KR100773995B1 - 선 개구수 제어부를 갖는 조명 시스템을 사용하여 리소그래피 장치의 선 폭 제어를 개선하기 위한 장치 및 방법 - Google Patents
선 개구수 제어부를 갖는 조명 시스템을 사용하여 리소그래피 장치의 선 폭 제어를 개선하기 위한 장치 및 방법 Download PDFInfo
- Publication number
- KR100773995B1 KR100773995B1 KR1020030025724A KR20030025724A KR100773995B1 KR 100773995 B1 KR100773995 B1 KR 100773995B1 KR 1020030025724 A KR1020030025724 A KR 1020030025724A KR 20030025724 A KR20030025724 A KR 20030025724A KR 100773995 B1 KR100773995 B1 KR 100773995B1
- Authority
- KR
- South Korea
- Prior art keywords
- optical element
- electromagnetic energy
- lenslets
- optical
- dimensional
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/127,506 | 2002-04-23 | ||
US10/127,506 US6784976B2 (en) | 2002-04-23 | 2002-04-23 | System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040002504A KR20040002504A (ko) | 2004-01-07 |
KR100773995B1 true KR100773995B1 (ko) | 2007-11-08 |
Family
ID=28790942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030025724A KR100773995B1 (ko) | 2002-04-23 | 2003-04-23 | 선 개구수 제어부를 갖는 조명 시스템을 사용하여 리소그래피 장치의 선 폭 제어를 개선하기 위한 장치 및 방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6784976B2 (fr) |
EP (1) | EP1357431A3 (fr) |
JP (1) | JP2003318106A (fr) |
KR (1) | KR100773995B1 (fr) |
CN (1) | CN1307485C (fr) |
SG (1) | SG116490A1 (fr) |
TW (1) | TWI299880B (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6888615B2 (en) * | 2002-04-23 | 2005-05-03 | Asml Holding N.V. | System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position |
US6842223B2 (en) | 2003-04-11 | 2005-01-11 | Nikon Precision Inc. | Enhanced illuminator for use in photolithographic systems |
EP1517183A1 (fr) * | 2003-08-29 | 2005-03-23 | ASML Netherlands B.V. | Appareil lithographique, procédé pour la production d'un dispositif et dispositif produit par ce procédé |
KR101134174B1 (ko) | 2005-03-15 | 2012-04-09 | 칼 짜이스 에스엠티 게엠베하 | 투사 노광 방법 및 이를 위한 투사 노광 시스템 |
WO2007018464A2 (fr) * | 2005-08-08 | 2007-02-15 | Micronic Laser Systems Ab | Procede et appareil d'impression par projection |
US7934172B2 (en) | 2005-08-08 | 2011-04-26 | Micronic Laser Systems Ab | SLM lithography: printing to below K1=.30 without previous OPC processing |
KR100712997B1 (ko) * | 2005-09-30 | 2007-05-02 | 주식회사 하이닉스반도체 | 수직 및 수평 임계치수 차이를 조절하기 위한 노광시스템및 이를 이용한 노광방법 |
US7948606B2 (en) * | 2006-04-13 | 2011-05-24 | Asml Netherlands B.V. | Moving beam with respect to diffractive optics in order to reduce interference patterns |
KR101470769B1 (ko) | 2010-08-30 | 2014-12-09 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래픽 투영 노광 장치의 조명 시스템 |
KR101813307B1 (ko) | 2011-01-29 | 2017-12-28 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래픽 투영 노광 장치의 조명 시스템 |
KR101658985B1 (ko) | 2015-01-30 | 2016-09-23 | 한국기계연구원 | 리소그래피용 광학계 장치 |
WO2016184560A1 (fr) * | 2015-05-21 | 2016-11-24 | Carl Zeiss Smt Gmbh | Procédé de fonctionnement d'appareil de projection microlitographique |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5631721A (en) | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
US6573975B2 (en) | 2001-04-04 | 2003-06-03 | Pradeep K. Govil | DUV scanner linewidth control by mask error factor compensation |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6461716A (en) * | 1987-08-31 | 1989-03-08 | Canon Kk | Illuminator |
JPH05217855A (ja) * | 1992-02-01 | 1993-08-27 | Nikon Corp | 露光用照明装置 |
US5329336A (en) * | 1992-07-06 | 1994-07-12 | Nikon Corporation | Exposure method and apparatus |
JP2917704B2 (ja) * | 1992-10-01 | 1999-07-12 | 日本電気株式会社 | 露光装置 |
US5383000A (en) * | 1992-11-24 | 1995-01-17 | General Signal Corporation | Partial coherence varier for microlithographic system |
US5598250A (en) * | 1994-03-07 | 1997-01-28 | Hyundai Electronics Industries Co., Ltd. | Prefabricated modified illumination apparatus for forming fine patterns in a semiconductor device |
JP3571397B2 (ja) * | 1995-02-20 | 2004-09-29 | シャープ株式会社 | 光源フィルタ、それを用いた投影露光装置および投影露光方法 |
US5724122A (en) * | 1995-05-24 | 1998-03-03 | Svg Lithography Systems, Inc. | Illumination system having spatially separate vertical and horizontal image planes for use in photolithography |
US5896188A (en) * | 1996-11-25 | 1999-04-20 | Svg Lithography Systems, Inc. | Reduction of pattern noise in scanning lithographic system illuminators |
US6259513B1 (en) * | 1996-11-25 | 2001-07-10 | Svg Lithography Systems, Inc. | Illumination system with spatially controllable partial coherence |
US6628370B1 (en) * | 1996-11-25 | 2003-09-30 | Mccullough Andrew W. | Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system |
US6013401A (en) * | 1997-03-31 | 2000-01-11 | Svg Lithography Systems, Inc. | Method of controlling illumination field to reduce line width variation |
US5966202A (en) * | 1997-03-31 | 1999-10-12 | Svg Lithography Systems, Inc. | Adjustable slit |
DE69931690T2 (de) * | 1998-04-08 | 2007-06-14 | Asml Netherlands B.V. | Lithographischer Apparat |
EP0949541B1 (fr) * | 1998-04-08 | 2006-06-07 | ASML Netherlands B.V. | Appareil lithographique |
AU2940600A (en) * | 1999-03-24 | 2000-10-09 | Nikon Corporation | Exposure method and apparatus |
JP2001267205A (ja) * | 2000-03-15 | 2001-09-28 | Nec Corp | 露光装置 |
JP4545874B2 (ja) * | 2000-04-03 | 2010-09-15 | キヤノン株式会社 | 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法 |
JP2002043214A (ja) * | 2000-07-26 | 2002-02-08 | Toshiba Corp | 走査型露光方法 |
JP2002075815A (ja) * | 2000-08-23 | 2002-03-15 | Sony Corp | パターン検査装置及びこれを用いた露光装置制御システム |
CN1141620C (zh) * | 2001-07-26 | 2004-03-10 | 清华大学 | 用于集成电路光刻系统中的线阵光源扫描装置 |
-
2002
- 2002-04-23 US US10/127,506 patent/US6784976B2/en not_active Expired - Lifetime
-
2003
- 2003-04-17 TW TW092108965A patent/TWI299880B/zh not_active IP Right Cessation
- 2003-04-23 CN CNB031222366A patent/CN1307485C/zh not_active Expired - Lifetime
- 2003-04-23 SG SG200302351A patent/SG116490A1/en unknown
- 2003-04-23 EP EP03008808A patent/EP1357431A3/fr not_active Withdrawn
- 2003-04-23 JP JP2003118993A patent/JP2003318106A/ja active Pending
- 2003-04-23 KR KR1020030025724A patent/KR100773995B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5631721A (en) | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
US6573975B2 (en) | 2001-04-04 | 2003-06-03 | Pradeep K. Govil | DUV scanner linewidth control by mask error factor compensation |
Also Published As
Publication number | Publication date |
---|---|
US20030197846A1 (en) | 2003-10-23 |
CN1307485C (zh) | 2007-03-28 |
KR20040002504A (ko) | 2004-01-07 |
JP2003318106A (ja) | 2003-11-07 |
US6784976B2 (en) | 2004-08-31 |
EP1357431A2 (fr) | 2003-10-29 |
TW200307983A (en) | 2003-12-16 |
CN1453643A (zh) | 2003-11-05 |
EP1357431A3 (fr) | 2008-10-01 |
TWI299880B (en) | 2008-08-11 |
SG116490A1 (en) | 2005-11-28 |
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