KR100837320B1 - An apparatus for processing glass substrate - Google Patents

An apparatus for processing glass substrate Download PDF

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KR100837320B1
KR100837320B1 KR1020070043427A KR20070043427A KR100837320B1 KR 100837320 B1 KR100837320 B1 KR 100837320B1 KR 1020070043427 A KR1020070043427 A KR 1020070043427A KR 20070043427 A KR20070043427 A KR 20070043427A KR 100837320 B1 KR100837320 B1 KR 100837320B1
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South Korea
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substrate
opening
closing
inlet
processing apparatus
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KR1020070043427A
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Korean (ko)
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손현호
김철식
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주식회사 디엠에스
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

A substrate processing apparatus is provided to increase durability by opening/closing a substrate inlet according as an opening/closing plate integrally rotates with a rotation shaft, and prevent drooping caused by self load of the transferred substrate by installing idle rollers on the rotation shaft. In a substrate processing apparatus having a shutter system(60), the shutter system comprises a rotation shaft(20), an opening/closing unit(30) and a driving unit(40). The rotation shaft includes plural idle rollers(25) and a fixing unit(27). The plural idle rollers are spaced with equal intervals along a length direction so as to prevent drooping caused by self load by supporting a lower side of a substrate when the substrate is inputted into a substrate inlet. The fixing unit is fixed and coupled as surrounding an outer circumference of both sides of the idle rollers so as to prevent axial movement of the idle roller. The opening/closing unit comprises an opening/closing plate(35) and a support bar(32). The opening/closing plate is installed to open/close the substrate inlet as integrally rotating with the rotation shaft after one side of the opening/closing unit is coupled on the rotation shaft. The support bar is protruded in the rear of the opening/closing plate to be coupled with the fixing unit. In the support unit, plural cut grooves(33) corresponding to the idle rollers are spaced so as to prevent interference with the idle rollers.

Description

기판 처리장치{An apparatus for processing glass substrate}An apparatus for processing glass substrate

도 1은 종래의 기판 처리장치에 설치된 셔터시스템의 측단면도,1 is a side cross-sectional view of a shutter system installed in a conventional substrate processing apparatus;

도 2는 종래의 셔터시스템의 정면도,2 is a front view of a conventional shutter system;

도 3은 본 발명의 기판 처리장치에 설치된 셔터시스템의 사시도,3 is a perspective view of a shutter system installed in the substrate processing apparatus of the present invention;

도 4는 본 발명의 셔터시스템의 사시도,4 is a perspective view of a shutter system of the present invention;

도 5는 도 3의 작동상태를 나탄낸 단면도이다.5 is a cross-sectional view showing the operating state of FIG.

* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

1 : 이송장치 5 : 이송롤러1: Feeding device 5: Feeding roller

10,100 : 기판처리장치 11 : 세정실10,100: substrate processing apparatus 11: cleaning chamber

12 : 외부투입구 15 : 격벽12: outside entrance 15: bulkhead

16,116 : 기판투입구 17 : 석출물수용홈16,116: substrate inlet 17: precipitate receiving groove

18 : 약액처리실 20 : 회전축18: chemical processing chamber 20: rotating shaft

25 : 아이들롤러 27 : 고정부25: idle roller 27: fixed part

30 : 개폐부 32 : 지지바30: opening and closing part 32: support bar

33 : 절취홈 35,135 : 개폐판33: cutting groove 35,135: opening and closing plate

36 : 완충부재 38 : 가압돌부36: buffer member 38: pressure protrusion

40,140 : 구동수단 50 : 축커플링40,140: driving means 50: shaft coupling

60 : 셔터시스템 70 : 석출물60: shutter system 70: precipitates

80 : 기판 110 : 고정플레이트80: substrate 110: fixed plate

112 : 관통공 115 : 가이드축112: through hole 115: guide shaft

120 : 가이드공 145 : 연결링크120: guide ball 145: connection link

본 발명은 액정표시장치용 기판의 표면을 약액 처리하는 기판 처리장치에 관한 것으로서, 일단부에 구동수단이 연결된 회전축을 기판투입구에 인접되게 설치하고, 회전축과 일체로 회동될 수 있게 회전축상에 개폐부를 설치하여 개폐부가 왕복 회전운동하면서 기판투입구를 개폐할 수 있게 함으로써, 셔터시스템의 내구성을 증대시키고, 기판투입구에서의 기판의 처짐을 방지할 수 있게 할 뿐 아니라, 기판투입구 내측에 고착되는 약액 성분의 석출물을 제거할 수 있는 셔터시스템이 구비된 기판 처리장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus for chemically treating a surface of a substrate for a liquid crystal display device. The present invention relates to a substrate processing apparatus including a rotating shaft connected to a driving unit at one end thereof adjacent to a substrate inlet, and being opened and closed on the rotating shaft to be integrally rotated with the rotating shaft. By opening and closing the opening and closing portion of the substrate inlet can be opened and closed by reciprocating rotation, thereby increasing the durability of the shutter system, to prevent the sag of the substrate at the substrate inlet, as well as the chemical component that is fixed inside the substrate inlet The present invention relates to a substrate processing apparatus having a shutter system capable of removing precipitates.

일반적으로 액정표시장치(LCD:liquid crystal display)는 다른 표시장치에 비해 경량일 뿐 아니라, 큰 화면과 높은 해상도를 구현할 수 있어 주요 디스플레이장치로 사용되는 것으로서, 기본적으로 전,후 두 장의 유리기판 내에 액정을 주입시키고 각 기판에 설치되는 전극을 통해 전압이나 전류를 부가하여 액정의 배열을 변화시킴으로써 빛을 투과 또는 차폐시켜 표시할 수 있게 하는 장치이다.In general, a liquid crystal display (LCD) is not only lighter than other display devices but also used as a main display device because it can realize a large screen and high resolution, and is basically used in two glass substrates. Injecting a liquid crystal and adding a voltage or current through an electrode provided on each substrate to change the arrangement of the liquid crystal to transmit or shield the light to display.

따라서 유리기판은 액정표시장치의 주요 부품 중의 하나로서, 표면에는 절연층, 컬러층, 편광층, 등 여러 막층이 형성되어야 하기 때문에 이송장치에 의해 이송되면서 세정공정, 증착공정, 식각공정, 박리공정 등의 처리과정을 거치게 된다.Therefore, the glass substrate is one of the main components of the liquid crystal display device. Since a plurality of film layers such as an insulating layer, a color layer, a polarizing layer, and the like must be formed on the surface of the glass substrate, the glass substrate is transported by the conveying device, and thus the cleaning process, the deposition process, the etching process, and the peeling process. It will go through the process.

이와 같은 각 공정들은 기판 처리장치인 베스(bath) 또는 챔버(chamber) 내에서 이루지는 것으로서, 유리기판은 주로 이송장치에 의해 이송되면서 베스나 챔버에 형성된 기판투입구를 통해 내부로 투입되어 처리된 후 다음 공정으로 이송되게 된다.Each of these processes is carried out in a bath or chamber, which is a substrate processing apparatus, and the glass substrate is mainly transported by a transfer apparatus and then introduced into and processed through a substrate inlet formed in the bath or chamber. It will be transferred to the next process.

이때 기판투입구에는 셔터시스템이 구비되어 기판투입구를 개폐시키게 된다.At this time, the substrate inlet is provided with a shutter system to open and close the substrate inlet.

이하 종래의 기판 처리장치의 셔터시스템을 도면을 참조하여 설명한다.Hereinafter, a shutter system of a conventional substrate processing apparatus will be described with reference to the drawings.

도 1은 종래의 셔터시스템의 측단면도를 나타낸 것이고, 도 2는 종래의 셔터시스템의 정면도를 나타낸 것이다.1 is a side cross-sectional view of a conventional shutter system, and FIG. 2 is a front view of a conventional shutter system.

도시된 바와 같이, 종래의 셔터시스템은 고정플레이트(110)와 개폐판(135) 및 구동수단(140)을 포함하여 구성된다.As shown, the conventional shutter system includes a fixing plate 110, opening and closing plate 135 and the driving means 140.

고정플레이트(110)는 개폐판(135)이 기판투입구(116)를 개폐할 수 있게 기판처리장치(100)의 측면에 설치되는 것으로서, 중앙부에 개폐판(135)이 슬라이딩 될 수 있는 공간이 형성되도록 일정거리 이격되어 한 쌍으로 구비된다.The fixed plate 110 is installed on the side of the substrate processing apparatus 100 so that the opening and closing plate 135 can open and close the substrate inlet 116, and a space in which the opening and closing plate 135 can be slid in the center is formed. It is provided as a pair spaced apart a certain distance as possible.

또한, 고정플레이트(110)에는 이송롤러(5)에 의해 이송되는 기판(80)이 통과할 수 있도록 기판투입구(116)에 대응되게 관통공(112)이 중앙부에 각각 형성되고, 관통공(112) 상측부에는 고정플레이트(110)를 연결 고정시키는 가이드축(115)이 이격되게 복수로 형성된다.In addition, through holes 112 are formed in the center portion of the fixing plate 110 to correspond to the substrate inlet 116 so that the substrate 80 transferred by the feed roller 5 can pass therethrough. The upper side portion is formed with a plurality of guide shafts 115 to connect and fix the fixing plate 110 spaced apart.

개폐판(135)은 고정플레이트(110)의 가이드축(115)이 끼워지는 가이드공(120)이 중앙부에 경사지게 형성되고, 일측에는 연결링크(145)에 의해 구동수단(140)이 연결된다.The opening and closing plate 135 has a guide hole 120 into which the guide shaft 115 of the fixing plate 110 is fitted to be inclined at the center portion, and the driving means 140 is connected to one side by a connection link 145.

따라서 개폐판(135)은 구동수단(140)에 의해 연결링크(145)가 전,후로 왕복하게 되면 가이드축(115)을 따라 경사방향으로 상승,하강되면서 슬라이딩 되어 기판투입구(116)를 개폐하게 되는 것이다.Therefore, the opening and closing plate 135 is slid up and down in the inclined direction along the guide shaft 115 when the connecting link 145 is reciprocated back and forth by the drive means 140 to open and close the substrate inlet 116. Will be.

그러나 상기와 같은 종래의 기판 처리장치의 슬라이딩 방식의 셔터시스템은 다음과 같은 문제점들이 있었다.However, the sliding shutter system of the conventional substrate processing apparatus as described above has the following problems.

첫째, 장기간 사용시 연결링크가 파손되어 개폐판이 자중에 의해 하강함으로써 기판에 손상을 줄 우려가 높았다.First, there is a high risk of damaging the substrate by breaking the connection link in the long-term use, the opening and closing plate descends due to its own weight.

둘째, 기판이 기판투입구를 통과할 때 기판처리장치의 외측과 내측의 이송롤러의 간격이 넓게 형성되어 발생되는 기판의 자중에 의한 처짐을 방지하기 위해 별도의 처짐방지수단이 필요한 구조이다.Second, a separate deflection prevention means is required to prevent sagging due to self-weight of the substrate, which is formed by a wide gap between the outer and inner transfer rollers of the substrate processing apparatus when the substrate passes through the substrate inlet.

셋째, 기판투입구 내측에 고착되는 약액 성분의 석출물을 제거하는 것이 곤란한 문제점이 있었다.Third, there is a problem that it is difficult to remove the precipitate of the chemical component fixed to the inside of the substrate inlet.

본 발명은 상기와 같은 문제점을 해결하기 위해 안출한 것으로서, 본 발명의 목적은 일단부에 구동수단이 구비된 회전축상에 개폐부를 설치하여 개폐부가 회전축과 일체로 회전되면서 기판투입구를 개폐할 수 있게 함으로써, 구동수단에 의한 개폐부의 작동메카니즘의 구조가 간단하고 견고하여 내구성이 증대될 수 있게 한 셔터시스템이 구비된 기판 처리장치를 제공하고자 하는 것이다.The present invention has been made to solve the above problems, an object of the present invention is to install the opening and closing portion on the rotary shaft provided with a driving means at one end so that the opening and closing part can be opened and closed the substrate inlet while rotating integrally with the rotating shaft. It is therefore an object of the present invention to provide a substrate processing apparatus equipped with a shutter system in which the structure of the operation mechanism of the opening and closing portion by the driving means is simple and robust, thereby increasing durability.

본 발명의 다른 목적은 회전축상에 아이들롤러를 구비하여 기판의 처짐을 방지할 수 있게 하는 셔터시스템이 구비된 기판 처리장치를 제공하고자 하는 것이다.Another object of the present invention is to provide a substrate processing apparatus equipped with a shutter system that is provided with an idle roller on a rotating shaft to prevent sagging of the substrate.

본 발명의 또 다른 목적은 개폐부에 가압돌부를 설치하여 기판투입구의 폐쇄와 동시에 기판투입구에 고착되는 약액 성분의 석출물을 제거할 수 있게 한 셔터시스템이 구비된 기판 처리장치를 제공하고자 하는 것이다.It is still another object of the present invention to provide a substrate processing apparatus having a shutter system in which a pressurizing protrusion is installed at an opening and closing part so that the deposit of the chemical liquid component fixed to the substrate inlet can be removed at the same time as the substrate inlet is closed.

상기 목적을 달성하기 위하여 본 발명은 기판이 투입될 수 있는 기판투입구와 상기 기판투입구를 개폐시킬 수 있는 셔터시스템이 구비된 기판 처리장치에 있어서, 상기 셔터시스템은 상기 기판투입구에 인접되게 설치하되, 양단이 회동 가능하게 축결합되는 회전축과, 상기 회전축상에 일측이 결합되어 회전축과 일체로 회동되면서 상기 기판투입구를 개폐할 수 있게 설치되는 개폐부 및 상기 회전축을 회전시킬 수 있게 회전축 일단부에 결합되는 구동수단을 포함하여 구성된다.In order to achieve the above object, the present invention provides a substrate processing apparatus having a substrate inlet through which a substrate can be inserted and a shutter system capable of opening and closing the substrate inlet, wherein the shutter system is installed adjacent to the substrate inlet. Is coupled to one end of the rotating shaft and the rotating shaft is coupled to one end on the rotating shaft, one side is coupled to the rotating shaft and integrally rotated with the rotating shaft to open and close the substrate inlet and one end of the rotating shaft to rotate the rotating shaft. It comprises a drive means.

본 발명의 상기 회전축은 상기 기판을 이송하는 이송장치의 양측부에 양단이 각각 결합되고, 상기 기판이 기판투입구로 투입될 때 기판의 하측면을 지지하여 자중에 의한 처짐이 방지될 수 있게 길이방향을 따라 등간격으로 이격된 복수의 아이들롤러가 설치된다.Both ends of the rotating shaft of the present invention are coupled to both side portions of the transfer device for transporting the substrate, and when the substrate is inserted into the substrate inlet, it supports the lower side of the substrate to prevent sagging due to its own weight. A plurality of idle rollers spaced at equal intervals along the installation.

또한, 상기 회전축에는 상기 아이들롤러의 이동을 방지할 수 있게 아이들롤 러 양측의 상기 회전축의 외주면을 감싸면서 고정 결합되는 고정부가 더 구비된다.In addition, the rotating shaft is further provided with a fixing portion fixedly coupled to surround the outer peripheral surface of the rotating shaft on both sides of the idle roller to prevent the movement of the idle roller.

또 본 발명의 상기 개폐부는 상기 기판투입구를 개폐시킬 수 있게 형성된 개폐판과 상기 개폐판의 배면에 돌출 형성되어 상기 고정부에 결합되되, 상기 아이들롤러와의 간섭이 방지될 수 있도록 아이들롤러에 대응되게 다수개의 절취홈이 이격되게 형성되는 지지바를 포함하여 구성될 수 있다.In addition, the opening and closing portion of the present invention is formed on the opening and closing plate and the back of the opening and closing plate formed to open and close the substrate inlet is coupled to the fixed portion, corresponding to the idle roller so that interference with the idle roller is prevented The plurality of cutting grooves may be configured to include a support bar to be spaced apart.

한편, 상기 개폐판의 전면에는 상기 기판투입구를 폐쇄할 때 기판투입구 내측에 고착되는 약액 성분의 석출물에 충격을 주어 분리 제거할 수 있는 가압돌부가 돌출 형성될 수 있다.On the other hand, the front and rear of the opening and closing plate may be formed to protrude a pressing protrusion which can be separated and removed by impacting the precipitate of the chemical component fixed to the inside of the substrate inlet when closing the substrate inlet.

또, 본 발명의 상기 개폐판은 상기 기판투입구를 폐쇄할 때 접촉소음이 방지될 수 있게 전면에 완충부재가 구비될 수 있다.In addition, the opening and closing plate of the present invention may be provided with a buffer member on the front surface to prevent contact noise when closing the substrate inlet.

또, 본 발명의 상기 구동수단은 왕복 회전운동이 반복적으로 가능한 회전실린더로 구성된다.In addition, the drive means of the present invention is composed of a rotation cylinder capable of repeatedly reciprocating rotational movement.

이하 본 발명에 대하여 도면을 참조하여 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

도 3은 본 발명의 셔터시스템이 기판 처리장치에 설치된 상태를 나타낸 일부 절개 사시도이고, 도 4는 본 발명의 셔터시스템의 사시도를 나타낸 것이다.3 is a partially cutaway perspective view illustrating a state in which the shutter system of the present invention is installed in a substrate processing apparatus, and FIG. 4 illustrates a perspective view of the shutter system of the present invention.

도시된 바와 같이, 액정표시장치의 기판(80)은 이송장치(1)에 설치된 이송롤러(5)에 의해서 화살표와 같이 이송되어 기판(80)의 표면을 약액 처리하는 기판처리장치(10) 내부로 투입되게 된다.As shown in the drawing, the substrate 80 of the liquid crystal display device is conveyed as an arrow by the conveying roller 5 installed in the conveying apparatus 1, and the substrate processing apparatus 10 which chemically processes the surface of the substrate 80. It will be put into.

기판처리장치(10)는 내부에 형성된 격벽(15)에 의해 격리되는 세정실(11)과 약액처리실(18)로 구성되는 것으로서, 내부에도 기판(80)을 이송시키는 이송장 치(1)가 구비된다.The substrate processing apparatus 10 is composed of a cleaning chamber 11 and a chemical liquid processing chamber 18 separated by a partition wall 15 formed therein, and a transfer device 1 for transferring the substrate 80 is also inside. It is provided.

따라서 기판(80)은 이송장치(1)의 이송롤러(5)에 의해 기판처리장치(10)의 일측면에 형성된 외부투입구(12)를 통해 세정실(11)로 투입되어 세정된 후 격벽(15)에 형성된 기판투입구(16)를 통해 약액처리실(18)로 투입되며, 약액 처리공정이 완료된 기판(80)은 타측면에 형성되는 배출구(도시하지 않음)를 통해 외부 이송장치(도시하지 않음)로 전달되어 다음 공정으로 이송되게 된다.Therefore, the substrate 80 is introduced into the cleaning chamber 11 through the external inlet 12 formed on one side of the substrate processing apparatus 10 by the feed roller 5 of the conveying apparatus 1, and then cleaned. 15 is introduced into the chemical liquid processing chamber 18 through the substrate inlet 16 formed in the substrate, and the substrate 80 having the chemical liquid processing process is completed through an outlet (not shown) formed on the other side of the substrate (not shown). Is transferred to the next process.

본 발명의 셔터시스템(60)은 기판처리장치(10) 내부의 격벽(15)에 형성된 기판투입구(16)에 설치되는 것으로서, 회전축(20)과 개폐부(30) 및 구동수단(40)으로 구성된다.The shutter system 60 of the present invention is installed at the substrate inlet 16 formed in the partition wall 15 in the substrate processing apparatus 10, and is composed of a rotating shaft 20, an opening and closing unit 30, and a driving means 40. do.

이때, 셔터시스템(60)은 기판처리장치(10)의 외부투입구(12)나 배출구에 적용될 수도 있다.In this case, the shutter system 60 may be applied to the external inlet 12 or the outlet of the substrate processing apparatus 10.

회전축(20)은 양단이 이송장치(1)의 양측부에 회동 가능하게 축결합되는 것으로서, 기판투입구(16)에 인접되게 설치된다.Both ends of the rotation shaft 20 are pivotally coupled to both sides of the transfer apparatus 1 and are installed adjacent to the substrate inlet 16.

이때, 회전축(20)에는 이송되는 기판(80)의 자중에 의한 처짐을 방지할 수 있게 기판(80)의 하측면을 지지하는 다수개의 아이들롤러(25)가 등간격으로 이격되게 설치되고, 일단에는 회전축(20)을 왕복 회전운동시키기 위한 구동수단(40)이 연결된다.At this time, the rotating shaft 20 is provided with a plurality of idle rollers 25 supporting the lower side of the substrate 80 spaced at equal intervals so as to prevent sagging due to the weight of the substrate 80 to be transferred. The drive means 40 for reciprocating the rotary shaft 20 is connected to the.

또한, 회전축(20)에는 아이들롤러(25)의 축방향 이동을 방지할 수 있게 아이들롤러(25)의 양측부의 회전축(20) 외주면에 고정부(27)가 고정 결합된다.In addition, the fixed part 27 is fixedly coupled to the rotary shaft 20 on the outer circumferential surface of the rotary shaft 20 on both sides of the idle roller 25 so as to prevent the axial movement of the idle roller 25.

고정부(27)는 아이들롤러(25)보다 직경이 작게 형성되어 회전축(20)의 외주 면을 감싸는 링 형상으로서, 셋트나사(도시하지 않음) 등을 관통 결합하여 회전축(20)에 고정시킬 수 있을 것이다.The fixing part 27 is formed in a smaller diameter than the idle roller 25 and surrounds the outer circumferential surface of the rotating shaft 20. The fixing part 27 may be fixed to the rotating shaft 20 by coupling a set screw (not shown). There will be.

구동수단(40)은 회전축(20)의 일단부에 축커플링(50)으로 연결되어 회전축(20)이 왕복 회전운동을 할 수 있게 구동력을 전달하는 회전실린더로서 제어장치(도시하지 않음)와 연결된다.The driving means 40 is connected to the one end of the rotating shaft 20 by the shaft coupling 50 to transmit a driving force for the rotating shaft 20 to reciprocate rotational movement as a control device (not shown) and Connected.

한편, 개폐부(30)는 상기 회전축(20)에 일측이 고정 결합되어 회전축(20)과 일체로 회전되면서 기판투입구(16)를 개폐하는 것으로서, 개폐판(35)과 지지바(32)로 구성된다.On the other hand, the opening and closing portion 30 as one side is fixedly coupled to the rotating shaft 20 to rotate the integrated shaft and the body 20 while opening and closing the substrate inlet 16, composed of the opening and closing plate 35 and the support bar 32. do.

개폐판(35)은 기판처리장치(10)의 격벽(15)에 밀착되어 기판투입구(16)를 개폐하는 것으로서 기판투입구(16)보다 높이와 폭이 큰 직사각형으로 형성되며 기판투입구(16)의 형상에 맞게 장공 등 다양한 형태로 형성될 수 있다.The opening and closing plate 35 is in close contact with the partition wall 15 of the substrate processing apparatus 10 and opens and closes the substrate inlet 16. The opening and closing plate 35 is formed in a rectangle having a height and a width larger than that of the substrate inlet 16. It may be formed in various forms such as long holes to suit the shape.

이때 개폐판(35)은 격벽(15)에 밀착될 때 발생될 수 있는 충격에 의한 파손이나 소음 방지를 위해 전면에 완충부재(36)가 설치된다.At this time, the opening and closing plate 35 is provided with a shock absorbing member 36 in the front to prevent damage or noise caused by the impact that may occur when in close contact with the partition wall (15).

또한, 전면의 중앙부에는 길이 방향을 따라 약액 처리과정에서 약액 성분에 의해 기판투입구(16)의 상측 모서리부에 고착될 수 있는 석출물(70)을 제거할 수 있게 가압돌부(38)가 구비된다.In addition, the central portion of the front surface is provided with a pressing protrusion 38 to remove the precipitate 70 that can be fixed to the upper edge portion of the substrate inlet 16 by the chemical component in the chemical treatment process along the longitudinal direction.

가압돌부(38)는 회전축(20)이 회전하여 개폐판(35)이 기판투입구(16)를 폐쇄할 때 석출물(70)에 충격을 줄 수 있게 적절한 높이로 돌출 형성된다.The pressure protrusion 38 is formed to protrude to an appropriate height so that when the rotating shaft 20 rotates so that the opening and closing plate 35 closes the substrate inlet 16, the precipitate 70 may be impacted.

이때, 기판투입구(16)의 저면에는 개폐판(35)의 가압돌부(38)에 의해 분리된 석출물(70)이 이송되는 기판(80)에 손상을 줄 수 없도록 석출물수용홈(17)이 일정 깊이로 형성될 수 있다.At this time, the precipitate receiving groove 17 is fixed to the bottom of the substrate inlet 16 so as not to damage the substrate 80 to which the precipitate 70 separated by the pressing protrusion 38 of the opening and closing plate 35 is transferred. Can be formed to depth.

한편, 지지바(32)는 개폐판(35)의 배면에 길이방향을 따라 일정 높이로 돌출 형성되는 것으로서, 개폐판(35)과 일체형으로 형성될 수 있으며, 일측면은 회전축(20)에 설치된 고정부(27)에 결합된다.On the other hand, the support bar 32 is formed to protrude to a predetermined height along the longitudinal direction on the back of the opening and closing plate 35, may be formed integrally with the opening and closing plate 35, one side is installed on the rotating shaft 20 It is coupled to the fixing portion 27.

이때, 지지바(32)는 고정부(27)에 나사(도시하지 않음)를 이용하여 결합시킬 수 있다.At this time, the support bar 32 may be coupled to the fixing part 27 by using a screw (not shown).

또한, 지지바(32)는 아이들롤러(25)의 외주면과 간섭될 염려가 있는 경우에는 아이들롤러(25)에 대응되는 위치에 절취홈(33)을 형성하여 간섭을 방지할 수 있다.In addition, when the support bar 32 may interfere with the outer circumferential surface of the idle roller 25, the support bar 32 may form a cutting groove 33 at a position corresponding to the idle roller 25 to prevent interference.

따라서, 개폐부(30)는 회전축(20)의 고정부(27)에 의해 회전축(20)과 일체로 회전 가능하게 되고, 아이들롤러(25)는 회전축(20)상에서 회전되면서 이송되는 기판(80)을 지지할 수 있게 되는 것이다.Therefore, the opening and closing part 30 is rotatable integrally with the rotating shaft 20 by the fixing portion 27 of the rotating shaft 20, the idler roller 25 is rotated on the rotating shaft 20, the substrate 80 is transported Will be able to support.

이하, 본 발명의 기판 처리장치의 셔터시스템(60)의 작동과정을 상세히 설명한다.Hereinafter, an operation process of the shutter system 60 of the substrate processing apparatus of the present invention will be described in detail.

도 5는 본 발명의 셔터시스템(60)의 작동상태를 나타낸 단면도이다.5 is a cross-sectional view showing an operating state of the shutter system 60 of the present invention.

도시된 바와 같이, 기판(80)이 이송장치(1)에 의해 화살표와 같이 이송되어 격벽(15)의 기판투입구(16)를 통해 약액처리실(18) 내부로 투입되게 되면, 제어장치(도시하지 않음)와 연결된 구동수단(40)(회전실린더)이 회전축(20)을 시계방향으로 90도 회전시키게 된다.As shown in the drawing, when the substrate 80 is conveyed as an arrow by the transfer device 1 and introduced into the chemical processing chamber 18 through the substrate inlet 16 of the partition wall 15, a control device (not shown) Drive means 40 (rotating cylinder) connected to the rotating shaft 20 to rotate the clockwise 90 degrees clockwise.

이때 회전축(20)에 결합된 고정부(27)가 회전축(20)과 일체로 회전되게 된 다.At this time, the fixed portion 27 coupled to the rotary shaft 20 is rotated integrally with the rotary shaft 20.

따라서 개폐판(35)은 고정부(27)에 결합된 지지바(32)에 의해 회전축(20)과 연동되어 회전됨으로써, 전면부가 기판투입구(16)에 밀착되어 기판투입구(16)를 폐쇄시키게 된다.Therefore, the opening and closing plate 35 is rotated in conjunction with the rotating shaft 20 by the support bar 32 coupled to the fixing portion 27, the front portion is in close contact with the substrate inlet 16 to close the substrate inlet 16 do.

이때, 개폐판(35)의 전면에 구비된 가압돌부(38)는 기판투입구(16) 상측 모서리에 고착된 약액 성분의 석출물(70)에 충격을 주어 석출물(70)이 기판투입구(16)로부터 분리되어 기판투입구(16)의 하부에 형성된 석출물수용홈(17)에 떨어지지게 함으로써 연속 이송되는 기판(80)이 석출물(70)에 의해 손상되는 것을 방지시키게 된다.At this time, the pressing protrusion 38 provided on the front surface of the opening and closing plate 35 impacts the precipitate 70 of the chemical liquid component fixed to the upper edge of the substrate inlet 16 so that the precipitate 70 is separated from the substrate inlet 16. By being separated and falling into the precipitate receiving groove 17 formed in the lower portion of the substrate inlet 16, the substrate 80 continuously transferred is prevented from being damaged by the precipitate 70.

따라서, 본 발명의 셔터시스템(60)은 개폐판(35)이 회전축(20)과 연동되어 일체로 회전되면서 기판투입구(16)를 개폐하는 회전방식을 채택함으로써, 구조가 간단하고 견고하여 내구성을 증대시킬 수 있고, 회전축(20) 상에 아이들롤러(25)를 구비하여 이송되는 기판(80)의 처짐도 동시에 방지할 수 있을 뿐 아니라, 기판투입구(16)의 폐쇄와 동시에 석출물(70)을 제거할 수 있게 되는 것이다.Therefore, the shutter system 60 of the present invention adopts a rotation method of opening and closing the substrate inlet 16 while the opening and closing plate 35 is rotated integrally with the rotation shaft 20, thereby simplifying the structure and durability. It is possible to increase and prevent the deflection of the substrate 80, which is provided with the idle roller 25 on the rotation shaft 20, at the same time, as well as closing the substrate inlet 16 and simultaneously depositing the precipitate 70. It can be removed.

이상, 상기의 실시 예는 단지 설명의 편의를 위해 예시로서 설명한 것에 불과하므로 특허청구범위를 한정하는 것은 아니다.As described above, the above embodiments are merely described as examples for convenience of description and are not intended to limit the scope of the claims.

이상에서 설명한 바와 같이, 본 발명은 첫째, 개폐판이 회전축과 일체로 회전되면서 기판투입구를 개폐할 수 있게 함으로써 작동구조가 간단하고 견고하여 내 구성을 증대시킬 수 있는 효과가 있다.As described above, the present invention, first, by opening and closing the opening and closing plate integrally with the rotating shaft to open and close the substrate inlet has the effect that the operating structure is simple and robust to increase the durability.

둘째, 회전축상에 아이들롤러를 구비하여 이송되는 기판의 자중에 의한 처짐을 방지하여 기판의 불량률을 감소시킬 수 있는 효과가 있다.Second, there is an effect that can reduce the defect rate of the substrate by preventing the sag caused by the weight of the substrate to be transported by having an idle roller on the rotation axis.

셋째, 개폐판에는 가압돌부를 설치하여 기판투입구의 폐쇄와 동시에 기판투입구에 고착되는 약액 성분의 석출물을 제거하여 이송되는 기판의 손상을 방지할 수 있는 효과가 있다.Third, the opening and closing plate has an effect of preventing the damage of the substrate to be transported by removing the precipitates of the chemical component fixed to the substrate inlet at the same time by closing the substrate inlet by pressing the protrusion.

Claims (8)

기판이 투입될 수 있는 기판투입구와 상기 기판투입구를 개폐시킬 수 있는 셔터시스템이 구비된 기판 처리장치에 있어서,In the substrate processing apparatus provided with a substrate inlet through which a substrate can be inserted and a shutter system for opening and closing the substrate inlet. 상기 셔터시스템은,The shutter system, 상기 기판투입구에 인접되게 설치하되, 양단이 상기 기판을 이송하는 이송장치의 양측부에 회동 가능하게 각각 축결합되고, 상기 기판이 기판투입구로 투입될 때 기판의 하측면을 지지하여 자중에 의한 처짐이 방지될 수 있게 길이방향을 따라 등간격으로 이격되게 복수의 아이들롤러가 설치되며, 상기 아이들롤러의 축방향 이동을 방지할 수 있게 아이들롤러 양측의 외주면을 감싸면서 고정 결합되는 고정부가 구비된 회전축;It is installed adjacent to the substrate inlet, each end is rotatably coupled to both sides of the transfer device for transporting the substrate, and when the substrate is introduced into the substrate inlet to support the lower side of the substrate deflection due to its own weight A plurality of idle rollers are installed to be spaced at equal intervals along the longitudinal direction so as to prevent this, and a rotating shaft having a fixed portion that is fixed while wrapping the outer peripheral surface of both sides of the idle roller to prevent the axial movement of the idle roller ; 상기 회전축상에 일측이 결합되어 회전축과 일체로 회동되면서 상기 기판투입구를 개폐할 수 있게 설치되는 개폐판과 상기 개폐판의 배면에 돌출 형성되어 상기 고정부에 결합되되, 상기 아이들롤러와의 간섭이 방지될 수 있도록 아이들롤러에 대응되게 다수개의 절취홈이 이격되게 형성되는 지지바로 구성하되, 상기 개폐판의 전면에는 상기 기판투입구를 폐쇄할 때 기판투입구 내측에 고착되는 약액 성분의 석출물에 충격을 주어 분리 제거할 수 있는 가압돌부가 돌출 형성된 개폐부; 및One side is coupled to the rotating shaft and is integrally rotated with the rotating shaft and protruded to the rear of the opening and closing plate and the opening and closing plate is installed to open and close the substrate inlet is coupled to the fixed portion, the interference with the idle roller Comprising a plurality of cutting grooves are formed to be spaced apart to correspond to the idle roller so as to be prevented, the front of the opening and closing the impact of the precipitate of the chemical component that is fixed to the inside of the substrate inlet when closing the substrate inlet An opening and closing portion protruding the pressing protrusion which can be separated and removed; And 상기 회전축을 회전시킬 수 있게 회전축 일단부에 결합되는 구동수단;Drive means coupled to one end of the rotation shaft to rotate the rotation shaft; 을 포함하여 구성된 것을 특징으로 하는 기판 처리장치.Substrate processing apparatus comprising a. 삭제delete 삭제delete 삭제delete 삭제delete 제 1항에 있어서,The method of claim 1, 상기 개폐판은 상기 기판투입구를 폐쇄할 때 충격이나 접촉소음이 방지될 수 있게 전면에 완충부재가 더 구비되는 것을 특징으로 하는 기판 처리장치.The opening and closing plate is a substrate processing apparatus, characterized in that the buffer member is further provided on the front surface to prevent the impact or contact noise when closing the substrate inlet. 제 1항 또는 제 6항에 있어서,The method according to claim 1 or 6, 상기 구동수단은 왕복 회전운동이 반복적으로 가능한 회전실린더인 것을 특징으로 하는 기판 처리장치.The driving means is a substrate processing apparatus, characterized in that the rotation cylinder capable of repeatedly reciprocating rotational movement. 제 7항에 있어서,The method of claim 7, wherein 상기 기판투입구의 저면에는 상기 개폐판의 가압돌부에 의해 분리되는 석출물이 수용될 수 있게 석출물수용홈이 형성되는 것을 특징으로 하는 기판 처리장치.Substrate processing apparatus, characterized in that the deposit receiving groove is formed in the bottom surface of the substrate inlet to accommodate the precipitate separated by the pressing protrusion of the opening and closing plate.
KR1020070043427A 2007-05-04 2007-05-04 An apparatus for processing glass substrate KR100837320B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101303808B1 (en) * 2011-12-07 2013-09-04 주식회사 케이씨텍 Auto Shutter
KR20150077544A (en) * 2013-12-27 2015-07-08 세메스 주식회사 apparatus for treating substrate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11307494A (en) * 1998-04-17 1999-11-05 Dainippon Screen Mfg Co Ltd Substrate processing device
JP2000177841A (en) 1998-12-11 2000-06-27 Dainippon Screen Mfg Co Ltd Substrate treating device
KR20050109258A (en) * 2004-05-14 2005-11-17 세메스 주식회사 Magnetic driven shutter
KR100667250B1 (en) 2005-09-06 2007-01-11 세메스 주식회사 Bake unit for heat treatment of glass substrates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11307494A (en) * 1998-04-17 1999-11-05 Dainippon Screen Mfg Co Ltd Substrate processing device
JP2000177841A (en) 1998-12-11 2000-06-27 Dainippon Screen Mfg Co Ltd Substrate treating device
KR20050109258A (en) * 2004-05-14 2005-11-17 세메스 주식회사 Magnetic driven shutter
KR100667250B1 (en) 2005-09-06 2007-01-11 세메스 주식회사 Bake unit for heat treatment of glass substrates

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101303808B1 (en) * 2011-12-07 2013-09-04 주식회사 케이씨텍 Auto Shutter
KR20150077544A (en) * 2013-12-27 2015-07-08 세메스 주식회사 apparatus for treating substrate
KR102138673B1 (en) * 2013-12-27 2020-07-29 세메스 주식회사 apparatus for treating substrate

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