KR100516950B1 - 포토다이오드 - Google Patents
포토다이오드 Download PDFInfo
- Publication number
- KR100516950B1 KR100516950B1 KR10-1998-0009586A KR19980009586A KR100516950B1 KR 100516950 B1 KR100516950 B1 KR 100516950B1 KR 19980009586 A KR19980009586 A KR 19980009586A KR 100516950 B1 KR100516950 B1 KR 100516950B1
- Authority
- KR
- South Korea
- Prior art keywords
- type layer
- photodiode
- type
- electrode
- layer
- Prior art date
Links
- 238000006243 chemical reaction Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 abstract description 92
- 230000001681 protective effect Effects 0.000 abstract description 9
- 239000000758 substrate Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 239000011241 protective layer Substances 0.000 abstract description 3
- 238000000926 separation method Methods 0.000 abstract 1
- 230000000903 blocking effect Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Abstract
Description
Claims (4)
- 제 1 p형층 및 상기 제 1 p형층 위에 형성된 n형층을 가지며, 상기 n형층측으로부터 광을 받아서 광전변환하여 생성된 전하를 상기 n형층으로부터 출력하는 포토다이오드에 있어서,상기 n형층 상에 제 2 p형층을 설치하고, 상기 제 1 p형층 및 상기 제 2 p형층을, 이들을 저 임피던스로 하는 소정 전위에 접속하는 것을 특징으로 하는 포토다이오드.
- 제 1 항에 있어서,상기 n형층으로부터 전하를 출력시키기 위한 제 1 전극; 및상기 제 1 p형층 및 상기 제 2 p형층을 상기 소정 전위에 접속하기 위한 제 2 전극을 상기 n형층측의 표면에 구비하도록 한 것을 특징으로 하는 포토다이오드.
- 제 1 항에 있어서,상기 n형층으로부터 전하를 출력하기 위한 제 1 전극; 및상기 제 1 p형층 및 상기 제 2 p형층을 상기 소정 전위에 접속하기 위한 제 2 전극을 더 구비하는 것을 특징으로 하는 포토다이오드.
- 제 3 항에 있어서,상기 제 2 p형층은, 상기 제 1 전극과 상기 n형층과의 접속부 이외의 부분에서 상기 n형층의 상부를 덮도록 형성되어 있는 것을 특징으로 하는 포토다이오드.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP77480 | 1997-03-28 | ||
JP97-77480 | 1997-03-28 | ||
JP9077480A JPH10270742A (ja) | 1997-03-28 | 1997-03-28 | フォトダイオード |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980080485A KR19980080485A (ko) | 1998-11-25 |
KR100516950B1 true KR100516950B1 (ko) | 2005-11-08 |
Family
ID=13635154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-1998-0009586A KR100516950B1 (ko) | 1997-03-28 | 1998-03-20 | 포토다이오드 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6118165A (ko) |
JP (1) | JPH10270742A (ko) |
KR (1) | KR100516950B1 (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7187048B2 (en) * | 2000-03-22 | 2007-03-06 | Kabushiki Kaisha Toshiba | Semiconductor light-receiving device |
DE10024473B4 (de) * | 2000-05-18 | 2007-04-19 | Vishay Semiconductor Gmbh | Optischer Empfänger |
US7109511B2 (en) * | 2000-11-02 | 2006-09-19 | Kabushiki Kaisha Yaskawa Denki | Techniques for wafer prealignment and sensing edge positions |
JP3807954B2 (ja) * | 2001-06-25 | 2006-08-09 | シャープ株式会社 | フォトダイオード |
DE102014211829A1 (de) * | 2014-06-20 | 2015-12-24 | Robert Bosch Gmbh | Thermodiodenelement für einen Fotosensor zur Infrarot-Strahlungsmessung, Fotosensor und Verfahren zum Herstellen eines Thermodiodenelements |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4241358A (en) * | 1979-03-26 | 1980-12-23 | Trw Inc. | Radiation sensitive device with lateral current |
US5130531A (en) * | 1989-06-09 | 1992-07-14 | Omron Corporation | Reflective photosensor and semiconductor light emitting apparatus each using micro Fresnel lens |
JPH0394478A (ja) * | 1989-09-06 | 1991-04-19 | Matsushita Electron Corp | 半導体装置 |
US5128729A (en) * | 1990-11-13 | 1992-07-07 | Motorola, Inc. | Complex opto-isolator with improved stand-off voltage stability |
US5291038A (en) * | 1990-12-19 | 1994-03-01 | Sharp Kabushiki Kaisha | Reflective type photointerrupter |
JPH04280685A (ja) * | 1991-03-08 | 1992-10-06 | Sony Corp | 受光装置 |
JPH04280674A (ja) * | 1991-03-08 | 1992-10-06 | Sharp Corp | 回路内蔵受光素子 |
US5592124A (en) * | 1995-06-26 | 1997-01-07 | Burr-Brown Corporation | Integrated photodiode/transimpedance amplifier |
US5903021A (en) * | 1997-01-17 | 1999-05-11 | Eastman Kodak Company | Partially pinned photodiode for solid state image sensors |
-
1997
- 1997-03-28 JP JP9077480A patent/JPH10270742A/ja active Pending
-
1998
- 1998-03-20 KR KR10-1998-0009586A patent/KR100516950B1/ko not_active IP Right Cessation
- 1998-03-26 US US09/048,109 patent/US6118165A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH10270742A (ja) | 1998-10-09 |
US6118165A (en) | 2000-09-12 |
KR19980080485A (ko) | 1998-11-25 |
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