KR100888045B1 - 기판 반전 장치 - Google Patents
기판 반전 장치 Download PDFInfo
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- KR100888045B1 KR100888045B1 KR1020070088065A KR20070088065A KR100888045B1 KR 100888045 B1 KR100888045 B1 KR 100888045B1 KR 1020070088065 A KR1020070088065 A KR 1020070088065A KR 20070088065 A KR20070088065 A KR 20070088065A KR 100888045 B1 KR100888045 B1 KR 100888045B1
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- rotating
- semiconductor substrate
- substrate
- gear
- transfer arm
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67793—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with orientating and positioning by means of a vibratory bowl or track
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67796—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with angular orientation of workpieces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
하지만 기판 반전 유닛은 상기 안착부 및 상기 홀딩부등을 포함함으로써, 복잡한 구조를 가질 뿐 만 아니라 상기 안착부 및 상기 홀딩부를 구동시키는 데 공정 시간이 상대적인 길게 발생한다. 따라서 기판을 반전시키는 데 많은 시간이 걸려 공정효율이 감소한다. 뿐만 아니라 복잡한 구조를 갖는 기판 반전 유닛을 유지하거나 이를 보수하는 데에도 많은 비용이 들 수 있다.
Claims (7)
- 복수의 개구들이 형성된 베이스 링;상기 베이스 링으로부터 돌출되며, 그 상부가 반도체 기판의 하면을 접촉하는 몸체 및 상기 몸체 상에 배치되고 상기 몸체의 종축에 대하여 편심되어 회전함으로써 상기 반도체 기판의 측면과 이격 또는 접촉할 수 있는 접촉부를 구비하는 복수의 회전 핀들;상기 회전 핀들을 회전시켜서 상기 반도체 기판의 측면과 이격/접촉할 수 있도록 하는 구동 유닛;상기 베이스 링과 체결되며 그 연장 방향을 중심으로 회전하는 이송 암; 및상기 이송 암과 연결되어 상기 반도체 기판을 반전시키는 반전 유닛을 포함하고, 상기 구동 유닛은,상기 이송 암을 관통하여 배치되며 회전하는 회전축;상기 회전축과 연결되며, 상기 회전축을 중심으로 회전하는 제1 회전 부재; 및상기 베이스 링의 내부에 배치되며, 상기 제1 회전 부재로부터 회전력을 전달받아 상기 회전 핀을 회전시키는 제2 회전 부재를 포함하는 것을 특징으로 하는 기판 반전 장치.
- 삭제
- 삭제
- 제 1 항에 있어서, 상기 제1 회전 부재의 외주면에는 제1 기어가 형성되고, 상기 제2 회전부재에는 상기 제1 기어와 맞물리는 제2 기어가 형성된 것을 특징으로 하는 기판 반전 장치.
- 제 1 항에 있어서, 상기 회전 핀의 상기 몸체에는 제3 기어가 형성되고, 상기 제2 회전 부재의 외주면에는 상기 제3 기어와 맞물리는 제4 기어가 형성된 것을 특징으로 하는 기판 반전 장치.
- 제 1 항에 있어서, 상기 베이스 링은,링 형상의 플레이트; 및상기 플레이트를 덮고 상기 개구들이 형성된 덮개부를 포함하는 것을 특징으로 하는 기판 반전 장치.
- 제 1 항에 있어서,상기 이송 암의 일 단부와 체결된 프레임;상기 프레임을 상기 이송 암을 체결시키는 체결 부재; 및상기 이송암을 승강시키는 승강 부재를 더 포함하는 것을 특징으로 하는 기판 반전 장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020070088065A KR100888045B1 (ko) | 2007-08-31 | 2007-08-31 | 기판 반전 장치 |
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KR1020070088065A KR100888045B1 (ko) | 2007-08-31 | 2007-08-31 | 기판 반전 장치 |
Publications (2)
Publication Number | Publication Date |
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KR20090022577A KR20090022577A (ko) | 2009-03-04 |
KR100888045B1 true KR100888045B1 (ko) | 2009-03-10 |
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KR1020070088065A KR100888045B1 (ko) | 2007-08-31 | 2007-08-31 | 기판 반전 장치 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102035452B1 (ko) | 2019-04-08 | 2019-10-22 | 이기용 | 제품의 포지션 반전을 위한 플립 콘트롤 시스템 |
WO2020194310A1 (en) | 2019-03-27 | 2020-10-01 | Yaskawa Europe Technology Ltd. | Semiconductor flipper |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020013244A (ko) * | 2000-08-14 | 2002-02-20 | 고미야 히로요시 | 낱장식 세정 장치 및 낱장식 세정 방법 |
KR20030027295A (ko) * | 2001-09-28 | 2003-04-07 | 한국디엔에스 주식회사 | 반도체 제조 장비의 웨이퍼 세정 장비 |
KR20060093715A (ko) * | 2003-10-20 | 2006-08-25 | 요시하루 야마모토 | 기판 세정장치 |
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2007
- 2007-08-31 KR KR1020070088065A patent/KR100888045B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020013244A (ko) * | 2000-08-14 | 2002-02-20 | 고미야 히로요시 | 낱장식 세정 장치 및 낱장식 세정 방법 |
KR20030027295A (ko) * | 2001-09-28 | 2003-04-07 | 한국디엔에스 주식회사 | 반도체 제조 장비의 웨이퍼 세정 장비 |
KR20060093715A (ko) * | 2003-10-20 | 2006-08-25 | 요시하루 야마모토 | 기판 세정장치 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020194310A1 (en) | 2019-03-27 | 2020-10-01 | Yaskawa Europe Technology Ltd. | Semiconductor flipper |
KR102035452B1 (ko) | 2019-04-08 | 2019-10-22 | 이기용 | 제품의 포지션 반전을 위한 플립 콘트롤 시스템 |
Also Published As
Publication number | Publication date |
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KR20090022577A (ko) | 2009-03-04 |
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