WO2018205602A1 - 芯片基板及其制作方法、基因测序芯片及基因测序方法 - Google Patents

芯片基板及其制作方法、基因测序芯片及基因测序方法 Download PDF

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WO2018205602A1
WO2018205602A1 PCT/CN2017/116049 CN2017116049W WO2018205602A1 WO 2018205602 A1 WO2018205602 A1 WO 2018205602A1 CN 2017116049 W CN2017116049 W CN 2017116049W WO 2018205602 A1 WO2018205602 A1 WO 2018205602A1
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substrate
electrode
dielectric layer
chip
capacitor dielectric
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PCT/CN2017/116049
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English (en)
French (fr)
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耿越
庞凤春
蔡佩芝
古乐
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京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Priority to US16/070,396 priority Critical patent/US10801984B2/en
Publication of WO2018205602A1 publication Critical patent/WO2018205602A1/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/221—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance by investigating the dielectric properties
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
    • C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
    • C12Q1/68—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
    • C12Q1/6813—Hybridisation assays
    • C12Q1/6816—Hybridisation assays characterised by the detection means
    • C12Q1/6825—Nucleic acid detection involving sensors
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
    • C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
    • C12Q1/68—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
    • C12Q1/6869—Methods for sequencing
    • C12Q1/6874—Methods for sequencing involving nucleic acid arrays, e.g. sequencing by hybridisation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/1031—Investigating individual particles by measuring electrical or magnetic effects thereof, e.g. conductivity or capacity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/223—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance for determining moisture content, e.g. humidity
    • G01N27/225—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance for determining moisture content, e.g. humidity by using hygroscopic materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/226—Construction of measuring vessels; Electrodes therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/227—Sensors changing capacitance upon adsorption or absorption of fluid components, e.g. electrolyte-insulator-semiconductor sensors, MOS capacitors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/28—Electrolytic cell components
    • G01N27/30—Electrodes, e.g. test electrodes; Half-cells
    • G01N27/327—Biochemical electrodes, e.g. electrical or mechanical details for in vitro measurements
    • G01N27/3275—Sensing specific biomolecules, e.g. nucleic acid strands, based on an electrode surface reaction
    • G01N27/3276—Sensing specific biomolecules, e.g. nucleic acid strands, based on an electrode surface reaction being a hybridisation with immobilised receptors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/72—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating magnetic variables
    • G01N27/74—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating magnetic variables of fluids
    • G01N27/745—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating magnetic variables of fluids for detecting magnetic beads used in biochemical assays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/483—Physical analysis of biological material
    • G01N33/487—Physical analysis of biological material of liquid biological material
    • G01N33/48707—Physical analysis of biological material of liquid biological material by electrical means
    • G01N33/48721—Investigating individual macromolecules, e.g. by translocation through nanopores

Definitions

  • Embodiments of the present disclosure relate to a chip substrate, a method for fabricating the same, a gene sequencing chip, and a gene sequencing method.
  • Gene sequencing technology is the most commonly used technology in modern molecular biology research. Since the development of the first generation of gene sequencing in 1977, gene sequencing technology has made considerable progress, including the first generation of sanger sequencing technology, the second generation of Qualcomm Sequencing technology, third-generation single-molecule sequencing technology and fourth-generation nanopore sequencing technology.
  • At least one embodiment of the present disclosure provides a chip substrate including: a substrate substrate; a first electrode disposed on the substrate; an insulating layer disposed between two adjacent first electrodes a gap, and partially covering the two adjacent first electrodes to form an accommodating space corresponding to the first electrode; a capacitor dielectric layer disposed at the first electrode away from the lining One side of the base substrate and located in the accommodating space; and a second electrode on a side of the capacitor dielectric layer away from the base substrate, the capacitor dielectric layer including the first area and the second area
  • An orthographic projection of the second electrode on the substrate substrate overlaps with an orthographic projection of the first region on the substrate, the second region being configured to perform a detection reaction.
  • a chip substrate further includes: a test point on a side of the capacitor dielectric layer away from the base substrate, the insulating layer includes a lead hole, and the test point passes through the lead The hole is electrically connected to the first electrode.
  • a chip substrate further includes: a magnetic bead disposed on a side of the capacitor dielectric layer away from the substrate substrate, and located in the second region, the magnetic bead and the magnetic bead Capacitor The electrical layer contacts and is configured to receive a sample containing DNA.
  • the capacitive dielectric layer comprises a PH-sensitive hydrogel material.
  • a chip substrate according to an embodiment of the present disclosure further includes: a protective layer disposed between the second electrode and the capacitor dielectric layer, and an orthographic projection of the protective layer on the substrate substrate An orthographic projection of the insulating layer and the second electrode on the base substrate overlaps.
  • the protective layer includes a polymer material having flexibility.
  • At least one embodiment of the present disclosure also provides a gene sequencing chip comprising: a counter substrate provided to the cartridge and the chip substrate according to any one of the above.
  • a sampling port and a sampling port are disposed on the opposite substrate.
  • a flow channel sidewall layer surrounding an edge of the gene sequencing chip is disposed between the opposite substrate and the chip substrate;
  • a flow path for storing a sequencing reagent is formed together with the opposite substrate and the second electrode.
  • the flow channel sidewall layer is made of any one of silicon oxide, silicon nitride, and polymer material.
  • the opposite substrate is made of any one of glass, silicon, and polymer materials.
  • At least one embodiment of the present disclosure further provides a method of fabricating a chip substrate, comprising: forming an array of first electrodes on a substrate; forming an insulating layer on a side of the first electrode away from the substrate The insulating layer is disposed in a gap between two adjacent first electrodes, and partially covers the adjacent two of the first electrodes to form a one-to-one correspondence with the first electrodes a space is formed; a capacitive dielectric layer is formed on a side of the first electrode away from the base substrate, the capacitive dielectric layer is located in the accommodating space; and the capacitive dielectric layer is away from the substrate Forming a second electrode on one side of the substrate, the capacitive dielectric layer including a first region and a second region, an orthographic projection of the second electrode on the substrate substrate and the first region on the substrate The orthographic projections on the substrate overlap, and the second region is configured to perform a detection reaction.
  • the method for fabricating a chip substrate according to an embodiment of the present disclosure further includes: forming a lead hole in the insulating layer, the lead hole exposing a portion of the first electrode; and moving the capacitive dielectric layer away from the lining One side of the base substrate forms a test point, and the test point passes through the lead hole and the first electrode Electrically connected.
  • the method for fabricating a chip substrate according to an embodiment of the present disclosure further includes: providing a magnetic bead on a side of the capacitor dielectric layer away from the substrate substrate, wherein the magnetic bead is located in the second region, A magnetic bead is in contact with the capacitive dielectric layer and is configured to receive a sample containing DNA.
  • the manufacturing method further includes: A layer and a side of the capacitor dielectric layer away from the substrate substrate form a protective layer.
  • the insulating layer forms a lead hole
  • the lead hole exposing portion of the first electrode includes: forming in the protective layer and the insulating layer The protective layer and the insulating layer are sequentially penetrated and a portion of the lead holes of the first electrode are exposed.
  • An embodiment of the present disclosure provides a method for sequencing a gene of a chip substrate according to any one of the preceding claims, comprising: acquiring a first spacing between the second electrode and the first electrode and the capacitor a first dielectric constant of the dielectric layer; obtaining the corresponding first capacitance of the second electrode and the first electrode according to the first pitch and the first dielectric constant; The second region performs a genetic detection reaction, and acquires a second spacing between the second electrode and the first electrode and a second dielectric constant of the capacitive dielectric layer; according to the second spacing and the second Obtaining a second capacitance value of the correspondingly disposed second electrode and the first electrode; and obtaining a corresponding setting by using a difference between the second capacitance value and the first capacitance value The sequence of the gene fragment corresponding to the second electrode and the first electrode.
  • FIG. 1 is a schematic structural view of a chip substrate according to Embodiment 1 of the present disclosure.
  • FIG. 2 is a top plan view of a prepared chip substrate according to Embodiment 1 of the present disclosure
  • FIG. 3 is a schematic structural diagram of a gene sequencing chip according to Embodiment 2 of the present disclosure.
  • FIG. 4 is a schematic structural view of a cross section of a gene sequencing chip according to Embodiment 2 of the present disclosure
  • FIG. 5 is a flow chart of a method for fabricating a chip substrate according to Embodiment 3 of the present disclosure
  • 5a is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5b is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5c is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5d is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5e is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5f is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • FIG. 5g is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5h is a schematic structural view of a chip substrate in the third embodiment of the present disclosure.
  • 5i is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5j is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • 5k is a schematic structural view of a chip substrate in a third embodiment of the present disclosure.
  • FIG. 6 is a flow chart showing the steps of a gene sequencing method according to Embodiment 4 of the present disclosure.
  • the usual gene sequencing methods usually use fluorescence detection methods, and major sequencing companies such as Illumina, Roche 454, and ABI are all genetically sequenced by fluorescence detection methods.
  • the fluorescence detection method is performed by modifying different bases with different fluorophores, and then When the gene fragments are paired, the fluorophore is released, and by detecting the fluorescent color through the optical system, the base species can be determined, and finally the sequence of the gene fragment to be tested is obtained.
  • the above-mentioned gene sequencing method has the advantages of intuitive detection results and high sequencing accuracy.
  • the above-mentioned gene sequencing method requires fluorescent labeling of four bases in different colors, and in the sequencing process, thousands of base pairings are required, which requires a large amount of test reagents, resulting in a substantial increase in the cost of the test reagent. It is not conducive to the popularization and promotion of gene sequencing in medicine and other fields.
  • Embodiments of the present disclosure provide a chip substrate, a method for fabricating the same, a gene sequencing chip, and a gene sequencing method.
  • the chip substrate includes: a substrate; an array of first electrodes disposed on the substrate; an insulating layer disposed in a gap between two adjacent first electrodes, and partially covering the phase Two adjacent first electrodes are formed to form an accommodating space corresponding to the first electrode; a capacitor dielectric layer is disposed on a side of the first electrode away from the substrate, and is located at Storing a space; and a second electrode on a side of the capacitor dielectric layer away from the base substrate, the capacitor dielectric layer including a first region and a second region, wherein the second electrode is An orthographic projection on the substrate substrate overlaps with an orthographic projection of the first region on the substrate, the second region being configured to perform a detection reaction.
  • a detection reaction in the second region for example, a base pairing reaction
  • hydrogen ions generated by the base pairing reaction enter the capacitor dielectric layer, causing the capacitor dielectric layer to swell, resulting in the first electrode and the second electrode.
  • the spacing between the dielectric layer and the dielectric constant of the dielectric layer changes, and finally the capacitance value between the first electrode and the second electrode is changed.
  • the chemical signal in the sequencing process can be converted into an electrical signal, and special marks such as fluorescent probes are not required for various bases, and the reagent cost is low; in addition, the above-mentioned chip substrate has a simple structure and a low process complexity. It can be fabricated by the usual photolithography process, which is beneficial to the popularization and promotion of gene sequencing in the fields of medicine and the like.
  • FIG. 1 is a schematic structural diagram of a chip substrate according to an embodiment of the present disclosure.
  • FIG. 2 is a top view of a prepared chip substrate according to an embodiment of the present disclosure. As shown in FIG. 1 and FIG.
  • the chip substrate includes: a base substrate 1; a first electrode 2, that is, a lower plate electrode, an array is disposed on the base substrate 1, and an insulating layer 3 is disposed adjacent to the two a gap between the electrodes 2, and partially covering the adjacent two first electrodes 2 to form an accommodating space 20 corresponding to the first electrode 2; the capacitor dielectric layer 4 is disposed on the first electrode 2 away from the lining One side of the base substrate 1 is located in the accommodating space 20; the second electrode 5, that is, the upper plate electrode, is located on a side of the capacitor dielectric layer 4 away from the substrate 1 , and the capacitor dielectric layer 4 includes the first region 41 and The second region 42, the orthographic projection of the second electrode 5 on the substrate 1 and the orthographic projection of the first region 41 on the substrate 1 Overlap, the second region 42 is configured to perform a detection reaction.
  • the corresponding first electrode, the second electrode, and the capacitor dielectric layer disposed between the first electrode and the second electrode may form a capacitor when a detection reaction occurs in the second region.
  • a base pairing reaction or the like detects a reaction, detects ions generated by the reaction, such as hydrogen ions, and enters the capacitor dielectric layer, causing the capacitor dielectric layer to swell, resulting in a spacing between the first electrode and the second electrode and a dielectric layer.
  • the electric constant changes, and finally the capacitance value between the first electrode and the second electrode correspondingly set changes, so that it can be judged whether or not the detection reaction occurs.
  • a continuous sequence of gene fragments can be obtained.
  • the chip substrate further includes: a test point 6 on a side of the capacitor dielectric layer 4 away from the substrate 1, and the insulating layer 3 includes a lead hole 21, a test point. 6 is electrically connected to the first electrode 2 through the lead hole 21 . Thereby, whether the detection reaction occurs can be determined by detecting the capacitance value of the test point and the second electrode.
  • the chip substrate further includes a magnetic bead 7 disposed on a side of the capacitive dielectric layer 4 away from the substrate 1 and located at a second region 42.
  • the magnetic beads 7 are in contact with the capacitive dielectric layer 4 and are configured to receive a sample containing DNA.
  • the DNA-containing sample can be immobilized by magnetic beads, and then different bases can be sequentially introduced; and the gene sequencing of the DNA-containing sample can be realized by judging whether or not a base pairing reaction occurs.
  • the first electrode 2 disposed in an array may be formed by depositing a metal film on the base substrate 1 by etching the metal film, and the manner of forming the first electrode 2 will be as follows. The details are described in the embodiments, and are not described herein.
  • the insulating layer 3 can be formed by a patterning process.
  • the material of the insulating layer 3 is usually a material such as silicon oxide or silicon nitride, and the material of the insulating layer 3 is specifically selected, and the embodiment of the present disclosure is not limited.
  • the capacitive dielectric layer 4 can comprise a pH sensitive hydrogel material.
  • the swelling phenomenon occurs, which in turn can increase the spacing between the second electrode 5 and the first electrode 2, thereby causing a change in the dielectric constant of the second electrode 5 and the first electrode 2, and finally This causes the capacitance value of the chip substrate to change.
  • capacitor dielectric layer 4 in the embodiment of the present disclosure can be made of other materials that encounter swelling phenomenon of hydrogen ions, and the material of the specific capacitor dielectric layer 4 is not limited in this embodiment.
  • the second electrode 5 and the test point 6 may be formed by a patterning process, The two electrodes 5 partially cover the capacitor dielectric layer 4, and the test points 6 are connected to the first electrode 2 through lead holes penetrating through the insulating layer 3.
  • test points 6 may be disposed on each of the second electrodes 5, which is not limited in the embodiment of the present disclosure.
  • the test point 6 can be in communication with the first electrode 2, and by testing the capacitance between the test point 6 and the second electrode 5, the capacitance between the second electrode 5 and the first electrode 2 can be known. To achieve gene sequencing.
  • the magnetic beads 7 are disposed in a region where the second electrode 5 does not cover the capacitive dielectric layer 4, that is, the second region 42, and is in contact with the capacitive dielectric layer 4, and the magnetic beads 7 can be used to receive DNA.
  • the magnetic beads 7 and the second electrode 5 are covered to cover the capacitor dielectric layer 4 and the insulating layer.
  • the DNA on the DNA-containing sample received by the magnetic beads 7 undergoes a sequencing reaction to generate hydrogen ions, and the hydrogen ions entering the capacitive dielectric layer 4 can cause the capacitive dielectric layer 4 to swell, thereby enabling the second
  • the spacing between the electrode 5 and the first electrode 2 is changed, and the dielectric constant of the capacitor dielectric layer 4 is also changed, thereby causing a change in the capacitance value between the chip substrates, thereby determining the corresponding gene fragment sequence.
  • the chip substrate in the embodiment of the present disclosure may further include a protective layer 8 formed between the second electrode 5 and the capacitor dielectric layer 4 and covering the insulating layer 3 and the capacitor dielectric layer 4.
  • the protective layer 8 can protect the capacitor dielectric layer 4 from various etching solutions during the etching process, and the protective layer 8 can be made of a flexible polymer for the capacitor dielectric layer 4 to be in good contact with the second electrode 5.
  • the material is made, and the specific material for forming the protective layer 8 is not limited in the embodiment of the present disclosure.
  • the magnetic beads are in contact with the capacitive dielectric layer.
  • the magnetic beads receive the sample containing the DNA.
  • the hydrogen ions generated by the DNA in the sequencing reaction enter the capacitive dielectric layer, so that The swell of the capacitor dielectric layer causes the plate spacing of the capacitor and the dielectric constant of the dielectric layer to change, which ultimately leads to a change in the capacitance of the chip substrate.
  • the final gene fragment sequence which converts the chemical signal in the sequencing process into an electrical signal, without special marking such as fluorescent probes for various bases, and has low reagent cost; the chip structure is simple and the process complexity is low.
  • the same as the general lithography process it is conducive to the popularization and promotion of gene sequencing in the fields of medicine and the like.
  • FIG. 3 is a schematic structural diagram of a gene sequencing chip according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic structural diagram of a cross section of a gene sequencing chip according to an embodiment of the present disclosure.
  • the gene sequencing chip can include: The counter substrate 9 provided to the cartridge and the chip substrate described in any of the above embodiments.
  • the gene sequencing chip can place a sample to be tested in the second region and pass different bases.
  • the hydrogen ions generated by the base pairing reaction enter the capacitor dielectric layer.
  • the counter substrate 9 is provided with a sampling port 10 and a sample port 11.
  • the sampling port 10 and the sampling port 11 are disposed on the opposite substrate 9 corresponding to the second electrode 5, wherein the sampling port 10 can be used for magnetic beads when performing gene sequencing.
  • a sample containing DNA is provided, and the sample port 11 can be used to discharge the used sequencing reagent through the sample port 11 when the gene sequencing is completed.
  • a flow channel sidewall layer 12 surrounding the edge of the gene sequencing chip is disposed between the opposite substrate 9 and the substrate 1.
  • the flow channel sidewall layer 12 and the opposite substrate 9 and the second electrode 5 together form a sequencing reagent.
  • the flow channel sidewall layer 12 may be made of any one of silicon oxide, silicon nitride, a polymer material, and the like, and the opposite substrate 9 may be made of any one of glass, silicon, and a polymer material. production.
  • the gene sequencing chip provided by the embodiment of the present disclosure can not only have the beneficial effects of the chip substrate shown in the first embodiment, but also can set the flow channel sidewall layer as the retaining wall of the chip substrate, which can better protect the chip substrate. Moreover, the flow path surrounded by the flow channel sidewall layer and the opposite substrate and the second electrode can conveniently store the sequencing reagent, thereby saving the extra space occupied by the separate storage reagent.
  • FIG. 5 is a flow chart showing a method of fabricating a chip substrate according to an embodiment of the present disclosure. As shown in FIG. 5, the manufacturing method of the chip substrate may include the following steps:
  • Step S301 forming an array-arranged first electrode on the base substrate.
  • the first electrode formed in an array on the base substrate may employ a patterning process.
  • a metal film 200 is first deposited on the base substrate 1, and then, as shown in FIG. 5b, the deposited metal film 200 is etched by a photolithography process to form a first array.
  • Electrode 2 It is to be understood that the above examples are merely examples for better understanding the technical solutions of the embodiments of the present disclosure. For example, it is not intended to be the only limitation of the embodiments of the present disclosure.
  • Step S302 forming an insulating layer on a side of the first electrode away from the substrate, the insulating layer is disposed in a gap between the adjacent two first electrodes, and partially covers the adjacent two first electrodes to form and An accommodating space corresponding to one electrode.
  • Step S303 forming a capacitor dielectric layer on a side of the first electrode away from the substrate, and the capacitor dielectric layer is located in the accommodating space.
  • Step S304 forming a second electrode on a side of the capacitor dielectric layer away from the substrate, the capacitor dielectric layer includes a first region and a second region, and the orthographic projection of the second electrode on the substrate substrate is aligned with the first region The orthographic projections on the base substrate overlap and the second region is configured to perform a detection reaction.
  • the step S302, the step S303, and the step S304 may deposit an insulating layer 3 on the first electrode 2 and the substrate 1 as shown in FIG. 5c, and then, as shown in FIG. 5d, A lithography process is performed on the insulating layer 3 to etch the accommodating space 20 for depositing the capacitor dielectric layer. Then, as shown in FIG. 5e, the capacitor dielectric layer 4 is deposited in the accommodating space 20, and then, as shown in FIG. 5f. As shown, the capacitor dielectric layer 4 is etched such that the upper surface of the capacitor dielectric layer 4 is flush with the upper surface of the insulating layer 3. The second electrode 5 is then formed on the side of the capacitor dielectric layer 4 remote from the substrate 1.
  • a method for fabricating a chip substrate according to an embodiment of the present disclosure further includes: forming a lead hole in an insulating layer, the lead hole exposing a portion of the first electrode; and a side of the capacitor dielectric layer away from the substrate A test point is formed, and the test point is electrically connected to the first electrode through the lead hole.
  • a lead hole 21 for the second electrode 5 to be connected to the first electrode 2 penetrating the insulating layer 3 is etched in the insulating layer 3.
  • a method for fabricating a chip substrate according to an embodiment of the present disclosure further includes: providing a magnetic bead on a side of the capacitor dielectric layer away from the substrate, the magnetic bead being located in the second region, the magnetic bead and the capacitor The electrical layer contacts and is configured to receive a sample containing DNA.
  • a metal film 56 is deposited on the chip substrate, and then, as shown in FIG. 5j, the deposited metal film 56 is etched by photolithography to form an array.
  • the second electrode 5 is etched on the second electrode 5 with a test point 6 for connecting the first electrode 2.
  • the manufacturing method further includes: forming a protective layer on a side of the insulating layer and the capacitor dielectric layer away from the substrate. For example, as shown in FIG. 5h, an array of protective layers 8 is deposited over the insulating layer 3 and the capacitor dielectric layer 4 to protect The layer 8 is deposited between the second electrode 5 and the capacitor dielectric layer 4 and covers the insulating layer 3 and the capacitor dielectric layer 4.
  • the insulating layer forms a lead hole
  • the lead hole exposes a portion of the first electrode including: a lead hole that sequentially penetrates the protective layer and the insulating layer and exposes a portion of the first electrode in the protective layer and the insulating layer.
  • FIG. 6 is a flow chart showing the steps of a gene sequencing method according to an embodiment of the present disclosure.
  • the gene sequencing method may use the chip substrate provided by any of the above examples. As shown in Figure 6, the gene sequencing method comprises the following steps:
  • Step S401 Acquire a first spacing between the correspondingly disposed second electrode and the first electrode and a first dielectric constant of the capacitor dielectric layer.
  • a capacitor dielectric layer is formed between the second electrode and the first electrode, and the first spacing between the second electrode and the first electrode may be obtained in advance before the gene sequencing, and the material is formed by the capacitor dielectric layer.
  • a first dielectric constant of the capacitive dielectric layer can be obtained.
  • Step S402 Acquire a first capacitance value of the corresponding second electrode and the first electrode according to the first pitch and the first dielectric constant.
  • the first capacitance value of the first sequencing unit can be calculated by the first pitch and the first dielectric constant.
  • Step S403 performing a gene detection reaction in the second region, and acquiring a second spacing between the second electrode and the first electrode and a second dielectric constant of the capacitor dielectric layer.
  • the gene is sequenced, and the DNA-containing sample and the required sequencing reagent are provided to the magnetic beads through the sampling port on the opposite substrate to perform gene sequencing.
  • the DNA will be The sequencing reaction generates hydrogen ions into the capacitor dielectric layer, causing the capacitor dielectric layer to swell, thereby increasing the spacing between the second electrode and the first electrode, and also causing a change in the dielectric constant of the capacitor dielectric layer. .
  • Step S404 Acquire a second capacitance value of the corresponding second electrode and the first electrode according to the second pitch and the second dielectric constant.
  • the second capacitance value of the first sequencing unit can be calculated by the second pitch and the second dielectric constant.
  • Step S405 The difference between the second capacitance value and the first capacitance value is used to obtain a sequence of the gene segment corresponding to the second electrode and the first electrode.
  • a corresponding first electrode, a second electrode, and a capacitor dielectric layer disposed between the first electrode and the second electrode form a capacitance, and when a detection reaction occurs in the second region, For example, a base pairing reaction or the like detects a reaction, detects ions generated by the reaction, such as hydrogen ions, and enters the capacitor dielectric layer, causing the capacitor dielectric layer to swell, resulting in a spacing between the first electrode and the second electrode and a dielectric layer dielectric.
  • the constant changes, and finally the capacitance value between the first electrode and the second electrode correspondingly set changes, so that it can be judged whether or not the detection reaction occurs.
  • the sequence of the gene segment corresponding to the second electrode and the first electrode corresponding to the first electrode can be obtained.
  • the embodiments of the present disclosure include but are not limited to, and the corresponding first and second electrodes may be directly measured to obtain the first capacitance value and the second capacitance value.

Abstract

一种芯片基板及其制作方法、基因测序芯片及基因测序方法。该芯片基板包括：衬底基板(1)；第一电极(2)，阵列设置在衬底基板(1)上；绝缘层(3)，设置在相邻的两个第一电极(2)之间的间隙，且部分覆盖相邻的两个第一电极(2)以形成与第一电极(2)一一对应的容置空间(20)；电容介电层(4)，设置在第一电极(2)远离衬底基板(1)的一侧，且位于容置空间(20)；以及第二电极(5)，位于电容介电层(4)远离衬底基板(1)的一侧，电容介电层(4)包括第一区域(41)和第二区域(42)，第二电极(5)在衬底基板(1)上的正投影与第一区域(41)在衬底基板(1)上的正投影重叠，第二区域(42)被配置为进行检测反应。该芯片基板可将测序过程中的化学信号转变为电信号，无需对各种碱基进行如荧光探针等特殊标记，成本较低。

Description

芯片基板及其制作方法、基因测序芯片及基因测序方法
交叉引用
本申请要求于2017年05月11日递交的中国专利申请第201710330831.9号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本公开实施例涉及一种芯片基板及其制作方法，基因测序芯片以及基因测序方法。
背景技术
基因测序技术是现代分子生物学研究中最常用的技术，从1977第一代基因测序发展至今，基因测序技术已经取得了相当大的发展，主要包括第一代sanger测序技术、第二代高通量测序技术、第三代单分子测序技术和第四代纳米孔测序技术。
发明内容
本公开至少一个实施例提供一种芯片基板，其包括：衬底基板；第一电极，阵列设置在所述衬底基板上；绝缘层，设置在相邻的两个所述第一电极之间的间隙，且部分覆盖所述相邻的两个所述第一电极以形成与所述第一电极一一对应的容置空间；电容介电层，设置在所述第一电极远离所述衬底基板的一侧，且位于所述容置空间；以及第二电极，位于所述电容介电层远离所述衬底基板的一侧，所述电容介电层包括第一区域和第二区域，所述第二电极在所述衬底基板上的正投影与所述第一区域在所述衬底基板上的正投影重叠，所述第二区域被配置为进行检测反应。
例如，本公开一实施例提供的芯片基板还包括：测试点，位于所述电容介电层远离所述衬底基板的一侧，所述绝缘层包括引线孔，所述测试点通过所述引线孔与所述第一电极电性相连。
例如，本公开一实施例提供的芯片基板还包括：磁珠，设置在所述电容介电层远离所述衬底基板的一侧，且位于所述第二区域，所述磁珠与所述电容介 电层接触，并被配置为接收含有DNA的样本。
例如，在本公开一实施例提供的芯片基板中，所述电容介电层包括PH敏感水凝胶材料。
例如，本公开一实施例提供的芯片基板还包括：保护层，设置在所述第二电极与所述电容介电层之间，所述保护层在所述衬底基板上的正投影与所述绝缘层和所述第二电极在所述衬底基板上的正投影重叠。
例如，在本公开一实施例提供的芯片基板中，所述保护层包括具有柔性的聚合物材料。
本公开至少一个实施例还提供一种基因测序芯片，包括：对盒设置的对置基板以及上述任一项所述的芯片基板。
例如，在本公开一实施例提供的基因测序芯片中，所述对置基板上设有采样口和出样口。
例如，在本公开一实施例提供的基因测序芯片中，所述对置基板和所述芯片基板之间设置有环绕所述基因测序芯片边缘的流道侧壁层；所述流道侧壁层与所述对置基板、所述第二电极共同形成用于存储测序试剂的流道。
例如，在本公开一实施例提供的基因测序芯片中，所述流道侧壁层由氧化硅、氮化硅、聚合物材料中的任一种材料制成。
例如，在本公开一实施例提供的基因测序芯片中，所述对置基板由玻璃、硅和聚合物材料中的任一种材料制成。
本公开至少一个实施例还提供一种芯片基板的制作方法，其包括：在衬底基板上形成阵列设置的第一电极；在所述第一电极远离所述衬底基板的一侧形成绝缘层，所述绝缘层设置在相邻的两个所述第一电极之间的间隙，且部分覆盖所述相邻的两个所述第一电极以形成与所述第一电极一一对应的容置空间；在所述第一电极远离所述衬底基板的一侧形成电容介电层，所述电容介电层位于所述容置空间；以及在所述电容介电层远离所述衬底基板的一侧形成第二电极，所述电容介电层包括第一区域和第二区域，所述第二电极在所述衬底基板上的正投影与所述第一区域在所述衬底基板上的正投影重叠，所述第二区域被配置为进行检测反应。
例如，本公开一实施例提供的芯片基板的制作方法还包括：在所述绝缘层形成引线孔，所述引线孔暴露部分所述第一电极；以及在所述电容介电层远离所述衬底基板的一侧形成测试点，所述测试点通过所述引线孔与所述第一电极 电性相连。
例如，本公开一实施例提供的芯片基板的制作方法还包括：在所述电容介电层远离所述衬底基板的一侧设置磁珠，所述磁珠位于所述第二区域，所述磁珠与所述电容介电层接触，并被配置为接收含有DNA的样本。
例如，在本公开一实施例提供的芯片基板的制作方法中，在所述绝缘层形成引线孔，所述引线孔暴露部分所述第一电极之前，所述制作方法还包括：在所述绝缘层及所述电容介电层远离所述衬底基板的一侧形成保护层。
例如，在本公开一实施例提供的芯片基板的制作方法中，所述绝缘层形成引线孔，所述引线孔暴露部分所述第一电极包括：在所述保护层和所述绝缘层中形成依次贯穿所述保护层及所述绝缘层并暴露部分所述第一电极的引线孔。
本公开一实施例还提供一种上述任一项所述的芯片基板的基因测序方法，包括：获取对应设置的所述第二电极与所述第一电极之间的第一间距和所述电容介电层的第一介电常数；根据所述第一间距和所述第一介电常数获取所述对应设置的所述第二电极与所述第一电极的第一电容值；在所述第二区域进行基因检测反应，并获取所述第二电极与第一电极之间的第二间距和所述电容介电层的第二介电常数；根据所述第二间距和所述第二介电常数获取所述对应设置的所述第二电极与所述第一电极的第二电容值；以及利用所述第二电容值与所述第一电容值的差值，获取所述对应设置的所述第二电极与所述第一电极所对应的基因片段序列。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本公开的一些实施例，而非对本公开的限制。
图1是本公开实施例一的一种芯片基板的结构示意图；
图2是本公开实施例一的一种制备好的芯片基板俯视图；
图3是本公开实施例二的一种基因测序芯片的结构示意图；
图4是本公开实施例二的一种基因测序芯片截面的结构示意图；
图5是本公开实施例三的一种芯片基板的制作方法流程图；
图5a是本公开实施例三中芯片基板制作过程中的结构示意图；
图5b是本公开实施例三中芯片基板制作过程中的结构示意图；
图5c是本公开实施例三中芯片基板制作过程中的结构示意图；
图5d是本公开实施例三中芯片基板制作过程中的结构示意图；
图5e是本公开实施例三中芯片基板制作过程中的结构示意图；
图5f是本公开实施例三中芯片基板制作过程中的结构示意图；
图5g是本公开实施例三中芯片基板制作过程中的结构示意图；
图5h是本公开实施例三中芯片基板制作过程中的结构示意图；
图5i是本公开实施例三中芯片基板制作过程中的结构示意图；
图5j是本公开实施例三中芯片基板制作过程中的结构示意图；
图5k是本公开实施例三中芯片基板制作过程中的结构示意图；以及
图6是本公开实施例四的一种基因测序方法的步骤流程图。
附图标记说明:
1-衬底基板；2-第一电极；3-绝缘层；4-电容介电层；5-第二电极；6-测试点；7-磁珠；8-保护层；9-对置基板；10-采样口；11-出样口；12-流道侧壁层；13-流道；20-容置空间；21-引线孔。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。
通常的基因测序方法通常采用的是荧光检测方法，各大测序公司如Illumina、Roche 454、ABI等均是采用荧光检测方法所进行的基因测序。荧光检测方法是通过对各种碱基进行不同的荧光基团修饰，进而在这些碱基与待测 基因片段配对时，会导致荧光基团释放，通过通过光学系统检测荧光颜色，即可确定碱基种类，最终得到待测基因片段序列。
虽然上述基因测序方法检测具有检测结果直观，测序精度高的效果。然而，上述基因测序方法需要对四种碱基进行不同颜色的荧光标记，而在测序过程中也需要进行上千轮的碱基配对，进而需要大量的测试试剂，造成测试试剂成本的大幅提高，不利于基因测序在医学等领域的普及和推广。
本公开实施例提供一种芯片基板及其制作方法，基因测序芯片以及基因测序方法。所述芯片基板包括：衬底基板；第一电极，阵列设置在所述衬底基板上；绝缘层，设置在相邻的两个所述第一电极之间的间隙，且部分覆盖所述相邻的两个所述第一电极以形成与所述第一电极一一对应的容置空间；电容介电层，设置在所述第一电极远离所述衬底基板的一侧，且位于所述容置空间；以及第二电极，位于所述电容介电层远离所述衬底基板的一侧，所述电容介电层包括第一区域和第二区域，所述第二电极在所述衬底基板上的正投影与所述第一区域在所述衬底基板上的正投影重叠，所述第二区域被配置为进行检测反应。通过上述芯片基板，通过在第二区域进行检测反应，例如，碱基配对反应，碱基配对反应产生的氢离子进入电容介电层，使得电容介电层溶胀，导致第一电极和第二电极之间的间距以及介质层介电常数发生变化，最终对应设置的第一电极和第二电极之间的电容值发生改变，通过连续监测上述电容值变化情况，即可得到最终的基因片段序列。由此，可将测序过程中的化学信号转变为电信号，无需对各种碱基进行如荧光探针等特殊标记，试剂成本低；另外，上述的芯片基板结构简单，工艺复杂程度较低，可采用通常的光刻工艺制作，有利于基因测序在医学等领域的普及和推广。
本公开一实施例提供一种芯片基板的结构示意图。图1示出了本公开一实施例提供的一种芯片基板的结构示意图。图2示出了本公开一实施例提供的一种制备好的芯片基板俯视图。如图1和图2所示，该芯片基板包括：衬底基板1；第一电极2，即下板电极，阵列设置在衬底基板1上；绝缘层3，设置在相邻的两个第一电极2之间的间隙，且部分覆盖相邻的两个第一电极2以形成与第一电极2一一对应的容置空间20；电容介电层4，设置在第一电极2远离衬底基板1的一侧，且位于容置空间20；第二电极5，即上板电极，位于电容介电层4远离衬底基板1的一侧，电容介电层4包括第一区域41和第二区域42，第二电极5在衬底基板1上的正投影与第一区域41在衬底基板1上的正投影 重叠，第二区域42被配置为进行检测反应。
在本实施例提供的芯片基板中，对应设置的第一电极、第二电极以及设置在第一电极和第二电极之间的电容介电层可形成一个电容，当第二区域发生检测反应时，例如，碱基配对反应等检测反应，检测反应产生的离子，例如氢离子，进入电容介电层，使得电容介电层溶胀，导致第一电极和第二电极之间的间距以及介质层介电常数发生变化，最终对应设置的第一电极和第二电极之间的电容值发生改变，从而可判断检测反应是否发生。另外，通过连续监测上述电容值变化情况，即可得到连续的基因片段序列。
例如，在一些示例中，如图1和2所示，该芯片基板还包括：测试点6，位于电容介电层4远离衬底基板1的一侧，绝缘层3包括引线孔21，测试点6通过引线孔21与第一电极2电性相连。由此，可通过检测测试点与第二电极的电容值，来判断检测反应是否发生。
例如，在一些示例中，如图1和2所示，该芯片基板还包括：磁珠7，设置在电容介电层4远离衬底基板1的一侧，且位于42第二区域。磁珠7与电容介电层4接触，并被配置为接收含有DNA的样本。由此，可通过磁珠固定含有DNA的样本，然后依次通入不同的碱基；通过判断是否发生碱基配对反应来实现对含有DNA的样本的基因测序。
例如，在一些示例中，可以通过在衬底基板1上沉积一层金属膜，通过对金属膜进行刻蚀以形成阵列设置的第一电极2，而对于第一电极2的形成方式将在下述实施例中详细说明，在此不加以赘述。
例如，在一些示例中，绝缘层3可通过图案化工艺形成。绝缘层3的材料通常为氧化硅或氮化硅等材料，而对于绝缘层3具体选用何种材料，本公开实施例不加以限制。
例如，在一些示例中，电容介电层4可包括PH敏感水凝胶材料。PH敏感水凝胶遇到氢离子会发生溶胀现象，进而可以使得第二电极5和第一电极2的间距增大，进而导致第二电极5和第一电极2的介电常数发生变化，最终导致芯片基板的电容值发生改变。
可以理解地，本公开实施例中的电容介电层4可以采用其他遇到氢离子会发生溶胀现象的材料制成，而对于具体的电容介电层4的材料本公开实施例不加以限制。
例如，在一些示例中，可通过图案化工艺形成第二电极5和测试点6，第 二电极5部分覆盖于电容介电层4，测试点6通过引线贯穿绝缘层3的引线孔与第一电极2连接。
在本公开实施例中，每个第二电极5上均可以设置一个或者多个测试点6，本公开实施例对此不加以限制。
例如，在一些示例中，测试点6可以与第一电极2连通，通过测试测试点6与第二电极5之间的电容，也就可以获知第二电极5与第一电极2之间的电容，进而实现基因测序。
例如，在一些示例中，磁珠7设置于第二电极5未覆盖电容介电层4的区域，即第二区域42，并与电容介电层4接触，磁珠7可以用于接收含有DNA的样本，磁珠7与第二电极5契合的覆盖电容介电层4及绝缘层。
在进行基因测序时，磁珠7接收的含有DNA的样本上的DNA会发生测序反应产生氢离子，氢离子进入电容介电层4可以使电容介电层4产生溶胀反应，从而可以使第二电极5和第一电极2的间距发生改变，也可以使电容介电层4的介电常数发生变化，进而导致芯片基板间的电容值发生改变，以此确定出相应的基因片段序列。
例如，本公开实施例中的芯片基板还可以包括：形保护层8，保护层8形成于第二电极5与电容介电层4之间并覆盖绝缘层3及电容介电层4。保护层8可以在刻蚀过程中保护电容介电层4不受各种刻蚀液侵蚀，而为了电容介电层4与第二电极5良好接触，保护层8可以是由具有柔性的聚合物材料制成，而本公开实施例中对于制成保护层8的具体的材料不加以限制。
本公开实施例通过磁珠与电容介电层接触，在基因测序时，磁珠接收含有DNA的样本，在基因测序的过程中，DNA在测序反应下产生的氢离子进入电容介电层，使得电容介电层溶胀，导致电容器的极板间距以及介质层介电常数发生变化，最终导致芯片基板电容值发生改变，通过连续监测每个测序过程中每个测序单元电容值变化情况，即可得到最终的基因片段序列，该方法是将测序过程中的化学信号转变为电信号，无需对各种碱基进行如荧光探针等特殊标记，试剂成本低；芯片结构简单，工艺复杂程度较低，与一般光刻工艺相同，有利于基因测序在医学等领域的普及和推广。
本公开一实施例还提供一种基因测序芯片。图3示出了本公开一实施例提供的一种基因测序芯片的结构示意图。图4示出了本公开一实施例提供的一种基因测序芯片截面的结构示意图。如图3和图4所示，基因测序芯片可以包括： 对盒设置的对置基板9以及上述实施例中任一示例所描述的芯片基板。由此，该基因测序芯片可通过在第二区域放置待测样本，并通入不同的碱基，当第二区域碱基配对反应时，碱基配对反应产生的氢离子进入电容介电层，使得电容介电层溶胀，导致第一电极和第二电极之间的间距以及介质层介电常数发生变化，最终对应设置的第一电极和第二电极之间的电容值发生改变，从而可判断检测反应是否发生。另外，通过连续监测上述电容值变化情况，即可得到连续的基因片段序列。
例如，对置基板9上设置有采样口10和出样口11。
在本公开实施例中，在对应于第二电极5之上的对置基板9上均设置有采样口10和出样口11，其中，采样口10可以用于在进行基因测序时向磁珠7提供含有DNA的样本，出样口11可以用于在基因测序完成时，通过出样口11排出使用过的测序试剂。
例如，对置基板9和基板1之间设置有环绕基因测序芯片边缘的流道侧壁层12，流道侧壁层12与对置基板9、第二电极5共同形成用于存储测序试剂的流道13。
例如，流道侧壁层12可以由氧化硅、氮化硅、聚合物材料等中的任一种材料制成，对置基板9可以由玻璃、硅和聚合物材料等中的任一种材料制成。
需要说明的是，在实际应用中，本领域技术人员可以根据实际需要自行选择制成流道侧壁层12和对置基板9的材料，本公开实施例对此不加以限制。
本公开实施例提供的基因测序芯片，除了具有实施例一中所示的芯片基板所具有的有益效果外，还可以设置流道侧壁层作为芯片基板的挡墙，可以更好的保护芯片基板，并且，通过流道侧壁层与对置基板、第二电极所围成的流道可以方便存储测序试剂，从而能够节省单独存放测序试剂占用的额外空间。
本公开一实施例还提供一种芯片基板的制作方法。图5示出了本公开一实施例提供的一种芯片基板的制作方法的流程图。如图5所示，该芯片基板的制作方法可包括以下步骤：
步骤S301：在衬底基板上形成阵列设置的第一电极。
例如，在衬底基板上形成阵列设置的第一电极可采用图案化工艺。例如，如图5a所示，首先在衬底基板1上沉积一层金属膜200，然后，如图5b所示，通过光刻工艺对沉积的金属膜200进行刻蚀以形成阵列设置的第一电极2。可以理解地，上述示例仅是为了更好地理解本公开实施例的技术方案而列举的示 例，并不作为对本公开实施例的唯一限制。
步骤S302：在第一电极远离衬底基板的一侧形成绝缘层，绝缘层设置在相邻的两个第一电极之间的间隙，且部分覆盖相邻的两个第一电极以形成与第一电极一一对应的容置空间。
步骤S303：在第一电极远离衬底基板的一侧形成电容介电层，电容介电层位于容置空间。
步骤S304：在电容介电层远离衬底基板的一侧形成第二电极，电容介电层包括第一区域和第二区域，第二电极在衬底基板上的正投影与第一区域在衬底基板上的正投影重叠，第二区域被配置为进行检测反应。
在本公开实施例中，上述步骤S302、步骤S303、步骤S304可以如图5c所示，在第一电极2及衬底基板1上沉积一层绝缘层3，然后，如图5d所示，在绝缘层3上采用光刻工艺刻蚀出用于沉积电容介电层的容置空间20，然后，如图5e所示，在容置空间20中沉积电容介电层4，进而，如图5f所示，对电容介电层4进行刻蚀，以使电容介电层4的上表面与绝缘层3的上表面平齐。然后在电容介电层4远离衬底基板1的一侧形成第二电极5。
例如，在一些示例中，本公开一实施例提供的芯片基板的制作方法还包括：在绝缘层形成引线孔，引线孔暴露部分第一电极；以及在电容介电层远离衬底基板的一侧形成测试点，测试点通过引线孔与第一电极电性相连。
例如，如图5g所示，在绝缘层3中刻蚀出贯穿绝缘层3的用于第二电极5与第一电极2连接的引线孔21。
例如，在一些示例中，本公开一实施例提供的芯片基板的制作方法还包括：在电容介电层远离衬底基板的一侧设置磁珠，磁珠位于第二区域，磁珠与电容介电层接触，并被配置为接收含有DNA的样本。
例如，在一些示例中，如图5i所示，在芯片基板上沉积一层金属膜56，然后，如图5j所示，采用光刻工艺对沉积的金属膜56进行刻蚀以形成阵列的第二电极5，并在第二电极5上刻蚀出用于连接第一电极2的测试点6。
可以理解地，上述示例仅是为了更好地理解本公开实施例的技术方案而列举的示例，并不作为对本公开实施例的唯一限制。
例如，在一些示例中，在绝缘层形成引线孔，引线孔暴露部分第一电极之前，制作方法还包括：在绝缘层及电容介电层远离衬底基板的一侧形成保护层。例如，如图5h所示，在绝缘层3和电容介电层4之上沉积阵列保护层8，保护 层8沉积于第二电极5与电容介电层4之间，并覆盖绝缘层3及电容介电层4。
例如，在一些示例中，绝缘层形成引线孔，引线孔暴露部分第一电极包括：在保护层和绝缘层中形成依次贯穿保护层及绝缘层并暴露部分第一电极的引线孔。
本公开一实施例还提供一种基因测序方法。图6示出了本公开一实施例提供的一种基因测序方法的步骤流程图。该基因测序方法可使用上述任一示例提供的芯片基板。如图6所示，该基因测序方法包括如下步骤：
步骤S401：获取对应设置的第二电极与第一电极之间的第一间距和电容介电层的第一介电常数。
例如，第二电极和第一电极之间形成有电容介电层，在进行基因测序之前，可以预先获取第二电极与第一电极之间的第一间距，通过电容介电层的制成材料可以获取电容介电层的第一介电常数。
步骤S402：根据第一间距和第一介电常数获取对应设置的第二电极与第一电极的第一电容值。
例如，通过第一间距和第一介电常数可以计算出该第一测序单元的第一电容值。
步骤S403：在第二区域进行基因检测反应，并获取第二电极与第一电极之间的第二间距和电容介电层的第二介电常数。
例如，在测出第一电容值之后进行基因测序，通过对置基板上的采样口向磁珠提供含有DNA的样本及所需的测序试剂以进行基因测序，在基因测序的过程中，DNA会发生测序反应产生氢离子进入电容介电层，从而导致电容介电层发生溶胀现象，从而可以使第二电极和第一电极的间距增大，并且也会导致电容介质层的介电常数发生改变。
步骤S404：根据第二间距和第二介电常数获取对应设置的第二电极与第一电极的第二电容值。
例如，通过第二间距和第二介电常数可以计算出该第一测序单元的第二电容值。
步骤S405：利用第二电容值与第一电容值的差值，获取对应设置的第二电极与第一电极所对应的基因片段序列。
在该芯片基板中，对应设置的第一电极、第二电极以及设置在第一电极和第二电极之间的电容介电层可形成一个电容，当第二区域发生检测反应时，例 如，碱基配对反应等检测反应，检测反应产生的离子，例如氢离子，进入电容介电层，使得电容介电层溶胀，导致第一电极和第二电极之间的间距以及介质层介电常数发生变化，最终对应设置的第一电极和第二电极之间的电容值发生改变，从而可判断检测反应是否发生。因此，通过利用第二电容值与第一电容值的差值，可获取对应设置的第二电极与第一电极所对应的基因片段序列。需要说明的是，本公开实施例包括但不限于此，也可直接测量对应设置的第一电极和第二电极，以得到上述的第一电容值和第二电容值。
对于前述的各实施例，为了简单描述，故将其都表述为一系列的动作组合，但是本领域技术人员应该知悉，本公开并不受所描述的动作顺序的限制，因为依据本公开，某些步骤可以采用其他顺序或者同时进行。其次，本领域技术人员也应该知悉，说明书中所描述的实施例均属于优选实施例，所涉及的动作和模块并不一定是本公开所必须的。
有以下几点需要说明：
(1)本公开实施例附图中，只涉及到与本公开实施例涉及到的结构，其他结构可参考通常设计。
(2)在不冲突的情况下，本公开同一实施例及不同实施例中的特征可以相互组合。
以上所述，仅为本公开的具体实施方式，但本公开的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本公开揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应以所述权利要求的保护范围为准。

Claims (17)

  1. 一种芯片基板，包括：
    衬底基板；
    第一电极，阵列设置在所述衬底基板上；
    绝缘层，设置在相邻的两个所述第一电极之间的间隙，且部分覆盖所述相邻的两个所述第一电极以形成与所述第一电极一一对应的容置空间；
    电容介电层，设置在所述第一电极远离所述衬底基板的一侧，且位于所述容置空间；以及
    第二电极，位于所述电容介电层远离所述衬底基板的一侧，
    其中，所述电容介电层包括第一区域和第二区域，所述第二电极在所述衬底基板上的正投影与所述第一区域在所述衬底基板上的正投影重叠，所述第二区域被配置为进行检测反应。
  2. 根据权利要求1所述的芯片基板，还包括：
    测试点，位于所述电容介电层远离所述衬底基板的一侧，
    其中，所述绝缘层包括引线孔，所述测试点通过所述引线孔与所述第一电极电性相连。
  3. 根据权利要求1所述的芯片基板，还包括：
    磁珠，设置在所述电容介电层远离所述衬底基板的一侧，且位于所述第二区域，
    其中，所述磁珠与所述电容介电层接触，并被配置为接收含有DNA的样本。
  4. 根据权利要求1-3中任一项所述的芯片基板，其中，所述电容介电层包括PH敏感水凝胶材料。
  5. 根据权利要求1-3中任一项所述的芯片基板，还包括：
    保护层，设置在所述第二电极与所述电容介电层之间，
    其中，所述保护层在所述衬底基板上的正投影与所述绝缘层和所述第二电极在所述衬底基板上的正投影重叠。
  6. 根据权利要求5所述的芯片基板，其中，所述保护层包括具有柔性的聚合物材料。
  7. 一种基因测序芯片，包括：
    对盒设置的对置基板以及如权利要求1至6中任一项所述的芯片基板。
  8. 根据权利要求7所述的基因测序芯片，其中，所述对置基板上设有采样口和出样口。
  9. 根据权利要求7所述的基因测序芯片，其中，所述对置基板和所述芯片基板之间设置有环绕所述基因测序芯片边缘的流道侧壁层；所述流道侧壁层与所述对置基板、所述第二电极共同形成用于存储测序试剂的流道。
  10. 根据权利要求9所述的基因测序芯片，其中，所述流道侧壁层由氧化硅、氮化硅、聚合物材料中的任一种材料制成。
  11. 根据权利要求7所述的基因测序芯片，其中，所述对置基板由玻璃、硅和聚合物材料中的任一种材料制成。
  12. 一种芯片基板的制作方法，包括：
    在衬底基板上形成阵列设置的第一电极；
    在所述第一电极远离所述衬底基板的一侧形成绝缘层，所述绝缘层设置在相邻的两个所述第一电极之间的间隙，且部分覆盖所述相邻的两个所述第一电极以形成与所述第一电极一一对应的容置空间；
    在所述第一电极远离所述衬底基板的一侧形成电容介电层，所述电容介电层位于所述容置空间；以及
    在所述电容介电层远离所述衬底基板的一侧形成第二电极，
    其中，所述电容介电层包括第一区域和第二区域，所述第二电极在所述衬底基板上的正投影与所述第一区域在所述衬底基板上的正投影重叠，所述第二区域被配置为进行检测反应。
  13. 根据权利要求12所述的芯片基板的制作方法，还包括：
    在所述绝缘层形成引线孔，所述引线孔暴露部分所述第一电极；以及
    在所述电容介电层远离所述衬底基板的一侧形成测试点，
    其中，所述测试点通过所述引线孔与所述第一电极电性相连。
  14. 根据权利要求12所述的芯片基板的制作方法，还包括：
    在所述电容介电层远离所述衬底基板的一侧设置磁珠，所述磁珠位于所述第二区域，
    其中，所述磁珠与所述电容介电层接触，并被配置为接收含有DNA的样本。
  15. 根据权利要求14所述的制作方法，其中，在所述绝缘层形成引线孔， 所述引线孔暴露部分所述第一电极之前，所述制作方法还包括：
    在所述绝缘层及所述电容介电层远离所述衬底基板的一侧形成保护层。
  16. 根据权利要求15所述的制作方法，其中，所述绝缘层形成引线孔，所述引线孔暴露部分所述第一电极包括：
    在所述保护层和所述绝缘层中形成依次贯穿所述保护层及所述绝缘层并暴露部分所述第一电极的引线孔。
  17. 一种使用权利要求1-6中任一项所述的芯片基板的基因测序方法，包括：
    获取对应设置的所述第二电极与所述第一电极之间的第一间距和所述电容介电层的第一介电常数；
    根据所述第一间距和所述第一介电常数获取所述对应设置的所述第二电极与所述第一电极的第一电容值；
    在所述第二区域进行基因检测反应，并获取所述第二电极与第一电极之间的第二间距和所述电容介电层的第二介电常数；
    根据所述第二间距和所述第二介电常数获取所述对应设置的所述第二电极与所述第一电极的第二电容值；以及
    利用所述第二电容值与所述第一电容值的差值，获取所述对应设置的所述第二电极与所述第一电极所对应的基因片段序列。
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