KR100930838B1 - Suction pad molding method of semiconductor package transfer device and suction pad of semiconductor package transfer device manufactured thereby - Google Patents

Suction pad molding method of semiconductor package transfer device and suction pad of semiconductor package transfer device manufactured thereby Download PDF

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KR100930838B1
KR100930838B1 KR1020070125288A KR20070125288A KR100930838B1 KR 100930838 B1 KR100930838 B1 KR 100930838B1 KR 1020070125288 A KR1020070125288 A KR 1020070125288A KR 20070125288 A KR20070125288 A KR 20070125288A KR 100930838 B1 KR100930838 B1 KR 100930838B1
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forming
solder balls
sealing wall
wall
semiconductor package
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KR1020070125288A
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Korean (ko)
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KR20090058625A (en
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이성범
임양수
오윤환
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(주)아이콘
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/04Mounting of components, e.g. of leadless components
    • H05K13/0404Pick-and-place heads or apparatus, e.g. with jaws
    • H05K13/0408Incorporating a pick-up tool

Abstract

본 발명에서는 대량생산과 충분한 생산성을 확보하는 압축성형에 의하여도 그 제작이 가능하며, 충분한 지지구조물로서 솔더볼 사이에 삽입되어져 패키지를 밀착시키는 반도체 패키지 이송장치의 흡착패드 성형방법 및 이에 따른 흡착패드를 제공한다.In the present invention, it can be manufactured by compression molding to ensure mass production and sufficient productivity, and the adsorption pad forming method and the adsorption pad according to the semiconductor package transfer device inserted between the solder balls as a sufficient support structure to adhere the package. to provide.

이를 위한 본 발명은 흡착패드의 모울드 성형을 위해 흡착패드의 하면을 경계로 성형틀을 구분하고, 흡착패드의 하면을 성형하는 성형틀에 연삭가공으로 평행된 한쌍의 가로홈과 한쌍의 세로홈을 형성시켜, 교차되어 폐구간을 이루는 성형홈을 통해 돌출밀폐벽을 흡착패드 하면에 일체로 성형시킨 것이다. To this end, the present invention divides the molding frame by the boundary of the lower surface of the adsorption pad for molding the mold of the adsorption pad, and forms a pair of horizontal grooves and a pair of longitudinal grooves parallel to the molding frame for forming the lower surface of the adsorption pad by grinding processing. It is formed by integrally molded on the lower surface of the adsorption pad through the forming grooves intersecting and forming a closed section.

이때, 상기 연삭가공에 의해 성형홈의 단면은 테이퍼홈으로 가공되며, 이러한 테이퍼홈은 간단하면서 확실한 돌출밀폐벽의 기능을 유지하게 된다. 즉, 중앙으로부터 벌어지는 테이퍼각도와 돌출밀폐벽의 돌출길이에 의해 돌출밀폐벽과 흡착패드 몸체 하면의 경계인 지지부는 솔더볼 사이간격을 월등히 초과하여도 무방하며, 이에 의해 충분한 두께를 가진 구조물이 형성되고, 상기 테이퍼각도에 의하여 그 단부는 솔더볼 사이간벽 보다 월등히 협소하여 마치 선접촉되는 부분이 형성된다. At this time, the end surface of the forming groove is processed into a tapered groove by the grinding process, and the tapered groove maintains the function of the simple and reliable protrusion sealing wall. That is, by the taper angle extending from the center and the protruding length of the protruding sealing wall, the supporting portion, which is the boundary between the protruding sealing wall and the lower surface of the suction pad body, may exceed the spacing between the solder balls so that a structure having a sufficient thickness is formed. Due to the taper angle, the end portion is narrower than the wall between the solder balls, so that a portion which is in line contact is formed.

Description

반도체 패키지 이송장치의 흡착패드 성형방법 및 이에 의해 제조된 반도체 패키지 이송장치의 흡착패드{Absorbing-Pad Moulding Method for Semiconductor-Package Transfer Apparatus and Absorbing-Pad therof} A method for forming a suction pad of a semiconductor package transfer device and an adsorption pad for a semiconductor package transfer device manufactured by the same {Absorbing-Pad Molding Method for Semiconductor-Package Transfer Apparatus and Absorbing-Pad therof}

도 1 은 종래 흡착패드 및 이것의 문제점을 설명하기 위한 개념도,1 is a conceptual diagram illustrating a conventional adsorption pad and problems thereof;

도 2 는 본 발명에 따른 반도체 패키지 이송장치의 흡착패드 성형방법을 위한 금형모울딩의 개념도,2 is a conceptual view of a mold molding for the adsorption pad forming method of a semiconductor package transfer device according to the present invention;

도 3 은 본 발명의 흡착패드를 나타낸 외관설명도,3 is an external view illustrating an adsorption pad of the present invention;

도 4 는 본 발명에 따른 흡착패드를 나타낸 확대단면 설명도이다.Figure 4 is an enlarged cross-sectional explanatory view showing a suction pad according to the present invention.

- 도면의 주요부분에 대한 부호의 설명 --Explanation of symbols for the main parts of the drawings-

3 - 솔더볼, 4 - 패키지,3-solder ball, 4-package,

10 - 돌출밀폐벽, 12 - 흡착패드,10-protrusion sealing wall, 12-suction pad,

14,14' - 금형틀, 16 - 가로홈,14,14 '-Mold, 16-Horizontal groove,

18 - 세로홈, 20 - 성형홈,18-longitudinal groove, 20-forming groove,

22 - 지지부, 24 - 테이퍼부,22-support, 24-taper,

26 - 첨예단, 28 - 지지벽.26-sharps, 28-support walls.

본 발명은 반도체 패키지를 흡착시켜 이송시키는 피커에 장착되는 흡착패드에 관한 것으로, 더욱 상세하게는 솔더볼이 형성된 패키지 면을 흡착시키는 흡착패드에 관한 것이며, 제조가 간단하고 충분한 흡착기능을 확보하는 흡착패드에 관한 것이다.The present invention relates to an adsorption pad mounted on a picker for adsorbing and transporting a semiconductor package, and more particularly, to an adsorption pad for adsorbing a package surface on which solder balls are formed. It is about.

일반적으로, 반도체 패키지는 에폭시 또는 구리로 된 기판상에 트랜지스터 및 캐피시터 등과 같은 집적회로가 형성된 반도체칩을 붙인 후에 반도체기판의 상면에 레진수지로 몰딩한 다음, 기판의 하면에 리드 역할을 하는 솔더볼을 접착시켜 칩과 통전을 하도록 형성시킨 후에, 쏘잉머신을 통하여 낱개로 절단하는 싱귤레이션작업을 수행하여 마련된다.In general, a semiconductor package attaches a semiconductor chip on which an integrated circuit such as a transistor and a capacitor is formed on a substrate made of epoxy or copper, molds it with resin paper on the upper surface of the semiconductor substrate, and then attaches a solder ball to the lower surface of the substrate. After the adhesive is formed to conduct electricity with the chip, it is prepared by performing a singulation operation that is individually cut through the sawing machine.

상기 싱귤레이션은 세척과 드라잉공정을 포함하며, 싱귤레이션 후에 흡착장치 및 이송트레이를 통해 패키지를 적재 이송시킨 후(프리 얼라인공정), 검수작업을 거쳐 양품과 불량품을 선별한 다음, 픽 앤 플레이스 장치를 통해 선별적재가 수행된다.The singulation includes a washing and drying process, and after singulation, the package is loaded and transported through an adsorption device and a transfer tray (pre-alignment process), and after inspection, the good and defective items are selected, and then Selective loading is performed via a place device.

이때, 상기 흡착장치 또는 픽 앤 플레이스 장치에 패키지를 흡착시키기 위한 피커가 장착되며 이 피커의 말단에 흡입력을 유지하기 위한 흡착패드가 장착된다. 특히 솔더볼이 형성된 패키지 면을 흡착시키기 위한 것은 예를 들어, 대한민국 출원 제10-2003-0021330호(명칭:반도체 패키지의 진공흡착피커)나 출원 제10-2005-0008189호(명칭:반도체 제조공정용 흡착패드), 출원 제10-2005-0008190(명칭:반도체 제조공정용 흡착패드) 등에 공지되어 있고, 이러한 흡착패드를 성형하기 위한 장치나 방법으로는 출원 제10-2004-0096957호(명칭:고무패드 가공방법)이나 출원 제10-2006-0007349호(명칭:반도체 제조공정용 흡착패드 가공장치 및 가공방법) 등에 의해 알려져 있다.At this time, a picker for adsorbing the package is mounted on the adsorption device or the pick and place device, and an adsorption pad is installed at the end of the picker to maintain suction force. In particular, for adsorbing the surface of the solder ball is formed, for example, Republic of Korea Application No. 10-2003-0021330 (name: vacuum adsorption picker of semiconductor package) or Application No. 10-2005-0008189 (name: for semiconductor manufacturing process Adsorption pad), application No. 10-2005-0008190 (name: adsorption pad for semiconductor manufacturing process), and the like, and an apparatus and a method for molding such an adsorption pad are disclosed in Application No. 10-2004-0096957 (name: rubber Pad processing method) and Application No. 10-2006-0007349 (name: adsorption pad processing apparatus and processing method for semiconductor manufacturing process) and the like.

본 발명은 특히, 솔더볼이 형성된 반도체 패키지 면을 흡착시키기 위한 흡착패드와 이러한 흡착패드를 성형하기 위한 방법 등에 관련된다.In particular, the present invention relates to an adsorption pad for adsorbing a surface of a semiconductor package on which solder balls are formed, a method for molding such an adsorption pad, and the like.

종래 흡착패드로부터 발생되는 문제점은 솔더볼이 형성된 패키지면을 흡착시키기 흡착기능의 하락과 성형의 불합리로부터 야기된다.Problems arising from the conventional adsorption pads are caused by a decrease in adsorption function and absurdity of molding to adsorb the package surface on which the solder balls are formed.

이를 좀 더 구체적으로 설명하면, 먼저 싱귤레이션이 완료된 반도체 패키지의 크기는 그 가로 세로변으로 다수의 컴비네이션을 갖고 있다. 예를 들어, 4 X 4, 4 X 4.5, 4 X 5 ···, 5 X 5, 5 X 5.5···(단위mm)등등으로 가로 세로변이 그 크기에 따라 다르게 되어, 약 300 가지에 이르고 있다. 그리고 솔더볼의 크기와 피치(솔더볼의 배치간격) 역시 다르며, 상기 솔더볼의 크기를 차치하더라도 솔더볼의 피치는 약 8 가지 정도이다.In more detail, first, the size of the semiconductor package, which has been singulated, has a plurality of combinations along its horizontal and vertical sides. For example, 4 x 4, 4 x 4.5, 4 x 5, 5 x 5, 5 x 5.5, ... have. And the size and pitch of solder balls (solder spacing intervals) are also different, even if the size of the solder ball, the pitch of the solder ball is about 8 kinds.

이러한 상황에서 솔더볼이 형성된 패키지 면을 흡착시키기 위한 흡착패드는 솔더볼의 형성된 구역을 회피하여 에지상부를 밀폐시켜 흡착을 수행하게 되며, 이에 의해 흡착패드는 각각의 패키지 사이즈에 맞추어 별도로 구비되어야 한다.In this situation, the adsorption pad for adsorbing the package surface on which the solder ball is formed is performed to adsorb by sealing the upper portion of the edge to avoid the region where the solder ball is formed, whereby the adsorption pad must be separately provided for each package size.

또한, 패키지 에지상부에 흡착공간이 부족한 경우에는 흡착불량이 발생될 우려가 크게 된다. 이러한 흡착패드 문제점의 개선사항을 전기된 출원 제10-2005-0008190호(명칭:반도체 제조공정용 흡착패드)가 어느 정도 제시하고 있다.In addition, when the adsorption space is insufficient on the package edge, there is a great risk of adsorption failure. The above-mentioned improvement of the problem of the adsorption pad has been described to some extent by the aforementioned application No. 10-2005-0008190 (name: adsorption pad for semiconductor manufacturing process).

당초 이것은 솔더볼의 상부와 대응되는 형상을 가진 다수의 진공흡착홈을 가 진 흡착패드를 제공하고 있다. 즉, 솔더볼이 수용될 수 있는 구형상의 진공흡착홈을 흡착패드에 형성시켜, 이로부터 에지부분으로의 흡착곤란이나 흡착불량을 해소하고 있는 것이다.Initially, this provided a suction pad with a plurality of vacuum suction grooves having a shape corresponding to the top of the solder ball. In other words, a spherical vacuum suction groove capable of accommodating solder balls is formed in the suction pad, thereby eliminating the difficulty of adsorption or poor adsorption to the edge portion.

이것 중 종래의 제3실시예에서는 이것이 발췌된 예시도면 도 1a 및 도 1b 에서와 같이, 흡착패드(1)의 하단에 돌출밀폐벽(2)을 별도로 구비하며, 이러한 돌출밀폐벽(2)은 솔더볼(3) 사이에 삽입되어져 패키지(4) 상면과 밀착됨으로써, 솔더볼(3)이 구비되었다 하더라도 패키지(4) 면을 흡착시키도록 구비되어 있다.In the third exemplary embodiment of the present invention, as illustrated in FIGS. 1A and 1B, the protrusion sealing wall 2 is separately provided at the lower end of the suction pad 1, and the protrusion sealing wall 2 is provided. The solder ball 3 is inserted between the solder balls 3 to be in close contact with the upper surface of the package 4, so that even if the solder ball 3 is provided, the surface of the package 4 is adsorbed.

그러나, 이러한 돌출부의 성형은 극히 까다로운 문제점이 있으며, 성형된 돌출부의 구조물도 충분한 기능을 수행하지 못하게 된다.However, the formation of such protrusions is extremely difficult, and the structure of the molded protrusions does not perform a sufficient function.

예를 들어 도 1c 에서와 같이, 솔더볼(3)의 직경(Ø)이 0.3mm, 볼피치(P) 0.5mm 인 패키지의 경우, 솔더볼 사이의 공간(S)은 0.2mm 에 불과하다. 실질적으로 0.2mm의 두께(t)를 가진 격벽은 극히 박막에 불과하며, 이러한 박막으로 이루어진 돌출밀폐벽을 흡착패드 하부에 일체로 성형시키는 것은 용이하지 않다.For example, as shown in FIG. 1C, in the case of a package having a diameter Ø of the solder ball 3 of 0.3 mm and a ball pitch P of 0.5 mm, the space S between the solder balls is only 0.2 mm. The partition wall having a thickness t of substantially 0.2 mm is only a very thin film, and it is not easy to integrally form the protruding and sealing wall made of such a thin film under the adsorption pad.

상기 종래기술의 기재사항에서는 레이저 가공을 제시하고 있지만, 이러한 박막 더욱이 고무재질의 흡착패드에서 박막으로 이루어진 돌출밀폐벽(2)의 성형은 실제로 곤란하며, 또한 상기 제10-2006-0007349호(명칭:반도체 제조공정용 흡착패드 가공장치 및 가공방법)에서도 가능한 것은 일반적인 패키지 에지 상부에 흡착되기 위한 흡착패드의 성형이다. 아울러, 레이저 가공으로 성형이 가능하다 하더라도 픽-앤드-플레이스에 장착되는 개별의 흡착패드 성형시 그 생산성은 극도로 취약하게 된다.Although the above-described description of the prior art suggests laser processing, it is practically difficult to form the projected airtight wall 2 made of a thin film in a thin film and also an adsorption pad made of rubber material, and the above-mentioned No. 10-2006-0007349 (name) (Sorption Pad Processing Apparatus and Processing Method for Semiconductor Manufacturing Process) is also possible to form a suction pad for adsorption on a general package edge. In addition, even if the molding is possible by laser processing, the productivity is extremely weak when forming the individual adsorption pads mounted on the pick-and-place.

더욱이, 이러한 박막으로 돌출밀폐벽이 성형되었다 하더라도, 일직선상의 극히 간단한 구조물로서 돌출밀폐벽이 성형될 수 밖에 없고, 돌출밀폐벽의 강성을 확보하기 위해 그 벽체의 두께(t)는 솔더볼 사이의 공간(S)에 근접한다.Moreover, even if the projecting sealing wall is formed by such a thin film, the projecting sealing wall is inevitably formed as a straight line structure, and the thickness t of the wall is the space between the solder balls to secure the rigidity of the projecting sealing wall. Close to (S).

이러한 박막의 벽체구조물은 도 1d 에서와 같이, 흡착력(진공압)에 의해 변형이 용이한데, 돌출밀폐벽(2)은 솔더볼(3) 사이에 압착되어 흡착시 솔더볼(3) 사이에서 틀어지게 된다. 이러한 변형의 방향은 복합적인 것으로서, 단순히 측방으로 진행되어 그 굴곡이 형성되는 것은 아니며, 상기 복합적인 방향으로의 틀어짐에 의해 돌출밀폐벽과 패키지 상면과 틈이 발생될 수 있고, 이에 의한 밀폐력 저하의 우려가 크게 된다.The wall structure of such a thin film is easily deformed by adsorption force (vacuum pressure), as shown in FIG. 1D. The protruding and sealing wall 2 is compressed between the solder balls 3 to be distorted between the solder balls 3 during adsorption. . The direction of the deformation is a complex one, it does not simply progress laterally to form a bend, and the protrusion in the complex direction may generate a gap between the protrusion sealing wall and the package top surface, thereby reducing the sealing force. There is a great deal of concern.

그리고, 박막의 벽체구조물에서 강성을 어느 정도 보유시키기 위하여는 돌출길이(h)를 솔더볼의 돌출길이로 근접시켜야 한다. 이것은 돌출길이가 길어지면 그 변형(틀어짐)이 심하기 때문이며, 이 역시 성형에 어려움을 야기시킨다.In addition, in order to retain the rigidity to some extent in the wall structure of the thin film, the protruding length h should be close to the protruding length of the solder ball. This is because the deformation (torsion) is severe when the protrusion length is longer, which also causes difficulty in forming.

아울러, 벽체구조물의 두께(t)가 솔더볼 사이의 공간(s)보다 크게되면 솔더볼(3) 사이에서 끼이게 되어, 마치 종래 스틱킹과 같이 흡착패드와 패키지가 붙게 되는 문제점도 우려된다.In addition, when the thickness t of the wall structure is larger than the space s between the solder balls, the wall is pinched between the solder balls 3, and thus, there is a concern that the adsorption pad and the package may stick together as in conventional sticking.

또한, 이러한 단순한 구조물과 솔더볼 사이에서 압착에 의한 과도한 틀어짐은 피로하중으로 인한 손상을 야기시키게 되며, 예를 들어 100만회의 요구사항을 만족하지 못하게 되므로, 장치(픽 앤 플레이스 장치)의 신뢰성을 하락시키게 되는 것이다.In addition, excessive squeezing between the simple structure and solder balls causes damage due to fatigue load, and for example, it does not satisfy the requirements of 1 million times, which reduces the reliability of the device (pick and place device). It is to be made.

한편, 상기된 제시된 성형에서 엔드밀에 의한 성형방법(출원 제10-2004- 0096957호)에서도 일반적인 패키지 에지 상부에 흡착되기 위한 흡착패드의 성형에 적용되는 것으로서, 상기된 박막의 돌출밀폐벽을 성형하는 것은 더욱 곤란하다.On the other hand, in the above-mentioned molding method, the molding method by the end mill (Application No. 10-2004-0096957) is also applied to the molding of the adsorption pad for adsorption on the top of the general package edge, forming the above-mentioned closed sealing wall of the thin film It is more difficult to do.

이에 본 발명은 대량생산과 충분한 생산성을 확보하는 압축성형에 의하여도 그 제작이 가능하며, 충분한 지지구조물로서 솔더볼 사이에 삽입되어져 패키지를 밀착시키는 반도체 패키지 이송장치의 흡착패드 성형방법 및 이에 따른 흡착패드를 제공함에 그 목적이 있는 것이다.Accordingly, the present invention can be manufactured by compression molding to ensure mass production and sufficient productivity, and a suction pad forming method and a suction pad of the semiconductor package transfer device, which are inserted between solder balls as a sufficient support structure to bring the package into close contact with each other. The purpose is to provide.

이를 위한 본 발명은 흡착패드의 모울드 성형을 위해 흡착패드의 하면을 경계로 성형틀을 구분하고, 흡착패드의 하면을 성형하는 성형틀에 연삭가공으로 평행된 한쌍의 가로홈과 한쌍의 세로홈을 형성시켜, 교차되어 폐구간을 이루는 성형홈을 통해 돌출밀폐벽을 흡착패드 하면에 일체로 성형시킨 것이다.To this end, the present invention divides the molding frame by the boundary of the lower surface of the adsorption pad for molding the mold of the adsorption pad, and forms a pair of horizontal grooves and a pair of longitudinal grooves parallel to the molding frame for forming the lower surface of the adsorption pad by grinding processing. It is formed by integrally molded on the lower surface of the adsorption pad through the forming grooves intersecting and forming a closed section.

이때, 상기 연삭가공에 의해 성형홈의 단면은 테이퍼홈으로 가공되며, 이러한 테이퍼홈은 간단하면서 확실한 돌출밀폐벽의 기능을 유지하게 된다. 즉, 중앙으로부터 벌어지는 테이퍼각도와 돌출밀폐벽의 돌출길이에 의해 돌출밀폐벽과 흡착패드 몸체 하면의 경계인 지지부는 솔더볼 사이간격을 월등히 초과하여도 무방하며, 이에 의해 충분한 두께를 가진 구조물이 형성되고, 상기 테이퍼각도에 의하여 그 단부는 솔더볼 사이간벽 보다 월등히 협소하여 마치 선접촉되는 부분이 형성된다.At this time, the end surface of the forming groove is processed into a tapered groove by the grinding process, and the tapered groove maintains the function of the simple and reliable protrusion sealing wall. That is, by the taper angle extending from the center and the protruding length of the protruding sealing wall, the supporting portion, which is the boundary between the protruding sealing wall and the lower surface of the suction pad body, may exceed the spacing between the solder balls so that a structure having a sufficient thickness is formed. Due to the taper angle, the end portion is narrower than the wall between the solder balls, so that a portion which is in line contact is formed.

이러한 테이퍼단면에 의해 충분한 지지구조물을 갖는 돌출밀폐벽이 형성되며, 흡착력에 충분히 대응하는 지지구조물을 갖게 되고 변형과 복원에 유리하며, 솔더볼 사이에 돌출밀폐벽이 압착되지 않는 구조물로서 성형된다.The tapered end face forms a protrusion sealing wall having a sufficient support structure, and has a support structure corresponding to adsorptive force and is advantageous in deformation and restoration, and is formed as a structure in which the protrusion sealing wall is not pressed between solder balls.

아울러, 한쌍의 가로홈과 한쌍의 세로홈을 연삭가공으로 형성시킴으로써, 그 가공이 간단하고, 모울드 성형에 의해 흡착패드가 성형됨으로써, 성형 역시 간단하여 흡착패드의 가공성과 생산성을 충분히 확보하게 된다.In addition, by forming a pair of horizontal grooves and a pair of longitudinal grooves by the grinding process, the processing is simple, and the adsorption pad is molded by mold molding, so that the molding is also simple and sufficiently secure the workability and productivity of the adsorption pad.

이하, 이 발명이 속하는 기술분야에서 통상의 지식을 갖는 자가 이 발명을 용이하게 실시할 수 있을 정도로 상세히 설명하기 위하여, 이 발명의 가장 바람직한 실시예를 상세히 설명하기로 한다. 이 발명의 목적, 작용효과를 포함하여 기타 다른 목적들, 특징점들이 바람직한 실시예의 설명에 의해 보다 명확해질 것이다.Hereinafter, the most preferred embodiments of the present invention will be described in detail so that those skilled in the art can easily carry out the present invention. Other objects, features, including the effect, the effect of this invention will become more apparent from the description of the preferred embodiment.

예시도면 도 2 는 본 발명에 따른 반도체 패키지 이송장치의 흡착패드 성형방법을 위한 금형모울딩의 개념도이고, 예시도면 도 3 은 본 발명의 흡착패드를 나타낸 외관설명도이며, 예시도면 도 4 는 본 발명에 따른 흡착패드를 나타낸 확대단면 설명도이다.Exemplary drawings Figure 2 is a conceptual view of the mold molding for the adsorption pad molding method of the semiconductor package transfer apparatus according to the present invention, Figure 3 is an external view showing the adsorption pad of the present invention, Figure 4 is an illustration An enlarged cross-sectional explanatory view showing a suction pad according to the invention.

본 발명은 솔더볼(3) 사이로 삽입되어 반도체 패키지(4) 상면을 흡착시키는 돌출밀폐벽(10)이 일체로 성형된 흡착패드(12)를 압축성형(모울드 성형)하기 위하여, 흡착패드 하면(12)을 경계로 하여 금형틀(14)(14')을 분리시키고, 상기 흡착패드(12) 하면을 성형하는 금형틀(14)에 연삭가공으로 1쌍의 평행된 가로홈(16)과 1쌍의 평행된 세로홈(18)을 교차되게 형성시켜 성형홈(20)을 형성시키되, 상기 연삭가공에 의해 테이퍼 단면형상으로 상기 성형홈(20)을 형성시켜, 압축성형을 통해 흡착패드(12) 하면에 솔더볼(3) 사이로 삽입되는 테이퍼단면 형상을 갖는 돌출밀폐벽(10)을 성형시키는 반도체 패키지 이송장치의 흡착패드 성형방법이다.The present invention provides a compression pad (mould molding) for the suction pad 12 in which the protruding and sealing wall 10 inserted between the solder balls 3 and adsorbing the upper surface of the semiconductor package 4 is integrally formed. 1 pair of parallel grooves 16 and 1 pair by grinding the mold 14 and 14 ′ with a boundary between the mold molds 14 and 14 ′ and grinding the mold mold 14 forming the lower surface of the suction pad 12. Forming parallel grooves (18) of the parallel to form the forming grooves 20, by forming the forming grooves 20 in the tapered cross-sectional shape by the grinding process, the suction pad 12 through compression molding The adsorption pad molding method of the semiconductor package conveying apparatus which forms the protrusion sealing wall 10 which has the taper cross-sectional shape inserted between the solder balls 3 in the lower surface.

상기 성형홈(20)의 형성에 의한 테이퍼단면 형상을 갖는 돌출밀폐벽(10)의 성형은 상기 테이퍼 각도와 솔더볼(3)의 직경을 초과하는 돌출밀폐벽의 돌출길이에 의해 돌출밀폐벽(10)과 흡착패드(12) 하면과의 경계부분에는 솔더볼 사이의 공간(s)을 초과하는 지지부(22)가 성형되고, 돌출밀폐벽(10)의 단부에는 솔더볼 사이의 간격보다 협소한 첨예단(26)이 성형되는 것을 특징으로 한다.Forming of the protrusion sealing wall 10 having a tapered cross-sectional shape by the formation of the forming groove 20 is the protrusion sealing wall 10 by the protrusion length of the protrusion sealing wall exceeding the taper angle and the diameter of the solder ball (3). ) And a support portion 22 exceeding the space s between the solder balls is formed at the boundary between the lower surface of the suction pad 12 and the sharp edge of the protrusion sealing wall 10 that is narrower than the gap between the solder balls. 26) is molded.

이때, 상기 테이퍼 각도는 솔더볼(3) 사이의 패키지(4) 상면 중앙지점과 솔더볼의 접선과 솔더볼(3)의 수직접선 사이의 각도로 형성된다. 이에 의해 돌출밀폐벽의 지지부(22) 두께(T)는 돌출밀폐벽(10)의 돌출길이(H)가 증가될 수록 두꺼워지며, 상기 테이퍼 각도에 의해 상기 지지부의 두께(T)는 솔더볼(3) 사이의 간격으로부터 회피되어 솔더볼 사이의 공간(s)을 월등히 초과하는 두께(T)로 형성된다.In this case, the taper angle is formed at an angle between the center point of the upper surface of the package 4 between the solder balls 3 and the tangent of the solder balls and the perpendicular tangent of the solder balls 3. As a result, the thickness T of the support part 22 of the protrusion sealing wall becomes thicker as the protrusion length H of the protrusion sealing wall 10 increases, and the thickness T of the support part is determined by the taper angle. The thickness T is avoided from the gaps between the solder balls and exceeds the space s between the solder balls.

이에 따라, 상기 성형홈(20)에 따른 돌출밀폐벽(10)의 형성은 돌출길이(H)를 증가시킴에 비례하여 지지부(22)의 두께(T)를 증가시키는 성형방법임을 특징으로 한다.Accordingly, the formation of the protrusion sealing wall 10 according to the forming groove 20 is characterized in that the molding method of increasing the thickness (T) of the support portion 22 in proportion to increasing the protrusion length (H).

한편, 본 발명은 이러한 반도체 패키지 이송장치의 흡착패드 성형방법에 의해 제조된 반도체 패키지 이송장치의 흡착패드인 것을 특징으로 한다.On the other hand, the present invention is characterized in that the suction pad of the semiconductor package transfer device manufactured by the suction pad molding method of the semiconductor package transfer device.

즉, 본 발명은 상기 본 발명의 반도체 패키지 이송장치의 흡착패드 성형방법에 의해 흡착패드(12) 몸체 하면에 돌출밀폐벽(10)이 일체로 형성되며, 상기 돌출밀폐벽(10)은 솔더볼(3) 사이의 간격을 초과하여 흡착패드(12)의 하면 경계에 형성된 지지부(22)와, 이 지지부(22)로부터 돌출밀폐벽(10)이 솔더볼(3) 사이로 삽입되기 위하여 상기 지지부(22)의 양단에서 돌출밀폐벽(10)의 돌출길이(H)에 따라 중앙 으로 교차되게 형성된 테이퍼부(24) 및 상기 테이퍼부(24)의 교차지점인 말단에 형성되어 상기 패키지 상부에 접촉되는 첨예단(26)으로 이루어진 반도체 패키지 이송장치의 흡착패드이다.That is, according to the present invention, the protrusion sealing wall 10 is integrally formed on the lower surface of the body of the suction pad 12 by the suction pad forming method of the semiconductor package transfer device of the present invention, and the protrusion sealing wall 10 is a solder ball ( 3) the support portion 22 formed at the lower boundary of the suction pad 12 in excess of the gap between the support portion 22 and the support portion 22 so that the protruding and sealing wall 10 is inserted between the solder balls 3 from the support portion 22. At the opposite ends of the tapered portion 24 formed to intersect the center according to the protruding length (H) of the protruding and sealing wall 10 and the cutting edge is formed at the end that is the intersection of the tapered portion 24 is in contact with the top of the package It is a suction pad of the semiconductor package conveying apparatus which consists of 26.

이를 위한, 상기 테이퍼부(24)는 솔더볼(3) 사이의 패키지(4) 상면 중앙지점과 솔더볼(3)의 접선으로부터 솔더볼(3)의 수직접선 사이의 각도로 형성된 것을 특징으로 한다.To this end, the tapered portion 24 is characterized in that formed at an angle between the center point of the upper surface of the package 4 between the solder ball 3 and the vertical tangent of the solder ball 3 from the tangent of the solder ball 3.

상기 돌출밀폐벽(10)이 전기된 바와 같이, 연삭가공으로 형성된 성형홈에 의해 형성됨에 따라, 돌출밀폐벽의 외측 모서리에 흡착패드 몸체까지 연장된 구조물이 형성된다.As the protrusion sealing wall 10 is formed by the forming groove formed by the grinding process, a structure extending to the suction pad body is formed at the outer edge of the protrusion sealing wall.

이러한 구조물은 돌출밀폐벽의 모서리를 지지하여 흡착을 위한 사각의 폐구간을 지지하게 되며, 따라서 돌출밀폐벽의 모서리에는 그 벽체의 연장선상으로 교차되어 지지벽(28)이 일체로 성형된 것을 특징으로 한다.Such a structure supports the corners of the protrusion sealing wall to support the rectangular closed section for adsorption. Therefore, the supporting wall 28 is integrally formed at the corners of the protrusion sealing wall by crossing the extension lines of the wall. It is done.

상술된 바와 같이 본 발명은 대량생산과 충분한 생산성을 확보하는 모울드 성형에 의하여도 그 제작이 가능하며, 충분한 지지구조물로서 솔더볼 사이에 삽입되어져 패키지를 밀착시키는 돌출밀폐벽을 갖는 반도체 패키지 공정처리용 흡착패드 성형방법 및 이에 따른 흡착패드를 제공한다.As described above, the present invention can be manufactured by mold molding to ensure mass production and sufficient productivity, and is adsorbed for processing a semiconductor package having a protrusion sealing wall inserted between solder balls as a sufficient support structure to adhere the package. Provided are a pad molding method and a suction pad accordingly.

좀 더 구체적으로, 본 발명의 흡착패드(12)는 모울드 성형에 의해 제조된다. 이를 위해 도 2 에서와 같이, 솔더볼 사이로 삽입되어 반도체 패키지 상면을 흡착시키는 돌출밀폐벽이 일체로 성형된 흡착패드를 모울드성형하기 위하여, 흡착패드 하면을 경계로 하여 금형틀이 분리된다.More specifically, the adsorption pad 12 of the present invention is produced by mold molding. To this end, as shown in FIG. 2, in order to mold a suction pad in which a protrusion sealing wall inserted into the solder balls and adsorbing the upper surface of the semiconductor package is integrally formed, the mold frame is separated on the lower surface of the suction pad.

예를 들어, 상부금형과 하부금형으로 분리되며, 도시된 것은 그 개념을 설명하기 위한 것으로 상부금형과 하부금형은 반전될 수 있다.For example, the upper mold and the lower mold, which is divided into the upper mold and the lower mold to illustrate the concept can be reversed.

상기 금형틀(14)(14') 중 흡착패드(12) 하면을 성형하는 금형틀(14)에 돌출밀폐벽을 성형하기 위한 성형홈(20)이 형성된다. 이때, 성형홈(20)은 연삭가공으로 형성되며, 이러한 연삭가공을 위해 상기된 바와 같이 흡착패드의 하면을 경계로 성형틀이 분리된 것이다.Forming grooves 20 for forming the protruding and sealing walls are formed in the mold 14 for forming the lower surface of the suction pad 12 among the molds 14 and 14 '. At this time, the forming groove 20 is formed by the grinding process, the mold is separated by the boundary of the lower surface of the suction pad as described above for the grinding process.

상기 성형홈(20)은 연삭가공으로 1쌍의 평행된 가로홈(16)과 1쌍의 평행된 세로홈(18)을 교차되게 형성시켜 수행되며, 성형틀에 흡착을 위한 밀폐구역으로서 폐구간이 형성된다.The forming groove 20 is performed by forming a pair of parallel transverse grooves 16 and a pair of parallel longitudinal grooves 18 by the grinding process, and closed section as a closed area for adsorption on the forming mold. Is formed.

상기 성형홈(20)은 연삭가공에 의해 테이퍼 단면형상으로 가공되며, 사각 폐구간을 결정하는 가로와 세로 간격이 고려되어 가로홈(16)과 세로홈(18)의 평행 이격거리가 결정된다.The forming groove 20 is processed into a tapered cross-sectional shape by grinding, and the horizontal separation distance of the horizontal groove 16 and the vertical groove 18 is determined in consideration of the horizontal and vertical spacing to determine the rectangular closed section.

상기 테이퍼 단면, 즉 중앙을 향하여 교차되는 경사면을 갖는 단면에 의해 면보다는 선에 가까울 정도의 접촉부로서 첨예단을 돌출밀폐벽에 모울드 성형하게되며, 이에 의해 솔더볼 사이의 간격에 따른 성형의 곤란성은 충분히 해소된다.The tapered cross section, that is, the cross section having an inclined surface intersecting toward the center, forms a sharp tip into the protrusion sealing wall as a contact portion closer to the line than the face, whereby the difficulty of forming according to the spacing between the solder balls is sufficient. Resolved.

한편, 상기 평행된 가로홈과 세로홈의 교차로서 성형홈이 연삭가공됨에 따라, 복수의 흡착패드를 모울드 성형하기 위한 금형틀에서는 성형홈을 공유하게 된다.On the other hand, as the forming groove is ground as the intersection of the parallel horizontal groove and the vertical groove, the mold groove for molding the plurality of adsorption pads share the forming groove.

즉, 4행 4열로서 16개의 흡착패드를 성형하는 금형틀인 경우, 16쌍의 가로홈과 세로홈을 각각 가공할 필요가 없다. 이것은 바둑판 배열에서 1쌍의 가로홈은 1 열의 가로홈을 모두 가공하게 되며, 1쌍의 세로홈은 1행의 세로홈을 모두 가공하기 때문이다.That is, in the case of a mold for molding 16 suction pads in 4 rows and 4 columns, there is no need to process 16 pairs of horizontal grooves and vertical grooves, respectively. This is because in the checkerboard arrangement, one pair of horizontal grooves processes all one row of horizontal grooves, and one pair of vertical grooves processes all one row of vertical grooves.

이에 의해 특히 복수개의 흡착패드를 모울드 성형하는 금형틀인 경우, 가공에 이득이 있게 되어 가공이 더욱 편리해 진다.As a result, particularly in the case of a mold for molding a plurality of suction pads, there is an advantage in processing, and the processing becomes more convenient.

이러한 압축성형에 의해 도 3 과 같이, 솔더볼 사이에 삽입되어 패키지 상면에 밀착되는 돌출밀폐벽을 갖는 흡착패드가 성형되며, 도 3a 와 같이 돌출밀폐벽의 모서리는 상기 교차된 가로홈과 세로홈에 의해 연장된 구조물이 형성된다.By this compression molding, as shown in FIG. 3, an adsorption pad having a protruding sealing wall inserted between the solder balls and adhered to the upper surface of the package is formed. As shown in FIG. 3A, the corners of the protruding sealing wall are formed in the intersecting horizontal grooves and the vertical grooves. Thereby extending the structure.

도 3b 와 같이 연장된 구조물을 절단 또는 연마하여 제거할 수 있으나, 오히려 연장된 구조물은 돌출밀폐벽의 모서리를 지지하여 흡착을 위한 사각의 폐구간을 지지하는 구조물로서 지지벽의 역할을 수행하게 된다.3b can be removed by cutting or grinding the extended structure, but rather the extended structure supports the corner of the protruding airtight wall to support the rectangular closed section for adsorption and serves as a supporting wall. .

상기 돌출밀폐벽이 중앙을 향하여 교차되는 경사면을 갖는 테이퍼단면의 형상을 갖게 됨에 따라, 도 4 에서와 같이 돌출밀폐벽은 돌출밀폐벽의 두께가 솔더볼 사이의 간격을 초과하여 흡착패드(12)의 하면 경계에 형성된 지지부(22)와, 이 지지부로부터 돌출밀폐벽이 솔더볼 사이로 삽입되기 위하여 상기 지지부의 양단에서 돌출밀폐벽의 돌출길이에 따라 중앙으로 교차되게 형성된 테이퍼부(24) 및 상기 테이퍼부의 교차지점인 말단에 형성되어 상기 패키지 상부에 접촉되는 첨예단(26)으로 이루어진다.As the protrusion sealing wall has the shape of a tapered section having an inclined surface intersecting toward the center, as shown in FIG. 4, the protrusion sealing wall has a thickness of the protrusion sealing wall exceeding the interval between the solder balls so that Intersection between the support portion 22 formed at the lower surface boundary, the tapered portion 24 and the tapered portion formed to intersect centrally according to the protruding length of the protruding sealing wall at both ends of the supporting portion so that the protruding sealing wall is inserted between the solder balls. It consists of a sharp tip 26 formed at the end which is a point and in contact with the top of the package.

여기서, 테이퍼 각도는 솔더볼(3) 사이의 패키지 상면 중앙지점과 솔더볼의 접선과 솔더볼의 수직접선 사이의 각도(θ)로 형성된다. 이에 의해 돌출밀폐벽의 지지부 두께(T)는 돌출밀폐벽의 돌출길이(H)가 증가될 수록 두꺼워지며, 상기 테이퍼 각도에 의해 상기 지지부의 두께는 솔더볼 사이의 공간(s)으로부터 회피되어 솔 더볼 사이의 간격(s)을 월등히 초과하는 두께(T)로 형성된다.Here, the taper angle is formed by the angle θ between the center point of the package upper surface between the solder balls 3 and the tangent of the solder ball and the vertical tangent of the solder ball. As a result, the thickness T of the supporting portion of the protrusion sealing wall becomes thicker as the protrusion length H of the protrusion sealing wall increases, and the thickness of the supporting portion is avoided from the space s between the solder balls by the taper angle. It is formed with a thickness T that significantly exceeds the spacing s therebetween.

이에 의해, 상기 성형홈의 형성은 돌출밀폐벽의 돌출길이를 증가(H - H')시킴에 비례하여 지지부(22)의 두께(T - T')를 증가시키는 성형방법이 되는 것이다.As a result, the forming groove is a forming method of increasing the thickness T-T 'of the support 22 in proportion to increasing the protruding length of the protruding sealing wall (H-H').

한편, 상기 테이퍼부(24)는 돌출밀폐벽이 솔더볼(3) 사이에 삽입될 때, 정위치가 아니더라도 돌출밀폐벽의 테이퍼부가 패키지를 이송시켜 흡착 정위치에 근접하게 가이드하게 된다.On the other hand, the tapered portion 24, when the protrusion sealing wall is inserted between the solder ball (3), even if not in the correct position, the tapered portion of the protrusion sealing wall transports the package and guides closer to the suction position.

또한, 상기 테이퍼부는 솔더볼과의 접촉면(접선)에 대한 법선이 하방을 향하여 솔더볼과 돌출밀폐벽이 압착되는 경우가 원천적으로 방지된다. 즉, 종래와 같은 스틱킹이 원천적으로 방지된다.In addition, the taper portion is essentially prevented from being pressed against the solder ball and the protruding sealing wall toward the downward normal line to the contact surface (tangential line) with the solder ball. That is, sticking as conventionally is prevented at the source.

이것은 흡착압에 의해 돌출밀폐벽이 솔더볼에 압착되더라도 테이퍼면이 솔더볼에 접촉되고, 그 접촉면의 법선방향은 흡착압의 해제시에 솔더볼을 하방으로 밀어내는 탄성력 방향이 되는 것이다. 이에 의해 오히려 돌출밀폐벽은 마치 이젝트 핀의 역할을 수행하게 되어, 돌출밀폐벽이 솔더볼에 압착되는 것이 원천적으로 방지되는 것이다.This is because the tapered surface is in contact with the solder ball even though the projecting sealing wall is pressed against the solder ball by the suction pressure, and the normal direction of the contact surface is the elastic force direction that pushes the solder ball downward when the suction pressure is released. As a result, the protrusion sealing wall acts as an eject pin, thereby preventing the protrusion sealing wall from being pressed onto the solder ball.

상술된 바와 같이 본 발명에 따르면, 흡착패드의 모울드 성형을 위해 흡착패드의 하면을 경계로 성형틀을 구분하고, 흡착패드의 하면을 성형하는 성형틀에 연삭가공으로 평행된 한쌍의 가로홈과 한쌍의 세로홈을 형성시켜, 교차되어 폐구간을 이루는 성형홈을 통해 돌출밀폐벽을 흡착패드 하면에 일체로 성형시킴으로써, 압축성형을 통해 돌출밀폐벽이 일체로 형성된 흡착패드가 성형되어, 흡착패드의 제조가 간단하고 대량생산이 가능하다는 효과가 있다.As described above, according to the present invention, for forming the mold of the adsorption pad, the mold is divided by the lower surface of the adsorption pad, and a pair of horizontal grooves and a pair parallel to the forming mold for forming the lower surface of the adsorption pad are ground by grinding. Forming a vertical groove of the suction pad and integrally forming the protruding sealed wall on the lower surface of the suction pad through the forming grooves intersecting the closed section, thereby forming an absorbent pad integrally formed through the compression molding. The effect is simple and mass production is possible.

이때, 돌출밀폐벽을 성형하기 위한 성형홈은 성형틀에 연삭가공으로 평행된 한쌍의 가로홈과 한쌍의 세로홈을 형성시켜 수행되므로, 가공이 편리하다는 효과가 있다.At this time, the forming groove for forming the protrusion sealing wall is carried out by forming a pair of horizontal grooves and a pair of vertical grooves parallel to the forming mold by grinding, there is an effect that the processing is convenient.

한편, 돌출밀폐벽은 테이퍼단면형상으로 성형되므로, 흡착패드몸체와의 경계인 지지부의 두께는 솔더볼 사이 간격 보다 월등히 두껍게 형성되고 테이퍼단면에 의해 흡착압에 의한 돌출밀폐벽의 변형이 적으며, 상기 테이퍼 단면에 의해 지지부의 두께를 조절할 수 있는 효과가 있다.On the other hand, since the protrusion sealing wall is formed into a tapered cross-sectional shape, the thickness of the support portion, which is the boundary with the suction pad body, is formed to be much thicker than the spacing between the solder balls, and the deformation of the protrusion sealing wall due to the suction pressure is reduced by the tapered cross section. There is an effect that can adjust the thickness of the support by the cross section.

아울러, 돌출밀폐벽이 솔더볼 사이에 삽입될 때, 정위치가 아니더라도 돌출밀폐벽의 테이퍼부가 정위치를 가이드하게 되며, 흡착압에 의해 돌출밀폐벽이 솔더볼에 압착되더라도 테이퍼면이 솔더볼에 접촉되므로, 흡착압의 해제시에 솔더볼을 하방으로 밀어내는 탄성력 방향을 발휘하므로, 돌출밀폐벽이 솔더볼에 압착되는 것이 원천적으로 방지되는 효과가 있다.In addition, when the protrusion sealing wall is inserted between the solder balls, the tapered portion of the protrusion sealing wall guides the correct position even if the protrusion sealing wall is not in the right position, and the tapered surface contacts the solder ball even when the protrusion sealing wall is pressed against the solder ball by suction pressure. Since the direction of the elastic force to push the solder ball downward when the adsorption pressure is released, there is an effect that the protrusion sealing wall is prevented from being pressed on the solder ball at the source.

Claims (6)

솔더볼 사이로 삽입되어 반도체 패키지 상면을 흡착시키는 돌출밀폐벽이 일체로 성형된 흡착패드를 압축성형하기 위하여, 흡착패드 하면을 경계로 하여 금형틀을 분리시키고, 상기 흡착패드 하면을 성형하는 금형틀에 연삭가공으로 1쌍의 평행된 가로홈과 1쌍의 평행된 세로홈을 교차되게 형성시켜 성형홈을 형성시키되, 상기 연삭가공에 의해 테이퍼 단면형상으로 상기 성형홈을 형성시켜, 압축성형을 통해 흡착패드 하면에 솔더볼 사이로 삽입되는 테이퍼단면 형상을 갖는 돌출밀폐벽을 성형시키는 반도체 패키지 이송장치의 흡착패드 성형방법.In order to compress molding the adsorption pads integrally formed with the protrusion sealing wall inserted between the solder balls and adsorbing the upper surface of the semiconductor package, the mold mold is separated on the lower surface of the adsorption pad, and the mold mold is then ground to form the adsorption pad lower surface. Forming grooves by forming a pair of parallel transverse grooves and a pair of parallel longitudinal grooves by processing to form a forming groove, by forming the forming groove in the tapered cross-sectional shape by the grinding process, the suction pad through compression molding A method of forming a suction pad of a semiconductor package transfer device for forming a protrusion sealing wall having a tapered cross-sectional shape inserted into a solder ball between a lower surface thereof. 제 1 항에 있어서, 테이퍼단면 형상을 갖는 돌출밀폐벽의 성형은 테이퍼 각도를 솔더볼 사이의 패키지 상면 중앙지점과 솔더볼의 접선과 솔더볼의 수직접선 사이의 각도로 형성시켜서, 상기 테이퍼 각도와 솔더볼의 직경을 초과하는 돌출밀폐벽의 돌출길이에 의해 돌출밀폐벽과 흡착패드 하면과의 경계부분에는 솔더볼 사이의 간격을 초과하는 지지부가 성형되고, 돌출밀폐벽의 단부에는 솔더볼 사이의 간격보다 협소한 첨예단이 성형시키는 것을 특징으로 하는 반도체 패키지 이송장치의 흡착패드 성형방법.The method of claim 1, wherein the forming of the protrusion sealing wall having a tapered cross-sectional shape forms a taper angle at an angle between the center of the package upper surface between the solder balls, the tangent of the solder balls, and the vertical tangent of the solder balls, and thus the taper angle and the diameter of the solder balls. Due to the protruding length of the protruding airtight wall, the support portion exceeding the gap between the solder balls is formed at the boundary between the protruding airtight wall and the lower surface of the suction pad, and at the end of the protruding airtight wall, narrower than the gap between the solder balls. A suction pad molding method of a semiconductor package transfer device, characterized in that the molding. 제 2 항에 있어서, 지지부의 성형은 돌출밀폐벽의 돌출길이를 증가시킴에 비례하여 지지부의 두께를 증가시키는 반도체 패키지 이송장치의 흡착패드 성형방법.The method of claim 2, wherein the forming of the support portion increases the thickness of the support portion in proportion to increasing the protruding length of the protrusion sealing wall. 반도체 패키지를 흡착시키는 흡착패드 몸체 하면에 솔더볼 사이에 삽입되어 패키지 상면과 밀착되는 돌출밀폐벽이 일체로 형성되며, 상기 돌출밀폐벽은 상기 돌출밀폐벽의 두께가 솔더볼 사이의 간격을 초과하여 흡착패드의 하면 경계에 형성된 지지부와, 이 지지부로부터 돌출밀폐벽이 솔더볼 사이로 삽입되기 위하여 상기 지지부의 양단에서 돌출밀폐벽의 돌출길이에 따라 중앙으로 교차되게 형성된 테이퍼부 및 상기 테이퍼부의 교차지점인 말단에 형성되어 상기 패키지 상부에 접촉되는 첨예단으로 이루어진 반도체 패키지 이송장치의 흡착패드.The protrusion sealing wall is inserted into the lower surface of the adsorption pad body for adsorbing the semiconductor package to be in close contact with the upper surface of the package is formed integrally, the protrusion sealing wall is the suction pad wall thickness of the protrusion sealing wall exceeds the gap between the solder ball Is formed at the end of the support portion formed at the bottom boundary and the tapered portion and the tapered portion formed to intersect centrally along the protruding length of the protruding sealing wall at both ends of the supporting portion so that the protruding sealing wall is inserted between the solder balls from the supporting portion. Adsorption pad of the semiconductor package transfer device is made of a cutting edge being in contact with the package upper portion. 제 4 항에 있어서, 테이퍼부는 솔더볼 사이의 패키지 상면 중앙지점과 솔더볼의 접선으로부터 솔더볼의 수직접선 사이의 각도로 형성된 것을 특징으로 하는 반도체 패키지 이송장치의 흡착패드.The suction pad of claim 4, wherein the tapered portion is formed at an angle between a center point of the upper surface of the package between the solder balls and a vertical tangent of the solder balls from a tangent of the solder balls. 제 4 항에 있어서, 돌출밀폐벽에는 그 모서리에 그 벽체의 연장선상으로 교차되어 지지벽이 일체로 성형된 것을 특징으로 하는 반도체 패키지 이송장치의 흡 착패드.5. The adsorption pad of a semiconductor package transfer device according to claim 4, wherein the support sealing wall is integrally formed on the protruding airtight wall and intersects at an edge thereof in an extension line of the wall.
KR1020070125288A 2007-12-05 2007-12-05 Suction pad molding method of semiconductor package transfer device and suction pad of semiconductor package transfer device manufactured thereby KR100930838B1 (en)

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Citations (4)

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Publication number Priority date Publication date Assignee Title
JPS63124428A (en) * 1986-11-12 1988-05-27 Mitsubishi Electric Corp Sealing apparatus for semiconductor
JPH07142524A (en) * 1993-06-30 1995-06-02 Sgs Thomson Microelettronica Spa Wire connection and tool head
KR20030097900A (en) * 2001-05-25 2003-12-31 말레 게엠베하 Mould and method for the production of a lost-foam casting model for a light metal cylinder liner
KR100584516B1 (en) * 2005-01-28 2006-05-29 한미반도체 주식회사 Absorbing pad for manufacturing semiconductor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63124428A (en) * 1986-11-12 1988-05-27 Mitsubishi Electric Corp Sealing apparatus for semiconductor
JPH07142524A (en) * 1993-06-30 1995-06-02 Sgs Thomson Microelettronica Spa Wire connection and tool head
KR20030097900A (en) * 2001-05-25 2003-12-31 말레 게엠베하 Mould and method for the production of a lost-foam casting model for a light metal cylinder liner
KR100584516B1 (en) * 2005-01-28 2006-05-29 한미반도체 주식회사 Absorbing pad for manufacturing semiconductor

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