KR100688773B1 - 항온수 순환장치 - Google Patents
항온수 순환장치 Download PDFInfo
- Publication number
- KR100688773B1 KR100688773B1 KR1020020086219A KR20020086219A KR100688773B1 KR 100688773 B1 KR100688773 B1 KR 100688773B1 KR 1020020086219 A KR1020020086219 A KR 1020020086219A KR 20020086219 A KR20020086219 A KR 20020086219A KR 100688773 B1 KR100688773 B1 KR 100688773B1
- Authority
- KR
- South Korea
- Prior art keywords
- constant temperature
- temperature water
- pipe
- water
- eclipse
- Prior art date
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 239000012530 fluid Substances 0.000 claims abstract description 7
- 238000005507 spraying Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
Claims (1)
- 항온수의 일정한 온도 유지를 위하여 저장, 보충 혹은 순환시키는 항온수 순환장치에 있어서;상기 항온수를 펌프 구동으로 순환시키는 FTC(Fluid Temperature Controller)와;상기 FTC의 후단에 배출관과 인입관으로 연결 설치되고, 공급되는 현상액이 순환되도록 내부에 순환관을 포함하며 상기 순환관내 순환되는 현상액이 항온수와 열교환되어 일정한 온도 유지가 가능하도록 하는 워터재킷(water jacket)과;상기 워터재킷의 후단에 공급관으로 연결 설치되어 온도 제어된 현상액을 분사하는 이클립스 노즐(eclipse nozzle)과;상기 이클립스 노즐의 상면 중 상기 공급관과 근접부에 일단이 설치되고, 상기 인입관 상에 타단이 직교 방향으로 연결 설치되어 상기 항온수의 순환을 돕는 리턴관이; 구성된 것을 특징으로 하는 항온수 순환장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020086219A KR100688773B1 (ko) | 2002-12-30 | 2002-12-30 | 항온수 순환장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020086219A KR100688773B1 (ko) | 2002-12-30 | 2002-12-30 | 항온수 순환장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040059471A KR20040059471A (ko) | 2004-07-05 |
KR100688773B1 true KR100688773B1 (ko) | 2007-02-28 |
Family
ID=37351476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020020086219A KR100688773B1 (ko) | 2002-12-30 | 2002-12-30 | 항온수 순환장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100688773B1 (ko) |
-
2002
- 2002-12-30 KR KR1020020086219A patent/KR100688773B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20040059471A (ko) | 2004-07-05 |
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