KR100870000B1 - Thin film transistor substrate and liquid crystal display - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device. In order to improve response speed and brightness, grooves are formed on the surface of the pixel electrode of the lower substrate or the surface of the common electrode of the upper substrate in parallel with the direction in which the liquid crystal should lie. do. Specifically, in the thin film transistor substrate according to the present invention, a gate wiring including a gate line and a gate electrode is formed on the substrate, and the gate insulating film covers the gate wiring. A semiconductor pattern is formed on the gate insulating layer above the gate electrode, and a data line defining a pixel region crossing the gate line and a source electrode, an electrode connected to the data line, and electrically connected to the semiconductor pattern on the gate insulating layer. Correspondingly, a data line including a drain electrode electrically connected to the semiconductor pattern is formed. A protective film covers the data line and the semiconductor pattern, and a contact hole is formed in the protective film to expose the drain electrode. A plurality of first linear holes arranged at predetermined intervals are formed in the passivation film and the gate insulating film, and pixel electrodes having grooves positioned along the linear holes are connected to the drain electrodes through the contact holes.

Response speed, brightness, linear hole, groove, direction in which the liquid crystal lies

Description

Thin Film Transistor Boards and Liquid Crystal Displays {THIN FILM TRANSISTOR SUBSTRATE AND LIQUID CRYSTAL DISPLAY}

1 is a schematic cross-sectional view of a liquid crystal display according to an exemplary embodiment of the present invention.

2 to 4 illustrate examples of arrangement states of grooves formed in pixel electrodes in the liquid crystal display according to the exemplary embodiment of the present invention.

5 and 6 illustrate examples of cross-sectional states of grooves formed in pixel electrodes in the liquid crystal display according to the exemplary embodiment of the present invention.

7 is a layout view of a liquid crystal display device according to an embodiment of the present invention,

FIG. 8 is a cross-sectional view illustrating the liquid crystal display device shown in FIG. 7 along a cutting line VIII-VIII,

9A through 13B are diagrams illustrating a manufacturing process of a liquid crystal display according to an exemplary embodiment of the present invention.

The present invention relates to a thin film transistor substrate and a liquid crystal display device.                         

In general, liquid crystal displays inject a liquid crystal material between an upper substrate on which a common electrode and a color filter are formed, and a lower substrate on which a thin film transistor and a pixel electrode are formed, and apply different potentials to the pixel electrode and the common electrode. By forming an electric field to change the arrangement of the liquid crystal molecules, and through this to adjust the transmittance of light to express the image.

In the manufacture of liquid crystal display devices, various methods for widening the viewing angle have been developed, among which PVA (orthogonal alignment) of liquid crystal molecules with respect to the upper and lower substrates, and forming a constant opening pattern on the pixel electrode and the common electrode which is the opposite electrode ( Background Art A multi-domain vertical aligned mode (MVA) forming a patterned vertically aligned mode or a projection pattern has been proposed. As such, when the opening pattern or the projection pattern is formed on the pixel electrode and the common electrode, the viewing angle is adjusted by adjusting the direction in which the liquid crystal molecules lie down using the fringe field of the electric field formed by the opening pattern or the projection pattern. You can widen it.

 In the vertical alignment mode, the liquid crystal is induced to lie vertically with respect to the openings of the upper and lower substrates or the sides of the domains partitioned by the projection patterns under the influence of the fringe field. At the edge of the domain, the fringe field is strong, allowing liquid crystal molecules to lie in a certain direction. However, as the fringe field weakens toward the center of the domain and the electric field component perpendicular to the upper and lower substrates increases, it becomes difficult to determine in which direction the liquid crystal molecules lie. At this time, when there is even irregularities on the surface of the substrate or fringe fields in different directions nearby, liquid crystal molecules do not lie down as intended. The liquid crystal molecules lying in the wrong direction may be kept as they are, or after a long time, the liquid crystal molecules may be found in the intended direction by interaction with the surroundings. However, in the former case, a loss of luminance is caused, and in the latter case, the response time becomes long.

The present invention seeks to improve response speed and luminance in a liquid crystal display.

In order to solve this technical problem, in the present invention, grooves are formed on the surface of the pixel electrode of the lower substrate or the surface of the common electrode of the upper substrate in parallel with the direction in which the liquid crystal should lie.

In detail, in the thin film transistor substrate according to the present invention, a gate wiring including a gate line and a gate electrode is formed on the substrate, and the gate insulating film covers the gate wiring. A semiconductor pattern is formed on the gate insulating layer above the gate electrode, and a data line intersecting the gate line to define a pixel region, a source electrode connected to the data line and electrically connected to the semiconductor pattern, and a source electrode on the gate insulating layer. A data line including a drain electrode electrically connected to the semiconductor pattern is formed. A protective film covers the data line and the semiconductor pattern, and a contact hole is formed in the protective film to expose the drain electrode. The protective film is formed with a plurality of grooves arranged at predetermined intervals, and is formed with a pixel electrode having a plurality of grooves connected to the drain electrode through the contact hole and positioned along the groove formed in the protective film.

Here, the plurality of first grooves may be formed together in the passivation layer and the gate insulating layer, and may be formed so that the liquid crystals in the plurality of liquid crystal domains formed in the pixel region are positioned parallel to the direction in which the liquid crystals are to be laid.

In addition, the liquid crystal display device according to the present invention corresponds to the above-described thin film transistor substrate and the thin film transistor substrate and is opposed to the overcoat film having a plurality of grooves and the pixel electrode, along the plurality of grooves of the overcoat film. A color filter substrate including a common electrode having a plurality of grooves positioned therein is provided, and a liquid crystal layer is interposed between these substrates. In this case, the pixel electrode has a first opening pattern, the common electrode has a second opening pattern, and the first opening pattern and the second opening pattern divide the liquid crystal in the pixel region into a plurality of liquid crystal domains, The groove and the groove of the common electrode may be formed to be parallel to the direction in which the liquid crystal should lie in the liquid crystal domain.

Hereinafter, with reference to the accompanying drawings will be described in detail the present invention.

1 is a schematic cross-sectional view of a liquid crystal display according to an exemplary embodiment of the present invention.

On the lower substrate, a first passivation layer 110 made of silicon nitride is formed on the first substrate 100 on which various wiring patterns and insulating films are formed, and the pixel electrode 120 made of ITO is formed on the first passivation layer 110. Is formed.                     

In the upper substrate corresponding to the lower substrate, a second protective film 210 made of silicon nitride is formed on the second substrate 200 on which various patterns are formed, and on the second protective film 210, ITO is formed. The common electrode 220 is formed. At this time, the opening pattern 220H is formed in a predetermined portion of the common electrode 220.

The liquid crystal layer composed of the liquid crystal 300 is interposed between the lower substrate and the upper substrate.

In such a liquid crystal display, when a voltage having a predetermined magnitude is applied to the common electrode 220 and the pixel electrode 120, a fringe field is formed by the opening pattern 220H of the common electrode 220. As a result, the liquid crystal molecules 300 are inclined in a predetermined direction. As a result, the liquid crystals of the liquid crystal layer are separated into a plurality of liquid crystal subregions (hereinafter, referred to as liquid crystal domains) in one pixel region, and the wide viewing angle can be ensured due to the multi domain of the liquid crystal. Will be.

At this time, the liquid crystal 300 is induced to lie perpendicular to the sides of the domain by the fringe field. At the edge of the domain, the fringe field is strong, allowing liquid crystal molecules to lie in a certain direction. However, the farther from the edge of the domain, that is, the component of the fringe field is weaker in the central portion of the domain, and the electric field in the vertical direction with respect to the upper substrate and the lower substrate is dominant, so that the liquid crystal molecules located in this portion are applied to the electric field. The liquid crystal is not aligned in the wrong direction, or the liquid crystal molecules in the vicinity of the opening pattern are inclined until the liquid crystal molecules are quickly changed. For this reason, the luminance of the liquid crystal display is low and the response speed is slow.                     

However, in such a liquid crystal display device, when a groove is formed on the surface of the pixel electrode 120 to be parallel to the direction in which the liquid crystal is to be properly laid, as shown in FIG. 2, the liquid crystal molecules 300 form the pixel electrode. Even if it is far from the edge of the 120 or the opening pattern 220H of the common electrode 220, it can lie down properly along the groove formed on the surface of the pixel electrode 120 without being affected by the intensity of the fringe field.

Advantages obtained by the present invention are as follows.

First, the response time can be increased by eliminating the time it takes for the liquid crystal to lie in the wrong direction and return to its original position. Second, liquid crystals may lie in a predetermined direction due to grooves formed on the surface of the pixel electrode 120, thereby maximizing luminance. Third, since the operation of the liquid crystal is stabilized in the middle portion of the liquid crystal domain, the size of the liquid crystal domain can be increased, thereby increasing the aperture ratio.

Since the misalignment of the liquid crystal occurs in the central portion of the liquid crystal domain, the groove may be formed only in a portion corresponding to the central portion of the liquid crystal domain in the pixel electrode 120.

For example, as shown in FIG. 3, the pixel electrode 120 having the? -Shaped opening pattern 125 in a predetermined region, and the “T” and? -Shaped opening pattern corresponding to the pixel electrode 120. In the liquid crystal display having the common electrode (not shown) having the 220H, the groove to be formed in the center portion of the pixel electrode 120 is parallel to the direction in which the liquid crystal should lie, that is, the opening pattern 220H of the common electrode. ) To be perpendicular to

For example, as shown in FIG. 4, the pixel electrode 120 having the diagonal opening pattern 125 in a predetermined region and the pixel electrode 120 correspond to the pixel electrode 120, but the opening of the pixel electrode 120 corresponds to the pixel electrode 120. In a liquid crystal display having a common electrode (not shown) having an oblique opening pattern 220H positioned in parallel with the pattern 125 at predetermined intervals, a groove to be formed in a central portion of the pixel electrode 120 is formed. It is formed so as to be parallel to this lying direction, ie, perpendicular to the opening pattern 220H of the common electrode.

Here, the groove may be formed in the common electrode 220 corresponding to the pixel electrode 120 without forming the groove in the pixel electrode 120. In this case, as described above, only the portion of the common electrode 220 corresponding to the center portion of the liquid crystal domain forms a groove in which the liquid crystal is arranged in parallel with the lying direction.

On the other hand, the groove of the surface of the pixel electrode 120, as shown in Figs. 5 and 6, to form a concave-convex shape on the surface of the first protective film 110 located at the lower end of the pixel electrode 120, the first protective film It may be formed by covering the pixel electrode 120 along the surface of the (110).

When the surface of the first passivation layer 110 is formed into an uneven shape, if the distance between the patterns to define the uneven portions in the mask portion to define the uneven shape is sufficiently large as 4 μm or more, as shown in FIG. 5, the pixel electrode 120 The grooves arranged at predetermined intervals may be formed on the surface of the (). At this time, when the interval between the patterns to define the recesses in the mask is set to 2 μm, the interval of the grooves to be formed in the first passivation layer 110 is reduced due to the diffraction of the light at the time of exposure, and the slope thereof becomes gentle, but FIG. 5. As shown in FIG. 2, the rounded grooves may still be formed on the surface of the pixel electrode 120.

In this case, as shown in FIGS. 5 and 6, only a portion of the upper portion of the first passivation layer 110 may have an uneven shape, but differently, the lower portion of the first passivation layer 110 may be formed using all of the first passivation layer 110. It is also possible to form grooves to expose the substrate 100 of the substrate.

The liquid crystal display device to which the technique of the present invention is applied will be described below.

FIG. 7 is a layout view of a liquid crystal display device according to an exemplary embodiment of the present invention, and FIG. 8 is a cross-sectional view of the liquid crystal display device shown in FIG. 7 along a cutting line VIII-VIII. In the liquid crystal display shown in FIG. 7, only the opening pattern 225 of the common electrode of the upper substrate is overlapped with the wiring structure of the lower substrate.

First, the lower substrate will be described.

The gate line 22 extending in the horizontal direction on the insulating substrate 10 and receiving the gate signal to the gate line 22 and the gate pad 24 and the gate line 22 applied from the outside. In part, gate wirings 22, 24, and 26 including the gate electrode 26 serving as one electrode of the thin film transistor are formed.

The gate wirings 22, 24, and 26 are advantageously formed of a low resistance metal material in order to be applied to a large area liquid crystal display device. In addition, the gate wirings 22, 24, and 26 may be formed in a single layer structure, or may be formed in a double layer structure or more. In the case of the single layer structure, the chromium or chromium alloy, molybdenum or molybdenum alloy, aluminum or aluminum alloy may be formed. Silver or a silver alloy is used, and when formed in a double layer structure, at least one of the two layers is preferably formed of a low resistance metal material.                     

On the insulating substrate 0, a gate insulating film 30 made of an insulating material such as silicon nitride covers the gate wirings 22, 24, and 26.

A semiconductor pattern 42 made of a semiconductor material such as amorphous silicon overlapping the gate electrode 26 is formed on the gate insulating layer 30, and a semiconductor material such as amorphous silicon doped with impurities on the semiconductor pattern 42. An ohmic contact layer 55, 56 is formed.

Data lines 62 extending in the vertical direction on the ohmic contacts 55 and 56 and the gate insulating layer 30 to transmit data signals, and data pads 64 to which data signals to be transmitted to the data lines 62 are applied from an external soil. ) And the other ohmic contact layer 56 corresponding to the source electrode 65 and the source electrode 65 protruding from the data line 62 and contacting the one ohmic contact layer 55 to form a part of the thin film transistor. ), The data wirings 62, 64, 65, and 66 are formed to include the drain electrode 66 which forms a part of the thin film transistor.

The data wirings 62, 64, 65, and 66 are also advantageously formed of a low resistance metal material in order to be applied to a large area liquid crystal display. In addition, the data lines 62, 64, 65, and 66 may also be formed in a single layer structure or in a double layer structure or the same as the gate lines 22, 24, and 26. Chromium or chromium alloys, molybdenum or molybdenum alloys, aluminum or aluminum alloys, or silver or silver alloys are used, and when formed in a double layer structure, at least one of the two layers is preferably formed of a low resistance metal material.                     

A protective film 70 made of an insulating material such as silicon nitride is formed on the exposed front surface including the data lines 62, 64, 65, and 66.

In the passivation layer 70, the first contact hole 72 exposing the drain electrode 66, the second contact hole 74 exposing the data pad 64, and the gate insulating film 30 together with the gate insulating film 30 are exposed. Three contact holes 76 are formed. In addition, a plurality of linear lines may be formed on two insulating layers, that is, the passivation layer 70 and the gate insulating layer 30, which are not overlapped with the opening pattern 225 of the common electrode 220 of the upper substrate. The hole 70H is formed.

As shown in the figure, these linear holes 70H are arranged so as to be positioned perpendicular to the side edge of the pixel electrode 82 described later, that is, the edge or the opening pattern 225 of the common electrode 220. Since these linear holes 70H are for forming grooves in the pixel electrode 82, a plurality of linear holes 70H are formed by the opening pattern 83 of the pixel electrode 82 and the opening pattern 225 of the common electrode 220. Preferably, the liquid crystal domains are formed at positions parallel to the direction in which the liquid crystals should lie.

In this case, the linear holes 70H may be formed only in the passivation layer 70. In this case, as shown in FIGS. 5 and 6, the linear holes 70H may be formed on the passivation layer 70. Further, the cross-sectional shape of the linear hole 70H is sufficient as long as a groove can be formed in the pixel electrode 82 to be formed later, and its side is inclined as shown in FIG. 5 or rounded as shown in FIG. 6. Can be formed.

The gate pad 24 and the data pad are disposed on the passivation layer 70 through the pixel electrode 82 connected to the drain electrode 66 through the first contact hole 72 and the second and third contact holes 74 and 76. An auxiliary data pad 84 and an auxiliary gate pad 86 connected to 64 are formed. In this case, the pixel electrode 82, the auxiliary gate pad 84, and the auxiliary data pad 86 may be formed of a transparent conductive material such as ITO or IZO.

An opening pattern 83 in which a predetermined portion is recessed is formed in the pixel electrode 82. Here, since the pixel electrode 82 is formed along the surface of the protective film 70, grooves are formed on the surface thereof by the linear holes 70H.

The overcoat film 210 covers the substrate 200 on which the color filter (not shown) and the black matrix (not shown) are formed on the upper substrate corresponding to the lower substrate. On the 210, a common electrode 220 is formed in which the opening pattern 225 having the T 'shape and the? -Shape is formed.

In this case, instead of forming the opening pattern 225 in the common electrode 220, a protrusion pattern protruding from the surface of the common electrode 220 in the shape of the opening pattern 225 may be formed.

As such, the opening pattern 225 of the common electrode 220 forms a fringe field between the pixel electrode 82 of the lower substrate, such that the liquid crystal of the liquid crystal layer existing between the upper substrate and the lower substrate is multi-domain. To widen the viewing angle.

In the liquid crystal display according to the present invention, grooves are disposed on the surface of the pixel electrode 82 in parallel with the direction in which the liquid crystal should be properly laid. Therefore, when an electric field is applied to the pixel, the liquid crystal is in the pixel electrode 82. Since it lie down properly along the groove, the reaction speed and brightness can be improved.

At this time, the surface of the upper substrate may also form the same grooves as the surface of the lower substrate. That is, when the groove is formed in the overcoat layer 210 of the upper substrate, and the transparent conductive material layer is deposited on the surface of the overcoat layer 210 and etched to form the common electrode 220, the common electrode 220 is formed. Grooves can also be formed on the surface of? The grooves formed on the surface of the common electrode 220 are also important to be positioned in parallel with the direction in which the liquid crystals should lie.

In the present invention, the opening pattern 83 of the pixel electrode 82 and the opening pattern 225 of the common electrode 220 divide the pixel electrode 82 into a plurality of domains and form a linear hole 70H formed in the passivation layer 70. ) And the grooves (not shown) formed in the overcoat film 210 are preferably formed to be parallel to the direction in which the liquid crystal should lie in each domain.

 Next, a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention will be described in detail with reference to FIGS. 7 and 8, and FIGS. 9A to 14B.

First, the manufacturing method of a lower board | substrate is demonstrated as follows.

9A and 9B, after depositing a low resistance metal layer on the insulating substrate 10, the metal layer is etched by a photolithography process using a mask to form gate wirings 22, 24, and 26. At this time, the gate wirings 22. 24. 26 include a gate line 22, a gate pad 24, and a gate electrode 26.

In this case, a double layer or more metal layer may be deposited on the entire surface of the substrate and photo-etched to form gate lines 22, 24, and 26 of the double layer or more.                     

Next, as shown in FIGS. 10A and 10B, the gate insulating film 30, the semiconductor layer, and the semiconductor layer doped with impurities are sequentially stacked. Subsequently, the semiconductor layer and the semiconductor layer doped with impurities are etched by a photolithography process using a mask to form an island-shaped semiconductor pattern 42 and an ohmic contact layer 52.

11A and 11B, after depositing a low resistance metal layer on the entire surface of the substrate, the metal layer is etched by a photolithography process using a mask to form data lines 62, 64, 65, and 66. At this time, the data lines 62, 64, 65, and 66 include a data line 62, a data pad 64, a source electrode 65, and a drain electrode 66.

Subsequently, the island-like ohmic contact layer 52 is etched using the source electrode 65 and the drain electrode 66 as a mask to the ohmic contact layer 55 and the drain electrode 66 contacting the source electrode 65. The resistive contact layer 56 is contacted.

Next, as shown in FIGS. 12A and 12B, the protective film 70 is formed by depositing a silicon nitride film on the exposed entire surface of the substrate including the data lines 62, 64, 65, and 66.

Subsequently, the protective layer 70 and the gate insulating layer 30 are etched by a photolithography process using a mask to expose the drain electrodes 66 and the data pads 64 and the first and second contact holes 72 and 74 and the gate pads. A third contact hole 76 exposing 24 is formed, and at the same time, a plurality of linear holes 70H are formed to be located in the pixel region. At this time, the linear holes 70H are formed to be parallel to the direction in which the liquid crystals should lie.

Here, the linear holes 70H formed in the passivation layer 70 and the gate insulating layer 30 are formed in the pixel region, particularly, in portions not overlapping the opening pattern 225 of the common electrode 220 of the upper substrate described later. In this case, the linear holes 70H are formed so as to be perpendicular to the edges of the pixel electrode 82 described later or to the opening pattern 225 of the common electrode 220.

Next, as shown in FIGS. 13A and 13B, a transparent material layer made of ITO or IZO is deposited on the entire surface of the substrate and etched by a photolithography process using a mask to drain the electrode 66 through the first contact hole 72. The auxiliary gate pad 84 and the auxiliary data pad 86 connected to the gate pad 24 and the data pad 64, respectively, through the pixel electrode 82 and the second and third contact holes 74 and 76 connected to the gate electrode 24. ).

In this case, the pixel electrode 82 may be formed to form an opening pattern 83 having a shape of “-” in a predetermined region, which corresponds to the opening pattern 225 of the common electrode 220 of the upper substrate, which will be described later. To implement a multi-domain.

Here, since the pixel electrode 82 is formed along the surface of the protective film 70, the surface thereof is bent along the shape of the linear hole 70H formed in the protective film 70 and the gate insulating film 30, and is linear on the surface thereof. Grooves are formed at positions corresponding to the holes 70H.

Subsequently, the subsequent process is performed to complete the fabrication of the lower substrate.

Next, as shown in FIGS. 7 and 8, an upper substrate is manufactured corresponding to the lower substrate. Using a conventional process, a color filter and a black matrix (not shown) are formed on an insulating substrate, and the substrate 200 is covered with an overcoat film 210 made of an insulating material. Subsequently, a transparent conductive material layer is deposited on the overcoat layer 210, and a photolithography process using a mask is performed to form a common electrode 220 having a T ″ shape and a − shape opening pattern 225. The process of forming, etc. is advanced and the manufacture of an "upper substrate" is completed.

On the other hand, in the liquid crystal display according to the exemplary embodiment of the present invention, a groove may be formed in the upper substrate in parallel with the direction in which the liquid crystal should lie on the surface of the common electrode 220 as in the lower substrate.

Using a conventional manufacturing process, a color filter and a black matrix (not shown) are formed on the insulating substrate, and the substrate 200 is covered with an overcoat film 210 made of an insulating material. Subsequently, the overcoat layer 210 is etched by a photolithography process to form grooves positioned parallel to the direction in which the liquid crystal should lie in the oboe coat layer 210. Subsequently, a transparent conductive material layer is deposited along the surface of the overcoat layer 210 and a photolithography process using a mask is performed to form a common electrode having a T ″ shape and an? Shape opening pattern 225. To form 220.

As described above, in the present invention, the groove is formed on the surface of the pixel electrode of the lower substrate or the common electrode of the upper substrate so as to be parallel to the direction in which the liquid crystal should lie, so that the liquid crystal is properly laid down when an electric field is applied. Speed and brightness can be improved. In addition, in the present invention, since the operation of the liquid crystal is stabilized due to the linear hole formed in the substrate portion corresponding to the middle portion of the liquid crystal domain in the structure of the multi-domain, it is possible to increase the size of the domain and thus increase the aperture ratio.

Claims (6)

Board, A gate wiring formed on the substrate, the gate wiring including a gate line and a gate electrode; A gate insulating film covering the gate wiring, A semiconductor pattern formed on the gate insulating layer on the gate electrode; A data line formed on the gate insulating layer and defining a pixel region crossing the gate line, a source electrode connected to the data line and electrically connected to the semiconductor pattern, and electrically connected to the semiconductor pattern in correspondence with the source electrode A data wire including a drain electrode connected thereto; A protective film covering the data line and the semiconductor pattern; A contact hole formed to expose the drain electrode in the protective film; A plurality of grooves formed in the protective film, A pixel electrode connected to the drain electrode through the contact hole and formed on the passivation layer, and Domain dividing means formed on the pixel electrode; The pixel electrode has a pixel electrode having a plurality of grooves formed along a groove of the passivation layer and formed in a direction perpendicular to the domain dividing means. Thin film transistor substrate. In claim 1, And the groove is formed in the protective film and the gate insulating film together. In claim 1, The groove is formed in the liquid crystal domain formed in the pixel region is formed so as to be parallel to the direction in which the liquid crystal lies when the voltage is applied. First substrate, A gate wiring formed on the first substrate and including a gate line and a gate electrode; A gate insulating film covering the gate wiring, A semiconductor pattern formed on the gate insulating layer on the gate electrode; A data line formed on the gate insulating layer and defining a pixel region crossing the gate line, a source electrode connected to the data line and electrically connected to the semiconductor pattern, and electrically connected to the semiconductor pattern in correspondence with the source electrode A data wire including a drain electrode connected thereto; A protective film covering the data wiring and the semiconductor wiring; A contact hole formed to expose the drain electrode in the protective film; A pixel electrode formed on the passivation layer and connected to the drain electrode through the contact hole; A second substrate facing the first substrate, A common electrode formed on the second substrate, and A liquid crystal layer interposed between the pixel electrode and the common electrode, Domain dividing means is formed in at least one of the pixel electrode and the common electrode, At least one of the pixel electrode and the common electrode has a plurality of grooves formed in a direction perpendicular to the domain dividing means, The domain dividing means divides the liquid crystal region into a plurality of liquid crystal domains, and the groove is formed to be positioned in parallel with the direction in which the liquid crystal should lie when a voltage is applied in the liquid crystal domain. Liquid crystal display. delete In claim 4, And said domain dividing means is an opening pattern.

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