JP3669063B2 - 投影露光装置 - Google Patents

投影露光装置 Download PDF

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Publication number
JP3669063B2
JP3669063B2 JP19553196A JP19553196A JP3669063B2 JP 3669063 B2 JP3669063 B2 JP 3669063B2 JP 19553196 A JP19553196 A JP 19553196A JP 19553196 A JP19553196 A JP 19553196A JP 3669063 B2 JP3669063 B2 JP 3669063B2
Authority
JP
Japan
Prior art keywords
mask
optical system
photosensitive substrate
mirror
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19553196A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1022219A5 (enExample
JPH1022219A (ja
Inventor
智秀 浜田
廣 白数
幸雄 柿崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP19553196A priority Critical patent/JP3669063B2/ja
Priority to KR1019970024882A priority patent/KR100492278B1/ko
Publication of JPH1022219A publication Critical patent/JPH1022219A/ja
Priority to US09/209,270 priority patent/US6317196B1/en
Priority to US09/955,116 priority patent/US6570641B2/en
Publication of JPH1022219A5 publication Critical patent/JPH1022219A5/ja
Application granted granted Critical
Publication of JP3669063B2 publication Critical patent/JP3669063B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP19553196A 1996-06-25 1996-07-05 投影露光装置 Expired - Fee Related JP3669063B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19553196A JP3669063B2 (ja) 1996-07-05 1996-07-05 投影露光装置
KR1019970024882A KR100492278B1 (ko) 1996-07-05 1997-06-16 투영노광장치
US09/209,270 US6317196B1 (en) 1996-06-25 1998-12-11 Projection exposure apparatus
US09/955,116 US6570641B2 (en) 1996-06-25 2001-09-19 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19553196A JP3669063B2 (ja) 1996-07-05 1996-07-05 投影露光装置

Publications (3)

Publication Number Publication Date
JPH1022219A JPH1022219A (ja) 1998-01-23
JPH1022219A5 JPH1022219A5 (enExample) 2004-07-29
JP3669063B2 true JP3669063B2 (ja) 2005-07-06

Family

ID=16342647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19553196A Expired - Fee Related JP3669063B2 (ja) 1996-06-25 1996-07-05 投影露光装置

Country Status (2)

Country Link
JP (1) JP3669063B2 (enExample)
KR (1) KR100492278B1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1070012C (zh) * 1998-08-04 2001-08-22 国家科学技术委员会高技术研究发展中心 全数字vsb调制器
TW392065B (en) * 1998-08-20 2000-06-01 Nikon Corp Laser interferometer, position measuring device and measuring method, exposure device and manufacturing methods thereof
EP1285222A4 (en) * 2000-05-17 2006-11-15 Zygo Corp INTERFEROMETRIC DEVICE AND INTERFEROMETRIC PROCEDURE
ATE502324T1 (de) * 2004-02-11 2011-04-15 Koninkl Philips Electronics Nv System und verfahren zum positionieren eines produkts

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
JPH07249567A (ja) * 1994-03-09 1995-09-26 Nikon Corp 露光装置
KR100363932B1 (ko) * 1994-04-12 2003-08-21 가부시키가이샤 니콘 주사형노광장치
JPH07326567A (ja) * 1994-05-31 1995-12-12 Nikon Corp 等倍投影型露光装置

Also Published As

Publication number Publication date
KR980011723A (ko) 1998-04-30
KR100492278B1 (ko) 2005-08-31
JPH1022219A (ja) 1998-01-23

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