KR100631098B1 - 리소그래피장치 및 디바이스 제조방법 - Google Patents
리소그래피장치 및 디바이스 제조방법 Download PDFInfo
- Publication number
- KR100631098B1 KR100631098B1 KR1020040016062A KR20040016062A KR100631098B1 KR 100631098 B1 KR100631098 B1 KR 100631098B1 KR 1020040016062 A KR1020040016062 A KR 1020040016062A KR 20040016062 A KR20040016062 A KR 20040016062A KR 100631098 B1 KR100631098 B1 KR 100631098B1
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- Prior art keywords
- coils
- coil
- radiation
- substrate
- coil unit
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Classifications
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M5/00—Devices for bringing media into the body in a subcutaneous, intra-vascular or intramuscular way; Accessories therefor, e.g. filling or cleaning devices, arm-rests
- A61M5/14—Infusion devices, e.g. infusing by gravity; Blood infusion; Accessories therefor
- A61M5/165—Filtering accessories, e.g. blood filters, filters for infusion liquids
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M2205/00—General characteristics of the apparatus
- A61M2205/75—General characteristics of the apparatus with filters
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Biomedical Technology (AREA)
- Anesthesiology (AREA)
- Vascular Medicine (AREA)
- Heart & Thoracic Surgery (AREA)
- Hematology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Linear Motors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (9)
- 리소그래피 투영장치에 있어서,- 방사선의 투영빔을 공급하는 방사선시스템;- 필요한 패턴에 따라 투영빔을 패터닝하는 역할을 하는 패터닝수단을 지지하는 지지구조체;- 기판을 잡아주는 기판테이블;- 상기 기판의 타겟부상으로 상기 패터닝된 빔을 투영시키는 투영시스템;- 상기 지지구조체 및 상기 기판테이블 중의 하나를 이동시키기 위한 리니어모터를 포함하고,상기 리니어모터는 서로 대향하는 제1 및 제2자석판 및 상기 자석판들 사이의 개방코일유닛을 포함하고, 상기 코일유닛은 각자의 강자성코어(ferromagnetic core) 주위를 각각 감고 있는 복수의 코일들을 포함하고, 상기 자석판 및 상기 코일유닛은 상대적으로 이동가능한 것을 특징으로 하는 리소그래피 투영장치.
- 제1항에 있어서,상기 코일블럭은 3개의 코일세트를 포함하고, 각각의 코일세트는 1이상의 코일을 포함하는 것을 특징으로 하는 리소그래피 투영장치.
- 제1항 또는 제2항에 있어서,상기 코일유닛은, 그 위에는 코일이 감겨져 있지 않고 상기 코일들 중의 최외측 코일로부터 이격되어 있는 1이상의 추가적인 강자성부재를 더 포함하는 것을 특징으로 하는 리소그래피 투영장치.
- 제1항 또는 제2항에 있어서,상기 강자성코어들은 그것에 감겨져 있는 코일들의 너머로 돌출하고, 냉각제 도관이 상기 코어들 사이에 제공되어 상기 코일들과 열적으로 접촉하는 것을 특징으로 하는 리소그래피 투영장치.
- 제4항에 있어서,상기 냉각제 도관은 세라믹재료로 형성되는 것을 특징으로 하는 리소그래피 투영장치.
- 제4항에 있어서,상기 코일들은 예를 들어, Cu 또는 Al포일과 같은 포일로 감겨지는 것을 특징으로 하는 리소그래피 투영장치.
- 제1항 또는 제2항에 있어서,상기 자석판들은 Halbach자석으로 이루어지는 것을 특징으로 하는 리소그래피 투영장치.
- 디바이스 제조방법에 있어서,- 부분적 또는 전체적으로 방사선감응재층으로 덮힌 기판을 제공하는 단계;- 방사선시스템을 사용하여 방사선의 투영빔을 제공하는 단계;- 패터닝수단을 사용하여 상기 투영빔의 단면에 패턴을 부여하는 단계;- 상기 방사선감응재층의 타겟부상에 상기 방사선의 패터닝된 빔을 투영하는 단계; 및- 리니어모터를 이용하여 상기 패터닝수단 및 상기 기판 중의 적어도 하나를 변위시키는 단계를 포함하고,- 상기 리니어모터는 서로 대항하는 제1 및 제2자석판 및 상기 자석판들 사이의 개방코일을 포함하고, 상기 코일유닛은 각자의 강자성코어들을 감싸는 복수의 코일을 포함하고, 상기 자석판 및 상기 코일유닛은 상대적으로 이동가능한 것을 특징으로 디바이스 제조방법.
- 제1항 또는 제2항에 있어서,상기 제1 및 제2자석판은 서로 평행하지 않고, 상기 코일유닛의 코일들에 적용되는 정류각(commutation angle)을 변화시키는 수단을 더 포함하는 것을 특징으로 하는 리소그래피 투영장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03251455.6 | 2003-03-11 | ||
EP03251455A EP1457826A1 (en) | 2003-03-11 | 2003-03-11 | Lithographic apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040081333A KR20040081333A (ko) | 2004-09-21 |
KR100631098B1 true KR100631098B1 (ko) | 2006-10-02 |
Family
ID=32748977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040016062A KR100631098B1 (ko) | 2003-03-11 | 2004-03-10 | 리소그래피장치 및 디바이스 제조방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7095485B2 (ko) |
EP (1) | EP1457826A1 (ko) |
JP (1) | JP4030512B2 (ko) |
KR (1) | KR100631098B1 (ko) |
CN (1) | CN100487575C (ko) |
DE (1) | DE602004022480D1 (ko) |
SG (1) | SG145538A1 (ko) |
TW (1) | TWI248645B (ko) |
Families Citing this family (13)
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US7813634B2 (en) | 2005-02-28 | 2010-10-12 | Tessera MEMS Technologies, Inc. | Autofocus camera |
US20060193620A1 (en) * | 2005-02-28 | 2006-08-31 | Darrell Harrington | Lorentz actuator for miniature camera |
US7692768B2 (en) * | 2006-06-29 | 2010-04-06 | Nikon Corporation | Iron core motor driven automatic reticle blind |
DE102007032680A1 (de) | 2007-07-13 | 2009-01-22 | Etel S.A. | Synchronmotor mit mehreren Spulensegmeten |
US20110156501A1 (en) * | 2007-12-11 | 2011-06-30 | Industrial Technology Research Institute | Reciprocating power generating module |
ITMI20081810A1 (it) * | 2008-10-13 | 2010-04-14 | Enrico Massa | Dispositivo di carico elettromagnetico per un'apparecchiatura per l'esercizio fisico, e apparecchiatura provvista di tale dispositivo |
JP5426180B2 (ja) * | 2009-01-20 | 2014-02-26 | 富士機械製造株式会社 | リニアモータ |
WO2010115657A1 (en) * | 2009-04-06 | 2010-10-14 | Asml Holding N.V. | Shared compliance in a rapid exchange device for reticles, and reticle stage |
NL2004847A (en) * | 2009-06-30 | 2011-01-04 | Asml Holding Nv | Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus. |
EP2882082A4 (en) | 2012-07-31 | 2015-12-09 | Shanghai Microelectronics Equi | LINEAR MOTOR AND PLATFORM DEVICE |
EP2994408A4 (en) * | 2013-05-06 | 2017-01-25 | Otis Elevator Company | Linear motor stator core for self-propelled elevator |
US9173035B2 (en) | 2013-11-07 | 2015-10-27 | Harman International Industries, Incorporated | Dual coil moving magnet transducer |
JP6552649B2 (ja) | 2015-07-09 | 2019-07-31 | エーエスエムエル ネザーランズ ビー.ブイ. | 可動サポート及びリソグラフィ装置 |
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JPH11307430A (ja) * | 1998-04-23 | 1999-11-05 | Canon Inc | 露光装置およびデバイス製造方法ならびに駆動装置 |
EP1124160A2 (en) * | 2000-02-10 | 2001-08-16 | Asm Lithography B.V. | Cooling of oscillating linear motors in lithographic projection apparatus |
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2003
- 2003-03-11 EP EP03251455A patent/EP1457826A1/en not_active Withdrawn
-
2004
- 2004-02-26 DE DE602004022480T patent/DE602004022480D1/de not_active Expired - Lifetime
- 2004-03-09 TW TW093106261A patent/TWI248645B/zh not_active IP Right Cessation
- 2004-03-09 SG SG200401155-7A patent/SG145538A1/en unknown
- 2004-03-10 JP JP2004066538A patent/JP4030512B2/ja not_active Expired - Fee Related
- 2004-03-10 KR KR1020040016062A patent/KR100631098B1/ko active IP Right Grant
- 2004-03-10 CN CNB2004100080816A patent/CN100487575C/zh not_active Expired - Lifetime
- 2004-03-11 US US10/797,662 patent/US7095485B2/en not_active Expired - Lifetime
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US4535278A (en) * | 1982-04-05 | 1985-08-13 | Telmec Co., Ltd. | Two-dimensional precise positioning device for use in a semiconductor manufacturing apparatus |
JP3555183B2 (ja) * | 1994-07-05 | 2004-08-18 | 株式会社ニコン | ステージ装置及び露光装置 |
JPH09154272A (ja) * | 1995-11-28 | 1997-06-10 | Nippon Seiko Kk | リニアモータの冷却構造 |
JPH11307430A (ja) * | 1998-04-23 | 1999-11-05 | Canon Inc | 露光装置およびデバイス製造方法ならびに駆動装置 |
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EP1124160A2 (en) * | 2000-02-10 | 2001-08-16 | Asm Lithography B.V. | Cooling of oscillating linear motors in lithographic projection apparatus |
JP2002272087A (ja) * | 2001-03-15 | 2002-09-20 | Nikon Corp | 電機子ユニット、モータ、ステージ装置、露光装置、および、デバイスの製造方法 |
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Also Published As
Publication number | Publication date |
---|---|
CN1530750A (zh) | 2004-09-22 |
DE602004022480D1 (de) | 2009-09-24 |
JP2004343062A (ja) | 2004-12-02 |
KR20040081333A (ko) | 2004-09-21 |
CN100487575C (zh) | 2009-05-13 |
SG145538A1 (en) | 2008-09-29 |
EP1457826A1 (en) | 2004-09-15 |
JP4030512B2 (ja) | 2008-01-09 |
TWI248645B (en) | 2006-02-01 |
US7095485B2 (en) | 2006-08-22 |
US20040246458A1 (en) | 2004-12-09 |
TW200504873A (en) | 2005-02-01 |
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