JP2002346328A - Apparatus for removing fine powder from semiconductor exhaust gas - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a fine particle removing apparatus capable of continuously removing fine particles over a long period of time by a simple device. SOLUTION: The filter element (5) of an HEPA filter formed from a fluoroplastic resin is formed into an endless strip shape and constituted so as to be rotatable in an up and down direction. The part near to the lower end of the filter element (5) rotated in an up and down direction is dipped in a water tank (6). The exhaust gas outlet(8)of an exhaust gas passage (7) and the suction port (10) of an exhaust gas suction passage (9) are arranged to the falling moving region of the filter element (5) in opposed relationship so as to hold the filter element (5). A washing water jet instrument (12), an air jet nozzle (13) for draining water and a filter element drying means (14) are successively arranged to the rising moving region of the filter element (5) from below.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for removing fine powder generated at the time of removing a process gas or a cleaning gas used in a semiconductor manufacturing process.

[0002]

2. Description of the Related Art There are many toxic process gases such as silane gas used in a semiconductor manufacturing process. Release to the atmosphere.

In this case, for example, fine powder of silicon dioxide is formed as a reaction product when the silane gas is burned, and the fine powder is sent out together with the processed gas. Since the fine powder cannot be released to the atmosphere as it is, conventionally, the treated gas is introduced into a wet scrubber and brought into contact with treated water to remove fine particles.

[0004]

The size of the fine particles generated during the processing of the semiconductor gas is, for example, extremely fine particles having a particle size of about 0.3 μm in the case of silicon dioxide generated during the processing of silane gas. For this reason, there was a problem that even a wet scrubber could not be sufficiently removed.

The present invention has been made in view of such a point, and an object of the present invention is to provide an apparatus for removing fine particles capable of continuously removing fine particles over a long period of time with a simple apparatus.

[0006]

In order to achieve the above-mentioned object, the present invention according to the first aspect of the present invention is directed to a method of forming a hydrogen-containing H resin.
The filter element of the EPA filter is formed in an endless band shape, the filter element formed in the endless band shape is configured to be rotatable in the vertical direction, and the lower end portion of the filter element rotating in the vertical direction is immersed in the water tank. At the same time, the exhaust outlet of the exhaust gas passage and the suction port of the exhaust suction passage are arranged opposite to each other with the filter element interposed therebetween in the downward movement area of the filter element. , An air ejection nozzle for draining water, and a filter element drying means.

According to a second aspect of the present invention, a filter element of a HEPA filter formed of a fluororesin is stretched on the outer peripheral surface of a cylindrical frame which rotates horizontally with its lower part protruding into a water tank. The exhaust outlet of the exhaust gas passage and the suction port of the exhaust gas suction path are arranged opposite to each other with the filter element interposed in the descending movement area of the element, and the washing water jetting tool and drainer are arranged in the ascending movement area of the filter element in order from the bottom. An air ejection nozzle and a filter element drying means are provided.

[0008]

According to the present invention, HE formed of fluororesin is used.
The filter element of the PA filter is circulated and moved, and the filter element is immersed in a water tank in the middle of its circulation path to remove fine particles adhering to the filter element. And the filter element is regenerated by drying the filter element with a drying means using warm air, etc., so that the treated gas discharged from the abatement system is always a new surface of the filter element. Therefore, the dust removing capability of the filter does not decrease over a long period of time.

[0009]

FIG. 1 is a conceptual diagram of a fine powder removing apparatus according to an embodiment of the present invention. This fine powder removing device includes rollers (1), (2), (3), and (4) rotatably supported at respective corners of a vertically long frame (not shown);
(1) An endless band-shaped filter element (5) that is wound around (2), (3) and (4) and travels in the vertical direction and moves in a circulating manner, and is disposed at the lower end portion in the movement area of the filter element (5). Water tank (6).

The filter element (5) is formed of a fluororesin so as to form a HEPA filter.
Roller (1) (2) (3)
By wrapping around (4), the filter element is made to run in one direction in a state corresponding to each side of the vertical quadrilateral.

An exhaust outlet of an exhaust gas passage (7) derived from a combustion abatement device (not shown) is provided in a downward movement region of the filter element (5) which moves downward from top to bottom.
(8) and a suction port (10) of an exhaust suction path (9) connected to and connected to a suction means (not shown) such as a wet scrubber are positioned to face each other with the filter element (5) interposed therebetween. ing.
In this case, the exhaust outlet (8) is arranged on the outer surface side of the filter element (5) forming a closed loop, and the suction port (10) is arranged in sliding contact with the inner surface side of the filter element (5).

A fountain for jetting a jet of water for washing out fine particles such as silicon dioxide adhered to the surface of the filter element (5) in an ascending movement area of the filter element (5) moving upward from the water tank (6). A nozzle (11), a cleaning water jetting device (12) for cleaning and regenerating the surface of the filter element (5), and a jet of compressed air for drying by blowing off moisture adhering to the surface of the filter element (5) The nozzle, (13) and a drying device (14) for drying the surface of the filter element (5) are provided with a filter element.
They are arranged in order from the upper side in the moving direction of (5).

The filter element (5) moves at a speed of about 0.5 m / min, and the jet water for washing out fine particles such as silicon dioxide is stored in a water tank (6). Water is used under pressure by a pressure pump (15). In addition, heated air is used as the drying device (7).

[0014] In the fine powder removing apparatus thus configured,
Exhaust gas reaching the exhaust outlet (8) from the combustion type abatement apparatus through the exhaust gas passage (7) is supplied to the suction port (10) of the exhaust suction path (9) by the suction force when the suction means is operated. At this time, particulate components such as silicon dioxide flowing over the exhaust gas are captured by the filter element (5) located between the exhaust outlet (8) and the suction port (10).

Since the filter element (5) runs continuously, the exhaust port (8) and the suction port (8) which are arranged opposite to each other.
During (10), a new surface of the filter element (5) is always exposed, so that the filter element can be operated continuously for a long time without clogging.

The element (5) is immediately immersed in the water tank (6) to remove the adhering fine particle components to the filter that has captured the fine particle components. Is blown off, the surface of the filter element is washed away with fresh washing water, the water is blown off with compressed air, and then dried by a drying means (14) such as warm air to be regenerated.

FIG. 2 shows another embodiment, which is a filter element (5) of a HEPA filter formed of a fluororesin on a peripheral surface of a cylindrical frame (16) rotatable around a horizontal axis. The lower part is immersed in the water in the water tank (6), and the water tank on the peripheral surface of the cylindrical filter is
Exhaust outlet (8) of exhaust gas passage (7) with filter element (5) sandwiched in the area (downward area) moving toward (6)
And the suction port (10) of the exhaust suction path (9) are arranged to face each other. In this case, the exhaust outlet (8)
(10) are located on the inner peripheral side.

Further, an area (elevation area) on the peripheral surface of the cylindrical filter which moves away from the water tank (6).
A fountain nozzle (11) for jetting jet water for washing out fine particles such as silicon dioxide adhered to the surface of the filter element (5); and washing water for washing and regenerating the surface of the filter element (5). The jetting device (12), the jet nozzle of compressed air that blows off moisture adhering to the surface of the filter element (5) to dry it, (13), and the drying device (14) that dries the surface of the filter element (5). , Are arranged in order from the upper side in the moving direction of the filter element (5).

In each of the above embodiments, the HEPA filter is constituted by using the filter element (5) formed of a fluororesin. This is because the filter element made of the fluororesin has a trapping efficiency, pressure loss, strength, This is because they have excellent acid resistance and water resistance.

[0020]

According to the present invention, HE formed of fluororesin is used.
The filter element of the PA filter is circulated and moved, and the filter element is immersed in a water tank in the middle of its circulation path to remove fine particles adhering to the filter element. And the filter element is regenerated by drying the filter element with a drying means using warm air, etc., so that the treated gas discharged from the abatement system is always a new surface of the filter element. Therefore, the dust removing ability as a filter can be exhibited for a long time without deteriorating the dust removing ability as a filter. As a result, the operation of the abatement system is restricted for maintenance of the abatement system for capturing the by-produced particles, or a plurality of abatement systems must be prepared in one abatement system. Elimination can be avoided.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram of a fine powder removing apparatus according to an embodiment of the present invention.

FIG. 2 is a conceptual diagram of a fine powder removing device showing another embodiment.

[Explanation of symbols]

5 ... Filter element, 6 ... Water tank, 7 ... Exhaust gas passage, 8 ... Exhaust outlet, 9 ... Exhaust suction passage, 10 ... Suction port, 12 ...
Cleaning water jetting tool, 13 ... Draining air jet nozzle, 14 ... Filter element drying means, 16 ... Cylinder frame.

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4D019 AA01 BA13 BB01 BC13 CA10 CB09 4D058 JA23 JB14 JB25 MA12 MA13 MA48 SA04 SA20

Claims (2)

[Claims] 1. A filter element (5) of a HEPA filter formed of a fluororesin is formed in an endless band shape, and the filter element (5) formed in an endless band shape is configured to be rotatable in a vertical direction. The lower end of the rotating filter element (5) is immersed in the water tank (6), and the exhaust outlet (8) of the exhaust gas passage (7) and the exhaust suction passage are located in the downward movement area of the filter element (5). The suction port (10) of (9) is disposed opposite to the filter element (5) with the filter element (5) sandwiched therebetween. Jet nozzle (13), filter element drying means (1
4) A device for removing fine powder fumes from semiconductor exhaust gas. 2. A filter element (5) of a HEPA filter formed of a fluororesin is stretched on the outer peripheral surface of a cylindrical frame (16) that rotates horizontally with its lower part protruding into a water tank (6). The exhaust outlet (8) of the exhaust gas passage (7) and the suction port (1) of the exhaust suction passage (9) are located in the downward movement area of the element (6).
0) and the filter element (5) sandwiched therebetween, and the washing water jetting tool (12) and the draining air jet nozzle (1) are arranged in the ascending movement area of the filter element (5) in order from the bottom.
3) A device for removing fine powder from semiconductor exhaust gas in which a filter element drying means (13) is arranged.