KR100574414B1 - 주파수 선택형 가변출력 인덕터 히터 시스템 및 방법 - Google Patents

주파수 선택형 가변출력 인덕터 히터 시스템 및 방법 Download PDF

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KR100574414B1
KR100574414B1 KR1020007000258A KR20007000258A KR100574414B1 KR 100574414 B1 KR100574414 B1 KR 100574414B1 KR 1020007000258 A KR1020007000258 A KR 1020007000258A KR 20007000258 A KR20007000258 A KR 20007000258A KR 100574414 B1 KR100574414 B1 KR 100574414B1
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South Korea
Prior art keywords
induction heating
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frequency
circuit
heating system
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Expired - Fee Related
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KR1020007000258A
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English (en)
Korean (ko)
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KR20010021699A (ko
Inventor
스카츠더글라스에스.
도렌베이커존엠.
Original Assignee
어드밴스드 에너지 인더스트리즈 인코포레이티드
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Publication of KR20010021699A publication Critical patent/KR20010021699A/ko
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/02—Induction heating
    • H05B6/36—Coil arrangements
    • H05B6/44—Coil arrangements having more than one coil or coil segment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/02—Induction heating
    • H05B6/06—Control, e.g. of temperature, of power

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Induction Heating (AREA)
KR1020007000258A 1997-07-09 1998-07-08 주파수 선택형 가변출력 인덕터 히터 시스템 및 방법 Expired - Fee Related KR100574414B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5202997P 1997-07-09 1997-07-09
US60/052,029 1997-07-09
PCT/US1998/014125 WO1999003308A1 (en) 1997-07-09 1998-07-08 Frequency selected, variable output inductor heater system and method

Publications (2)

Publication Number Publication Date
KR20010021699A KR20010021699A (ko) 2001-03-15
KR100574414B1 true KR100574414B1 (ko) 2006-04-27

Family

ID=21974964

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007000258A Expired - Fee Related KR100574414B1 (ko) 1997-07-09 1998-07-08 주파수 선택형 가변출력 인덕터 히터 시스템 및 방법

Country Status (5)

Country Link
US (1) US6316754B1 (https=)
EP (1) EP0995340A1 (https=)
JP (1) JP2001509634A (https=)
KR (1) KR100574414B1 (https=)
WO (1) WO1999003308A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017023008A1 (ko) * 2015-08-04 2017-02-09 삼성전자주식회사 유도 가열 장치 및 그 제어 방법

Families Citing this family (29)

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GB2340681B (en) * 1998-08-14 2003-07-30 Mars Inc Oscillators
US7212414B2 (en) 1999-06-21 2007-05-01 Access Business Group International, Llc Adaptive inductive power supply
ATE349879T1 (de) 1999-11-03 2007-01-15 Nexicor Llc Induktionshandgerät
JP3839228B2 (ja) 2000-07-31 2006-11-01 株式会社神戸製鋼所 生タイヤ予熱方法およびその装置
EP1194010A2 (de) * 2000-09-29 2002-04-03 BSH Balay, S.A. Umrichterschaltung und Verfahren zum Betrieb einer solchen
WO2003003399A1 (en) * 2001-06-27 2003-01-09 Koninklijke Philips Electronics N.V. Method and device for evaporating a getter material in a vacuum tube
JP2003017237A (ja) * 2001-06-28 2003-01-17 Harison Toshiba Lighting Corp 誘導加熱ローラ装置、定着装置および画像形成装置
JP2004013016A (ja) * 2002-06-10 2004-01-15 Toshiba Tec Corp 定着装置および画像形成装置
JP3834540B2 (ja) 2002-10-10 2006-10-18 株式会社神戸製鋼所 生タイヤ予熱方法およびその装置
JP4422422B2 (ja) * 2003-03-25 2010-02-24 東芝テック株式会社 定着装置
WO2005008876A2 (en) * 2003-07-09 2005-01-27 Board Of Regents, The University Of Texas System Methods and systems for simultaneous multiple frequency voltage generation
GB0324831D0 (en) * 2003-10-24 2003-11-26 British Nuclear Fuels Plc Induction heating
US6875966B1 (en) 2004-03-15 2005-04-05 Nexicor Llc Portable induction heating tool for soldering pipes
AU2007205141A1 (en) * 2006-01-09 2007-07-19 Inductotherm Corp. Induction heating apparatus for strip materials with variable parameters
JP5202839B2 (ja) * 2006-12-25 2013-06-05 東京エレクトロン株式会社 成膜装置および成膜方法
US8884201B2 (en) * 2008-09-15 2014-11-11 The Boeing Company Systems and methods for fabrication of thermoplastic components
JP5350747B2 (ja) 2008-10-23 2013-11-27 東京エレクトロン株式会社 熱処理装置
DE102009048490A1 (de) * 2009-09-24 2011-04-07 E.G.O. Elektro-Gerätebau GmbH Verfahren zum Einstellen einer Heizleistungsabgabe einer Induktionsheizeinrichtung sowie zugehörige Induktionsheizeinrichtung
US9089007B2 (en) * 2012-04-27 2015-07-21 Applied Materials, Inc. Method and apparatus for substrate support with multi-zone heating
CN104372309B (zh) * 2013-08-12 2018-09-14 北京北方华创微电子装备有限公司 加热装置、反应腔室及等离子体加工设备
US9789421B2 (en) 2014-06-11 2017-10-17 Corner Star Limited Induction heater system for a fluidized bed reactor
GB201511361D0 (en) 2015-06-29 2015-08-12 Nicoventures Holdings Ltd Electronic vapour provision system
GB201511358D0 (en) * 2015-06-29 2015-08-12 Nicoventures Holdings Ltd Electronic aerosol provision systems
GB201511349D0 (en) 2015-06-29 2015-08-12 Nicoventures Holdings Ltd Electronic aerosol provision systems
GB201511359D0 (en) 2015-06-29 2015-08-12 Nicoventures Holdings Ltd Electronic vapour provision system
DE102016119328A1 (de) 2016-10-11 2018-04-12 Osram Opto Semiconductors Gmbh Heizvorrichtung, Verfahren und System zur Herstellung von Halbleiterchips im Waferverbund
CN106947954B (zh) * 2017-04-27 2019-06-18 京东方科技集团股份有限公司 一种气相沉积设备及薄膜的制备方法
CN117224017B (zh) * 2022-06-08 2025-10-10 上海爱餐机器人(集团)有限公司 智能炒菜机中为炒锅提供热能的加热装置
CN120896457B (zh) * 2025-09-30 2025-12-26 湖南大学 一种多频感应加热电源及其控制方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4755648A (en) * 1985-12-12 1988-07-05 Fuji Electric Co., Ltd. Cyclical, multiple frequency high-frequency induction heating apparatus

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US2669647A (en) * 1952-06-13 1954-02-16 Gen Engineering Company Canada Dual frequency induction heating apparatus
US4093839A (en) 1976-04-02 1978-06-06 Ajax Magnethermic Corporation Apparatus and method for inductively heating metallic tubing having an upset portion
US4506131A (en) 1983-08-29 1985-03-19 Inductotherm Industries Inc. Multiple zone induction coil power control apparatus and method
GB8505811D0 (en) 1985-03-06 1985-04-11 Bekaert Sa Nv Induction heating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4755648A (en) * 1985-12-12 1988-07-05 Fuji Electric Co., Ltd. Cyclical, multiple frequency high-frequency induction heating apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017023008A1 (ko) * 2015-08-04 2017-02-09 삼성전자주식회사 유도 가열 장치 및 그 제어 방법
KR20170016608A (ko) * 2015-08-04 2017-02-14 삼성전자주식회사 유도 가열 장치 및 그 제어 방법
US11249119B2 (en) 2015-08-04 2022-02-15 Samsung Electronics Co., Ltd. Induction heating apparatus and controlling method thereof
KR102368372B1 (ko) * 2015-08-04 2022-02-28 삼성전자주식회사 유도 가열 장치 및 그 제어 방법

Also Published As

Publication number Publication date
JP2001509634A (ja) 2001-07-24
US6316754B1 (en) 2001-11-13
EP0995340A1 (en) 2000-04-26
KR20010021699A (ko) 2001-03-15
WO1999003308A1 (en) 1999-01-21

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