing
storage means
condition
Prior art date
Application number
KR1020090027321A
Other languages
Korean (ko)
Other versions
KR20100008327A (en
Inventor
가즈히데 아사이
히로유키 이와쿠라
도시로 고시마키
가요코 야시키
Original Assignee
가부시키가이샤 히다치 고쿠사이 덴키
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히다치 고쿠사이 덴키 filed Critical 가부시키가이샤 히다치 고쿠사이 덴키
Publication of KR20100008327A publication Critical patent/KR20100008327A/en
Application granted granted Critical
Publication of KR101097913B1 publication Critical patent/KR101097913B1/en

Links

Images

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • General Factory Administration (AREA)
  • Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The time required when the terminal device acquires information from the information management device is shortened.

The substrate processing system has a group management server and a terminal device. On the basis of the data transmitted from the substrate processing apparatus, the group management server stores the device information and time in association with the current information storage unit 402 which stores the device information of the substrate processing apparatus at the time when the data is transmitted. When the condition stored in the device information DB 400, the definition information storage unit 404 for storing the condition in which the device information is stored, and the condition stored in the definition information storage unit 404 is satisfied, the time at which the condition is satisfied. And a device information registration unit 410 for associating the device information stored in the current information storage unit 402 with the device information DB 400. The terminal device includes a device information acquisition unit 602 for retrieving device information stored in the device information DB 400.

Professional, operation terminal

Description

Information management method, information management device and substrate processing system {INFORMATION MANAGING METHOD, INFORMATION MANAGING APPARATUS AND SUBSTRATE PROCESSING SYSTEM}

The present invention provides an information management method and apparatus for managing information transmitted from a substrate processing apparatus for processing a semiconductor substrate, a glass substrate, or the like, or information accumulated in a substrate processing system or information management apparatus including the substrate processing apparatus and the information management apparatus. And a substrate processing system including the information.

In general, this type of substrate processing system includes a plurality of substrate processing apparatuses for processing a substrate, and information (data) such as monitoring of a state of operation of the plurality of substrate processing apparatuses and a production history. It consists of a group management server (information management apparatus) which manages this. Therefore, the information management apparatus manages various types of information such as measured values such as temperature, pressure, gas, and operation status transmitted from the substrate processing apparatus. By such an information management apparatus, the efficiency of semiconductor production is aimed at. The user acquires the information managed by the information management apparatus using the terminal device.

However, in the conventional substrate processing system, the terminal apparatus may take time to acquire information from the information management apparatus.

This invention is made | formed in order to solve the above-mentioned subject, and an object of this invention is to shorten the time which a terminal apparatus acquires information from an information management apparatus.

A first information management method according to the present invention is an information management method for managing information based on a full text including device information or event information transmitted from a substrate processing apparatus for processing a substrate, the device information including device information. The device information of the substrate processing apparatus at the time when the full text is transmitted is stored in the first device information storage means, and when the full text including event information is transmitted, the event information and the condition for storing the device information are compared. If the match is found, the device information and the time at which the event information occurred are stored in the second device information storage means.

The second information management method according to the present invention is a moving condition for moving the event information and the device information stored in the first device information storage means to the second device information storage means when the full message including the event information is transmitted. And the condition storage means for which the device information to be moved is set, and when the event information and the condition match, as the device information stored in the first device information storage means, the event is added to the set device information of the moving object. The time at which the information occurred is added and stored in the second device information storage means.

The information display method according to the present invention is an information display method for displaying information to an operation terminal having an operation screen, and when the full message including event information is transmitted from the substrate processing apparatus for processing the substrate, By referring to the moving condition for moving the event information and the device information stored in the first device information storage means to the second device information storage means and the condition storage means for which the device information of the moving target is set, the device information of the moving target is set. The second device information storage means is searched by adding the time at which the event information has occurred, and the searched result information is compared with the set device information, and if it matches, the device information is displayed on the operation screen.

According to the present invention, when the terminal apparatus acquires information from the information management apparatus, the time required for searching can be shortened. Then, using various information generated when the substrate is processed in the substrate processing apparatus, data analysis (eg, abnormality caused by abnormalities generated in the substrate processing apparatus, etc.) and data processing (eg, the substrate Time for performing graphing of production information transmitted from the processing apparatus, etc. can be shortened.

First, the background of this invention is demonstrated based on FIG.

1 is a diagram showing device information stored in a conventional group management server, its structure, and a retrieval method of stored device information.

FIG. 1A is a diagram illustrating the full text transmitted from a substrate processing apparatus. As illustrated in FIG. 1A, each full text includes the transmitted time, the name (device name) of the substrate processing apparatus of the sender, the item type, and the information (measured value, etc.) of the item. The group management server receives a telegram transmitted from a plurality of substrate processing apparatuses, obtains device information from the telegram, and stores the device information.

1B is a diagram schematically showing a structure in which device information is stored. As shown in Fig. 1B, the device information is stored in the database DB. The DB includes an item management table, a measurement data management table, and a device management table. In the item management table, each item corresponding to the item type is managed. In the apparatus management table, each substrate processing apparatus is managed. In the measurement data management table, information (measured values, etc.) related to items managed in the item management table and devices managed in the device management table, and time included in the full text (corresponding to 'time' in FIG. 1 (A)) are managed. do.

The merit of this DB structure is as follows. That is, 1) there is no effect on the DB structure even when an item is added (for example, a new table must be added), and 2) an effect on the DB structure even when a substrate processing apparatus is added. 3) Even when each substrate processing apparatus includes different items, the device information is managed by the measurement data management table. 4) The measurement data management table includes information on items included in the substrate processing apparatus (measured values, etc.). ) Is stored, there is no unnecessary data area.

1C shows a method of acquiring device information stored in a DB. For example, when confirming the state of the substrate processing apparatus (the failure generating device) at the time of the occurrence of the failure, the terminal device as the operation terminal refers to these three tables with reference to the item management table, the measurement data management table, and the device management table of the DB. Is reconstructed as a table illustrated in FIG. 1C, and in the table of FIG. Here, since the measured values of all items are not limited to each time, when the measured values are not stored at a desired time, it is necessary to retrospect to the time at which the measured values are stored.

Specifically, the terminal apparatus needs to perform the supplementary work of the measured value from the desired time to the time at which the measured value is stored for each item. For example, the terminal device can retrieve the value (690.0) of the temperature ch1 at time 12:00:04, but cannot retrieve the value of the temperature ch2 and the gas ch1, but the value of the temperature ch2 and the gas ch1 In order to retrieve the value, it is necessary to retrospect it by time 12:00:02.

Thus, this DB structure has the following demerit. That is, 1) it takes time to reconstruct a plurality of related tables as one table for data retrieval, and 2) it takes time to interpolate measurement values.

Hereinafter, the substrate processing system which concerns on embodiment of this invention is demonstrated based on the background mentioned above.

2 is a diagram illustrating a configuration of a substrate processing system 1 according to an embodiment of the present invention.

As shown in FIG. 2, the substrate processing system 1 includes a plurality of substrate processing apparatuses 10-1 to 10-n, a group management server 4, and a terminal device 6. The substrate processing apparatuses 10-1 to 10-n, the military management server 4, and the terminal apparatus 6 are capable of transmitting and receiving data via a network 12 such as a LAN or a WAN, for example. It is connected to each other possible. On the other hand, when showing any one of several component parts, such as substrate processing apparatuses 10-1 to 10-n, without specifying, it may abbreviate | omit simply with the substrate processing apparatus 10 etc.

The substrate processing apparatus 10 executes processing of the substrate based on a process recipe or the like. Specifically, the process recipe describes a procedure for processing a substrate, and the substrate processing apparatus 10 performs control of components in the apparatus based on this procedure. Further, the substrate processing apparatus 10 includes a full text including information (hereinafter referred to as "device information") relating to the processing of the substrate processing apparatus 10 including production information such as temperature information, pressure information, gas information, and the like. Is transmitted to the group management server 4 via the network 12. And the substrate processing apparatus 10 generates information with a low frequency of occurrence or sudden occurrence, such as information (error information) indicating the occurrence of a failure or information (moving information) indicating a predetermined operation in the substrate processing, for example. The full text including the information (hereinafter referred to as "event information") to be transmitted is transmitted to the military management server 4.

The substrate processing apparatus 10 is configured as a semiconductor manufacturing apparatus which performs the processing apparatus in the manufacturing method of a semiconductor device (IC) as an example. In addition, in the following description, the Example which applied the vertical type apparatus which performs oxidation, a diffusion process, CVD process, etc. to a board | substrate as a substrate processing apparatus is demonstrated. In addition, the detailed structure of the substrate processing apparatus 10 is demonstrated in detail later.

The group management server 4 (information management apparatus) receives a professional transmitted from the substrate processing apparatus 10 and stores and manages device information or event information included in the preamble. In addition, the group management server 4 may be implemented so that a some database DB may be provided. On the other hand, the function and DB structure of the military management server 4 will be described later in detail.

The terminal device 6 searches for the information accumulated by the group management server 4, displays the search results on the screen, and configures an interface for providing information to the user. More specifically, the terminal device 6 receives a user's request via a keyboard or a mouse, obtains information from the group management server 4, and displays this information on the screen. On the other hand, the terminal device 6 does not need to be disposed in a place (eg, a clean room) where the substrate processing apparatus 10 is disposed. For example, the substrate processing apparatus 10 such as an office is provided. You may be arrange | positioned at the place different from the arrange | positioned place.

Next, the detailed structure of the substrate processing apparatus 10 is demonstrated.

3 shows a perspective view of the substrate processing apparatus 10 according to the embodiment of the present invention. 4 is a side perspective view of the substrate processing apparatus 10 according to the embodiment of the present invention.

As shown in Figs. 3 and 4, a hoop (FOUP, substrate receiver, pod 110, hereinafter) is used as a wafer carrier which accommodates a wafer (substrate 200) made of silicon or the like. The substrate processing apparatus 10 according to the embodiment of the present invention includes a housing 111. In the front front part of the front wall 111a of the housing body 111, the front maintenance opening 103 as an opening provided so that maintenance is possible is opened, The front maintenance doors 104 and 104 which open and close this front maintenance opening 103 are provided, respectively.

In the front wall 111a of the housing 111, a pod carrying in / out port (substrate container carrying in / out port 112) is opened so as to communicate inside and outside of the housing 111, and the pod carrying in / out port 112 is front It opens and closes with a shutter (substrate container carrying-in / out opening / closing mechanism 113). A load port (substrate container tap, 114) is provided on the front front side of the pod carrying-in and out port 112, and the load port 114 mounts the pod 110. Is configured to be aligned. The pod 110 is carried in on the load port 114 by the in-process transport apparatus (not shown), and is also carried out from the load port 114.

A rotary pod shelf (substrate container placing shelf 105) is provided in the upper part in the front-back direction substantially center part in the housing body 111, and the rotary pod shelf 105 is comprised so that the some pod 110 may be stored. . That is, the rotary pod shelf 105 is vertically erected and radiated at each position of the upper and lower ends of the support 116 and the support 116 intermittently rotating in the horizontal plane. A plurality of shelves plates (substrate container placing table, 117) supported in the shape of a wave is provided, and the plurality of shelves plates 117 are held in a state in which a plurality of pods 110 are placed. It is configured to guarantee.

Between the load port 114 and the rotary pod shelf 105 in the housing 111, a pod carrying device (substrate container carrying device 118) is provided, and the pod carrying device 118 is a pod 110. ) Is configured as a pod elevator (substrate container lift mechanism 118a) which can be lifted and held, and a pod conveyance mechanism (substrate container conveyance mechanism 118b) as a conveyance mechanism. By the continuous operation of the pod conveyance mechanism 118b, the pod 110 is conveyed between the load port 114, the rotary pod shelf 105, and the pod opener (substrate container individual opening and closing mechanism 121). Consists of.

The sub-body 119 is constructed in the lower part in the substantially center part of the front-back direction in the front body 111 over the rear end. The front wall 119a of the sub-mirror 119 has a pair of wafer loading / unloading ports (substrate carrying-out / outlet 120) for carrying in and out of the wafer 200 with respect to the inside of the sub-body 119. Aligned and opened, the pair of pod openers 121 and 121 are provided in the top and bottom wafer loading-in / out ports 120 and 120, respectively. The pod opener 121 is provided with the mounting bases 122 and 122 which mount the pod 110, and the cap detachment mechanism (object detachment mechanism 123, 123) which attaches and detaches the cap (object) of the pod 110. As shown in FIG. . The pod opener 121 is configured to open and close the wafer entrance and exit of the pod 110 by attaching and detaching the cap of the pod 110 mounted on the mounting table 122 by the cap detachment mechanism 123.

The sub-mirror 119 comprises the transfer chamber 124 fluidly isolated from the installation space of the pod carrying apparatus 118 or the rotary pod shelf 105. FIG. A wafer transfer mechanism (substrate transfer mechanism) 125 is provided in the front region of the transfer chamber 124, and the wafer transfer mechanism 125 is capable of rotating or directing the wafer 200 in the horizontal direction. It is comprised as a wafer transfer apparatus elevator (substrate transfer apparatus elevating mechanism, 125b) for elevating a wafer transfer apparatus (substrate transfer apparatus 125a) and the wafer transfer apparatus 125a. As schematically shown in FIG. 4, the wafer transfer device elevator 125b is provided between the right end of the pressure resistant body 111 and the right end of the transfer region 124 of the sub-body 119. By the continuous operation of the wafer transfer device elevator 125b and the wafer transfer device 125a, the tweezer (the substrate holding body) 125c of the wafer transfer device 125a is used as a mounting portion of the wafer 200. The boat 200 is configured to charge and discharge the wafer 200 with respect to the boat (substrate holding tool 217).

In the rear region of the transfer room 124, a waiting section 126 is configured to accommodate the boat 217 and to stand by. Above the atmospheric part 126, the process chamber 202 is provided. The lower end of the processing chamber 202 is configured to be opened and closed by a furnace shutter (furnace opening and closing mechanism) 147.

As schematically shown in FIG. 3, a boat elevator (substrate) for lifting and lowering the boat 217 between the right end portion of the pressure resistant body 111 and the right end portion of the atmospheric portion 126 of the sub-body 119. A holding mechanism lifting mechanism 115 is provided. A seal cap 219 as an object is horizontally installed on an arm 128 as a connector connected to the platform of the boat elevator 115, and the seal cap 219 opens the boat 217. It is comprised so that it may support vertically and the lower end part of the process chamber 202 may be closed. The boat 217 is provided with a plurality of holding members, and the plurality of wafers (for example, about 50 to 125 sheets) of the wafers 200 are horizontally held while being aligned in the vertical direction with their centers aligned. Consists of.

As typically shown in FIG. 3, the left end opposite to the wafer transfer device elevator 125b side and the boat elevator 115 side of the transfer room 124 has a clean air that is a clean atmosphere or an inert gas. A clean unit 134, which is composed of a supply fan and a dustproof filter, is provided to supply the 133, and between the wafer transfer device 125a and the clean unit 134, although not shown, A notch aligner 135 as a substrate aligning device for aligning the circumferential position is provided.

The clean air 133 blown out of the clean unit 134 is not shown after being distributed to the notch alignment device 135, the wafer transfer device 125a, and the boat 217 in the standby section 126. Inhalation is carried out by a duct, which is exhausted to the outside of the housing 111, or circulated to the primary side (supply side), which is the suction side of the clean unit 134, and again the clean unit 134 It is comprised so that it may take out in the transfer room 124 by this.

Next, a process module controller (PMC) 14 provided in the substrate processing apparatus 10 and performing control of each device in the substrate processing apparatus 10 will be described.

5 shows a functional configuration of the substrate processing apparatus 10 centered on the PMC 14.

As shown in FIG. 5, the PMC 14 includes a CPU 140, a ROM 142, a RAM 144, a display device such as a hard disk drive (HDD) 158 for storing data, a display not shown, and the like. A communication control unit 156 that controls communication of data between the military management server 4 and the like via an input / output interface (IF) 146 for performing data transmission and reception between input devices such as a keyboard and the network 12. And an I / O control unit 148 that performs I / O control with the temperature control unit 150, the gas control unit 152, the pressure control unit 154, and the temperature control unit 150. These components are interconnected via the bus 160, and data is input and output via the bus 160 between the components.

In the PMC 14, the CPU 140 processes the substrate based on a predetermined recipe. Specifically, the CPU 140 outputs control data (control instruction) to the temperature control unit 150, the gas control unit 152, the pressure control unit 154, and the like. The ROM 142, the RAM 144, and the HDD 158 store a sequence program, data input from the input / output IF 146, data input via the communication control unit 156, and the like.

The temperature control part 150 controls the temperature in the process chamber 202 by the heater 338 provided in the outer peripheral part of the process chamber 202 mentioned above. The gas control unit 152 controls the supply amount of the reactive gas supplied into the processing chamber 202 based on the output value from the mass flow controller 342 installed in the gas pipe 340 of the processing chamber 202. The pressure control unit 154 controls the pressure in the processing chamber 202 by opening and closing the valve 348 based on the output value of the pressure sensor 346 provided in the exhaust pipe 344 of the processing chamber 202. The conveyance control unit 159 controls conveyance systems such as the pod opener 121, the boat elevator 115, and the wafer conveyance mechanism. Thus, the temperature control part 150 etc. control each part (heater 338, MFC 342, valve 348, etc.) of the substrate processing apparatus 10 based on the control instruction from CPU140. Perform.

Therefore, the CPU 140 starts the sequence program and, in accordance with the sequence program, calls and executes a command of a recipe, and the steps in which the target values of the control parameters and the like are set are executed in sequence, and I / The control instruction for processing a substrate is transmitted to the temperature control part 150, the gas control part 152, the pressure control part 154, and the conveyance control part 159 via the O control part 148. The temperature control unit 150 or the like performs control of each unit (heater 338, MFC 342, valve 348, etc.) in the substrate processing apparatus 10 in accordance with the control instruction. As a result, the wafer 200 is processed.

The CPU 140 (transmitting means) intersects the full text including the device information or the event information of the substrate processing apparatus 10 including production information such as temperature information, pressure information, gas information, etc. via the communication control unit 156. To the military management server 4. For example, when any one of the production information changes, the CPU 140 transmits a full text including the device information reflecting the change information. In addition, the CPU 140 transmits, to the military management server 4, a full text including information (event information) relating to events and failures of the substrate processing apparatus 10. The event is, for example, at the start of the ascent of the boat 217, at the end of the ascent, at the start of the descent, or at the end of the descent. When such an event occurs, the on / off of the position sensor of the boat elevator 115 is switched and a switching signal is transmitted.

6 is a diagram illustrating a hardware configuration of the terminal device 6 mainly on the control device 16.

As shown in FIG. 6, the terminal device 6 transmits and receives data from an external computer and data via a control device 16 including a CPU 18, a memory 20, and the like, and a network 12. A display / input device 24 including a communication interface (IF) 22 to be performed, a storage device 26 such as a hard disk drive, a display device such as a liquid crystal display, and a pointing device such as a keyboard and a mouse. Have In this way, the terminal device 6 is realized as a general purpose computer such as a personal computer. On the other hand, the group management server 4 has the control apparatus 16 mentioned above, the communication IF 22, and the memory | storage device 26. As shown in FIG. The group management server 4 is configured to be connected to the display / input device 24 of the terminal device 6 via the communication IF 22.

Next, the functions of the group management server 4 and the DB structure and the functions of the terminal device 6 will be described.

FIG. 7 is a diagram showing the functional configurations of the group management program 40 executed by the group management server 4 and the terminal program 60 executed by the terminal device 6.

As shown in FIG. 7, the group management program 40 includes a device information DB 400, a current information storage unit 402, a definition information storage unit 404, a communication unit 406, and a specialized reception unit 408. ) And a device information registration unit 410. The group management program 40 is loaded into the memory 20 of the group management server 4 and executed on an OS (not shown) operating on the control device 16.

In the group management program 40, the current information storage unit 402 (first device information storage means) stores the latest device information of each substrate processing apparatus 10. Specifically, the current information storage unit 402 stores the device information at the time when the full text is transmitted based on the full text transmitted from the substrate processing apparatus 10. The device information includes production information such as device identification information, temperature information, pressure information, gas information, and measurement data for each production information. The current information storage unit 402 (first device information storage means) stores the measured values with respect to all the device information of each substrate processing apparatus 10 obtained from the full text. The current information storage unit 402 is realized by the memory 20.

The device information DB 400 (second device information storage means) stores device information and time in association with each substrate processing apparatus 10. Specifically, the device information DB 400 stores, as part of the device information, the device information defined by the definition information storage unit 404 described later for each time the defined event information occurs. The device information DB 400 is realized by at least one of the memory 20 and the storage device 26. The structure of the device information stored in the device information DB 400 and the current information storage unit 402 will be described later in detail.

The definition information storage unit 404 is stored so that the definition information can be changed. The definition information includes a condition (accumulation condition) in which the device information stored in the current information storage unit 402 is read and accumulated in the device information DB 400, the device information displayed on the terminal device 6, and the like. For example, the accumulation condition includes occurrence of a predetermined event. For example, the device information displayed by the terminal device 6 includes the type of production information such as "temperature ch1", "temperature ch2" and "gas ch1" and the measured value of each production information. On the other hand, the definition information storage unit 404 may store a plurality of definition information. In this case, the group management program 40 preferably has the device information DB 400 for each definition information.

The communication unit 406 performs communication processing required for communication with the substrate processing apparatus 10. Specifically, the communication unit 406 acquires the full text transmitted from the substrate processing apparatus 10 via the communication IF 22 in a predetermined order, and outputs the full text to the full text reception unit 408.

The full-text accepting unit 408 accepts a full-text output from the communication unit 406, and when the full-text includes the device information, causes the current information storage unit 402 to store the device information. Specifically, the full text acceptor 408 updates the measured value of the device information included in the full text output from the communication unit 406 among the device information currently stored in the information storage unit 402. For example, the full text accepting unit 408 overwrites the measured value of the device information included in the full text with the measured value currently stored in the information storage unit 402. As a result, the current information storage unit 402 stores the device information of the time point at which the full text was transmitted, that is, the latest substrate processing apparatus 10.

In addition, when the telegram received from the communication unit 406 includes event information, the telegram acceptor 408 outputs the event information to the device information registration unit 410.

The device information registration unit 410 refers to the definition information storage unit 404, and stores the device information stored in the current information storage unit 402 according to the accumulation condition stored in the definition information storage unit 404. Register in the information DB (400). Specifically, the device information registration unit 410 is a source of transmission of event information when the event information output from the full-text reception unit 408 and the event information stored as the accumulation condition in the definition information storage unit 404 match. The device information of the substrate processing apparatus 10 is read from the current information storage unit 402, and at least a part of the read device information is registered in the device information DB 400 in association with the time at which the event occurred. Here, the device information registration unit 410 refers to the definition information stored in the definition information storage unit 404, reads only the defined device information, and processes and registers the information so that the information is organized into a predetermined data format. As a result, whenever an event as an accumulation condition occurs in the substrate processing apparatus 10, device information of the substrate processing apparatus 10 at the time of occurrence is accumulated in the device information DB 400.

The terminal program 60 has a user interface (UI) unit 600, a device information acquisition unit 602, and a screen generation unit 604. The terminal program 60 is loaded into the memory 20 of the terminal device 6 and executed on an OS (not shown) operating on the control device 16.

In the terminal program 60, the UI unit 600 (display means) receives the input content via the display / input device 24 and outputs it to the device information acquisition unit 602. For example, the UI unit 600 receives identification information such as the name and identifier (ID) of the substrate processing apparatus 10 and the time. The UI unit 600 also displays, on the display / input device 24, the obstacle information screen (described later) generated by the screen generation unit 604.

The device information acquisition unit 602 retrieves the device information stored in the device information DB 400 based on the identification information and the time output from the UI unit 600, and identifies the substrate processing device by the identification information. The device information at the time of (10) is acquired. The device information acquisition unit 602 outputs the acquired device information to the screen generation unit 604.

The screen generation unit 604 refers to the definition information storage unit 404 to obtain the type of the defined device information and the measurement value of each device information. The screen generating unit 604 generates a screen configuration of the fault information screen based on the type of the device information. The screen generation unit 604 synthesizes the device information acquired by the device information acquisition unit 602 into the screen configuration of the failure information screen to generate a failure information screen. The screen generating unit 604 outputs the generated obstacle information screen to the UI unit 600. The fault information screen will be described later in detail.

FIG. 8 is a diagram schematically showing a storage structure of the current information storage unit 402 and the device information DB 400 of the group management program 40. (A) illustrates the current information storage unit 402. , (B) illustrates the device information DB 400.

As illustrated in FIG. 8A, the current information storage unit 402 stores device information including all types and measured values of each substrate processing apparatus 10. In the current information storage unit 402, the latest measured values of the device information of each substrate processing apparatus 10 are stored. Therefore, the device information stored in the current information storage unit 402 is updated only when the measured value is changed.

On the other hand, although the case where three types are displayed by FIG. 8 is illustrated, the number of types which are not limited to three are actually displayed.

As illustrated in FIG. 8B, in the device information DB 400, device information including the type defined in the definition information storage unit 404 and the measured value of each substrate processing apparatus 10 is included. I remember. This device information is accumulated each time the accumulation condition defined in the definition information storage unit 404 is satisfied. The device information at each time is in a format in which a plurality of types and their measured values are organized into one data. For example, the type and the measured value are connected by a connection symbol such as "/", and the information thus connected is included in one device information.

Hereinafter, the operation of the substrate processing system 1 according to the embodiment of the present invention will be described in detail.

First, the substrate processing by the substrate processing apparatus 10 is demonstrated.

As shown in FIGS. 3 and 4, when the pod 110 is supplied to the load port 114, the pod carry-in and out port 112 is opened by the front shutter 113, and above the load port 114. Of the pod 110 is carried into the interior of the housing 111 from the pod carrying in and out 112 by the pod carrying device 118.

The carried-in pod 110 is automatically conveyed by the pod conveying apparatus 118 to the designated lathe plate 117 of the rotary pod shelf 105, and is temporarily stored, and after being temporarily stored, the ladle plate ( It may be conveyed to the one pod opener 121 from 117, and after being temporarily stored, it may be conveyed to the one pod opener 121 from the lathe plate 117, and transferred to the mounting base 122, or directly It is conveyed to the pod opener 121 and transferred to the mounting table 122. At this time, the wafer loading / unloading port 120 of the pod opener 121 is closed by the cap detaching mechanism 123, and the clean air 133 is flowed and filled in the transfer chamber 124. For example, the transfer chamber 124 is filled with nitrogen gas as the clean air 133, and the oxygen concentration is 20 ppm or less, which is set to be much lower than the oxygen concentration in the interior (atmosphere) of the housing 111. It is.

The pod 110 mounted on the mounting table 122 has its opening end face pressed against the edge of the opening of the wafer carry-in / out port 120 in the front wall 119a of the sub-body 119. With the baggage, the cap is removed by the cap detachment mechanism 123 to open the wafer entrance and exit.

When the pod 110 is opened by the pod opener 121, the wafer 200 is picked up from the pod 110 through the wafer entrance by the tweezers 125c of the wafer transfer device 125a and not shown. After the wafers are matched in the notched alignment device 135, they are brought into the standby portion 126 behind the transfer chamber 124 and charged in the boat 217. The wafer transfer device 125a which transfers the wafer 200 to the boat 217 returns to the pod 110, and loads the next wafer 200 in the boat 217.

During the loading operation of the wafer to the boat 217 by the wafer transfer mechanism 125 in this one (upper or lower) pod opener 121, the other (lower or upper) pod opener 121 is rotatable. Another pod 110 is transferred from the pod shelf 105 by the pod carrying device 118, and is transferred, and the opening operation of the pod 110 by the pod opener 121 is simultaneously performed.

When the predetermined number of wafers 200 are loaded in the boat 217, the lower end of the processing chamber 202 closed by the furnace shutter 147 is opened by the furnace bulb 147. Subsequently, the boat 217 holding the wafer 200 group is loaded into the process chamber 202 by the seal cap 219 being lifted by the boat elevator 115.

After loading, in the processing chamber 202, a process is performed on the wafer 200 based on a predetermined recipe. After the treatment, the wafer 200 and the pods 110 are discharged to the outside of the housing in the opposite order to the above-mentioned procedure except for the step of matching the wafer in the notched alignment device 135 (not shown). .

While processing the substrate, the substrate processing apparatus 10 transmits the full text including the device information of the substrate processing apparatus 10, such as temperature information, pressure information, and gas information, to the group management server 4. In addition, the substrate processing apparatus 10 transmits event information to the group management server 4 whenever an event occurs.

Next, the operation of the group management server 4 according to the embodiment of the present invention will be described.

9 is a flowchart showing an operation S10 of the military management server 4 according to the embodiment of the present invention.

As shown in FIG. 9, in the group management server 4 (group management program 40), the communication unit 406 determines whether or not a full text is received from the substrate processing apparatus 10. If the military management server 4 receives the full text, the processing proceeds to step 102 (S102), and otherwise, the processing ends.

In step 102 (S102), the communication unit 406 outputs the full text to the full text accepting unit 408, and the full text accepting unit 408 determines whether the event information is included in the output full text. When event information is included in the preamble, the military management server 4 proceeds to the processing of step 106 (S106), and otherwise proceeds to the processing of step 104 (S104).

In step 104 (S104), the full text accepting unit 408 updates the data of the device information included in the full text among the device information currently stored in the information storage unit 402. After the data update, the military management server 4 returns to the process of step 100 (S100).

In step 106 (S106), the full text accepting unit 408 outputs event information included in the full text to the device information registering unit 410, and the device information registering unit 410 designates this event information as an accumulation condition. It is determined whether there is. If the event information is designated as the accumulation condition, the group management server 4 proceeds to the processing of step 108 (S108), and otherwise returns to the processing of step 100 (S100).

In step 108 (S108), the device information registration unit 410 reads the information about the substrate processing apparatus 10 of the transmission source of the event information as the device information currently stored in the information storage unit 402, and the device information. Is associated with the event occurrence time and accumulated in the device information DB400. After the accumulation, the group management server 4 returns to the processing of step 100 (S100).

As described above, in the group management server 4, the latest information among the device information from the substrate processing apparatus 10 is once stored in the current information storage unit 402, and stored in the current information storage unit 402. Of the information, only the information related to the event defined by the definition information of the definition information storage unit 404 is accumulated in the device information DB 400, but the operation in the group management server 4 is not limited to this. .

For example, in the group management server 4, only the device information defined by the definition information among the device information from the substrate processing apparatus 10 with reference to the definition information of the definition information storage unit 404 in advance is presently present. Of the information stored in the information storage unit 402 and currently stored in the information storage unit 402, only information on an event defined by the definition information of the definition information storage unit 404 is provided in the device information DB 400. It may accumulate.

Next, browsing of the information about the substrate processing apparatus 10 using the terminal device 6 will be described.

10 is a diagram illustrating an obstacle information screen displayed on the terminal device 6.

FIG. 10A shows an example in which the type designated as the definition information in the definition information storage unit 404 and the type of the device information at the desired time stored in the device information DB 400 match. As illustrated in FIG. 10 (A), the failure information screen includes the contents of the failure and the device information at the time of the occurrence of the failure, and the device information includes the type defined by the definition information storage unit 404 and the occurrence of the failure. Measurements are included. Here the measurements corresponding to all defined categories are displayed.

The definition information stored in the definition information storage unit 404 can be changed. Therefore, when definition information is changed, there may be a case where the type specified by the definition information does not match the type of the device information at the desired time.

FIG. 10B shows an example in which the type designated as the definition information in the definition information storage unit 404 does not match the type of the device information at the desired time stored in the device information DB 400. As illustrated in FIG. 10B, when the type "pressure" is defined in the definition information at the search time, but the type "pressure" is not defined in the definition information at the desired time, The measurement value of the type "pressure" is not stored in the device information DB400. In this case, the measured value is not displayed in the type "pressure" column of the obstacle information screen, and the said column is a state of empty space.

In this manner, even when the definition information is changed, the terminal device 6 can display information on the type accumulated in the device information of the substrate processing apparatus 10. On the other hand, the measurement value regarding the type accumulated in the device information DB 400 but not defined in the definition information at the time of retrieval is obtained from the group management server 4 by the terminal device 6, but is displayed on the obstacle information screen. It doesn't work.

As described above, the substrate processing system 1 according to the present invention holds the latest device information of the substrate processing apparatus 10 based on the full text transmitted from the substrate processing apparatus 10, and the substrate processing apparatus 10. Stored in the device information DB 400 of the group management server 4 and the group management server 4 which accumulate the specified type and the measured value of the device information in the device information DB 400 at the timing at which the event occurred. It has a terminal device 6 for retrieving device information. Therefore, since the device information at each time includes the measured value of the defined type, the terminal device 6 can search the device information based on the time information, and at the time of retrieval, the type is retrospectively classified. There is no need to supplement the measurements. As a result, since the search time is shortened, for example, the efficiency of work such as data analysis work can be improved.

Next, a modification of the storage structure of the current information storage unit 402 of the group management program 40 and the storage structure of the item information DB 412 will be described. On the other hand, the item information includes device information and event information.

11 is a diagram showing a modification of the storage structure of the current information storage unit 402 of the group management program 40 and the storage structure of the item information DB 412, where (A) is the current information storage unit 402. (B) illustrates item information DB 412.

As illustrated in FIG. 11B, the item information may include information on the process recipe (for example, the name of the process recipe), a wafer map, an O 2 concentration, and the like. In other words, the item information may include process information of each substrate processing apparatus 10. For example, when there is a change in the name of the process recipe, wafer map, O 2 concentration, or the like at the start of the boat 217 and at the end of the lift, the user uses the terminal device 6 to change the boat 217. The difference can be confirmed by acquiring information about the time before and after the rise of. On the other hand, the wafer map or the O 2 concentration and the like by way of example only, may be a different type is stored.

In addition, the substrate processing apparatus 10 which concerns on this invention is applied not only to a semiconductor manufacturing apparatus but also the apparatus which processes glass substrates, such as an LCD apparatus. Moreover, the substrate processing apparatus 10 which concerns on this invention is applied also to the exposure apparatus, the coating apparatus, the drying apparatus, the heating apparatus, etc. which are other substrate processing apparatuses. Further, the substrate processing apparatus 10 according to the present invention is not limited to an in-house treatment, but includes a film formation including a process of forming a CVD, PVD, an oxide film, a nitric acid, and a process of forming a film containing a metal. Processing can be performed. In addition, the substrate processing apparatus 10 according to the present invention can perform annealing treatment, oxidation treatment, nitriding treatment, diffusion treatment, or the like.

In addition, the present invention also includes the following embodiments.

An information management apparatus according to the present invention includes first device information storage means for storing device information of the substrate processing apparatus at the time when the message is transmitted, based on the message transmitted from the substrate processing apparatus for processing the substrate; Second device information storage means for storing information and time in association with each other, condition storage means for storing settings of moving device information and conditions for storing the device information, and conditions stored in the condition storage means are satisfied. And a registration means for registering in the second device information storage means in association with the time when the condition is satisfied and the device information that matches the setting stored in the first device information storage means.

A first substrate processing system according to the present invention includes a plurality of substrate processing apparatuses for processing a substrate, an information management apparatus for processing a telegram transmitted from the substrate processing apparatus, and a terminal device connected to the information management apparatus. A substrate processing system, wherein the substrate processing apparatus includes transmission means for transmitting a telegram including device information or event information to the information management apparatus, and the information management apparatus based on the telegram transmitted from the transmission means. A first device information storage means for storing device information of the substrate processing apparatus at the time when the full text is transmitted, a second device information storage means for storing device information and time in association with each other, and a condition for storing device information. If the condition storage means to be stored, the condition stored in the condition storage means and the event information match, And registration means for associating the time at which the solution condition is satisfied with the device information stored in the first device information storage means, and registering it in the second device information storage means, wherein the terminal device stores the second device information memory. And retrieving means for retrieving the device information stored in the means.

In the second substrate processing system according to the present invention, in the first substrate processing system, a display means is provided in the terminal means, and the device information stored in the condition storage means and the second device information storage means is referred to. If the stored device information coincides with the contents of the condition storing means, it displays on the display means.

In a third substrate processing system according to the present invention, in the first substrate processing system, the substrate processing apparatus includes retrieving means for retrieving device information stored in the second device information storage means, And display means for displaying the retrieved device information.

In the first data retrieval method according to the present invention, the first data retrieval method stores the latest data transmitted from the apparatus, and when the predetermined data is received in advance, the first data retrieval method is stored in the first storage means. At least a part of the data is accumulated in the second storage means at the time when the predetermined data is generated, and the accumulated data is retrieved.

The second data retrieval method according to the present invention stores the latest data transmitted from the apparatus in the first storage means for storing the predetermined data and the data to be moved to the second storage means only when the predetermined data occurs. When the predetermined data is received with reference to the set parameter, at least some data of the data stored in the first storage means is accumulated in the second storage means, and the accumulated data is retrieved.

A first data retrieval system according to the present invention includes first storage means for overwriting and storing data transmitted from a processing apparatus, and predetermined data and data to be moved from the first storage means when the predetermined data is received. And second storage means for accumulating data stored in the first storage means, and terminal means for retrieving the accumulated data, corresponding to the set parameter.

The second data retrieval system according to the present invention is, in the first data retrieval system, provided with display means in the terminal means, and the parameter and the accumulated data are retrieved so that the accumulated data is determined by the contents of the parameter. If there is a match, it is displayed on the display means.

A third data retrieval system according to the present invention is the first data retrieval system, wherein the processing apparatus includes retrieval means for retrieving data accumulated in the second storage means, and displays the data retrieved by the retrieval means. And display means.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a diagram showing device information stored in a conventional group management server, its structure, and a method of acquiring stored device information.

2 is a diagram illustrating a configuration of a substrate processing system 1 according to an embodiment of the present invention.

3 is a perspective view of a substrate processing apparatus 10 according to an embodiment of the present invention.

4 is a side perspective view of the substrate processing apparatus 10 according to the embodiment of the present invention.

5 is a diagram illustrating a functional configuration of the substrate processing apparatus 10 centered on the PMC 14.

FIG. 6 is a diagram showing the hardware configuration of the terminal device 6 mainly on the control device 16. FIG.

FIG. 7 is a diagram showing the functional configurations of the group management program 40 executed by the group management server 4 and the terminal program 60 executed by the terminal device 6.

FIG. 8 is a diagram schematically showing a storage structure of the current information storage unit 402 and the device information DB 400 of the group management program 40, (A) illustrating the current information storage unit 402, (B) is a diagram illustrating the device information DB 400.

9 is a flowchart showing an operation S10 of the military management server 4 according to the embodiment of the present invention.

10 is a diagram illustrating an obstacle information screen displayed on the terminal device 6.

FIG. 11 is a diagram showing a modification of the storage structure of the current information storage unit 402 of the group management program 40 and the storage structure of the item information DB 412. (A) shows the current information storage unit 402. FIG. And (B) illustrates an item information DB 412.

<Description of Drawing Major Symbols>

1: substrate processing system 4: military management server

6: terminal device 10: substrate processing device

12 network 16 control device

18: CPU 20: memory

22: communication IF 24: display / input device

26: memory 40: military management program

400: device information DB 402: current information storage unit

404: Definition information storage unit 406: communication unit

408: professional reception unit 410: device information register

412: item information DB 60: terminal program

600: UI unit 602: device information acquisition unit

604: screen generation unit

Claims (12)

An information management method for managing information based on a full text containing device information or event information transmitted from a substrate processing apparatus for processing a substrate, the information management method comprising: The device information is stored in the first device information storage means, and when the full text including event information is transmitted, the event information and the condition for storing the device information are compared and matched. And an information management method that associates the time at which the event information occurred with the second device information storage means. delete An information display method for displaying information on an operation terminal having an operation screen, wherein when the telegraph including event information is transmitted from a substrate processing apparatus for processing a substrate, the operation terminal includes the event information and the first device information storage means. The moving condition for moving the device information stored in the second device information storage means to the second device information storage means and the condition storage means for which the device information of the moving target is set, and adding and storing the time at which the event information occurred to the set moving target device information. An information display method of searching for the second device information storage means, comparing the searched result information with the set device information, and displaying the device information on the operation screen if they match. A first device information storage means for storing device information of the substrate processing apparatus at the time when the full text is transmitted, based on the full text transmitted from the substrate processing apparatus for processing the substrate, and a device for storing the device information in association with the time; 2 device information storage means, setting of moving device information, condition storage means for storing the condition for storing the device information, and time when the condition is satisfied, if the condition stored in the condition storage means is satisfied; And registration means for associating device information matching the setting stored in said first device information storage means with said second device information storage means. A substrate processing system comprising a plurality of substrate processing apparatuses for processing a substrate and an information management apparatus for processing a telegram transmitted from the substrate processing apparatus, wherein the substrate processing apparatus includes a telegram including device information or event information. A transmission means for transmitting to the information management apparatus, wherein the information management apparatus stores the device information of the substrate processing apparatus at the time when the message is transmitted based on the message transmitted from the transmission means. Information storage means, second device information storage means for storing device information and time in association with each other, condition storage means for storing settings of moving device information and conditions for storing the device information, and storage in the condition storage means. When the condition is satisfied, it is stored in the time when the condition is satisfied and in the first device information storage means. The substrate processing system of the apparatus in association with information that art consistent with the set comprises a registration means for registering in the second device information storage means. A substrate processing system comprising a plurality of substrate processing apparatuses for processing a substrate, an information management apparatus for processing a telegram transmitted from the substrate processing apparatus, and a terminal device connected to the information management apparatus. Transmission means for transmitting a telegram including device information or event information to the information management apparatus, wherein the information management apparatus is based on the telegram transmitted from the transmission means, and the substrate processing at the time when the telegram is transmitted. A first device information storage means for storing device information of the device, a second device information storage means for storing device information and time in association with each other, a condition for storing setting of moving device information and a condition for storing the device information The storage means and, when the conditions stored in the condition storage means are satisfied, And registration means for associating device information that matches the setting stored in the first device information storage means with the second device information storage means, wherein the terminal device is provided with the second device information storage means. A substrate processing system comprising retrieval means for retrieving stored device information. The substrate processing apparatus according to claim 5 or 6, wherein the substrate processing apparatus includes retrieving means for retrieving device information stored in the second device information storage means, and displays the device information retrieved by the retrieving means. A substrate processing system comprising display means. The substrate processing apparatus in the substrate processing system in any one of Claims 5-6. 7. The terminal device according to claim 6, wherein the terminal device includes display means, and the stored device information stores the condition information with reference to the device information stored in the condition storage means and the second device information storage means. The substrate processing system which displays on the said display means if it matches the content of the means. As a substrate processing apparatus in the substrate processing system as described in any one of Claims 5-6, Retrieving means for retrieving device information stored in the second device information storage means; Display means for displaying the device information retrieved by the search means Substrate processing apparatus comprising a. As a terminal apparatus in the substrate processing system of Claim 6, Including marking means, The terminal device referring to the device information stored in the condition storage means and the second device information storage means, and displayed on the display means if the stored device information matches the contents of the condition storage means.  An operation terminal including an operation screen, When the preamble including event information is transmitted from the substrate processing apparatus for processing the substrate, the movement condition and the movement target for moving the event information and the device information stored in the first device information storage means to the second device information storage means. With reference to the condition storage means for which device information is set, the second device information storage means is searched for by adding the time at which the event information occurred to the set device information of the moving object, and the searched result information and the set device information. And compares and, if there is a match, displays the device information on the operation screen.
KR1020090027321A 2008-07-15 2009-03-31 Information managing method, information managing apparatus and substrate processing system KR101097913B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008183573A JP5412065B2 (en) 2008-07-15 2008-07-15 Information management method, information management apparatus, and substrate processing system
JPJP-P-2008-183573 2008-07-15

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020110019789A Division KR101028356B1 (en) 2008-07-15 2011-03-07 Information managing method, information managing apparatus and substrate processing system

Publications (2)

Publication Number Publication Date
KR20100008327A KR20100008327A (en) 2010-01-25
KR101097913B1 true KR101097913B1 (en) 2011-12-23

Family

ID=41575688

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020090027321A KR101097913B1 (en) 2008-07-15 2009-03-31 Information managing method, information managing apparatus and substrate processing system
KR1020110019789A KR101028356B1 (en) 2008-07-15 2011-03-07 Information managing method, information managing apparatus and substrate processing system

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020110019789A KR101028356B1 (en) 2008-07-15 2011-03-07 Information managing method, information managing apparatus and substrate processing system

Country Status (4)

Country Link
JP (1) JP5412065B2 (en)
KR (2) KR101097913B1 (en)
CN (1) CN101630631B (en)
TW (1) TWI398790B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5420981B2 (en) * 2009-06-11 2014-02-19 株式会社日立国際電気 Substrate processing system, group management device, communication processing program and data processing method for group management device.
TWI474143B (en) * 2010-02-09 2015-02-21 Hitachi Int Electric Inc Substrate processing system and data processing method thereof, group control device and data processing method thereof, method of manufacturing semiconductor processing apparatus, and computer-readable recording medium
JP5841336B2 (en) * 2011-02-08 2016-01-13 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing apparatus and information management method
JP6106606B2 (en) * 2011-12-20 2017-04-05 株式会社日立国際電気 Substrate processing system, substrate processing apparatus, data storage method and program for substrate processing apparatus
WO2016157402A1 (en) * 2015-03-31 2016-10-06 株式会社日立国際電気 Substrate processing device, semiconductor device production method, and recording medium
WO2017056241A1 (en) * 2015-09-30 2017-04-06 株式会社日立国際電気 Substrate processing system, file management method of substrate processing device, and program
AT520012A1 (en) * 2017-06-01 2018-12-15 Keba Ag Method for operating a production plant and construction of the production plant

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231595A (en) 2001-01-31 2002-08-16 Hitachi Ltd Semiconductor manufacturing equipment managing system
JP2004207679A (en) 2002-12-24 2004-07-22 Powerchip Semiconductor Corp Automated management system
JP2008117974A (en) 2006-11-06 2008-05-22 Tokyo Electron Ltd Server equipment, information processing method, and program
JP2008140369A (en) 2006-11-02 2008-06-19 Tokyo Electron Ltd Server device, manufacturing device, group control system, information processing method, and program

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299316A (en) * 1992-04-20 1993-11-12 Kokusai Electric Co Ltd Semiconductor manufacturing equipment
US7728953B2 (en) * 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
JP2006294831A (en) * 2005-04-11 2006-10-26 Hitachi Kokusai Electric Inc Data collecting system
JP4780715B2 (en) * 2006-08-01 2011-09-28 東京エレクトロン株式会社 Server apparatus and program
TW200826592A (en) * 2006-12-07 2008-06-16 Inventec Corp A test system and method for using a local loop to establish connection to baseboard management control

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231595A (en) 2001-01-31 2002-08-16 Hitachi Ltd Semiconductor manufacturing equipment managing system
JP2004207679A (en) 2002-12-24 2004-07-22 Powerchip Semiconductor Corp Automated management system
JP2008140369A (en) 2006-11-02 2008-06-19 Tokyo Electron Ltd Server device, manufacturing device, group control system, information processing method, and program
JP2008117974A (en) 2006-11-06 2008-05-22 Tokyo Electron Ltd Server equipment, information processing method, and program

Also Published As

Publication number Publication date
JP5412065B2 (en) 2014-02-12
KR20100008327A (en) 2010-01-25
JP2010027646A (en) 2010-02-04
CN101630631A (en) 2010-01-20
TWI398790B (en) 2013-06-11
KR20110030529A (en) 2011-03-23
KR101028356B1 (en) 2011-04-11
TW201013451A (en) 2010-04-01
CN101630631B (en) 2012-04-25

Similar Documents

Publication Publication Date Title
KR101028356B1 (en) Information managing method, information managing apparatus and substrate processing system
US8719230B2 (en) Information managing method, information searching method and data displaying method
US8874259B2 (en) Substrate processing apparatus and method of processing error of substrate processing apparatus
KR101043986B1 (en) Substrate processing system and group management system
KR20110134273A (en) Control system of substrate processing apparatus, collection unit, substrate processing apparatus and control method of substrate processing apparatus
KR101075128B1 (en) Substrate processing apparatus
US20110071661A1 (en) Substrate processing system
WO2011021635A1 (en) Substrate processing system, group management device, and display method for substrate processing system
KR101074685B1 (en) Substrate processing apparatus
KR101075935B1 (en) Substrare processing system and data retrieval method
JP2012129414A (en) Substrate processing system
JP2012060059A (en) Substrate processing system, substrate processing apparatus and display method of substrate processing apparatus
JP6018369B2 (en) Substrate processing system, management apparatus, and display method in substrate processing system
JP2009290158A (en) Substrate processing system
JP2014082497A (en) Data retrieval method, data retrieval system, and management program executed by information management device
JP2009260130A (en) Substrate processing system
JP2012059724A (en) Substrate processing system
JP5420981B2 (en) Substrate processing system, group management device, communication processing program and data processing method for group management device.
JP2014116453A (en) Data acquiring method and management device for substrate processing apparatus
JP5546195B2 (en) Substrate processing apparatus, display method for substrate processing apparatus, and method for manufacturing semiconductor device
JP2011249387A (en) Substrate processing system
JP2009252911A (en) Substrate processing system
JP2010225617A (en) Substrate processing system

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
A107 Divisional application of patent
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20141120

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20151118

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20161123

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20171114

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20181129

Year of fee payment: 8

FPAY Annual fee payment

Payment date: 20191202

Year of fee payment: 9