KR100538389B1 - 화학 반응기용 형광 표지의 검출용 감광 다이오드 - Google Patents
화학 반응기용 형광 표지의 검출용 감광 다이오드 Download PDFInfo
- Publication number
- KR100538389B1 KR100538389B1 KR10-2002-0019065A KR20020019065A KR100538389B1 KR 100538389 B1 KR100538389 B1 KR 100538389B1 KR 20020019065 A KR20020019065 A KR 20020019065A KR 100538389 B1 KR100538389 B1 KR 100538389B1
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor substrate
- layer
- connection
- metal layer
- substrate
- Prior art date
Links
- 238000005842 biochemical reaction Methods 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 claims abstract description 31
- 239000002184 metal Substances 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000012535 impurity Substances 0.000 claims abstract description 25
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- 239000007850 fluorescent dye Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 238000000034 method Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 102000004190 Enzymes Human genes 0.000 description 2
- 108090000790 Enzymes Proteins 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 244000005700 microbiome Species 0.000 description 2
- 102000004169 proteins and genes Human genes 0.000 description 2
- 108090000623 proteins and genes Proteins 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910020776 SixNy Inorganic materials 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
Abstract
Description
Claims (3)
- 요홈 형상의 웰이 형성된 반도체 기판과 ;상기 반도체 기판의 각각의 웰 바닥에 도핑된 불순물층들과 ;상기 불순물이 도핑된 기판에 증착되고 접속홀들이 형성된 절연막과 ;상기 절연막에 형성된 접속홀들을 관통하여 반도체 기판과 반도체 불순물들에 각각 접속되고 불순물이 도핑된 부분에는 윈도우가 형성된 접속 금속층 또는 투명전극층으로 구성되는 다이오드셀이 하나 이상 접속되어 구성되되, 각 다이오드셀의 전부 또는 일부는 상호 병렬도 접속됨을 특징으로 하는 화학 반응기용 형광 표지의 검출용 감광 다이오드.
- 반도체 기판에 다수의 웰을 형성하는 단계(S1)와 ;형성된 웰의 바닥면에 불순불을 도핑하는 단계(S2)와 ;불순물이 도핑된 기판의 전면에 절연막을 증착시키는 단계(S3)와 ;증착된 절연막에 접속홀을 에칭하는 단계(S4)와 ;접속홀에 스며들도록 금속층 또는 투명전극층을 증착시키는 단계(S5) 및 ;증착된 금속층을 에칭하여 윈도우 및 연결선을 형성하는 단계(S6)로 이루어짐을 특징으로 하는 화학 반응기용 형광 표지의 검출용 감광 다이오드 제조 방법.
- 제 1 항에 있어서, 상기 반도체 기판은 실리콘 기판임을 특징으로 하는 화학 반응기용 형광 표지의 검출용 감광 다이오드.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0019065A KR100538389B1 (ko) | 2002-04-08 | 2002-04-08 | 화학 반응기용 형광 표지의 검출용 감광 다이오드 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0019065A KR100538389B1 (ko) | 2002-04-08 | 2002-04-08 | 화학 반응기용 형광 표지의 검출용 감광 다이오드 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030080453A KR20030080453A (ko) | 2003-10-17 |
KR100538389B1 true KR100538389B1 (ko) | 2005-12-22 |
Family
ID=32378193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0019065A KR100538389B1 (ko) | 2002-04-08 | 2002-04-08 | 화학 반응기용 형광 표지의 검출용 감광 다이오드 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100538389B1 (ko) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05317030A (ja) * | 1992-05-21 | 1993-12-03 | Hitachi Ltd | マイクロチャンバを用いた生化学反応装置 |
US5466348A (en) * | 1991-10-21 | 1995-11-14 | Holm-Kennedy; James W. | Methods and devices for enhanced biochemical sensing |
JPH10197526A (ja) * | 1997-01-09 | 1998-07-31 | Nec Corp | 生化学分析装置及びこれに用いる試験片並びに生化学分 析方法 |
JP2002350348A (ja) * | 2001-05-22 | 2002-12-04 | Matsushita Electric Ind Co Ltd | 蛍光検出装置 |
-
2002
- 2002-04-08 KR KR10-2002-0019065A patent/KR100538389B1/ko not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5466348A (en) * | 1991-10-21 | 1995-11-14 | Holm-Kennedy; James W. | Methods and devices for enhanced biochemical sensing |
JPH05317030A (ja) * | 1992-05-21 | 1993-12-03 | Hitachi Ltd | マイクロチャンバを用いた生化学反応装置 |
JPH10197526A (ja) * | 1997-01-09 | 1998-07-31 | Nec Corp | 生化学分析装置及びこれに用いる試験片並びに生化学分 析方法 |
JP2002350348A (ja) * | 2001-05-22 | 2002-12-04 | Matsushita Electric Ind Co Ltd | 蛍光検出装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20030080453A (ko) | 2003-10-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102410801B1 (ko) | 마이크로 발광소자 및 그 제조방법 | |
US20060105449A1 (en) | Biochip having an electode array on a substrate | |
EP2339632B1 (en) | Image sensor and method of manufacturing the same, and sensor device | |
US5068205A (en) | Header mounted chemically sensitive ISFET and method of manufacture | |
TWI399850B (zh) | 生化感測裝置及其製造方法 | |
US6203985B1 (en) | Bio-molecule analyzer with photosensitive material and fabrication | |
EP4362100A2 (en) | Biosensor with improved light collection efficiency | |
US20220189834A1 (en) | Method for testing semiconductor elements | |
US7718130B1 (en) | Integrated thin-film sensors and methods | |
US5629533A (en) | Optical sensor and method | |
WO2018205602A1 (zh) | 芯片基板及其制作方法、基因测序芯片及基因测序方法 | |
KR100538389B1 (ko) | 화학 반응기용 형광 표지의 검출용 감광 다이오드 | |
TWI730472B (zh) | 使用雷射切割道絕緣之全彩led顯示面板及其製造方法 | |
CN110416103B (zh) | 一种残胶标准片及其制备方法 | |
US7316930B1 (en) | Use of vertically stacked photodiodes in a gene chip system | |
US7547381B2 (en) | Sensor array integrated electrochemical chip, method of forming same, and electrode coating | |
CN110318099B (zh) | Cis基因芯片及其制作方法 | |
US20110194104A1 (en) | Device and method for optical parallel analysis of a sample arrangement and corresponding manufacturing method | |
EP4303568A1 (en) | Bio-chip, bio-detection system and bio-detection method | |
US20250002975A1 (en) | Device for detecting fluorescence with nanophotodetectors | |
TWI751893B (zh) | 影像感測裝置 | |
EP4089748A1 (en) | Optical substrate and manufacturing method thereof | |
EP4124853A1 (en) | Biosensor apparatus | |
WO2023208208A9 (zh) | 基于晶圆级封装的多模式传感器及其制造方法 | |
EP4334978A1 (en) | Inter-pixel substrate isolation |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20020408 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20040503 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20020408 Comment text: Patent Application |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20051207 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20051216 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20051216 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20081118 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20091215 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20101116 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20111116 Start annual number: 7 End annual number: 7 |
|
FPAY | Annual fee payment |
Payment date: 20121204 Year of fee payment: 8 |
|
PR1001 | Payment of annual fee |
Payment date: 20121204 Start annual number: 8 End annual number: 8 |
|
FPAY | Annual fee payment |
Payment date: 20131217 Year of fee payment: 9 |
|
PR1001 | Payment of annual fee |
Payment date: 20131217 Start annual number: 9 End annual number: 9 |
|
LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |
Termination category: Default of registration fee Termination date: 20151109 |