KR100941762B1 - 펠리클프레임 가공방법 - Google Patents
펠리클프레임 가공방법 Download PDFInfo
- Publication number
- KR100941762B1 KR100941762B1 KR1020070120176A KR20070120176A KR100941762B1 KR 100941762 B1 KR100941762 B1 KR 100941762B1 KR 1020070120176 A KR1020070120176 A KR 1020070120176A KR 20070120176 A KR20070120176 A KR 20070120176A KR 100941762 B1 KR100941762 B1 KR 100941762B1
- Authority
- KR
- South Korea
- Prior art keywords
- processing
- cutting
- base
- pellicle frame
- raw material
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims (3)
- 알루미늄 판재를 소재로 펠리클 프레임 가공하는 방법에 있어서,소재(1)에 묻힘 볼트홀(1a)을 가공하는 볼트홀 가공공정(S1단계)과; 소재(1)의 내경을 필요한 부분만을 남기고 절단하고 다수의 볼트로 베이스(A)에 소재(1)를 고정한 후 페이스(face) 커터(cutter)로 두께를 가공하는 소재 절단ㆍ두께 가공공정(S2단계)과; 절단한 소재(1)를 다수의 볼트로 커팅용 홈(Aa)이 있는 베이스(A)에 고정하여 필요로 하는 두께가 되도록 커팅공구(T1)로 소재(1)를 가공함과 더불어 외경(3)을 가공하는 소재 두께 및 외경 가공공정(S3 단계)과; 소재(1)를 다수의 볼트로 베이스(A)에 고정하여 T-커팅공구(T2)로 T-커팅하는 T-커팅공정(S4단계)과; 소재(1)를 다수의 볼트로 베이스(A)에 고정하여 양면면취공구(T3)로 소재(1)의 상하 모서리부를 면취 가공하는 외경 면취가공공정(S5단계) 및; 고정용 지그(4)를 사용하여 누름턱(4 a)으로 소재(1)를 베이스(A)에 고정하고, 소재(1)의 내경을 가공함과 더불어 내경의 상하 모서리부를 면취 가공하는 내경 면취가공공정(S6단계)으로 이루어지고;상기 면취 가공공정(S5단계 및 S6단계)은 소재(1)를 균일한 힘으로 베이스(A)에 고정하도록 누름턱(4a)을 구비한 고정지그(4)를 사용하여 소재(1)를 베이스(A)에 고정하여 면취 가공하는 것을 특징으로 하는 펠리클 프레임 가공방법.
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070120176A KR100941762B1 (ko) | 2007-11-23 | 2007-11-23 | 펠리클프레임 가공방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070120176A KR100941762B1 (ko) | 2007-11-23 | 2007-11-23 | 펠리클프레임 가공방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090053354A KR20090053354A (ko) | 2009-05-27 |
KR100941762B1 true KR100941762B1 (ko) | 2010-02-11 |
Family
ID=40860874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070120176A KR100941762B1 (ko) | 2007-11-23 | 2007-11-23 | 펠리클프레임 가공방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100941762B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101434550B1 (ko) * | 2013-02-01 | 2014-08-26 | (주)에스피텍 | 펠리클 프레임 가공용 고정지그 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100419742B1 (ko) * | 2003-05-26 | 2004-02-25 | 권선용 | 펠리클용 프레임의 제조방법 |
KR100505148B1 (ko) * | 2004-04-01 | 2005-07-29 | 권선용 | 펠리클 프레임 박판 가공용 고정 지그 |
JP2006284927A (ja) | 2005-03-31 | 2006-10-19 | Nippon Light Metal Co Ltd | ペリクル、支持枠、枠体および枠体の製造方法 |
-
2007
- 2007-11-23 KR KR1020070120176A patent/KR100941762B1/ko not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100419742B1 (ko) * | 2003-05-26 | 2004-02-25 | 권선용 | 펠리클용 프레임의 제조방법 |
KR100505148B1 (ko) * | 2004-04-01 | 2005-07-29 | 권선용 | 펠리클 프레임 박판 가공용 고정 지그 |
JP2006284927A (ja) | 2005-03-31 | 2006-10-19 | Nippon Light Metal Co Ltd | ペリクル、支持枠、枠体および枠体の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101434550B1 (ko) * | 2013-02-01 | 2014-08-26 | (주)에스피텍 | 펠리클 프레임 가공용 고정지그 |
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Publication number | Publication date |
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KR20090053354A (ko) | 2009-05-27 |
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