JP2001509634A - 周波数選択型可変出力誘導ヒータシステムおよび方法 - Google Patents

周波数選択型可変出力誘導ヒータシステムおよび方法

Info

Publication number
JP2001509634A
JP2001509634A JP2000501636A JP2000501636A JP2001509634A JP 2001509634 A JP2001509634 A JP 2001509634A JP 2000501636 A JP2000501636 A JP 2000501636A JP 2000501636 A JP2000501636 A JP 2000501636A JP 2001509634 A JP2001509634 A JP 2001509634A
Authority
JP
Japan
Prior art keywords
induction heating
zones
frequency
circuit
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000501636A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001509634A5 (https=
Inventor
ダグラス エス． シャッツ，
ジョン エム． ドレンベイチャー，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Industries Inc
Original Assignee
Advanced Energy Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Industries Inc filed Critical Advanced Energy Industries Inc
Publication of JP2001509634A publication Critical patent/JP2001509634A/ja
Publication of JP2001509634A5 publication Critical patent/JP2001509634A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/02—Induction heating
    • H05B6/36—Coil arrangements
    • H05B6/44—Coil arrangements having more than one coil or coil segment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/02—Induction heating
    • H05B6/06—Control, e.g. of temperature, of power

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Induction Heating (AREA)
JP2000501636A 1997-07-09 1998-07-08 周波数選択型可変出力誘導ヒータシステムおよび方法 Pending JP2001509634A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5202997P 1997-07-09 1997-07-09
US60/052,029 1997-07-09
PCT/US1998/014125 WO1999003308A1 (en) 1997-07-09 1998-07-08 Frequency selected, variable output inductor heater system and method

Publications (2)

Publication Number Publication Date
JP2001509634A true JP2001509634A (ja) 2001-07-24
JP2001509634A5 JP2001509634A5 (https=) 2006-01-05

Family

ID=21974964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000501636A Pending JP2001509634A (ja) 1997-07-09 1998-07-08 周波数選択型可変出力誘導ヒータシステムおよび方法

Country Status (5)

Country Link
US (1) US6316754B1 (https=)
EP (1) EP0995340A1 (https=)
JP (1) JP2001509634A (https=)
KR (1) KR100574414B1 (https=)
WO (1) WO1999003308A1 (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010047155A1 (ja) * 2008-10-23 2010-04-29 東京エレクトロン株式会社 熱処理装置
KR20150013637A (ko) * 2012-04-27 2015-02-05 어플라이드 머티어리얼스, 인코포레이티드 다-구역 가열을 갖는 기판 지지부를 위한 방법 및 장치
JP2018524983A (ja) * 2015-06-29 2018-09-06 ニコベンチャーズ ホールディングス リミテッド 電子エアロゾル供給システム
US11185110B2 (en) 2015-06-29 2021-11-30 Nicoventures Trading Limited Electronic vapor provision system
US11896055B2 (en) 2015-06-29 2024-02-13 Nicoventures Trading Limited Electronic aerosol provision systems
US12070070B2 (en) 2015-06-29 2024-08-27 Nicoventures Trading Limited Electronic vapor provision system

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2340681B (en) * 1998-08-14 2003-07-30 Mars Inc Oscillators
US7212414B2 (en) 1999-06-21 2007-05-01 Access Business Group International, Llc Adaptive inductive power supply
ATE349879T1 (de) 1999-11-03 2007-01-15 Nexicor Llc Induktionshandgerät
JP3839228B2 (ja) 2000-07-31 2006-11-01 株式会社神戸製鋼所 生タイヤ予熱方法およびその装置
EP1194010A2 (de) * 2000-09-29 2002-04-03 BSH Balay, S.A. Umrichterschaltung und Verfahren zum Betrieb einer solchen
WO2003003399A1 (en) * 2001-06-27 2003-01-09 Koninklijke Philips Electronics N.V. Method and device for evaporating a getter material in a vacuum tube
JP2003017237A (ja) * 2001-06-28 2003-01-17 Harison Toshiba Lighting Corp 誘導加熱ローラ装置、定着装置および画像形成装置
JP2004013016A (ja) * 2002-06-10 2004-01-15 Toshiba Tec Corp 定着装置および画像形成装置
JP3834540B2 (ja) 2002-10-10 2006-10-18 株式会社神戸製鋼所 生タイヤ予熱方法およびその装置
JP4422422B2 (ja) * 2003-03-25 2010-02-24 東芝テック株式会社 定着装置
WO2005008876A2 (en) * 2003-07-09 2005-01-27 Board Of Regents, The University Of Texas System Methods and systems for simultaneous multiple frequency voltage generation
GB0324831D0 (en) * 2003-10-24 2003-11-26 British Nuclear Fuels Plc Induction heating
US6875966B1 (en) 2004-03-15 2005-04-05 Nexicor Llc Portable induction heating tool for soldering pipes
AU2007205141A1 (en) * 2006-01-09 2007-07-19 Inductotherm Corp. Induction heating apparatus for strip materials with variable parameters
JP5202839B2 (ja) * 2006-12-25 2013-06-05 東京エレクトロン株式会社 成膜装置および成膜方法
US8884201B2 (en) * 2008-09-15 2014-11-11 The Boeing Company Systems and methods for fabrication of thermoplastic components
DE102009048490A1 (de) * 2009-09-24 2011-04-07 E.G.O. Elektro-Gerätebau GmbH Verfahren zum Einstellen einer Heizleistungsabgabe einer Induktionsheizeinrichtung sowie zugehörige Induktionsheizeinrichtung
CN104372309B (zh) * 2013-08-12 2018-09-14 北京北方华创微电子装备有限公司 加热装置、反应腔室及等离子体加工设备
US9789421B2 (en) 2014-06-11 2017-10-17 Corner Star Limited Induction heater system for a fluidized bed reactor
KR102368372B1 (ko) * 2015-08-04 2022-02-28 삼성전자주식회사 유도 가열 장치 및 그 제어 방법
DE102016119328A1 (de) 2016-10-11 2018-04-12 Osram Opto Semiconductors Gmbh Heizvorrichtung, Verfahren und System zur Herstellung von Halbleiterchips im Waferverbund
CN106947954B (zh) * 2017-04-27 2019-06-18 京东方科技集团股份有限公司 一种气相沉积设备及薄膜的制备方法
CN117224017B (zh) * 2022-06-08 2025-10-10 上海爱餐机器人(集团)有限公司 智能炒菜机中为炒锅提供热能的加热装置
CN120896457B (zh) * 2025-09-30 2025-12-26 湖南大学 一种多频感应加热电源及其控制方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2669647A (en) * 1952-06-13 1954-02-16 Gen Engineering Company Canada Dual frequency induction heating apparatus
US4093839A (en) 1976-04-02 1978-06-06 Ajax Magnethermic Corporation Apparatus and method for inductively heating metallic tubing having an upset portion
US4506131A (en) 1983-08-29 1985-03-19 Inductotherm Industries Inc. Multiple zone induction coil power control apparatus and method
GB8505811D0 (en) 1985-03-06 1985-04-11 Bekaert Sa Nv Induction heating
JP2530812B2 (ja) 1985-12-12 1996-09-04 富士電機株式会社 高周波誘導加熱装置

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010103280A (ja) * 2008-10-23 2010-05-06 Tokyo Electron Ltd 熱処理装置
KR101102740B1 (ko) 2008-10-23 2012-01-05 도쿄엘렉트론가부시키가이샤 열 처리 장치
US8658951B2 (en) 2008-10-23 2014-02-25 Tokyo Electron Limited Heat treatment apparatus
WO2010047155A1 (ja) * 2008-10-23 2010-04-29 東京エレクトロン株式会社 熱処理装置
KR102113454B1 (ko) * 2012-04-27 2020-05-21 어플라이드 머티어리얼스, 인코포레이티드 다-구역 가열을 갖는 기판 지지부를 위한 방법 및 장치
KR20150013637A (ko) * 2012-04-27 2015-02-05 어플라이드 머티어리얼스, 인코포레이티드 다-구역 가열을 갖는 기판 지지부를 위한 방법 및 장치
JP2015521371A (ja) * 2012-04-27 2015-07-27 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ マルチゾーン加熱を有する基板支持体のための方法および装置
US11033055B2 (en) 2015-06-29 2021-06-15 Nicoventures Trading Limited Electronic aerosol provision systems, inductive heating assemblies and cartridges for use therewith, and related methods
JP2018524983A (ja) * 2015-06-29 2018-09-06 ニコベンチャーズ ホールディングス リミテッド 電子エアロゾル供給システム
US11185110B2 (en) 2015-06-29 2021-11-30 Nicoventures Trading Limited Electronic vapor provision system
US11882877B2 (en) 2015-06-29 2024-01-30 Nicoventures Trading Limited Electronic vapor provision system
US11896055B2 (en) 2015-06-29 2024-02-13 Nicoventures Trading Limited Electronic aerosol provision systems
US12070070B2 (en) 2015-06-29 2024-08-27 Nicoventures Trading Limited Electronic vapor provision system
US12232533B2 (en) 2015-06-29 2025-02-25 Nicoventures Trading Limited Inductive heating assemblies for generating an aerosol
US12402657B2 (en) 2015-06-29 2025-09-02 Nicoventures Trading Limited Electrical vapor provision system without wired electrical connection between a control unit and a cartridge
US12557846B2 (en) 2015-06-29 2026-02-24 Nicoventures Trading Limited Electronic vapour provision system

Also Published As

Publication number Publication date
US6316754B1 (en) 2001-11-13
KR100574414B1 (ko) 2006-04-27
EP0995340A1 (en) 2000-04-26
KR20010021699A (ko) 2001-03-15
WO1999003308A1 (en) 1999-01-21

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