KR100492278B1 - 투영노광장치 - Google Patents

투영노광장치 Download PDF

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Publication number
KR100492278B1
KR100492278B1 KR1019970024882A KR19970024882A KR100492278B1 KR 100492278 B1 KR100492278 B1 KR 100492278B1 KR 1019970024882 A KR1019970024882 A KR 1019970024882A KR 19970024882 A KR19970024882 A KR 19970024882A KR 100492278 B1 KR100492278 B1 KR 100492278B1
Authority
KR
South Korea
Prior art keywords
mask
stage
optical element
optical system
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019970024882A
Other languages
English (en)
Korean (ko)
Other versions
KR980011723A (ko
Inventor
도모히데 하마다
히로시 시라수
유끼오 가까자끼
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR980011723A publication Critical patent/KR980011723A/ko
Application granted granted Critical
Publication of KR100492278B1 publication Critical patent/KR100492278B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019970024882A 1996-07-05 1997-06-16 투영노광장치 Expired - Fee Related KR100492278B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP195531/1996 1996-07-05
JP19553196A JP3669063B2 (ja) 1996-07-05 1996-07-05 投影露光装置

Publications (2)

Publication Number Publication Date
KR980011723A KR980011723A (ko) 1998-04-30
KR100492278B1 true KR100492278B1 (ko) 2005-08-31

Family

ID=16342647

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970024882A Expired - Fee Related KR100492278B1 (ko) 1996-07-05 1997-06-16 투영노광장치

Country Status (2)

Country Link
JP (1) JP3669063B2 (enExample)
KR (1) KR100492278B1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1070012C (zh) * 1998-08-04 2001-08-22 国家科学技术委员会高技术研究发展中心 全数字vsb调制器
TW392065B (en) * 1998-08-20 2000-06-01 Nikon Corp Laser interferometer, position measuring device and measuring method, exposure device and manufacturing methods thereof
EP1285222A4 (en) * 2000-05-17 2006-11-15 Zygo Corp INTERFEROMETRIC DEVICE AND INTERFEROMETRIC PROCEDURE
ATE502324T1 (de) * 2004-02-11 2011-04-15 Koninkl Philips Electronics Nv System und verfahren zum positionieren eines produkts

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPH07249567A (ja) * 1994-03-09 1995-09-26 Nikon Corp 露光装置
JPH07326567A (ja) * 1994-05-31 1995-12-12 Nikon Corp 等倍投影型露光装置
KR950033691A (ko) * 1994-04-12 1995-12-26 오노 시게오 주사형 노광 장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPH07249567A (ja) * 1994-03-09 1995-09-26 Nikon Corp 露光装置
KR950033691A (ko) * 1994-04-12 1995-12-26 오노 시게오 주사형 노광 장치
JPH07326567A (ja) * 1994-05-31 1995-12-12 Nikon Corp 等倍投影型露光装置

Also Published As

Publication number Publication date
KR980011723A (ko) 1998-04-30
JPH1022219A (ja) 1998-01-23
JP3669063B2 (ja) 2005-07-06

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