KR101008253B1 - Dry type cleaning device for cleaning organic and inorganic matter on substrate - Google Patents

Abstract

The present invention relates to a dry and organic simultaneous cleaning apparatus for a substrate. It is a casing; An organic material washing unit provided inside the casing to remove organic contaminants from the substrate; An inorganic water cleaner installed at the side of the organic water cleaner and separating inorganic contaminants from the surface of the substrate; An air supply unit acting as an air curtain to blow air downward in a fixed state in the casing to prevent air outside the casing from entering the casing; And an exhaust unit for discharging the contaminants separated from the substrate by the organic material washing unit and the inorganic water washing unit and the impurity gas in the casing to the outside of the casing.

The present invention made as described above, since the organic tax and the inorganic tax is embedded in one case, it is possible to simultaneously clean the organic and inorganic matters, excellent cleaning ability, and the device is compact and can be installed in a small place as much as possible In particular, since no water is used, no water supply and drainage facilities or sewage treatment facilities are required.

Substrate Cleaning, Excimer UV, Plasma, Organic, Inorganic

Description

Dry type cleaning device for cleaning organic and inorganic matter on substrate}

The present invention relates to a dry and organic simultaneous cleaning apparatus for a substrate.

For example, a process for manufacturing a substrate used for a liquid crystal display, a flat panel display, or the like includes a cleaning process for removing various organic and inorganic contaminants from a substrate having a predetermined surface treatment.

This cleaning process removes various contaminants from the substrate surface during the main process or during the main process, thereby preventing defects from occurring and further increasing the adhesion of the thin film to be deposited and improving the characteristics of the device. This is a very important process. Accordingly, various cleaning apparatuses for the above cleaning process have been developed and used.

1 is a view for explaining the configuration and problems of a conventional substrate cleaning apparatus for cleaning a substrate.

Basically, the substrate cleaning apparatus of the related art has a problem that organic contaminants and inorganic contaminants cannot be collectively processed, and in particular, they are large in size and consume a large amount of water for cleaning.

As shown in FIG. 1, the conventional substrate cleaning apparatus consists of separate organic substance washing apparatus 11 and inorganic substance washing apparatus 15 which operate independently of each other.

The organic material cleaning apparatus 11 includes a conveyor 11b for horizontally transporting the substrate A to be cleaned, and a substrate A surface passed through the conveyor 11b to pass through the conveyor 11b. It consists of an organic material cleaner (11a) to remove the organic contaminants (hereinafter, organic matter) of.

The substrate A in which the organic material is removed by the organic material cleaner 11a is moved to the inorganic material cleaning device 15 by the transfer cart 13. In some cases, the conveyor 11b of the organic substance cleaning apparatus 11 and the conveyor 15b of the inorganic substance washing apparatus 15 are connected, and the board | substrate A is moved to the inorganic substance washing apparatus 15 side without the transfer cart 13. It is also possible, but because the processing speed of the organic material cleaning device 11 and the inorganic material cleaning device 15 is different, it is common to use a separate transport means such as the transfer cart (13).

In any case, the substrate A from which the organic matter is removed by the organic material cleaner 11a passes through the inside of the inorganic material cleaner 15a via the conveyor 15b of the inorganic material cleaner 15.

The inorganic cleaning device 15 removes various inorganic contaminants (hereinafter, referred to as inorganic matter) on the surface of the substrate A, which is transported at a constant speed, and allows the inorganic cleaner 15a to pass through the conveyor 15b therein. Has The inorganic cleaner 15a is a wet method using a large amount of water and includes a washing part 15c, a rinse part 15d, and a drying part 15e.

The cleaning unit 15c serves to remove the inorganic material on the surface of the substrate A by contacting or spraying water on the substrate A. FIG. In addition, the rinse section 15d rinses the substrate A that has passed through the cleaning section 15c, and the drying section 15e functions to dry the substrate.

Reference numeral 15f is a monitoring window installed to look inside the inorganic cleaner 15a. The operator can see the internal operating state of the inorganic cleaner 15a through the monitoring window 15f. The monitoring window 15f is positioned at a height such that an operator can look into the back without bending.

By the way, the conventional board | substrate cleaning apparatus which has the above-mentioned structure has the problem that it is not easy for an operator to respond quickly to various situations during operation, since the size is very large and the structure is complicated above all. In addition, since a large amount of water is used, a water supply and drainage facility must be satisfied, and an auxiliary facility such as an anti-pollution water treatment device for treating polluted water discharged must be installed.

In addition, since organic matter cleaning and inorganic matter cleaning are performed independently in separate and separate devices, the work efficiency is low. For example, if the processing speed of the organic material cleaning device 11 and the processing speed of the inorganic material cleaning device 15 are not matched, the smooth continuous operation is impossible and the efficiency may be significantly reduced.

The present invention was created to solve the above-mentioned problems, and since the organic tax government and the inorganic tax government are housed in one case, the organic and inorganic materials can be simultaneously cleaned, so that the cleaning ability is excellent and the apparatus is compact, so that even in a narrow place It can be installed as much as possible, especially since it does not use water, it does not need water supply and drainage facilities or sewage treatment facilities, so the composition is simple, the cost can be reduced, and the setup is simple. The purpose is to provide.

Dry organic and inorganic cleaning device for a substrate of the present invention for achieving the above object, to pass through the substrate contaminated with various organic contaminants and inorganic contaminants, to remove the organic inorganic contaminants from the substrate at once A casing disposed above the transfer path of the substrate; An organic material washing unit provided inside the casing and forming an ozone atmosphere on an upper portion of the transport path to allow ozone to remove organic contaminants on the substrate surface transported along the transport path; An inorganic water cleaner disposed on the side of the organic material cleaner and applying ultrasonic waves to the substrate being transported to separate inorganic contaminants from the surface of the substrate; An air supply unit acting as an air curtain to blow air downward in a fixed state in the casing to prevent air outside the casing from entering the casing; It characterized in that it comprises an exhaust for discharging the contaminants and impurity gas in the casing separated from the substrate by the organic material and inorganic water cleaning to the outside of the casing.

In addition, the organic material tax administration is; It characterized in that it comprises an atmospheric pressure plasma generator for inducing the ozone by generating a plasma on the upper transfer path of the substrate.

In addition, the organic material tax administration is; And an excimer UV generator that oxidizes and removes organic contaminants adhered to the substrate by irradiating excimer UV on the substrate moving along the movement path to generate ozone between the substrate and the substrate.

In addition, the inorganic tax government; A body having a horizontal bottom surface parallel to the conveying path, and having a body serving as a medium for ultrasonic movement, and an ultrasonic generator fixedly adhered to the body and generating ultrasonic waves to form an ultrasonic atmosphere under the body. And an air discharge path for receiving air from an external blower and discharging the supplied air to the lower part of the body, and a discharge path for taking in air and contaminants in the lower part of the body and discharging it to the outside of the casing. .

In addition, the case; And a lower case fixed horizontally to an upper portion of the transfer path, and an upper case detachably mounted to an upper portion of the lower case.

The present invention made as described above, since the organic material and the inorganic material government is embedded in one case, it is possible to simultaneously clean the organic and inorganic materials, excellent cleaning ability, and the device is compact and can be installed in a small place as much as possible In particular, since it does not use water, it does not need a water supply and drainage facility or a sewage treatment facility, so the configuration is simple, the cost can be reduced, and the setup is simple and convenient to use.

Hereinafter, one embodiment according to the present invention will be described in detail with reference to the accompanying drawings.

Figure 2 is a perspective view showing the outer shape of the simultaneous dry cleaning device for organic and inorganic substrates according to an embodiment of the present invention.

Basically, the simultaneous dry cleaning of organic and inorganic materials 31 according to the present embodiment is located above the conveying means such as, for example, the conveyor 41, and the organic and inorganic materials on the surface of the substrate A, which are conveyed along the conveyor 41. It has the function of washing at the same time. To this end, the organic matter tax authorities 43 and 59 and the inorganic tax authorities 49 are embedded in one casing 37. In addition, in the present embodiment, the organic material washing units 43 and 59 are applied in two ways.

Referring to FIG. 2, the simultaneous dry and inorganic cleaning apparatus 31 according to the present embodiment includes a casing 37 supported horizontally by a plurality of legs 35. The leg 35 supports the casing 37 to a certain height, such as placing the casing 37 horizontally on top of the conveyor 41.

In particular, the casing 37 is composed of a lower casing 37a and an upper casing 37b. The lower casing 37a is fixed to the upper end of the leg 35 and provides a horizontal support force, and the upper casing 37b is mounted to the lower casing 37a to be opened and closed. The upper casing 37b is fixed to the lower casing 37a through the locking ring 39.

The locking ring 39 is conventional and secures the upper casing 37b to the lower casing 37a. When it is necessary to open the casing 37 in accordance with the need for maintenance, the casing 37 is opened by lifting the upper casing 37b by releasing the locking ring 39.

3 is a view showing the internal configuration of the dry organic and inorganic substrate cleaning apparatus for the substrate shown in FIG. 2, Figure 4 is a configuration diagram for explaining the operation of the cleaning apparatus shown in FIG.

As shown in the drawing, the apparatus for simultaneously cleaning dry and inorganic substrates for a substrate according to the present embodiment includes a casing 37 horizontally positioned above the conveyor 41 and an inside of the casing 37. The role of the air curtain to prevent the surrounding air from entering the casing 37 by spraying down the air provided from the organic matter washer 43 and the inorganic water washer 49 and the external blower 53 installed. It consists of a plurality of discharge parts 45 to discharge, and an exhaust port 47 for discharging the contaminants generated in the casing 37 during the cleaning process to the outside.

The organic material washing unit 43 has an atmospheric pressure plasma generator 43a that implements an atmospheric pressure plasma region P at a lower portion thereof. The atmospheric pressure plasma generator (43a) is a conventionally used to generate the atmospheric pressure plasma by receiving the reaction gas and power from the outside.

As known in the art, the atmospheric pressure plasma can easily make a large amount of highly active particles such as ozone and radicals when a small amount of active gas is added to the inert gas as the discharge gas. There is a large amount of ozone. The ozone is an important material used for disinfection of substrates and cleaning of organic materials during the semiconductor manufacturing process.

Eventually, the substrate A entering the lower casing 37 and passing through the plasma region P by the operation of the conveyor 41 contacts with ozone, whereby organic contaminants on the surface of the substrate are caused by the action of the ozone. Removed.

The inorganic water cleaning unit 49 provided on the side of the organic material washing unit 43 removes various inorganic contaminants adhering to the surface of the substrate A to form the ultrasonic region S thereunder. The ultrasonic region S comes from two ultrasonic generators 51.

The inorganic water cleaner 49 is cast from aluminum and has a body 49a having a horizontal bottom surface 49m parallel to the transfer path, and two bodies 49a closely fixed to both sides of the body 49a to generate ultrasonic waves. It consists of an ultrasonic generator (51).

The body 49a has a constant density and serves as a medium for ultrasonic waves. Ultrasonic waves generated from the ultrasonic generator 51 are guided to the bottom surface 49m through the body 49a and transferred to the transport path side.

In addition, the exhaust passage 49b and the intermediate passage 49c are disposed up and down inside the body 49a. In addition, the exhaust passage 49b and the intermediate passage 49c are connected through the connecting pipe 49e. The exhaust passage 49b is connected to the external vacuum pump 55 through the vacuum pipe 55a, and the intermediate passage 49c is opened downward through the intake port 49d.

The exhaust passage 49b, the intermediate passage 49c, and the connection pipe 49e discharge various particles or contaminated gas generated from the lower portion of the inorganic water cleaner 49 to the outside of the casing 37.

In addition, air supply passages 49f opened downward through the air supply port 49k are formed at both sides of the intermediate passage 49c. The air supply passage 49f removes contaminants from the surface of the substrate by receiving the air supplied from the outside or the required gas downward through the air supply pipe 53a. Of course, the air supply passage 49f is connected to the external blower 53 through the air supply pipe 53a.

The ultrasonic generator 51 is known, and generates ultrasonic waves in a state where the ultrasonic generator 51 is closely and symmetrically fixed to both sides of the body 49a. The ultrasonic wave generated from the ultrasonic generator 51 moves the body 49a as a medium to implement the ultrasonic region S at the lower portion of the body 49a.

Therefore, the ultrasonic wave is transmitted to the substrate A passing through the ultrasonic region S by the conveyor 41, and the contaminants adhering to the substrate are separated from the substrate. Various inorganic substances separated from the substrate A are sucked into the inlet port 49d and discharged to the outside through the intermediate passage 49c, the connecting pipe 49e, and the exhaust passage 49b.

On the other hand, the discharge portion 45 is provided at the position facing the outside of the atmospheric pressure plasma generator (43a) and the body (49a), that is, the casing (37). The discharge part 45 injects the gas supplied from the outside downward, and serves as a so-called air curtain to block the internal space of the casing 37 from the outside, as well as the plasma area P or the ultrasonic area S. It also serves to sweep the contaminants inside to the exhaust port 47 side.

The discharge part 45 is connected to the blower 53 through the air supply pipe 53a. In addition, the air supply pipe 53a is provided with a filter portion 53c and a drying portion 53d. The filter unit 53c filters foreign matter in the gas flowing through the air supply pipe 53a, and the drying unit 53d removes moisture in the gas. As the filter unit 53c or the drying unit 53d, a general filter or a dryer may be used.

In any case, the discharge part 45 is provided with an air supply pipe 45a connected to the air supply pipe 53a, and a branch pipe 45b extending downwardly and open downward in communication with the air supply pipe 45a. . The gas ejected to the lower portion through the branch pipe 45b is a clean state after filtering and drying. The dust or foreign matter on the surface of the newly entered substrate A is first shaken off, and the casing 37 is finished after cleaning. It serves as a function of blowing out fine contaminants that may remain on the leaving substrate A.

An exhaust unit 47 is provided between the organic material washing unit 43 and the inorganic water washing unit 49. The exhaust part 47 discharges contaminated gas or pollutants generated in the casing 37 to the outside of the casing 37. The intermediate passage 49c and the exhaust passage 49b provided in the body 49a are mainly for discharging contaminants generated in the ultrasonic region S, and the exhaust portion 47 is disposed in the plasma region P. It is responsible for emitting organic pollutants or inorganic pollutants and gases that could not be released.

An exhaust pipe 47a connected to the vacuum pipe 55a and a vertical tube 47b communicating with the exhaust pipe 47a and opened downward are provided in the exhaust part 47. When the vacuum pump 55 operates, a negative pressure is applied to the inside of the exhaust pipe 47a, so that gas or contaminants around the exhaust part 47 are sucked into the vertical tube 47b.

5 is a view showing another configuration example of the simultaneous simultaneous organic and inorganic cleaning device shown in Figure 2, Figure 6 is a configuration diagram for explaining the operation of the simultaneous cleaning device shown in FIG.

The same reference numerals as the above reference numerals refer to the same members having the same function, and repeated descriptions thereof will be omitted.

As shown in the figure, the dry organic and inorganic matter cleaning apparatus 31 for a board | substrate which concerns on another structural example has the excimer UV generator 59a as the organic material washing | cleaning part 59 for washing | cleaning organic substance. The excimer UV generator 59a is a known equipment used in a process for cleaning a substrate for a liquid crystal display or a flat panel display.

The excimer UV generator 59a irradiates the excimer UV downward toward the substrate A to form a UV region Z below. To this end, a lower portion of the excimer UV generator 59a is provided with a plurality of excimer UV lamps 59b.

The wavelength of the ultraviolet region generated from the excimer UV lamp 59b is photochemically reacted with a separately provided reactive gas to generate ozone. Therefore, ozone is present in the UV region Z. As described above, ozone can remove organic substances on the surface of the substrate A.

Although the excimer UV generator 59a and the atmospheric pressure plasma generator 43a are different devices, they play a common role in generating ozone.

As a result, the simultaneous dry cleaning device 31 for substrates of the present embodiment having the above-described configuration passes the substrate A, which is conveyed at a predetermined speed by the conveyor 41, under the organic material cleaner 43 59) and the inorganic water cleaner 49 to remove organic and inorganic contaminants adhering to the substrate A at one time.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.

1 is a view for explaining the configuration and problems of a conventional substrate cleaning apparatus for cleaning a substrate.

Figure 2 is a perspective view showing the outer shape of the simultaneous dry cleaning device for organic and inorganic substrates according to an embodiment of the present invention.

3 is a view showing the internal configuration of a dry organic and inorganic simultaneous cleaning apparatus for a substrate shown in FIG.

4 is a configuration diagram illustrating the operation of the cleaning apparatus shown in FIG. 3.

5 is a view showing another configuration example of the simultaneous organic and inorganic cleaning device shown in FIG.

FIG. 6 is a diagram illustrating the operation of the simultaneous cleaning device shown in FIG. 5.

<Explanation of symbols for the main parts of the drawings>

11: Organic cleaner 11a: Organic cleaner 11b: Conveyor

13: Transfer cart 15: Mineral cleaning device 15a: Mineral cleaning device

15b: Conveyor 15c: Tax Government 15d: Rinse Department

15e: Drying unit 15f: Monitoring window 31: Simultaneous cleaning of organic and inorganic

35: leg 37: casing 37a: lower casing

37b: upper casing 39: lock ring 41: conveyor

43: organic matter government 43a: atmospheric plasma generator 45: discharge section

45a: supply pipe 45b: branch pipe 47: exhaust

47a: exhaust pipe 47b: vertical tube 49: inorganic tax government

49a: Body 49b: Exhaust passage 49c: Intermediate passage

49d: Intake vent 49e: Connector 49f: Supply passage

49k: air supply 49m: bottom 51: ultrasonic generator

53: blower 53a: air supply pipe 53c: filter unit

53d: drying part 55: vacuum pump 55a: vacuum pipe

59: Organic Tax Government 59a: Excimer UV Generator 59b: Excimer UV Lamp

Claims (5)

It passes through the substrate contaminated with various organic contaminants and inorganic contaminants, and removes organic and inorganic contaminants from the substrate at once. A casing disposed above the transfer path of the substrate; An organic material washing unit provided inside the casing and forming an ozone atmosphere on an upper portion of the transport path to allow ozone to remove organic contaminants on the substrate surface transported along the transport path; An inorganic water cleaner disposed on the side of the organic material cleaner and applying ultrasonic waves to the substrate being transported to separate inorganic contaminants from the surface of the substrate; An air supply unit acting as an air curtain to blow air downward in a fixed state in the casing to prevent air outside the casing from entering the casing; And an exhaust unit for discharging the contaminants separated from the substrate and the impurity gas in the casing to the outside of the casing by the organic and inorganic washing units. The method of claim 1, The organic material tax administration is; Drying organic and inorganic equipment for a substrate, characterized in that it comprises an atmospheric pressure plasma generator to induce the ozone by generating a plasma on the upper transfer path of the substrate. The method of claim 1, The organic material tax administration is; Irradiating excimer UV to the substrate moving along the movement path to generate the ozone between the substrate by including an excimer UV generator for oxidizing and removing the organic contaminants attached to the substrate Simultaneous washing equipment. The method of claim 2 or 3, The mineral taxation government; A body having a horizontal bottom surface parallel to the transfer path and serving as a medium for ultrasonic movement; Including the ultrasonic generator is tightly fixed to the body to generate an ultrasonic wave to form an ultrasonic atmosphere in the lower body, Inside the body, An air discharge path receiving air from an external blower and discharging the supplied air to the lower part of the body; Dry organic and inorganic substrate cleaning apparatus for the substrate, characterized in that the discharge path for inhaling the air and contaminants in the lower body and discharged to the outside of the casing. The method of claim 1, The casing; A lower casing fixed horizontally to an upper portion of the conveying path; Drying inorganic and simultaneous cleaning device for a substrate, characterized in that consisting of the upper casing detachably mounted on the upper portion of the lower casing.

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