KR100992302B1 - 광학계, 노광장치 및 디바이스 제조방법 - Google Patents

광학계, 노광장치 및 디바이스 제조방법 Download PDF

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Publication number
KR100992302B1
KR100992302B1 KR1020080074836A KR20080074836A KR100992302B1 KR 100992302 B1 KR100992302 B1 KR 100992302B1 KR 1020080074836 A KR1020080074836 A KR 1020080074836A KR 20080074836 A KR20080074836 A KR 20080074836A KR 100992302 B1 KR100992302 B1 KR 100992302B1
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KR
South Korea
Prior art keywords
refractive optical
distortion
refractive
optical system
optical member
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020080074836A
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English (en)
Korean (ko)
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KR20090013132A (ko
Inventor
수 와타나베
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20090013132A publication Critical patent/KR20090013132A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
KR1020080074836A 2007-07-31 2008-07-31 광학계, 노광장치 및 디바이스 제조방법 Expired - Fee Related KR100992302B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-00199894 2007-07-31
JP2007199894A JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20090013132A KR20090013132A (ko) 2009-02-04
KR100992302B1 true KR100992302B1 (ko) 2010-11-05

Family

ID=40439798

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KR1020080074836A Expired - Fee Related KR100992302B1 (ko) 2007-07-31 2008-07-31 광학계, 노광장치 및 디바이스 제조방법

Country Status (3)

Country Link
JP (1) JP5118407B2 (enExample)
KR (1) KR100992302B1 (enExample)
TW (1) TWI397781B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP7005364B2 (ja) * 2018-01-29 2022-01-21 キヤノン株式会社 投影光学系、露光装置、物品の製造方法及び調整方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100514063B1 (ko) 2002-11-08 2005-09-13 캐논 가부시끼가이샤 투영광학계와 노광장치
KR100566261B1 (ko) 2003-09-02 2006-03-29 캐논 가부시끼가이샤 투영광학계, 노광장치 및 디바이스의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142501A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法
JP2002250865A (ja) * 2000-06-14 2002-09-06 Nikon Corp 投影光学系、露光装置、およびそれらの製造方法
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2005024814A (ja) * 2003-07-01 2005-01-27 Nikon Corp 投影光学系、露光装置および露光方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100514063B1 (ko) 2002-11-08 2005-09-13 캐논 가부시끼가이샤 투영광학계와 노광장치
KR100566261B1 (ko) 2003-09-02 2006-03-29 캐논 가부시끼가이샤 투영광학계, 노광장치 및 디바이스의 제조방법

Also Published As

Publication number Publication date
TWI397781B (zh) 2013-06-01
JP2009038152A (ja) 2009-02-19
TW200912562A (en) 2009-03-16
JP5118407B2 (ja) 2013-01-16
KR20090013132A (ko) 2009-02-04

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