KR100904461B1 - Mixture liquid supply apparatus, and facility for treating substrate unsed in ozonated water mixture with the apparatus - Google Patents

Abstract

The present invention relates to an apparatus for supplying a mixed liquid and a facility for treating a substrate having the same. Mixing liquid supply apparatus according to the present invention is a mixing line for receiving the treatment liquid and ozone to mix it to produce an ozone water mixture satisfies a predetermined concentration, a plurality of distribution lines for distributing the generated ozone water mixture to the process unit, distribution line Concentration test lines branching from the air conditioner, a concentration meter for measuring the concentration of the ozone water mixture flowing along the concentration test line, and a discharge line for discharging the ozone water mixture outside the predetermined concentration from the distribution lines and the concentration test lines. The present invention can generate the ozone water mixture by the in-line mixing method, it is possible to precisely manage the concentration of the generated ozone water mixture.

Semiconductor, Wafer, Cleaning, Ozone, Ozone Water, Functional Water, Mixing

Description

MIXTURE LIQUID SUPPLY APPARATUS, AND FACILITY FOR TREATING SUBSTRATE UNSED IN OZONATED WATER MIXTURE WITH THE APPARATUS}

The present invention relates to an apparatus for supplying a mixed liquid, and a facility for processing a substrate by receiving the mixed liquid from the apparatus.

The cleaning process of the semiconductor manufacturing process is a process of removing foreign matter remaining on the wafer. In this cleaning process, the wet cleaning process uses various kinds of treatment liquids to clean foreign substances remaining on the wafer surface. For example, in the wet cleaning process, the ozone cleaning process uses a solution of ozone and ultrapure water or a treatment liquid (hereinafter referred to as an ozone water mixture) and a photoresist and organic residue remaining on the wafer surface. It is a process to remove contaminants.

The apparatus for performing this ozone cleaning process has a mixing vessel, a buffer vessel, and a circulation line. The mixing vessel receives a treatment solution and ozone therein and provides a space for mixing the mixture and generating an ozone water mixture. Ultrapure water or various kinds of acid alkaline chemicals may be used as the treatment liquid. As a mixing vessel, a mixing tank is used. The buffer container receives the ozone water mixture from the mixing container and sprays the wafer into the wafer to supply the process unit to clean the wafer. The circulation line circulates the ozone and the treatment liquid in the mixing vessel and circulates to produce an ozone water mixture liquid satisfying a predetermined process concentration. The concentration line is installed in the circulation line.

However, the ozone cleaning device described above is difficult to control the concentration of the ozone water mixture. That is, since ozone (O₃) is easily reduced to oxygen gas (O, O₂), the ozone cleaning apparatus described above is generated in a mixing vessel and then stored in the mixing vessel, and the ozone water mixture is gradually reduced in ozone water mixture. It is not easy to manage the concentration. In addition, when the supply time of the ozone water mixture to the unit on which the process is performed increases, the concentration of the ozone water mixture in the standby state of supplying the device changes, so that it is difficult to maintain the concentration of the ozone water mixture. Cleaning efficiency is lowered when using ozone water mixture that does not satisfy the usual concentration.

In addition, since the lengths of the lines supplying the ozone water mixture from the buffer container to the respective process chambers are different, the concentration of the ozone water mixture supplied by the respective lines is not constant, so that the wafer cleaning rate of each process chamber is different. can do.

The present invention provides a mixed liquid supply apparatus for improving the efficiency of the process of removing foreign substances on the surface of the substrate, and an apparatus for treating the substrate using an ozone water mixture having the same.

The present invention provides a mixed solution supply apparatus for effectively managing the concentration of the ozone water mixture, and a facility for treating the substrate using the ozone water mixture having the same.

The mixed liquid supply apparatus according to the present invention includes a first processing liquid supply line for supplying a first processing liquid, a second processing liquid supply line for supplying a second processing liquid, the first processing liquid supply line, and the second processing liquid supply A mixing line receiving a first processing liquid and a second processing liquid from each of the lines to mix the first processing liquid and the second processing liquid to generate a mixed liquid, a manifold receiving the mixed liquid generated by the mixing line, A plurality of distribution lines for supplying a mixed solution to the plurality of process units in which the substrate treatment process is performed from the manifold, a concentration test line branching from the distribution line, and a concentration test line installed on the concentration test line It includes a concentration meter for measuring the concentration of the mixed liquid flowing along.

According to an embodiment of the present invention, the concentration inspection line has a plurality of inspection lines branched from each of the distribution lines and an integration line integrating the inspection lines into one, and the concentration meter is installed in the integration line.

According to an embodiment of the present invention, the mixed liquid supply device includes a discharge line which is branched from each of the inspection line to discharge the mixed liquid in the inspection lines.

According to an embodiment of the present invention, the inspection line branches from a portion adjacent to the discharge end of the distribution line.

According to an embodiment of the invention, the distribution lines are provided with the same length to each other.

According to an embodiment of the present invention, at least one of the distribution lines has a coil-shaped line.

The substrate treating apparatus using the ozone water mixture according to the present invention generates a ozone water mixture by receiving a processing fluid from a plurality of process units performing a substrate treating process, a processing fluid storage unit storing a processing fluid, and a processing fluid storage unit. And a mixed liquid dispensing unit configured to distribute the mixed liquid generating unit and the ozone water mixed liquid generated by the mixed liquid generating unit to the process unit, wherein the mixed liquid generating unit supplies a first processing liquid supply line for supplying a treating liquid and supplying ozone water. A second treatment liquid supply line, and a mixing line receiving the treatment liquid and the ozone water from each of the first treatment liquid supply line and the second treatment liquid supply line to mix the treatment liquid and the ozone water to generate an ozone water mixture solution. The mixed solution distribution unit receives the ozone water mixture produced by the mixing line. A manifold, a plurality of distribution lines for supplying a mixed solution to a plurality of process units in which a substrate processing process is performed from the manifold, a concentration test line branching from the distribution line, and a concentration test line installed on the concentration test line It includes a concentration meter for measuring the concentration of the mixed liquid flowing along the test line.

According to an embodiment of the present invention, the concentration test line has a plurality of test lines branched from each of the distribution lines and an integrated line integrating the test lines into one, and the concentration meter is installed in the integrated line.

According to an embodiment of the present invention, the mixed liquid supply device includes a discharge line which is branched from each of the inspection line to discharge the mixed liquid in the inspection lines.

According to an embodiment of the present invention, the inspection line branches from a portion adjacent to the discharge end of the distribution line.

According to an embodiment of the invention, the distribution lines are provided with the same length to each other.

According to an embodiment of the present invention, at least one of the distribution lines has a coil-shaped line.

The apparatus for treating a substrate using the mixed liquid supply device and the ozone water mixed liquid according to the present invention performs precise concentration management of the mixed ozone water mixture.

The apparatus for treating a substrate using the mixed liquid supply apparatus and the ozone water mixed liquid according to the present invention reduces the drainage amount of the ozone water mixed liquid, thereby reducing the maintenance cost of the mixed liquid supply apparatus.

The apparatus for treating a substrate using the mixed liquid supply device and the ozone water mixed liquid according to the present invention improves cleaning uniformity by supplying a uniform concentration of ozone water mixed liquid for each process chamber.

Hereinafter, with reference to the accompanying drawings will be described in detail the processing equipment and method for treating a substrate using a mixed solution supply apparatus according to an embodiment of the present invention, and an ozone water mixture having the same. Embodiment of the present invention may be modified in various forms, the scope of the present invention is not limited to the embodiments described below. This embodiment is provided to more fully explain the present invention to those skilled in the art, that is, to those skilled in the art. Accordingly, the shape of elements in the figures is exaggerated to emphasize clear explanation.

In addition, the embodiment of the present invention will be described by taking an example of a single-layer cleaning equipment for removing foreign matter remaining on the surface of the semiconductor substrate using the ozone water mixture. However, the present invention can be applied to any apparatus using various kinds of mixed liquids.

1 is a view showing a substrate processing equipment according to the present invention, Figure 2 is a plan view showing a process unit and a mixed liquid supply unit shown in FIG. 3 is a view showing the configuration of the process chamber shown in FIG.

1 to 3, a facility for treating substrate 1 according to the present invention is a process of treating a semiconductor substrate (hereinafter referred to as “wafer”) W using a mixture. Do this. The substrate processing apparatus 1 includes a process unit 10, a mixture supply unit 20, 30, 40, a drain unit 50, and a control unit. (60).

The process unit 10 performs a cleaning process to remove foreign substances remaining on the wafer W. The mixed liquid supply unit 20, 30, 40 generates a mixed liquid and supplies the mixed liquid to the process unit 10. In one embodiment, the mixed liquor is an ozonated water mixture. The ozone water mixture is a mixture of ozonated water and treating liquid. Various kinds of acidic or alkaline chemical liquids may be used as the treatment liquid.

The mixed liquid supply unit 20, 30, 40 includes a treating-fluid storage unit 20, a mixture generating unit 30, and a mixed liquid distribution unit 40. Has The drainage unit 50 drains the mixed solution generating unit 30 and the mixed solution distribution unit 40 in the ozone water mixture. Then, the control unit 60 controls the above-described process unit 10, the mixed liquid supply unit (20, 30, 40), and the drainage unit (50).

Here, the mixed liquid supply units 20, 30, and 40 generate and supply the ozone water mixed liquid by in-line mixing. In-line mixing is a method in which the mixed liquid of ozone water and the treatment liquid is not stored in a storage container such as a tank, but is mixed while supplying the ozone water and the treatment liquid to the process unit 10. Therefore, the mixed liquid supply unit 20, 30, 40 is not provided with a configuration (for example, a mixing tank for receiving and storing the ozone water and the treatment liquid to be supplied with stagnant supply of ozone water and treatment liquid). Do not.

The process unit 10 has a plurality of process chambers 100. Referring to FIG. 2, the process chamber 100 has first to fourth process chambers 100a, 100b, 100c and 100d. Each of the process chambers 100a, 100b, 100c, 100d is disposed on both sides of the transfer part 12. The transfer unit 12 transfers the wafer W to each of the process chambers 100a, 100b, 100c, and 100d. Each process chamber 100 receives the ozone water mixture solution from the mixed solution supply units 20, 30, and 40 during the process, and cleans the wafer W in a single sheet manner. The process unit 100 has a housing 110, a spin chuck 120, and a nozzle 130. The housing 110 provides a space in which a cleaning process is performed. The housing 110 has a cup shape with an open top. The open upper portion of the housing 110 serves as a passage for entering and exiting the wafer (W). The spin chuck 120 supports and rotates the wafer W in the housing 110 during the process. In addition, the nozzle 130 receives the ozone water mixture solution from the mixed liquid supply units 20, 30, and 40 during the cleaning process, and injects the ozone water mixture solution into the processing surface of the wafer W placed on the spin chuck 120.

The processing fluid storage unit 20 stores the processing fluid for generating the mixed liquid. The treatment fluid storage unit 20 includes a first treating liquid supply source 22 and a second treating liquid supply source 24. For example, the first processing liquid supply source 22 stores the first processing liquid, and the second processing liquid supply source 24 stores the second processing liquid. The first treatment liquid may be hydrofluoric acid solution (HF), and the second treatment liquid may be ozonated water. In the present exemplary embodiment, the case where the hydrofluoric acid solution and the ozone water are mixed to generate an ozone water mixed solution having a predetermined concentration is used as an example, but the first and second treatment liquids may be changed in various ways.

The mixed liquid generating unit 30 receives the processing fluid from the processing fluid storage unit 20 to generate the ozone water mixture. The mixed liquid generating unit 30 includes a first treating liquid supply line 32, a second treating liquid supply line 34, and a mixing line 36. )

The first treatment liquid supply line 32 supplies the hydrofluoric acid solution from the treatment liquid supply source 22 to the mixing line 36, and the second treatment liquid supply line 34 supplies the mixing line from the second treatment liquid supply source 24. The ozone water is supplied to (36). On the first processing liquid supply line 32, a first pressure measuring device 32a, a first positive pressure valve 32b, a first flow meter 32c, and a first back pressure valve 32d are provided. The first pressure measuring device 32a measures the hydrofluoric acid solution supply pressure of the first processing liquid supply line 32. The first positive pressure valve 32b is a valve capable of adjusting the supply pressure of the first processing liquid supply line 32 such that the flow rate of the hydrofluoric acid solution supplied through the first processing liquid supply line 32 satisfies a predetermined flow rate. The first flow meter 32c measures the flow rate of the hydrofluoric acid solution supplied through the first processing liquid supply line 32. Then, the first back pressure valve 32d is the first processing liquid supply line 32 from the mixing line 36 when the supply pressure of the mixing line 36 is greater than the supply pressure of the first processing liquid supply line 32. To prevent backflow of the hydrofluoric acid solution.

The second processing liquid supply line 34 is provided with the same components as those installed in the first processing liquid supply line 32. That is, the second pressure measuring unit 34a, the second positive pressure valve 34b, the second flow meter 34c, and the second back pressure valve 34d are installed on the second processing liquid supply line 34. The second pressure gauge 34a measures the ozone water supply pressure of the second treatment liquid supply line 34. The second positive pressure valve 34b is a valve capable of adjusting the supply pressure of the second processing liquid supply line 34 such that the flow rate of the ozone water supplied through the second processing liquid supply line 34 satisfies a predetermined flow rate. The second flow meter 34c measures the flow rate of the ozone water supplied through the second processing liquid supply line 34. Then, the second back pressure valve 34d prevents the ozone water backflow from the mixing line 36 to the second processing liquid supply line 34.

The mixing line 36 receives hydrofluoric acid solution and ozone water from the first treatment liquid supply line 32 and the second treatment liquid supply line 34 to mix them. On the mixing line 36, a mixing valve 36a, a static mixer 36b, and a third pressure gauge 36c are installed. The mixing valve 36a is configured to effectively open and close the first processing liquid supply line 32 and the second processing liquid supply line 34 so as to effectively open and close the first processing liquid supply line 32 and the second processing liquid supply line 34. This valve is capable of precisely supplying hydrofluoric acid solution and ozone water at the time of opening. The static mixer 36b effectively mixes the hydrofluoric acid solution and ozone water flowing through the mixing line 36. Then, the third pressure measuring device 36c measures the ozone water supply pressure of the mixing line 36 and transmits the measured pressure data to the control unit 60.

The mixed liquid distribution unit 40 distributes the ozone water mixture generated by the mixed liquid generating unit 30 to the supply chambers 100 of the process unit 10. The mixed liquid distribution unit 40 has a manifold 42, a distribution line 44, and a concentration detecting member. The concentration test member has a concentration check line 46 and a concentration meter 48. The manifold 42 receives and receives the ozone water mixture produced by the mixing line 36. The fourth pressure gauge 42a is installed in the manifold 42. The fourth pressure gauge 42a measures the pressure in the manifold 42 and transmits the measured pressure data to the control unit 60.

The distribution line 44 supplies the ozone water mixture from the manifold 42 to the process unit 100. The distribution line 44 has first to fourth distribution lines 44a, 44b, 44c and 44d. The first to fourth distribution lines 44a, 44b, 44c, and 44d respectively supply the ozone water mixture to the first to fourth process chambers 100a, 100b, 100c, and 100d. Here, the lengths of the distribution lines 44 are all provided to be the same. That is, since ozone in the ozone water mixture is easily reduced to oxygen gas, when the lengths of the distribution lines 44 are different from each other, the concentration of ozone in the ozone water mixture is different according to each process unit 100. For example, as shown in FIG. 3, the distance between the manifold 42 and the first and fourth process units 100a and 100d is the distance between the manifold 42 and the second and third process units 100b and 100c. Farther than Accordingly, the length compensation lines 44b-1 and 44c-1 are provided in the second and third distribution lines 44b and 44c. The length compensation lines 44b-1 and 44c-1 are formed so that the lengths of the second and third distribution lines 44b and 44c are the same as the lengths of the first and fourth distribution lines 44a and 44d. 3 is a line installed on the distribution lines 44b and 44c. The length compensation lines 44b-1 and 44c-1 may be provided in a coil shape wound multiple times.

The concentration test line 46 is a line for checking the concentration of the ozone water mixture in the distribution lines 44. The concentration test line 46 has first to fourth test lines 46a, 46b, 46c, 46d and an integrated line 46e. One end of the first to fourth inspection lines 46a, 46b, 46c, and 46d is connected to the first to fourth distribution lines 44a, 44b, 44c, and 44d, and the other end is connected to the integration line 46e. The integration line 46e is a line integrating the first to fourth distribution lines 44a, 44b, 44c, and 44d into one line. The integration line 46e receives the ozone water mixture from each of the first to fourth distribution lines 44a, 44b, 44c, and 44d. The concentration meter 48 is installed on the integrated line 46e, and measures the concentration of the ozone water mixture flowing through the integrated line 46e. The concentration data measured by the concentration meter 48 is transmitted to the control unit 60. Here, one end of the first to fourth inspection lines 46a, 46b, 46c, 46d is preferably connected to a portion as close as possible to the discharge end of the distribution line 44 (part connected to the spray nozzle 130). Do. This allows the inspection line 46 to collect a concentration sample of the ozone water mixture from the discharge end of the distribution lines 44a, 44b, 44c, and 44d, so that the concentration meter 48 supplies the concentration of the ozone water mixture supplied to the process unit 100. To precisely measure the

The discharge line 49 discharges the ozone water mixture in the distribution line 44 and the concentration test line 46 from the distribution line 44 and the concentration test line 46. The discharge line 49 has first to fourth discharge lines 49a, 49b, 49c, and 49d. One end of the first to fourth discharge lines 49a, 49b, 49c, and 49d is connected to the first to fourth concentration test lines 46a, 46b, 46c, and 46d, respectively, and the other end is respectively connected to the drain container 56. Connected. At this time, one end of each of the first to fourth discharge lines 49a, 49b, 49c, and 49d is provided with valves 46a ', 46b', which are installed at the first to fourth concentration test lines 46a, 46b, 46c, and 46d, respectively. 46c ', 46d') is preferably provided at the front end.

The drainage unit 50 drains the mixed solution generating unit 30 and the mixed solution distribution unit 40 in the ozone water mixture. Drain unit 50 has a first drain line 52, a second drain line 54, and a drain vessel 56. One end of the first drain line 52 is connected to the mixing line 36, and the other end is connected to the drain container 56. Therefore, when the pressure in the mixing line 52 is out of the preset pressure range, the first drain line 52 discharges the ozone water mixture in the mixing line 52. In order to quickly discharge the ozone water mixture, a relief valve may be used for the valve 52a installed in the first drain line 52. Therefore, when the pressure in the mixing line 52 is out of the predetermined pressure range, the valve 52a is automatically opened to allow the first drain line 52 to discharge the ozone water mixture in the mixing line 52.

One end of the second drain line 54 is connected to the manifold 42 and the other end is connected to the drain container 56. Therefore, the second drain line 54 discharges the ozone water mixture in the manifold 42 to the drain container 56. Here, the valve 54a installed in the second drain line 54 may use a flow control valve. That is, the valve 54a is provided to enable adjustment of the amount of drainage of the ozone water mixture in the manifold 42, so that the amount of drainage of the ozone water mixture in the second drain line 54 can be adjusted. Alternatively, a relief valve that performs the same function as the valve 52a installed in the first drain line 52 may be used as the valve 54a. The drain container 56 stores the ozone water mixture flowing through the first and second drain lines 52 and 54. Ozone water mixture is accommodated in the drain container 56 is discharged to the outside of the facility (1) by the discharge line (56a).

The control unit 60 controls the process of the above-described units 10, 20, 30, 40, 50. A detailed process of controlling the above-described units 10, 20, 30, 40, and 50 of the control unit 60 will be described later.

Hereinafter, the process of the substrate processing equipment 1 according to the present invention will be described in detail with reference to FIG. 4. 4 is a view showing an ozone water mixture supply method according to the present invention, Figures 5a to 5e is a view showing the ozone water mixture supply process according to the present invention.

Each of the first treatment liquid supply line 32 and the second treatment liquid supply line 34 supplies the treatment liquid and the ozone water to the mixing line 36 (S110). That is, referring to FIG. 5A, the control unit 60 opens the mixing valve 36. The first processing liquid supply line 32 supplies the processing liquid (fluoric acid solution) from the first processing liquid supply source 22 to the mixing line 36, and the second processing liquid supply line 34 supplies the second processing liquid supply source. Ozone water is supplied from 24 to the mixing line 36. At this time, the control unit 60 determines whether the pressure measured by the first and second pressure measuring devices 32a and 34a is out of the predetermined pressure (S120). If the pressure values measured by the first to third pressure measuring devices 32a, 34a, and 34c are displayed on the outside of the apparatus 1 so that the operator can recognize the preset pressure range (S130). That is, the control unit 60 determines whether the supply pressure in the first processing liquid supply line 32 and the second processing liquid supply line 34 is out of the preset pressure. This is because when the supply pressures of the first processing liquid supply line 32 and the second processing liquid supply line 34 change, the flow rate measuring efficiency of the first and second flow meters 32c and 34c is lowered, and the mixing line ( This is because the concentration of the ozone water mixture produced by 36) may change.

Further, the control unit 60 supplies the hydrofluoric acid solution supply flow rate of the first processing liquid supply line 32 and the ozone water supply of the second processing liquid supply line 34 measured by the first and second flowmeters 32c and 34c. It is determined whether the flow rate is out of the preset flow rate. If the supply flow rates of the hydrofluoric acid solution and the ozone water measured by the first and second flowmeters 32c and 34c deviate from the predetermined supply flow rates, they are displayed on the outside of the facility 1 so that an operator can recognize them. The operator adjusts the first and second positive pressure valves 32b and 34b to control the flow rates of the hydrofluoric acid solution and the ozone water.

Hydrofluoric acid solution and ozone water flowing into the mixing line 36 is mixed while flowing along the mixing line 36 is supplied to the manifold 42 (S140). That is, the treatment liquid and ozone water flowing along the mixing line 36 are mixed by the static mixer 36b to generate an ozone water mixture liquid satisfying a predetermined concentration, and then supplied to the manifold 42. The ozone water mixture supplied to the manifold 42 is distributed to each distribution line 44a, 44b, 44c, 44d. At this time, in order to prevent the ozone water mixture supplied to the distribution lines 44a, 44b, 44c, and 44d from stagnation in the distribution lines 44a, 44b, 44c, and 44d, the discharge lines 49a, 49b, 49c, and 49d. Discharges the ozone water mixture from the distribution lines 44a, 44b, 44c, 44d to the drain container 56 continuously. The ozone water mixture discharged to the drain container 56 may be recovered to a regeneration facility (not shown) for reuse of the ozone water mixture.

While the ozone water mixture is generated by the mixing line 36, the control unit 60 determines whether the pressure in the mixing line 36 and the manifold 42 deviates from the predetermined pressure (S150). That is, when the pressure in the mixing line 36 and the manifold 42 is out of the predetermined pressure range (eg, exceeds the predetermined pressure range), the mixing efficiency of the hydrofluoric acid solution and the ozone water is lowered to satisfy the predetermined concentration. It is difficult to produce an ozone water mixture effectively. Therefore, the control unit 60 adjusts the pressure in the mixing line 36 and the manifold 42 to the predetermined pressure when the pressure in the mixing line 36 and the manifold 42 is out of the predetermined pressure.

For example, referring to FIG. 5B, when the ozone water mixture liquid supply pressure of the mixing line 36 measured by the third pressure measuring instrument 36c exceeds the preset pressure, the valve 52a is automatically opened to open the first drain line. The ozone water mixture in the mixing line 36 is discharged to the drain container 56 through 52 (S160). When the ozone water mixture in the mixing line 36 is discharged from the mixing line 36, the supply pressure of the mixing line 36 decreases. When the pressure in the mixing line 36 satisfies the preset pressure, the control unit 60 closes the valve 52a to stop the ozone water mixture drainage of the first drain line 52.

Alternatively, referring to FIG. 5C, when the pressure in the manifold 42 measured by the fourth pressure gauge 42a exceeds a preset pressure, the control unit 60 opens the valve 52b to open the second drain line. 54 to discharge the ozone water mixture in the manifold 42 to the drain container 56 (S160). When the ozone water mixture in the manifold 42 is discharged from the manifold 42, the pressure in the manifold 42 decreases. If the pressure in the manifold 42 satisfies the preset pressure, the control unit 60 closes the valve 52b to stop the ozone water mixture drainage in the manifold 42 of the second drain line 54.

When the ozone water mixture generated in the manifold 42 is accommodated, the mixed liquid distribution unit 40 supplies the ozone water mixture from the manifold 42 to the process chambers required in the process chambers 100. At this time, the control unit 60 is ozone water in the distribution line (first distribution line in the present embodiment) 44a to supply the ozone water mixture to the process chamber 100 among the distribution lines 44a, 44b, 44c, 44d. It is determined whether the concentration of the mixed liquid is out of the predetermined concentration (S170).

For example, referring to FIG. 5D, the control unit 60 opens the valve 46a ′ installed in the first inspection line 46a connected to the first distribution line 44a. The concentration meter 48 determines whether the concentration of the ozone water mixture flowing along the first inspection line 46a is outside the preset concentration range (S180). If the concentration of the ozone water mixture measured by the concentration measuring instrument 48 is out of a predetermined concentration, the control unit 60 stops supplying the ozone water mixture to the first distribution line 46a, so that the operator can recognize the same. It may be displayed outside the facility 1 (S190).

If the concentration of the ozone water mixture measured by the concentration meter 48 satisfies the predetermined concentration, the distribution line 44 supplies the ozone water mixture to the process unit 100, and the process unit 100 supplies the ozone water mixture. Receives and performs the cleaning process (S200). That is, referring to FIG. 5E, the control unit 60 opens the valve 44a 'and the first distribution line 44a supplies the ozone water mixture that satisfies the predetermined concentration to the process unit 100. The process unit 100 injects the supplied ozone water mixture onto the wafer (W). The injected ozone water mixture solution is drained to the outside of the process unit 100 after removing foreign matter remaining on the surface of the wafer (W).

As described above, the present invention improves the efficiency of the substrate processing process by effectively generating and supplying a predetermined ozone water mixture in the in-line mixing method to the process unit. In particular, the present invention can perform the generation and supply of the ozone water mixture satisfies a predetermined concentration, and the concentration and management without the provision of a mixing vessel such as a conventional mixing tank (mixing tank). Accordingly, the present invention minimizes the stagnation period of the ozone water mixture in the mixed liquid supply device, and when the ozone water mixture is produced in a conventional mixing container, ozone in the mixed container in the ozone water mixture is decomposed to lower the concentration of the ozone water mixture. It can prevent.

In addition, the present invention by measuring the ozone water mixture concentration of each of the distribution lines for distributing the ozone water mixture to the process units, by selectively draining only the ozone water mixture in the distribution line in which the ozone water mixture outside the predetermined concentration remains, the ozone water mixture Minimize drainage.

In addition, the present invention is such that the length of the plurality of distribution lines for supplying the ozone water mixture from the manifold to the process chamber are the same, so that the concentration of the ozone water mixture supplied to the different distribution lines is different for each distribution line during the process To prevent it from changing.

The foregoing detailed description illustrates the present invention. In addition, the foregoing description merely shows and describes preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications may be made within the scope of the concept of the invention disclosed in this specification, the scope equivalent to the disclosed contents, and / or the skill or knowledge in the art. The above-described embodiments are for explaining the best state in carrying out the present invention, the use of other inventions such as the present invention in other state known in the art, and the specific fields of application and uses of the present invention. Various changes are also possible. Accordingly, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. Also, the appended claims should be construed to include other embodiments.

1 shows a substrate processing facility according to the present invention.

FIG. 2 is a plan view illustrating a process unit and a mixed liquid supply unit illustrated in FIG. 1.

3 is a view showing the configuration of the process chamber shown in FIG.

4 is a view showing an ozone water mixture supply method according to the present invention.

5a to 5e are views showing the ozone water mixture supply process according to the present invention.

* Description of symbols on the main parts of the drawings *

1: substrate processing equipment

10: process unit

20: treatment fluid supply unit

30: mixed liquid generating unit

40: mixed liquid distribution unit

50: drainage unit

60 control unit

Claims (18)

delete A first processing liquid supply line for supplying a first processing liquid, A second processing liquid supply line for supplying a second processing liquid; A mixing line configured to receive a first processing liquid and a second processing liquid from each of the first processing liquid supply line and the second processing liquid supply line, thereby mixing the first processing liquid and the second processing liquid to generate a mixed liquid; , A manifold receiving the mixed liquid produced by the mixing line, A plurality of distribution lines for supplying a mixed solution from the manifold to a plurality of process units in which a substrate treatment process is performed; A concentration test line branching from the distribution line, and Is installed on the concentration test line includes a concentration meter for measuring the concentration of the mixed liquid flowing along the concentration test line, The concentration test line, Has a plurality of inspection lines branching from each of the distribution lines and an integration line integrating the inspection lines into one, The concentration meter, Mixed solution supply apparatus, characterized in that installed in the integration line. The method of claim 2, The mixed liquid supply device, And a discharge line which is branched from each of the inspection lines to discharge the mixed liquid in the inspection lines. A first processing liquid supply line for supplying a first processing liquid, A second processing liquid supply line for supplying a second processing liquid; A mixing line configured to receive a first processing liquid and a second processing liquid from each of the first processing liquid supply line and the second processing liquid supply line, thereby mixing the first processing liquid and the second processing liquid to generate a mixed liquid; , A manifold receiving the mixed liquid produced by the mixing line, A plurality of distribution lines for supplying a mixed solution from the manifold to a plurality of process units in which a substrate treatment process is performed; A concentration test line branching from the distribution line, and Is installed on the concentration test line includes a concentration meter for measuring the concentration of the mixed liquid flowing along the concentration test line, The concentration test line, And a branched portion from a portion adjacent to the discharge end of the distribution line. The method according to any one of claims 2 to 4, The distribution lines, Mixed liquid supply apparatus, characterized in that provided in the same length with each other. A first processing liquid supply line for supplying a first processing liquid, A second processing liquid supply line for supplying a second processing liquid; A mixing line configured to receive a first processing liquid and a second processing liquid from each of the first processing liquid supply line and the second processing liquid supply line, thereby mixing the first processing liquid and the second processing liquid to generate a mixed liquid; , A manifold receiving the mixed liquid produced by the mixing line, A plurality of distribution lines for supplying a mixed solution from the manifold to a plurality of process units in which a substrate treatment process is performed; A concentration test line branching from the distribution line, and Is installed on the concentration test line includes a concentration meter for measuring the concentration of the mixed liquid flowing along the concentration test line, The distribution lines are provided with the same length as each other, At least one of the distribution lines of the distribution line is a mixed liquid supply apparatus, characterized in that having a coil-shaped line. A plurality of processing units for performing a substrate processing process, A processing fluid storage unit for storing a processing fluid; A mixed liquid generating unit receiving the processing fluid from the processing fluid storage unit to generate an ozone water mixture, and Including a mixed liquid distribution unit for distributing the mixed ozone water generated in the mixed liquid generating unit to the process unit, The mixed liquid generating unit, A first treatment liquid supply line for supplying a treatment liquid; A second treatment liquid supply line for supplying ozone water, and A mixing line for receiving a treatment liquid and ozone water from each of the first treatment liquid supply line and the second treatment liquid supply line to mix the treatment liquid and the ozone water to generate an ozone water mixture; The mixed liquid distribution unit, A manifold receiving the ozone water mixture produced by the mixing line, A plurality of distribution lines for supplying a mixture of ozone water from the manifold to the plurality of process units; A concentration test line branching from the distribution line, and And a concentration measuring device installed on the concentration test line and measuring a concentration of the mixed liquid flowing along the concentration test line. The method of claim 7, wherein The concentration test line, Has a plurality of inspection lines branching from each of the distribution lines and an integration line integrating the inspection lines into one, The concentration meter, Substrate treatment equipment using an ozone water mixture, characterized in that installed in the integrated line. The method of claim 7, wherein The mixed liquid supply device, Substrate processing equipment using an ozone water mixture, characterized in that it comprises a discharge line for branching from each of the inspection line to discharge the mixed liquid in the inspection lines. The method of claim 7, wherein The inspection line, Substrate processing equipment using a wash water mixture, characterized in that branching from the portion adjacent to the discharge end of the distribution line. The method according to any one of claims 7 to 10, The distribution lines, Substrate treatment equipment using an ozone water mixture, characterized in that provided with the same length. The method of claim 11, At least one distribution line of the distribution lines, A substrate processing apparatus using an ozone water mixture, characterized by having a coil-shaped line. The method according to any one of claims 2 to 4, And the mixing line is provided to mix the first processing liquid and the second processing liquid in-line. The method according to any one of claims 7 to 10, Wherein said mixing line is provided to mix said treatment liquid and said ozone water inline. A plurality of processing units for performing a substrate processing process, A processing fluid storage unit for storing a processing fluid; A mixed liquid generation unit receiving a processing fluid from the processing fluid storage unit to generate a mixed liquid, and It includes a mixed liquid distribution unit for distributing the mixed liquid generated in the mixed liquid generating unit to the processing unit, The mixed liquid distribution unit, A manifold receiving the mixed liquid generated by the mixed liquid generating unit, A plurality of distribution lines connecting the manifold and each of the process units to supply a mixed solution from the manifold to the process unit, And at least one of the distribution lines has a coil-shaped line. The method of claim 15, The processing unit of any one of the above processing units is disposed farther from the manifold than the other processing unit. The method of claim 16, And the distribution lines are provided with the same length as each other. The method according to claim 16 or 17, And at least one distribution line of the distribution lines is not provided with the coil-shaped line.

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