KR100836132B1 - Nitride semiconductor light emitting diode - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nitride semiconductor light emitting diode, and in particular, a substrate, a first n-type nitride semiconductor layer formed on the substrate, a current diffusion layer formed in a predetermined region on the first n-type nitride semiconductor layer, and the current A second n-type nitride semiconductor layer formed on the diffusion layer, an active layer formed on the second n-type nitride semiconductor layer, a p-type nitride semiconductor layer formed on the active layer, and a p-type formed on the p-type nitride semiconductor layer A nitride-based semiconductor comprising an electrode and an n-type electrode positioned on the first n-type nitride semiconductor layer on which the second n-type nitride semiconductor layer is not formed, the portion of which is in direct contact with a portion of the current spreading layer. The present invention relates to a light emitting diode.

LED, horizontal, current spreading, n-type electrode

Description

Nitride semiconductor light emitting diodes {NITRIDE SEMICONDUCTOR LIGHT EMITTING DIODE}

1 is a cross-sectional view showing the structure of a nitride-based semiconductor LED according to the prior art.

2 is a view illustrating a current diffusion path of the nitride-based semiconductor LED shown in FIG.

3 is a cross-sectional view showing the structure of a nitride-based semiconductor LED according to a first embodiment of the present invention.

4 is a view illustrating a current diffusion path of the nitride-based semiconductor LED shown in FIG.

5 is a cross-sectional view showing a structure of a nitride based semiconductor LED according to a second embodiment of the present invention.

6 to 8 are cross-sectional views showing nitride-based semiconductor LEDs according to the first to third modified examples of the second embodiment.

<Explanation of symbols for the main parts of the drawings>

110 substrate 120 buffer layer

130: n-type nitride semiconductor layer 140: active layer

150: p-type nitride semiconductor layer 160: p-type electrode

170: n-type electrode 200: current diffusion layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nitride semiconductor light emitting diode, and more particularly, a nitride semiconductor semiconductor light emitting diode which improves luminous efficiency by optimizing current diffusion effect of a nitride semiconductor light emitting diode having a p-type electrode and an n-type electrode. It is about.

In general, a light emitting diode (LED) is used to send and receive an electric signal by converting an electric signal into an infrared, visible or light form using a property of a compound semiconductor called recombination of electrons and holes. It is a semiconductor device.

Usually, the use range of LED is used for home appliances, remote controllers, electronic signs, indicators, various automation devices, optical communications, and the types are largely divided into Infrared Emitting Diode (IRD) and Visible Light Emitting Diode (VLED).

In LEDs, the frequency (or wavelength) of light emitted is a function of the band gap of the material used in the semiconductor device. When using a semiconductor material having a small band gap, low energy and long wavelength photons are generated, and a wide band gap When using a semiconductor material having a photon of a short wavelength is generated. Therefore, the semiconductor material of the device is selected according to the kind of light to be emitted.

For example, AlGaInP materials are used for red LEDs, and silicon carbide (SiC) and group III nitride semiconductors, especially gallium nitride (GaN), are used for blue LEDs. Recently, a nitride semiconductor used as a blue light emitting diode is (Al _x In _1-x ) _y Ga _1-y N composition formula (where 0≤x≤1, 0≤y≤1, 0≤x + y≤1 ) Materials are widely used.

Since such nitride-based semiconductor LEDs can be grown on a sapphire substrate, which is generally a light transmissive insulating substrate, both the p-type electrode and the n-type electrode, which are both electrodes, should be formed horizontally on the crystal-grown semiconductor layer side. The structure of such a conventional nitride based semiconductor LED is illustrated in FIG.

Referring to FIG. 1, the nitride semiconductor LED includes a sapphire substrate 110, a GaN buffer layer 120, an n-type nitride semiconductor layer 130, an active layer 140, and a p-type nitride semiconductor layer 150. The p-type nitride semiconductor layer 150 and the active layer 140 are sequentially grown, and a portion of the n-type nitride semiconductor layer 130 is partially removed by a etching process. It has an exposed structure.

An n-type electrode 170 is formed on the exposed n-type nitride semiconductor layer 130, and a p-type electrode 160 made of ITO or the like is formed on the p-type nitride semiconductor layer 150.

Meanwhile, the nitride based semiconductor LED according to the related art has a horizontal structure in which the p-type electrode 160 and the n-type electrode 170 are formed side by side on the side of the semiconductor layer crystal grown from one surface of the sapphire substrate 110. Therefore, as the p-type electrode 160 moves away from the n-type electrode 170, the length of the current flow path increases, thereby increasing the resistance of the n-type nitride semiconductor layer 130, and thus, the n-type electrode Current flows in a portion adjacent to 170 intensively, there is a problem that the effect of current spreading falls.

In particular, the nitride-based semiconductor LED according to the prior art, as shown in Figure 2, due to the large contact area of the p-type electrode 160 made of the ITO or the like, the n-type nitride semiconductor layer ( The path of the current flowing to 130 is formed to be longer, so that the current flows intensively in the portion adjacent to the n-type electrode 170 as in the case of "A", thereby reducing the effect of current diffusion.

Accordingly, in order to solve such a problem, the current diffusion effect is improved by doping a high concentration of Si impurities into the n-type nitride semiconductor layer 130 to improve electrical conductivity.

However, the nitride-based semiconductor LED according to the prior art as described above was able to obtain an improved current diffusion effect than the conventional by improving the electrical conductivity of the n-type nitride semiconductor layer 130, the n-type nitride semiconductor layer 130 Doping at a high concentration in the Si impurity has a problem of lowering the crystallinity of the layer.

As such, when the crystallinity of the n-type nitride semiconductor layer 130 is lowered, the surface of the n-type nitride semiconductor layer 130 is roughened by spiral growth, and thus the density of defects is increased to reverse the voltage of the entire nitride-based semiconductor LED. And leakage current characteristics are lowered.

Accordingly, an object of the present invention, in order to solve the above problems, in the nitride-based semiconductor LED having a p-type electrode and the n-type electrode having a horizontal structure, provided with a current diffusion layer in the n-type nitride semiconductor layer, By directly contacting a portion of the current spreading layer with the n-type electrode, the diffusion effect of the current diffused from the n-type electrode to the p-type electrode is improved to provide a nitride-based semiconductor LED with improved luminous efficiency.

In order to achieve the above object, the present invention provides a substrate, a first n-type nitride semiconductor layer formed on the substrate, a current diffusion layer formed in a predetermined region on the first n-type nitride semiconductor layer, and on the current diffusion layer A second n-type nitride semiconductor layer formed, an active layer formed on the second n-type nitride semiconductor layer, a p-type nitride semiconductor layer formed on the active layer, a p-type electrode formed on the p-type nitride semiconductor layer and the A nitride-based semiconductor LED is provided on the first n-type nitride semiconductor layer on which the second n-type nitride semiconductor layer is not formed, the n-type electrode including a portion of which is in direct contact with a portion of the current spreading layer. do.

In the nitride-based semiconductor LED of the present invention, the first n-type nitride semiconductor layer is preferably doped with a conductive impurity having a higher concentration than that of the second n-type nitride semiconductor layer. This is to reduce the contact resistance of the n-type electrode in contact with the nitride semiconductor layer.

Further, in the nitride based semiconductor LED of the present invention, the current spreading layer further includes a trench therein, the upper surface of the first n-type nitride semiconductor layer, the n-type electrode along the inner wall of the trench It is preferable that it is formed.

In the nitride-based semiconductor LED of the present invention, the current diffusion layer is preferably formed in a multilayer structure in which two or more layers of nitride semiconductor layers having different energy bands are stacked. More specifically, the current diffusion layer constitutes the current diffusion layer. The nitride semiconductor layer having different energy bands is composed of In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X + Y≤1), and the composition ratio of Al and In is different. Is preferably formed.

In the nitride-based semiconductor LED of the present invention, the current diffusion layer is preferably formed in a multilayer structure in which two or more layers of nitride semiconductor layers doped with different types of conductive impurities are stacked, and more specifically, the current The nitride semiconductor layer doped with different types of conductive impurities constituting the diffusion layer is composed of an In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X + Y≤1) composition, It is preferable that the doping concentrations of the n-type conductivity and the p-type conductivity be different.

The nitride semiconductor layer doped with conductive impurities of different types constituting the current diffusion layer may include a nitride semiconductor layer doped with n-type conductive impurities and a nitride semiconductor layer doped with p-type conductive impurities, or an n-type A nitride semiconductor layer doped with a conductive impurity, a nitride semiconductor layer doped with a conductive impurity, and a nitride semiconductor layer doped with a p-type conductive impurity may be formed. In this case, the nitride semiconductor layer doped with the n-type conductive impurity may be formed of two or more layers of nitride semiconductor layers in which the doping concentration of the n-type conductive impurity is sequentially increased, and the p-type conductive impurity is doped. The nitride semiconductor layer may also be formed of two or more nitride semiconductor layers in which the doping concentration of the p-type conductive impurity is sequentially increased.

In the nitride-based semiconductor LED of the present invention, the current diffusion layer is preferably formed in a multi-layer structure in which two or more layers of nitride semiconductor layers doped with a conductive impurity of the same type are stacked.

A nitride semiconductor layer doped with a conductive impurity of the same type constituting the current diffusion layer is composed of an In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X + Y≤1) composition. In one embodiment, the nitride semiconductor layer doped with the same type of conductive impurity may be formed in two or more layers in which the doping concentration of the conductive impurity is sequentially increased. It may be made of a nitride semiconductor layer, or may be composed of two or more layers of nitride semiconductor layers in which one or more doping concentrations of conductive impurities are sequentially increased.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like reference numerals designate like parts throughout the specification.

Now, a nitride-based semiconductor LED according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

Example  One

A nitride based semiconductor LED according to a first embodiment of the present invention will be described in detail with reference to FIGS. 3 and 4.

3 is a cross-sectional view illustrating a structure of a nitride based semiconductor LED according to a first embodiment of the present invention, and FIG. 4 is a view illustrating a current diffusion path of the nitride based semiconductor LED shown in FIG. 3.

First, referring to FIG. 3, in the nitride-based semiconductor LED according to the first embodiment of the present invention, a buffer layer 120 is formed on a substrate 110.

The substrate 110 is a substrate suitable for growing a nitride-based semiconductor single crystal, and is preferably formed using a transparent material including sapphire. In addition to sapphire, the substrate 110 may be formed of zinc oxide (ZnO), gallium nitride (GaN), silicon carbide (SiC), aluminum nitride (AlN), or the like.

The buffer layer 120 is a layer for improving lattice matching with the substrate 110 before growing the first n-type nitride semiconductor layer 130a and is generally formed of AlN / GaN. This is a layer for improving lattice matching with the substrate 110 and is not necessarily a layer, and may be omitted depending on the characteristics of the device and the process conditions.

The n-type nitride semiconductor layer 130, the active layer 140, and the p-type nitride semiconductor layer 150 are sequentially stacked on the buffer layer 120.

In particular, in the n-type nitride semiconductor layer 130 according to the present invention, the first n-type nitride semiconductor layer 130a and the second n-type nitride semiconductor layer 130b are sequentially stacked on the buffer layer 120. It is formed in a two-layer structure, and the current spreading layer 200 is inserted in the interface therebetween. In this case, it is preferable that the first n-type nitride semiconductor layer 130a is doped with a conductive impurity having a higher concentration than the second n-type nitride semiconductor layer 130b, which is the first n-type nitride semiconductor layer ( When the contact between the 120a) and the n-type electrode 170 to be described later, it serves to minimize the contact resistance.

The n-type and p-type nitride semiconductor layers 130 and 150 and the active layer 140 have an Al _x In _y Ga _(1-xy) N composition formula (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1, 0 ≦ x + y ≦ 1). More specifically, the first n-type and second n-type nitride semiconductor layers 130a and 130b constituting the n-type nitride semiconductor layer 130 may be a GaN layer or a GaN / AlGaN layer doped with n-type conductive impurities. For example, n-type conductive impurities may be used, for example, Si, Ge, Sn, or the like, and preferably Si is mainly used. In addition, the p-type nitride semiconductor layer 150 may be formed of a GaN layer or a GaN / AlGaN layer doped with a p-type conductive impurities, for example, Mg, Zn, Be, etc. It is used, Preferably Mg is mainly used. The active layer 140 may be formed of an InGaN / GaN layer having a multi-quantum well structure.

The current spreading layer 130 may have a multilayer structure in which two or more nitride semiconductor layers having different energy bands are stacked, or two or more nitride semiconductor layers doped with different types of conductive impurities may be stacked. The multilayer structure and the nitride semiconductor layer doped with conductive impurities of the same type may be formed in a multilayer structure in which two or more layers are stacked. At this time, the nitride semiconductor layer is preferably made of In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X + Y≤1) composition.

More specifically, the nitride semiconductor layer having different energy bands constituting the current diffusion layer 200, In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X + Y≤1) The nitride semiconductor layer formed by varying the composition ratio of Al and In of the composition, and doped with different types of conductive impurities, includes In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X +). Y≤1) can be formed by varying the doping concentration of the n-type conductivity and the p-type conductivity impurities in the composition.

In other words, the nitride semiconductor layer doped with the conductive impurity of different types constituting the current diffusion layer 200 includes a nitride semiconductor layer doped with n-type conductivity impurity and a nitride doped with p-type conductivity impurity. The semiconductor layer may be formed of a semiconductor layer, or a nitride semiconductor layer doped with n-type conductive impurities, a nitride semiconductor layer undoped with conductive impurities, and a nitride semiconductor layer doped with p-type conductive impurities. In this case, the nitride semiconductor layer doped with the n-type conductive impurity may be formed of two or more layers of nitride semiconductor layers in which the doping concentration of the n-type conductive impurity is sequentially increased, and the p-type conductive impurity is doped. The nitride semiconductor layer may also consist of two or more nitride semiconductor layers in which the doping concentration of the p-type conductive impurity is sequentially increased.

In addition, the nitride semiconductor layer doped with conductive impurities of the same type constituting the current diffusion layer 200 may be formed with different doping concentrations of the conductive impurities. In this case, the nitride semiconductor layer doped with the conductive impurity of the same type is composed of two or more nitride semiconductor layers in which the doping concentration of the conductive impurity is sequentially increased in one direction, or the doping concentration of the conductive impurity is either It is possible to consist of two or more nitride semiconductor layers sequentially increasing or decreasing.

The p-type electrode 160 is formed on the p-type nitride semiconductor layer 150. In this case, the p-type electrode 160 is preferably formed of a conductive metal oxide such as indium tin oxide (ITO) to improve the current diffusion effect. In addition, the p-type electrode 160 may be formed of a metal thin film having high conductivity and low contact resistance if the transmittance is high with respect to the emission wavelength of the LED.

In addition, a portion of the active layer 150, the p-type nitride semiconductor layer 140, and the second n-type nitride semiconductor layer 130b are removed by mesa etching, so that the current diffusion layer 200 and the first surface are formed on the bottom surface of the active layer 150. A portion of the n-type nitride semiconductor layer 130a is exposed.

The n-type electrode 170 is formed on the current diffusion layer 200 and the first n-type nitride semiconductor layer 130a exposed by the mesa etching.

More specifically, the n-type electrode 180 according to the first embodiment of the present invention is formed such that a portion of the current diffusion layer 200 and a portion of the first n-type nitride semiconductor layer 130a are exposed through mesa etching. The exposed portions of the resultant current diffusion layer 200 and the portion of the first n-type nitride semiconductor layer 130a are simultaneously formed.

Accordingly, in the nitride-based semiconductor LED according to the present invention, as shown in FIG. 4, a path of a current flowing from the n-type electrode 170 through the n-type nitride semiconductor layer 130 to the p-type electrode 160 is measured. Since the n-type nitride semiconductor layer 130, that is, the current diffusion layer 200 formed at the interface between the first n-type nitride semiconductor layer 130a and the second n-type nitride semiconductor layer 130b, the lower surface of the conventional p-type electrode It is possible to solve the problem that current is concentrated in a portion adjacent to the n-type electrode 170 rather than the nitride-based semiconductor LED (see FIG. 2), which is directed to the LED, thereby improving the current diffusion effect of the LED. Can be.

That is, since the current diffusion layer 200 according to the present invention is in direct contact with the n-type electrode 170, the injection efficiency of the injected current is high while the injection efficiency of the initial current applied from the n-type electrode 170 is also high. Can be improved.

Example  2

Referring to FIG. 5, a second embodiment of the present invention will be described. However, the description of the same parts as those of the first embodiment of the configuration of the second embodiment will be omitted, and only the configuration that is different from the second embodiment will be described in detail.

 5 is a cross-sectional view illustrating a structure of a nitride based semiconductor LED according to a second exemplary embodiment of the present invention.

 As shown in FIG. 5, the nitride-based semiconductor LED according to the second embodiment has the same structure as that of the nitride-based semiconductor LED according to the first embodiment, except that the current diffusion layer 200 is formed therein. The semiconductor device further includes a trench that exposes an upper surface of the 1 n-type nitride semiconductor layer 130a, and the first implementation is performed only in that the n-type electrode 170 is formed in the trench with both sidewalls and a lower surface embedded therein. It is different from the example.

That is, the first embodiment illustrates that the n-type electrode is formed to be in contact with a portion of the current diffusion layer 200 selectively exposed by mesa etching and a portion of the first n-type nitride semiconductor layer 130a. The second embodiment illustrates that the n-type electrode 170 is formed in a trench that exposes a sidewall of the current diffusion layer 200 and an upper surface of the first n-type nitride semiconductor layer 130a.

Therefore, the nitride-based LED according to the second embodiment obtains the same effect and effect as the nitride-based LED according to the first embodiment, and further improves the contact area between the n-type electrode 170 and the current diffusion layer 200. There is an advantage to this.

Meanwhile, as illustrated in FIGS. 6 to 8, the n-type electrode 170 according to the second embodiment includes a sidewall of the current diffusion layer 200 exposed through a trench and a first n-type nitride semiconductor layer ( It may be formed in various shapes along the inner wall of the trench formed to expose the top surface of 130a). 6 to 8 are cross-sectional views showing nitride-based semiconductor LEDs according to the first to third modified examples of the second embodiment.

Although the preferred embodiments of the present invention have been described in detail above, those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Accordingly, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concept of the present invention as defined in the following claims also fall within the scope of the present invention.

As described above, the present invention utilizes a current diffusion layer formed between the n-type nitride semiconductor layer and a current flowing from the n-type electrode to the p-type electrode through the n-type nitride semiconductor layer and in direct contact with the n-type electrode. By applying the same, the current diffusion effect can be improved to provide a nitride-based semiconductor light emitting diode having a low operating voltage and a high luminous efficiency.

Claims (18)

Board; A first n-type nitride semiconductor layer formed on the substrate; A current diffusion layer formed in a predetermined region on the first n-type nitride semiconductor layer; A second n-type nitride semiconductor layer formed on the current spreading layer and doped with a conductive impurity having a lower concentration than the first n-type nitride semiconductor layer; An active layer formed on the second n-type nitride semiconductor layer; A p-type nitride semiconductor layer formed on the active layer; A p-type electrode formed on the p-type nitride semiconductor layer; And A nitride-based semiconductor light-emitting device comprising: an n-type electrode positioned on the first n-type nitride semiconductor layer on which the second n-type nitride semiconductor layer is not formed, and part of which is in direct contact with a portion of the current spreading layer diode. delete The method of claim 1, The current spreading layer further includes a trench that exposes an upper surface of the first n-type nitride semiconductor layer therein, and the n-type electrode is formed along the inner wall of the trench. The method of claim 1, A nitride-based semiconductor light emitting diode further comprises a buffer layer at the interface between the substrate and the n-type nitride semiconductor layer. The method of claim 1, The current diffusion layer is a nitride-based semiconductor light emitting diode, characterized in that the nitride semiconductor layer having a different energy band is formed in a multi-layer structure in which at least two layers are stacked. The method of claim 5, The nitride semiconductor layer having different energy bands constituting the current spreading layer is composed of In _X Al _Y Ga ₁ -X _{- Y} N (0≤X, 0≤Y, X + Y≤1) composition, and A nitride-based semiconductor light emitting diode formed by varying the composition ratio of In. The method of claim 1, The current diffusion layer is a nitride-based semiconductor light emitting diode, characterized in that formed of a multilayer structure in which at least two layers of nitride semiconductor layers doped with different types of conductive impurities are stacked. The method of claim 7, wherein The nitride semiconductor layer doped with the conductive impurities of different types constituting the current spreading layer is composed of an In _X Al _Y Ga ₁ -X _{- Y} N (0≤X, 0≤Y, X + Y≤1) composition. And a doping concentration between the n-type conductivity and the p-type conductivity impurity. The method of claim 7, wherein The nitride semiconductor layer doped with the conductive impurities of different types constituting the current spreading layer comprises a nitride semiconductor layer doped with n-type conductive impurities and a nitride semiconductor layer doped with p-type conductive impurities. A nitride based semiconductor light emitting diode. The method of claim 9, The nitride semiconductor layer doped with the n-type conductive impurity comprises a nitride semiconductor layer having a multi-layered nitride semiconductor layer in which at least two layers in which the doping concentration of the n-type conductive impurity is sequentially increased are laminated. Semiconductor light emitting diode. The method of claim 9, The nitride semiconductor layer doped with the p-type conductive impurity comprises a nitride semiconductor layer having a multi-layered nitride semiconductor layer in which at least two layers in which the doping concentration of the p-type conductive impurity is sequentially increased are laminated. Semiconductor light emitting diode. The method of claim 7, wherein The nitride semiconductor layer doped with different types of conductive impurities constituting the current spreading layer includes a nitride semiconductor layer doped with n-type conductive impurities, a nitride semiconductor layer doped with conductive type impurities and a p-type conductive impurity. A nitride-based semiconductor light emitting diode comprising a doped nitride semiconductor layer. The method of claim 12, The nitride semiconductor layer doped with the n-type conductive impurity is a nitride-based semiconductor light emitting diode, characterized in that consisting of two or more layers of nitride semiconductor layer in which the doping concentration of the n-type conductive impurity is sequentially increased. The method of claim 12, The nitride semiconductor layer doped with the p-type conductive impurity is a nitride-based semiconductor light emitting diode, characterized in that consisting of two or more layers of nitride semiconductor layer in which the doping concentration of the p-type conductive impurity is sequentially increased. The method of claim 1, The current diffusion layer is a nitride-based semiconductor light emitting diode, characterized in that formed of a multilayer structure in which at least two layers of a nitride semiconductor layer doped with a conductive impurity of the same type is stacked. The method of claim 15, A nitride semiconductor layer doped with a conductive impurity of the same type constituting the current diffusion layer is composed of an In _X Al _Y Ga _{1 -X- Y} N (0≤X, 0≤Y, X + Y≤1) composition. A nitride-based semiconductor light emitting diode, characterized in that formed by varying the doping concentration of the conductive impurities. The method of claim 16, The nitride semiconductor layer doped with the same conductive impurity constituting the current spreading layer is formed of a nitride semiconductor layer having a multilayer structure in which at least two layers in which the doping concentration of the conductive impurity is sequentially increased are stacked. Nitride-based semiconductor light emitting diodes. The method of claim 16, A nitride semiconductor layer doped with the same conductive impurity constituting the current spreading layer is formed of a nitride semiconductor layer having a multi-layered nitride semiconductor layer in which at least two layers sequentially increase or decrease the doping concentration of the conductive impurity. Type semiconductor light emitting diode.

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