JP5412065B2 - Information management method, information management apparatus, and substrate processing system - Google Patents

Description

  The present invention is stored in a substrate processing system or information management apparatus including an information management method and apparatus for managing information transmitted from a substrate processing apparatus for processing a semiconductor substrate, a glass substrate, or the like, or a substrate processing apparatus and an information management apparatus. And a substrate processing system including the information.

  In general, this type of substrate processing system includes a plurality of substrate processing apparatuses that perform processing on a substrate, and a group management server that manages information (data) such as operation status monitoring and production history of the plurality of substrate processing apparatuses. Information management device). Therefore, the information management apparatus manages various information such as measured values such as temperature, pressure, gas, and operation status transmitted from the substrate processing apparatus. By such an information management apparatus, the efficiency of semiconductor production is improved. The user acquires information managed by the information management device using the terminal device.

  However, in the conventional substrate processing system, it may take time for the terminal device to acquire information from the information management device.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to shorten the time for the terminal device to acquire information from the information management device.

  A first information management method according to the present invention is an information management method for managing information based on a message including device information or event information transmitted from a substrate processing apparatus that processes a substrate, and includes a message including device information. The apparatus information of the substrate processing apparatus at the time when is transmitted is stored in the first apparatus information storage means, and when a message including event information is transmitted, the event information and the conditions for storing the apparatus information are stored. Are compared, the device information and the time when the event information occurred are associated with each other and stored in the second device information storage means.

  According to the second information management method of the present invention, when a message including the event information is transmitted, the event information and the device information stored in the first device information storage means are stored in the second device information storage means. If the event information matches the condition, the device information stored in the first device information storage means is compared with the condition storage means in which the movement condition to be moved to the device information to be moved is set. Then, the time when the event information occurs is added to the set device information to be moved and stored in the second device information storage means.

  The information display method according to the present invention is an information display method for displaying information on an operation terminal having an operation screen, and the operation terminal when an electronic message including event information is transmitted from a substrate processing apparatus for processing a substrate. Refers to the condition storage means in which the movement condition for moving the event information and the device information stored in the first device information storage means to the second device information storage means and the device information to be moved are set, The second device information storage means stored by adding the time when the event information occurred to the set device information to be moved is searched, and the searched result information is compared with the set device information. If they match, the device information is displayed on the operation screen.

  According to the present invention, when the terminal device acquires information from the information management device, it is possible to reduce the time required for the search. Furthermore, using various information generated when the substrate is processed by the substrate processing apparatus, data analysis (for example, pursuit of the cause of abnormality occurring in the substrate processing apparatus) and data processing (for example, transmission from the substrate processing apparatus) The time for performing production information graphing, etc.) can be shortened.

First, the background of the present invention will be described with reference to FIG.
FIG. 1 is a diagram showing device information and its structure stored in a conventional group management server, and a method for retrieving stored device information.
FIG. 1A is a diagram illustrating a message transmitted from the substrate processing apparatus. As illustrated in FIG. 1A, each message includes a transmission time, a name of a substrate processing apparatus as a transmission source (apparatus name), an item type, and information on the item (measurement value, etc.). . The group management server receives messages transmitted from a plurality of substrate processing apparatuses, acquires apparatus information from the messages, and stores the apparatus information.

  FIG. 1B is a diagram schematically showing a structure in which device information is stored. As shown in FIG. 1B, the device information is stored in a database (DB). The DB includes an item management table, a measurement data management table, and a device management table. In the item management table, each item corresponding to the item type is managed. In the apparatus management table, each substrate processing apparatus is managed. In the measurement data management table, information (measurement value, etc.) associated with the item managed in the item management table and the device managed in the device management table, and the time included in the message (the “time” in FIG. 1A) Is equivalent).

  The merit of this DB structure is as follows. That is, 1) there is no influence on the DB structure even if an item is added (for example, a new table has to be added). 2) even when a substrate processing apparatus is added, the DB structure is changed. 3) Even when each substrate processing apparatus includes different items, the apparatus information is managed by the measurement data management table. 4) Information related to items included in the substrate processing apparatus (in the measurement data management table) Only measured values) are stored, so there is no unnecessary data area.

FIG. 1C shows a method for acquiring device information stored in the DB. For example, when confirming the state of a substrate processing apparatus (failure occurrence apparatus) at the time of occurrence of a failure, a terminal device as an operation terminal refers to the item management table, measurement data management table, and device management table of the DB, and these three tables Is reconfigured as a table illustrated in FIG. 1C, and the measured value of each item at each time is searched for the failure occurrence device in the table of FIG. Here, since the measured values of all items are not always stored at each time, it is necessary to go back to the time when the measured values are stored when the measured values are not stored at the desired time. is there. Specifically, it is necessary for the terminal device to perform measurement value complementation for each item from a desired time to a time at which the measurement value is stored. For example, the terminal device can search for the value of temperature ch1 (690.0) at time 12:00:04, but cannot search for the values of temperature ch2 and gas ch1, but can search for the values of temperature ch2 and gas ch1. To search, it is necessary to go back to time 12:00:02.
Thus, this DB structure has the following disadvantages. That is, 1) It takes time to reconstruct a plurality of related tables as one table for data retrieval, and 2) It takes time to interpolate measurement values.

Hereinafter, a substrate processing system according to an embodiment of the present invention will be described based on the background described above.
FIG. 2 is a diagram showing a configuration of the substrate processing system 1 according to the embodiment of the present invention.
As shown in FIG. 2, the substrate processing system 1 includes a plurality of substrate processing apparatuses 10-1 to 10-n, a group management server 4, and a terminal device 6. The substrate processing apparatuses 10-1 to 10-n, the group management server 4 and the terminal apparatus 6 are connected to each other so as to be able to transmit and receive data via a network 12 such as a LAN or a WAN. In addition, when it shows, without specifying any of several component parts, such as the substrate processing apparatus 10-1 to 10-n, it may be abbreviated simply as the substrate processing apparatus 10 or the like.

  The substrate processing apparatus 10 performs substrate processing based on a process recipe or the like. Specifically, the process recipe describes a procedure for processing a substrate, and the substrate processing apparatus 10 controls components in the apparatus based on this procedure. In addition, the substrate processing apparatus 10 sends a message including information related to processing of the substrate processing apparatus 10 (hereinafter referred to as “apparatus information”) including production information such as temperature information, pressure information, and gas information via the network 12. It transmits to the group management server 4. Further, the substrate processing apparatus 10 may be, for example, information that occurs less frequently or information that occurs unexpectedly (hereinafter referred to as information (error information) or information (operation information) that indicates a predetermined operation in substrate processing) A message including “event information” is transmitted to the group management server 4.

  As an example, the substrate processing apparatus 10 is configured as a semiconductor manufacturing apparatus that implements a processing apparatus in a semiconductor device (IC) manufacturing method. In the following description, an embodiment will be described in which a vertical apparatus that performs oxidation, diffusion processing, CVD processing, or the like is applied to a substrate as the substrate processing apparatus. The detailed structure of the substrate processing apparatus 10 will be described in detail later.

  The group management server 4 (information management device) receives a message transmitted from the substrate processing apparatus 10, and stores and manages device information or event information included in the message. Further, the group management server 4 may be realized to include a plurality of databases (DB). The function and DB structure of the group management server 4 will be described in detail later.

  The terminal device 6 searches for information stored by the group management server 4, displays a search result on a screen, and constitutes an interface for providing information to the user. More specifically, the terminal device 6 receives a user request via a keyboard or a mouse, acquires information from the group management server 4, and displays this information on the screen. The terminal device 6 does not need to be placed in a place (for example, a clean room) where the substrate processing apparatus 10 is placed, and is placed in a place different from the place where the substrate processing apparatus 10 is placed, such as an office. Also good.

Next, a detailed configuration of the substrate processing apparatus 10 will be described.
FIG. 3 is a perspective view of the substrate processing apparatus 10 according to the embodiment of the present invention. FIG. 4 is a side perspective view of the substrate processing apparatus 10 according to the embodiment of the present invention.
As shown in FIGS. 3 and 4, an embodiment of the present invention in which a hoop (substrate container; hereinafter referred to as a pod) 110 is used as a wafer carrier containing a wafer (substrate) 200 made of silicon or the like. The substrate processing apparatus 10 according to FIG. A front maintenance port 103 as an opening provided for maintenance is opened at the front front portion of the front wall 111a of the casing 111, and front maintenance doors 104 and 104 for opening and closing the front maintenance port 103 are respectively built. It is attached.

  A pod loading / unloading port (substrate container loading / unloading port) 112 is opened on the front wall 111a of the casing 111 so as to communicate between the inside and the outside of the casing 111. The pod loading / unloading port 112 has a front shutter (substrate container loading / unloading port). The loading / unloading opening / closing mechanism 113 is opened and closed. A load port (substrate container delivery table) 114 is installed in front of the front side of the pod loading / unloading port 112, and the load port 114 is configured so that the pod 110 is placed and aligned. The pod 110 is carried onto the load port 114 by an in-process carrying device (not shown), and is also carried out from the load port 114.

  A rotary pod shelf (substrate container mounting shelf) 105 is installed at an upper portion of the casing 111 in a substantially central portion in the front-rear direction. The rotary pod shelf 105 stores a plurality of pods 110. It is configured. In other words, the rotary pod shelf 105 is vertically arranged and intermittently rotated in a horizontal plane, and a plurality of shelf boards (supported by a substrate container) that are radially supported by the support 116 at each of the upper, middle, and lower positions. And a plurality of shelf plates 117 are configured to hold the pods 110 in a state where a plurality of pods 110 are respectively placed.

  A pod transfer device (substrate container transfer device) 118 is installed between the load port 114 and the rotary pod shelf 105 in the housing 111, and the pod transfer device 118 moves up and down while holding the pod 110. A pod elevator (substrate container lifting mechanism) 118a and a pod transfer mechanism (substrate container transfer mechanism) 118b as a transfer mechanism are configured. The pod transfer device 118 includes a pod elevator 118a and a pod transfer mechanism 118b. The pod 110 is transported between the load port 114, the rotary pod shelf 105, and the pod opener (substrate container lid opening / closing mechanism) 121 by continuous operation.

  A sub-housing 119 is constructed across the rear end of the lower portion of the housing 111 at a substantially central portion in the front-rear direction. A pair of wafer loading / unloading ports (substrate loading / unloading ports) 120 for loading / unloading the wafer 200 into / from the sub-casing 119 are arranged on the front wall 119a of the sub-casing 119 in two vertical stages. A pair of pod openers 121 and 121 are installed at the wafer loading / unloading ports 120 and 120 at the upper and lower stages, respectively. The pod opener 121 includes mounting bases 122 and 122 on which the pod 110 is placed, and cap attaching / detaching mechanisms (lid attaching / detaching mechanisms) 123 and 123 for attaching and detaching caps (lids) of the pod 110. The pod opener 121 is configured to open and close the wafer loading / unloading port of the pod 110 by attaching / detaching the cap of the pod 110 placed on the placing table 122 by the cap attaching / detaching mechanism 123.

  The sub-housing 119 constitutes a transfer chamber 124 that is fluidly isolated from the installation space of the pod transfer device 118 and the rotary pod shelf 105. A wafer transfer mechanism (substrate transfer mechanism) 125 is installed in the front region of the transfer chamber 124, and the wafer transfer mechanism 125 rotates the wafer 200 in the horizontal direction or can move the wafer 200 in the horizontal direction. A substrate transfer device) 125a and a wafer transfer device elevator (substrate transfer device lifting mechanism) 125b for moving the wafer transfer device 125a up and down. As schematically shown in FIG. 4, the wafer transfer device elevator 125 b is installed between the right end of the pressure-resistant casing 111 and the right end of the front area of the transfer chamber 124 of the sub casing 119. By the continuous operation of the wafer transfer device elevator 125b and the wafer transfer device 125a, the tweezer (substrate holder) 125c of the wafer transfer device 125a is used as a placement portion for the wafer 200 with respect to the boat (substrate holder) 217. The wafer 200 is loaded (charged) and unloaded (discharged).

  In the rear region of the transfer chamber 124, a standby unit 126 that houses and waits for the boat 217 is configured. A processing chamber 202 is provided above the standby unit 126. The lower end portion of the processing chamber 202 is configured to be opened and closed by a furnace port shutter (furnace port opening / closing mechanism) 147.

  As schematically shown in FIG. 3, a boat elevator (substrate holder lifting / lowering) for raising and lowering the boat 217 between the right end of the pressure-resistant casing 111 and the right end of the standby section 126 of the sub casing 119 is illustrated. Mechanism) 115 is installed. A seal cap 219 serving as a lid is horizontally installed on an arm 128 serving as a connecting tool connected to a lifting platform of the boat elevator 115, and the seal cap 219 supports the boat 217 vertically, and a lower end of the processing chamber 202. It is comprised so that a part can be obstruct | occluded. The boat 217 includes a plurality of holding members, and is configured to hold a plurality of (for example, about 50 to 125) wafers 200 horizontally in a state where the centers are aligned in the vertical direction. Has been.

  As schematically shown in FIG. 3, the left end of the transfer chamber 124 opposite to the wafer transfer device elevator 125b side and the boat elevator 115 side is a cleaned atmosphere or an inert gas. A clean unit 134 composed of a supply fan and a dust-proof filter is installed so as to supply clean air 133. Between the wafer transfer device 125a and the clean unit 134, although not shown, the circumferential direction of the wafer A notch aligning device 135 is installed as a substrate aligning device for aligning the positions.

  The clean air 133 blown out from the clean unit 134 flows into the notch aligning device 135, the wafer transfer device 125a, and the boat 217 in the standby unit 126, and is then sucked in through a duct (not shown) to the outside of the housing 111. Exhaust is performed or it is circulated to the primary side (supply side) that is the suction side of the clean unit 134, and is again blown into the transfer chamber 124 by the clean unit 134.

Next, a process module controller (PMC) 14 that is provided in the substrate processing apparatus 10 and controls each apparatus in the substrate processing apparatus 10 will be described.
FIG. 5 shows a functional configuration of the substrate processing apparatus 10 centering on the PMC 14.
As shown in FIG. 5, the PMC 14 transmits / receives data to / from a CPU 140, ROM 142, RAM 144, a hard disk drive (HDD) 158 that stores data, a display device such as a display (not shown), and an input device such as a keyboard. An input / output interface (IF) 146, a communication control unit 156 for controlling data communication with the group management server 4 and the like via the network 12, a temperature control unit 150, a gas control unit 152, a pressure control unit 154, and An I / O control unit 148 that performs I / O control with the temperature control unit 150 and the like is included. These components are connected to each other via a bus 160, and data is input and output between the components via the bus 160.

  In the PMC 14, the CPU 140 processes the substrate based on a predetermined recipe. Specifically, the CPU 140 outputs control data (control instruction) to the temperature control unit 150, the gas control unit 152, the pressure control unit 154, and the like. The ROM 142, RAM 144, and HDD 158 store a sequence program, data input from the input / output IF 146, data input via the communication control unit 156, and the like.

  The temperature controller 150 controls the temperature in the processing chamber 202 by the heater 338 provided on the outer periphery of the processing chamber 202 described above. The gas control unit 152 controls the supply amount of the reaction gas supplied into the processing chamber 202 based on the output value from the MFC (mass flow controller) 342 provided in the gas pipe 340 of the processing chamber 202. The pressure control unit 154 controls the pressure in the processing chamber 202 by opening and closing the valve 348 based on the output value of the pressure sensor 346 provided in the exhaust pipe 344 of the processing chamber 202. The transfer control unit 159 controls transfer systems such as the pod opener 121, the boat elevator 115, and the wafer transfer mechanism. As described above, the temperature control unit 150 and the like control each unit (the heater 338, the MFC 342, the valve 348, and the like) of the substrate processing apparatus 10 based on a control instruction from the CPU 140.

  Therefore, the CPU 140 starts the sequence program, and calls and executes recipe commands according to the sequence program, so that the steps in which the target values of the control parameters are set are sequentially executed, and the I / O control unit 148 is executed. Via the temperature control unit 150, the gas control unit 152, the pressure control unit 154, and the transfer control unit 159, a control instruction for processing the substrate is transmitted. The temperature control unit 150 and the like control each unit (the heater 338, the MFC 342, the valve 348, and the like) in the substrate processing apparatus 10 according to a control instruction. Thereby, processing of the wafer 200 is performed.

  The CPU 140 (transmission means) sends a message including apparatus information or event information of the substrate processing apparatus 10 including production information such as temperature information, pressure information, and gas information to the group management server 4 via the communication control unit 156. Send. For example, when any production information changes, the CPU 140 transmits a telegram including device information that reflects the change information. In addition, the CPU 140 transmits a message including information (event information) related to the event and failure of the substrate processing apparatus 10 to the group management server 4. The event is, for example, when the boat 217 starts to rise, at the end of the rise, at the start of descent, or at the end of descent. When such an event occurs, the position sensor of the boat elevator 115 is switched on and off, and a switching signal is transmitted.

FIG. 6 is a diagram illustrating a hardware configuration of the terminal device 6 with the control device 16 as the center.
As shown in FIG. 6, the terminal device 6 includes a control device 16 including a CPU 18 and a memory 20, a communication interface (IF) 22 that transmits and receives data to and from an external computer via a network 12, a hard disk drive, and the like. The display / input device 24 includes a storage device 26, a display device such as a liquid crystal display, and a pointing device such as a keyboard and a mouse. Thus, the terminal device 6 is realized as a general-purpose computer such as a personal computer. The group management server 4 includes the control device 16, the communication IF 22, and the storage device 26 described above. The group management server 4 is configured to be connected to the display / input device 24 of the terminal device 6 via the communication IF 22.

Next, the function and DB structure of the group management server 4 and the function of the terminal device 6 will be described.
FIG. 7 is a diagram illustrating a functional configuration of the group management program 40 executed by the group management server 4 and the terminal program 60 executed by the terminal device 6.
As shown in FIG. 7, the group management program 40 includes a device information DB 400, a current information storage unit 402, a definition information storage unit 404, a communication unit 406, a message reception unit 408, and a device information registration unit 410. The group management program 40 is loaded on the memory 20 of the group management server 4 and is executed on an OS (not shown) operating on the control device 16.

  In the group management program 40, the current information storage unit 402 (first apparatus information storage means) stores the latest apparatus information of each substrate processing apparatus 10. Specifically, the current information storage unit 402 stores device information at the time when this electronic message is transmitted based on the electronic message transmitted from the substrate processing apparatus 10. The device information includes production information such as device identification information, temperature information, pressure information, gas information, and measurement data for each piece of production information. The current information storage unit 402 (first apparatus information storage unit) stores the measurement values of all the apparatus information of each substrate processing apparatus 10 acquired from the electronic message. The current information storage unit 402 is realized by the memory 20.

  The apparatus information DB 400 (second apparatus information storage means) stores apparatus information and time in association with each substrate processing apparatus 10. Specifically, the device information DB 400 stores device information, which is a part of device information and defined by a definition information storage unit 404 described later, for each time when defined event information occurs. The device information DB 400 is realized by at least one of the memory 20 and the storage device 26. The structure of the device information stored in the device information DB 400 and the current information storage unit 402 will be described in detail later.

  The definition information storage unit 404 stores definition information in a changeable manner. The definition information includes conditions (accumulation conditions) in which device information currently stored in the information storage unit 402 is read and stored in the device information DB 400, device information displayed on the terminal device 6, and the like. For example, the accumulation condition includes occurrence of a predetermined event. Further, for example, the device information displayed on the terminal device 6 includes the type of production information such as “temperature ch 1”, “temperature ch 2”, and “gas ch 1” and measured values of each piece of production information. The definition information storage unit 404 may store a plurality of definition information. In this case, the group management program 40 preferably has a device information DB 400 for each definition information.

  The communication unit 406 performs communication processing required for communication with the substrate processing apparatus 10. Specifically, the communication unit 406 acquires a message transmitted from the substrate processing apparatus 10 via the communication IF 22 according to a predetermined procedure, and outputs the acquired message to the message reception unit 408.

The electronic message reception unit 408 receives the electronic message output from the communication unit 406, and stores the device information in the current information storage unit 402 when the electronic message includes device information. Specifically, the message reception unit 408 updates the measurement value of the device information included in the message output from the communication unit 406 out of the device information currently stored in the information storage unit 402. For example, the message reception unit 408 overwrites the measurement value of the device information included in the message with the measurement value currently stored in the information storage unit 402. Thereby, the current information storage unit 402 stores the time when the electronic message is transmitted, that is, the latest device information of the substrate processing apparatus 10.
In addition, when the message received from the communication unit 406 includes event information, the message reception unit 408 outputs the event information to the device information registration unit 410.

  The device information registration unit 410 refers to the definition information storage unit 404 and registers the device information currently stored in the information information storage unit 402 in the device information DB 400 in accordance with the accumulation conditions stored in the definition information storage unit 404. Specifically, when the event information output from the message reception unit 408 matches the event information stored in the definition information storage unit 404 as the accumulation condition, the device information registration unit 410 matches the event information transmission source. The apparatus information of the substrate processing apparatus 10 is read from the current information storage unit 402, and at least a part of the read apparatus information is registered in the apparatus information DB 400 in association with the time when the event occurred. Here, the device information registration unit 410 refers to the definition information stored in the definition information storage unit 404, reads only the defined device information, and processes the information so that the information is collected into a predetermined data format. sign up. Thereby, every time an event as an accumulation condition occurs in the substrate processing apparatus 10, the apparatus information of the substrate processing apparatus 10 at the time of occurrence is accumulated in the apparatus information DB 400.

  The terminal program 60 includes a user interface (UI) unit 600, a device information acquisition unit 602, and a screen generation unit 604. The terminal program 60 is loaded on the memory 20 of the terminal device 6 and is executed on an OS (not shown) operating on the control device 16.

  In the terminal program 60, the UI unit 600 (display unit) receives the content input via the display / input device 24 and outputs the content to the device information acquisition unit 602. For example, the UI unit 600 receives identification information such as the name and identifier (ID) of the substrate processing apparatus 10 and the time. The UI unit 600 also displays a failure information screen (described later) generated by the screen generation unit 604 on the display / input device 24.

  The apparatus information acquisition unit 602 searches the apparatus information stored in the apparatus information DB 400 based on the identification information and time output from the UI unit 600, and at the time of the substrate processing apparatus 10 identified by the identification information. Get device information. The device information acquisition unit 602 outputs the acquired device information to the screen generation unit 604.

  The screen generation unit 604 refers to the definition information storage unit 404 and acquires the type of the defined device information and the measured value of each device information. The screen generation unit 604 generates a screen configuration of the failure information screen based on the type of device information. Furthermore, the screen generation unit 604 generates the failure information screen by combining the device information acquired by the device information acquisition unit 602 with the screen configuration of the failure information screen. The screen generation unit 604 outputs the generated failure information screen to the UI unit 600. The failure information screen will be described in detail later.

FIG. 8 is a diagram schematically illustrating the storage structure of the current information storage unit 402 and the device information DB 400 of the group management program 40, where (A) illustrates the current information storage unit 402 and (B) illustrates device information. DB400 is illustrated.
As illustrated in FIG. 8A, the current information storage unit 402 stores apparatus information including all types and measurement values for each substrate processing apparatus 10. The current information storage unit 402 stores the latest measurement values of each piece of apparatus information of each substrate processing apparatus 10. Therefore, the device information currently stored in the information storage unit 402 is updated only when the measurement value is changed.
In addition, although the case where three types are displayed is illustrated in FIG. 8, actually, the number of types not limited to three is displayed.

  As illustrated in FIG. 8B, the apparatus information DB 400 stores apparatus information including the types defined in the definition information storage unit 404 and the measured values for each substrate processing apparatus 10. This device information is accumulated every time the accumulation condition defined in the definition information storage unit 404 is satisfied. The device information at each time is in a format in which a plurality of types and their measured values are collected into one data. For example, the type and the measured value are connected by a connection symbol such as “/”, and the information connected in this way is included in one device information.

Hereinafter, the operation of the substrate processing system 1 according to the embodiment of the present invention will be described in detail.
First, substrate processing by the substrate processing apparatus 10 will be described.
As shown in FIGS. 3 and 4, when the pod 110 is supplied to the load pot 114, the pod loading / unloading port 112 is opened by the front shutter 113, and the pod 110 above the load port 114 is connected to the pod transfer device. 118 is carried into the housing 111 from the pod loading / unloading port 112.

  The loaded pod 110 is automatically transported and delivered by the pod transport device 118 to the designated shelf 117 of the rotary pod shelf 105, temporarily stored, and then one pod opener from the shelf 117. After being transferred to 121 and delivered and temporarily stored, it is transferred from the shelf 117 to one of the pod openers 121 and transferred to the mounting table 122 or directly transferred to the pod opener 121 and mounted. It is transferred to the mounting table 122. At this time, the wafer loading / unloading port 120 of the pod opener 121 is closed by the cap attaching / detaching mechanism 123, and the transfer chamber 124 is filled with clean air 133. For example, the transfer chamber 124 is filled with nitrogen gas as clean air 133, so that the oxygen concentration is set to 20 ppm or less, which is much lower than the oxygen concentration inside the casing 111 (atmosphere).

  The pod 110 mounted on the mounting table 122 has its opening-side end face pressed against the opening edge of the wafer loading / unloading port 120 on the front wall 119a of the sub-housing 119, and the cap is removed by the cap attaching / detaching mechanism 123. The wafer loading / unloading port is opened.

  When the pod 110 is opened by the pod opener 121, the wafer 200 is picked up from the pod 110 by the tweezer 125c of the wafer transfer device 125a through the wafer loading / unloading port, aligned with the notch alignment device 135 (not shown), and then transferred. It is carried into the standby section 126 behind the chamber 124 and loaded (charged) into the boat 217. The wafer transfer device 125 a that has transferred the wafer 200 to the boat 217 returns to the pod 110 and loads the next wafer 200 into the boat 217.

  During the loading operation of the wafer into the boat 217 by the wafer transfer mechanism 125 in the one (upper or lower) pod opener 121, another pod from the rotary pod shelf 105 is loaded into the other (lower or upper) pod opener 121. 110 is transferred and transferred by the pod transfer device 118, and the opening operation of the pod 110 by the pod opener 121 is simultaneously performed.

  When a predetermined number of wafers 200 are loaded into the boat 217, the lower end portion of the processing chamber 202 closed by the furnace port shutter 147 is opened by the furnace port shutter 147. Subsequently, the boat 217 holding the wafers 200 is loaded into the processing chamber 202 when the seal cap 219 is lifted by the boat elevator 115.

  After loading, processing is performed on the wafer 200 in the processing chamber 202 based on a predetermined recipe. After the processing, the wafer 200 and the pod 110 are ejected to the outside of the casing by the reverse procedure described above except for the wafer alignment process in the notch alignment device 135 (not shown).

  During such substrate processing, the substrate processing apparatus 10 transmits a message including apparatus information of the substrate processing apparatus 10 such as temperature information, pressure information, and gas information to the group management server 4. Furthermore, the substrate processing apparatus 10 transmits event information to the group management server 4 every time an event occurs.

Next, the operation of the group management server 4 according to the embodiment of the present invention will be described.
FIG. 9 is a flowchart showing the operation (S10) of the group management server 4 according to the embodiment of the present invention.
As shown in FIG. 9, in the group management server 4 (group management program 40), the communication unit 406 determines whether or not a message has been received from the substrate processing apparatus 10. The group management server 4 proceeds to the process of step 102 (S102) when receiving the electronic message, and ends the process otherwise.

  In step 102 (S102), the communication unit 406 outputs a message to the message reception unit 408, and the message reception unit 408 determines whether or not event information is included in the output message. When event information is included in the electronic message, the group management server 4 proceeds to the process of step 106 (S106), otherwise proceeds to the process of step 104 (S104).

  In step 104 (S104), the message reception unit 408 updates the device information data included in the message among the device information currently stored in the information storage unit 402. After the data update, the group management server 4 returns to the process of step 100 (S100).

  In step 106 (S106), the message reception unit 408 outputs the event information included in the message to the device information registration unit 410, and the device information registration unit 410 determines whether or not this event information is specified as a storage condition. Determine whether. When the event information is specified as the accumulation condition, the group management server 4 proceeds to the process of step 108 (S108), and otherwise returns to the process of step 100 (S100).

  In step 108 (S108), the apparatus information registration unit 410 reads out the apparatus information currently stored in the information storage unit 402 relating to the substrate processing apparatus 10 that is the source of the event information, and this apparatus information and event occurrence The time is associated and stored in the device information DB 400. After the accumulation, the group management server 4 returns to the process of step 100 (S100).

As described above, in the group management server 4, the latest information among the apparatus information from the substrate processing apparatus 10 is once stored in the current information storage unit 402, and the definition information storage is stored among the information stored in the current information storage unit 402. Although it has been described that only information related to the event defined by the definition information of the unit 404 is stored in the device information DB 400, the operation in the group management server 4 is not limited to this.
For example, in the group management server 4, the definition information in the definition information storage unit 404 is referred to in advance, and only the device information defined by the definition information among the device information from the substrate processing apparatus 10 is stored in the current information storage unit 402. Of the information currently stored in the information storage unit 402, only information related to events defined by the definition information in the definition information storage unit 404 may be accumulated in the device information DB 400.

Next, browsing of information related to the substrate processing apparatus 10 using the terminal device 6 will be described.
FIG. 10 is a diagram illustrating a failure information screen displayed on the terminal device 6.
FIG. 10A shows an example in which the type specified as the definition information in the definition information storage unit 404 matches the type of device information at a desired time stored in the device information DB 400. As illustrated in FIG. 10A, the failure information screen includes the failure content and device information at the time of the failure occurrence. The device information includes the type defined at the definition information storage unit 404 and the failure occurrence time. Measured values are included. Here, measured values corresponding to all defined types are displayed.

  The definition information stored in the definition information storage unit 404 can be changed. Therefore, when the definition information has been changed, the type specified in the definition information may not match the type of device information at a desired time.

  FIG. 10B shows an example in which the type specified as the definition information in the definition information storage unit 404 does not match the type of device information stored at the device information DB 400 at a desired time. As illustrated in FIG. 10B, the type “pressure” is defined in the definition information at the time of search, but the type “pressure” is not defined in the definition information at a desired time. The measured value of the type “pressure” is not stored in the apparatus information DB 400. In this case, the measurement value is not displayed in the type “pressure” column of the failure information screen, and the column remains blank.

  Thus, even when the definition information is changed, the terminal device 6 can display information relating to the accumulated type among the device information of the substrate processing apparatus 10. Note that the measurement values related to the types that are stored in the device information DB 400 but are not defined in the definition information at the time of retrieval are acquired from the group management server 4 by the terminal device 6 but are not displayed on the failure information screen. .

  As described above, the substrate processing system 1 according to the present invention holds the latest apparatus information of the substrate processing apparatus 10 based on a message transmitted from the substrate processing apparatus 10, and an event has occurred in the substrate processing apparatus 10. The group management server 4 that accumulates the type specified in the device information at the timing and the measured value in the device information DB 400, and the terminal device 6 that searches the device information stored in the device information DB 400 of the group management server 4 Have Therefore, since the device information at each time includes the measured value of the defined type, the terminal device 6 can search for the device information based on the time information, and at the time of the search, the measured value of the type can be retrieved retroactively. There is no need to supplement. Thereby, since the search time is shortened, the efficiency of work such as data analysis work can be improved.

Next, a modification of the storage structure of the current information storage unit 402 of the group management program 40 and the storage structure of the item information DB 412 will be described. The item information includes device information and event information.
FIG. 11 is a diagram showing a modification of the storage structure of the current information storage unit 402 of the group management program 40 and the storage structure of the item information DB 412. FIG. 11A illustrates the current information storage unit 402, and FIG. Exemplifies the item information DB 412.
As illustrated in FIG. 11B, the item information may include information on the process recipe (for example, the name of the process recipe), a wafer map, an O 2 concentration, and the like. That is, the item information may include process information of each substrate processing apparatus 10. For example, when there is a change in the name of the process recipe, the wafer map, the O2 concentration, etc., at the start of the rise of the boat 217 and at the end of the rise, the user uses the terminal device 6 to information on the time before and after the rise of the boat 217 By acquiring, the difference can be confirmed. It should be noted that the wafer map, the O 2 concentration, etc. are merely examples, and other types may be stored.

  The substrate processing apparatus 10 according to the present invention is applied not only to a semiconductor manufacturing apparatus but also to an apparatus for processing a glass substrate such as an LCD apparatus. The substrate processing apparatus 10 according to the present invention is also applied to an exposure apparatus, a coating apparatus, a drying apparatus, a heating apparatus, and the like, which are other substrate processing apparatuses. Moreover, the substrate processing apparatus 10 according to the present invention does not limit the processing in the furnace, but includes film forming processing including processing for forming CVD, PVD, oxide film, nitriding diffusion, and processing for forming a film containing metal. It can be carried out. Furthermore, the substrate processing apparatus 10 according to the present invention can perform annealing treatment, oxidation treatment, nitriding treatment, diffusion treatment, and the like.

The present invention also includes the following embodiments.
The information management apparatus according to the present invention is a first apparatus information storage unit that stores apparatus information of the substrate processing apparatus at the time when the electronic message is transmitted based on an electronic message transmitted from the substrate processing apparatus that processes the substrate. Second device information storage means for storing device information and time in association with each other, condition storage means for storing settings for moving device information and conditions for storing the device information, and stored in the condition storage means. When the condition is satisfied, the time when the condition is satisfied and the device information that matches the setting stored in the first device information storage unit are associated with each other in the second device information storage unit. Registration means for registration.

  A first substrate processing system according to the present invention includes a plurality of substrate processing apparatuses that process a substrate, an information management apparatus that processes a message transmitted from the substrate processing apparatus, and a terminal device connected to the information management apparatus The substrate processing apparatus includes a transmission unit that transmits a message including device information or event information to the information management device, and the information management device is transmitted from the transmission unit. First apparatus information storage means for storing apparatus information of the substrate processing apparatus at the time of transmission of the electronic message, and second apparatus information storage means for storing apparatus information and time in association with each other And condition storage means for storing conditions for accumulating device information, and when the event information matches the condition stored in the condition storage means, the time when the condition is satisfied, and the first Registration means for associating the device information stored in the device information storage means with the second device information storage means, and the terminal device is stored in the second device information storage means. There is a search means for searching for device information.

  According to a second substrate processing system of the present invention, in the first substrate processing system, a display unit is further provided in the terminal unit, and the device is stored in the condition storage unit and the second apparatus information storage unit. With reference to the information, if the stored device information matches the contents of the condition storage means, the information is displayed on the display means.

  According to a third substrate processing system of the present invention, in the first substrate processing system, the substrate processing apparatus further includes search means for searching for apparatus information stored in a second apparatus information storage means, Display means for displaying device information searched by the search means;

  The first data search method according to the present invention stores the latest data transmitted from the apparatus in the first storage means, and receives the predetermined data set in advance. At least a part of the data stored in the storage means is added to the second storage means by adding the time when the predetermined data is generated, and the stored data is searched.

  The second data search method according to the present invention stores the latest data transmitted from the apparatus in the first storage means, and stores the second data only when the predetermined data and the predetermined data are generated. When the predetermined data is received with reference to the parameter that sets the data to be moved to the storage means, at least a part of the data stored in the first storage means is accumulated in the second storage means Then, the stored data is searched.

  The first data search system according to the present invention includes a first storage means for overwriting and storing data transmitted from a processing device, predetermined data, and the first storage when the predetermined data is received. According to a parameter for setting data to be moved from the means, there is provided a second storage means for accumulating the data stored in the first storage means, and a terminal means for retrieving the accumulated data.

  According to a second data search system of the present invention, in the first data search system, a display unit is further provided in the terminal unit, the parameter and the stored data are searched, and the stored data is If it matches the content of the parameter, it is displayed on the display means.

  According to a third data search system of the present invention, in the first data search system, the processing device further includes search means for searching data stored in a second storage means, and the search means Display means for displaying the retrieved data.

It is a figure which shows the apparatus information memorize | stored in the conventional group management server, its structure, and the acquisition method of the memorize | stored apparatus information. 1 is a diagram showing a configuration of a substrate processing system 1 according to an embodiment of the present invention. 1 is a perspective view of a substrate processing apparatus 10 according to an embodiment of the present invention. 1 is a side perspective view of a substrate processing apparatus 10 according to an embodiment of the present invention. A functional configuration of the substrate processing apparatus 10 centering on the PMC 14 is shown. 2 is a diagram illustrating a hardware configuration of a terminal device 6 with a control device 16 as a center. FIG. It is a figure which shows the function structure of the terminal program 60 performed by the group management program 40 performed by the group management server 4, and the terminal device 6. FIG. It is a figure which shows typically the storage structure of the present information storage part 402 of the group management program 40, and apparatus information DB400, (A) illustrates the present information storage part 402, (B) illustrates apparatus information DB400. . It is a flowchart which shows operation | movement (S10) of the group management server 4 which concerns on embodiment of this invention. It is a figure which illustrates the failure information screen displayed on the terminal device. It is a figure which shows the modification of the storage structure of the present information storage part 402 of the group management program 40, and the storage structure of item information DB412, Comprising: (A) illustrates the present information storage part 402, (B) is item information DB412. Is illustrated.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing system 4 Group management server 6 Terminal device 10 Substrate processing device 12 Network 16 Control device 18 CPU
20 Memory 22 Communication IF
24 display / input device 26 storage device 40 group management program 400 device information DB
402 current information storage unit 404 definition information storage unit 406 communication unit 408 message reception unit 410 device information registration unit 412 item information DB
60 terminal program 600 UI unit 602 device information acquisition unit 604 screen generation unit

Claims (11)

Based on a message including apparatus information or event information transmitted from a substrate processing apparatus that processes a substrate, the apparatus information of the substrate processing apparatus at the time of transmission of the message is stored in a first apparatus information storage unit. , a pre-Symbol device information and information management method wherein the event information is stored in the second apparatus information storage means in association with the time that occurred,
When a message including the event information is transmitted, a movement condition for moving the device information stored in the first device information storage means to the second device information storage means and device information to be moved are obtained. If the event information and the movement condition match with reference to the set condition storage means, the time when the movement condition is satisfied and the device information stored in the first device information storage means An information management method for associating device information that matches the set device information to be moved and storing it in a second device information storage means. Further comprising an operation terminal having an operation screen, the operation terminal, searching for a second device information storage means for the event information to the device information of the object to be moved before Symbol set is stored by adding the time that occurred The information management method according to claim 1 , wherein the retrieved result information is compared with the set device information to be moved, and the device information is displayed on the operation screen if they match. First apparatus information storage means for storing apparatus information of the substrate processing apparatus at the time when the electronic message is transmitted based on an electronic message including apparatus information or event information transmitted from the substrate processing apparatus that processes the substrate; A second device information storage means for storing the device information and the time when the event information occurred, and the second device information storage means for storing the device information stored in the first device information storage means; A condition storage unit in which a movement condition to be moved to and apparatus information to be moved are set, and when the movement condition stored in the condition storage unit is satisfied, the time when the movement condition is satisfied and the first Registration means for associating device information that matches the set device information to be moved stored in one device information storage device and registering it in the second device information storage device; Information management apparatus that. A substrate processing system including a plurality of substrate processing apparatuses for processing a substrate, and an information management apparatus for processing a message including apparatus information or event information transmitted from the substrate processing apparatus, wherein the substrate processing apparatus includes: A transmission unit configured to transmit a message to the information management device, the information management device based on the message transmitted from the transmission unit, device information of the substrate processing apparatus at the time when the message was transmitted; First device information storage means for storing, second device information storage means for storing the device information and the time at which the event information has occurred in association with each other, and the first device information storage means stored in the first device information storage means Condition storage means in which movement conditions for moving apparatus information to the second apparatus information storage means and apparatus information to be moved are set; and the movement conditions stored in the condition storage means Is satisfied, the time when the movement condition is satisfied and the device information that matches the set device information of the movement target stored in the first device information storage means are associated with each other. A substrate processing system having registration means for registering in the apparatus information storage means.   Furthermore, the substrate processing system includes a terminal device connected to the information management device, wherein the terminal device includes a search unit that searches for device information stored in the second device information storage unit. 4. Substrate processing system.   Further, the terminal device refers to the device information stored in the condition storage means and the second device information storage means, and if the stored device information matches the content of the condition storage means The substrate processing system according to claim 5, wherein the apparatus information is displayed on an operation screen.   The substrate processing apparatus includes at least one of an annealing process, an oxidation process, a diffusion process, a process for forming a CVD film, a PVD film, an oxide film, and a nitride film, and a film forming process for forming a film containing a metal on the substrate. The substrate processing system according to claim 4, wherein the substrate processing system is a processing apparatus.   The substrate processing system according to claim 4, wherein the substrate processing apparatus is at least one of an exposure apparatus, a coating apparatus, a drying apparatus, and a heating apparatus.   5. The substrate according to claim 4, wherein the substrate processing apparatus further comprises search means for searching for apparatus information stored in the second apparatus information storage means, and display means for displaying the apparatus information searched by the search means. Processing system.   The substrate processing apparatus includes at least one of an annealing process, an oxidation process, a diffusion process, a process for forming a CVD film, a PVD film, an oxide film, and a nitride film, and a film forming process for forming a film containing a metal on the substrate. The information management method according to claim 1, wherein the information management method is a device that performs processing.   The information management method according to claim 1, wherein the substrate processing apparatus is at least one of an exposure apparatus, a coating apparatus, a drying apparatus, and a heating apparatus.

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