KR100847277B1 - A read wire product system and method - Google Patents

A read wire product system and method Download PDF

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KR100847277B1
KR100847277B1 KR1020070042272A KR20070042272A KR100847277B1 KR 100847277 B1 KR100847277 B1 KR 100847277B1 KR 1020070042272 A KR1020070042272 A KR 1020070042272A KR 20070042272 A KR20070042272 A KR 20070042272A KR 100847277 B1 KR100847277 B1 KR 100847277B1
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tank
pretreatment
circulation
plating
melting
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KR1020070042272A
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Korean (ko)
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황재현
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황재현
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C23C2/08Tin or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/34Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
    • C23C2/36Elongated material
    • C23C2/38Wires; Tubes

Abstract

An apparatus and a method for manufacturing ultrafine read wires for electronic components are provided to improve productivity substantially by straightly transferring ultrafine wires, manufacture ultrafine read wires by performing a tin plating operation easily while smoothly transferring strands of the ultrafine wires without cutting, and improve pre-treatment and plating capabilities while circulating a pre-treatment solution and molten tin consistently. An apparatus(1-3) for manufacturing a ultrafine read wire comprises: first and second pre-treatment tanks(10,20) of a pre-treatment unit part(2) for removing alien substances adhered to an outer face of a ultrafine wire(A), and a melting tank(30) of a plating unit part(3) having a heating device(34) mounted on a bottom face thereof, the first and second pre-treatment tanks and the melting tank being successively installed side by side on the same horizontal line; straight circulating sealing ports(40) which are mounted both side faces of the first and second pre-treatment tanks and the melting tank such that heights of the straight circulating sealing ports are lower than those of the melting tank and a pre-treatment solution filled in the first and second pre-treatment tanks, and which pre-treats and coats the ultrafine wire while horizontally supplying or discharging the ultrafine wire through the straight circulating sealing ports of the first and second pre-treatment tanks and the melting tank; and first and second pre-treatment circulation tanks(11,21) installed under the first and second pre-treatment tanks, and a melting circulation tank(31) which is installed under the melting tank and has a heating device mounted on a bottom face thereof such that pre-treatment and plating processes are performed while consistently circulating a pre-treatment solution filled in the first and second pre-treatment tanks and molten tin filled in the melting tank by a circulating unit.

Description

전자부품용 극세리드선 제조장치 및 제조방법{A READ WIRE PRODUCT SYSTEM AND METHOD}Micro lead wire manufacturing apparatus and manufacturing method for electronic components {A READ WIRE PRODUCT SYSTEM AND METHOD}

도 1a 및 도 1b는 종래의 전자부품용 리그선 제조장치를 보인 계통도.1A and 1B are schematic diagrams showing a conventional apparatus for manufacturing a rig wire for an electronic component.

도 2는 본 발명에 따른 전자부품용 극세리드선 제조장치를 보인 계통도.Figure 2 is a schematic diagram showing a micro lead wire manufacturing apparatus for an electronic component according to the present invention.

도 3a 및 도 3b는 본 발명에 따른 전자부품용 극세리드선 제조장치에 설치되는 직선유통씰링구를 보인 사시도 및 단면도.Figure 3a and Figure 3b is a perspective view and a cross-sectional view showing a straight through sealing hole installed in the ultra-fine lead wire manufacturing apparatus for electronic components according to the present invention.

* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

1-1.1-2: 리드선제조장치 1-3: 극세리드선제조장치 2: 전처리장치부1-1.1-2: Lead wire manufacturing device 1-3: Ultra fine wire production device 2: Pretreatment unit

3: 도금장치부 5: 전처리조 6.7.30: 용융조3: Plating apparatus part 5: Pretreatment tank 6.7.30: Melting tank

8.30.35: 히팅장치 10: 제1전처리조 20: 제2전처리조8.30.35: heating apparatus 10: first pretreatment tank 20: second pretreatment tank

11: 제1전처리순환조 21: 제2전처리순환조 12.22.32: 공급순환관11: first pretreatment circulation tank 21: second pretreatment circulation tank 12.22.32: supply circulation pipe

13.23.33: 배출순환관 40: 직선유통씰링구 41: 씰링유통구13.23.33: Outlet circulating pipe 40: Straight line sealing port 41: Sealing port

42: 씰링유통공 43.44: 확개부 P1.P2.P3: 순환용펌프42: Sealing hole 43.44: Expansion part P1.P2.P3: Circulation pump

본 발명은 각종 전자부품의 소자를 인쇄회로기판상의 배선에 연결할 때에 사용되는 리드선에 있어서, 굵기가 현저히 가느다란 전자부품용 극세리드선(READ WIRE) 제조장치 및 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an apparatus and a manufacturing method for an electronic component READ WIRE having a significantly thin thickness in a lead wire used when connecting elements of various electronic parts to wiring on a printed circuit board.

이를 좀 더 상세히 설명하면, 구리(Cu) 또는 구리합금으로 된 도선의 외면(외주)에 주석(Sn)으로 된 용융석을 도금(피막)함에 있어서, 복수의 전처리조와 별도의 용융조를 수평상태의 일직선상으로 설치하고, 각 전처리조와 용융조의 각 공급측과 배출측에는 직선유통구뭉치를 동일 수평선상에 각각 장착하여, 도선을 각 전처리조와 용융조의 각 공급측과 배출측에 각각 설치된 직선유통구뭉치들에 수평선상으로 통과시키면서 도선의 외주(외면)에 부착되어 있는 이물질 등을 깨끗하게 제거하는 전처리를 실시하고, 전처리된 도선을 히팅장치가 구비된 용융조에 용융석을 통과시켜 도금시켜서 된 전자부품용 극세리드선(READ WIRE) 제조장치와 제조방법을 제공하려는 것이다.In more detail, in the plating (film) of molten stone made of tin (Sn) on the outer surface (the outer circumference) of the conductor made of copper (Cu) or copper alloy, a plurality of pretreatment tanks and a separate molten bath are in a horizontal state. Straight distribution balls are installed on each supply side and discharge side of each pretreatment tank and the melting tank on the same horizontal line, and the wires are respectively installed on each supply side and the discharge side of each pretreatment tank and the melting tank. Pretreatment to cleanly remove foreign substances attached to the outer circumference (outer surface) of the conducting wire while passing on the horizontal line, and the pre-processed conducting wire is plated by passing molten stone through a molten bath equipped with a heating device It is to provide a lead wire manufacturing apparatus and a manufacturing method.

전자부품용 리드선(READ WIRE)은 각종 전자소자(마이컴, 트랜지스터, 다이오드, 저항, 콘덴서 등)들을 인쇄회로기판(PCB)의 배선 상에 고정하여 접속시키거나 납땜을 할 때에 사용되므로 전도성과 기계적 강도의 우수성이 필연적으로 요구된다.READ WIRE for electronic components is used to fix and connect various electronic devices (microcom, transistor, diode, resistor, capacitor, etc.) on the wiring of printed circuit board (PCB) or to conduct soldering. Excellence is inevitably required.

본인은 상기와 같은 특성을 갖는 전자부품용 리드선(READ WIRE)을 특허공고 공고번호 제10-1980-520호(출원번호 제10-1979-474호)와 특허공고번호 제10-1986-476호(출원번호 제10-1984-802호) 및 특허등록 제10-405350호에 의해 개발하였다.I have read the READ WIRE for electronic parts having the above characteristics. Patent Publication No. 10-1980-520 (Application No. 10-1979-474) and Patent Publication No. 10-1986-476 (Application No. 10-1984-802) and Patent Registration No. 10-405350.

이는 구리(Cu) 또는 구리합금으로 된 도선의 외주(외면)에 주석(Sn)을 도금한 것이다.This is a tin (Sn) plated on the outer circumference (outer surface) of a conductor made of copper (Cu) or a copper alloy.

도 1a 및 도 1b는 상기와 같은 전자부품용 리드선(READ WIRE)을 제조할 때에 도선의 외주(외면)에 주석(Sn)을 도금하는 종래의 리드선제조장치(1-1)(1-2)를 보인 것이다.1A and 1B show a conventional lead wire manufacturing apparatus 1-1 (1-2) in which tin (Sn) is plated on the outer circumference (outer surface) of a conductive wire when the lead wire for a electronic component (READ WIRE) is manufactured as described above. Will be shown.

도 1a에 예시된 종래의 리드선제조장치(1-1)는 전처리방치부(2)와 도금장치부(3)를 횡대로 설치한 것이다.In the conventional lead wire manufacturing apparatus 1-1 illustrated in FIG. 1A, the pretreatment leaving unit 2 and the plating apparatus unit 3 are provided horizontally.

전처리장치부(2)와 용융장치부(3)는 전처리조(5) 및 히팅장치(8)가 밑면에 장착된 복수의 용융조(6)를 일렬 횡대를 설치하되, 각 전처리조(5)와 용융조(6)의 상부 양측(인입측과 배출측)에는 인입유도롤러(5-1)(6-1)와 배출유도롤러(5-2)(6-2)를 각각 장착하고, 각 전처리조(5)와 용융조(6)의 내부에는 인입유도롤러(5-1)(6-1)와 배출유도롤러(5-2)(6-2)의 하측에 한 쌍씩의 아이들롤러(5-3)(6-3)을 각각 장착하며, 최종 용융조(7)의 상부 인입 측에는 인입유도롤러(7-1)를 장착하고 내부에는 배출유도롤러(7-2)를 설치한 것이다.The pretreatment unit 2 and the melter unit 3 are provided with a row side by side in the pretreatment tank 5 and the plurality of melting tanks 6, the heating device 8 is mounted on the bottom, each pretreatment tank (5) And induction rollers 5-1, 6-1 and discharge induction rollers 5-2 and 6-2, respectively, on both sides (inlet side and outlet side) of the upper part of the melting tank 6, Inside the pretreatment tank 5 and the melting tank 6, a pair of idle rollers are provided below the induction rollers 5-1, 6-1 and the discharge induction rollers 5-2, 6-2. 5-3) and 6-3, respectively, and the induction roller 7-1 is mounted on the upper inlet side of the final melting tank 7 and the discharge induction roller 7-2 is installed inside.

이와 같이 형성된 각 전처리조(5)와 용융조(6)의 인입유도롤러(5-1)(6-1)(7-1)와 배출유도롤러(5-2)(6-2)(7-2)에 도선(A)을 순차적으로 걸어주고, 각 전처리조(5)와 도금조(6)에 전처리액과 용융주석을 충진시킨 상태에서 도금을 실행하며, 용융된 용융리드선(A-1)은 약 45도 각도로 경사지게 배출시켜 차기공정(권취공정)으로 이송시키게 된다.Induction rollers 5-1, 6-1, 7-1 and discharge induction rollers 5-2, 6-2 and 7 of the respective pretreatment tanks 5 and the melting tank 6 formed as described above. -2), the conducting wires A are sequentially applied to each other, plating is performed while the pretreatment liquid and the molten tin are filled in each pretreatment tank 5 and the plating tank 6, and the molten molten lead wire A-1 ) Is inclined at an angle of about 45 degrees to be transferred to the next process (winding process).

도 1b에 예시된 리드선제조장치(1-2)는 본인에 의해 개발되어 선등록된 특허 등록 제10-41955호 "다단식 도금장치를 이용한 전자부품용 리드선 도금방법"을 보인 것이다.The lead wire manufacturing apparatus 1-2 illustrated in FIG. 1B shows a patent registration No. 10-41955, "Lead wire plating method for an electronic component using a multi-stage plating apparatus," developed and registered by the person.

이는 전기도금방식으로, 전처리장치부(2)와 도금장치부(3)를 종방향으로 설치한 것이 특징으로서, 전처리조(5) 및 히팅장치(8)가 밑면에 장착된 복수의 도금조(6)를 일렬 종대를 설치하되, 각 전처리조(5)와 도금조(6)의 상부 양측(인입측과 배출측)에는 인입유도롤러(5-1)(6-1)와 배출유도롤러(5-2)(6-2)를 각각 장착하고, 각 전처리조(5)와 도금조(6)의 내부에는 인입유도롤러(5-1)(6-1)와 배출유도롤러(5-2)(6-2)의 하측에 한 쌍씩의 아이들롤러(5-3)(6-3)을 각각 장착하며, 전처리조(5)와 도금조(6)의 사이 및 도금조(6)와 도금조(6)의 사이에서 외측에는 한 쌍의 안내롤러(9)를 좌우 반복적으로 설치한 것이다.The electroplating method is characterized in that the pretreatment unit 2 and the plating unit 3 are installed in the longitudinal direction, and a plurality of plating tanks in which the pretreatment tank 5 and the heating device 8 are mounted on the bottom ( 6) Install a line in longitudinal line, each of the pretreatment tank (5) and the upper side of the plating tank (6) (inlet side and outlet side), the induction roller (5-1) (6-1) and the discharge induction roller ( 5-2) and 6-2, respectively, and inside the pretreatment tank 5 and the plating tank 6, the induction rollers 5-1, 6-1 and the discharge induction roller 5-2. A pair of idle rollers (5-3) (6-3) are mounted to the lower side of (6-2), respectively, between the pretreatment tank (5) and the plating tank (6), and the plating tank (6). A pair of guide rollers 9 are repeatedly provided left and right on the outer side between the jaws 6.

이와 같이 형성된 각 전처리조(5)와 도금조(6)의 인입유도롤러(5-1)(6-1)(7-1)와 배출유도롤러(5-2)(6-2)(7-2)에 도선(A)을 순차적으로 걸어주되, 좌우 반복적으로 설치되는 안내롤러(9)를 거쳐 순차적으로 걸어주고, 각 전처리조(5)와 도금조(6)에 전처리액과 용융주석을 충진시킨 상태에서 도금을 실행하며, 도금된 도금리드선(A-1)은 최상단에 위치하는 최종 도금조(6)에서 배출시켜 차기공정(권취공정)으로 이송시키게 된다. The induction rollers 5-1, 6-1, 7-1 and the discharge induction rollers 5-2, 6-2 and 7 of each of the pretreatment tanks 5 and the plating tanks 6 formed as described above. -2) to the wire (A) in sequence, and sequentially walked through the guide roller (9) which is installed left and right repeatedly, pretreatment liquid and molten tin in each pretreatment tank (5) and plating tank (6) Plating is carried out in a filled state, and the plated plating lead wire A-1 is discharged from the final plating bath 6 located at the top thereof and transferred to the next step (winding step).

그러나, 이는 기존의 일직선상태로 늘어 놓은 종래의 전처리조와 도금조들을 수직 상태로 쌓아 놓은 것으로, 도선을 전처리한 후에 도금을 할 때에 도금을 실행하는 전체의 길이가 길어지게(약 300m) 되는 문제가 있고, 도선을 각 도금조로 단순하게 통과시키므로 주석(Sn)의 부착능력이 떨어지게 되며, 주석(Sn)의 떨어지는 부착능력을 해소하기 위하여 도금조를 반복적으로 통과시켜 도금을 하여야 하므로 도금시간이 길어지고 도금시간이 길어져 생산능력이 떨어지는 문제가 있다.However, this is a stack of conventional pre-treatment tanks and plating baths arranged in a straight line in a vertical state, the problem that the entire length of the plating is long (about 300m) when plating after pre-processing the wires Since the wire simply passes through each plating bath, the adhesion ability of the tin (Sn) is reduced, and the plating time is long because the plating bath must be repeatedly passed through the plating bath to eliminate the adhesion ability of the tin (Sn). There is a problem in that the production time is reduced due to the long plating time.

특히, 종래의 리드선제조장치(1-1)(1-2)들은 도선(A)을 인입유도롤러(5-1)(6-1)(7-1)와 배출유도롤러(5-2)(6-2)(7-2) 및 안내롤러(9)에 의해 지그재그로 걸어 이송시키게 되므로 이송능력이 현저히 떨어져(분당 350M 정도) 생산성이 떨어지는 문제가 있다.In particular, the conventional lead wire manufacturing apparatuses 1-1 (1-2) lead wires A to the induction rollers 5-1, 6-1, 7-1 and the discharge induction roller 5-2. (6-2) (7-2) and the guide rollers 9 are zigzag and transported, so that the transfer capacity is remarkably poor (about 350M / min), which leads to a problem of low productivity.

또한, 굵기가 0.03 ~ 0.10mm인 극세선 가닥(10 ~ 12줄)을 인입유도롤러(5-1)(6-1)(7-1)와 배출유도롤러(5-2)(6-2)(7-2) 및 안내롤러(9)에 걸어 이송시키게 되면 극세선 가닥이 인입유도롤러(5-1)(6-1)(7-1)와 배출유도롤러(5-2)(6-2)(7-2) 및 안내롤러(9)들과 빈번하게 접촉하여 마찰하고 절곡이 반복적으로 이루어지게 되며, 굵기가 극히 가느다란 극세선(극세선가닥)은 이송을 할 때에 마찰과 절곡이 반복적으로 실시되면서 이송도중에 쉽게 끊어지게 되는 문제가 있다.In addition, the ultra fine wire strands (10 to 12 lines) having a thickness of 0.03 to 0.10 mm are drawn in the induction rollers (5-1) (6-1) (7-1) and the discharge induction rollers (5-2) (6-2). (7-2) and guide rollers (9) are transported on the micro fine strands induction roller (5-1) (6-1) (7-1) and discharge guide roller (5-2) (6 -2) (7-2) and the guide rollers (9) are frequently in contact with the friction and bending is made repeatedly, and the ultra-fine wires (fine wire strands) of very thin thickness are friction and bending during transfer As this is repeatedly carried out, there is a problem that is easily broken during the transfer.

따라서 종래의 리드선제조장치(1-1)(1-2)로서는 굵기가 0.03 ~ 0.10mm인 극세선가닥(10 ~ 12줄)에 주석(Sn)이 도금시킬 수 없을 뿐만 아니라 극세선리드선을 원천적으로 생산(제조)할 수 없는 문제가 있다.Therefore, in the conventional lead wire manufacturing apparatus 1-1 (1-2), not only tin (Sn) can be plated on the fine wire strands (10 to 12 lines) having a thickness of 0.03 to 0.10 mm, but also the fine wire leads There is a problem that cannot be produced (manufactured).

본 발명은 상기와 같은 문제를 해소하여 극세리드선을 제조할 수 있는 전자부품용 극세리드선(READ WIRE) 제조장치 및 제조방법에 관한 것이다.The present invention relates to an ultra-thin lead wire (READ WIRE) manufacturing apparatus and a manufacturing method for an electronic component that can solve the above problems to manufacture a ultra-fine lead wire.

본 발명은, 구리(Cu) 또는 구리합금으로 된 도선의 외면(외주)에 주석(Sn)으로 된 용융액을 도금함에 있어서, 복수의 전처리조와 별도의 용융조를 수평상태의 일직선상으로 설치하고, 각 전처리조와 용융조의 각 공급측과 배출측에는 직선유통구뭉치를 동일 수평선상에 각각 장착하여, 도선을 각 전처리조와 용융조의 각 공급측과 배출측에 각각 설치된 직선유통씰링구들에 수평선상으로 통과시키면서 도선의 외주(외면)에 부착되어 있는 이물질 등을 깨끗하게 제거하는 전처리를 하고, 전처리된 도선을 히팅장치가 구비된 용융조에 용융주석을 통과시켜 전자부품용 극세리드선(READ WIRE) 제조장치와 제조방법을 제공하려는데 목적이 있다.In the present invention, in plating a molten solution made of tin (Sn) on the outer surface (outer periphery) of a conductor made of copper (Cu) or a copper alloy, a plurality of pretreatment tanks and separate melt baths are provided in a straight line in a horizontal state. Each supply side and the discharge side of each pretreatment tank and the melting tank are equipped with a straight flow ball bundle on the same horizontal line, and the lead wires are passed through the horizontal line through the straight flow sealing ports respectively provided on each supply side and the discharge side of each pretreatment tank and the melting tank. It provides pretreatment to remove foreign matters attached to the outer circumference (outer surface) cleanly, and passes the pretreated lead through molten tin through a melting tank equipped with a heating device, and provides an READ WIRE manufacturing device and manufacturing method for electronic parts. There is a purpose.

본 발명의 다른 목적은, 도선을 방향전환시키거나 절곡시키지 않고 접촉저항을 없이하는 일직선으로 이송시킴으로써 이송능력 즉 생산성을 크게 향상시킬 수 있고, 방향전환과 절곡되는 것과 접촉저항의 발생을 원천적으로 배제시켜 굵기가 극히 가느다란 극세선(0.03 ~ 0.10mm)의 가닥(10 ~ 12줄)을 절단 없이 원활하게 이송시키면서 도금(주석)을 용이하게 실시하여 극세리드선을 제조(생산)할 수 있도록 된 전자부품용 극세리드선(READ WIRE) 제조장치와 제조방법을 제공하려는데 있다.Another object of the present invention is to significantly improve the transfer capacity, that is, productivity by transferring the wire in a straight line without turning or bending the wire, and eliminating the turning and bending and the generation of contact resistance. It is possible to manufacture (produce) ultra fine wire by easily performing plating (tin) while smoothly transferring strands (10 to 12 lines) of ultra fine wires (0.03 to 0.10 mm) that are extremely thin. It is to provide an apparatus and a manufacturing method for a READ WIRE for parts.

본 발명의 또 다른 목적은, 전처리와 도금이 실시되는 전처리조와 용융조의 하측에 전처리순환조 및 용융순환조를 각각 설치하여, 전처리액과 용융액을 지속적을 순환시키면서 전처리 및 도금을 실행하여 전처리와 도금을 효율적으로 실시하고 전처리 및 도금 능력을 향상시킬 수 있도록 된 전자부품용 극세리드선(READ WIRE) 제조장치와 제조방법을 제공하려는데 있다.Still another object of the present invention is to provide a pretreatment circulation tank and a melt circulation tank under the pretreatment tank and the melting tank where pretreatment and plating are performed, respectively, and pretreatment and plating by continuously circulating the pretreatment liquid and the melt, and pretreatment and plating. The present invention aims to provide an READ WIRE manufacturing apparatus and a manufacturing method for an electronic component that can efficiently perform and improve pretreatment and plating ability.

본 발명의 상기 및 기타 목적은, The above and other objects of the present invention,

구리(Cu) 또는 구리합금으로 된 도선을 전처리조로 통과시켜 외면에 부착된 이물질을 제거하고, 전처리조를 통과하여 이물질이 제거된 도선을 주석(Sn)으로 된 용융액이 충진되고 밑면에 히팅장치(34)가 설치된 용융조(30)로 통과시키면서 도금하는 것에 있어서, Pass the copper (Cu) or copper alloy wire through the pretreatment tank to remove foreign substances adhering to the outer surface, and through the pretreatment tank, the conducting wire from which the foreign matter is removed is filled with a melt of tin (Sn) and the heating device ( In plating while passing through the molten bath 30 provided with 34),

극세도선(A)의 외면에 부착된 이물질을 제거하는 전처리장치부(2)의 제1전처리조(10)와 제2전처리조(20) 및 밑면에 히팅장치(34)가 장착된 도금장치부(3)의 용융조(30)를 동일 수평선상에 나란하게 연속 설치한 것과;The first pretreatment tank 10 and the second pretreatment tank 20 of the pretreatment unit 2 for removing the foreign matter attached to the outer surface of the ultra fine wire A, and the plating apparatus unit on which the heating device 34 is mounted. (3) that the molten bath 30 is continuously installed side by side on the same horizontal line;

동일 수평선상에 나란하게 연속 설치되는 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 인입 및 배출의 양 측면에는 직선유통구뭉치(40)를 충진되는 전처리액 및 용융조(30)의 높이 보다 낮게 각각 장착한 것과;Pretreatment liquid filled with a linear distribution ball 40 on both sides of the inlet and discharge of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 which are continuously installed side by side on the same horizontal line. And lower than the height of the melting tank 30, respectively;

동일한 수평선상으로 장착되는 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 각 직선유통씰링구(40)들을 통해 극세도선(A)을 수평으로 공급/배출시키면서 전처리 및 도금을 하도록 한 것과;While supplying / discharging the ultra-fine conductive wires A horizontally through the linear distribution sealing holes 40 of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 mounted on the same horizontal line. Pretreatment and plating;

각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 하측에는 제1전처리순환조(11)와 제2전처리순환조(21) 및 밑면에 히팅장치(35)가 장착된 용융순환조(31)를 각각 설치하여, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 충진되는 전처리액과 용융액을 순환장치에 의해 지속적으로 순환시키면서 전처리 및 도금을 실행하도록 한 것;이 포함되는 것을 특징으로 하는 극세리드선 제조장치(1-3)에 의해 달성된다.Under the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30, a first pretreatment circulation tank 11, a second pretreatment circulation tank 21, and a heating device 35 on the bottom thereof. Respectively equipped with a melt circulation tank 31, and continuously circulates the pretreatment liquid and the melt liquid filled in the first pretreatment tank 10, the second pretreatment tank 20, and the molten bath 30 by a circulation device. It is achieved by the ultra-fine lead wire manufacturing apparatus (1-3) characterized in that the;

본 발명의 다른 상기 및 기타 목적은, Other above and other objects of the present invention,

구리(Cu) 또는 구리합금으로 된 도선을 전처리조로 통과시켜 외면에 부착된 이물질을 제거하는 전처리공정, 전처리조를 통과하여 이물질이 제거된 도선을 주석(Sn)으로 된 용융석이 충진되고 밑면에 히팅장치(34)가 설치된 용융조(30)로 통과시키면서 도금시키는 도금공정을 실행하는 것에 있어서, Pre-treatment process that removes foreign substances adhering to the outer surface by passing the copper (Cu) or copper alloy wire through the pretreatment tank, molten stone made of tin (Sn) is filled and heated to the bottom In carrying out the plating step of plating while passing through the molten bath 30 provided with the apparatus 34,

극세선(A)의 외면에 부착된 이물질을 제거하는 전처리공정은 제1전처리조(10)와 제2전처리조(20) 및 도금이 실행되는 용융조(30)를 나란하게 설치하여 도선(A)을 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)로 관통 이동시키면서 이중 전처리와 도금하여 도금극세리드선(A-1)을 배출시키는 공정과;In the pretreatment step of removing foreign matter adhering to the outer surface of the ultrafine wire A, the first pretreatment tank 10 and the second pretreatment tank 20 and the melting tank 30 where plating is performed are installed side by side. ) And discharging the plated ultra fine lead A-1 by plating the double pretreatment while penetrating and moving through the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30;

각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 하측에 제1전처리순환조(11)와 제2전처리순환조(21) 및 용융순환조(31)를 각각 설치하여, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 충진되는 전처리액과 용융액을 순환장치에 의해 지속적으로 순환시키는 공정;이 포함되는 것을 특징으로 하는 극세리드선 제조방법에 의해 달성된다.The first pretreatment circulation tank 11, the second pretreatment circulation tank 21, and the melt circulation tank 31 are disposed below the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30. Respectively installed, the step of continuously circulating the pretreatment liquid and the molten liquid filled in the first pretreatment tank 10, the second pretreatment tank 20 and the molten bath 30 by the circulation device; It is achieved by a micro lead wire manufacturing method.

본 발명의 상기 및 기타 목적과 특징은 첨부된 도면에 의거한 다음의 상세한 설명에 의해 더욱 명확하게 이해할 수 있을 것이다.The above and other objects and features of the present invention will be more clearly understood by the following detailed description based on the accompanying drawings.

첨부된 도면 도 2 내지 도 3b는 본 발명에 따른 극세리드선제조장치(1-3)의 구체적인 실현 예를 보인 것으로서, 도 2는 본 발명에 따른 극세리드선제조장치(1-3)를 보인 계통도이고, 도 3a 및 도 3b는 본 발명에 설치되는 직선유통씰링구(40) 를 보인 사시도 및 단면도이다.2 to 3b are views showing specific implementation examples of the ultra fine lead wire manufacturing apparatus 1-3 according to the present invention, and FIG. 2 is a schematic diagram showing the ultra lead wire manufacturing apparatus 1-3 according to the present invention. 3A and 3B are a perspective view and a cross-sectional view showing a straight flow sealing hole 40 installed in the present invention.

본 발명에 따른 극세리드선제조장치(1-3)도 2에 예시된 바와 같이 전처리장치부(2)와 도금처리장치부(3)로 형성하였다.The ultra fine lead wire manufacturing apparatus 1-3 according to the present invention was also formed of the pretreatment unit 2 and the plating treatment unit 3 as illustrated in FIG. 2.

상기 전처리장치부(2)와 도금처리장치부(3)는 다음과 같이 형성하였다.The pretreatment unit 2 and the plating treatment unit 3 were formed as follows.

제1전처리조(10)와 제2전처리조(20) 및 용융조(30)를 동일선상에 나란하게 설치하였고, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 각 양측면(인입측과 배출측)에는 차후에 구체적으로 설명되는 직선유통씰링구(40)를 각각 설치(장착)하되, 각 직선유통씰링구(40)를 측면의 중간 상측에 설치하여 충진되는 전처리액 또는 용융액의 하측에 위치하도록 하였다.The first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 were installed side by side on the same line, and the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 were installed side by side. Each side surface (inlet side and outlet side) of the) is installed (installed), respectively, the linear distribution sealing sphere 40 which will be described in detail later, each of the linear distribution sealing sphere 40 is installed by filling the upper side of the middle It was set under the pretreatment liquid or melt liquid.

제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 각 양측면(인입측과 배출측)에 각각 설치(장착)되는 직선유통씰링구(40)는 도 3a 및 도 3b에 예시된 바와 같이, 유통씰링구(41)의 중앙에는 극세리드선이 통과할 수 있도록 미세한 크기의 유통공(42)을 전후로 개방되게 형성하였고, 유통공(42)의 전면과 배면의 양측 면에서 유통공(42)의 외측에는 나팔형으로 된 확개부(43)(44)를 각각 형성하여 극세도선 및 극세리드선이 용이하게 통과(인입 및 배출)시킬 수 있도록 하였다.3A and FIG. 3 are straight line sealing ports 40 which are installed (mounted) on both side surfaces (inlet side and outlet side) of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30, respectively. As illustrated in 3b, at the center of the distribution sealing opening 41, a minute size distribution hole 42 was opened and opened to the front and rear of the distribution hole 42 so as to allow the ultra fine lead to pass therethrough. In the outside of the distribution hole 42, trumpet-shaped extensions 43 and 44 were formed, respectively, so that the micro-conductors and the micro-lead wires could easily pass (intake and discharge).

특히 상기 직선유통씰링구(40)는 금속 또는 합성수지 등으로 성형하여 통과(인입 및 배출)하는 극세도선 및 극세리드선을 손상시키지 않도록 하였다.In particular, the linear distribution sealing sphere 40 is formed of metal or synthetic resin, etc. so as not to damage the ultra-fine wire and the ultra-lead wire passing through (inlet and discharge).

또 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 각 하측에는 제1전처리순환조(11)와 제2전처리순환조(21) 및 용융순환조(31)를 각각 나란하게 설치하였고, 제1전처리조(10)와 제1전처리순환조(11)의 사이 및 제2전처리조(20)와 제2전 처리순환조(21)의 사이 그리고 용융조(30)와 용융순환조(31)의 사이에는 순환장치를 각각 설치하여 전처리액 또는 용융액을 순환시킬 수 있도록 하였다.Further, the first pretreatment circulation tank 11, the second pretreatment circulation tank 21, and the melt circulation tank 31 are disposed below the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30. Are installed side by side, respectively, between the first pretreatment tank 10 and the first pretreatment circulation tank 11, and between the second pretreatment tank 20 and the second pretreatment circulation tank 21 and the melting tank 30. And a circulation device are installed between the melt circulation tank 31 and each to circulate the pretreatment solution or the melt.

상기 제1전처리조(10)와 제1전처리순환조(11) 및 제2전처리조(20)와 제2전처리순환조(21) 그리고 용융조(30)와 용융순환조(31)의 사이에 각각 설치되어 전처리액 또는 용융액을 순환시키는 순환장치는, 각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 밑면에는 공급순환관(12)(22)(32)과 배출순환관(13)(23)(33)을 나란하게 각각 설치하되 각 공급순환관(12)(22)(32)과 배출순환관(13)(23)(33)의 하단이 제1전처리순환조(11)와 제2전처리순환조(21) 및 용융순환조(31)의 내부까지 유입되도록 하였고, 각 공급순환관(12)(22)(32)에는 펌프(P1)(P2)(P3)를 각각 장착하여 배출순환관(13)(23)(33)을 통해 제1전처리순환조(11) 또는 제2전처리순환조(21) 또는 용융순환조(31)로 자유 낙하하는 전처리액 또는 용융액을 펌핑하여 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 각각 공급하여 순환시킬 수 있도록 하였다.Between the first pretreatment tank 10, the first pretreatment circulation tank 11, the second pretreatment tank 20, the second pretreatment circulation tank 21, and the melting tank 30 and the melt circulation tank 31. Each of the circulation devices for circulating the pretreatment liquid or the melt is provided with supply circulation pipes 12, 22, 32 at the bottom of each of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30. ) And discharge circulation tubes 13, 23, 33 are installed side by side, respectively, but the lower ends of each supply circulation tube 12, 22, 32 and discharge circulation tubes 13, 23, 33 The first pretreatment circulation tank 11, the second pretreatment circulation tank 21, and the melt circulation tank 31 were introduced to the inside, and each of the supply circulation pipes 12, 22, and 32 had a pump P1 (P2). (P3) are respectively mounted to free fall into the first pretreatment circulation tank 11 or the second pretreatment circulation tank 21 or the melt circulation tank 31 through the discharge circulation pipes (13) (23) and (33). The pretreatment liquid or the melt is pumped and supplied to the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30, respectively. It was to be able to ring.

이하 상기와 같이 구성된 본 발명에 따른 극세리드선제조장치(1-3)에 의해 극세리드선(A-1)을 제조하는 방법(과정)을 설명한다.Hereinafter, a method (process) of manufacturing the ultra fine lead wire A-1 by the ultra fine lead wire manufacturing apparatus 1-3 according to the present invention configured as described above will be described.

동일 수평선상을 유지하도록 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 양측(유입 및 배출)에 장착된 각 직선유통구(40)의 유통공(42)에는 선 공정에서 신선 및 연화된 극세리드선(A)을 통과시켜 설치하고, 용융조(30)의 배출측 직선유통구(40)의 유통공(42)에서 배출되는 극세리드선(A)을 차기(권취)공정에 걸어 준다.Distribution holes 42 of the respective linear flow ports 40 mounted on both sides (inflow and discharge) of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 so as to maintain the same horizontal line. In the preliminary process, the wires are installed by passing the fresh and softened ultra fine lead wires A, and the ultra fine lead wires A discharged from the distribution hole 42 of the straight flow port 40 on the discharge side of the melting tank 30 are next installed. Winding) walk on the process.

상기와 같이 극세리드선(A)을 걸어 준 상태에서 각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에는 전처리액 및 용융액을 충진시키되 설치된 극세리드선(A)이 충분히 잠기도록 충진시키고, 제1전처리순환조(11)와 제2전처리순환조(21) 및 용융순환조(31)에도 전처리액 및 용융주석을 충진시키되 각 공급순환관(12)(22)(32)과 배출순환관(13)(23)(33)의 하단이 잠기도록 충분히 충진시킨다.As described above, the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 are filled with the pretreatment solution and the melt solution in the state where the ultra fine lead wire A is applied. Filled to be sufficiently submerged, and the first pretreatment circulation tank 11, the second pretreatment circulation tank 21 and the melt circulation tank 31 is also filled with the pretreatment liquid and molten tin, each supply circulation pipe (12) (22) ( 32) and the bottom of the discharge circulation tube 13, 23, 33 is sufficiently filled to lock.

이와 같이 극세리드선(A)을 걸어주고 전처리액 및 용융석을 각각 충진시킨 상태에서 메인스위치(구체적으로 도시하지 아니함)를 조작하여 극세리드선(A)을 공급 및 당기고, 각 펌프(P1)(P2)(P3)를 가동시켜 전처리액 및 용융액을 순환시키면서 도금을 실시한다. In this way, the ultra fine lead wire A is applied and the main switch (not specifically shown) is operated while the pretreatment liquid and the molten stone are filled, respectively, to supply and pull the ultra fine lead wire A, and each pump P1 (P2) (P3) is operated and plating is performed while circulating the pretreatment liquid and the molten liquid.

특히, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 각 각 직선유통구(40)에 수평으로 걸진 극세도선(A)은 분당 3500M 내외의 속도로 이동시키면서 전처리 및 도금을 실시한다. In particular, the ultra-fine conductive wires A, which are horizontally applied to the straight flow ports 40 in the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30, respectively, move at a speed of about 3500 M / min. Pretreatment and plating are performed.

전처리장치부(2)의 각 제1전처리조(10)와 제2전처리조(20)에 설치된 펌프(P1)(P2)가 작동하게 되면 제1전처리순환조(11)와 제2전처리순환조(21)에 각각 충진된 전처리액이 펌핑되어 각 순환공급관(12)(22)을 통해 제1전처리조(10)와 제2전처리조(20)에 공급되고, 제1전처리조(10)와 제2전처리조(20)에 이미 충진되어 있던 전처리액은 배출순환(13)(23)을 통해 낙하하여 제1전처리순환조(11)와 제2전처리순환조(21)에 공급되며, 따라서 제1전처리조(11)와 제2전처리조(22) 및 제1전처리순환조(11)와 제2전처리순환조(21)에 충진된 전처리액은 펌프(P1)(P2)의 작동에 의해 순환하게 된다.When the pumps P1 and P2 installed in each of the first pretreatment tank 10 and the second pretreatment tank 20 of the pretreatment unit 2 operate, the first pretreatment circulation tank 11 and the second pretreatment circulation tank The pretreatment liquid filled in each of the 21 is pumped and supplied to the first pretreatment tank 10 and the second pretreatment tank 20 through each of the circulation supply pipes 12 and 22, and the first pretreatment tank 10 and The pretreatment liquid already filled in the second pretreatment tank 20 is dropped through the discharge circulation 13, 23 and is supplied to the first pretreatment circulation tank 11 and the second pretreatment circulation tank 21, and thus The pretreatment liquid filled in the first pretreatment tank 11, the second pretreatment tank 22, and the first pretreatment circulation tank 11 and the second pretreatment circulation tank 21 is circulated by the operation of the pumps P1 and P2. Done.

상기 펌프(P1)(P2)의 작동에 의해 제1전처리순환조(11)와 제2전처리순환조(21)에 각각 충진된 전처리액이 각 제1전처리조(10)와 제2전처리조(20)에 공급될 때에, 순환공급관(12)(22)을 통해 제1전처리조(10)와 제2전처리조(20)로 공급되는 전처리액은 제1전처리조(11)와 제2전처리조(22)의 내부에서 순환하면서 요동하게 되므로 극세리드선(A)이 신속히 통과하게 되더라도 극세리드선(A)의 외면에 부착되어 있는 이물질들을 용이하게 신속하게 분리(탈락)시킬 수 있게 된다.The pretreatment liquids respectively filled in the first pretreatment circulation tank 11 and the second pretreatment circulation tank 21 by the operation of the pumps P1 and P2 are each of the first pretreatment tank 10 and the second pretreatment tank ( 20, the pretreatment liquid supplied to the first pretreatment tank 10 and the second pretreatment tank 20 through the circulation supply pipes 12 and 22 is the first pretreatment tank 11 and the second pretreatment tank. Since it swings while circulating inside (22), even if the ultrafine lead wire A passes quickly, foreign matters attached to the outer surface of the ultrafine lead wire A can be easily separated (dropped off).

또한, 용융장치부(3)의 용융석조(30)에 설치된 펌프(P3)가 작동하게 되면 용융순환조(31)에 충진된 용융석 즉, 주석(Sn)용액이 펌핑되어 순환공급관(32)을 통해 용융조(30)에 공급되고, 용융조(30)에 충진되어 있던 용융석은 배출순환(33)을 통해 낙하하여 용융순환조(31)에 공급되면서 순환하게 된다.In addition, when the pump P3 installed in the molten stone tank 30 of the melter unit 3 is operated, the molten stone filled in the molten circulating tank 31, that is, tin (Sn) solution is pumped to circulate the supply pipe 32. The molten stone which is supplied to the molten bath 30 through the melted tank 30 is dropped through the discharge circulation 33 and circulated while being supplied to the molten circulation tank 31.

상기 펌프(P3)의 작동에 의해 용융조(30)에 충진된 용융석이 도금순환조(32)에 공급될 때에, 순환공급관(32)을 통해 용융조(30)로 공급되는 용융석은 용융조(30)의 내부에서 순환하면서 요동하게 되므로 신속하게 통과하는 극세리드선(A)의 외면에는 용융석 즉, 주석(Sn)용액이 용이하고 신속하면서 균일하게 도금된다.When the molten stone filled in the molten bath 30 is supplied to the plating circulation tank 32 by the operation of the pump P3, the molten stone supplied to the molten bath 30 through the circulation supply pipe 32 is a molten bath ( Since it swings while circulating in the inside of 30), molten stone, that is, tin (Sn) solution is plated easily, quickly and uniformly on the outer surface of the ultra fine lead wire A which passes quickly.

극세리드선(A) 또는 도금이 완료된 도금극세리드선(A-1)이 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 장착된 각 직선유통씰링구(40)의 유통공(42)을 각각 통과(유통)할 때에, 유통공(42)의 인입(공급)측과 배출측에 확개부(43)(44)가 각각 형성되어 있으므로 극세리드선(A) 또는 도금극세리드선(A-1)은 용이하게 이동하게 된다.Each of the straight line sealing holes 40 mounted on the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 is provided with the ultra fine lead wire A or the plated ultra fine lead wire A-1 having completed plating. When passing (distributing) each of the distribution holes 42, the extension portions 43 and 44 are formed on the inlet (supply) side and the discharge side of the distribution hole 42, respectively. The ultrafine lead wire A-1 is easily moved.

특히, 극세리드선(A) 또는 도금이 완료된 도금극세리드선(A-1)이 각 각 직선 유통씰링구(40)의 유통공(42)을 각각 통과(유통)할 때에 제1전처리조(10)와 제2전처리조(20) 또는 도금조(30)에 각각 충진된 전처리액과 용융석은 표면장력의 현상에 의해 제1전처리조(10)와 제2전처리조(20) 또는 도금조(30)의 외부로 배출도지 않은 상태를 유지하게 된다.In particular, the first pretreatment tank 10 when the ultra fine lead wire A or the plated ultra fine lead wire A-1 of which plating is completed passes through (distributes) the distribution holes 42 of the linear flow distribution sealing holes 40, respectively. And the pretreatment liquid and the molten stone respectively filled in the second pretreatment tank 20 or the plating tank 30 are first pretreatment tank 10 and the second pretreatment tank 20 or the plating tank 30 by the phenomenon of surface tension. It will not be discharged to the outside of the state.

도금조(30)를 통과하면서 도금이 완료되어 최종 직선유통씰링구(40)를 통고하여 배출되는 도금극세리드선(A-1)은 차기공정(권취공정)으로 이송된다.Plating is completed while passing through the plating bath 30 and the plated ultra fine lead wire A-1 discharged through the final straight flow sealing port 40 is transferred to the next step (winding step).

이와 같이 본 발명에 따른 극세리드선제조장치(1-3)는 공급되는 극세도선(A)을 전처리장치부(2)의 제1전처리조(10)와 제2전처리조(20) 및 도금장치부(3)의 용융조(30)를 통과시키면서 전처리 및 도금을 실시할 때에 방향전환시키거나 절곡시키지 않고 접촉저항을 없이하는 일직선으로 이송시킴으로써 굵기가 극히 가느다란 극세리드선을 고속으로 이송시키면서 도금을 실시할 수 있게 된다.As described above, the ultra-fine lead wire manufacturing apparatus 1-3 according to the present invention transfers the ultra-fine wire A supplied from the first pretreatment tank 10, the second pretreatment tank 20, and the plating apparatus part of the pretreatment unit 2. When pretreatment and plating are carried out while passing through the molten bath 30 of (3), the plating is carried out while transferring extremely thin wires having a very thin thickness at a high speed by transferring them in a straight line without changing contact or bending. You can do it.

상기는 본 발명의 특정한 실시 예에 대해서만 설명 및 도시하였지만, 당업자에 의해 다양하게 변형하여 실시할 수 있으며, 이와 같이 변형될 수 있는 실시 예들은 본 발명의 사상이나 기술적 구성으로부터 개별적으로 이해되어서는 아니 될 것이며, 본 발명의 특허청구범위에 속한다 해야 할 것이다.Although the above has been described and illustrated only with respect to specific embodiments of the present invention, various modifications can be made by those skilled in the art, and the embodiments which can be modified as described above are not to be individually understood from the spirit or technical configuration of the present invention. Will be belong to the claims of the present invention.

본 발명에 따른 전자부품용 극세리드선(READ WIRE) 제조장치 및 제조방법은, 구리(Cu) 또는 구리합금으로 된 도선의 외면(외주)에 주석(Sn)으로 된 용융석을 도금(피막)함에 있어서, 복수의 전처리조와 별도의 용융조를 수평상태의 일직선상으로 설치하고, 각 전처리조와 용융조의 각 공급측과 배출측에는 직선유통구뭉치를 동일 수평선상에 각각 장착하여, 도선을 각 전처리조와 용융조의 각 공급측과 배출측에 각각 설치된 직선유통씰링구들에 수평선상으로 통과시키면서 도선의 외주(외면)에 부착되어 있는 이물질 등을 깨끗하게 제거하는 전처리를 하고, 전처리된 도선을 히팅장치가 구비된 용융조의 용융 주석을 통과시켜 도금시키도록 된 것으로서, An apparatus and a manufacturing method for an READ WIRE for an electronic component according to the present invention are to plate (film) molten stone made of tin (Sn) on an outer surface (outer periphery) of a conductor made of copper (Cu) or a copper alloy. In this case, a plurality of pretreatment tanks and separate melting tanks are installed in a straight line in a horizontal state, and a linear flow ball is mounted on the same horizontal line on each supply side and discharge side of each pretreatment tank and the melting tank, respectively, and the wires are Pretreatment to cleanly remove foreign substances attached to the outer circumference (outer surface) of the conducting wire while passing through the horizontal straight sealing seals installed on each supply side and the discharge side, respectively, and melt the molten bath equipped with the heating device. It is to be plated through tin,

도선을 방향전환시키거나 절곡시키지 않고 접촉저항을 없이하는 일직선으로 이송시킴으로써 이송능력 즉 생산성을 크게 향상시킬 수 있고, 방향전환과 절곡되는 것과 접촉저항의 발생을 원천적으로 배제시켜 굵기가 극히 가느다란 극세선(0.03 ~ 0.10mm)의 가닥(10 ~ 12줄)을 절단 없이 원활하게 이송시키면서 주석도금을 용이하게 실시하여 극세리드선을 제조(생산)할 수 있으며, 전처리와 도금이 실시되는 전처리조와 용융석의 하측에 전처리순환조 및 용융순환조를 각각 설치하여 전처리액과 용융석을 지속적을 순환시키면서 전처리 및 도금을 실행하여 전처리와 도금을 효율적으로 실시하고 전처리 및 도금 능력을 향상시킬 수 있다.By transferring the wire in a straight line without turning or bending the wire, it is possible to greatly improve the transfer capacity, that is, the productivity, and to make it extremely thin by excluding the bending and bending and the generation of contact resistance. It is possible to manufacture (produce) ultra fine lead wire by easily tin plating while transferring strands (10 ~ 12 lines) of wire (0.03 ~ 0.10mm) without cutting. The pretreatment circulation tank and the melt circulation tank are installed at the lower side, and the pretreatment and plating are carried out while continuously circulating the pretreatment liquid and the molten stone, so that the pretreatment and plating can be efficiently performed and the pretreatment and plating ability can be improved.

Claims (4)

구리(Cu) 또는 구리합금으로 된 도선을 전처리조로 통과시켜 외면에 부착된 이물질을 제거하고, 전처리조를 통과하여 이물질이 제거된 도선을 주석(Sn)으로 된 용융석이 충진되고 밑면에 히팅장치(34)가 설치된 용융조(30)로 통과시키면서 도금하는 것에 있어서, Pass the copper (Cu) or copper alloy wire through the pretreatment tank to remove foreign substances adhering to the outer surface, and through the pretreatment tank, the lead wire with the foreign matter removed is filled with molten stone made of tin (Sn), and the heating device ( In plating while passing through the molten bath 30 provided with 34), 극세도선(A)의 외면에 부착된 이물질을 제거하는 전처리장치부(2)의 제1전처리조(10)와 제2전처리조(20) 및 밑면에 히팅장치(34)가 장착된 도금장치부(3)의 용융조(30)를 동일 수평선상에 나란하게 연속 설치한 것과;The first pretreatment tank 10 and the second pretreatment tank 20 of the pretreatment unit 2 for removing the foreign matter attached to the outer surface of the ultra fine wire A, and the plating apparatus unit on which the heating device 34 is mounted. (3) that the molten bath 30 is continuously installed side by side on the same horizontal line; 동일 수평선상에 나란하게 연속 설치되는 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 인입 및 배출의 양 측면에는 직선유통구뭉치(40)를 충진되는 전처리액 및 용융조(30)의 높이 보다 낮게 각각 장착한 것과;Pretreatment liquid filled with a linear distribution ball 40 on both sides of the inlet and discharge of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 which are continuously installed side by side on the same horizontal line. And lower than the height of the melting tank 30, respectively; 동일한 수평선상으로 장착되는 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 각 직선유통씰링구(40)들을 통해 극세도선(A)을 수평으로 공급/배출시키면서 전처리 및 도금을 하도록 한 것과;While supplying / discharging the ultra-fine conductive wires A horizontally through the linear distribution sealing holes 40 of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 mounted on the same horizontal line. Pretreatment and plating; 각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 하측에는 제1전처리순환조(11)와 제2전처리순환조(21) 및 밑면에 히팅장치(35)가 장착된 용융순환조(31)를 각각 설치하여, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 충진되는 전처리액과 용융석을 순환장치에 의해 지속적으로 순환시키면서 전처리 및 도금을 실행하도록 한 것;이 포함되는 것을 특징으로 하는 극세리드선 제조장치.Under the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30, a first pretreatment circulation tank 11, a second pretreatment circulation tank 21, and a heating device 35 on the bottom thereof. The molten circulating tank 31 equipped with each other and continuously circulating the pretreatment liquid and the molten stone filled in the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 by a circulating device. The pre-treatment and plating to be performed while circulating; Ultra-fine lead wire manufacturing apparatus comprising a. 청구항 1에 있어서, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 각 양측면에 각각 설치되는 직선유통씰링구(40)는;The method according to claim 1, The first pre-treatment tank 10, the second pre-treatment tank 20 and the straight flow sealing sphere 40 is provided on each side of each of the melting tank 30; 유통씰링구(41)의 중앙에는 유통공(42)을 전후로 개방되게 형성하여 극세리드선이 통과할 수 있도록 한 것과; In the center of the distribution sealing port 41 is formed so that the distribution hole 42 is opened to the front and rear to allow the ultra fine lead wire to pass through; 유통공(42)의 전면과 배면의 양측 면에서 유통공(42)의 외측에는 확개부(43)(44)를 각각 형성한 것;을 특징으로 하는 전자부품용 극세리드선 제조장치.And an extension portion (43) (44) formed on the outer side of the distribution hole (42) on both front and rear surfaces of the distribution hole (42), respectively. 청구항 1에 있어서, 제1전처리조(10)와 제1전처리순환조(11), 제2전처리조(20)와 제2전처리순환조(21), 용융조(30)와 용융순환조(31)의 사이에 각각 설치되는 순환장치는, The first pretreatment tank 10, the first pretreatment circulation tank 11, the second pretreatment tank 20, the second pretreatment circulation tank 21, the melting tank 30, and the melt circulation tank 31. Circulator installed between each) 각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 밑면에는 전처리액 또는 용융석을 자유낙하시킬 수 있도록 공급순환관(12)(22)(32)과 배출순환관(13)(23)(33)을 나란하게 각각 설치한 것과;Supply circulation tubes 12, 22, 32 and discharges are provided on the bottom of each of the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30 so as to freely drop the pretreatment liquid or molten stone. The circulation pipes 13, 23, 33 are respectively installed side by side; 각 공급순환관(12)(22)(32)에는 제1전처리순환조(11) 또는 제2전처리순환조(21) 또는 용융순환조(31)로 자유 낙하하는 전처리액 또는 용융석을 펌핑하여 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 각각 공급하여 순환시킬 수 있도록 펌프(P1)(P2)(P3)를 각각 장착한 것;을 특징으로 하는 전자부품용 극세리드선 제조장치.Each of the supply circulation pipes 12, 22 and 32 is pumped with pretreatment liquid or molten stone falling freely into the first pretreatment circulation tank 11, the second pretreatment circulation tank 21, or the melt circulation tank 31. And pumps P1, P2, and P3, respectively, for supplying and circulating the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30, respectively. Ultra-fine lead wire manufacturing equipment for parts. 구리(Cu) 또는 구리합금으로 된 도선을 전처리조로 통과시켜 외면에 부착된 이물질을 제거하는 전처리공정, 전처리조를 통과하여 이물질이 제거된 도선을 주석(Sn)으로 된 용융액이 충진되고 밑면에 히팅장치(34)가 설치된 용융조(30)로 통과시키면서 도금시키는 도금공정을 실행하는 것에 있어서, Pre-treatment process that removes foreign substances adhering to the outer surface by passing the copper (Cu) or copper alloy lead through the pretreatment tank, and melts the tin liquid (Sn) filled with the lead through the pretreatment tank and heats the bottom In carrying out the plating step of plating while passing through the molten bath 30 provided with the apparatus 34, 극세선(A)의 외면에 부착된 이물질을 제거하는 전처리공정은 제1전처리조(10)와 제2전처리조(20) 및 도금이 실행되는 용융조(30)를 나란하게 설치하여 도선(A)을 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)로 관통 이동시키면서 이중 전처리와 도금하여 도금극세리드선(A-1)을 배출시키는 공정과;In the pretreatment step of removing foreign matter adhering to the outer surface of the ultrafine wire A, the first pretreatment tank 10 and the second pretreatment tank 20 and the melting tank 30 where plating is performed are installed side by side. ) And discharging the plated ultra fine lead A-1 by plating the double pretreatment while penetrating and moving through the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30; 각 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)의 하측에 제1전처리순환조(11)와 제2전처리순환조(21) 및 용융순환조(31)를 각각 설치하여, 제1전처리조(10)와 제2전처리조(20) 및 용융조(30)에 충진되는 전처리액과 용융석을 순환장치에 의해 지속적으로 순환시키는 공정;이 포함되는 것을 특징으로 하는 극세리드선 제조방법.The first pretreatment circulation tank 11, the second pretreatment circulation tank 21, and the melt circulation tank 31 are disposed below the first pretreatment tank 10, the second pretreatment tank 20, and the melting tank 30. Installed respectively, the step of continuously circulating the pretreatment liquid and the molten stone filled in the first pretreatment tank 10, the second pretreatment tank 20 and the molten bath 30 by a circulation device; Ultra-fine lead wire manufacturing method.
KR1020070042272A 2007-05-01 2007-05-01 A read wire product system and method KR100847277B1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4111772A (en) 1975-05-22 1978-09-05 Pitt Metals And Chemicals, Inc. Process for electrodialytically controlling the alkali metal ions in a metal plating process
KR19980064606A (en) * 1996-12-27 1998-10-07 에모토간지 Molten Metal Plating Equipment and Molten Metal Plating Methods
KR20040052517A (en) * 2001-10-17 2004-06-23 가부시키 가이샤 에바라 세이사꾸쇼 Plating apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4111772A (en) 1975-05-22 1978-09-05 Pitt Metals And Chemicals, Inc. Process for electrodialytically controlling the alkali metal ions in a metal plating process
KR19980064606A (en) * 1996-12-27 1998-10-07 에모토간지 Molten Metal Plating Equipment and Molten Metal Plating Methods
KR20040052517A (en) * 2001-10-17 2004-06-23 가부시키 가이샤 에바라 세이사꾸쇼 Plating apparatus

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