WO2012169537A1 - Cleaning method and cleaning device for mask for sealing honeycomb structure, and method for manufacturing honeycomb filter - Google Patents

Cleaning method and cleaning device for mask for sealing honeycomb structure, and method for manufacturing honeycomb filter Download PDF

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Publication number
WO2012169537A1
WO2012169537A1 PCT/JP2012/064574 JP2012064574W WO2012169537A1 WO 2012169537 A1 WO2012169537 A1 WO 2012169537A1 JP 2012064574 W JP2012064574 W JP 2012064574W WO 2012169537 A1 WO2012169537 A1 WO 2012169537A1
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WO
WIPO (PCT)
Prior art keywords
mask
cleaning
cleaning liquid
air
supplied
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PCT/JP2012/064574
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French (fr)
Japanese (ja)
Inventor
則夫 村上
正春 森
Original Assignee
住友化学株式会社
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Application filed by 住友化学株式会社 filed Critical 住友化学株式会社
Publication of WO2012169537A1 publication Critical patent/WO2012169537A1/en

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    • B08B1/20—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work

Definitions

  • the present invention relates to a honeycomb structure sealing mask cleaning method and cleaning apparatus, and a honeycomb filter manufacturing method.
  • honeycomb filters are known to be used for DPF (Diesel particulate filter) and the like.
  • the honeycomb filter has a structure in which one end side of some of the through holes of the honeycomb structure having a large number of through holes is sealed with a sealing material, and the other end side of the remaining through holes is sealed with a sealing material.
  • Patent Documents 1 and 2 describe a method of sealing a honeycomb structure using a sealing mask.
  • the sealing mask used in the sealing step is for removing foreign matters (sealing material remaining in the mask in the sealing step, dust in the air, etc.) attached to the mask from the viewpoint of repeatedly using the mask.
  • a washing solution for example, washed with water
  • a drying treatment is performed.
  • the present invention has been made in view of such circumstances, and it is preferable to provide a honeycomb structure sealing mask having a plurality of through holes penetrating in a thickness direction from one main surface to the other main surface. It aims at providing the washing
  • cleaned. Another object of the present invention is to provide a method for manufacturing a honeycomb filter using a mask cleaned by such a cleaning method.
  • a cleaning method is a cleaning method for a honeycomb structure sealing mask having a plurality of through-holes penetrating in a thickness direction from one main surface to the other main surface.
  • a step of supplying a cleaning liquid to at least one cleaning surface of the surface or the other main surface, a step of transporting a mask having the cleaning liquid attached to the cleaning surface in a direction perpendicular to the thickness direction, and cleaning of the transported mask A first drying step for supplying air in the axial direction of the through hole with respect to the surface, and a direction inclined to the upstream side of the mask transport direction with respect to the mask thickness direction with respect to the cleaning surface of the mask to be transported
  • the cleaning method according to the present invention in the first drying step, air is supplied in the axial direction of the through hole to the cleaning surface of the mask that is transported in the direction orthogonal to the thickness direction. In addition to the adhering cleaning liquid, the cleaning liquid adhering to the inside of the through hole can be removed.
  • the cleaning surface of the mask transported in the direction orthogonal to the thickness direction in the second drying step, is upstream of the mask transport direction with respect to the mask thickness direction. By supplying the wind in the inclined direction, the cleaning liquid adhering to the cleaning surface of the mask can be removed.
  • the air may be supplied in the second drying step to the region where the air is supplied in the first drying step on the cleaning surface, and the wind is supplied in the second drying step on the cleaning surface. Air may be supplied to the region in the first drying step.
  • the cleaning method according to the present invention it is preferable to supply air from only one of the main surface side and the other main surface side in the first drying step.
  • the wind supplied from one end side of the through hole is easily removed from the other end side. Thereby, it becomes easy to remove the cleaning liquid adhering to the inside of the through hole, and the mask can be cleaned more satisfactorily.
  • the cleaning method according to the present invention it is preferable to supply air from each of the one main surface side and the other main surface side in the second drying step. In this case, since the cleaning liquid adhering to the other main surface can be removed together with the cleaning liquid adhering to one main surface, the mask can be cleaned more satisfactorily.
  • the inclination angle in the direction of supplying wind is preferably 10 to 45 ° with respect to the thickness direction of the mask. In this case, the mask can be cleaned more satisfactorily.
  • a method for manufacturing a honeycomb filter according to the present invention includes a step of cleaning a mask by the above-described cleaning method, and a step of supplying a sealing material to some through holes of the honeycomb structure through the cleaned mask.
  • the sealing material can be supplied to the through holes of the honeycomb structure through the mask from which the cleaning liquid has been sufficiently removed by the above cleaning method.
  • a sealed honeycomb filter can be easily obtained.
  • a cleaning device is a cleaning device for a honeycomb structure sealing mask having a plurality of through holes penetrating in a thickness direction from one main surface to the other main surface,
  • a cleaning liquid supply means for supplying a cleaning liquid to at least one cleaning surface of the surface or the other main surface; a transport means for transporting a mask having the cleaning liquid adhered to the cleaning surface in a direction perpendicular to the thickness direction;
  • a first blower for supplying air in the axial direction of the through-hole with respect to the cleaning surface of the mask, and an inclination to the upstream side of the mask transport direction with respect to the mask thickness direction with respect to the mask cleaning surface to be transported
  • Second air blowing means for supplying wind in a direction to perform.
  • the cleaning of the mask is performed by supplying air to the cleaning surface of the mask transported by the transporting means in the direction orthogonal to the thickness direction by the first blower means in the axial direction of the through hole.
  • the cleaning liquid adhering to the inside of the through hole can be removed.
  • the direction inclined to the upstream side of the mask transport direction with respect to the mask thickness direction with respect to the mask cleaning surface transported by the transport means in the direction orthogonal to the thickness direction By supplying air by the second air blowing means, the cleaning liquid adhering to the cleaning surface of the mask can be removed.
  • the cleaning liquid attached to the cleaning surface of the mask and the cleaning liquid attached to the inside of the through hole are sufficiently removed by removing the cleaning liquid by the first air blowing means and the second air blowing means.
  • the mask can be cleaned well.
  • the cleaning liquid adhered to the honeycomb structure sealing mask having a plurality of through holes penetrating in the thickness direction from one main surface to the other main surface is sufficiently obtained. It can be removed and drained, and the honeycomb structure sealing mask can be washed well. Moreover, according to the cleaning method and the cleaning apparatus of the present invention, it is possible to improve the cleaning efficiency of the honeycomb structure sealing mask, and to shorten the cleaning time. According to the method for manufacturing a honeycomb filter according to the present invention, a honeycomb filter in which desired through holes are reliably sealed can be easily obtained by using a mask cleaned by such a cleaning method.
  • 1 is a drawing showing a honeycomb filter manufactured by a method for manufacturing a honeycomb filter according to an embodiment of the present invention. It is drawing which shows the flowchart of the manufacturing method of the honey-comb filter which concerns on one Embodiment of this invention.
  • 1 is a view showing a mask cleaned by a cleaning method according to an embodiment of the present invention. It is drawing which shows the washing
  • FIG. 1 is a drawing showing a honeycomb filter manufactured by the method for manufacturing a honeycomb filter according to the present embodiment.
  • the honeycomb filter 100 can be used as a DPF, for example.
  • the honey-comb filter 100 is a cylindrical body which has the some flow path 110a, 110b arrange
  • the flow paths 110 a and 110 b are partitioned by a partition wall 112 that extends parallel to the central axis of the honeycomb filter 100.
  • One end of the channel 110 a is sealed by a sealing portion 114 on one end surface 100 a of the honeycomb filter 100, and the other end of the channel 110 a is opened as a gas outlet on the other end surface 100 b of the honeycomb filter 100.
  • one end of the flow path 110b is opened as a gas inlet on one end face 100a, and the other end of the flow path 110b is sealed by a sealing portion 114 on the other end face 100b.
  • the flow paths 110a and the flow paths 110b are alternately arranged to form a lattice structure.
  • the flow paths 110a and 110b are perpendicular to both end faces 100a and 100b of the honeycomb filter 100, and are arranged in a square shape when viewed from one end face side, that is, the central axes of the flow paths 110a and 110b are respectively located at the apexes of the square.
  • the cross-sectional shape of the flow paths 110a and 110b is, for example, a substantially square shape.
  • the partition 112 is made of porous ceramics (fired body).
  • ceramics include oxides such as alumina, silica, mullite, cordierite, glass and aluminum titanate; silicon carbide, silicon nitride, metal and the like.
  • the aluminum titanate can contain magnesium and / or silicon.
  • the material of the sealing part 114 can be the same material as the partition 112.
  • the cross-sectional shapes of the flow paths 110a and 110b are substantially square.
  • the shape is not limited to this, and may be a rectangle, a circle, an ellipse, a triangle, a hexagon, an octagon, or the like.
  • the channels 110a and 110b may have a mixture of different diameters and / or different cross-sectional shapes.
  • the flow path arrangement is a square arrangement in FIG. 1, but is not limited to this, and may be an equilateral triangle arrangement or a staggered arrangement in which the central axis of the flow path is arranged at the apex of the equilateral triangle in the cross section. Good.
  • the honeycomb filter 100 is not limited to a cylindrical body, and may be a triangular prism, a quadrangular prism, a hexagonal prism, an octagonal prism, or the like.
  • the gas G supplied from the one end face 100a to the flow path 110b passes through the partition wall 112, reaches the adjacent flow path 110a, and is discharged from the other end face 100b.
  • particles in the gas G for example, fine particles (PM) contained in exhaust gas discharged from an internal combustion engine such as a diesel engine
  • the partition walls 112 so that the honeycomb filter 100 functions as a filter. .
  • FIG. 2 is a flowchart showing a method for manufacturing a honeycomb filter according to the present embodiment.
  • the manufacturing method of the honeycomb filter 100 according to the present embodiment includes a cleaning step S100 for cleaning the honeycomb structure sealing mask, a preparation step S200 for preparing the honeycomb structure, and the penetration of the honeycomb structure using the cleaned mask. And a sealing step S300 for sealing the holes.
  • FIG. 3 is a view showing a mask cleaned by the cleaning method according to the present embodiment in the cleaning step S100.
  • the mask 1 has an upper surface (one main surface) 1a and a lower surface (the other main surface) 1b facing each other as the cleaning surface 3, and has a disk shape, for example.
  • the diameter of the mask 1 is, for example, 150 to 500 mm.
  • the thickness of the mask 1 is, for example, 0.1 to 3.0 mm.
  • the material of the mask 1 is not specifically limited, For example, a metal and resin are mentioned.
  • the mask 1 has a plurality of through holes 5 penetrating in the thickness direction from the upper surface 1a to the lower surface 1b.
  • the through holes 5 are arranged in the same manner as the arrangement of the through holes sealed in the honeycomb structure, and are arranged in a zigzag manner, for example.
  • the cross-sectional shape of the through-hole 5 perpendicular to the axial direction of the through-hole 5 has the same cross-sectional shape as the through-hole sealed in the honeycomb structure, and is, for example, a substantially square shape.
  • the inner diameter of the through hole 5 (the length of one side when the cross-sectional shape is substantially square) is, for example, 0.8 to 2.5 mm.
  • the mask 1 is cleaned by removing the foreign matter from the mask 1 by supplying cleaning liquid and dry air to the mask 1 to which foreign matter such as a sealing material adheres.
  • the foreign matter adheres to, for example, the upper surface 1 a, the lower surface 1 b, and the inner wall of the through hole 5.
  • the cleaning liquid is water, for example.
  • the washing step S100 includes a water washing step S110 and a drying step S120 as shown in FIG.
  • the water washing step S110 includes a first water washing step S110a for washing the mask 1 with water (pretreatment), a second water washing step S110b for washing the mask 1 with water (main washing), and a third washing step (rinsing) for the mask 1 with water.
  • the washing step S110c is included in this order.
  • FIG. 4 is a drawing showing the cleaning device according to the present embodiment, and is a drawing showing the cleaning device 50 used in the cleaning step S100.
  • illustration of the through hole 5 in the mask 1 is omitted for convenience.
  • the cleaning device 50 includes a wheel conveyor (conveying means) 7, a pretreatment unit 10 in which the first water washing step S110a is performed, a cleaning unit 20 in which the second water washing step S110b is performed, and a third water washing step S110c.
  • the post-processing part 30 to be performed and the drying part 40 in which the drying step S120 is performed are included.
  • the supply method of the mask 1 is, for example, a single wafer type, and the single mask 1 is sequentially conveyed.
  • the mask 1 has the mask 1 in the order of the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40 by the wheel conveyor 7 with the upper surface 1a facing upward in the vertical direction and the lower surface 1b facing downward in the vertical direction.
  • the supply method of the mask 1 may be a batch method in which a plurality of masks 1 are transported together and washed or dried at the same time.
  • the mask 1 may be transported continuously by performing the transport operation, or the mask 1 may be transported intermittently by performing the transport operation intermittently.
  • the wheel conveyor 7 is on each of the upper surface 1a side and the lower surface 1b side of the mask 1 being conveyed so as to face each other in the thickness direction D1. Is arranged.
  • the cleaning unit 20, the post-processing unit 30, and the drying unit 40 the mask 1 is sandwiched by the wheel conveyor 7 in the thickness direction D1 as shown in FIG. The mask 1 is transported in the transport direction D2 and cleaning liquid or drying air is supplied to the cleaning surface 3 of the mask 1.
  • the wheel conveyor 7 in the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30 and the drying unit 40 has a pair of wheels 7a and 7b arranged in the transport direction D2.
  • the wheels 7 a and 7 b are, for example, roller-type wheels that are driven to rotate, and face each other in the thickness direction D ⁇ b> 1 in the pair of wheel conveyors 7.
  • the pair of wheels 7a and 7b are arranged in a staggered pattern along the transport direction D2.
  • three pairs of wheels 7a and 7b are arranged in a direction (horizontal direction) D3 orthogonal to the thickness direction D1 and the conveyance direction D2, and four pairs of wheels 7a and 7b are arranged in the direction D3.
  • the areas are alternately arranged along the transport direction D2.
  • the cleaning unit 20, the post-processing unit 30, and the drying unit 40 it is preferable to transport the mask 1 so that the arrangement direction of the adjacent through holes 5 and the transport direction D2 coincide.
  • the cross-sectional shape of the through hole 5 perpendicular to the axial direction of the through hole 5 is rectangular, the angle of the through hole 5 with respect to at least one of the long side direction and the short side direction with respect to the transport direction D2 is 45 °. Is preferred. In these cases, the inside of the through hole 5 can be washed and dried more satisfactorily.
  • the wheel conveyor 7 is It is arranged only below the mask 1 to be conveyed (see FIG. 4).
  • the mask 1 is placed on the wheel conveyor 7 and conveyed in the conveyance direction D2 as the wheel rotates.
  • the mask 1 in the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40, the mask 1 is transported in the transport direction D2 while being held in the thickness direction D1 by the wheel conveyor 7.
  • the cleaning liquid or the drying air is supplied to the cleaning surface 3 of 1.
  • positioning position of the mask 1 fluctuates because the mask 1 is pressed by the cleaning liquid or the drying air.
  • a pair of wheel 7a, 7b which comprises the wheel conveyor 7 is the conveyance direction D2.
  • the area of the contact area between the mask 1 and the wheel conveyor 7 can be reduced as compared to the case of using a wheel conveyor having a long wheel extending in the direction D3. it can. Thereby, even if the foreign substance has adhered to the wheel conveyor 7, it can suppress that the said foreign substance will be supplied with respect to the wash
  • FIG. it can. According to the present embodiment as described above, it is easy to remove the foreign matter adhering to the mask 1, and the mask 1 can be more satisfactorily cleaned.
  • the wheel conveyor 7 is not limited to the above, and may be disposed only below the mask 1 to be conveyed in the pretreatment unit 10, the cleaning unit 20, the posttreatment unit 30, and the drying unit 40. Further, the wheel conveyor 7 includes a plurality of pairs of roller-type wheels opposed to the thickness direction D1 in the conveyance direction D2 in a region other than the preprocessing unit 10, the cleaning unit 20, the postprocessing unit 30, and the drying unit 40. The form which consists of may be sufficient. Furthermore, the wheel conveyor 7 is not limited to being arranged in a staggered manner along the transport direction D2, but is a form in which a plurality of long wheels extending in the direction D3 are arranged in parallel in the transport direction D2. May be.
  • the pretreatment unit 10 includes a wheel conveyor 7 including a plurality of pairs of wheels 7 a and 7 b, a pair of roller brushes 12 a and 12 b, and a pair of spray nozzles (cleaning liquid Supply means) 16a, 16b.
  • a pair of roller brushes 12a and 12b are disposed so as to face each other in the thickness direction D1, the roller brush 12a is disposed on the upper surface 1a side of the mask 1, and the roller brush 12b is disposed on the lower surface 1b of the mask 1. Arranged on the side.
  • the roller brushes 12a and 12b only need to be rotatable about an axis extending in a direction parallel to the cleaning surface 3 and intersecting the transport direction D2.
  • the roller brushes 12a and 12b are parallel to the cleaning surface 3 and perpendicular to the transport direction D2. It rotates about an axis extending in the same direction as the direction D3 in this embodiment.
  • An axis A1 that is the rotation center of the roller brush 12a and an axis A2 that is the rotation center of the roller brush 12b extend in the direction D3 in parallel with each other.
  • the roller brushes 12a and 12b only need to have a brush 12c capable of cleaning the mask 1, and are, for example, members having the brush 12c connected to the surface of a long wheel extending in the direction D3.
  • the roller brushes 12a and 12b preferably rotate in the rotation direction D4 so that the brush 12c in contact with the mask 1 moves in the direction opposite to the conveyance direction D2. In this case, the mask 1 can be cleaned more satisfactorily.
  • the spray nozzles 16a and 16b are opposed to each other in the thickness direction D1 with the roller brushes 12a and 12b interposed, and the centers of the upper surface 1a and the lower surface 1b pass between the spray nozzles 16a and 16b in the conveying process.
  • the spray nozzle 16a is arranged on the upper surface 1a side of the mask 1, and sprays the cleaning liquid 14 in the axial direction of the through-hole 5 (vertical direction, the same direction as the direction D1 in the present embodiment) to spray the cleaning liquid 14 on the upper surface 1a.
  • the spray nozzle 16b is disposed on the lower surface 1b side of the mask 1, and sprays the cleaning liquid 14 in the axial direction of the through hole 5 to supply the cleaning liquid 14 to the lower surface 1b.
  • the spray nozzles 16 a and 16 b are only required to be able to supply the cleaning liquid 14 to the cleaning surface 3.
  • the spray nozzles 16 a and 16 b are one-fluid nozzles or two-fluid nozzles and are connected to a supply source 18 of the cleaning liquid 14.
  • the spray nozzles 16a and 16b are further connected to a compressed air supply source (not shown), and the mist composed of fine particles of the cleaning liquid 14 is removed. Can be sprayed.
  • the distance from the tip (spray port) of the spray nozzle 16a to the upper surface 1a and the distance from the tip (spray port) of the spray nozzle 16b to the lower surface 1b are, for example, 50 to 200 mm.
  • the temperature of the cleaning liquid 14 is 10 to 40 ° C., for example.
  • the cleaning liquid 14 attached to the roller brushes 12a and 12b is caused by the rotation of the roller brushes 12a and 12b or the rollers.
  • the brush 12a is supplied between the cleaning surface 3 and the roller brushes 12a and 12b and used for cleaning the cleaning surface 3.
  • the inner wall of the through hole 5 can be cleaned by supplying the cleaning liquid 14 supplied from the spray nozzles 16 a and 16 b to the cleaning surface 3 into the through hole 5.
  • the cleaning liquid 14 is supplied to the cleaning surface 3 of the mask 1 that is continuously or intermittently transported in the transport direction D2 by the wheel conveyor 7, and is parallel to the cleaning surface 3. Further, the cleaning surface 3 is cleaned by bringing the brushes 12c of the roller brushes 12a and 12b rotating around the axis extending in the direction D3 orthogonal to the transport direction D2 into contact with the cleaning surface 3 in order from the downstream side to the upstream side in the transport direction D2. To do. Thereby, in this embodiment, it becomes easy to remove the foreign material adhering to the cleaning surface 3, and the mask 1 can be cleaned more satisfactorily.
  • the cleaning surface 3 is cleaned by bringing the brush 12c into contact with each of the upper surface 1a and the lower surface 1b in a state where the cleaning liquid 14 is supplied to each of the upper surface 1a and the lower surface 1b. is doing. In this case, the mask 1 can be cleaned more satisfactorily.
  • the pretreatment unit 10 may have a plurality of roller brushes and spray nozzles arranged in the transport direction D2. Further, the pretreatment unit 10 may have a single roller brush or spray nozzle.
  • the spray nozzle is disposed only on either the upper surface 1a side or the lower surface 1b side, These roller brushes may be arranged between a single spray nozzle and the mask 1.
  • the spray nozzles 16a and 16b may be opposed to each other in the thickness direction D1 without interposing the roller brushes 12a and 12b, and may be arranged apart from each other in the transport direction D2.
  • the direction in which the cleaning liquid 14 is supplied from the spray nozzles 16a and 16b may be inclined with respect to the thickness direction D1.
  • the cleaning unit 20 includes a wheel conveyor 7 including a plurality of pairs of wheels 7a and 7b, and a pair of spray nozzles (cleaning liquid supply means) 26a and 26b that supply the cleaning liquid 24. ing.
  • the spray nozzle 26a is disposed on the upper surface 1a side of the mask 1, and is disposed such that the center of the upper surface 1a passes under the spray nozzle 26a in the transport process.
  • the spray nozzle 26 a sprays the cleaning liquid 24 in the axial direction (vertical direction) of the through hole 5 and supplies the cleaning liquid 24 to the upper surface 1 a and the through hole 5.
  • the spray nozzle 26b is disposed on the lower surface 1b side of the mask 1, and is disposed such that the center of the lower surface 1b passes above the spray nozzle 26b in the conveyance process.
  • the spray nozzle 26 b sprays the cleaning liquid 24 in the axial direction of the through hole 5 and supplies the cleaning liquid 24 to the inside of the lower surface 1 b and the through hole 5.
  • the spray nozzles 26a and 26b are disposed on the same straight line along the transport direction D2 and are separated from each other in the transport direction D2.
  • the spray nozzle 26a is disposed downstream of the spray nozzle 26b in the transport direction D2. Yes. That is, the spray axis A3 of the cleaning liquid 24 sprayed on the upper surface 1a and the spray axis A4 of the cleaning liquid 24 sprayed on the lower surface 1b are separated from each other in the transport direction D2, and the spray axis A3 is It is located downstream of the spray axis A4 in the transport direction D2.
  • the supply position (area where the cleaning liquid 24 is sprayed) P1 on the upper surface 1a is located downstream of the supply position P2 of the cleaning liquid 24 on the lower surface 1b in the transport direction D2.
  • the spray nozzles 26a and 26b are two-fluid nozzles capable of spraying the cleaning liquid 24 onto the cleaning surface 3, and are connected to a cleaning liquid supply source 28a and a compressed air supply source 28b.
  • the distance from the tip (spray port) of the spray nozzle 26a to the upper surface 1a and the distance from the tip (spray port) of the spray nozzle 26b to the lower surface 1b are, for example, 10 to 200 mm.
  • the spray spread angle ⁇ 1 of the spray nozzles 26a and 26b is, for example, 60 to 80 °.
  • the spray pressure is, for example, 0.1 to 0.7 MPa.
  • the spray amount is, for example, 0.2 to 4.0 liter / min.
  • the temperature of the cleaning liquid 24 is 10 to 40 ° C., for example.
  • the spray pattern of the spray nozzles 26a and 26b is, for example, a film shape, a fan shape, or a cone shape, and a film shape is preferable from the viewpoint of obtaining a relatively uniform flow rate distribution.
  • the distance D5 in the transport direction D2 between the tip of the spray nozzle 26a and the tip of the spray nozzle 26b prevents the cleaning liquid 24 from being simultaneously supplied into the same through-hole 5 from the upper surface 1a side and the lower surface 1b side. From the viewpoint of facilitating, it is, for example, 5 to 50 mm.
  • the spray nozzles 26a and 26b extend in the axial direction of the through-hole 5 with respect to the upper surface 1a and the lower surface 1b of the mask 1 that are continuously or intermittently conveyed in the conveyance direction D2 by the wheel conveyor 7,
  • the cleaning liquid 24 is sprayed to clean the upper surface 1a and the lower surface 1b of the mask 1 and the inside of the through hole 5 in order from the downstream side to the upstream side in the transport direction D2.
  • the cleaning liquid 24 is sprayed from the spray nozzles 26a and 26b, which are two-fluid nozzles, in the second water washing step S110b, the mist composed of the fine particles of the cleaning liquid 24 is supplied to the cleaning surface 3. It is possible to easily remove foreign substances from the mask 1. Further, in the present embodiment, by spraying the cleaning liquid 24 in the axial direction of the through hole 5, the cleaning liquid 24 is easily supplied into the through hole 5, and the inside of the through hole 5 can be sufficiently cleaned. Furthermore, in this embodiment, the spray axis A3 of the cleaning liquid 24 sprayed on the upper surface 1a and the spray axis A4 of the cleaning liquid 24 sprayed on the lower surface 1b are separated from each other in the transport direction D2.
  • the cleaning liquid 24 is sprayed on each of the upper surface 1a and the lower surface 1b, the cleaning liquid 24 is simultaneously supplied into the same through-hole 5 from each of the upper surface 1a side and the lower surface 1b side. Is suppressed. Thereby, the cleaning liquid 24 supplied from one side of the upper surface 1a side and the lower surface 1b side is prevented from being hindered by the cleaning liquid 24 supplied from the other side. According to the present embodiment as described above, it becomes easy to remove the foreign matter adhering to the inner wall of the through hole 5 in addition to the foreign matter adhering to the cleaning surface 3 of the mask 1, and the mask 1 can be cleaned more satisfactorily. .
  • the cleaning method according to the present embodiment includes the second water washing step S110b after the first water washing step S110a.
  • the mask 1 since the mask 1 is finally cleaned in the second water washing step S110b after the mask 1 is washed as a pretreatment in the first water washing step S110a, the mask 1 can be further satisfactorily washed.
  • the mask 1 in the second water washing step S110b, is transported with the upper surface 1a facing upward in the vertical direction and the lower surface 1b facing downward in the vertical direction, and the spray axis A3 is transported in the transport direction D2 rather than the spray axis A4. It is located on the downstream side.
  • the cleaning liquid 24 supplied to the inside of the through-hole 5 by the spray nozzle 26b from the lower surface 1b side facing downward in the vertical direction passes through the inside of the through-hole 5 while removing foreign matters, and faces upward in the vertical direction. Even if it adheres to the upper surface 1a, the cleaning liquid 24 attached to the upper surface 1a can be removed by the cleaning liquid 24 supplied by the spray nozzle 26a on the downstream side in the transport direction D2. Thereby, the mask 1 can be more satisfactorily cleaned.
  • the second water washing step S110b is not limited to the above, and the spray axis A3 is transported more than the spray axis A4 by disposing the spray nozzle 26a upstream of the spray nozzle 26b in the transport direction D2. It may be located upstream of D2. Further, the cleaning unit 20 may have a plurality of spray nozzles arranged in the transport direction D2.
  • the post-processing unit 30 includes a wheel conveyor 7 including a plurality of pairs of wheels 7a and 7b, and a pair of spray nozzles (cleaning liquid supply means) 36a and 36b for supplying the cleaning liquid 34. is doing.
  • the spray nozzles 36a and 36b are arranged in a pair so as to face each other in the thickness direction D1, and supply the cleaning liquid 34 in a direction D6 inclined to the upstream side of the transport direction D2 with respect to the thickness direction D1.
  • the spray nozzle 36 a is disposed on the upper surface 1 a side of the mask 1 and sprays the cleaning liquid 34 to supply the cleaning liquid 34 to the upper surface 1 a and the inside of the through hole 5.
  • the spray nozzle 36 b is disposed on the lower surface 1 b side of the mask 1 and sprays the cleaning liquid 34 to supply the cleaning liquid 34 to the inside of the lower surface 1 b and the through hole 5.
  • the supply position (region where the cleaning liquid 34 is sprayed) P3 on the upper surface 1a and the supply position P4 of the cleaning liquid 34 on the lower surface 1b face each other in the thickness direction D1.
  • the spray nozzles 36 a and 36 b are only required to be able to spray the cleaning liquid 34 onto the cleaning surface 3.
  • the spray nozzles 36 a and 36 b are one-fluid nozzles or two-fluid nozzles and are connected to a supply source 38 of the cleaning liquid 34.
  • the spray nozzles 36a and 36b are further connected to a compressed air supply source (not shown).
  • the inclination angle ⁇ 2 in the direction D6 for supplying the cleaning liquid 34 at the spray nozzles 36a and 36b is, for example, 10 to 45 ° with respect to the thickness direction D1.
  • the shortest distance from the tip (spray port) of the spray nozzle 36a to the upper surface 1a and the shortest distance from the tip (spray port) of the spray nozzle 36b to the lower surface 1b are, for example, 50 to 200 mm.
  • the spray pressure is, for example, 0.1 to 2 MPa.
  • the spray amount is, for example, 0.2 to 15 liter / min.
  • the temperature of the cleaning liquid 34 is 10 to 40 ° C., for example.
  • the spray pattern of the spray nozzles 36a and 36b is, for example, a film shape, a fan shape, or a cone shape.
  • the cleaning liquid 34 is supplied in the direction D6 inclined to the side, and the mask 1 is cleaned in order from the downstream side to the upstream side in the transport direction D2. This makes it easier for foreign matter to be removed upstream of the transport direction D2 by the cleaning liquid 34, and suppresses foreign matter from remaining in the region of the cleaning surface 3 downstream of the transport direction D2 as the mask 1 is transported. Can do. Therefore, in this embodiment, it becomes easy to remove the foreign matter adhering to the mask 1, and the mask 1 can be cleaned more satisfactorily.
  • the cleaning method according to the present embodiment includes the second water washing step S110b before the third water washing step S110c.
  • the mask 1 since the mask 1 is washed as a post-treatment in the third water washing step S110c after the main washing of the mask 1 in the second water washing step S110b, the mask 1 can be further satisfactorily washed.
  • the third water washing step S110c is not limited to the above, and the spray nozzles 36a and 36b are spaced apart from each other in the transport direction D2 so that the supply position P3 and the supply position P4 are in the transport direction D2. May be separated from each other.
  • the post-processing unit 30 may have a plurality of spray nozzles arranged in the transport direction D2, or may have a single spray nozzle only on one of the upper surface 1a side and the lower surface 1b side. Good.
  • the drying step S120 In the drying step S120, the mask 1 that has been post-processed in the third water washing step S110c and has the cleaning liquid attached thereto is conveyed to the drying unit 40, and the cleaning liquid attached to the mask 1 is removed.
  • the cleaning liquid to be removed adheres to, for example, the upper surface 1 a and lower surface 1 b of the mask 1 and the inner wall of the through hole 5.
  • the drying unit 40 includes a wheel conveyor 7 including a plurality of pairs of wheels 7 a and 7 b, and a spray nozzle (first blowing unit) 44 that blows drying air 42 a as a first drying process.
  • air knives (second blowing means) 46a and 46b for blowing the drying air 42b are provided.
  • the spray nozzle 44 and the air knives 46a and 46b are connected to a supply source 48 of the drying air 42a and the drying air 42b.
  • the spray nozzle 44 blows the drying air 42 a for drying the mask 1 in the axial direction of the through hole 5, and can blow the drying air 42 a onto the cleaning surface 3.
  • the air knives 46a and 46b blow the drying air 42b for drying the mask 1 in the direction D7 inclined to the upstream side of the transport direction D2 with respect to the thickness direction D1, and the drying air 42b over the entire length of the direction D3 in the mask 1. Can be sprayed onto the cleaning surface 3.
  • the drying air 42a is preferably supplied to the mask 1 from only one of the upper surface 1a side and the lower surface 1b side.
  • the mask 1 is sprayed by the spray nozzle 44 only from the upper surface 1a side of the mask 1. Is not supplied from the lower surface 1 b side of the mask 1.
  • the spray nozzle 44 is disposed only on the upper surface 1a side, and is disposed such that the center of the upper surface 1a passes below the spray nozzle 44 in the transport process.
  • the spray nozzle 44 blows the drying air 42 a and supplies the drying air 42 a to the upper surface 1 a and the inside of the through hole 5.
  • the distance from the tip (blower surface) of the spray nozzle 44 to the upper surface 1a is, for example, 50 to 200 mm.
  • the pressure of the drying air 42a is, for example, 0.1 to 1 MPa.
  • the supply amount of the drying air 42a is, for example, 100 to 1000 liters / min.
  • the drying air 42a is, for example, a wind of 5 to 200 ° C.
  • the drying air 42b is supplied to the mask 1 by air knives 46a and 46b from the upper surface 1a side and the lower surface 1b side, respectively.
  • the air knives 46a and 46b are arranged on the upper surface 1a side and the lower surface 1b side of the mask 1, respectively, and are paired so as to face each other in the thickness direction D1.
  • the air knife 46a is disposed on the upper surface 1a side of the mask 1, and blows the drying air 42b to supply the drying air 42b to the upper surface 1a.
  • the air knife 46b is disposed on the lower surface 1b side of the mask 1, and blows the drying air 42b to supply the drying air 42b to the lower surface 1b.
  • the supply position P5 of the drying air 42b on the upper surface 1a (position where the drying air 42b is blown) P5 and the supply position P6 of the drying air 42b on the lower surface 1b face each other in the thickness direction D1.
  • the shortest distance from the tip (air blowing surface) of the air knife 46a to the upper surface 1a and the shortest distance from the tip (air blowing surface) of the air knife 46b to the lower surface 1b are, for example, 1 to 200 mm.
  • the pressure of the drying air 42b is, for example, 0.1 to 1 MPa.
  • the supply amount of the drying air 42b is, for example, 100 to 5000 liters / min.
  • the drying air 42b is, for example, a wind of 5 to 200 ° C.
  • the inclination angle ⁇ 3 in the direction D7 for supplying the drying air 42b in the air knives 46a and 46b is, for example, 10 to 45 ° with respect to the thickness direction D1.
  • the drying air 42b is supplied to the region P7 where the drying air 42a on the upper surface 1a is supplied.
  • the region P7 to which the drying air 42a blown from the spray nozzle 44 is supplied is conveyed in the conveying direction D2 as the mask 1 is conveyed in the conveying direction D2 continuously or intermittently by the wheel conveyor 7.
  • the region P7 is supplied with the dry air 42b blown from the air knife 46a.
  • the drying air 42a and the drying air 42b are supplied to the upper surface 1a while the mask 1 is being transported in the transporting direction D2, whereby the drying air 42a is applied to the upper surface 1a from the downstream side to the upstream side in the transporting direction D2.
  • the drying air 42b is supplied.
  • the cleaning liquid adhering to the cleaning surface 3 and the cleaning liquid adhering to the inside of the through hole 5 can be sufficiently removed by performing the first drying process and the second drying process. Therefore, in this embodiment, the mask 1 can be cleaned satisfactorily.
  • the drying air 42a is supplied to the mask 1 only from the upper surface 1a side in the first drying step.
  • the drying air 42a supplied from the upper surface 1a side of the through hole 5 is easily removed from the lower surface 1b side. Thereby, it becomes easy to remove the cleaning liquid adhering to the inside of the through-hole 5, and the mask 1 can be cleaned more satisfactorily.
  • the drying air 42b is supplied from each of the upper surface 1a side and the lower surface 1b side in the second drying step.
  • the cleaning liquid adhering to the lower surface 1b can be removed together with the cleaning liquid adhering to the upper surface 1a, the mask 1 can be more satisfactorily cleaned.
  • drying process S120 is not restricted above.
  • the mask 1 is transported in the horizontal direction, but the mask 1 may be transported in a direction inclined from the horizontal direction.
  • the mask 1 may be transported while being inclined such that the downstream side is positioned above the upstream side in the transport direction D2, and the tilt angle is, for example, 5 to 20 ° with respect to the horizontal direction.
  • the cleaning liquid adhering to the mask 1 is further easily removed to the upstream side in the transport direction D2 by the drying air 42a and 42b, and the cleaning liquid remains in the downstream area of the cleaning surface 3 in the transport direction D2 or is dried.
  • drying air 42b is supplied with respect to the area
  • air knives 46a and 46b are arrange
  • the drying air 42a and the drying air 42b are simultaneously supplied to the cleaning surface 3 of the same mask 1, but the drying air 42a is supplied over the entire length of the cleaning surface 3 in the transport direction D2. Later, the drying air 42b may be supplied over the entire length of the same cleaning surface 3 in the transport direction D2.
  • the drying unit 40 may include a plurality of spray nozzles 44 and air knives 46a and 46b arranged in the transport direction D2.
  • the drying unit 40 may have an air knife capable of blowing the drying air 42a over the entire length in the direction D3 in the mask 1 instead of the spray nozzle 44.
  • the spray nozzle 44 may be disposed only on the lower surface 1b side of the upper surface 1a side and the lower surface 1b side of the mask 1, and the drying air 42a may be supplied to the mask 1 only from the lower surface 1b side of the mask 1. .
  • a pair of air knives 46a and 46b may be arranged apart from each other in the transport direction D2, and the supply position P5 and the supply position P6 may be separated from each other in the transport direction D2.
  • the dry air 42b since it is suppressed that the dry air 42b is simultaneously supplied into the same through-hole 5 from each of the upper surface 1a side and the lower surface 1b side, it is easier to remove the cleaning liquid adhering to the inside of the through-hole 5.
  • only one of the air knife 46 a and the air knife 46 b may be arranged, and the drying air 42 b may be supplied to the mask 1 from only one side of the mask 1.
  • ⁇ Preparation process S200> A preparation step S200 subsequent to the cleaning step S100 will be described.
  • a honeycomb structure is prepared. For example, after extruding the raw material mixture to obtain a green honeycomb molded body having a plurality of through holes partitioned by partition walls, the green honeycomb molded body is fired to form a honeycomb structure (unsealed honeycomb fired body). obtain.
  • the raw material mixture contains a ceramic material and an organic binder, and other additives as necessary.
  • the honeycomb filter 100 contains aluminum titanate
  • the raw material mixture contains, for example, an aluminum source powder or a titanium source powder as a ceramic material, and further contains a magnesium source powder or a silicon source powder as necessary.
  • the organic binder is, for example, methyl cellulose.
  • the additive is, for example, a pore-forming agent, a lubricant, a plasticizer, a dispersant, or a solvent.
  • ⁇ Sealing process S300> the sealing step S300, the mask 1 provided with the through holes 5 at positions corresponding to the through holes to be sealed in the honeycomb structure is brought into close contact with one end surface of the honeycomb structure, and the masks are formed in some of the through holes of the honeycomb structure. A sealing material is supplied through 1. Next, the mask 1 is brought into close contact with the other end surface of the honeycomb structure, and the sealing material is supplied through the mask 1 to the through hole in which the end portion on the one end surface side of the honeycomb structure is not sealed. As a result, a flow path is formed in which either the end on one end side or the end on the other end side of the honeycomb structure is sealed. In the present embodiment, as shown in FIG.
  • the through-holes of the honeycomb structure are sealed so that 110b is alternately arranged.
  • the sealing material is not particularly limited as long as the through-holes of the honeycomb structure can be sealed, and the same material as the raw material mixture for obtaining the honeycomb structure can be used.
  • the honeycomb structure with the through holes sealed is heated, and the sealing material supplied into the through holes is cured to form the sealed portions 114.
  • the honeycomb filter 100 shown in FIG. 1 can be obtained.
  • the through hole is sealed in the sealing step S300 after firing the green honeycomb molded body in the preparation step S200, but after the through hole of the green honeycomb molded body obtained in the preparation step S200 is sealed.
  • the honeycomb filter 100 can also be obtained by firing.

Abstract

A cleaning method in one embodiment of the present invention, said method being a method for cleaning a mask (1) that has a plurality of through-holes (5) running through the thickness direction (D1) thereof from a top surface (1a) to a bottom surface (1b), is provided with the following steps: a step wherein a cleaning solution is supplied to the top surface (1a) and bottom surface (1b) of the mask (1); a step wherein the mask (1), with the cleaning solution adhered to the top surface (1a) and bottom surface (1b) thereof, is conveyed in a conveyance direction (D2) perpendicular to the thickness direction (D1) of the mask; a first drying step wherein drying air (42a) is supplied to the top surface (1a) of the conveyed mask (1) in the axial direction of the through-holes (5); and a second drying step wherein drying air (42b) is supplied to the top surface (1a) and bottom surface (1b) of the conveyed mask in a direction (D7) angled towards the upstream side of the conveyance direction (D2) with respect to the thickness direction (D1).

Description

ハニカム構造体封口用マスクの洗浄方法及び洗浄装置、並びに、ハニカムフィルタの製造方法Cleaning method and cleaning apparatus for honeycomb structure sealing mask, and honeycomb filter manufacturing method
　本発明は、ハニカム構造体封口用マスクの洗浄方法及び洗浄装置、並びに、ハニカムフィルタの製造方法に関する。 The present invention relates to a honeycomb structure sealing mask cleaning method and cleaning apparatus, and a honeycomb filter manufacturing method.
　従来、ハニカムフィルタは、ＤＰＦ（Diesel　particulate　filter）等に用いられることが知られている。ハニカムフィルタは、多数の貫通孔を有するハニカム構造体の一部の貫通孔の一端側を封口材で封じると共に、残りの貫通孔の他端側を封口材で封じた構造を有する。 Conventionally, honeycomb filters are known to be used for DPF (Diesel particulate filter) and the like. The honeycomb filter has a structure in which one end side of some of the through holes of the honeycomb structure having a large number of through holes is sealed with a sealing material, and the other end side of the remaining through holes is sealed with a sealing material.
　ハニカム構造体の一端側の所望の貫通孔のみを封口材により封じるに際しては、ハニカム構造体の封口すべき貫通孔に対応する箇所に貫通孔が設けられた封口用マスクが使用される。下記特許文献１，２には、封口用マスクを用いてハニカム構造体を封口する方法が記載されている。 When sealing only a desired through hole on one end side of the honeycomb structure with a sealing material, a sealing mask having a through hole provided at a position corresponding to the through hole to be sealed of the honeycomb structure is used. The following Patent Documents 1 and 2 describe a method of sealing a honeycomb structure using a sealing mask.
特開２００４－２９０７６６号公報JP 2004-290766 A 特開２００８－１３２７４９号公報JP 2008-132749 A
　ところで、封口工程で使用された封口用マスクは、当該マスクを繰り返し使用する観点から、マスクに付着した異物（封口工程においてマスクに残存した封口材や、空気中のダスト等）を除去するために洗浄液により洗われた（例えば水洗された）後に乾燥処理が施される。しかしながら、従来の封口用マスクの洗浄方法では、マスクに付着した洗浄液を充分に除去することが困難であり、封口用マスクを良好に洗浄することが困難である。そのため、封口用マスクの洗浄方法に対しては、マスクに付着した洗浄液を充分に除去することにより、従来に比してマスクを良好に洗浄することが求められている。 By the way, the sealing mask used in the sealing step is for removing foreign matters (sealing material remaining in the mask in the sealing step, dust in the air, etc.) attached to the mask from the viewpoint of repeatedly using the mask. After being washed with a washing solution (for example, washed with water), a drying treatment is performed. However, in the conventional sealing mask cleaning method, it is difficult to sufficiently remove the cleaning liquid adhering to the mask, and it is difficult to clean the sealing mask well. Therefore, with respect to the sealing mask cleaning method, it is required to clean the mask better than before by sufficiently removing the cleaning liquid adhering to the mask.
　本発明は、このような実情に鑑みてなされたものであり、一方の主面から他方の主面にかけて厚さ方向に貫通している複数の貫通孔を有するハニカム構造体封口用マスクを良好に洗浄することが可能な洗浄方法及び洗浄装置を提供することを目的とする。また、本発明は、このような洗浄方法により洗浄されたマスクを用いるハニカムフィルタの製造方法を提供することを目的とする。 The present invention has been made in view of such circumstances, and it is preferable to provide a honeycomb structure sealing mask having a plurality of through holes penetrating in a thickness direction from one main surface to the other main surface. It aims at providing the washing | cleaning method and washing | cleaning apparatus which can be wash | cleaned. Another object of the present invention is to provide a method for manufacturing a honeycomb filter using a mask cleaned by such a cleaning method.
　本発明に係る洗浄方法は、一方の主面から他方の主面にかけて厚さ方向に貫通している複数の貫通孔を有するハニカム構造体封口用マスクの洗浄方法であって、マスクの一方の主面又は他方の主面の少なくとも一方の洗浄面に対して洗浄液を供給する工程と、洗浄面に洗浄液が付着したマスクを厚さ方向に直交する方向に搬送する工程と、搬送されるマスクの洗浄面に対し、貫通孔の軸方向に風を供給する第１乾燥工程と、搬送されるマスクの洗浄面に対し、マスクの厚さ方向に対してマスクの搬送方向の上流側に傾斜する方向に風を供給する第２乾燥工程と、を備える。 A cleaning method according to the present invention is a cleaning method for a honeycomb structure sealing mask having a plurality of through-holes penetrating in a thickness direction from one main surface to the other main surface. A step of supplying a cleaning liquid to at least one cleaning surface of the surface or the other main surface, a step of transporting a mask having the cleaning liquid attached to the cleaning surface in a direction perpendicular to the thickness direction, and cleaning of the transported mask A first drying step for supplying air in the axial direction of the through hole with respect to the surface, and a direction inclined to the upstream side of the mask transport direction with respect to the mask thickness direction with respect to the cleaning surface of the mask to be transported A second drying step for supplying wind.
　本発明に係る洗浄方法では、第１乾燥工程において、厚さ方向に直交する方向に搬送されるマスクの洗浄面に対し、貫通孔の軸方向に風を供給することにより、マスクの洗浄面に付着した洗浄液に加えて貫通孔の内部に付着した洗浄液を除去することができる。また、本発明に係る洗浄方法では、第２乾燥工程において、厚さ方向に直交する方向に搬送されるマスクの洗浄面に対し、マスクの厚さ方向に対してマスクの搬送方向の上流側に傾斜する方向に風を供給することにより、マスクの洗浄面に付着した洗浄液を除去することができる。本発明に係る洗浄方法では、第１乾燥工程及び第２乾燥工程を行うことにより、マスクの洗浄面に付着した洗浄液、及び、貫通孔の内部に付着した洗浄液を充分に除去することが可能であり、マスクを良好に洗浄することができる。 In the cleaning method according to the present invention, in the first drying step, air is supplied in the axial direction of the through hole to the cleaning surface of the mask that is transported in the direction orthogonal to the thickness direction. In addition to the adhering cleaning liquid, the cleaning liquid adhering to the inside of the through hole can be removed. In the cleaning method according to the present invention, in the second drying step, the cleaning surface of the mask transported in the direction orthogonal to the thickness direction is upstream of the mask transport direction with respect to the mask thickness direction. By supplying the wind in the inclined direction, the cleaning liquid adhering to the cleaning surface of the mask can be removed. In the cleaning method according to the present invention, it is possible to sufficiently remove the cleaning liquid attached to the cleaning surface of the mask and the cleaning liquid attached to the inside of the through hole by performing the first drying step and the second drying step. Yes, the mask can be cleaned well.
　本発明に係る洗浄方法では、洗浄面における第１乾燥工程において風が供給された領域に対し、第２乾燥工程において風を供給してもよく、洗浄面における第２乾燥工程において風が供給された領域に対し、第１乾燥工程において風を供給してもよい。 In the cleaning method according to the present invention, the air may be supplied in the second drying step to the region where the air is supplied in the first drying step on the cleaning surface, and the wind is supplied in the second drying step on the cleaning surface. Air may be supplied to the region in the first drying step.
　本発明に係る洗浄方法では、第１乾燥工程において一方の主面側及び他方の主面側のいずれか一方のみから風を供給することが好ましい。この場合、貫通孔の一端側から供給された風が他端側より排除され易くなる。これにより、貫通孔の内部に付着した洗浄液を除去し易くなり、マスクを更に良好に洗浄することができる。 In the cleaning method according to the present invention, it is preferable to supply air from only one of the main surface side and the other main surface side in the first drying step. In this case, the wind supplied from one end side of the through hole is easily removed from the other end side. Thereby, it becomes easy to remove the cleaning liquid adhering to the inside of the through hole, and the mask can be cleaned more satisfactorily.
　本発明に係る洗浄方法では、第２乾燥工程において一方の主面側及び他方の主面側のそれぞれから風を供給することが好ましい。この場合、一方の主面に付着した洗浄液と共に他方の主面に付着した洗浄液を除去することができるため、マスクを更に良好に洗浄することができる。 In the cleaning method according to the present invention, it is preferable to supply air from each of the one main surface side and the other main surface side in the second drying step. In this case, since the cleaning liquid adhering to the other main surface can be removed together with the cleaning liquid adhering to one main surface, the mask can be cleaned more satisfactorily.
　第２乾燥工程において風を供給する方向の傾斜角度は、マスクの厚さ方向に対して１０～４５°であることが好ましい。この場合、マスクを更に良好に洗浄することができる。 In the second drying step, the inclination angle in the direction of supplying wind is preferably 10 to 45 ° with respect to the thickness direction of the mask. In this case, the mask can be cleaned more satisfactorily.
　本発明に係るハニカムフィルタの製造方法は、上記洗浄方法によりマスクを洗浄する工程と、洗浄されたマスクを介してハニカム構造体の一部の貫通孔に封口材を供給する工程と、を備える。本発明に係るハニカムフィルタの製造方法では、上記洗浄方法により洗浄液が充分に除去されたマスクを介してハニカム構造体の貫通孔に封口材を供給することができるため、所望の貫通孔が確実に封口されたハニカムフィルタを容易に得ることができる。 A method for manufacturing a honeycomb filter according to the present invention includes a step of cleaning a mask by the above-described cleaning method, and a step of supplying a sealing material to some through holes of the honeycomb structure through the cleaned mask. In the method for manufacturing a honeycomb filter according to the present invention, the sealing material can be supplied to the through holes of the honeycomb structure through the mask from which the cleaning liquid has been sufficiently removed by the above cleaning method. A sealed honeycomb filter can be easily obtained.
　本発明に係る洗浄装置は、一方の主面から他方の主面にかけて厚さ方向に貫通している複数の貫通孔を有するハニカム構造体封口用マスクの洗浄装置であって、マスクの一方の主面又は他方の主面の少なくとも一方の洗浄面に対して洗浄液を供給する洗浄液供給手段と、洗浄面に洗浄液が付着したマスクを厚さ方向に直交する方向に搬送する搬送手段と、搬送されるマスクの洗浄面に対し、貫通孔の軸方向に風を供給する第１送風手段と、搬送されるマスクの洗浄面に対し、マスクの厚さ方向に対してマスクの搬送方向の上流側に傾斜する方向に風を供給する第２送風手段と、を備える。 A cleaning device according to the present invention is a cleaning device for a honeycomb structure sealing mask having a plurality of through holes penetrating in a thickness direction from one main surface to the other main surface, A cleaning liquid supply means for supplying a cleaning liquid to at least one cleaning surface of the surface or the other main surface; a transport means for transporting a mask having the cleaning liquid adhered to the cleaning surface in a direction perpendicular to the thickness direction; A first blower for supplying air in the axial direction of the through-hole with respect to the cleaning surface of the mask, and an inclination to the upstream side of the mask transport direction with respect to the mask thickness direction with respect to the mask cleaning surface to be transported Second air blowing means for supplying wind in a direction to perform.
　本発明に係る洗浄装置では、厚さ方向に直交する方向に搬送手段により搬送されるマスクの洗浄面に対し、貫通孔の軸方向に第１送風手段によって風を供給することにより、マスクの洗浄面に付着した洗浄液に加えて貫通孔の内部に付着した洗浄液を除去することができる。また、本発明に係る洗浄装置では、厚さ方向に直交する方向に搬送手段により搬送されるマスクの洗浄面に対し、マスクの厚さ方向に対してマスクの搬送方向の上流側に傾斜する方向に第２送風手段によって風を供給することにより、マスクの洗浄面に付着した洗浄液を除去することができる。本発明に係る洗浄装置では、第１送風手段及び第２送風手段によって洗浄液を除去することにより、マスクの洗浄面に付着した洗浄液、及び、貫通孔の内部に付着した洗浄液を充分に除去することが可能であり、マスクを良好に洗浄することができる。 In the cleaning apparatus according to the present invention, the cleaning of the mask is performed by supplying air to the cleaning surface of the mask transported by the transporting means in the direction orthogonal to the thickness direction by the first blower means in the axial direction of the through hole. In addition to the cleaning liquid adhering to the surface, the cleaning liquid adhering to the inside of the through hole can be removed. Further, in the cleaning apparatus according to the present invention, the direction inclined to the upstream side of the mask transport direction with respect to the mask thickness direction with respect to the mask cleaning surface transported by the transport means in the direction orthogonal to the thickness direction By supplying air by the second air blowing means, the cleaning liquid adhering to the cleaning surface of the mask can be removed. In the cleaning apparatus according to the present invention, the cleaning liquid attached to the cleaning surface of the mask and the cleaning liquid attached to the inside of the through hole are sufficiently removed by removing the cleaning liquid by the first air blowing means and the second air blowing means. The mask can be cleaned well.
　本発明に係る洗浄方法及び洗浄装置によれば、一方の主面から他方の主面にかけて厚さ方向に貫通している複数の貫通孔を有するハニカム構造体封口用マスクに付着した洗浄液を充分に除去して水切りすることが可能であり、ハニカム構造体封口用マスクを良好に洗浄することができる。また、本発明に係る洗浄方法及び洗浄装置によれば、ハニカム構造体封口用マスクの洗浄効率を向上させることが可能であり、洗浄時間を短縮することもできる。本発明に係るハニカムフィルタの製造方法によれば、このような洗浄方法により洗浄されたマスクを用いることにより、所望の貫通孔が確実に封口されたハニカムフィルタを容易に得ることができる。 According to the cleaning method and the cleaning apparatus of the present invention, the cleaning liquid adhered to the honeycomb structure sealing mask having a plurality of through holes penetrating in the thickness direction from one main surface to the other main surface is sufficiently obtained. It can be removed and drained, and the honeycomb structure sealing mask can be washed well. Moreover, according to the cleaning method and the cleaning apparatus of the present invention, it is possible to improve the cleaning efficiency of the honeycomb structure sealing mask, and to shorten the cleaning time. According to the method for manufacturing a honeycomb filter according to the present invention, a honeycomb filter in which desired through holes are reliably sealed can be easily obtained by using a mask cleaned by such a cleaning method.
本発明の一実施形態に係るハニカムフィルタの製造方法で製造されるハニカムフィルタを示す図面である。1 is a drawing showing a honeycomb filter manufactured by a method for manufacturing a honeycomb filter according to an embodiment of the present invention. 本発明の一実施形態に係るハニカムフィルタの製造方法のフローチャートを示す図面である。It is drawing which shows the flowchart of the manufacturing method of the honey-comb filter which concerns on one Embodiment of this invention. 本発明の一実施形態に係る洗浄方法により洗浄されるマスクを示す図面である。1 is a view showing a mask cleaned by a cleaning method according to an embodiment of the present invention. 本発明の一実施形態に係る洗浄装置を示す図面である。It is drawing which shows the washing | cleaning apparatus which concerns on one Embodiment of this invention. 本発明の一実施形態に係る洗浄方法の一工程を示す図面である。It is drawing which shows 1 process of the washing | cleaning method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る洗浄方法の一工程を示す図面である。It is drawing which shows 1 process of the washing | cleaning method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る洗浄方法の一工程を示す図面である。It is drawing which shows 1 process of the washing | cleaning method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る洗浄方法の一工程を示す図面である。It is drawing which shows 1 process of the washing | cleaning method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る洗浄方法の一工程を示す図面である。It is drawing which shows 1 process of the washing | cleaning method which concerns on one Embodiment of this invention.
　以下、図面を参照しながら、本発明の好適な実施形態について詳細に説明する。なお、寸法の比率は図面に示すものに限定されない。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. The ratio of dimensions is not limited to that shown in the drawings.
［ハニカムフィルタ］
　図１は、本実施形態に係るハニカムフィルタの製造方法で製造されるハニカムフィルタを示す図面である。ハニカムフィルタ１００は、例えばＤＰＦとして用いることができる。 [Honeycomb filter]
FIG. 1 is a drawing showing a honeycomb filter manufactured by the method for manufacturing a honeycomb filter according to the present embodiment. The honeycomb filter 100 can be used as a DPF, for example.
　ハニカムフィルタ１００は、図１に示すように、互いに平行に配置された複数の流路１１０ａ，１１０ｂを有する円柱体である。流路１１０ａ，１１０ｂは、ハニカムフィルタ１００の中心軸に平行に延びる隔壁１１２により仕切られている。流路１１０ａの一端は、ハニカムフィルタ１００の一端面１００ａにおいて封口部１１４により封口されており、流路１１０ａの他端は、ハニカムフィルタ１００の他端面１００ｂにおいてガス流出口として開口している。一方、流路１１０ｂの一端は、一端面１００ａにおいてガス流入口として開口しており、流路１１０ｂの他端は、他端面１００ｂにおいて封口部１１４により封口されている。 The honey-comb filter 100 is a cylindrical body which has the some flow path 110a, 110b arrange | positioned mutually parallel, as shown in FIG. The flow paths 110 a and 110 b are partitioned by a partition wall 112 that extends parallel to the central axis of the honeycomb filter 100. One end of the channel 110 a is sealed by a sealing portion 114 on one end surface 100 a of the honeycomb filter 100, and the other end of the channel 110 a is opened as a gas outlet on the other end surface 100 b of the honeycomb filter 100. On the other hand, one end of the flow path 110b is opened as a gas inlet on one end face 100a, and the other end of the flow path 110b is sealed by a sealing portion 114 on the other end face 100b.
　ハニカムフィルタ１００では、流路１１０ａと流路１１０ｂとが交互に配置されて格子構造が形成されている。流路１１０ａ，１１０ｂは、ハニカムフィルタ１００の両端面１００ａ，１００ｂに垂直であり、一方の端面側から見て正方形配置、すなわち、流路１１０ａ，１１０ｂの中心軸が、正方形の頂点にそれぞれ位置するように配置されている。流路１１０ａ，１１０ｂの断面形状は、例えば略正方形である。 In the honeycomb filter 100, the flow paths 110a and the flow paths 110b are alternately arranged to form a lattice structure. The flow paths 110a and 110b are perpendicular to both end faces 100a and 100b of the honeycomb filter 100, and are arranged in a square shape when viewed from one end face side, that is, the central axes of the flow paths 110a and 110b are respectively located at the apexes of the square. Are arranged as follows. The cross-sectional shape of the flow paths 110a and 110b is, for example, a substantially square shape.
　ハニカムフィルタ１００が円柱体である場合、流路１１０ａ，１１０ｂの長手方向におけるハニカムフィルタ１００の長さは、例えば４０～３５０ｍｍであり、ハニカムフィルタ１００の外径は、例えば１００～３２０ｍｍである。また、流路１１０ａ，１１０ｂの長手方向に垂直な断面の内径（断面形状が略正方形の場合は一辺の長さ）は、例えば０．８～２．５ｍｍである。隔壁１１２の厚みは、例えば０．０５～０．５ｍｍである。 When the honeycomb filter 100 is a cylindrical body, the length of the honeycomb filter 100 in the longitudinal direction of the flow paths 110a and 110b is, for example, 40 to 350 mm, and the outer diameter of the honeycomb filter 100 is, for example, 100 to 320 mm. The inner diameter of the cross section perpendicular to the longitudinal direction of the flow paths 110a, 110b (the length of one side when the cross-sectional shape is substantially square) is, for example, 0.8 to 2.5 mm. The thickness of the partition 112 is, for example, 0.05 to 0.5 mm.
　隔壁１１２は、多孔性セラミクス（焼成体）から形成されている。セラミクスとしては、例えばアルミナ、シリカ、ムライト、コーディエライト、ガラス、チタン酸アルミニウム等の酸化物；シリコンカーバイド、窒化珪素、金属等が挙げられる。なお、チタン酸アルミニウムは、マグネシウム及び／又はケイ素を含むことができる。封口部１１４の材質は、隔壁１１２と同様の材質とすることができる。 The partition 112 is made of porous ceramics (fired body). Examples of ceramics include oxides such as alumina, silica, mullite, cordierite, glass and aluminum titanate; silicon carbide, silicon nitride, metal and the like. The aluminum titanate can contain magnesium and / or silicon. The material of the sealing part 114 can be the same material as the partition 112.
　なお、上記実施形態では、流路１１０ａ，１１０ｂの断面形状が略正方形であるが、これに限定されず、矩形、円形、楕円形、３角形、６角形、８角形等であってもよい。また、流路１１０ａ，１１０ｂには、径の異なるもの及び／又は断面形状の異なるものが混在していてもよい。また、流路の配置は、図１では正方形配置であるが、これに限定されず、断面において流路の中心軸が正三角形の頂点に配置される正三角形配置、千鳥配置等であってもよい。さらに、ハニカムフィルタ１００は、円柱体に限られず、３角柱、４角柱、６角柱、８角柱等であってもよい。 In the above embodiment, the cross-sectional shapes of the flow paths 110a and 110b are substantially square. However, the shape is not limited to this, and may be a rectangle, a circle, an ellipse, a triangle, a hexagon, an octagon, or the like. In addition, the channels 110a and 110b may have a mixture of different diameters and / or different cross-sectional shapes. In addition, the flow path arrangement is a square arrangement in FIG. 1, but is not limited to this, and may be an equilateral triangle arrangement or a staggered arrangement in which the central axis of the flow path is arranged at the apex of the equilateral triangle in the cross section. Good. Furthermore, the honeycomb filter 100 is not limited to a cylindrical body, and may be a triangular prism, a quadrangular prism, a hexagonal prism, an octagonal prism, or the like.
　ハニカムフィルタ１００は、図１（ｂ）に示すように、一端面１００ａから流路１１０ｂに供給されたガスＧが隔壁１１２を通過して隣の流路１１０ａに到達し、他端面１００ｂから排出される。このとき、ガスＧ中の粒子（例えば、ディーゼルエンジン等の内燃機関から排出される排気ガスに含まれる微細粒子（ＰＭ））が隔壁１１２によって除去されることにより、ハニカムフィルタ１００はフィルタとして機能する。 In the honeycomb filter 100, as shown in FIG. 1B, the gas G supplied from the one end face 100a to the flow path 110b passes through the partition wall 112, reaches the adjacent flow path 110a, and is discharged from the other end face 100b. The At this time, particles in the gas G (for example, fine particles (PM) contained in exhaust gas discharged from an internal combustion engine such as a diesel engine) are removed by the partition walls 112, so that the honeycomb filter 100 functions as a filter. .
［ハニカムフィルタの製造方法］
　図２は、本実施形態に係るハニカムフィルタの製造方法のフローチャートを示す図面である。本実施形態に係るハニカムフィルタ１００の製造方法は、ハニカム構造体封口用マスクを洗浄する洗浄工程Ｓ１００と、ハニカム構造体を準備する準備工程Ｓ２００と、洗浄されたマスクを用いてハニカム構造体の貫通孔を封口する封口工程Ｓ３００とを備えている。 [Honeycomb filter manufacturing method]
FIG. 2 is a flowchart showing a method for manufacturing a honeycomb filter according to the present embodiment. The manufacturing method of the honeycomb filter 100 according to the present embodiment includes a cleaning step S100 for cleaning the honeycomb structure sealing mask, a preparation step S200 for preparing the honeycomb structure, and the penetration of the honeycomb structure using the cleaned mask. And a sealing step S300 for sealing the holes.
＜洗浄工程Ｓ１００＞
　図３は、洗浄工程Ｓ１００において本実施形態に係る洗浄方法により洗浄されるマスクを示す図面である。マスク１は、互いに対向する上面（一方の主面）１ａ及び下面（他方の主面）１ｂを洗浄面３として有しており、例えば円板状を呈している。マスク１の直径は、例えば１５０～５００ｍｍである。マスク１の厚さは、例えば０．１～３．０ｍｍである。なお、マスク１の材質は特に限定されず、例えば、金属や樹脂が挙げられる。 <Washing step S100>
FIG. 3 is a view showing a mask cleaned by the cleaning method according to the present embodiment in the cleaning step S100. The mask 1 has an upper surface (one main surface) 1a and a lower surface (the other main surface) 1b facing each other as the cleaning surface 3, and has a disk shape, for example. The diameter of the mask 1 is, for example, 150 to 500 mm. The thickness of the mask 1 is, for example, 0.1 to 3.0 mm. In addition, the material of the mask 1 is not specifically limited, For example, a metal and resin are mentioned.
　マスク１は、上面１ａから下面１ｂにかけて厚さ方向に貫通している複数の貫通孔５を有している。貫通孔５は、ハニカム構造体において封口される貫通孔の配列と同様に配列されており、例えば千鳥状に配列されている。貫通孔５の軸方向に垂直な貫通孔５の断面形状は、ハニカム構造体において封口される貫通孔と同様の断面形状を有しており、例えば略正方形状である。貫通孔５の内径（断面形状が略正方形の場合は一辺の長さ）は、例えば０．８～２．５ｍｍである。 The mask 1 has a plurality of through holes 5 penetrating in the thickness direction from the upper surface 1a to the lower surface 1b. The through holes 5 are arranged in the same manner as the arrangement of the through holes sealed in the honeycomb structure, and are arranged in a zigzag manner, for example. The cross-sectional shape of the through-hole 5 perpendicular to the axial direction of the through-hole 5 has the same cross-sectional shape as the through-hole sealed in the honeycomb structure, and is, for example, a substantially square shape. The inner diameter of the through hole 5 (the length of one side when the cross-sectional shape is substantially square) is, for example, 0.8 to 2.5 mm.
　洗浄工程Ｓ１００では、封口材等の異物が付着したマスク１に対して洗浄液及び乾燥風を供給することによってマスク１から異物を除去してマスク１を洗浄する。異物は、例えば上面１ａや下面１ｂ、貫通孔５の内壁に付着している。洗浄液は、例えば水である。 In the cleaning step S100, the mask 1 is cleaned by removing the foreign matter from the mask 1 by supplying cleaning liquid and dry air to the mask 1 to which foreign matter such as a sealing material adheres. The foreign matter adheres to, for example, the upper surface 1 a, the lower surface 1 b, and the inner wall of the through hole 5. The cleaning liquid is water, for example.
　洗浄工程Ｓ１００は、図２に示すように、水洗工程Ｓ１１０と乾燥工程Ｓ１２０とを備える。水洗工程Ｓ１１０は、マスク１を水洗（前処理）する第１水洗工程Ｓ１１０ａと、マスク１を水洗（本洗浄）する第２水洗工程Ｓ１１０ｂと、マスク１を水洗（後処理、リンス）する第３水洗工程Ｓ１１０ｃとをこの順に有する。 The washing step S100 includes a water washing step S110 and a drying step S120 as shown in FIG. The water washing step S110 includes a first water washing step S110a for washing the mask 1 with water (pretreatment), a second water washing step S110b for washing the mask 1 with water (main washing), and a third washing step (rinsing) for the mask 1 with water. The washing step S110c is included in this order.
　図４は、本実施形態に係る洗浄装置を示す図面であり、洗浄工程Ｓ１００で用いられる洗浄装置５０を示す図面である。なお、図４においては、マスク１における貫通孔５の図示を便宜上省略する。 FIG. 4 is a drawing showing the cleaning device according to the present embodiment, and is a drawing showing the cleaning device 50 used in the cleaning step S100. In FIG. 4, illustration of the through hole 5 in the mask 1 is omitted for convenience.
　洗浄装置５０は、ホイールコンベア（搬送手段）７と、第１水洗工程Ｓ１１０ａが実施される前処理部１０と、第２水洗工程Ｓ１１０ｂが実施される洗浄部２０と、第３水洗工程Ｓ１１０ｃが実施される後処理部３０と、乾燥工程Ｓ１２０が実施される乾燥部４０とを有している。洗浄装置５０においてマスク１の供給方式は、例えば枚葉式であり、単一のマスク１が順次搬送される。マスク１は、上面１ａが鉛直方向上方を向くと共に下面１ｂが鉛直方向下方を向いた状態で、ホイールコンベア７によって前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０の順にマスク１の厚さ方向（鉛直方向）Ｄ１に直交する搬送方向（水平方向）Ｄ２に搬送される（搬送工程）。なお、マスク１の供給方式は、複数のマスク１を一括して搬送し同時に水洗又は乾燥するバッチ式であってもよい。洗浄装置５０では、搬送動作が連続的に行われてマスク１が連続的に搬送されてもよく、搬送動作が断続的に行われてマスク１が断続的に搬送されてもよい。 The cleaning device 50 includes a wheel conveyor (conveying means) 7, a pretreatment unit 10 in which the first water washing step S110a is performed, a cleaning unit 20 in which the second water washing step S110b is performed, and a third water washing step S110c. The post-processing part 30 to be performed and the drying part 40 in which the drying step S120 is performed are included. In the cleaning apparatus 50, the supply method of the mask 1 is, for example, a single wafer type, and the single mask 1 is sequentially conveyed. The mask 1 has the mask 1 in the order of the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40 by the wheel conveyor 7 with the upper surface 1a facing upward in the vertical direction and the lower surface 1b facing downward in the vertical direction. Is transported in a transport direction (horizontal direction) D2 orthogonal to the thickness direction (vertical direction) D1 (transport process). The supply method of the mask 1 may be a batch method in which a plurality of masks 1 are transported together and washed or dried at the same time. In the cleaning device 50, the mask 1 may be transported continuously by performing the transport operation, or the mask 1 may be transported intermittently by performing the transport operation intermittently.
　前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０において、ホイールコンベア７は、厚さ方向Ｄ１に互いに対向するように、搬送されるマスク１の上面１ａ側及び下面１ｂ側のそれぞれに配置されている。前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０では、図５（ａ）に示すようにマスク１がホイールコンベア７により厚さ方向Ｄ１に挟持された状態で、ホイールコンベア７によりマスク１を搬送方向Ｄ２に搬送すると共にマスク１の洗浄面３に対して洗浄液又は乾燥風を供給する。 In the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40, the wheel conveyor 7 is on each of the upper surface 1a side and the lower surface 1b side of the mask 1 being conveyed so as to face each other in the thickness direction D1. Is arranged. In the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40, the mask 1 is sandwiched by the wheel conveyor 7 in the thickness direction D1 as shown in FIG. The mask 1 is transported in the transport direction D2 and cleaning liquid or drying air is supplied to the cleaning surface 3 of the mask 1.
　前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０におけるホイールコンベア７は、搬送方向Ｄ２に複数配列された一対のホイール７ａ，７ｂを有している。ホイール７ａ，７ｂは、例えば、回転駆動するコロ式のホイールであり、一対のホイールコンベア７において厚さ方向Ｄ１に互いに対向している。一対のホイール７ａ，７ｂは、図５（ｂ）に示すように、搬送方向Ｄ２に沿って千鳥状に配列されている。例えば、厚さ方向Ｄ１及び搬送方向Ｄ２に直交する方向（水平方向）Ｄ３に一対のホイール７ａ，７ｂが３対配列された領域と、方向Ｄ３に一対のホイール７ａ，７ｂが４対配列された領域とが搬送方向Ｄ２に沿って交互に配置されている。 The wheel conveyor 7 in the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30 and the drying unit 40 has a pair of wheels 7a and 7b arranged in the transport direction D2. The wheels 7 a and 7 b are, for example, roller-type wheels that are driven to rotate, and face each other in the thickness direction D <b> 1 in the pair of wheel conveyors 7. As shown in FIG. 5B, the pair of wheels 7a and 7b are arranged in a staggered pattern along the transport direction D2. For example, three pairs of wheels 7a and 7b are arranged in a direction (horizontal direction) D3 orthogonal to the thickness direction D1 and the conveyance direction D2, and four pairs of wheels 7a and 7b are arranged in the direction D3. The areas are alternately arranged along the transport direction D2.
　前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０では、隣接する貫通孔５の配列方向と搬送方向Ｄ２とが一致するようにマスク１を搬送することが好ましい。また、貫通孔５の軸方向に垂直な貫通孔５の断面形状が矩形である場合、貫通孔５の長辺方向又は短辺方向の少なくとも一方の搬送方向Ｄ２に対する角度は、４５°であることが好ましい。これらの場合、貫通孔５の内部を更に良好に水洗及び乾燥することができる。 In the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40, it is preferable to transport the mask 1 so that the arrangement direction of the adjacent through holes 5 and the transport direction D2 coincide. When the cross-sectional shape of the through hole 5 perpendicular to the axial direction of the through hole 5 is rectangular, the angle of the through hole 5 with respect to at least one of the long side direction and the short side direction with respect to the transport direction D2 is 45 °. Is preferred. In these cases, the inside of the through hole 5 can be washed and dried more satisfactorily.
　前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０以外の領域（前処理部１０へ搬送される前の領域、乾燥部４０から搬送された後の領域）において、ホイールコンベア７は、搬送されるマスク１の下方にのみ配置されている（図４参照）。マスク１は、ホイールコンベア７上に載置されて、ホイールの回転に伴い搬送方向Ｄ２に搬送される。 In a region other than the pretreatment unit 10, the cleaning unit 20, the posttreatment unit 30 and the drying unit 40 (a region before being transported to the pretreatment unit 10 and a region after being transported from the drying unit 40), the wheel conveyor 7 is It is arranged only below the mask 1 to be conveyed (see FIG. 4). The mask 1 is placed on the wheel conveyor 7 and conveyed in the conveyance direction D2 as the wheel rotates.
　本実施形態では、前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０において、マスク１がホイールコンベア７により厚さ方向Ｄ１に挟持された状態で、搬送方向Ｄ２に搬送されるマスク１の洗浄面３に対して洗浄液又は乾燥風が供給されている。これにより、マスク１が洗浄液や乾燥風に押圧されてマスク１の配置位置が変動してしまうことを抑制することができる。また、本実施形態では、マスク１がホイールコンベア７により厚さ方向Ｄ１に挟持された状態でマスク１を搬送しているものの、ホイールコンベア７を構成する一対のホイール７ａ，７ｂが搬送方向Ｄ２に沿って千鳥状に配列されているため、方向Ｄ３に延びる長尺状のホイールを有するホイールコンベア等を用いる場合に比して、マスク１とホイールコンベア７との接触領域の面積を低減することができる。これにより、ホイールコンベア７に異物が付着していたとしても、マスク１を搬送している間に当該異物が、洗浄面３における洗浄された領域に対して供給されてしまうことを抑制することができる。以上のような本実施形態によれば、マスク１に付着した異物を除去し易くなり、マスク１を更に良好に洗浄することができる。 In this embodiment, in the pre-processing unit 10, the cleaning unit 20, the post-processing unit 30, and the drying unit 40, the mask 1 is transported in the transport direction D2 while being held in the thickness direction D1 by the wheel conveyor 7. The cleaning liquid or the drying air is supplied to the cleaning surface 3 of 1. Thereby, it can suppress that the arrangement | positioning position of the mask 1 fluctuates because the mask 1 is pressed by the cleaning liquid or the drying air. Moreover, in this embodiment, although the mask 1 is conveyed in the state clamped in the thickness direction D1 by the wheel conveyor 7, a pair of wheel 7a, 7b which comprises the wheel conveyor 7 is the conveyance direction D2. Since they are arranged in a zigzag pattern, the area of the contact area between the mask 1 and the wheel conveyor 7 can be reduced as compared to the case of using a wheel conveyor having a long wheel extending in the direction D3. it can. Thereby, even if the foreign substance has adhered to the wheel conveyor 7, it can suppress that the said foreign substance will be supplied with respect to the wash | cleaned area | region in the cleaning surface 3 while conveying the mask 1. FIG. it can. According to the present embodiment as described above, it is easy to remove the foreign matter adhering to the mask 1, and the mask 1 can be more satisfactorily cleaned.
　なお、ホイールコンベア７は、上記に限られるものではなく、前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０において、搬送されるマスク１の下方にのみ配置されていてもよい。また、ホイールコンベア７は、前処理部１０、洗浄部２０、後処理部３０及び乾燥部４０以外の領域において、厚さ方向Ｄ１に対向する一対のコロ式のホイールが搬送方向Ｄ２に複数並列してなる形態であってもよい。さらに、ホイールコンベア７は、搬送方向Ｄ２に沿って千鳥状に配置されることに限定されるものではなく、方向Ｄ３に延びる長尺状のホイールが搬送方向Ｄ２に複数並列してなる形態であってもよい。 The wheel conveyor 7 is not limited to the above, and may be disposed only below the mask 1 to be conveyed in the pretreatment unit 10, the cleaning unit 20, the posttreatment unit 30, and the drying unit 40. Further, the wheel conveyor 7 includes a plurality of pairs of roller-type wheels opposed to the thickness direction D1 in the conveyance direction D2 in a region other than the preprocessing unit 10, the cleaning unit 20, the postprocessing unit 30, and the drying unit 40. The form which consists of may be sufficient. Furthermore, the wheel conveyor 7 is not limited to being arranged in a staggered manner along the transport direction D2, but is a form in which a plurality of long wheels extending in the direction D3 are arranged in parallel in the transport direction D2. May be.
（第１水洗工程Ｓ１１０ａ）
　第１水洗工程Ｓ１１０ａでは、異物が付着したマスク１を前処理部１０に搬送し、搬送されるマスク１に前処理を施す。前処理部１０は、図６に示すように、複数の一対のホイール７ａ，７ｂから構成されるホイールコンベア７と、一対のローラブラシ１２ａ，１２ｂと、洗浄液１４を供給する一対のスプレーノズル（洗浄液供給手段）１６ａ，１６ｂとを有している。 (First water washing step S110a)
In 1st water washing process S110a, the mask 1 to which the foreign material adhered is conveyed to the pre-processing part 10, and pre-processing is performed to the mask 1 conveyed. As shown in FIG. 6, the pretreatment unit 10 includes a wheel conveyor 7 including a plurality of pairs of wheels 7 a and 7 b, a pair of roller brushes 12 a and 12 b, and a pair of spray nozzles (cleaning liquid Supply means) 16a, 16b.
　ローラブラシ１２ａ，１２ｂは、厚さ方向Ｄ１に互いに対向するように一対配置されており、ローラブラシ１２ａは、マスク１の上面１ａ側に配置されており、ローラブラシ１２ｂは、マスク１の下面１ｂ側に配置されている。ローラブラシ１２ａ，１２ｂは、洗浄面３と平行かつ搬送方向Ｄ２と交差する方向に延びる軸回りに回転可能であればよく、本実施形態では、洗浄面３と平行かつ搬送方向Ｄ２と直交する方向（本実施形態では方向Ｄ３と同一方向）に延びる軸回りに回転する。ローラブラシ１２ａの回転中心である軸Ａ１と、ローラブラシ１２ｂの回転中心である軸Ａ２とは、互いに平行に方向Ｄ３に延びている。ローラブラシ１２ａ，１２ｂは、マスク１を洗浄可能なブラシ１２ｃを有していればよく、例えば、方向Ｄ３に延びる長尺のホイールの表面にブラシ１２ｃが接続された部材である。ローラブラシ１２ａ，１２ｂは、マスク１に接したブラシ１２ｃが搬送方向Ｄ２と反対方向に移動するように回転方向Ｄ４に回転することが好ましい。この場合、マスク１を更に良好に洗浄することができる。 A pair of roller brushes 12a and 12b are disposed so as to face each other in the thickness direction D1, the roller brush 12a is disposed on the upper surface 1a side of the mask 1, and the roller brush 12b is disposed on the lower surface 1b of the mask 1. Arranged on the side. The roller brushes 12a and 12b only need to be rotatable about an axis extending in a direction parallel to the cleaning surface 3 and intersecting the transport direction D2. In this embodiment, the roller brushes 12a and 12b are parallel to the cleaning surface 3 and perpendicular to the transport direction D2. It rotates about an axis extending in the same direction as the direction D3 in this embodiment. An axis A1 that is the rotation center of the roller brush 12a and an axis A2 that is the rotation center of the roller brush 12b extend in the direction D3 in parallel with each other. The roller brushes 12a and 12b only need to have a brush 12c capable of cleaning the mask 1, and are, for example, members having the brush 12c connected to the surface of a long wheel extending in the direction D3. The roller brushes 12a and 12b preferably rotate in the rotation direction D4 so that the brush 12c in contact with the mask 1 moves in the direction opposite to the conveyance direction D2. In this case, the mask 1 can be cleaned more satisfactorily.
　スプレーノズル１６ａ，１６ｂは、ローラブラシ１２ａ，１２ｂを介在させた状態で厚さ方向Ｄ１に互いに対向しており、搬送過程において上面１ａ及び下面１ｂの中心がスプレーノズル１６ａ，１６ｂの間を通過するように配置されている。スプレーノズル１６ａは、マスク１の上面１ａ側に配置されており、貫通孔５の軸方向（鉛直方向、本実施形態では方向Ｄ１と同一方向）に洗浄液１４を噴霧して上面１ａに洗浄液１４を供給する。スプレーノズル１６ｂは、マスク１の下面１ｂ側に配置されており、貫通孔５の軸方向に洗浄液１４を噴霧して下面１ｂに洗浄液１４を供給する。 The spray nozzles 16a and 16b are opposed to each other in the thickness direction D1 with the roller brushes 12a and 12b interposed, and the centers of the upper surface 1a and the lower surface 1b pass between the spray nozzles 16a and 16b in the conveying process. Are arranged as follows. The spray nozzle 16a is arranged on the upper surface 1a side of the mask 1, and sprays the cleaning liquid 14 in the axial direction of the through-hole 5 (vertical direction, the same direction as the direction D1 in the present embodiment) to spray the cleaning liquid 14 on the upper surface 1a. Supply. The spray nozzle 16b is disposed on the lower surface 1b side of the mask 1, and sprays the cleaning liquid 14 in the axial direction of the through hole 5 to supply the cleaning liquid 14 to the lower surface 1b.
　スプレーノズル１６ａ，１６ｂは、洗浄面３に洗浄液１４を供給可能であればよく、例えば一流体ノズルや二流体ノズルであり、洗浄液１４の供給源１８に接続されている。スプレーノズル１６ａ，１６ｂが二流体ノズルである場合には、スプレーノズル１６ａ，１６ｂは、圧縮空気の供給源（図示せず）に更に接続されており、洗浄液１４の微細粒子から構成されるミストを噴霧することができる。スプレーノズル１６ａの先端（噴霧口）から上面１ａまでの距離、及び、スプレーノズル１６ｂの先端（噴霧口）から下面１ｂまでの距離は、例えば５０～２００ｍｍである。洗浄液１４の温度は、例えば１０～４０℃である。 The spray nozzles 16 a and 16 b are only required to be able to supply the cleaning liquid 14 to the cleaning surface 3. For example, the spray nozzles 16 a and 16 b are one-fluid nozzles or two-fluid nozzles and are connected to a supply source 18 of the cleaning liquid 14. In the case where the spray nozzles 16a and 16b are two-fluid nozzles, the spray nozzles 16a and 16b are further connected to a compressed air supply source (not shown), and the mist composed of fine particles of the cleaning liquid 14 is removed. Can be sprayed. The distance from the tip (spray port) of the spray nozzle 16a to the upper surface 1a and the distance from the tip (spray port) of the spray nozzle 16b to the lower surface 1b are, for example, 50 to 200 mm. The temperature of the cleaning liquid 14 is 10 to 40 ° C., for example.
　本実施形態では、スプレーノズル１６ａ，１６ｂからローラブラシ１２ａ，１２ｂに対して洗浄液１４が噴霧された後、ローラブラシ１２ａ，１２ｂに付着した洗浄液１４は、ローラブラシ１２ａ，１２ｂが回転することやローラブラシ１２ａ，１２ｂの表面を流れることにより、洗浄面３とローラブラシ１２ａ，１２ｂとの間に供給されて洗浄面３の洗浄に用いられる。また、本実施形態では、スプレーノズル１６ａ，１６ｂから洗浄面３に供給された洗浄液１４が貫通孔５の内部に供給されることにより、貫通孔５の内壁を洗浄することもできる。 In the present embodiment, after the cleaning liquid 14 is sprayed on the roller brushes 12a and 12b from the spray nozzles 16a and 16b, the cleaning liquid 14 attached to the roller brushes 12a and 12b is caused by the rotation of the roller brushes 12a and 12b or the rollers. By flowing on the surfaces of the brushes 12a and 12b, the brush 12a is supplied between the cleaning surface 3 and the roller brushes 12a and 12b and used for cleaning the cleaning surface 3. In the present embodiment, the inner wall of the through hole 5 can be cleaned by supplying the cleaning liquid 14 supplied from the spray nozzles 16 a and 16 b to the cleaning surface 3 into the through hole 5.
　本実施形態では、第１水洗工程Ｓ１１０ａにおいて、ホイールコンベア７によって連続的又は断続的に搬送方向Ｄ２に搬送されるマスク１の洗浄面３に洗浄液１４が供給された状態で、洗浄面３と平行かつ搬送方向Ｄ２と直交する方向Ｄ３に延びる軸回りに回転するローラブラシ１２ａ，１２ｂのブラシ１２ｃを搬送方向Ｄ２の下流側から上流側に向かって順に洗浄面３に接触させて洗浄面３を洗浄する。これにより、本実施形態では、洗浄面３に付着した異物を除去し易くなり、マスク１を更に良好に洗浄することができる。 In the present embodiment, in the first water washing step S110a, the cleaning liquid 14 is supplied to the cleaning surface 3 of the mask 1 that is continuously or intermittently transported in the transport direction D2 by the wheel conveyor 7, and is parallel to the cleaning surface 3. Further, the cleaning surface 3 is cleaned by bringing the brushes 12c of the roller brushes 12a and 12b rotating around the axis extending in the direction D3 orthogonal to the transport direction D2 into contact with the cleaning surface 3 in order from the downstream side to the upstream side in the transport direction D2. To do. Thereby, in this embodiment, it becomes easy to remove the foreign material adhering to the cleaning surface 3, and the mask 1 can be cleaned more satisfactorily.
　また、本実施形態では、第１水洗工程Ｓ１１０ａにおいて、上面１ａ及び下面１ｂのそれぞれに洗浄液１４が供給された状態で、ブラシ１２ｃを上面１ａ及び下面１ｂのそれぞれに接触させて洗浄面３を洗浄している。この場合、マスク１を更に良好に洗浄することができる。 In the present embodiment, in the first water washing step S110a, the cleaning surface 3 is cleaned by bringing the brush 12c into contact with each of the upper surface 1a and the lower surface 1b in a state where the cleaning liquid 14 is supplied to each of the upper surface 1a and the lower surface 1b. is doing. In this case, the mask 1 can be cleaned more satisfactorily.
　なお、第１水洗工程Ｓ１１０ａは、上記に限られるものではなく、前処理部１０は、搬送方向Ｄ２に複数配置されたローラブラシやスプレーノズルを有していてもよい。また、前処理部１０は、単一のローラブラシやスプレーノズルを有していてもよく、例えば、スプレーノズルが上面１ａ側及び下面１ｂ側のいずれか一方のみに配置されていると共に、単一のローラブラシが単一のスプレーノズルとマスク１との間に配置されていてもよい。スプレーノズル１６ａ，１６ｂは、ローラブラシ１２ａ，１２ｂを介在させることなく厚さ方向Ｄ１に互いに対向していてもよく、搬送方向Ｄ２に互いに離間して配置されていてもよい。スプレーノズル１６ａ，１６ｂから洗浄液１４を供給する方向は、厚さ方向Ｄ１に対して傾斜していてもよい。 Note that the first water washing step S110a is not limited to the above, and the pretreatment unit 10 may have a plurality of roller brushes and spray nozzles arranged in the transport direction D2. Further, the pretreatment unit 10 may have a single roller brush or spray nozzle. For example, the spray nozzle is disposed only on either the upper surface 1a side or the lower surface 1b side, These roller brushes may be arranged between a single spray nozzle and the mask 1. The spray nozzles 16a and 16b may be opposed to each other in the thickness direction D1 without interposing the roller brushes 12a and 12b, and may be arranged apart from each other in the transport direction D2. The direction in which the cleaning liquid 14 is supplied from the spray nozzles 16a and 16b may be inclined with respect to the thickness direction D1.
（第２水洗工程Ｓ１１０ｂ）
　第２水洗工程Ｓ１１０ｂでは、第１水洗工程Ｓ１１０ａで前処理が施されたマスク１を洗浄部２０に搬送し、マスク１を本洗浄する。洗浄部２０は、図７に示すように、複数の一対のホイール７ａ，７ｂから構成されるホイールコンベア７と、洗浄液２４を供給する一対のスプレーノズル（洗浄液供給手段）２６ａ，２６ｂとを有している。 (Second water washing step S110b)
In the second water washing step S110b, the mask 1 that has been pretreated in the first water washing step S110a is transported to the cleaning unit 20, and the mask 1 is finally cleaned. As shown in FIG. 7, the cleaning unit 20 includes a wheel conveyor 7 including a plurality of pairs of wheels 7a and 7b, and a pair of spray nozzles (cleaning liquid supply means) 26a and 26b that supply the cleaning liquid 24. ing.
　スプレーノズル２６ａは、マスク１の上面１ａ側に配置されており、搬送過程においてスプレーノズル２６ａの下方を上面１ａの中心が通過するように配置されている。スプレーノズル２６ａは、貫通孔５の軸方向（鉛直方向）に洗浄液２４を噴霧して上面１ａ及び貫通孔５の内部に洗浄液２４を供給する。スプレーノズル２６ｂは、マスク１の下面１ｂ側に配置されており、搬送過程においてスプレーノズル２６ｂの上方を下面１ｂの中心が通過するように配置されている。スプレーノズル２６ｂは、貫通孔５の軸方向に洗浄液２４を噴霧して下面１ｂ及び貫通孔５の内部に洗浄液２４を供給する。 The spray nozzle 26a is disposed on the upper surface 1a side of the mask 1, and is disposed such that the center of the upper surface 1a passes under the spray nozzle 26a in the transport process. The spray nozzle 26 a sprays the cleaning liquid 24 in the axial direction (vertical direction) of the through hole 5 and supplies the cleaning liquid 24 to the upper surface 1 a and the through hole 5. The spray nozzle 26b is disposed on the lower surface 1b side of the mask 1, and is disposed such that the center of the lower surface 1b passes above the spray nozzle 26b in the conveyance process. The spray nozzle 26 b sprays the cleaning liquid 24 in the axial direction of the through hole 5 and supplies the cleaning liquid 24 to the inside of the lower surface 1 b and the through hole 5.
　スプレーノズル２６ａ，２６ｂは、搬送方向Ｄ２に沿った同一直線上において搬送方向Ｄ２に互いに離間して配置されており、スプレーノズル２６ａは、スプレーノズル２６ｂよりも搬送方向Ｄ２の下流側に配置されている。すなわち、上面１ａに対して噴霧される洗浄液２４の噴霧軸Ａ３と、下面１ｂに対して噴霧される洗浄液２４の噴霧軸Ａ４とは、搬送方向Ｄ２において互いに離間しており、噴霧軸Ａ３は、噴霧軸Ａ４よりも搬送方向Ｄ２の下流側に位置している。これにより、上面１ａにおける洗浄液２４の供給位置（洗浄液２４が吹き付けられる領域）Ｐ１は、下面１ｂにおける洗浄液２４の供給位置Ｐ２よりも搬送方向Ｄ２の下流側に位置することとなる。 The spray nozzles 26a and 26b are disposed on the same straight line along the transport direction D2 and are separated from each other in the transport direction D2. The spray nozzle 26a is disposed downstream of the spray nozzle 26b in the transport direction D2. Yes. That is, the spray axis A3 of the cleaning liquid 24 sprayed on the upper surface 1a and the spray axis A4 of the cleaning liquid 24 sprayed on the lower surface 1b are separated from each other in the transport direction D2, and the spray axis A3 is It is located downstream of the spray axis A4 in the transport direction D2. Thereby, the supply position (area where the cleaning liquid 24 is sprayed) P1 on the upper surface 1a is located downstream of the supply position P2 of the cleaning liquid 24 on the lower surface 1b in the transport direction D2.
　スプレーノズル２６ａ，２６ｂは、洗浄面３に洗浄液２４を吹き付けることが可能な二流体ノズルであり、洗浄液の供給源２８ａと、圧縮空気の供給源２８ｂとに接続されている。スプレーノズル２６ａの先端（噴霧口）から上面１ａまでの距離、及び、スプレーノズル２６ｂの先端（噴霧口）から下面１ｂまでの距離は、例えば１０～２００ｍｍである。スプレーノズル２６ａ，２６ｂの噴霧広がり角θ１は、例えば６０～８０°である。噴霧圧力は、例えば０．１～０．７ＭＰａである。噴霧量は、例えば０．２～４．０リットル／ｍｉｎである。洗浄液２４の温度は、例えば１０～４０℃である。スプレーノズル２６ａ，２６ｂの噴霧パターンは、例えば膜状、扇状、円錐状であり、比較的均一な流量分布が得られる観点から、膜状が好ましい。スプレーノズル２６ａの先端とスプレーノズル２６ｂの先端との搬送方向Ｄ２における間隔Ｄ５は、上面１ａ側及び下面１ｂ側のそれぞれから同一の貫通孔５の内部に洗浄液２４が同時に供給されることが抑制され易くなる観点から、例えば５～５０ｍｍである。 The spray nozzles 26a and 26b are two-fluid nozzles capable of spraying the cleaning liquid 24 onto the cleaning surface 3, and are connected to a cleaning liquid supply source 28a and a compressed air supply source 28b. The distance from the tip (spray port) of the spray nozzle 26a to the upper surface 1a and the distance from the tip (spray port) of the spray nozzle 26b to the lower surface 1b are, for example, 10 to 200 mm. The spray spread angle θ1 of the spray nozzles 26a and 26b is, for example, 60 to 80 °. The spray pressure is, for example, 0.1 to 0.7 MPa. The spray amount is, for example, 0.2 to 4.0 liter / min. The temperature of the cleaning liquid 24 is 10 to 40 ° C., for example. The spray pattern of the spray nozzles 26a and 26b is, for example, a film shape, a fan shape, or a cone shape, and a film shape is preferable from the viewpoint of obtaining a relatively uniform flow rate distribution. The distance D5 in the transport direction D2 between the tip of the spray nozzle 26a and the tip of the spray nozzle 26b prevents the cleaning liquid 24 from being simultaneously supplied into the same through-hole 5 from the upper surface 1a side and the lower surface 1b side. From the viewpoint of facilitating, it is, for example, 5 to 50 mm.
　第２水洗工程Ｓ１１０ｂでは、ホイールコンベア７によって連続的又は断続的に搬送方向Ｄ２に搬送されるマスク１の上面１ａ及び下面１ｂのそれぞれに対してスプレーノズル２６ａ，２６ｂから貫通孔５の軸方向に洗浄液２４を噴霧して、搬送方向Ｄ２の下流側から上流側に向かって順にマスク１の上面１ａ及び下面１ｂ並びに貫通孔５の内部を洗浄する。 In the second water washing step S110b, the spray nozzles 26a and 26b extend in the axial direction of the through-hole 5 with respect to the upper surface 1a and the lower surface 1b of the mask 1 that are continuously or intermittently conveyed in the conveyance direction D2 by the wheel conveyor 7, The cleaning liquid 24 is sprayed to clean the upper surface 1a and the lower surface 1b of the mask 1 and the inside of the through hole 5 in order from the downstream side to the upstream side in the transport direction D2.
　本実施形態では、第２水洗工程Ｓ１１０ｂにおいて、二流体ノズルであるスプレーノズル２６ａ，２６ｂから洗浄液２４を噴霧しているため、洗浄液２４の微細粒子から構成されるミストを洗浄面３に供給することが可能であり、マスク１から異物を除去し易い。また、本実施形態では、貫通孔５の軸方向に洗浄液２４を噴霧することにより、洗浄液２４が貫通孔５の内部に供給され易く、貫通孔５の内部を充分に洗浄することができる。さらに、本実施形態では、上面１ａに対して噴霧される洗浄液２４の噴霧軸Ａ３と下面１ｂに対して噴霧される洗浄液２４の噴霧軸Ａ４とが、搬送方向Ｄ２において互いに離間している。この場合、本実施形態では、上面１ａ及び下面１ｂのそれぞれに対して洗浄液２４を噴霧しているものの、上面１ａ側及び下面１ｂ側のそれぞれから同一の貫通孔５の内部に洗浄液２４が同時に供給されることが抑制される。これにより、上面１ａ側及び下面１ｂ側のうちの一方側から供給された洗浄液２４による洗浄が、他方側から供給された洗浄液２４により妨げられることが抑制される。以上のような本実施形態によれば、マスク１の洗浄面３に付着した異物に加えて貫通孔５の内壁に付着した異物を除去し易くなり、マスク１を更に良好に洗浄することができる。 In the present embodiment, since the cleaning liquid 24 is sprayed from the spray nozzles 26a and 26b, which are two-fluid nozzles, in the second water washing step S110b, the mist composed of the fine particles of the cleaning liquid 24 is supplied to the cleaning surface 3. It is possible to easily remove foreign substances from the mask 1. Further, in the present embodiment, by spraying the cleaning liquid 24 in the axial direction of the through hole 5, the cleaning liquid 24 is easily supplied into the through hole 5, and the inside of the through hole 5 can be sufficiently cleaned. Furthermore, in this embodiment, the spray axis A3 of the cleaning liquid 24 sprayed on the upper surface 1a and the spray axis A4 of the cleaning liquid 24 sprayed on the lower surface 1b are separated from each other in the transport direction D2. In this case, in this embodiment, although the cleaning liquid 24 is sprayed on each of the upper surface 1a and the lower surface 1b, the cleaning liquid 24 is simultaneously supplied into the same through-hole 5 from each of the upper surface 1a side and the lower surface 1b side. Is suppressed. Thereby, the cleaning liquid 24 supplied from one side of the upper surface 1a side and the lower surface 1b side is prevented from being hindered by the cleaning liquid 24 supplied from the other side. According to the present embodiment as described above, it becomes easy to remove the foreign matter adhering to the inner wall of the through hole 5 in addition to the foreign matter adhering to the cleaning surface 3 of the mask 1, and the mask 1 can be cleaned more satisfactorily. .
　また、本実施形態に係る洗浄方法は、第１水洗工程Ｓ１１０ａの後に第２水洗工程Ｓ１１０ｂを備えている。この場合、第１水洗工程Ｓ１１０ａにおいて前処理としてマスク１を洗浄した後に第２水洗工程Ｓ１１０ｂにおいてマスク１が本洗浄されるため、マスク１を更に良好に洗浄することができる。 Moreover, the cleaning method according to the present embodiment includes the second water washing step S110b after the first water washing step S110a. In this case, since the mask 1 is finally cleaned in the second water washing step S110b after the mask 1 is washed as a pretreatment in the first water washing step S110a, the mask 1 can be further satisfactorily washed.
　本実施形態では、第２水洗工程Ｓ１１０ｂにおいて、上面１ａが鉛直方向上方を向くと共に下面１ｂが鉛直方向下方を向いた状態でマスク１が搬送され、噴霧軸Ａ３が噴霧軸Ａ４よりも搬送方向Ｄ２の下流側に位置している。この場合、鉛直方向下方を向いた下面１ｂ側からスプレーノズル２６ｂによって貫通孔５の内部に供給された洗浄液２４が、異物を除去しつつ貫通孔５の内部を通過して、鉛直方向上方を向いた上面１ａに付着したとしても、搬送方向Ｄ２の下流側においてスプレーノズル２６ａによって供給される洗浄液２４により、上面１ａに付着した洗浄液２４を除去することができる。これにより、マスク１を更に良好に洗浄することができる。 In the present embodiment, in the second water washing step S110b, the mask 1 is transported with the upper surface 1a facing upward in the vertical direction and the lower surface 1b facing downward in the vertical direction, and the spray axis A3 is transported in the transport direction D2 rather than the spray axis A4. It is located on the downstream side. In this case, the cleaning liquid 24 supplied to the inside of the through-hole 5 by the spray nozzle 26b from the lower surface 1b side facing downward in the vertical direction passes through the inside of the through-hole 5 while removing foreign matters, and faces upward in the vertical direction. Even if it adheres to the upper surface 1a, the cleaning liquid 24 attached to the upper surface 1a can be removed by the cleaning liquid 24 supplied by the spray nozzle 26a on the downstream side in the transport direction D2. Thereby, the mask 1 can be more satisfactorily cleaned.
　なお、第２水洗工程Ｓ１１０ｂは、上記に限られるものではなく、スプレーノズル２６ａがスプレーノズル２６ｂよりも搬送方向Ｄ２の上流側に配置されることにより、噴霧軸Ａ３が噴霧軸Ａ４よりも搬送方向Ｄ２の上流側に位置していてもよい。また、洗浄部２０は、搬送方向Ｄ２に複数配置されたスプレーノズルを有していてもよい。 The second water washing step S110b is not limited to the above, and the spray axis A3 is transported more than the spray axis A4 by disposing the spray nozzle 26a upstream of the spray nozzle 26b in the transport direction D2. It may be located upstream of D2. Further, the cleaning unit 20 may have a plurality of spray nozzles arranged in the transport direction D2.
（第３水洗工程Ｓ１１０ｃ）
　第３水洗工程Ｓ１１０ｃでは、第２水洗工程Ｓ１１０ｂで洗浄されたマスク１を後処理部３０に搬送し、マスク１に後処理を施す。後処理部３０は、図８に示すように、複数の一対のホイール７ａ，７ｂから構成されるホイールコンベア７と、洗浄液３４を供給する一対のスプレーノズル（洗浄液供給手段）３６ａ，３６ｂとを有している。 (Third water washing step S110c)
In 3rd water washing process S110c, the mask 1 wash | cleaned by 2nd water washing process S110b is conveyed to the post-processing part 30, and the mask 1 is post-processed. As shown in FIG. 8, the post-processing unit 30 includes a wheel conveyor 7 including a plurality of pairs of wheels 7a and 7b, and a pair of spray nozzles (cleaning liquid supply means) 36a and 36b for supplying the cleaning liquid 34. is doing.
　スプレーノズル３６ａ，３６ｂは、厚さ方向Ｄ１に互いに対向するように一対配置されており、厚さ方向Ｄ１に対して搬送方向Ｄ２の上流側に傾斜する方向Ｄ６に洗浄液３４を供給する。スプレーノズル３６ａは、マスク１の上面１ａ側に配置されており、洗浄液３４を噴霧して上面１ａ及び貫通孔５の内部に洗浄液３４を供給する。スプレーノズル３６ｂは、マスク１の下面１ｂ側に配置されており、洗浄液３４を噴霧して下面１ｂ及び貫通孔５の内部に洗浄液３４を供給する。上面１ａにおける洗浄液３４の供給位置（洗浄液３４が吹き付けられる領域）Ｐ３と下面１ｂにおける洗浄液３４の供給位置Ｐ４とは、厚さ方向Ｄ１に互いに対向している。 The spray nozzles 36a and 36b are arranged in a pair so as to face each other in the thickness direction D1, and supply the cleaning liquid 34 in a direction D6 inclined to the upstream side of the transport direction D2 with respect to the thickness direction D1. The spray nozzle 36 a is disposed on the upper surface 1 a side of the mask 1 and sprays the cleaning liquid 34 to supply the cleaning liquid 34 to the upper surface 1 a and the inside of the through hole 5. The spray nozzle 36 b is disposed on the lower surface 1 b side of the mask 1 and sprays the cleaning liquid 34 to supply the cleaning liquid 34 to the inside of the lower surface 1 b and the through hole 5. The supply position (region where the cleaning liquid 34 is sprayed) P3 on the upper surface 1a and the supply position P4 of the cleaning liquid 34 on the lower surface 1b face each other in the thickness direction D1.
　スプレーノズル３６ａ，３６ｂは、洗浄面３に洗浄液３４を吹き付けることが可能であればよく、例えば一流体ノズルや二流体ノズルであり、洗浄液３４の供給源３８に接続されている。スプレーノズル３６ａ，３６ｂが二流体ノズルである場合には、スプレーノズル３６ａ，３６ｂは、圧縮空気の供給源（図示せず）に更に接続されている。 The spray nozzles 36 a and 36 b are only required to be able to spray the cleaning liquid 34 onto the cleaning surface 3. For example, the spray nozzles 36 a and 36 b are one-fluid nozzles or two-fluid nozzles and are connected to a supply source 38 of the cleaning liquid 34. When the spray nozzles 36a and 36b are two-fluid nozzles, the spray nozzles 36a and 36b are further connected to a compressed air supply source (not shown).
　スプレーノズル３６ａ，３６ｂにおいて洗浄液３４を供給する方向Ｄ６の傾斜角度θ２は、厚さ方向Ｄ１に対して例えば１０～４５°である。スプレーノズル３６ａの先端（噴霧口）から上面１ａまでの最短距離、及び、スプレーノズル３６ｂの先端（噴霧口）から下面１ｂまでの最短距離は、例えば５０～２００ｍｍである。噴霧圧力は、例えば０．１～２ＭＰａである。噴霧量は、例えば０．２～１５リットル／ｍｉｎである。洗浄液３４の温度は、例えば１０～４０℃である。スプレーノズル３６ａ，３６ｂの噴霧パターンは、例えば膜状、扇状、円錐状である。 The inclination angle θ2 in the direction D6 for supplying the cleaning liquid 34 at the spray nozzles 36a and 36b is, for example, 10 to 45 ° with respect to the thickness direction D1. The shortest distance from the tip (spray port) of the spray nozzle 36a to the upper surface 1a and the shortest distance from the tip (spray port) of the spray nozzle 36b to the lower surface 1b are, for example, 50 to 200 mm. The spray pressure is, for example, 0.1 to 2 MPa. The spray amount is, for example, 0.2 to 15 liter / min. The temperature of the cleaning liquid 34 is 10 to 40 ° C., for example. The spray pattern of the spray nozzles 36a and 36b is, for example, a film shape, a fan shape, or a cone shape.
　本実施形態では、第３水洗工程Ｓ１１０ｃにおいて、ホイールコンベア７によって連続的又は断続的に搬送方向Ｄ２に搬送されるマスク１の洗浄面３に対し、厚さ方向Ｄ１に対して搬送方向Ｄ２の上流側に傾斜する方向Ｄ６に洗浄液３４を供給して、搬送方向Ｄ２の下流側から上流側に向かって順にマスク１を洗浄する。これにより、異物が洗浄液３４によって搬送方向Ｄ２の上流側に排除され易くなり、洗浄面３における搬送方向Ｄ２の下流側の領域に、マスク１を搬送するに伴い異物が残存することを抑制することができる。したがって、本実施形態では、マスク１に付着した異物を除去し易くなり、マスク１を更に良好に洗浄することができる。 In the present embodiment, in the third water washing step S110c, the upstream side of the transport direction D2 with respect to the thickness direction D1 with respect to the cleaning surface 3 of the mask 1 that is transported continuously or intermittently by the wheel conveyor 7 in the transport direction D2. The cleaning liquid 34 is supplied in the direction D6 inclined to the side, and the mask 1 is cleaned in order from the downstream side to the upstream side in the transport direction D2. This makes it easier for foreign matter to be removed upstream of the transport direction D2 by the cleaning liquid 34, and suppresses foreign matter from remaining in the region of the cleaning surface 3 downstream of the transport direction D2 as the mask 1 is transported. Can do. Therefore, in this embodiment, it becomes easy to remove the foreign matter adhering to the mask 1, and the mask 1 can be cleaned more satisfactorily.
　また、本実施形態では、第３水洗工程Ｓ１１０ｃにおいて上面１ａ及び下面１ｂのそれぞれに洗浄液３４を供給している。この場合、マスク１を更に良好に洗浄することができる。 In the present embodiment, the cleaning liquid 34 is supplied to each of the upper surface 1a and the lower surface 1b in the third water washing step S110c. In this case, the mask 1 can be cleaned more satisfactorily.
　また、本実施形態に係る洗浄方法は、第３水洗工程Ｓ１１０ｃの前に第２水洗工程Ｓ１１０ｂを備えている。この場合、第２水洗工程Ｓ１１０ｂにおいてマスク１を本洗浄した後に第３水洗工程Ｓ１１０ｃにおいて後処理としてマスク１が洗浄されるため、マスク１を更に良好に洗浄することができる。 Moreover, the cleaning method according to the present embodiment includes the second water washing step S110b before the third water washing step S110c. In this case, since the mask 1 is washed as a post-treatment in the third water washing step S110c after the main washing of the mask 1 in the second water washing step S110b, the mask 1 can be further satisfactorily washed.
　なお、第３水洗工程Ｓ１１０ｃは、上記に限られるものではなく、スプレーノズル３６ａ，３６ｂが搬送方向Ｄ２に互いに離間して一対配置されることにより、供給位置Ｐ３と供給位置Ｐ４とが搬送方向Ｄ２において互いに離間していてもよい。また、後処理部３０は、搬送方向Ｄ２に複数配置されたスプレーノズルを有していてもよく、上面１ａ側及び下面１ｂ側のいずれか一方のみに単一のスプレーノズルを有していてもよい。 Note that the third water washing step S110c is not limited to the above, and the spray nozzles 36a and 36b are spaced apart from each other in the transport direction D2 so that the supply position P3 and the supply position P4 are in the transport direction D2. May be separated from each other. Further, the post-processing unit 30 may have a plurality of spray nozzles arranged in the transport direction D2, or may have a single spray nozzle only on one of the upper surface 1a side and the lower surface 1b side. Good.
（乾燥工程Ｓ１２０）
　乾燥工程Ｓ１２０では、第３水洗工程Ｓ１１０ｃで後処理が施されて洗浄液が付着したマスク１を乾燥部４０に搬送し、マスク１に付着した洗浄液を除去する。除去されるべき洗浄液は、例えば、マスク１の上面１ａや下面１ｂ、貫通孔５の内壁に付着している。乾燥部４０は、図９に示すように、複数の一対のホイール７ａ，７ｂから構成されるホイールコンベア７と、第１乾燥工程として乾燥風４２ａを送風するスプレーノズル（第１送風手段）４４と、第２乾燥工程として乾燥風４２ｂを送風するエアナイフ（第２送風手段）４６ａ，４６ｂとを有している。 (Drying step S120)
In the drying step S120, the mask 1 that has been post-processed in the third water washing step S110c and has the cleaning liquid attached thereto is conveyed to the drying unit 40, and the cleaning liquid attached to the mask 1 is removed. The cleaning liquid to be removed adheres to, for example, the upper surface 1 a and lower surface 1 b of the mask 1 and the inner wall of the through hole 5. As shown in FIG. 9, the drying unit 40 includes a wheel conveyor 7 including a plurality of pairs of wheels 7 a and 7 b, and a spray nozzle (first blowing unit) 44 that blows drying air 42 a as a first drying process. As a second drying step, air knives (second blowing means) 46a and 46b for blowing the drying air 42b are provided.
　スプレーノズル４４及びエアナイフ４６ａ，４６ｂは、乾燥風４２ａや乾燥風４２ｂの供給源４８に接続されている。スプレーノズル４４は、マスク１を乾燥するための乾燥風４２ａを貫通孔５の軸方向に送風し、乾燥風４２ａを洗浄面３に吹き付けることが可能である。エアナイフ４６ａ，４６ｂは、マスク１を乾燥するための乾燥風４２ｂを厚さ方向Ｄ１に対して搬送方向Ｄ２の上流側に傾斜する方向Ｄ７に送風し、マスク１における方向Ｄ３の全長にわたって乾燥風４２ｂを洗浄面３に吹き付けることが可能である。 The spray nozzle 44 and the air knives 46a and 46b are connected to a supply source 48 of the drying air 42a and the drying air 42b. The spray nozzle 44 blows the drying air 42 a for drying the mask 1 in the axial direction of the through hole 5, and can blow the drying air 42 a onto the cleaning surface 3. The air knives 46a and 46b blow the drying air 42b for drying the mask 1 in the direction D7 inclined to the upstream side of the transport direction D2 with respect to the thickness direction D1, and the drying air 42b over the entire length of the direction D3 in the mask 1. Can be sprayed onto the cleaning surface 3.
　乾燥風４２ａは、上面１ａ側及び下面１ｂ側のいずれか一方のみからマスク１に対して供給されていることが好ましく、本実施形態では、マスク１の上面１ａ側のみからスプレーノズル４４によってマスク１に対して供給されており、マスク１の下面１ｂ側からは供給されていない。スプレーノズル４４は、上面１ａ側のみに配置されており、搬送過程においてスプレーノズル４４の下方を上面１ａの中心が通過するように配置されている。スプレーノズル４４は、乾燥風４２ａを送風して上面１ａ及び貫通孔５の内部に乾燥風４２ａを供給する。スプレーノズル４４の先端（送風面）から上面１ａまでの距離は、例えば５０～２００ｍｍである。乾燥風４２ａの圧力は、例えば０．１～１ＭＰａである。乾燥風４２ａの供給量は、例えば１００～１０００リットル／ｍｉｎである。乾燥風４２ａは、例えば５～２００℃の風である。 The drying air 42a is preferably supplied to the mask 1 from only one of the upper surface 1a side and the lower surface 1b side. In this embodiment, the mask 1 is sprayed by the spray nozzle 44 only from the upper surface 1a side of the mask 1. Is not supplied from the lower surface 1 b side of the mask 1. The spray nozzle 44 is disposed only on the upper surface 1a side, and is disposed such that the center of the upper surface 1a passes below the spray nozzle 44 in the transport process. The spray nozzle 44 blows the drying air 42 a and supplies the drying air 42 a to the upper surface 1 a and the inside of the through hole 5. The distance from the tip (blower surface) of the spray nozzle 44 to the upper surface 1a is, for example, 50 to 200 mm. The pressure of the drying air 42a is, for example, 0.1 to 1 MPa. The supply amount of the drying air 42a is, for example, 100 to 1000 liters / min. The drying air 42a is, for example, a wind of 5 to 200 ° C.
　乾燥風４２ｂは、上面１ａ側及び下面１ｂ側のそれぞれからエアナイフ４６ａ，４６ｂによってマスク１に対して供給されている。エアナイフ４６ａ，４６ｂは、マスク１の上面１ａ側及び下面１ｂ側のそれぞれに配置されており、厚さ方向Ｄ１に互いに対向するように一対配置されている。エアナイフ４６ａは、マスク１の上面１ａ側に配置されており、乾燥風４２ｂを送風して上面１ａに乾燥風４２ｂを供給する。エアナイフ４６ｂは、マスク１の下面１ｂ側に配置されており、乾燥風４２ｂを送風して下面１ｂに乾燥風４２ｂを供給する。上面１ａにおける乾燥風４２ｂの供給位置（乾燥風４２ｂが吹き付けられる位置）Ｐ５と下面１ｂにおける乾燥風４２ｂの供給位置Ｐ６とは、厚さ方向Ｄ１に互いに対向している。 The drying air 42b is supplied to the mask 1 by air knives 46a and 46b from the upper surface 1a side and the lower surface 1b side, respectively. The air knives 46a and 46b are arranged on the upper surface 1a side and the lower surface 1b side of the mask 1, respectively, and are paired so as to face each other in the thickness direction D1. The air knife 46a is disposed on the upper surface 1a side of the mask 1, and blows the drying air 42b to supply the drying air 42b to the upper surface 1a. The air knife 46b is disposed on the lower surface 1b side of the mask 1, and blows the drying air 42b to supply the drying air 42b to the lower surface 1b. The supply position P5 of the drying air 42b on the upper surface 1a (position where the drying air 42b is blown) P5 and the supply position P6 of the drying air 42b on the lower surface 1b face each other in the thickness direction D1.
　エアナイフ４６ａの先端（送風面）から上面１ａまでの最短距離、及び、エアナイフ４６ｂの先端（送風面）から下面１ｂまでの最短距離は、例えば１～２００ｍｍである。乾燥風４２ｂの圧力は、例えば０．１～１ＭＰａである。乾燥風４２ｂの供給量は、例えば１００～５０００リットル／ｍｉｎである。乾燥風４２ｂは、例えば５～２００℃の風である。エアナイフ４６ａ，４６ｂにおいて乾燥風４２ｂを供給する方向Ｄ７の傾斜角度θ３は、厚さ方向Ｄ１に対して例えば１０～４５°である。 The shortest distance from the tip (air blowing surface) of the air knife 46a to the upper surface 1a and the shortest distance from the tip (air blowing surface) of the air knife 46b to the lower surface 1b are, for example, 1 to 200 mm. The pressure of the drying air 42b is, for example, 0.1 to 1 MPa. The supply amount of the drying air 42b is, for example, 100 to 5000 liters / min. The drying air 42b is, for example, a wind of 5 to 200 ° C. The inclination angle θ3 in the direction D7 for supplying the drying air 42b in the air knives 46a and 46b is, for example, 10 to 45 ° with respect to the thickness direction D1.
　乾燥工程Ｓ１２０では、上面１ａにおける乾燥風４２ａが供給された領域Ｐ７に対して乾燥風４２ｂを供給する。具体的には、スプレーノズル４４から送風された乾燥風４２ａが供給された領域Ｐ７は、ホイールコンベア７によって連続的又は断続的に搬送方向Ｄ２に搬送されるマスク１の移動に伴って搬送方向Ｄ２の下流側に移動する。そして、領域Ｐ７には、エアナイフ４６ａから送風された乾燥風４２ｂが供給される。このようにマスク１が搬送方向Ｄ２に搬送されつつ上面１ａに対して乾燥風４２ａ及び乾燥風４２ｂが供給されることにより、上面１ａには、搬送方向Ｄ２の下流側から上流側にかけて乾燥風４２ａ及び乾燥風４２ｂが供給されることとなる。 In the drying step S120, the drying air 42b is supplied to the region P7 where the drying air 42a on the upper surface 1a is supplied. Specifically, the region P7 to which the drying air 42a blown from the spray nozzle 44 is supplied is conveyed in the conveying direction D2 as the mask 1 is conveyed in the conveying direction D2 continuously or intermittently by the wheel conveyor 7. Move downstream. The region P7 is supplied with the dry air 42b blown from the air knife 46a. In this way, the drying air 42a and the drying air 42b are supplied to the upper surface 1a while the mask 1 is being transported in the transporting direction D2, whereby the drying air 42a is applied to the upper surface 1a from the downstream side to the upstream side in the transporting direction D2. Then, the drying air 42b is supplied.
　本実施形態では、第１乾燥工程として、ホイールコンベア７によって連続的又は断続的に搬送方向Ｄ２に搬送されるマスク１の上面１ａに対し、搬送方向Ｄ２の下流側から上流側に向かって順に、貫通孔５の軸方向にスプレーノズル４４から乾燥風４２ａを供給することにより、洗浄面３に付着した洗浄液に加えて貫通孔５の内部に付着した洗浄液を除去することができる。 In this embodiment, as a 1st drying process, with respect to the upper surface 1a of the mask 1 conveyed to the conveyance direction D2 continuously or intermittently by the wheel conveyor 7, in order toward the upstream from the downstream of the conveyance direction D2, By supplying the drying air 42 a from the spray nozzle 44 in the axial direction of the through hole 5, in addition to the cleaning liquid attached to the cleaning surface 3, the cleaning liquid attached to the inside of the through hole 5 can be removed.
　続いて、第２乾燥工程として、ホイールコンベア７によって連続的又は断続的に搬送方向Ｄ２に搬送されるマスク１の上面１ａ及び下面１ｂに対し、搬送方向Ｄ２の下流側から上流側に向かって順に、厚さ方向Ｄ１に対して搬送方向Ｄ２の上流側に傾斜する方向Ｄ７にエアナイフ４６ａ，４６ｂから乾燥風４２ｂを供給することにより、上面１ａ及び下面１ｂに付着した洗浄液を除去することができる。 Subsequently, as the second drying step, the upper surface 1a and the lower surface 1b of the mask 1 that are continuously or intermittently transported in the transport direction D2 by the wheel conveyor 7 in order from the downstream side in the transport direction D2 toward the upstream side. By supplying the drying air 42b from the air knives 46a and 46b in the direction D7 inclined to the upstream side of the transport direction D2 with respect to the thickness direction D1, the cleaning liquid adhering to the upper surface 1a and the lower surface 1b can be removed.
　本実施形態では、第１乾燥工程及び第２乾燥工程を行うことにより、洗浄面３に付着した洗浄液、及び、貫通孔５の内部に付着した洗浄液を充分に除去することが可能である。したがって、本実施形態では、マスク１を良好に洗浄することができる。 In the present embodiment, the cleaning liquid adhering to the cleaning surface 3 and the cleaning liquid adhering to the inside of the through hole 5 can be sufficiently removed by performing the first drying process and the second drying process. Therefore, in this embodiment, the mask 1 can be cleaned satisfactorily.
　また、本実施形態では、第１乾燥工程において上面１ａ側のみからマスク１に対して乾燥風４２ａを供給している。この場合、貫通孔５の上面１ａ側から供給された乾燥風４２ａが下面１ｂ側より排除され易くなる。これにより、貫通孔５の内部に付着した洗浄液を除去し易くなり、マスク１を更に良好に洗浄することができる。 In the present embodiment, the drying air 42a is supplied to the mask 1 only from the upper surface 1a side in the first drying step. In this case, the drying air 42a supplied from the upper surface 1a side of the through hole 5 is easily removed from the lower surface 1b side. Thereby, it becomes easy to remove the cleaning liquid adhering to the inside of the through-hole 5, and the mask 1 can be cleaned more satisfactorily.
　また、本実施形態では、第２乾燥工程において上面１ａ側及び下面１ｂ側のそれぞれから乾燥風４２ｂを供給している。この場合、上面１ａに付着した洗浄液と共に下面１ｂに付着した洗浄液を除去することができるため、マスク１を更に良好に洗浄することができる。 In the present embodiment, the drying air 42b is supplied from each of the upper surface 1a side and the lower surface 1b side in the second drying step. In this case, since the cleaning liquid adhering to the lower surface 1b can be removed together with the cleaning liquid adhering to the upper surface 1a, the mask 1 can be more satisfactorily cleaned.
　なお、乾燥工程Ｓ１２０は、上記に限られるものではない。上記実施形態ではマスク１を水平方向に搬送しているが、水平方向から傾斜した方向にマスク１を搬送してもよい。例えば、搬送方向Ｄ２の上流側よりも下流側が鉛直方向上方に位置するように傾斜させてマスク１を搬送してもよく、傾斜角度は、水平方向に対して例えば５～２０°である。この場合、マスク１に付着した洗浄液が乾燥風４２ａ，４２ｂにより搬送方向Ｄ２の上流側に更に排除され易くなり、洗浄面３における搬送方向Ｄ２の下流側の領域に洗浄液が残存することや、乾燥風４２ａ，４２ｂにより排除された洗浄液が洗浄面３における搬送方向Ｄ２の下流側の領域に再度付着することを抑制することができる。また、乾燥工程Ｓ１２０では、洗浄面３における搬送方向Ｄ２の下流側の領域に洗浄液が残存することや再度付着することを更に抑制する観点から、ドラフト設備や気液分離器を用いてもよい。 In addition, drying process S120 is not restricted above. In the above embodiment, the mask 1 is transported in the horizontal direction, but the mask 1 may be transported in a direction inclined from the horizontal direction. For example, the mask 1 may be transported while being inclined such that the downstream side is positioned above the upstream side in the transport direction D2, and the tilt angle is, for example, 5 to 20 ° with respect to the horizontal direction. In this case, the cleaning liquid adhering to the mask 1 is further easily removed to the upstream side in the transport direction D2 by the drying air 42a and 42b, and the cleaning liquid remains in the downstream area of the cleaning surface 3 in the transport direction D2 or is dried. It is possible to prevent the cleaning liquid removed by the winds 42a and 42b from adhering again to the downstream area of the cleaning surface 3 in the transport direction D2. Further, in the drying step S120, a draft facility or a gas-liquid separator may be used from the viewpoint of further suppressing the cleaning liquid remaining in the downstream area of the cleaning surface 3 in the transport direction D2 and adhering again.
　また、上記実施形態では、上面１ａにおける乾燥風４２ａが供給された領域Ｐ７に対して乾燥風４２ｂを供給しているが、エアナイフ４６ａ，４６ｂをスプレーノズル４４よりも搬送方向Ｄ２の上流側に配置して、上面１ａにおける乾燥風４２ｂが供給された領域に対して乾燥風４２ａを供給してもよい。さらに、上記実施形態では、同一のマスク１の洗浄面３に対して同時に乾燥風４２ａ及び乾燥風４２ｂをそれぞれ供給しているが、洗浄面３の搬送方向Ｄ２の全長にわたって乾燥風４２ａを供給した後に、同一の洗浄面３の搬送方向Ｄ２の全長にわたって乾燥風４２ｂを供給してもよい。 Moreover, in the said embodiment, although the drying air 42b is supplied with respect to the area | region P7 to which the drying air 42a in the upper surface 1a was supplied, air knives 46a and 46b are arrange | positioned rather than the spray nozzle 44 in the upstream of the conveyance direction D2. And you may supply the drying air 42a with respect to the area | region where the drying air 42b in the upper surface 1a was supplied. Further, in the above embodiment, the drying air 42a and the drying air 42b are simultaneously supplied to the cleaning surface 3 of the same mask 1, but the drying air 42a is supplied over the entire length of the cleaning surface 3 in the transport direction D2. Later, the drying air 42b may be supplied over the entire length of the same cleaning surface 3 in the transport direction D2.
　乾燥部４０は、搬送方向Ｄ２に複数配列されたスプレーノズル４４及びエアナイフ４６ａ，４６ｂを有していてもよい。乾燥部４０は、スプレーノズル４４に代えて、マスク１における方向Ｄ３の全長にわたって乾燥風４２ａを送風可能なエアナイフを有していてもよい。また、スプレーノズル４４がマスク１の上面１ａ側及び下面１ｂ側のうち下面１ｂ側のみに配置されて、乾燥風４２ａがマスク１の下面１ｂ側のみからマスク１に対して供給されていてもよい。 The drying unit 40 may include a plurality of spray nozzles 44 and air knives 46a and 46b arranged in the transport direction D2. The drying unit 40 may have an air knife capable of blowing the drying air 42a over the entire length in the direction D3 in the mask 1 instead of the spray nozzle 44. Further, the spray nozzle 44 may be disposed only on the lower surface 1b side of the upper surface 1a side and the lower surface 1b side of the mask 1, and the drying air 42a may be supplied to the mask 1 only from the lower surface 1b side of the mask 1. .
　エアナイフ４６ａ，４６ｂは、搬送方向Ｄ２に互いに離間して一対配置されていてもよく、供給位置Ｐ５と供給位置Ｐ６とは、搬送方向Ｄ２において互いに離間していてもよい。この場合、上面１ａ側及び下面１ｂ側のそれぞれから同一の貫通孔５の内部に乾燥風４２ｂが同時に供給されることが抑制されるため、貫通孔５の内部に付着した洗浄液を更に除去し易くなる。また、エアナイフ４６ａ及びエアナイフ４６ｂのいずれか一方のみが配置されて、乾燥風４２ｂがマスク１の一方側のみからマスク１に対して供給されていてもよい。 A pair of air knives 46a and 46b may be arranged apart from each other in the transport direction D2, and the supply position P5 and the supply position P6 may be separated from each other in the transport direction D2. In this case, since it is suppressed that the dry air 42b is simultaneously supplied into the same through-hole 5 from each of the upper surface 1a side and the lower surface 1b side, it is easier to remove the cleaning liquid adhering to the inside of the through-hole 5. Become. Alternatively, only one of the air knife 46 a and the air knife 46 b may be arranged, and the drying air 42 b may be supplied to the mask 1 from only one side of the mask 1.
＜準備工程Ｓ２００＞
　洗浄工程Ｓ１００に続く準備工程Ｓ２００について説明する。準備工程Ｓ２００では、ハニカム構造体を準備する。例えば、原料混合物を押出成形して、隔壁により区画された複数の貫通孔を有するグリーンハニカム成形体を得た後に、当該グリーンハニカム成形体を焼成してハニカム構造体（未封口ハニカム焼成体）を得る。 <Preparation process S200>
A preparation step S200 subsequent to the cleaning step S100 will be described. In the preparation step S200, a honeycomb structure is prepared. For example, after extruding the raw material mixture to obtain a green honeycomb molded body having a plurality of through holes partitioned by partition walls, the green honeycomb molded body is fired to form a honeycomb structure (unsealed honeycomb fired body). obtain.
　原料混合物は、セラミクス材料や有機バインダを含有し、必要に応じてその他の添加剤を含有する。ハニカムフィルタ１００がチタン酸アルミニウムを含む場合、原料混合物は、セラミクス材料として例えばアルミニウム源粉末やチタニウム源粉末を含有し、必要に応じてマグネシウム源粉末やケイ素源粉末を更に含有する。有機バインダは、例えばメチルセルロースである。添加剤は、例えば造孔剤、潤滑剤、可塑剤、分散剤、溶媒である。 The raw material mixture contains a ceramic material and an organic binder, and other additives as necessary. When the honeycomb filter 100 contains aluminum titanate, the raw material mixture contains, for example, an aluminum source powder or a titanium source powder as a ceramic material, and further contains a magnesium source powder or a silicon source powder as necessary. The organic binder is, for example, methyl cellulose. The additive is, for example, a pore-forming agent, a lubricant, a plasticizer, a dispersant, or a solvent.
＜封口工程Ｓ３００＞
　封口工程Ｓ３００では、ハニカム構造体における封口すべき貫通孔に対応する箇所に貫通孔５が設けられたマスク１をハニカム構造体の一端面に密着させ、ハニカム構造体の一部の貫通孔にマスク１を介して封口材を供給する。次に、マスク１をハニカム構造体の他端面に密着させ、ハニカム構造体の一端面側の端部が封口されていない貫通孔にマスク１を介して封口材を供給する。これにより、ハニカム構造体の一端側の端部及び他端側の端部のいずれかが封口された流路が形成される。本実施形態では、図１に示したように、ハニカムフィルタ１００の一端面１００ａ側の端部が封口された流路１１０ａと、ハニカムフィルタ１００の他端面１００ｂ側の端部が封口された流路１１０ｂとが交互に配置されるように、ハニカム構造体の貫通孔を封口する。封口材は、ハニカム構造体の貫通孔を封口可能であれば特に限定されず、ハニカム構造体を得るための上記原料混合物と同様の材料を用いることができる。 <Sealing process S300>
In the sealing step S300, the mask 1 provided with the through holes 5 at positions corresponding to the through holes to be sealed in the honeycomb structure is brought into close contact with one end surface of the honeycomb structure, and the masks are formed in some of the through holes of the honeycomb structure. A sealing material is supplied through 1. Next, the mask 1 is brought into close contact with the other end surface of the honeycomb structure, and the sealing material is supplied through the mask 1 to the through hole in which the end portion on the one end surface side of the honeycomb structure is not sealed. As a result, a flow path is formed in which either the end on one end side or the end on the other end side of the honeycomb structure is sealed. In the present embodiment, as shown in FIG. 1, the flow path 110 a in which the end on the one end face 100 a side of the honeycomb filter 100 is sealed, and the flow path in which the end on the other end face 100 b side of the honeycomb filter 100 is sealed. The through-holes of the honeycomb structure are sealed so that 110b is alternately arranged. The sealing material is not particularly limited as long as the through-holes of the honeycomb structure can be sealed, and the same material as the raw material mixture for obtaining the honeycomb structure can be used.
　続いて、貫通孔が封口されたハニカム構造体を加熱し、貫通孔内に供給した封口材を硬化させて封口部１１４を形成する。以上により、図１に示すハニカムフィルタ１００を得ることができる。なお、上記実施形態では、準備工程Ｓ２００においてグリーンハニカム成形体を焼成した後に封口工程Ｓ３００において貫通孔を封口しているが、準備工程Ｓ２００において得られたグリーンハニカム成形体の貫通孔を封口した後に焼成してハニカムフィルタ１００を得ることもできる。 Subsequently, the honeycomb structure with the through holes sealed is heated, and the sealing material supplied into the through holes is cured to form the sealed portions 114. Thus, the honeycomb filter 100 shown in FIG. 1 can be obtained. In the above embodiment, the through hole is sealed in the sealing step S300 after firing the green honeycomb molded body in the preparation step S200, but after the through hole of the green honeycomb molded body obtained in the preparation step S200 is sealed. The honeycomb filter 100 can also be obtained by firing.
　１…マスク、１ａ…上面（一方の主面）、１ｂ…下面（他方の主面）、３…洗浄面、５…貫通孔、７…ホイールコンベア（搬送手段）、１４，２４，３４…洗浄液、１６ａ，１６ｂ，２６ａ，２６ｂ，３６ａ，３６ｂ…スプレーノズル（洗浄液供給手段）、４２ａ，４２ｂ…乾燥風、４４…スプレーノズル（第１送風手段）、４６ａ，４６ｂ…エアナイフ（第２送風手段）、５０…洗浄装置、１００…ハニカムフィルタ、Ｄ１…マスクの厚さ方向、Ｄ２…マスクの搬送方向、Ｄ７…乾燥風を供給する方向、Ｐ７…乾燥風が供給された領域、Ｓ１００…洗浄工程、Ｓ１１０…水洗工程、Ｓ１２０…乾燥工程（第１乾燥工程、第２乾燥工程）、Ｓ３００…封口工程、θ３…傾斜角度。 DESCRIPTION OF SYMBOLS 1 ... Mask, 1a ... Upper surface (one main surface), 1b ... Lower surface (the other main surface), 3 ... Cleaning surface, 5 ... Through-hole, 7 ... Wheel conveyor (conveying means), 14, 24, 34 ... Cleaning liquid 16a, 16b, 26a, 26b, 36a, 36b ... spray nozzle (cleaning liquid supply means), 42a, 42b ... dry air, 44 ... spray nozzle (first blowing means), 46a, 46b ... air knife (second blowing means) 50 ... Cleaning device, 100 ... Honeycomb filter, D1 ... Mask thickness direction, D2 ... Mask transport direction, D7 ... Direction for supplying drying air, P7 ... Region to which drying air is supplied, S100 ... Cleaning step, S110 ... water washing step, S120 ... drying step (first drying step, second drying step), S300 ... sealing step, [theta] 3 ... inclination angle.

Claims (8)

  1. 　一方の主面から他方の主面にかけて厚さ方向に貫通している複数の貫通孔を有するハニカム構造体封口用マスクの洗浄方法であって、
    　前記マスクの前記一方の主面又は前記他方の主面の少なくとも一方の洗浄面に対して洗浄液を供給する工程と、
    　前記洗浄面に前記洗浄液が付着した前記マスクを前記厚さ方向に直交する方向に搬送する工程と、
    　前記搬送されるマスクの前記洗浄面に対し、前記貫通孔の軸方向に風を供給する第１乾燥工程と、
    　前記搬送されるマスクの前記洗浄面に対し、前記厚さ方向に対して前記マスクの搬送方向の上流側に傾斜する方向に風を供給する第２乾燥工程と、を備える、洗浄方法。     A method for cleaning a honeycomb structure sealing mask having a plurality of through holes penetrating in a thickness direction from one main surface to the other main surface,
    Supplying a cleaning liquid to at least one cleaning surface of the one main surface or the other main surface of the mask;
    Transporting the mask with the cleaning liquid attached to the cleaning surface in a direction perpendicular to the thickness direction;
    A first drying step for supplying air in the axial direction of the through-holes to the cleaning surface of the transported mask;
    A second drying step of supplying air in a direction inclined to the upstream side of the transport direction of the mask with respect to the thickness direction with respect to the cleaning surface of the transported mask.
  2. 　前記洗浄面における前記第１乾燥工程において前記風が供給された領域に対し、前記第２乾燥工程において前記風を供給する、請求項１に記載の洗浄方法。 The cleaning method according to claim 1, wherein the air is supplied in the second drying step to a region of the cleaning surface to which the air is supplied in the first drying step.
  3. 　前記洗浄面における前記第２乾燥工程において前記風が供給された領域に対し、前記第１乾燥工程において前記風を供給する、請求項１に記載の洗浄方法。 The cleaning method according to claim 1, wherein the air is supplied in the first drying step to a region where the air is supplied in the second drying step on the cleaning surface.
  4. 　前記第１乾燥工程において前記一方の主面側及び前記他方の主面側のいずれか一方のみから前記風を供給する、請求項１～３のいずれか一項に記載の洗浄方法。 The cleaning method according to any one of claims 1 to 3, wherein in the first drying step, the air is supplied from only one of the one main surface side and the other main surface side.
  5. 　前記第２乾燥工程において前記一方の主面側及び前記他方の主面側のそれぞれから前記風を供給する、請求項１～４のいずれか一項に記載の洗浄方法。 The cleaning method according to any one of claims 1 to 4, wherein the air is supplied from each of the one main surface side and the other main surface side in the second drying step.
  6. 　前記第２乾燥工程において前記風を供給する方向の傾斜角度が、前記厚さ方向に対して１０～４５°である、請求項１～５のいずれか一項に記載の洗浄方法。 The cleaning method according to any one of claims 1 to 5, wherein an inclination angle in a direction in which the wind is supplied in the second drying step is 10 to 45 ° with respect to the thickness direction.
  7. 　請求項１～６のいずれか一項に記載の洗浄方法により前記マスクを洗浄する工程と、
    　前記洗浄されたマスクを介してハニカム構造体の一部の貫通孔に封口材を供給する工程と、を備える、ハニカムフィルタの製造方法。     A step of cleaning the mask by the cleaning method according to any one of claims 1 to 6;
    Supplying a sealing material to a part of the through-holes of the honeycomb structure through the cleaned mask.
  8. 　一方の主面から他方の主面にかけて厚さ方向に貫通している複数の貫通孔を有するハニカム構造体封口用マスクの洗浄装置であって、
    　前記マスクの前記一方の主面又は前記他方の主面の少なくとも一方の洗浄面に対して洗浄液を供給する洗浄液供給手段と、
    　前記洗浄面に前記洗浄液が付着した前記マスクを前記厚さ方向に直交する方向に搬送する搬送手段と、
    　前記搬送されるマスクの前記洗浄面に対し、前記貫通孔の軸方向に風を供給する第１送風手段と、
    　前記搬送されるマスクの前記洗浄面に対し、前記厚さ方向に対して前記マスクの搬送方向の上流側に傾斜する方向に風を供給する第２送風手段と、を備える、洗浄装置。     A cleaning device for a honeycomb structure sealing mask having a plurality of through holes penetrating in a thickness direction from one main surface to the other main surface,
    Cleaning liquid supply means for supplying a cleaning liquid to at least one cleaning surface of the one main surface or the other main surface of the mask;
    Transport means for transporting the mask having the cleaning liquid adhered to the cleaning surface in a direction perpendicular to the thickness direction;
    First blowing means for supplying air in the axial direction of the through-hole to the cleaning surface of the transported mask;
    A cleaning apparatus comprising: a second air blowing unit configured to supply air in a direction inclined to the upstream side of the transport direction of the mask with respect to the thickness direction with respect to the cleaning surface of the transported mask.
PCT/JP2012/064574 2011-06-09 2012-06-06 Cleaning method and cleaning device for mask for sealing honeycomb structure, and method for manufacturing honeycomb filter WO2012169537A1 (en)

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US20140311534A1 (en) * 2011-12-19 2014-10-23 Sumitomo Chemical Company, Limited Cleaning method and cleaning device for sealing mask, and production method for honeycomb structure
CN104988777A (en) * 2015-04-21 2015-10-21 国家海洋局第一海洋研究所 Scientific expedition ship with steel wire rope rust-proof maintaining device
CN104988778A (en) * 2015-04-21 2015-10-21 国家海洋局第一海洋研究所 Rustproof maintaining device for steel wire rope specially for scientific expedition ship and maintenance method thereof

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JP2001300922A (en) * 2000-04-18 2001-10-30 Ngk Insulators Ltd Method for preparing ceramic body
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US20140311534A1 (en) * 2011-12-19 2014-10-23 Sumitomo Chemical Company, Limited Cleaning method and cleaning device for sealing mask, and production method for honeycomb structure
CN104988777A (en) * 2015-04-21 2015-10-21 国家海洋局第一海洋研究所 Scientific expedition ship with steel wire rope rust-proof maintaining device
CN104988778A (en) * 2015-04-21 2015-10-21 国家海洋局第一海洋研究所 Rustproof maintaining device for steel wire rope specially for scientific expedition ship and maintenance method thereof

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