KR100646248B1 - The Preparation Method of 2-Layer Copper Clad Laminate - Google Patents

The Preparation Method of 2-Layer Copper Clad Laminate Download PDF

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KR100646248B1
KR100646248B1 KR1020040031306A KR20040031306A KR100646248B1 KR 100646248 B1 KR100646248 B1 KR 100646248B1 KR 1020040031306 A KR1020040031306 A KR 1020040031306A KR 20040031306 A KR20040031306 A KR 20040031306A KR 100646248 B1 KR100646248 B1 KR 100646248B1
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copper foil
dianhydride
clad laminate
coating
copper clad
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KR1020040031306A
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Korean (ko)
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KR20050106538A (en
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고주은
송헌식
안병인
경유진
김홍진
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주식회사 엘지화학
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    • EFIXED CONSTRUCTIONS
    • E03WATER SUPPLY; SEWERAGE
    • E03CDOMESTIC PLUMBING INSTALLATIONS FOR FRESH WATER OR WASTE WATER; SINKS
    • E03C1/00Domestic plumbing installations for fresh water or waste water; Sinks
    • E03C1/12Plumbing installations for waste water; Basins or fountains connected thereto; Sinks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B1/00Layered products having a non-planar shape
    • B32B1/08Tubular products
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • EFIXED CONSTRUCTIONS
    • E03WATER SUPPLY; SEWERAGE
    • E03BINSTALLATIONS OR METHODS FOR OBTAINING, COLLECTING, OR DISTRIBUTING WATER
    • E03B7/00Water main or service pipe systems
    • E03B7/09Component parts or accessories
    • E03B7/10Devices preventing bursting of pipes by freezing
    • EFIXED CONSTRUCTIONS
    • E03WATER SUPPLY; SEWERAGE
    • E03CDOMESTIC PLUMBING INSTALLATIONS FOR FRESH WATER OR WASTE WATER; SINKS
    • E03C1/00Domestic plumbing installations for fresh water or waste water; Sinks
    • E03C1/02Plumbing installations for fresh water
    • E03C1/021Devices for positioning or connecting of water supply lines
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16LPIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L55/00Devices or appurtenances for use in, or in connection with, pipes or pipe systems
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16LPIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L55/00Devices or appurtenances for use in, or in connection with, pipes or pipe systems
    • F16L55/02Energy absorbers; Noise absorbers
    • F16L55/033Noise absorbers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/10Properties of the layers or laminate having particular acoustical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2597/00Tubular articles, e.g. hoses, pipes
    • EFIXED CONSTRUCTIONS
    • E03WATER SUPPLY; SEWERAGE
    • E03CDOMESTIC PLUMBING INSTALLATIONS FOR FRESH WATER OR WASTE WATER; SINKS
    • E03C2201/00Details, devices or methods not otherwise provided for
    • E03C2201/60Reducing noise in plumbing systems

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Public Health (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Laminated Bodies (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

본 발명은 2층 동장 적층판(2CCL)의 제조방법에 관한 것으로, 2층 동장 적층판의 제조방법에서 종래 접착을 위해 사용하였던 폴리아믹산(PAA) 대신, 동박과의 접착을 유도하는 작용기를 가지는, 디아민계 및 디안하이드라이드 화합물로 이루어진 군으로부터 선택되는 단분자 화합물을 이용하여 동박에 코팅함으로써, 동박과 폴리이미드와의 접착력을 크게 높일 수 있고 폴리아믹산의 사용빈도를 줄일 수 있는 블렉시블 회로기판용 2층 동장 적층판의 제조방법을 제공한다.The present invention relates to a method for manufacturing a two-layer copper clad laminate (2CCL), and has a functional group that induces adhesion with copper foil instead of polyamic acid (PAA), which has been conventionally used for adhesion in a two-layer copper clad laminate. Coating on copper foil using a monomolecular compound selected from the group consisting of dianhydride compounds and dianhydride compounds, for flexible circuit boards that can significantly increase the adhesion between copper foil and polyimide and reduce the frequency of use of polyamic acid. Provided is a method for producing a two-layer copper clad laminate.

2층 동장 적층판(2CCL), 폴리이미드 필름, 블렉시블 회로기판소재, 이미드화2-layer copper clad laminate (2CCL), polyimide film, flexible circuit board material, imidization

Description

2층 동장 적층판의 제조방법{The Preparation Method of 2-Layer Copper Clad Laminate}The Preparation Method of 2-Layer Copper Clad Laminate

본 발명은 2층 동장 적층판(2-Layer Copper Clad Laminate: 이하 '2CCL' 이라 한다)에 관한 것으로서, 보다 상세하게는 종래에 비해 동박과 폴리이미드와의 접착력을 크게 높일 수 있는 인쇄회로기판용 2층 동장 적층판의 제조방법에 관한 것이다.The present invention relates to a two-layer copper clad laminate (hereinafter referred to as '2CCL'), and more specifically, to a printed circuit board capable of significantly increasing adhesion between copper foil and polyimide, as compared to the prior art. A method for producing a layer copper clad laminate.

2층 동장 적층판은 동박(Cu)과 폴리이미드(polyimide; 이하 'PI'라 한다) 필름을 직접 맞붙인 형태로서, 기존의 접착제를 사용하여 동박과 PI 필름을 접착한 이른바 3CCL에 비해 열안정성, 내구성, 전기적 특성 등이 매우 우수한 플렉시블(flexible) 회로 기판 소재이다.The two-layer copper clad laminate is a form of directly bonding copper (Cu) and polyimide (hereinafter referred to as 'PI') films, and compared to so-called 3CCL, in which copper foil and PI film were bonded using a conventional adhesive, It is a flexible circuit board material with excellent durability and electrical characteristics.

기존의 2CCL 적층판을 만드는 방법에는 크게 두 가지가 있는데, 하나는 일단 형성된 PI 필름의 표면에 구리(Cu)를 증착해서 적층시키는 방법이고(Sputtering법), 다른 하나는 동박에 PI의 전구체인 폴리아믹산(polyamic acid; 이하 'PAA'라 한다) 용액(바니쉬; varnish)을 도포하고 이를 건조한 후, 이를 열적으로(thermal imidization) 혹은 화학적으로(chemical imidization) 경화( 이미드화)하여 적층체를 형성하는 방법이다(Casting법).There are two methods of making a conventional 2CCL laminate plate, one method is to deposit copper (Cu) on the surface of the PI film formed once (Sputtering method), the other is polyamic acid which is a precursor of PI to copper foil (polyamic acid; hereinafter referred to as 'PAA') A method of forming a laminate by applying a solution (varnish; varnish), drying it, and then curing it (thermally imidization) or chemically (chemical imidization) (Casting method)

상기 2CCL의 여러 가지 요구 특성 중에서, 동박과 PI 간의 접착력은 회로기판의 성능과 내구성에 중요한 영향을 끼치는 항목이다.Among the various required characteristics of the 2CCL, the adhesive force between the copper foil and the PI is an item that has an important effect on the performance and durability of the circuit board.

상기의 두 가지 제조 방법 중에서 캐스팅법은 동박에 폴리아믹산을 도포하고 경화하는데 접착력이 낮은 경우가 대부분이다. 그래서, 현재까지는 동박에 바로 닿는 PI의 경우 동박과의 접착력을 높이는 폴리아믹산과, 전체의 물성을 좌우하는 폴리아믹산을 차례로 도포하고 건조하는 과정을 반복한 후 경화하여 2층 동장 적층판을 제조하고 있다. 그러나, 이러한 방법은 접착력이 높은 2CCL을 제조할 수는 있지만, 물성이 서로 다른 폴리아믹산을 두 번 이상 도포하고 건조하는 과정을 거침으로 인해, 번거로움과 제조비용을 높이는 문제를 발생시킨다.Among the two production methods described above, the casting method is most often a case where the adhesive strength is low in applying and curing the polyamic acid to the copper foil. So, until now, the PI which directly touches the copper foil has been applied to the polyamic acid which increases the adhesive strength with the copper foil, and the polyamic acid which affects the overall physical properties is sequentially applied and dried, and then cured to produce a two-layer copper clad laminate. . However, this method can produce a high adhesion 2CCL, but due to the process of applying and drying the polyamic acid with different physical properties two or more times, there is a problem of increasing the hassle and manufacturing cost.

따라서, 상기와 같은 문제점을 해결하기 위하여, 본 발명의 목적은 접착력을 높일 수 있는 디안하드라이드나 디아민 단분자를 동박에 도포한 후, 바로 폴리아믹산을 도포하고 경화하여 동박과 폴리이미드(PI)와의 접착력을 높일 수 있으며, 제조공정을 단축하여 비용감소 효과를 가져올 수 있는 2층 동장 적층판의 제조방법을 제공하는 것이다.Therefore, in order to solve the above problems, an object of the present invention is to apply a dianhydride or a diamine single molecule to the copper foil that can increase the adhesion, immediately after applying a polyamic acid and cured copper foil and polyimide (PI) It is to provide a method of manufacturing a two-layer copper clad laminate that can increase the adhesive force with and shorten the manufacturing process to bring a cost-effectiveness.

본 발명의 다른 목적은 상기한 방법으로 제조된 플렉시블 인쇄회로기판용 2층 동장 적층판을 제공하는 것이다.Another object of the present invention is to provide a two-layer copper clad laminate for a flexible printed circuit board manufactured by the above method.

상기 목적을 달성하기 위하여, 본 발명은 In order to achieve the above object, the present invention                     

a) 동박에 폴리이미드 전구체 용액을 코팅, 건조하고,a) coating and drying the polyimide precursor solution on copper foil,

b) 상기 a)에서 얻어진 동박에 상기 a)의 폴리이미드 전구체 용액을 코팅, 건조하고,b) coating and drying the polyimide precursor solution of said a) on the copper foil obtained by said a),

c) 상기 b)에서 얻어진 동박에 상기 a)의 폴리이미드 전구체 용액을 코팅, 건조하고 경화하는 단계를 포함하는 2층 동장 적층판의 제조방법에 있어서,c) coating, drying and curing the polyimide precursor solution of a) on the copper foil obtained in b), the method of producing a two-layer copper clad laminate,

상기 a)단계에서 동박에 코팅하는 용액은, 하기 화학식 1로 표시되는 디아민 화합물, 및 화학식 2로 표시되는 디안하이드라이드 화합물로 이루어진 군으로부터 선택되는 1 종 이상을 포함하는 것인 2층 동장 적층판의 제조방법을 제공한다.The solution coated on the copper foil in step a) is a diamine compound represented by the following formula (1), and a dianhydride compound represented by the formula (2) of the two-layer copper clad laminate of one or more selected from the group consisting of It provides a manufacturing method.

[화학식 1][Formula 1]

H2N-X1-NH2 H 2 NX 1 -NH 2

[화학식 2][Formula 2]

Figure 112004018830121-pat00001
Figure 112004018830121-pat00001

상기 식에서,Where

X1

Figure 112004018830121-pat00002
,
Figure 112004018830121-pat00003
,
Figure 112004018830121-pat00004
, 또는 X 1 is
Figure 112004018830121-pat00002
,
Figure 112004018830121-pat00003
,
Figure 112004018830121-pat00004
, or

Figure 112004018830121-pat00005
이며,
Figure 112004018830121-pat00005
Is,

이때 Y1 및 Y2는 각각 독립적으로 또는 동시에 -, -O-, -CO-, -SO2, -C(CH 3)2-, -CONH-, -(CH2)n1-, -(CH2)n2-O-, -O(CH2)n 3O-, -COO(CH2)n4OCO-, 또는 할로겐 원자이며, 여기서 1≤ n1, n3, n4 ≤ 5이며, 0 ≤ n2 ≤5인 정수이다.Wherein Y 1 and Y 2 are each independently or simultaneously-, -O-, -CO-, -SO 2 , -C (CH 3 ) 2- , -CONH-,-(CH 2 ) n 1 -,-( CH 2 ) n 2 —O—, —O (CH 2 ) n 3 O—, —COO (CH 2) n 4 OCO—, or a halogen atom, where 1 ≦ n 1, n 3 , n 4 ≦ 5, and 0 ≤ n is an integer of 2 ≤5.

이하에서 본 발명을 상세하게 설명한다.Hereinafter, the present invention will be described in detail.

본 발명은 동박과의 접착을 유도하는 안하이드라이드나 디아민 단분자가 폴리아믹산과 반응하는 것을 이용하는 2층 동장 적층판(2CCL)의 제조 방법을 제공하는 특징이 있다.The present invention is characterized by providing a method for producing a two-layer copper clad laminate (2CCL) using an anhydride or a diamine single molecule that induces adhesion with a copper foil to react with a polyamic acid.

본 발명은 종래 a) 접착을 위한 PAA의 코팅, 건조단계, b) 베이스 PAA 코팅, 건조단계, c) PAA의 코팅, 건조단계, 및 d) 전체 PAA의 경화 단계를 포함하는 2층 동장 적층판의 제조방법에서, 상기 접착을 위해 사용되는 폴리아믹산 대신 접착력을 높일 수 있는 디아민계나 디안하이드라이드 단분자 화합물을 사용하고, 그 이후의 공정은 종래와 동일하게 진행된다. 본 발명에 따르면 폴리아믹산을 2번 이상으로 사용하지 않아도 동박과 폴리이미드사이에 충분한 접착력을 나타낼 수 있다.The present invention relates to a two-layer copper clad laminate comprising a) coating of PAA for adhesion, drying step, b) coating of base PAA, drying step, c) coating of PAA, drying step, and d) curing of the entire PAA. In the production method, a diamine-based or dianhydride monomolecular compound capable of enhancing adhesion instead of the polyamic acid used for the adhesion is used, and the subsequent steps proceed in the same manner as in the prior art. According to the present invention, even if the polyamic acid is not used two or more times, sufficient adhesion between the copper foil and the polyimide can be exhibited.

이러한 본 발명의 2층 동장 적층판의 제조방법은, a) 동박에 접착을 유도하는 단분자 화합물을 유기용매에 용해한 용액을 도포하고 건조한 후, b) 유기 용매에 녹인 폴리아믹산을 그 위에 다시 코팅, 건조하고, c) 다시 b)단계의 폴리아믹산 용액을 코팅, 건조하고, d) 폴리아믹산을 경화(이미드화)하는 단계로 이루어진다. In the method of manufacturing a two-layer copper clad laminate of the present invention, a) applying a solution obtained by dissolving a monomolecular compound inducing adhesion to copper foil in an organic solvent and drying, b) re-coating a polyamic acid dissolved in an organic solvent thereon, Drying, c) coating and drying the polyamic acid solution of step b), and d) curing (imidization) of the polyamic acid.                     

이때, 상기 단분자는 폴리아믹산과 반응할 수 있는데, 반응한 단분자는 동박과의 접착을 유도할 뿐만 아니라 폴리아믹산과 한분자를 이루는 폴리이미드가 되어 동박과 폴리이미드 사이의 접착력이 높고, 열안정성이 있는 2CCL을 제작할 수 있게 한다.At this time, the monomolecule may react with the polyamic acid. The reacted monomolecule not only induces adhesion with the copper foil but also becomes a polyimide forming a single molecule with the polyamic acid, and thus has high adhesive strength between the copper foil and the polyimide, and thermal stability. Allows you to build 2CCLs.

상기 단분자 화합물은 하기 화학식 1로 표시되는 디아민계 화합물, 및 화학식 2로 표시되는 디안하이드라이드 화합물로 이루어진 군으로부터 1 종 이상 선택되는 것이 바람직하다.The monomolecular compound is preferably selected from the group consisting of a diamine compound represented by the following formula (1), and a dianhydride compound represented by the formula (2).

[화학식 1][Formula 1]

H2N-X1-NH2 H 2 NX 1 -NH 2

[화학식 2][Formula 2]

Figure 112004018830121-pat00006
Figure 112004018830121-pat00006

상기 식에서,Where

X1

Figure 112004018830121-pat00007
,
Figure 112004018830121-pat00008
,
Figure 112004018830121-pat00009
, 또는X 1 is
Figure 112004018830121-pat00007
,
Figure 112004018830121-pat00008
,
Figure 112004018830121-pat00009
, or

Figure 112004018830121-pat00010
이며,
Figure 112004018830121-pat00010
Is,

이때 Y1 및 Y2는 각각 독립적으로 또는 동시에 -, -O-, -CO-, -SO2, -C(CH 3)2-, -CONH-, -(CH2)n1-, -(CH2)n2-O-, -O(CH2)n 3O-, -COO(CH2)n4OCO-, 또는 할로겐 원자이며, 여기서 1≤ n1, n3, n4 ≤ 5이며, 0 ≤ n2 ≤5인 정수이다.Wherein Y 1 and Y 2 are each independently or simultaneously-, -O-, -CO-, -SO 2 , -C (CH 3 ) 2- , -CONH-,-(CH 2 ) n 1 -,-( CH 2 ) n 2 —O—, —O (CH 2 ) n 3 O—, —COO (CH 2) n 4 OCO—, or a halogen atom, where 1 ≦ n 1, n 3 , n 4 ≦ 5, and 0 ≤ n is an integer of 2 ≤5.

상기 단분자 화합물을 동박에 코팅하는 과정에서 그 두께는 0.01 내지 5 ㎛가 바람직하다. 일반적으로 CCL(회로소재)에서 사용되는 동박은 보통 1 내지 3 ㎛ 정도의 조도(roughness)를 가지고 있다. 이것은 표면적을 넓혀서 폴리이미드와의 접착력을 높이기 위함인데, 이때 그 코팅두께가 0.01 ㎛ 미만일 경우 접착력을 높이는 효과를 얻기 어렵다. 또한, 폴리이미드를 중합하는 것은 디안하이드라이드나 디아민을 당량비로 그 분자량을 조절하는데, 상기 코팅두께가 5 ㎛를 초과하면 디아민이나 디안하이드라니드를 캐스트하고 그 위에 폴리아믹산을 도포하면 캐스팅된 박막 전체의 디안하이드라이드나 디아민의 당량비가 맞지 않아 적당한 분자량을 가질 수 없어 기계적 물성이 좋지 않다.In the process of coating the monomolecular compound on the copper foil, the thickness thereof is preferably 0.01 to 5 μm. Generally, copper foil used in CCL (circuit material) has roughness of about 1 to 3 μm. This is to increase the adhesion to the polyimide by widening the surface area, when the coating thickness is less than 0.01 ㎛ difficult to obtain the effect of increasing the adhesive force. In addition, the polymerization of polyimide regulates the molecular weight of dianhydride or diamine in an equivalence ratio. When the coating thickness exceeds 5 μm, the cast thin film is cast by casting diamine or dianhydride and applying polyamic acid thereon. Since the equivalent ratio of dianhydride and diamine of the whole does not match, it cannot have moderate molecular weight and mechanical properties are not good.

또한, 상기 b)단계 및 c)단계의 폴리이미드 전구체 용액인 PAA는 용매에 디안하이드라이드(dianhydride)와 디아민(diamine)을 1:0.9 내지 1:1.1의 몰비로 혼합한 바니쉬를 1회 이상 코팅 및 건조시켜 이루어질 수 있다.In addition, PAA, the polyimide precursor solution of steps b) and c) is coated with a varnish containing a mixture of dianhydride and diamine in a molar ratio of 1: 0.9 to 1: 1.1 at least once in a solvent. And drying.

상기 디안하이드라이드(dianhydride)는 PMDA(피로멜리틱 디안하이드라이드), BPDA(3,3',4,4'-바이페닐테트라카복실릭 디안하이드라이드), BTDA(3,3',4,4'-벤조페논테트라카복실릭 디안하이드라이드), ODPA(4,4'-옥시다이프탈릭 안하이드라이드), BPADA(4,4'-(4,4'-이소프로필바이페녹시)바이프탈릭 안하이드라이드), 6FDA(2,2'-bis-(3,4-디카복실페닐) 헥사플루오로프로판 디안하이드라이드), TMEG(에틸렌 글리콜 비스(안하이드로-트리멜리테이트) 등으로 이루어진 군으로부터 선택되는 1종 이상일 수 있다.The dianhydride is PMDA (pyromellitic dianhydride), BPDA (3,3 ', 4,4'-biphenyltetracarboxylic dianhydride), BTDA (3,3', 4,4). '-Benzophenonetetracarboxylic dianhydride), ODPA (4,4'-oxydiphthalic anhydride), BPADA (4,4'-(4,4'-isopropylbiphenoxy) biphthalic Anhydride), 6FDA (2,2'-bis- (3,4-dicarboxylphenyl) hexafluoropropane dianhydride), TMEG (ethylene glycol bis (anhydro- trimellitate), etc.) It may be one or more selected.

상기 디아민(diamine)은 p-PDA(p-페닐렌디아민), m-PDA(m-페닐렌디아민), 4,4'-ODA(4,4'-옥시디아닐린), 3,4'-ODA(3,4'-옥시디아닐린), BAPP(2,2-비스(4-[4-아미노페녹시]-페닐)프로판), TPE-R(1,3-비스(4-아미노페녹시)벤젠), m-BAPS(2,2-비스(4-[3-아미노페녹시]페닐)설폰) 등으로 이루어진 군으로부터 선택되는 1종 이상일 수 있다.The diamine may be p-PDA (p-phenylenediamine), m-PDA (m-phenylenediamine), 4,4'-ODA (4,4'-oxydianiline), 3,4'- ODA (3,4'-oxydianiline), BAPP (2,2-bis (4- [4-aminophenoxy] -phenyl) propane), TPE-R (1,3-bis (4-aminophenoxy) ) Benzene), m-BAPS (2,2-bis (4- [3-aminophenoxy] phenyl) sulfone) and the like.

또한, 본 발명은 필요에 따라 상기의 화합물 이외의 다른 디안하이드라이드나 다른 디아민, 혹은 다른 화합물을 소량 첨가하는 것도 가능하다.Moreover, this invention can also add a small amount of other dianhydrides, another diamine, or another compound other than the said compound as needed.

상기 용매는 N-메틸피롤리디논(N-methylpyrrolidinone; NMP), N,N-디메틸아세트아미드(N,N-dimethylacetamide; DMAc), 테트라히드로퓨란(tetrahydrofuran; THF), N,N-디메틸포름아미드(N,N-dimethylformamide; DMF), 디메틸설폭시드(dimethylsulfoxide; DMSO), 시클로헥산(cyclohexane), 아세토니트릴(acetonitrile) 및 이들의 혼합물로 이루어진 군으로부터 선택하여 사용할 수 있으며, 용매의 종류가 이에 한정되는 것은 아니다.The solvent is N-methylpyrrolidinone (NMP), N, N-dimethylacetamide (N, N-dimethylacetamide; DMAc), tetrahydrofuran (THF), N, N-dimethylformamide (N, N-dimethylformamide; DMF), dimethylsulfoxide (DMSO), cyclohexane (cyclohexane), acetonitrile (acetonitrile), and mixtures thereof. It doesn't happen.

상기 코팅은 콤마(comma) 코터나 다이(die) 코터 등을 사용할 수 있고, 이 외에도 일반적으로 코팅에 사용되는 다른 기술을 써도 무방하다. 상기 코팅된 바니쉬의 건조는 오븐의 구조나 조건에 따라 다르겠지만 보통 100 내지 350 ℃ 정도, 보다 바람직하게는 140 내지 250 ℃ 정도에서 행한다. The coating may be a comma coater, a die coater, or the like, in addition to the other techniques generally used for coating. Drying of the coated varnish depends on the structure and conditions of the oven, but is usually performed at about 100 to 350 ° C, more preferably at about 140 to 250 ° C.                     

이상과 같이, 본 발명의 방법에 의하면 폴리아믹산과 반응하여 접착력을 높일 수 있는 디아민이나 디안하이드라이드 단분자 화합물을 사용함으로써, 간단한 방법으로 종래에 비해 동박과 폴리이미드간의 접착력이 우수한 플렉시블 인쇄회로기판용 2층 동장 적층판을 제공할 수 있다.As described above, according to the method of the present invention, by using a diamine or a dianhydride monomolecular compound capable of increasing adhesion by reacting with a polyamic acid, a flexible printed circuit board having excellent adhesion between copper foil and polyimide in a simple method as compared with the conventional method. 2-layer copper clad laminated board for this invention can be provided.

이렇게 얻어진 본 발명의 2층 동장 적층판은 접착력이 적어도 500 N/m 이상, 흡습율은 4% 이하, 인장 강도 13.8×107 Pa 이상, 신장율 25% 이상, 유전상수 4.0 t3 이하가 된다.The two-layer copper clad laminate of the present invention thus obtained has an adhesive force of at least 500 N / m or more, a moisture absorption of 4% or less, a tensile strength of 13.8 × 10 7 Pa or more, an elongation of 25% or more, and a dielectric constant of 4.0 t3 or less.

이하 본 발명을 실시예를 통해 더욱 상세히 설명하고자 한다. 그러나 하기 실시예는 본 발명을 예시하는 것일 뿐이며 본 발명의 범위가 하기 실시예로 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples. However, the following examples are merely to illustrate the invention and the scope of the present invention is not limited to the following examples.

[실시예 1]Example 1

하기 화학식 1a의 4,4'-옥시다이아닐린을 NMP에 10 중량%로 녹인 후 그라비아 코터를 이용하여 동박에 0.5 ㎛의 두께로 도포하였다. 이후, PMDA와 4,4-ODA를 1:1의 몰비로 20 중량% 중합한 폴리아믹산을 도포하여 140 ℃에서 건조하는 과정을 2번 반복하였다. 그 후에 분당 20 ℃ 속도로 350 ℃ 까지 온도를 올려 경화하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 0.9kg/cm로 나타났다. 4,4'-oxydianiline of Formula 1a was dissolved in NMP at 10% by weight, and then applied to a copper foil with a thickness of 0.5 μm using a gravure coater. Thereafter, the process of drying polyamic acid polymerized with 20 wt% of PMDA and 4,4-ODA in a molar ratio of 1: 1 was repeated twice. Thereafter, the temperature was raised to 350 ° C at 20 ° C per minute to cure. The thickness of the PI of 2CCL thus prepared was 25 μm and the adhesion between copper foil and PI was 0.9 kg / cm.                     

(화학식 1a)(Formula 1a)

Figure 112004018830121-pat00011
Figure 112004018830121-pat00011

[실시예 2]Example 2

실시예 1과 같은 방법으로 2CCL을 제작하되, 4,4'-디아미노벤조페논을 1 ㎛로 두께로 도포하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 1.0 kg/cm로 나타났다.2CCL was prepared in the same manner as in Example 1, but 4,4′-diaminobenzophenone was applied to a thickness of 1 μm. The thickness of the PI of 2CCL thus prepared was 25 μm and the adhesion between copper foil and PI was 1.0 kg / cm.

[실시예 3]Example 3

실시예 1과 같은 방법으로 2CCL을 제작하되, TMEG(에틸렌글리콜 비스(안하이드로-트리멜리테이드)(화학식 2)을 1㎛ 두께로 도포한 후, PMDA와 4,4-ODA를 1:1의 몰비로 20 중량% 중합한 폴리아믹산을 도포하고 건조하여 경화하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 1.2 kg/cm를 나타내었다.Prepare 2CCL in the same manner as in Example 1, apply TMEG (ethylene glycol bis (anhydro- trimellitate) (Formula 2) to 1㎛ thickness, PMDA and 4,4-ODA 1: 1 The polyamic acid polymerized at 20% by weight in a molar ratio of was applied, dried and cured, and the thickness of PI of 2CCL thus prepared was 25 μm and the adhesion between copper foil and PI was 1.2 kg / cm.

[화학식 2][Formula 2]

Figure 112004018830121-pat00012
Figure 112004018830121-pat00012

[실시예 4]Example 4

2,5-비스(4-아미노페닐)-1,3,4-옥사디아졸 (화학식 1b)을 NMP에 10 wt%로 녹 인 후 0.5um 두께로 그라비아 코터를 이용하여 전해 동박에 도포하였다. BPDA와 p-PDA를 1:1로 20 wt% 중합한 폴리아믹산을 도포하여 140 ℃ 에서 건조하였다. 그 후에 분당 20 ℃ 속도로 350 ℃까지 온도를 올려 경화하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 1.0 kg/cm를 나타내었다.2,5-bis (4-aminophenyl) -1,3,4-oxadiazole (Formula 1b) was dissolved in NMP at 10 wt% and applied to the electrolytic copper foil using a gravure coater at a thickness of 0.5 um. Polyamic acid obtained by polymerizing BPDA and p-PDA in a 1: 1 weight ratio was applied and dried at 140 ° C. Thereafter, the temperature was raised to 350 ° C at 20 ° C per minute to cure. The thickness of the PI of 2CCL thus prepared was 25 μm and the adhesion between copper foil and PI was 1.0 kg / cm.

[비교예 1]Comparative Example 1

상기 실시예 1과 동일한 방법으로 실시하되, 첫 번째 동박 코팅과정에서 화학식 1 또는 2의 화합물 대신, 동박에 PMDA와 4,4-ODA를 1:1의 몰비로 20 중량% 중합한 폴리아믹산을 도포하여 140 ℃ 에서 건조하였다. 그 후에 분당 20 ℃ 속도로 350 ℃ 까지 온도를 올려 경화하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고, 동박과 PI의 접착력은 0.5 kg/cm을 나타내었다.In the same manner as in Example 1, but instead of the compound of Formula 1 or 2 in the first copper foil coating process, 20% by weight of polyamic acid polymerized PMDA and 4,4-ODA at a molar ratio of 1: 1 by weight Dried at 140 ° C. Thereafter, the temperature was raised to 350 ° C at 20 ° C per minute to cure. The thickness of the PI of 2CCL thus prepared was 25 μm, and the adhesion between copper foil and PI was 0.5 kg / cm.

[비교예 2]Comparative Example 2

상기 실시예 1과 동일한 방법으로 실시하되, 첫 번째 동박 코팅과정에서 화학식 1 또는 2의 화합물 대신, 동박에 BPDA와 p-PDA를 1:1의 몰비로 20 중량% 중합한 폴리아믹산을 도포하여 140 ℃에서 건조하였다. 그 후에 분당 20 ℃ 속도로 350 ℃ 까지 온도를 올려 경화하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 0.4 kg/cm으로 나타내었다.In the same manner as in Example 1, in the first copper foil coating process, instead of the compound of Formula 1 or 2, BPDA and p-PDA at a molar ratio of 1: 1 by weight of 20% by weight of polyamic acid 140 Dried at ° C. Thereafter, the temperature was raised to 350 ° C at 20 ° C per minute to cure. The thickness of PI of 2CCL thus prepared was 25 μm and the adhesion between copper foil and PI was 0.4 kg / cm.

[비교예 3]Comparative Example 3

상기 실시예 1과 동일한 방법으로 실시하되, 단분자 화합물을 포함하는 용액의 도포두께는 0.005 ㎛가 되게 하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 0.5 kg/cm으로 나타났다. In the same manner as in Example 1, the coating thickness of the solution containing a single molecule compound was set to 0.005 ㎛. The thickness of PI of 2CCL thus prepared was 25 μm and the adhesion between copper foil and PI was 0.5 kg / cm.                     

[비교예 3]Comparative Example 3

상기 실시예 1과 동일한 방법으로 실시하되, 단분자 화합물을 포함하는 용액의 도포두께는 6 ㎛가 되게 하였다. 이렇게 하여 제조된 2CCL의 PI의 두께는 25 ㎛이고 동박과 PI의 접착력은 0.7 kg/cm으로 나타났다.In the same manner as in Example 1, the coating thickness of the solution containing a single molecule compound was 6 ㎛. The PI of the 2CCL prepared in this way was 25 ㎛ and the adhesion between the copper foil and PI was 0.7 kg / cm.

또한, 상기 실시예 1 내지 4에 대하여, 기계적 물성으로서 통상의 방법으로 신장율(elongation)을 시험하였다.In addition, for Examples 1 to 4, the elongation was tested by a conventional method as mechanical properties.

그 결과, 본 실시예 1 내지 4의 경우 폴리이미드의 신장율이 25% 정도로 기준에 합당하나, 비교예 3의 경우는 10% 미만으로 불량하였다.As a result, in Examples 1 to 4, the elongation rate of the polyimide was about 25%, which satisfies the criterion, but in Comparative Example 3, it was poor, less than 10%.

이상에서 설명한 바와 같이, 본 발명의 2층 동장 적층판의 제조 방법은 폴리아믹산과 반응할 수 있는 화합물을 이용하여 동박과 폴리이미드와의 접착력을 향상시키고, 접착을 위해 사용되는 폴리아믹산의 사용 빈도를 줄일 수 있어 경제적인 효과가 있다.As described above, the method for producing a two-layer copper clad laminate of the present invention improves the adhesion between the copper foil and the polyimide by using a compound capable of reacting with the polyamic acid, and improves the frequency of use of the polyamic acid used for the adhesion. It is possible to reduce the economic effect.

Claims (7)

a) 동박에 폴리이미드 전구체 용액을 코팅, 건조하고,a) coating and drying the polyimide precursor solution on copper foil, b) 상기 a)에서 얻어진 동박에 상기 a)의 폴리이미드 전구체 용액을 코팅, 건조하고,b) coating and drying the polyimide precursor solution of said a) on the copper foil obtained by said a), c) 상기 b)에서 얻어진 동박에 상기 a)의 폴리이미드 전구체 용액을 코팅, 건조하고 경화하는 단계를 포함하는 2층 동장 적층판의 제조방법에 있어서,c) coating, drying and curing the polyimide precursor solution of a) on the copper foil obtained in b), the method of producing a two-layer copper clad laminate, 상기 a)단계에서 동박에 코팅하는 용액은, 하기 화학식 1로 표시되는 디아민 화합물, 및 화학식 2로 표시되는 디안하이드라이드 화합물로 이루어진 군으로부터 선택되는 1 종 이상The solution coated on the copper foil in the step a), at least one selected from the group consisting of a diamine compound represented by the following formula (1), and a dianhydride compound represented by the formula (2) 을 포함하는 것인 2층 동장 적층판의 제조방법:Method for producing a two-layer copper clad laminate comprising: [화학식 1][Formula 1] H2N-X1-NH2 H 2 NX 1 -NH 2 [화학식 2][Formula 2]
Figure 112004018830121-pat00013
Figure 112004018830121-pat00013
상기 식에서,Where X1
Figure 112004018830121-pat00014
,
Figure 112004018830121-pat00015
,
Figure 112004018830121-pat00016
, 또는
X 1 is
Figure 112004018830121-pat00014
,
Figure 112004018830121-pat00015
,
Figure 112004018830121-pat00016
, or
Figure 112004018830121-pat00017
이며,
Figure 112004018830121-pat00017
Is,
이때 Y1 및 Y2는 각각 독립적으로 또는 동시에 -, -O-, -CO-, -SO2, -C(CH 3)2-, -CONH-, -(CH2)n1-, -(CH2)n2-O-, -O(CH2)n 3O-, -COO(CH2)n4OCO-, 또는 할로겐 원자이며, 여기서 1≤ n1, n3, n4 ≤ 5이며, 0 ≤ n2 ≤5인 정수이다.Wherein Y 1 and Y 2 are each independently or simultaneously-, -O-, -CO-, -SO 2 , -C (CH 3 ) 2- , -CONH-,-(CH 2 ) n 1 -,-( CH 2 ) n 2 —O—, —O (CH 2 ) n 3 O—, —COO (CH 2) n 4 OCO—, or a halogen atom, where 1 ≦ n 1, n 3 , n 4 ≦ 5, and 0 ≤ n is an integer of 2 ≤5.
제 1항에 있어서, 상기 a)단계에서 동박의 코팅은 0.01 내지 5 ㎛의 두께로 실시되는 것인 제조방법.The method of claim 1, wherein the coating of the copper foil in step a) is carried out to a thickness of 0.01 to 5 ㎛. 제 1항에 있어서, 상기 b)단계 및 c)단계의 폴리이미드 전구체 용액은 유기용매에 디안하이드라이드와 디아민을 1: 0.9 내지 1: 1.1의 몰비로 혼합한 바니쉬 형태로 이루어진 것인 제조방법.The method according to claim 1, wherein the polyimide precursor solution of steps b) and c) is formed in a varnish form in which dianhydride and diamine are mixed in an organic solvent in a molar ratio of 1: 0.9 to 1: 1.1. 제 3항에 있어서, 상기 디안하이드라이드는 피로멜리틱 디안하이드라이드, 3,3'4,4'-바이페닐테트라카복실릭 디안하이드라이드, 3,3'.4,4'-벤조페논테트라카복실릭 디안하이드라이드, 4,4'-옥시디프탈릭 안하이드라이드, 4,4'-(4,4'-이소프 로필바이페녹시)바이프탈릭 안하이드라이드, 2,2'-비스-(3,4-디카복시페닐)헥사플로오로프로판 디안하이드라이드, 및 에틸렌 글리콜 비스(안하이드로-트리멜리테이트)로 이루어진 군으로부터 1 종 이상 선택되는 것인 제조방법.The dianhydride of claim 3, wherein the dianhydride is pyromellitic dianhydride, 3,3'4,4'-biphenyltetracarboxylic dianhydride, 3,3'.4,4'-benzophenonetetracarboxyl. Rick dianhydride, 4,4'-oxydiphthalic anhydride, 4,4 '-(4,4'-isopropylbiphenoxy) biphthalic anhydride, 2,2'-bis- (3 And 4-dicarboxyphenyl) hexafluoropropane dianhydride, and ethylene glycol bis (anhydro-trimelitate). 제 3항에 있어서, 상기 디아민은 p-페닐렌디아민, m-페닐렌디아민, 4,4'-옥시디아닐린, 3,4'-옥시디아닐린, 2,2-비스(4-[4-아미노페녹시]-페닐)프로판, 1,3-비스(4-아미노페녹시)벤젠, 및 (2,2-비스(4-[3-아미노페녹시]페닐)설폰)으로 이루어진 군으로부터 1종 이상 선택되는 것인 제조방법.4. The diamine according to claim 3, wherein the diamine is p-phenylenediamine, m-phenylenediamine, 4,4'-oxydianiline, 3,4'-oxydianiline, 2,2-bis (4- [4- Aminophenoxy] -phenyl) propane, 1,3-bis (4-aminophenoxy) benzene, and (2,2-bis (4- [3-aminophenoxy] phenyl) sulfone) The manufacturing method will be selected above. 제 1항에 있어서, 상기 용매는 N-메틸피롤리디논, N, N-디메틸아세트아미드, 테트라히드로퓨란, N, N-디메틸포름아미드, 디메틸설폭사이드, 시클로헥산, 아세토니트릴 및 이들의 혼합물로 이루어진 군으로부터 선택되는 것인 제조방법.The method of claim 1, wherein the solvent is N-methylpyrrolidinone, N, N-dimethylacetamide, tetrahydrofuran, N, N-dimethylformamide, dimethyl sulfoxide, cyclohexane, acetonitrile and mixtures thereof. The production method is selected from the group consisting of. 제 1항 내지 제 6항 중 어느 한 항의 방법으로 제조된 2층 동장 적층판.A two-layer copper clad laminate produced by the method of any one of claims 1 to 6.
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JPH02131936A (en) * 1988-11-14 1990-05-21 Mitsui Toatsu Chem Inc Flexible copper-clad laminated board
JPH104268A (en) 1996-06-18 1998-01-06 Sumitomo Bakelite Co Ltd Method of manufacturing multilayer printed wiring board
KR19980071471A (en) * 1997-02-18 1998-10-26 야마토야 다카키 Resin solution composition for electronic materials and circuit protective film for printed circuit board using the same
JPH11227099A (en) 1998-02-10 1999-08-24 Mitsubishi Chemical Corp Heat-resistant substrate
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JPH02131936A (en) * 1988-11-14 1990-05-21 Mitsui Toatsu Chem Inc Flexible copper-clad laminated board
JPH104268A (en) 1996-06-18 1998-01-06 Sumitomo Bakelite Co Ltd Method of manufacturing multilayer printed wiring board
KR19980071471A (en) * 1997-02-18 1998-10-26 야마토야 다카키 Resin solution composition for electronic materials and circuit protective film for printed circuit board using the same
JPH11227099A (en) 1998-02-10 1999-08-24 Mitsubishi Chemical Corp Heat-resistant substrate
KR20040084028A (en) * 2003-03-26 2004-10-06 주식회사 엘지화학 Double-Sided Metallic Laminate and Method for Preparing thereof
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