KR100484383B1 - Anisotropic conductive adhesives for connecting circuit, and connecting method of circuit board and circuit connected structure material using the same - Google Patents

Anisotropic conductive adhesives for connecting circuit, and connecting method of circuit board and circuit connected structure material using the same Download PDF

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KR100484383B1
KR100484383B1 KR10-2001-0085782A KR20010085782A KR100484383B1 KR 100484383 B1 KR100484383 B1 KR 100484383B1 KR 20010085782 A KR20010085782 A KR 20010085782A KR 100484383 B1 KR100484383 B1 KR 100484383B1
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adhesive
anisotropic conductive
circuit connection
circuit
compound
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KR10-2001-0085782A
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KR20020055403A (en
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노무라사토유키
오노히로시
스토호코
유사마사미
후지나와토오루
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히다치 가세고교 가부시끼가이샤
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Priority claimed from JP2000399827A external-priority patent/JP2002201440A/en
Priority claimed from JP2001261675A external-priority patent/JP2003064332A/en
Priority claimed from JP2001261673A external-priority patent/JP4736280B2/en
Application filed by 히다치 가세고교 가부시끼가이샤 filed Critical 히다치 가세고교 가부시끼가이샤
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Conductive Materials (AREA)

Abstract

본 발명은 서로 대향하는 회로전극을 가지는 기판간에 개재시켜 서로 대향하는 회로전극을 가지는 기판을 가압하여, 가압방향의 전극간을 전기적으로 접속하는 이방도전성 회로접속용 접착제로서, 상기 접착제에는 (1) 라디칼 중합성화합물 및 (2) 염기성화합물 및 적어도 1개의 에폭시기를 가지는 화합물로 이루어지는 군에서 선택되는 적어도 1종의 화합물로 표면처리를 한 도전입자를 포함하는 것을 특징으로 하는 이방도전성 회로접속용 접착제, 이들을 사용한 회로판의 접속방법 및 회로접속 구조체를 개시한다.The present invention provides an anisotropic conductive circuit connection adhesive which presses a substrate having circuit electrodes facing each other by interposing between substrates having circuit electrodes facing each other, and electrically connects the electrodes in the pressing direction. An adhesive for anisotropic conductive circuit connection comprising a conductive polymer surface-treated with at least one compound selected from the group consisting of a radically polymerizable compound and (2) a basic compound and a compound having at least one epoxy group, Disclosed are a circuit board connecting method and a circuit connecting structure using the same.

Description

이방도전성 회로 접속용 접착제 및 이들을 이용한 회로판의 접속방법 및 회로접속 구조체{Anisotropic conductive adhesives for connecting circuit, and connecting method of circuit board and circuit connected structure material using the same}Anisotropic conductive adhesives for connecting circuit, and connecting method of circuit board and circuit connected structure material using the same}

본 발명은 이방도전성 회로 접속용 접착제 및 이들을 이용한 회로판의 접속 방법 및 회로접속 구조체에 관한 것으로서, 보다 상세하게는 저온 속경화성이 우수하고, 또한 보존안정성도 양호하여 접속저항이 안정한 이방도전성 회로 접속용 접착제 및 그것을 이용한 회로판의 접속 방법 및 접속 구조체에 관한 것이다.The present invention relates to an anisotropic conductive circuit connection adhesive, a circuit board connection method and a circuit connection structure using the same, and more particularly, for anisotropic conductive circuit connection having excellent low temperature fast curing properties and good storage stability and stable connection resistance. A connection method and a bonded structure of an adhesive agent and a circuit board using the same.

최근 반도체나 액정 디스플레이 등의 분야에서 전자부품을 고정하거나 회로접속을 행하기 위하여 각종의 접착재료가 사용되고 있다. 이들의 용도로는 점점 고밀도화, 고정세화가 진행되고, 접착제에도 높은 접착력이나 신뢰성이 요구되고 있다.Background Art In recent years, various adhesive materials have been used for fixing electronic components or making circuit connections in fields such as semiconductors and liquid crystal displays. Higher density and higher definition progress as these uses progress, and high adhesive force and reliability are calculated | required also for an adhesive agent.

특히, 회로접속재료로서는 액정 디스플레이와 TCP 또는 FPC와 TCP와의 접속, FPC와 프린트 배선판과의 접속에는 접착제 중에 도전입자를 분산시킨 이방도전성 회로 접속용 접착제가 사용되고 있다. 또, 최근에는 반도체 실리콘칩을 기판에 실장하는 경우에도 종래의 와이어본드(wire bond)가 아닌 반도체 실리콘칩을 페이스다운(face down)으로 기판에 직접 실장하는 소위 플립칩(flip chip) 실장이 행해지고 있고, 여기에서도 이방도전성 회로 접속용 접착제의 용도가 개시되어 있다(특개소 59-120436호, 특개소 60-191228호, 특개평 1-251787호, 특개평 7-90237호 공보).In particular, an adhesive for anisotropic conductive circuit connection in which conductive particles are dispersed in an adhesive is used for the connection between the liquid crystal display and the TCP or the FPC and the TCP, and the connection between the FPC and the printed wiring board as the circuit connection material. In recent years, even when the semiconductor silicon chip is mounted on a substrate, so-called flip chip mounting is performed in which a semiconductor silicon chip is directly mounted on the substrate instead of a conventional wire bond face down. In addition, the use of the adhesive agent for anisotropic conductive circuit connection is also disclosed here (JP-A-59-120436, JP-A-60-191228, JP-A- 1-251787, and JP-A-7-90237).

또, 최근, 정밀전자기기의 분야에서는 회로의 고밀도화가 진행되고 있고, 전극폭 및 전극간격이 매우 좁게 되고 있다. 이 때문에 종래의 에폭시수지계를 사용한 회로접속용 접착제의 접속조건에서는 배선의 탈락, 박리, 위치차이가 생기는 등의 문제점이 있었다. 또, 생산효율 향상을 위하여 10초이하로 접속할 수 있도록 접속시간의 단축화가 강하게 요구되어 왔고, 저온 속경화성이 필요불가결하게 되고 있다. 그 때문에 특개평 10-273636호 공보에는 라디칼중합성 물질을 사용한 회로 접속용 재료가 개시되어 있다.In recent years, in the field of precision electronic devices, circuit densification has been progressed, and electrode width and electrode spacing have become very narrow. For this reason, the connection conditions of the adhesive agent for circuit connection using the conventional epoxy resin system had the problem of a wiring | wire falling off, peeling, and a position difference. In addition, the shortening of the connection time has been strongly demanded for the connection of less than 10 seconds in order to improve the production efficiency, and low temperature fast curing is indispensable. Therefore, Japanese Patent Laid-Open No. 10-273636 discloses a circuit connection material using a radical polymerizable material.

그러나, (메타)아크릴레이트, 인산에스테르화합물 등의 라디칼 중합성물질과 도전입자를 포함하는 접착제를 공기 중에 방치하면 접속된 경우의 접속 저항이 상승한다고 하는 문제가 있다.However, when the adhesive containing radical polymerizable substances, such as a (meth) acrylate and a phosphate ester compound, and an electrically-conductive particle is left in air, there exists a problem that the connection resistance at the time of connection increases.

본 발명은 저온 속경화성이 우수하고, 또한 보존안정성도 양호하여 접속저항이 안정한 회로접속용 접착제, 고온도 조건하에서의 팟라이프(pot life)가 우수한 이방도전성 회로 접속용 접착제 및 그들을 사용한 회로판의 접속 방법 및 접속구조체를 제공하는 것에 있다. The present invention has excellent low temperature fast curing property and good storage stability, and has a stable connection resistance. An adhesive for anisotropic conductive circuit connection excellent in pot life under high temperature conditions, and a circuit board connection method using the same. And providing a connection structure.

본 발명은 도전입자를 균일 분사하여 이루어지는 수지필름상 형성물로서, 적어도 이하의 성분으로 이루어지는 것을 특징으로 하는 이방도전성 회로 접속용 접착제에 관한 것이다.The present invention relates to an anisotropic conductive circuit connection adhesive, comprising a resin film-form formed by uniformly spraying conductive particles, and comprising at least the following components.

(1) 표면에 Ag, Au, Pt 이외의 전이금속이 노출되어 있지 않은 도전입자,(1) conductive particles having no transition metal other than Ag, Au, or Pt exposed on their surface;

(2) 라디칼 중합성 물질,(2) radically polymerizable materials,

(3) 가열 또는 광에 의해 유리 라디칼을 발생하는 경화제.(3) A curing agent that generates free radicals by heating or light.

본 발명은 또, 도전입자를 균일분산하여 이루어지는 수지필름상 형성물로서, 적어도 이하의 성분으로 이루어지는 것을 특징으로 하는 이방도전성 회로 접속용 접착제에 관한 것이다.The present invention also relates to an adhesive for anisotropic conductive circuit connection, comprising a resin film-form formed by uniformly dispersing conductive particles, and comprising at least the following components.

(1) 표면에 Ag, Au, Pt 이외의 전이금속이 노출되어 있지 않은 도전입자,(1) conductive particles having no transition metal other than Ag, Au, or Pt exposed on their surface;

(2) 라디칼 중합성 물질,(2) radically polymerizable materials,

(3) 가열 또는 광에 의해 유리 라디칼을 발생하는 경화제 및(3) a curing agent that generates free radicals by heating or light, and

(4) 인산에스테르화합물.(4) Phosphate ester compound.

본 발명은 더욱이, 상기의 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 가지는 기판간에 개재시키고, 서로 대향하는 회로전극을 가지는 기판을 가압하고, 또, 경우에 따라 광(활성에너지)을 조사하여 가압방향의 전극간을 전기적으로 접속하는 회로판의 접속방법에 관한 것이다.The present invention further provides an anisotropic conductive circuit connection adhesive interposed between substrates having circuit electrodes opposing each other, pressurizing the substrates having opposing circuit electrodes, and irradiating light (active energy) in some cases. And a circuit board connecting method for electrically connecting the electrodes in the pressing direction.

본 발명은 또, 상기의 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 가지는 기판간에 개재시키고, 서로 대향하는 회로전극을 가지는 기판을 가압하여 가압방향의 전극간을 전기적으로 접속한 접속구조체에 관한 것이다. The present invention also relates to a connection structure in which the anisotropic conductive circuit connection adhesive is interposed between substrates having circuit electrodes facing each other, and the substrates having circuit electrodes facing each other are pressed to electrically connect the electrodes in the pressing direction. It is about.

본 발명의 이방도전성 회로 접속용 접착제는 실온고습도에 방치한 경우에도 접속초기, 내습시험, 냉열사이클 등 각종 신뢰성 시험 후에도 접속저항의 상승이나 접착강도의 저하가 억제되고 우수한 접속신뢰성을 나타낸다.Even if the adhesive for anisotropic conductive circuit connection of the present invention is left at room temperature and high humidity, an increase in connection resistance and a decrease in adhesive strength are suppressed even after various reliability tests such as initial connection, moisture resistance test, and cold cycle, and exhibit excellent connection reliability.

이방도전성 회로 접속용 접착제는 필름, 피착체 표면에 형성한 이방도전성 수지이다.The adhesive agent for anisotropic conductive circuit connection is an anisotropic conductive resin formed in the film and the to-be-adhered body surface.

본 발명은 또한 서로 대향하는 회로전극을 가지는 기판간에 개재시켜, 서로 대향하는 회로전극을 가지는 기판을 가압하여 가압방향의 전극간을 전기적으로 접속하는 이방도전성 회로 접속용 접착제로서, 상기 접착제는 (1) 라디칼 중합성 화합물 및 (2) 염기성 화합물 및 적어도 1개의 에폭시기를 가지는 화합물로 이루어지는 군에서 선택되는 적어도 1종의 화합물로 표면처리를 한 도전입자를 포함하는 것을 특징으로 하는 이방도전성 회로 접속용 접착제에 관한 것이다. 상기 이방도전성 회로 접속용 접착제는 광 또는 가열에 의해 라디칼을 발생하는 화합물, 또는 인산에스테르화합물을 포함하는 것이 바람직하다. 게다가, 본 발명의 이방도전성 회로 접속용 접착제는 표면처리에 사용하는 염기성 화합물이 아미노계 화합물인 것이 바람직하다.The present invention also provides an adhesive for anisotropic conductive circuit connection, which is interposed between substrates having opposite circuit electrodes and pressurizes substrates having opposite circuit electrodes to electrically connect the electrodes in the pressing direction. An adhesive for anisotropic conductive circuit connection, comprising: conductive particles surface-treated with at least one compound selected from the group consisting of: a radically polymerizable compound and (2) a basic compound and a compound having at least one epoxy group. It is about. It is preferable that the said adhesive agent for anisotropic conductive circuit connections contains the compound which generate | occur | produces a radical by light or heating, or the phosphate ester compound. Moreover, it is preferable that the basic compound used for surface treatment of the adhesive agent for anisotropic conductive circuit connections of this invention is an amino compound.

또, 본 발명의 또 하나의 형태는 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 가지는 기판간에 개재시켜, 서로 대향하는 회로전극을 가지는 기판을 가압하여 가압방향의 전극간을 전기적으로 접속한 접속구조체이고, 이방도전성 회로 접속용 접착제가 (1) 라디칼 중합성 화합물 및 (2) 염기성 화합물 및 적어도 1개의 에폭시기를 가지는 화합물로 이루어지는 군에서 선택된 적어도 1종의 화합물로 표면처리를 한 도전입자를 포함하는 접착제인 이방도전성 회로 접속구조체에 관한 것이다.In still another aspect of the present invention, an anisotropic conductive circuit connection adhesive is interposed between substrates having opposing circuit electrodes, and the substrates having opposing circuit electrodes are pressed to electrically connect the electrodes in the pressing direction. The conductive particles having a connection structure, wherein the adhesive for anisotropic conductive circuit connection is surface treated with at least one compound selected from the group consisting of (1) a radically polymerizable compound and (2) a basic compound and a compound having at least one epoxy group. It relates to an anisotropic conductive circuit connection structure which is an adhesive.

본 발명의 이방도전성 회로 접속용 접착제에서는 도전 입자의 표면에 Ag, Au, Pt 이외의 Ni 등의 전이금속이 노출되어 있지 않은 도전입자를 사용한다. 충분한 내습 팟라이프 및 접속신뢰성을 얻기 위해서는 가장 표면의 금속은 Au, Ag, 백금족의 귀금속류로 되고, Au가 보다 바람직하다.In the adhesive agent for anisotropic conductive circuit connections of this invention, the electroconductive particle which does not expose transition metals, such as Ni, other than Ag, Au, and Pt, to the surface of electroconductive particle is used. In order to obtain sufficient moisture resistance pot life and connection reliability, the metal on the surface becomes Au, Ag, platinum group precious metals, and Au is more preferable.

본 발명의 이방도전성 회로 접속용 접착제에 사용하는 도전입자는 전기적 접속을 얻을 수 있는 도전성을 가지고 있으면 특별히 제한은 없지만, Au, Ag, Ni, Cu, Co, 납 등의 금속입자나 카본 등을 들 수 있다. 또, 비도전성의 유리, 세라믹, 플라스틱 등을 상기 금속의 도전물질로 피복한 것도 사용할 수 있다. 이 때, 피복하는 금속층의 두께는 충분한 도전성을 얻기 위해서는 100Å이하가 바람직하다. Co, Zn, Cu, Ni 등의 전이금속 위에 귀금속류의 층을 설치하는 경우에는 귀금속류층의 결함이나 도전입자의 혼합분산시에 생기는 귀금속류층의 결함 등에 의해 생기는 산화환원작용으로 유리라디칼이 발생하고, 팟라이프 저하를 일으키기 때문에 도전입자를 표면처리한다. 도전입자는 회로 접속용 접착제 성분에 대해 0.1~30체적%의 범위로 사용하고, 바람직하게는 0.1~20체적%의 범위로 사용할 수 있다.The conductive particles used for the anisotropic conductive circuit connection adhesive of the present invention are not particularly limited as long as they have conductivity capable of obtaining electrical connection, but metal particles such as Au, Ag, Ni, Cu, Co, and lead, carbon, and the like can be cited. Can be. Moreover, the thing which coat | covered non-conductive glass, ceramic, plastics, etc. with the electrically conductive material of the said metal can also be used. At this time, in order to acquire sufficient electroconductivity, the thickness of the metal layer to coat | cover is 100 Pa or less is preferable. When a precious metal layer is provided on transition metals such as Co, Zn, Cu, and Ni, free radicals are generated by redox action caused by defects in the precious metal layer or defects in the precious metal layer caused by mixed dispersion of conductive particles. The conductive particles are surface treated because they cause a decrease in pot life. The conductive particles are used in the range of 0.1 to 30% by volume with respect to the adhesive component for circuit connection, and preferably in the range of 0.1 to 20% by volume.

도전입자의 표면을 처리하는 화합물로서 산성물질과 반응성을 가지는 화합물로 처리하는 것이 바람직하고, 이 처리에 의해 상기 이방도전성 회로 접속용 접착제의 보존 안정성을 현저하게 향상시킬 수 있다.It is preferable to treat it with a compound having reactivity with an acidic substance as a compound for treating the surface of the conductive particles, and by this treatment, the storage stability of the adhesive for anisotropic conductive circuit connection can be remarkably improved.

도전입자의 표면을 처리하는 화합물로서 염기성 화합물 또는 적어도 1개의 에폭시기를 가지는 화합물이 바람직하고, 특히 염기성 화합물로서는 아미노계 화합물이 바람직하다.As the compound for treating the surface of the conductive particles, a compound having a basic compound or at least one epoxy group is preferable, and an amino compound is particularly preferable as the basic compound.

아미노계 화합물로서는 액체이어도 고체이어도 좋고, 고체의 경우는 유기용제나 물 등에 용해시켜 사용한다. 또, 액체의 화합물에 있어서도 유기용제 등에 용해시켜 사용하는 것이 바람직하다. 유기용제로서는 아미노계 화합물과 반응성이 없이 아미노계 화합물이 용해하면 특별히 제한이 없지만, 메탄올, 에탄올, 이소프로판올, 메틸에틸케톤, 아세트산에틸, 톨루엔 등이 처리후 도전입자를 건조하는 점에서 바람직하다.The amino compound may be a liquid or a solid, and in the case of a solid, it is used after being dissolved in an organic solvent, water, or the like. Moreover, also in a liquid compound, it is preferable to melt | dissolve and use for an organic solvent. The organic solvent is not particularly limited as long as the amino compound is dissolved without reactivity with the amino compound. However, methanol, ethanol, isopropanol, methyl ethyl ketone, ethyl acetate, toluene and the like are preferable in terms of drying the conductive particles after treatment.

처리액 중에 포함되는 아미노계 화합물의 농도로서는 0.05~20중량%가 바람직하다. 0.05중량% 미만이면 표면처리가 유효하게 행해지지 않고, 20중량%를 초과하면 도전입자표면에 피복되는 아미노계 화합물의 양이 많게 되고, 접속저항이 높게 되어버린다.As a density | concentration of the amino compound contained in a process liquid, 0.05-20 weight% is preferable. If the amount is less than 0.05% by weight, the surface treatment is not effectively performed. If the amount is more than 20% by weight, the amount of the amino compound to be coated on the surface of the conductive particles increases, resulting in high connection resistance.

적어도 1개의 에폭시기를 가지는 화합물로서는 액체이어도 고체이어도 좋고, 고체의 경우는 유기용제나 물 등에 용해시켜 사용한다. 또, 액체의 화합물에 있어서도 유기용제 등에 용해시켜 사용하는 것이 바람직하다. 유기용제로서는 적어도 1개의 에폭시기를 가지는 화합물과 반응성이 없이 적어도 1개의 에폭시기를 가지는 화합물이 용해하면 특별히 제한은 없지만, 메탄올, 에탄올, 이소프로판올, 메틸에틸케톤, 아세트산에틸, 톨루엔 등이 표면처리 후의 도전입자를 건조하는 점에서 바람직하다.The compound having at least one epoxy group may be a liquid or a solid, and in the case of a solid, it is used after being dissolved in an organic solvent, water, or the like. Moreover, also in a liquid compound, it is preferable to melt | dissolve and use for an organic solvent. The organic solvent is not particularly limited as long as the compound having at least one epoxy group is dissolved without reactivity with the compound having at least one epoxy group, but methanol, ethanol, isopropanol, methyl ethyl ketone, ethyl acetate, toluene and the like are conductive particles after surface treatment. It is preferable at the point which dries.

처리액 중에 포함되는 적어도 1개의 에폭시기를 가지는 화합물의 농도로서는 0.05~20중량%가 바람직하다. 0.05중량% 미만이면 표면처리가 유효하게 행해지지 않고, 20중량%를 초과하면 도전입자 표면에 피복되는 적어도 1개의 에폭시기를 가지는 화합물의 양이 많게 되고, 접속저항이 높게 되어버린다.As a density | concentration of the compound which has at least 1 epoxy group contained in a process liquid, 0.05-20 weight% is preferable. If it is less than 0.05 weight%, surface treatment will not be performed effectively. If it exceeds 20 weight%, the quantity of the compound which has at least 1 epoxy group coat | covered on the surface of a conductive particle will become large, and connection resistance will become high.

표면처리를 하는 경우의 온도, 시간 등의 처리조건은 특별히 제한은 없지만, 처리온도는 실온(25℃)~100℃, 처리시간은 10초~1시간의 범위인 것이 바람직하다.Although the processing conditions, such as temperature and time in the case of surface treatment, do not have a restriction | limiting in particular, It is preferable that processing temperature is the range of room temperature (25 degreeC)-100 degreeC, and processing time is 10 second-1 hour.

또, 처리한 도전입자는 여과후 건조하여 사용한다. 건조조건은 사용하는 유기용매에 따라 적의선택되지만, 실온(25℃)~150℃에서 행한다.The treated conductive particles are dried after filtration and used. Drying conditions are appropriately selected depending on the organic solvent used, but are carried out at room temperature (25 ° C) to 150 ° C.

본 발명의 표면처리에 사용하는 염기성 화합물, 즉 아미노계 화합물로서는 트리에틸아민, 디에틸아민, 부틸아민, 에틸렌디아민, 헥사메틸디아민, 아닐린, 아미노프로필트리메톡시실란, 이미다졸, 2-에틸-4-메틸이미다졸, 2-페닐-1-시아노에틸이미다졸, 비닐이미다졸, 비닐피리딘 등을 들 수 있고, 아민계로서는 1급, 2급, 3급아민을 들 수 있고, 이들은 2종 이상을 혼합하여 사용하여도 좋다.As a basic compound used for the surface treatment of this invention, ie, an amino compound, triethylamine, diethylamine, butylamine, ethylenediamine, hexamethyldiamine, aniline, aminopropyltrimethoxysilane, imidazole, 2-ethyl- 4-methylimidazole, 2-phenyl-1-cyanoethylimidazole, vinylimidazole, vinylpyridine, and the like. Examples of the amine type include primary, secondary and tertiary amines. You may use these 2 or more types in mixture.

본 발명에서 표면처리에 사용하는 적어도 1개의 에폭시기를 가지는 화합물로서는 페닐글리시딜에테르, 글리시딜(메타)아크릴레이트, γ-글리시드옥시프로필트리메톡시실란, γ-글리시드옥시프로필메틸트리에톡시실란, γ-글리시드옥시프로필메틸디메톡시실란, γ-글리시옥시프로필메틸에톡시실란, β-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 비스페놀A형에폭시수지, 비스페놀F형에폭시수지, 비스페놀S형에폭시수지, 페놀노블락형에폭시수지, 크레졸노블락형에폭시수지, 비스페놀A노블락형에폭시수지, 비스페놀F노블락형에폭시수지, 지환식에폭시수지, 글리시딜에스테르형에폭시수지, 글리시딜아민형에폭시수지, 히단토인형에폭시수지, 이소시아네이트형에폭시수지, 지방족쇄상에폭시수지 등이 있고, 이들 에폭시수지는 할로겐화되어 있어도 좋고, 수소첨가되어 있어도 좋다. 이들 에폭시화합물은 2종 이상을 병용하여도 좋다.As a compound which has at least 1 epoxy group used for surface treatment in this invention, phenyl glycidyl ether, glycidyl (meth) acrylate, (gamma)-glycidoxy propyl trimethoxysilane, (gamma)-glycidoxy propyl methyl tri Ethoxysilane, (gamma)-glycidoxy propylmethyldimethoxysilane, (gamma) -glycioxy propylmethylethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, bisphenol-A epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol no block type epoxy resin, cresol no block type epoxy resin, bisphenol A no block type epoxy resin, bisphenol F no block type epoxy resin, alicyclic epoxy resin, glycidyl ester type epoxy resin, Glycidyl amine epoxy resins, hydantoin epoxy resins, isocyanate epoxy resins, and epoxy resins on aliphatic chains. These epoxy resins may be halogenated. , It may be hydrogenated. These epoxy compounds may use 2 or more types together.

본 발명의 이방도전성 회로 접속용 접착제에 사용하는 라디칼 중합성 화합물은 라디칼에 의해 중합하는 관능기를 가지는 화합물로, (메타)아크릴레이트수지, 말레이미드수지, 시트라콘이미드수지, 나디이미드수지 등이 있고, 2종류 이상을 혼합하여 사용하여도 좋다. 또 라디칼 중합성 화합물은 모노머, 올리고머 어느 상태로도 사용할 수 있고, 모노머와 올리고머를 혼합하여 사용하여도 좋다. 여기서, 「(메타)아크릴레이트」라는 것은 아크릴레이트 및 그것에 대응하는 메타아크릴레이트를 의미한다.The radically polymerizable compound used for the adhesive for anisotropic conductive circuit connections of the present invention is a compound having a functional group which is polymerized by radicals, and (meth) acrylate resin, maleimide resin, citraconimide resin, nadiimide resin, and the like. You may mix and use two or more types. Moreover, a radically polymerizable compound can be used also in the state of a monomer and an oligomer, and you may use it, mixing a monomer and an oligomer. Here, "(meth) acrylate" means an acrylate and the methacrylate corresponding to it.

(메타)아크릴레이트수지로서는 (메타)아크릴레이트를 라디칼 중합시키므로써 얻을 수 있는 것으로, (메타)아크릴레이트로서는 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 이소프로필(메타)아크릴레이트, 이소부틸(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 테트라메틸렌글리콜테트라(메타)아크릴레이트, 2-히드록시-1,3-디아크릴옥시프로판, 2,2-비스[4-(아크릴옥시메톡시)페닐]프로판, 2,2-비스[4-(아크릴옥시에톡시)페닐]프로판, 디시클로펜테닐(메타)아크릴레이트, 트리시클로데카닐(메타)아크릴레이트, 트리스(아크릴옥시에틸)이소시아네이트, 우레탄(메타)아크릴레이트, 이소시아눌산에틸렌옥사이드변성디아크릴레이트 등을 들 수 있고, 단독 또는 2종 이상을 혼합하여 사용하여도 좋다. 또, 필요에 따라서는 하이드로키논, 메틸에테르하이드로키논 등의 라디칼 중합금지제를 경화성이 손상되지 않는 범위에서 사용하여도 좋다.As (meth) acrylate resin, it is obtained by radically polymerizing (meth) acrylate. As (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, Isobutyl (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylene glycol tetra (meth) acrylate, 2-hydrate Oxy-1,3-diacryloxypropane, 2,2-bis [4- (acryloxymethoxy) phenyl] propane, 2,2-bis [4- (acryloxyethoxy) phenyl] propane, dicyclophene Tenyl (meth) acrylate, tricyclodecanyl (meth) acrylate, tris (acryloxyethyl) isocyanate, urethane (meth) acrylate, isocyanurate ethylene oxide modified diacrylate, and the like, 2 may be mixed with a more thereof. If necessary, radical polymerization inhibitors such as hydrokinone and methyl ether hydrokinone may be used in a range where the curability is not impaired.

또한, 라디칼 중합성 화합물로서 인산에스테르화합물을 사용한 경우, 금속 등 무기물에 대한 접착력을 향상시킬 수 있다. 이 인산에스테르화합물의 사용량은 접착제성분 100중량부에 대하여 0.1~10중량부이고, 바람직하게는 0.5~5중량부이다. 인산에스테르화합물은 무수인산과 2-히드록시에틸(메타)아크릴레이트의 반응 생성물로서 얻어진다. 구체적으로는 모노(2-메타아크릴로옥시에틸)에시드포스페이트, 디(2-메타아크릴로일옥시에틸)에시드포스페이트 등이 있고, 단독으로 또는 혼합하여 사용하여도 좋다.Moreover, when a phosphate ester compound is used as a radically polymerizable compound, the adhesive force with respect to inorganic substances, such as a metal, can be improved. The usage-amount of this phosphate ester compound is 0.1-10 weight part with respect to 100 weight part of adhesive components, Preferably it is 0.5-5 weight part. A phosphate ester compound is obtained as a reaction product of phosphoric anhydride and 2-hydroxyethyl (meth) acrylate. Specific examples thereof include mono (2-methacrylooxyethyl) acid phosphate and di (2-methacryloyloxyethyl) acid phosphate, and may be used alone or in combination.

말레이미드수지로서는 분자 중에 말레이미드기를 적어도 1개 가지고 있는 것으로, 예컨대 페닐말레이미드, 1-메틸-2,4-비스말레이미드벤젠, N,N'-m-페닐렌비스말레이미드, N,N'-p-페닐렌비스말레이미드, N,N'-4,4-비페닐렌비스말레이미드, N,N'-4,4-(3,3-디메틸비페닐렌)비스말레이미드, N,N'-4,4-(3,3-디메틸디페닐메탄)비스말레이미드, N,N'-4,4-(3,3-디에틸디페닐메탄)비스말레이미드, N,N'-4,4-디페닐메탄비스말레이미드, N,N'-4,4-디페닐프로판비스말레이미드, N,N'-4,4-디페닐에테르비스말레이미드, N,N'-4,4-디페닐설폰비스말레이미드, 2,2-비스(4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-s-부틸-3,4-(4-말레이미드페녹시)페닐)프로판, 1,1-비스(4-(4-말레이미드페녹시)페닐)데칸, 4,4'-시클로헥실리덴-비스(1-(4-말레이미드페녹시)페녹시)-2-디시클로헥실벤젠, 2,2-비스(4-(4-말레이미드페녹시)페닐)헥사플루오로프로판 등이 있고, 단독으로 또는 2종 이상을 혼합하여 사용하여도 좋다.The maleimide resin has at least one maleimide group in the molecule, such as phenylmaleimide, 1-methyl-2,4-bismaleimide benzene, N, N'-m-phenylenebismaleimide, N, N '-p-phenylenebismaleimide, N, N'-4,4-biphenylenebismaleimide, N, N'-4,4- (3,3-dimethylbiphenylene) bismaleimide, N , N'-4,4- (3,3-dimethyldiphenylmethane) bismaleimide, N, N'-4,4- (3,3-diethyldiphenylmethane) bismaleimide, N, N ' -4,4-diphenylmethanebismaleimide, N, N'-4,4-diphenylpropanebismaleimide, N, N'-4,4-diphenyletherbismaleimide, N, N'-4 , 4-diphenylsulfonbismaleimide, 2,2-bis (4- (4-maleimidephenoxy) phenyl) propane, 2,2-bis (3-s-butyl-3,4- (4-maleic Midphenoxy) phenyl) propane, 1,1-bis (4- (4-maleimidephenoxy) phenyl) decane, 4,4'-cyclohexylidene-bis (1- (4-maleimidephenoxy) Phenoxy) -2-dicyclohexylbenzene, 2,2-bis (4- (4-maleic) De) phenyl) and the like hexafluoropropane, it may be used either individually or in combination of two or more thereof.

시트라콘이미드수지로서는, 분자 중에 시트라콘이미드기를 적어도 1개 가지고 있는 시트라콘이미드 화합물을 중합시킨 것으로, 시트라콘이미드 화합물로서는, 예컨대 페닐시트라콘이미드, 1-메틸-2,4-비스시트라콘이미드벤젠, N,N'-m-페닐렌비스시트라콘이미드, N,N'-p-페닐렌비스시트라콘이미드, N,N'-4,4-비페닐렌비스시트라콘이미드, N,N'-4,4-(3,3-디메틸비페닐렌)비스시트라콘이미드, N,N'-4,4-(3,3-디메틸디페닐메탄)비스시트라콘이미드, N,N'-4,4-(3,3-디에틸디페닐메탄)비스시트라콘이미드, N,N'-4,4-디페닐메탄비스시트라콘이미드, N,N'-4,4-디페닐프로판비스시트라콘이미드, N,N'-4,4-디페닐에테르비스시트라콘이미드, N,N'-4,4-디페닐설폰비스시트라콘이미드, 2,2-비스(4-(4-시트라콘이미드페녹시)페닐)프로판, 2,2-비스(3-s-부틸-3,4-(4-시트라콘이미드페녹시)페닐)프로판, 1,1-비스(4-(4-시트라콘이미드페녹시)페닐)데칸, 4,4'-시클로헥실리덴-비스(1-(4-시트라콘이미드페녹시)페녹시)-2-시클로헥실벤젠, 2,2-비스(4-(4-시트라콘이미드페녹시)페닐)헥사플루오로프로판 등이 있고, 단독으로 또는 2종류 이상을 혼합하여 사용하여도 좋다.As the citraconimide resin, a citraconimide compound having at least one citraconimide group in a molecule is polymerized. Examples of the citraconimide compound include phenylcitraconimide and 1-methyl-2,4. Biscitraconimide benzene, N, N'-m-phenylenebiscitraconimide, N, N'-p-phenylenebiscitraconimide, N, N'-4,4-biphenylene Biscitraconimide, N, N'-4,4- (3,3-dimethylbiphenylene) biscitraconimide, N, N'-4,4- (3,3-dimethyldiphenylmethane) Biscitraconimide, N, N'-4,4- (3,3-diethyldiphenylmethane) biscitraconimide, N, N'-4,4-diphenylmethanebiscitraconimide, N, N'-4,4-diphenylpropanebiscitraconimide, N, N'-4,4-diphenyletherbiscitraconimide, N, N'-4,4-diphenylsulfonbissheet Laconimide, 2,2-bis (4- (4-citraconimidephenoxy) phenyl) propane, 2,2-bis (3-s-butyl-3,4- (4-citraconimidephenoxy Phenyl) propane , 1,1-bis (4- (4-citraconimidephenoxy) phenyl) decane, 4,4'-cyclohexylidene-bis (1- (4-citraconimidephenoxy) phenoxy) 2-cyclohexyl benzene, 2, 2-bis (4- (4-citraconimide phenoxy) phenyl) hexafluoro propane, etc. may be used individually or in mixture of 2 or more types.

나디이미드수지로서는 분자 중에 나디이미드기를 적어도 1개 가지고 있는 나디이미드 화합물을 중합한 것으로, 나디이미드 화합물로서는, 예컨대 페닐나디이미드, 1-메틸-2,4-비스나디이미드벤젠, N,N'-m-페닐렌비스나디이미드, N,N'-p-페닐렌비스나디이미드, N,N'-4,4-비페닐렌비스나디이미드, N,N'-4,4-(3,3-디메틸비페닐렌)비스나디이미드, N,N'-4,4-(3,3-디메틸디페닐메탄)비스나디이미드, N,N'-4,4-(3,3-디에틸디페닐메탄)비스나디이미드, N,N'-4,4-디페닐메탄비스나디이미드, N,N'-4,4-디페닐프로판비스나디이미드, N,N'-4,4-디페닐에테르비스나디이미드, N,N'-4,4-디페닐설폰비스나디이미드, 2,2-비스(4-(4-나디이미드페녹시)페닐)프로판, 2,2-비스(3-s-부틸-3,4-(4-나디이미드페녹시)페닐)프로판, 1,1-비스(4-(4-나디이미드페녹시)페닐)데칸, 4,4-시클로헥실리덴-비스(1-(4-나디이미드페녹시)페녹시)-2-시클로헥실벤젠, 2,2-비스(4-(4-나디이미드페녹시)페닐)헥사플루오로프로판 등이 있고, 단독으로 또는 2종류 이상을 혼합하여 사용하여도 좋다.As a nadiimide resin, it polymerized the nadiimide compound which has at least 1 nadiimide group in a molecule | numerator, As a nadiimide compound, For example, Phenylimide, 1-methyl- 2, 4-bisnamidimide benzene, N, N'- m-phenylenebisnamidimide, N, N'-p-phenylenebisnamidimide, N, N'-4,4-biphenylenebisnamidimide, N, N'-4,4- (3,3 -Dimethylbiphenylene) bisnamidimide, N, N'-4,4- (3,3-dimethyldiphenylmethane) bisnamidimide, N, N'-4,4- (3,3-diethyldi Phenylmethane) bisnamidimide, N, N'-4,4-diphenylmethanebisnamidimide, N, N'-4,4-diphenylpropanebisnamidimide, N, N'-4,4-diphenyl Etherbisnamidimide, N, N'-4,4-diphenylsulfonbisnamidimide, 2,2-bis (4- (4-namidimidephenoxy) phenyl) propane, 2,2-bis (3-s -Butyl-3,4- (4-diimidephenoxy) phenyl) propane, 1,1-bis (4- (4-diimidephenoxy) phenyl) decane, 4,4-cyclohexylidene-bis ( 1- (4-nadiiimide (Oxy)) phenoxy) -2-cyclohexylbenzene, 2,2-bis (4- (4-nadiimidphenoxy) phenyl) hexafluoropropane, and the like, or used alone or in combination of two or more thereof. good.

상기 라디칼 중합성 화합물을 사용한 경우에는 가열 또는 광에 의해 유리라디칼을 발생하는 경화제로서 중합개시제를 사용한다. 중합개시제로서는, 광 또는 가열에 의해 라디칼을 발생하는 화합물이면 특별히 제한은 없고, 과산화물, 아조화합물 등이 있고, 목적으로 하는 접속온도, 접속시간, 보존안정성 등을 고려하여 적의선택되지만, 고반응성과 보존안정성의 점에서 반감기 10시간의 온도가 40℃ 이상, 또한 반감기 1분의 온도가 180℃ 이하의 유기과산화물이 바람직하고, 반감기 10시간의 온도가 50℃ 이상 또한, 반감기 1분의 온도가 170℃ 이하의 유기과산화물이 특히 바람직하다. 접속시간을 10초로 한 경우, 충분한 반응율을 얻기 위하여 중합개시제의 배합량은 접착제의 총량에 대해 1~20중량%가 바람직하고, 2~15중량%가 특히 바람직하다. 사용되는 유기과산화물의 구체적인 화합물로서는 디아실퍼옥사이드, 퍼옥시디카보네이트, 퍼옥시에스테르, 퍼옥시케탈, 디알킬퍼옥사이드, 하이드로퍼옥사이드, 시릴퍼옥사이드 등으로부터 선정할 수 있지만, 퍼옥시에스테르, 디알킬퍼옥사이드, 하이드로퍼옥사이드, 시릴퍼옥사이드는 개시제 중의 염소이온이나 유기산이 5000ppm 이하이고, 분해 후에 발생하는 유기산이 적고, 회로부재의 접속단자의 부식을 억제할 수 있기 때문에 특히 바람직하다. 고반응성이 얻어지는 퍼옥시에스테르로부터 선정되는 것이 더욱 바람직하다. 이들은 적의혼합하여 이용할 수 있다.In the case of using the radically polymerizable compound, a polymerization initiator is used as a curing agent for generating free radicals by heating or light. The polymerization initiator is not particularly limited as long as it is a compound that generates radicals by light or heating, and there are peroxides, azo compounds, and the like, and are appropriately selected in consideration of the desired connection temperature, connection time, storage stability, and the like. From the point of storage stability, an organic peroxide having a temperature of 10 hours for a half life of 40 ° C or more and a temperature of 1 minute for a half life of 180 ° C or less is preferred, and a temperature of 50 minutes or more for a half life of 10 hours and a temperature of 1 minute for a half life of 170 Particular preference is given to organic peroxides at or below 캜. When the connection time is 10 seconds, in order to obtain a sufficient reaction rate, the blending amount of the polymerization initiator is preferably 1 to 20% by weight, particularly preferably 2 to 15% by weight based on the total amount of the adhesive. As a specific compound of the organic peroxide to be used, it can be selected from diacyl peroxide, peroxy dicarbonate, peroxy ester, peroxy ketal, dialkyl peroxide, hydroperoxide, and cyryl peroxide, but peroxy ester, dialkyl peroxide Oxides, hydroperoxides and silyl peroxides are particularly preferred because they have 5000 ppm or less of chlorine ions or organic acids in the initiator, few organic acids generated after decomposition, and can suppress corrosion of the connection terminals of the circuit members. It is more preferable to select from the peroxy ester from which high reactivity is obtained. These can be mixed and used by an enemy.

디아실퍼옥사이드류로서는 이소부틸퍼옥사이드, 2,4-디클로로벤조일퍼옥사이드, 3,5,5,-트리메틸헥사노일퍼옥사이드, 옥타노일퍼옥사이드, 라우로일퍼옥사이드, 스테아로일퍼옥사이드, 숙시닉퍼옥사이드, 벤조일퍼옥시톨루엔, 벤조일퍼옥사이드 등을 들 수 있다.As the diacyl peroxides, isobutyl peroxide, 2,4-dichlorobenzoyl peroxide, 3,5,5, -trimethylhexanoyl peroxide, octanoyl peroxide, lauroyl peroxide, stearoyl peroxide and succinic peroxide , Benzoyl peroxy toluene, benzoyl peroxide and the like.

퍼옥시디카보네이트류로서는 디-n-프로필퍼옥시디카보네이트, 디이소프로필퍼옥시디카보네이트, 비스(4-t-부틸시클로헥실)퍼옥시디카보네이트, 디-2-에톡시메톡시퍼옥시디카보네이트, 디(2-에틸헥실퍼옥시)디카보네이트, 디메톡시부틸퍼오옥시디카보네이트, 디(3-메틸-3-메톡시부틸퍼옥시)디카보네이트 등을 들 수 있다.As peroxydicarbonates, di-n-propyl peroxydicarbonate, diisopropyl peroxydicarbonate, bis (4-t-butylcyclohexyl) peroxydicarbonate, di-2-ethoxymethoxy peroxydicarbonate, di (2 -Ethylhexyl peroxy) dicarbonate, dimethoxy butyl perooxy dicarbonate, di (3-methyl-3- methoxy butyl peroxy) dicarbonate, etc. are mentioned.

퍼옥시에스테르류로서는 큐밀퍼옥시네오데카노에이트, 1,1,3,3-테트라메틸부틸퍼옥시네오데카노에이트, 1-시클로헥실-1-메틸에틸퍼옥시네오데카노에이트, t-헥실퍼옥시네오데카노에이트, t-부틸퍼옥시피바레이트, 1,1,3,3-테트라메틸부틸퍼옥시-2-에틸헥사노네이트, 2,5-디메틸-2,5-디(2-에틸헥사노일퍼옥시)헥산, 1-시클로헥실-1-메틸에틸퍼옥시-2-에틸헥사노네이트, t-헥실퍼옥시-2-에틸헥사노네이트, t-부틸퍼옥시-2-에틸헥사노네이트, t-부틸퍼옥시이소부틸레이트, 1,1-비스(t-부틸퍼옥시)시클로헥산, t-헥실퍼옥시이소프로필모노카보네이트, t-부틸퍼옥시-3,5,5-트리메틸헥사노네이트, t-부틸퍼옥시라우릴레이트, 2,5-디메틸-2,5-디(m-톨루일퍼옥시)헥산, t-부틸퍼옥시이소프로필모노카보네이트, t-부틸퍼옥시-2-에틸헥실모노카보네이트, t-헥실퍼옥시벤조에이트, t-부틸퍼옥시아세테이트 등을 들 수 있다.As peroxy ester, cumyl peroxy neodecanoate, 1,1,3,3- tetramethylbutyl peroxy neodecanoate, 1-cyclohexyl-1-methylethyl peroxy neodecanoate, t-hex Silperoxyneodecanoate, t-butylperoxy pibarate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, 2,5-dimethyl-2,5-di (2- Ethylhexanoylperoxy) hexane, 1-cyclohexyl-1-methylethylperoxy-2-ethylhexanoate, t-hexylperoxy-2-ethylhexanoate, t-butylperoxy-2-ethylhexa Nonate, t-butylperoxy isobutylate, 1,1-bis (t-butylperoxy) cyclohexane, t-hexylperoxyisopropyl monocarbonate, t-butylperoxy-3,5,5-trimethyl Hexanonate, t-butylperoxylaurylate, 2,5-dimethyl-2,5-di (m-toluylperoxy) hexane, t-butylperoxyisopropylmonocarbonate, t-butylperoxy-2 Ethylhexyl monocarbonate, t-hexyl peroxybenzoate, t-butyl peroxy acetate, etc. are mentioned.

퍼옥시케탈류로서는 1,1-비스(t-헥실퍼옥시)-3,3,5-트리메틸시클로헥산, 1,1-비스(t-헥실퍼옥시)시클로헥산, 1,1-비스(t-부틸퍼옥시)-3,3,5-트리메틸시클로헥산, 1,1-(t-부틸퍼옥시)시클로도데칸, 2,2-비스(t-부틸퍼옥시)데칸 등을 들 수 있다.As peroxy ketals, 1, 1-bis (t-hexyl peroxy) -3, 3, 5- trimethyl cyclohexane, 1, 1-bis (t-hexyl peroxy) cyclohexane, 1, 1-bis (t -Butyl peroxy) -3,3,5-trimethylcyclohexane, 1,1- (t-butylperoxy) cyclododecane, 2,2-bis (t-butylperoxy) decane, and the like.

디알킬퍼옥사이드류로서는 α,α'-비스(t-부틸퍼옥시)디이소프로필벤젠, 디큐밀퍼옥사이드, 2,5-디메틸-2,5-디(t-부틸퍼옥시)헥산, t-부틸큐밀퍼옥사이드 등을 들 수 있다.Examples of the dialkyl peroxides include α, α'-bis (t-butylperoxy) diisopropylbenzene, dicumylperoxide, 2,5-dimethyl-2,5-di (t-butylperoxy) hexane, t- Butyl cumyl peroxide etc. are mentioned.

하이드로퍼옥사이드류로서는 디이소프로필벤젠하이드로퍼옥사이드, 큐멘하이드로퍼옥사이드 등을 들 수 있다.Diisopropyl benzene hydroperoxide, cumene hydroperoxide, etc. are mentioned as hydroperoxides.

시릴퍼옥사이드류로서는 t-부틸트리메틸시릴퍼옥사이드, 비스(t-부틸)디메틸시릴퍼옥사이드, t-부틸트리비닐시릴퍼옥사이드, 비스(t-부틸)디비닐시릴퍼옥사이드, 트리스(t-부틸)비닐시릴퍼옥사이드, t-부틸트리아릴시릴퍼옥사이드, 비스(t-부틸)디아릴시릴퍼옥사이드, 트리스(t-부틸)아릴시릴퍼옥사이드 등을 들 수 있다.Examples of the silyl peroxides include t-butyltrimethylsilyl peroxide, bis (t-butyl) dimethylsilyl peroxide, t-butyltrivinylsilyl peroxide, bis (t-butyl) divinylsilyl peroxide and tris (t-butyl ) Vinylsilyl peroxide, t-butyl triaryl silyl peroxide, bis (t-butyl) diaryl silyl peroxide, tris (t-butyl) aryl silyl peroxide, etc. are mentioned.

또, 회로부재의 접속단자의 부식을 억제하기 위하여 유리 라디칼 발생제(경화제) 중에 함유되는 염소이온이나 유기산은 5000ppm 이하인 것이 바람직하고, 더욱이 가열분해 후에 발생하는 유기산이 적은 것이 보다 바람직하다. 또, 제작한 회로접속재료의 안정성이 향상하는 것으로 실온(25℃), 상압하에서 24시간의 개방방치후에 20중량% 이상의 중량보지율을 가지는 것이 바람직하다. 이들은 적의혼합하여 사용할 수 있다.Moreover, in order to suppress corrosion of the connection terminal of a circuit member, it is preferable that chlorine ion and organic acid contained in a free radical generating agent (curing agent) are 5000 ppm or less, and it is more preferable that there are few organic acids which generate | occur | produce after thermal decomposition. Moreover, in order to improve the stability of the produced circuit connection material, it is preferable to have a weight retention rate of 20 weight% or more after opening for 24 hours at room temperature (25 degreeC) and normal pressure. These can be used in admixture.

이들 유리라디칼 발생제는 단독 또는 혼합하여 사용할 수 있고, 분해촉진제, 억제제 등을 혼합하여 사용하여도 좋다.These free radical generators may be used alone or in combination, or may be used by mixing a decomposition accelerator, an inhibitor and the like.

또, 이들 유리 라디칼 발생제를 폴리우레탄계, 폴리에스테르계의 고분자물질 등으로 피복하여 마이크로캡슐화한 것은 가용시간이 연장되기 때문에 바람직하다.In addition, it is preferable to coat these free radical generators with a polyurethane-based, polyester-based high molecular material, and the like to microencapsulate them, since the pot life is extended.

라디칼 중합성 화합물 이외에 열경화성 수지로서 에폭시수지를 배합할 수도 있다. 에폭시수지로서는 비스페놀A형에폭시수지, 비스페놀F형에폭시수지, 비스페놀S형에폭시수지, 페놀노블락형에폭시수지, 크레졸노블락형에폭시수지, 비스페놀A노블락형에폭시수지, 비스페놀F노블락형에폭시수지, 지환식에폭시수지, 글리시딜에스테르형에폭시수지, 글리시딜아민형에폭시수지, 히단토인형에폭시수지, 이소시아누레이트형에폭시수지, 지방족쇄상에폭시수지 등이 있고, 이들 에폭시수지는 할로겐화되어 있어도 좋고, 수소첨가되어 있어도 좋다. 이들 에폭시수지는 2종 이상을 병용하여도 좋다.In addition to the radically polymerizable compound, an epoxy resin may be blended as the thermosetting resin. Examples of epoxy resins include bisphenol A epoxy resins, bisphenol F epoxy resins, bisphenol S epoxy resins, phenol noblock epoxy resins, cresol noblock epoxy resins, bisphenol A noblock epoxy resins, bisphenol F noblock epoxy resins, and alicyclic epoxy resins. Resins, glycidyl ester type epoxy resins, glycidyl amine type epoxy resins, hydantoin type epoxy resins, isocyanurate type epoxy resins, and epoxy resins on aliphatic chains, and these epoxy resins may be halogenated, Hydrogen may be added. These epoxy resins may use 2 or more types together.

또, 상기 에폭시 수지의 경dS화제로서는 아민류, 페놀류, 산무수물류, 이미다졸류, 디시안디아미드 등 통상의 에폭시수지의 경화제로서 사용되고 있는 것을 들 수 있다. 또한, 경화촉진제로서 통상 사용되고 있는 3급아민류, 유기인계화합물을 적의사용하여도 좋다.Moreover, as a hard dS agent of the said epoxy resin, what is used as hardening | curing agent of normal epoxy resins, such as amines, phenols, acid anhydrides, imidazoles, and dicyandiamide, is mentioned. In addition, tertiary amines and organophosphorus compounds commonly used as curing accelerators may be suitably used.

또, 에폭시 수지를 반응시키는 방법으로서 상기 경화제를 사용하는 이외에, 설포늄염, 요오드늄염 등을 사용하여 양이온 중합시켜도 좋다.Moreover, in addition to using the said hardening | curing agent as a method of making an epoxy resin react, you may carry out cation polymerization using a sulfonium salt, an iodonium salt, etc.

본 발명의 회로접속용 접착제 또는 이방도전성 수지 필름상 형성물에는 필름 형성성, 접착성, 경화시의 반응완화성을 부여하기 위하여 폴리비닐부티랄수지, 폴리비닐포르말수지, 폴리에스테르수지, 폴리아미드수지, 폴리이미드수지, 키실렌수지, 페녹시수지, 폴리우레탄수지, 요소수지 등 고분자성분이 사용된다. 이들 고분자 성분은 분자량이 10,000~10,000,000의 것이 바람직하다. 또, 이들 수지는 라디칼 중합성의 관능기로 변성되어 있어도 좋고, 이 경우 내열성이 향상한다. 또한, 라디칼 중합성의 관능기나 에폭시기, 카르복실기 등으로 변성되어 있어도 좋고, 이 경우 내열성이 향상한다. 고분자 성분의 배합량은 2~80중량%이고, 5~70중량%가 바람직하고, 10~60중량%가 특히 바람직하다. 2중량% 미만에서는 응력완화나 접착력이 충분하지 않고, 80중량%를 초과하면 유동성이 저하한다.In order to provide the film formation property, adhesiveness, and the reaction relaxation property at the time of hardening, the adhesive agent for circuit connection or the anisotropic conductive resin film form of this invention is polyvinyl butyral resin, polyvinyl formal resin, polyester resin, poly Polymeric components such as amide resin, polyimide resin, xylene resin, phenoxy resin, polyurethane resin, and urea resin are used. These polymer components preferably have a molecular weight of 10,000 to 10,000,000. Moreover, these resin may be modified | denatured by the radically polymerizable functional group, and in this case, heat resistance improves. Moreover, it may be modified | denatured with a radically polymerizable functional group, an epoxy group, a carboxyl group, etc., and heat resistance improves in this case. The compounding quantity of a macromolecular component is 2-80 weight%, 5-70 weight% is preferable and 10-60 weight% is especially preferable. If it is less than 2 weight%, stress relaxation and adhesive force are not enough, and when it exceeds 80 weight%, fluidity will fall.

본 발명의 이방도전성 회로 접속용 접착제에는 적절한 충진제, 연화제, 촉진제, 노화방지제, 착색제, 난연제, 커플링제를 첨가하여도 좋다.Appropriate fillers, softeners, accelerators, anti-aging agents, colorants, flame retardants, and coupling agents may be added to the adhesive for anisotropic conductive circuit connections of the present invention.

충진재를 함유한 경우, 접속신뢰성 등의 향상이 얻어지기 때문에 바람직하다. 충진재의 최대경이 도전입자의 입경 미만이면 사용가능하고, 5~60체적%의 범위가 바람직하다. 60체적%를 초과하면 신뢰성 향상의 효과가 포화된다. 커플링제로서는 비닐기, 아크릴기, 아미노기, 에폭시기, 아지드기 및 비이소시아네이트기 함유물이 접착성 향상의 점에서 바람직하다.When it contains a filler, since improvement, such as connection reliability, is obtained, it is preferable. It can be used if the maximum diameter of a filler is less than the particle diameter of a conductive particle, and the range of 5 to 60 volume% is preferable. When it exceeds 60 volume%, the effect of a reliability improvement is saturated. As a coupling agent, a vinyl group, an acryl group, an amino group, an epoxy group, an azide group, and a non-isocyanate group containing material are preferable at the point of an adhesive improvement.

또, 본 발명의 이방도전성 회로 접속용 접착제를 경화물로 한 때의 Tg(유리전이온도)가 다른 2종류 이상의 층으로 이루어지는 다층구성으로 하여도 좋다.Moreover, you may make it the multilayer structure which consists of two or more types of layers in which Tg (glass transition temperature) when the adhesive for anisotropic conductive circuit connections of this invention is made into hardened | cured material.

본 발명의 이방도전성 회로 접속용 접착제를 사용하여 접착하는 기판으로서는 전기적 접속을 필요로 하는 전극이 형성되어 있는 것이면 특별히 제한은 없지만, 액정 디스플레이에 사용되고 있는 ITO 등에 전극이 형성되어 있는 유리 또는 플라스틱기판, PDP패널, EL패널 등의 화상표시기판, 프린트배선판, 세라믹배선판, 플렉시블배선판, 반도체칩, 저항체칩, 콘덴서칩 등의 칩부품, 테이프캐리어팩키지, COF 등의 회로부품 반도체 실리콘칩 등이 있고, 필요에 따라 조합하여 사용된다.The substrate to be bonded using the anisotropic conductive circuit connection adhesive of the present invention is not particularly limited as long as an electrode that requires electrical connection is formed, but a glass or plastic substrate having an electrode formed on an ITO or the like used in a liquid crystal display, Image display substrates such as PDP panels and EL panels, printed wiring boards, ceramic wiring boards, flexible wiring boards, semiconductor components such as semiconductor chips, resistor chips, capacitor chips, circuit components such as tape carrier packages, and COF semiconductor silicon chips. Used in combination according to.

접속하는 경우의 조건으로서는 특별히 제한은 없지만, 접속온도 90~250℃, 접속시간 1초~10분간이고, 사용하는 용도, 접착제, 기판에 따라 적의선택된다. 필요에 따라 후경화를 행하여도 좋다. 또, 접속시는 가열가압에 의해 행하여지지만, 필요에 따라 열 이외의 에너지, 예컨대 광, 초음파, 전자파 등을 사용하여도 좋다.There is no restriction | limiting in particular as conditions in the case of a connection, It is connection temperature 90-250 degreeC, connection time 1 second-10 minutes, and it selects suitably according to the use, adhesive agent, and board | substrate to be used. You may post-cure as needed. Although the connection is performed by heating and pressing, energy other than heat, such as light, ultrasonic waves, electromagnetic waves, or the like may be used as necessary.

이하, 본 발명의 실시예를 사용하여 구체적으로 설명하지만, 본 발명의 범위는 이 실시예에 한정되는 것은 아니다.Hereinafter, although it demonstrates concretely using the Example of this invention, the scope of the present invention is not limited to this Example.

실시예 1Example 1

페녹시수지(유니온카바이드주식회사제, 상품명 PKHC, 평균분자량 45,000) 50g을 MEK(메틸에틸케톤, 비점 79.6℃)에 용해시켜 고형분 50중량%의 용액으로 하였다.50 g of phenoxy resins (manufactured by Union Carbide Co., Ltd., product name PKHC, average molecular weight 45,000) were dissolved in MEK (methyl ethyl ketone, boiling point 79.6 ° C.) to obtain a solution having a solid content of 50% by weight.

라디칼 중합성물질로서 이소시아눌산에틸렌옥사이드변성 디아크릴레이트(동아합성주식회사제, 상품명 M-215) 및 인산에스테르형아크릴레이트(공영사유지주식회사제, 상품명 P-2M)를 사용하였다.Isocyanurate ethylene oxide modified diacrylate (manufactured by Dong-A Synthetic Co., Ltd., brand name M-215) and phosphate ester type acrylate (manufactured by Kogyo Holding Co., Ltd., brand name P-2M) were used as the radical polymerizable material.

가열 또는 광에 의해 유리라디칼을 발생하는 경화제로서 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산의 50중량% 탄화수소용액(일본유지주식회사제, 상품명 퍼헥사 25O)을 사용하였다. 50% by weight hydrocarbon solution of 2,5-dimethyl-2,5-bis (2-ethylhexanoylperoxy) hexane as a curing agent that generates free radicals by heating or light (manufactured by Nippon Oil Holding Co., Ltd., trade name Perhexa 25O) Was used.

도전입자로서 폴리스틸렌을 핵으로 하는 입자(압축탄성율 480kg/㎟)의 표면에 두께 0.09㎛의 Ag층을 설치한 평균입자경 5㎛의 도전입자를 사용하였다.As the conductive particles, conductive particles having an average particle diameter of 5 µm in which an Ag layer having a thickness of 0.09 µm were provided on the surface of the particles having a polystyrene as a nucleus (compressive modulus of 480 kg / mm 2) were used.

고형중량비로 페녹시수지 50g, 이소시아눌산에틸렌옥사이드변성 디아크릴레이트 50g, 인산에스테르형아크릴레이트 2g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 5g으로 되도록 배합하고, 또한 도전입자를 3체적% 배합분산시켜 두께 80㎛의 편면(片面)을 표면처리한 PET(폴리에틸렌테레프탈레이트)필름에 도공장치를 사용하여 도포하고, 70℃, 10분의 열풍건조에 의해 접착제층의 두께가 35㎛인 이방도전성 회로 접속용 접착제를 얻었다.50 g of phenoxy resin, 50 g of isocyanuric acid ethylene oxide modified diacrylate, 2 g of phosphate ester acrylate, and 5 g of 2,5-dimethyl-2,5-bis (2-ethylhexanoylperoxy) hexane in solid weight ratio 3 vol% of the conductive particles were dispersed and blended, and coated on a PET (polyethylene terephthalate) film having a surface treated with a single surface having a thickness of 80 µm using a pre-processing device, followed by hot air drying at 70 캜 for 10 minutes. This obtained the adhesive agent for anisotropic conductive circuit connections whose thickness of an adhesive bond layer is 35 micrometers.

실시예 2Example 2

도전입자로서 폴리스틸렌을 핵으로 하는 입자(압축탄성율 366kg/㎟)의 표면에 두께 0.1㎛의 Ag층을 설치한 평균입경 6.15㎛의 것을 사용하여 실시예 1과 동일하게 하여 이방도전성 회로 접속용 접착제를 얻었다.The adhesive for anisotropic conductive circuit connection was carried out in the same manner as in Example 1 using a conductive particle having an average particle size of 6.15 µm in which an Ag layer having a thickness of 0.1 µm was provided on the surface of a polystyrene-based particle (compressive modulus of 366 kg / mm 2). Got it.

실시예 3Example 3

도전입자로서 폴리스틸렌을 핵으로 하는 입자(압축탄성율 480kg/㎟)의 표면에 두께 0.1㎛의 Ag층을 설치하고, 이 Ag층의 외측에 두께 0.04㎛의 Au층을 설치한 평균입경 5㎛의 것을 사용하여 실시예 1과 동일하게 하여 이방도전성 회로 접속용 접착제를 얻었다.An average particle diameter of 5 µm in which an Ag layer having a thickness of 0.1 µm is provided on the surface of a polystyrene-based particle (compressive modulus of 480 kg / mm 2) as a conductive particle, and an Au layer having a thickness of 0.04 µm is provided outside the Ag layer. Using the same method as in Example 1, an adhesive for anisotropic conductive circuit connection was obtained.

실시예 4Example 4

도전입자로서 폴리스틸렌을 핵으로 하는 입자(압축탄성율 480kg/㎟)의 표면에 두께 0.1㎛의 Ni층을 설치하고, 이 Ni층의 외측에 두께 0.05㎛의 Au층을 설치한 평균입경 5㎛의 것을 사용하여 실시예 1과 동일하게 하여 이방도전성 회로 접속용 접착제를 얻었다.A conductive particle having an average particle diameter of 5 µm in which a Ni layer having a thickness of 0.1 µm is provided on the surface of a polystyrene-derived particle (compressive modulus of 480 kg / mm 2) and an Au layer having a thickness of 0.05 µm is formed outside the Ni layer. Using the same method as in Example 1, an adhesive for anisotropic conductive circuit connection was obtained.

비교예 1Comparative Example 1

도전입자로서 폴리스틸렌을 핵으로 하는 입자(압축탄성율 480kg/㎟)의 표면에 두께 0.2㎛의 Ni층을 설치한 평균입경 5㎛의 것을 사용하여 실시예 1과 동일하게 하여 이방도전성 회로 접속용 접착제를 얻었다.The adhesive for anisotropic conductive circuit connection was carried out in the same manner as in Example 1, using an average particle diameter of 5 µm in which a Ni layer having a thickness of 0.2 µm was formed on the surface of the polystyrene-derived particles (compressive modulus of 480 kg / mm 2) as the conductive particles. Got it.

비교예 2Comparative Example 2

도전입자로서 폴리스틸렌을 핵으로 하는 입자(압축탄성율 480kg/㎟)의 표면에 두께 0.2㎛의 Ni층을 설치하고, 이 니켈층의 외측에 두께 0.04㎛의 Au층을 설치한 평균입경 5㎛의 것을 사용하여 실시예 1과 동일하게 하여 이방도전성 회로 접속용 접착제를 얻었다.An average particle diameter of 5 µm in which a Ni layer having a thickness of 0.2 µm was formed on the surface of a polystyrene-based particle (compressive modulus of 480 kg / mm 2) as a conductive particle, and an Au layer having a thickness of 0.04 µm was formed outside the nickel layer. Using the same method as in Example 1, an adhesive for anisotropic conductive circuit connection was obtained.

(회로의 접속)(Connection of circuit)

상술의 이방도전성 수지필름상 형성물을 사용하여 라인폭 30㎛, 피치 30㎛, 두께 18㎛의 구리회로를 150개 가지는 테이프캐리어팩키지(TCP)와 ITO유리(디오마텍크주식회사제, 표면저항 20~30Ω/□, 두께 1.1mm)를 140℃, 3MPa로 15초간 가열가압하여 폭 2mm에 걸쳐서 접속한 접속구조체를 얻었다. 이 때, 미리 ITO 유리상에 이방도전성 회로 접속용 접착제의 접착면을 부착한 후, 80℃, 0.5MPa로 3초간 가열가압하여 반접속하고, 그 후 PET 필름을 박리시켜 TCP와 접속하였다.Tape Carrier Package (TCP) and ITO Glass (manufactured by Diomatec Co., Ltd., Surface Resistance 20) having 150 copper circuits having a line width of 30 μm, a pitch of 30 μm, and a thickness of 18 μm using the above-described anisotropic conductive resin film-formed product 30 占 Ω / ?, 1.1 mm thick) was pressurized by heating at 140 DEG C and 3 MPa for 15 seconds to obtain a connection structure connected over a width of 2 mm. At this time, after adhering the adhesive surface of the adhesive for anisotropic conductive circuit connection on ITO glass in advance, it heated and pressurized at 80 degreeC and 0.5 MPa for 3 second, and made it half-connection, after that, PET film was peeled off and it connected with TCP.

(접속저항의 측정)(Measurement of connection resistance)

제작한 이방도전성 회로 접속용 접착제를 -20℃ 보존 및 30℃, 85%RH의 항온항습조 중에 각각 100시간 보존한 후, 상기한 회로의 접속을 행하고, 상기 접속부를 포함하는 TCP의 인접회로간의 접속저항값을 멀티메타로 측정하였다. 접속저항값은 인접회로간의 저항 150점의 평균으로 나타내었다. 그 측정결과를 표 1에 나타내었다.The produced anisotropic conductive circuit connection adhesive was stored for 100 hours in -20 ° C storage and 30 ° C and 85% RH constant temperature and humidity chamber, respectively, and then the above circuits were connected to each other and the adjacent circuits of TCP including the connection part were connected. The connection resistance value was measured by multimeter. The connection resistance value is shown as the average of 150 resistance points between adjacent circuits. The measurement results are shown in Table 1.

표 1Table 1

접속저항(Ω)Connection resistance -20℃, 100시간 보존-20 ℃, 100 hours storage 30℃, 85%RH, 100시간 보존30 ℃, 85% RH, 100 hours storage 실시예 1Example 1 2.12.1 2.32.3 실시예 2Example 2 1.91.9 2.12.1 실시예 3Example 3 2.22.2 2.42.4 실시예 4Example 4 2.32.3 2.12.1 비교예 1Comparative Example 1 2.22.2 35.535.5 비교예 2Comparative Example 2 2.52.5 28.428.4

실시예 1에서 얻어진 접속구조체는 -20℃ 보존 또는 30℃, 85%RH의 항온항습조 중에 보존한 것 모두 2.5Ω이하의 양호한 접속신뢰성을 나타내었다. 또, 실시예 2, 3의 접속 구조체에 대해서도 동일하게, -20℃ 보존 또는 30℃, 85%RH의 항온항습조 중에 보존한 것 모두 2.5Ω이하의 양호한 접속신뢰성이 얻어졌다.The connection structure obtained in Example 1 exhibited satisfactory connection reliability of 2.5 Ω or less, whether stored at -20 ° C or in a constant temperature and humidity bath at 30 ° C and 85% RH. Similarly, for the bonded structures of Examples 2 and 3, satisfactory connection reliability of 2.5? Or less was obtained either in -20 ° C storage or in a constant temperature and humidity chamber at 30 ° C and 85% RH.

이들에 대하여, 비교예 1 및 2는 -20℃ 보존한 접속구조체에 대해서는 양호한 접속신뢰성이 얻어졌지만, 30℃, 85%RH의 항온항습조 중에 보존한 것은 접속저항이 10Ω이상으로 크게 상승하였다.On the other hand, in Comparative Examples 1 and 2, good connection reliability was obtained for the connection structure stored at -20 ° C. However, the connection resistance greatly increased to 10 Ω or more at 30 ° C and 85% RH.

(접착강도의 측정)(Measurement of Adhesive Strength)

실시예 1~3에서는 -20℃ 또는 30℃, 85%RH의 항온항습조 중에 보존한 것 모두 1000N/m정도로 양호한 접착강도가 얻어졌다. 한편, 비교예 1 및 2에 대해서도 접착강도에 대해서는 -20℃ 또는 30℃, 85%RH의 항온항습조 중에 보존한 것 모두 1000N/m정도로 양호한 접착강도가 얻어졌다.In Examples 1 to 3, good adhesive strength was obtained at -20 ° C, 30 ° C and 85% RH in a constant temperature and humidity bath at about 1000 N / m. On the other hand, in Comparative Examples 1 and 2, the adhesive strength was about 1000 N / m, which was about 1000 N / m in both the -20 DEG C or 30 DEG C and 85% RH stored in a constant temperature and humidity bath.

(절연성의 평가)(Evaluation of insulation)

얻어진 이방도전성 회로 접속용 접착제를 사용하여, 라인폭 50㎛, 피치 100㎛, 두께 18㎛의 구리회로를 서로 번갈아 250개 배치한 빗모양회로를 가지는 프린트기판과 라인폭 50㎛, 피치 100㎛, 두께 18㎛의 구리회로를 500개 가지는 테이프베리어팩키지(TCP)를 140℃, 3MPa로 15초간 가열가압하여 폭 2mm에 걸쳐서 접속하였다. 이 접속체의 빗모양회로에 100V의 전압을 인가하여 85℃, 85%RH의 고온고습시험 500시간후의 절연저항값을 측정하였다.Using the obtained adhesive for anisotropic conductive circuit connection, a printed circuit board having a comb-like circuit in which 250 copper circuits having a line width of 50 μm, a pitch of 100 μm, and a thickness of 18 μm were alternately arranged, a line width of 50 μm, a pitch of 100 μm, A Tape Barrier Package (TCP) having 500 copper circuits having a thickness of 18 µm was heated and pressed at 140 ° C and 3 MPa for 15 seconds to connect over a width of 2 mm. A voltage of 100 V was applied to the comb-shaped circuit of this connector, and the insulation resistance value after 500 hours of 85 degreeC and 85% RH high temperature and high humidity test was measured.

어느 경우도 109Ω이상의 양호한 절연성이 얻어지고, 절연성의 저하는 관찰되지 않았다.In either case, good insulation of 10 9 Ω or more was obtained, and no decrease in insulation was observed.

(유동성의 평가)(Evaluation of liquidity)

두께 35㎛, 5mm×5mm의 이방도전성 회로 접속용 접착제를 사용하고, 이것을 두께 0.7mm, 15mm×15mm의 유리에 끼우고, 140℃, 3MPa로 15초간 가열가압을 행하였다. 초기의 면적 (A)와 가열가압후의 면적 (B)를 사용하여 유동성 (B)/(A)의 값을 구한 바, 실시예 1~3은 1.9~2.0의 범위내이었다. 한편, 비교예 1 및 2에 대해서도 1.8 및 1.9이었다.The adhesive for anisotropic conductive circuit connections of 35 micrometers in thickness and 5 mm x 5 mm was used, this was sandwiched in glass of thickness 0.7 mm and 15 mm x 15 mm, and heating pressurization was performed at 140 degreeC and 3 MPa for 15 second. When the value of fluidity (B) / (A) was calculated | required using the initial area (A) and the area (B) after heating pressurization, Examples 1-3 were in the range of 1.9-2.0. On the other hand, it was 1.8 and 1.9 also about Comparative Examples 1 and 2.

(경화 후의 탄성율)(Elastic modulus after curing)

실시예 1의 이방도전성 회로 접속용 접착제의 경화 후의 40℃의 탄성율을 측정한 바 1.5GPa이었다.It was 1.5 GPa when the elasticity modulus of 40 degreeC after hardening of the adhesive agent for anisotropic conductive circuit connections of Example 1 was measured.

상기한 접착강도, 절연성, 유동성, 경화 후의 탄성율로부터 본 발명의 실시예의 값과 비교예의 값은 거의 같은 값을 나타내지만, 표 1에 나타낸 바와 같이 접속저항값이 크게 다르다. 접착강도, 절연성, 유동성 등이 실시예, 비교예에서 동등한 특성을 나타내기 때문에, 도전입자표면의 피복층은 매우 얇은 것이라고 생각되지만, 접속저항에 현저하게 영향을 미친다. 본 발명과 같이 표면에 Ag, Au, Pt 이외의 전이금속이 노출되어있지 않은 도전입자에서는 도전입자표면에서 라디칼 중합성물질의 중합이 촉진되지 않아, 접속저항이 낮은 양호한 값을 나타낸다. 실시예 4에서 Ni와 같은 전이금속을 사용한 경우에 있어서도, 그 외측에 500Å 이상의 Ag, Au, Pt 등의 피복을 행하고, 내측의 전이금속이 노출되지 않도록 하므로써 온도나 온습도처리하여도 보존안정성이 우수하고, 접속저항이 증가하지 않는다.Although the value of the Example of this invention and the value of a comparative example show substantially the same value from the said adhesive strength, insulation, fluidity, and the elasticity modulus after hardening, as shown in Table 1, a connection resistance value differs significantly. Since adhesive strength, insulation, fluidity, and the like exhibit the same characteristics in Examples and Comparative Examples, the coating layer on the surface of the conductive particles is considered to be very thin, but it significantly affects the connection resistance. In the conductive particles in which transition metals other than Ag, Au, and Pt are not exposed on the surface as in the present invention, the polymerization of the radically polymerizable material is not promoted at the surface of the conductive particles, and thus a good value with low connection resistance is exhibited. Even in the case of using a transition metal such as Ni in Example 4, it is excellent in storage stability even when subjected to temperature or temperature and humidity treatment by coating Ag, Au, Pt or the like on the outside of 500 kPa or more and preventing the inner transition metal from being exposed. Connection resistance does not increase.

(표면처리입자 A의 제작)(Production of Surface Treated Particles A)

트리에틸아민의 1중량% 메탄올용액에, 폴리스틸렌을 핵으로 하는 입자의 표면에 두께 0.2㎛의 니켈층을 설치하고, 이 니켈층의 외측에 두께 0.04㎛의 금층을 설치한 평균입경 4㎛의 도전입자를 넣고, 25℃에서 10분간 교반하였다. 도전입자를 여과분리 후, 50℃에서 15분간 건조하여 표면처리입자 A를 얻었다.In a 1 wt% methanol solution of triethylamine, a nickel layer having a thickness of 0.2 μm was formed on the surface of the polynuclear particles and a gold layer having a thickness of 0.04 μm was provided outside the nickel layer. Particles were added and stirred at 25 ° C for 10 minutes. The conductive particles were filtered off and then dried at 50 ° C. for 15 minutes to obtain surface treated particles A.

(표면처리입자 B의 제작)(Production of Surface Treated Particles B)

아미노프로필트리메톡시실란의 3중량% 메탄올 용액에, 폴리스티렌을 핵으로 하는 입자의 표면에 두께 0.2㎛의 니켈층을 설치하고, 이 니켈층의 외측에 두께 0.04㎛의 금층을 설치한 평균입경 5㎛의 도전입자를 넣고, 50℃에서 5분간 교반하였다. 도전입자를 여과분리 후, 80℃에서 5분간 건조하여 표면처리입자 B를 얻었다.An average particle diameter of 5 μm in which a nickel layer having a thickness of 0.2 μm was provided on the surface of particles made of polystyrene as a nucleus in a 3 wt% methanol solution of aminopropyltrimethoxysilane, and a gold layer having a thickness of 0.04 μm was provided outside the nickel layer. The microparticles | fine-particles were added and stirred for 5 minutes at 50 degreeC. The conductive particles were filtered off and dried at 80 ° C. for 5 minutes to obtain surface treated particles B.

(표면처리입자 C의 제작)(Production of Surface Treated Particles C)

γ-글리시드옥시프로필메틸디메톡시실란의 1중량% 메탄올용액에, 폴리스티렌을 핵으로 하는 입자의 표면에 두께 0.2㎛의 니켈층을 설치하고, 이 니켈층의 외측에 두께 0.04㎛의 금층을 설치한 평균입경 4㎛의 도전입자를 넣고, 25℃에서 10분간 교반하였다. 도전입자를 여과분리 후, 50℃에서 15분간 건조하여 표면처리입자 C를 얻었다.In a 1% by weight methanol solution of γ-glycidoxy propylmethyldimethoxysilane, a nickel layer having a thickness of 0.2 μm is provided on the surface of particles made of polystyrene as a nucleus, and a gold layer having a thickness of 0.04 μm is provided outside the nickel layer. The electroconductive particle of one average particle diameter of 4 micrometers was added, and it stirred at 25 degreeC for 10 minutes. The conductive particles were filtered off and dried at 50 ° C. for 15 minutes to obtain surface treated particles C.

(표면처리입자 D의 제작)(Production of Surface Treated Particles D)

비스페놀A형에폭시수지의 3중량% 메탄올 용액에, 폴리스틸렌을 핵으로 하는 입자의 표면에 두께 0.2㎛의 니켈층을 설치하고, 이 니켈층의 외측에 두께 0.04㎛의 금층을 설치한 평균입경 5㎛의 도전입자를 넣고, 50℃에서 5분간 교반하였다. 도전입자를 여과분리 후, 80℃에서 5분간 건조하여 표면처리입자 D를 얻었다.An average particle diameter of 5 µm in which a nickel layer having a thickness of 0.2 µm is provided on the surface of the polystyrene-containing particles in a 3 wt% methanol solution of bisphenol A epoxy resin, and a gold layer having a thickness of 0.04 µm is formed outside the nickel layer. Of conductive particles were added and stirred at 50 ° C for 5 minutes. The conductive particles were filtered off and dried at 80 ° C. for 5 minutes to obtain surface treated particles D.

이들 도전입자 A, B, C 및 D를 사용하여, 이하에 나타내는 배합으로 각각 배합하고, 간이도공기(테스타산업주식회사제)를 사용하여 두께 50㎛의 편면을 표면처리한 PET(폴리에틸렌테레프탈레이트)필름에 도포하고, 70℃, 10분간의 열풍건조기에 의해 회로접속용 접착제를 제작하였다.PET (polyethylene terephthalate) which surface-treated the single side | surface of thickness of 50 micrometers using these conductive particles A, B, C, and D, respectively, mix | blending by the following formulation, and using the simple coating machine (made by TESTA INDUSTRIAL CO., LTD.). ) It was apply | coated to a film, and the adhesive agent for circuit connection was produced with the hot air dryer of 70 degreeC and 10 minutes.

실시예 5Example 5

페녹시수지(PKHC, 유니온카바이드주식회사제 상품명, 평균분자량 45,000) 50g, 라디칼 중합성 화합물로서 디시클로헥실메타아크릴레이트 48g과 인산에스테르아크릴레이트 2g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 3g을 메틸에틸케톤을 용매로 하여 용해배합하고, 또한 표면처리입자 A를 3체적% 배합분산하였다. 두께 50㎛의 편면을 표면처리한 폴리에틸렌테레프탈레이트필름에 간이도공기를 사용하여 도포하고, 70℃, 10분간 건조시켜 두께 30㎛의 이방도전성 회로 접속용 접착제를 얻었다.50 g of phenoxy resins (PKHC, trade name of Union Carbide Co., Ltd., average molecular weight 45,000), 48 g of dicyclohexyl methacrylate and 2 g of phosphate ester acrylate as a radically polymerizable compound, 2,5-dimethyl-2,5-bis (2 3 g of ethylhexanoylperoxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and 3 vol% of the surface treated particles A were blended and dispersed. One side of 50 micrometers in thickness was apply | coated to the polyethylene terephthalate film which surface-treated using the simple coating machine, and it dried at 70 degreeC for 10 minutes, and obtained the adhesive for anisotropic conductive circuit connection of 30 micrometers in thickness.

실시예 6Example 6

페녹시수지(PKHC, 유니온카바이드주식회사 상품명, 평균분자량 45,000) 50g, 이소시아눌산에틸렌옥사이드변성 디아크릴레이트 46g, 인산에스테르아크릴레이트 4g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 3g을 메틸에틸케톤을 용매로 하여 용해배합하고, 또한 표면처리입자 B를 3체적% 배합분산하였다. 두께 50㎛의 편면을 표면처리한 폴리에틸렌테레프탈레이트필름에 간이도공기를 사용하여 도포하고, 70℃, 10분간 건조시켜 두께 30㎛의 이방도전성 회로 접속용 접착제를 얻었다.50 g of phenoxy resins (PKHC, Union Carbide Co., Ltd., average molecular weight 45,000), 46 g of isocyanuric acid ethylene oxide modified diacrylate, 4 g of phosphate ester acrylate, 2,5-dimethyl-2,5-bis (2-ethylhexa 3 g of noyl peroxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and 3 vol% of the surface treated particles B were dispersed. One side of 50 micrometers in thickness was apply | coated to the polyethylene terephthalate film which surface-treated using the simple coating machine, and it dried at 70 degreeC for 10 minutes, and obtained the adhesive for anisotropic conductive circuit connection of 30 micrometers in thickness.

실시예 7Example 7

페녹시수지(PKHC, 유니온카바이드주식회사 상품명, 평균분자량 45,000) 25g, 폴리우레탄수지 25g, 디시클로헥실메타아크릴레이트 48g, 인산에스테르아크릴레이트 2g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 3g을 메틸에틸케톤을 용매로 하여 용해배합하고, 또한 표면처리입자 B를 3체적% 배합분산하였다. 두께 50㎛의 편면을 표면처리한 폴리에틸렌테레프탈레이트필름에 간이도공기를 사용하여 도포하고, 70℃, 10분간 건조시켜 두께 30㎛의 이방도전성 회로 접속용 접착제를 얻었다.25 g of phenoxy resin (PKHC, trade name of Union Carbide, average molecular weight 45,000), 25 g of polyurethane resin, 48 g of dicyclohexyl methacrylate, 2 g of phosphate ester acrylate, 2,5-dimethyl-2,5-bis (2- 3 g of ethylhexanoylperoxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and 3 vol% of the surface treated particles B were dispersed and blended. One side of 50 micrometers in thickness was apply | coated to the polyethylene terephthalate film which surface-treated using the simple coating machine, and it dried at 70 degreeC for 10 minutes, and obtained the adhesive for anisotropic conductive circuit connection of 30 micrometers in thickness.

실시예 8Example 8

페녹시수지(PKHC, 유니온카바이드주식회사 상품명, 평균분자량 45,000) 50g, 라디칼 중합성화합물로서 디시클로헥실메타아크릴레이트 48g, 인산에스테르화합물로서 인산에스테르아크릴레이트 2g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 3g을 메틸에틸케톤을 용매로 하여 용해배합하고, 또한 표면처리입자 C를 3체적% 배합분산하였다. 두께 50㎛의 편면을 표면처리한 폴리에틸렌테레프탈레이트필름에 간이도공기를 사용하여 도포하고, 70℃, 10분간 건조시켜 두께 30㎛의 이방도전성 회로 접속용 접착제를 얻었다.50 g of phenoxy resin (PKHC, trade name of Union Carbide Co., Ltd., average molecular weight 45,000), 48 g of dicyclohexyl methacrylate as a radical polymerizable compound, 2 g of phosphate ester acrylate as a phosphate ester compound, 2,5-dimethyl-2,5- 3 g of bis (2-ethylhexanoylperoxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and 3 vol% of the surface treated particles C were blended and dispersed. One side of 50 micrometers in thickness was apply | coated to the polyethylene terephthalate film which surface-treated using the simple coating machine, and it dried at 70 degreeC for 10 minutes, and obtained the adhesive for anisotropic conductive circuit connection of 30 micrometers in thickness.

실시예 9Example 9

페녹시수지(PKHC, 유니온카바이드주식회사 상품명, 평균분자량 45,000) 50g, 이소시아눌산에틸렌옥사이드변성 디아크릴레이트 46g, 인산에스테르아크릴레이트 4g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 3g을 메틸에틸케톤을 용매로 하여 용해배합하고, 또한 표면처리입자 D를 3체적% 배합분산하였다. 두께 50㎛의 편면을 표면처리한 폴리에틸렌테레프탈레이트필름에 간이도공기를 사용하여 도포하고, 70℃, 10분간 건조시켜 두께 30㎛의 이방도전성 회로 접속용 접착제를 얻었다.50 g of phenoxy resins (PKHC, Union Carbide Co., Ltd., average molecular weight 45,000), 46 g of isocyanuric acid ethylene oxide modified diacrylate, 4 g of phosphate ester acrylate, 2,5-dimethyl-2,5-bis (2-ethylhexa 3 g of noyl peroxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and 3 vol% of the surface treated particles D were blended and dispersed. One side of 50 micrometers in thickness was apply | coated to the polyethylene terephthalate film which surface-treated using the simple coating machine, and it dried at 70 degreeC for 10 minutes, and obtained the adhesive for anisotropic conductive circuit connection of 30 micrometers in thickness.

실시예 10Example 10

페녹시수지(PKHC, 유니온카바이드주식화사 상품명, 평균분자량 45,000) 25g, 폴리우레탄수지 25g, 디시클로헥실메타아크릴레이트 48g, 인산에스테르아크릴레이트 2g, 2,5-디메틸-2,5-비스(2-에틸헥사노일퍼옥시)헥산 3g을 메틸에틸케톤을 용매로 하여 용해배합하고, 또한 표면처리입자 D를 3체적% 배합분산하였다. 두께 50㎛의 편면을 표면처리한 폴리에틸렌테레프탈레이트필름에 간이도공기를 사용하여 도포하고, 70℃, 10분간 건조시켜 두께 30㎛의 이방도전성 회로 접속용 접착제를 얻었다.25 g of phenoxy resin (PKHC, trade name of Union Carbide Co., Ltd., average molecular weight 45,000), 25 g of polyurethane resin, 48 g of dicyclohexyl methacrylate, 2 g of phosphate ester acrylate, 2,5-dimethyl-2,5-bis (2 -3 g of ethylhexanoylperoxy) hexane was dissolved and mixed with methyl ethyl ketone as a solvent, and 3 vol% of the surface treated particles D were blended and dispersed. One side of 50 micrometers in thickness was apply | coated to the polyethylene terephthalate film which surface-treated using the simple coating machine, and it dried at 70 degreeC for 10 minutes, and obtained the adhesive for anisotropic conductive circuit connection of 30 micrometers in thickness.

비교예 3Comparative Example 3

실시예 5의 표면처리입자 A를 미처리입자로 바꾼 이외에는 실시예 5와 동일하게 하여 이방도전성 회로 접속용 접착제를 제작하였다.The adhesive for anisotropic conductive circuit connections was produced like Example 5 except having changed the surface-treated particle | grains A of Example 5 into the unprocessed particle | grains.

(회로접속구조체의 제작)(Manufacture of circuit connection structure)

상기 이방도전성 회로 접속용 접착제를 1.5mm 폭으로 슬릿하고, 전극으로서 ITO가 형성된 유리기판상에 80℃, 5초, 1MPa의 조건으로 반접속하였다. PET지지기재를 박리하여, 이것에 전극폭 50㎛, 스페이스 50㎛의 TCP의 전극을 위치 결합시켜 150℃, 20초, 4MPa의 조건으로 본접속하여 회로접속구조체를 제작하였다.The anisotropic conductive circuit connection adhesive was slit in a width of 1.5 mm and semi-connected on a glass substrate on which ITO was formed as an electrode at 80 ° C., 5 seconds, and 1 MPa. The PET support base material was peeled off, and the electrode of TCP of 50 micrometers in width and space of 50 micrometers was bonded to this position, and this connection was made under conditions of 150 degreeC, 20 second, and 4 Mpa, and the circuit connection structure was produced.

(특성평가방법)(Characteristic evaluation method)

접속저항 : 주식회사 아도반테스트제 멀티메타 TR6848을 사용하여 인접회로간의 저항을 1mA의 정전류로 측정하였다. 접속저항은 접속한 후의 초기와 30℃, 60%RH, 100시간방치 후의 값을 측정하였다. 이들의 결과를 표 2에 나타내었다.Connection resistance: The resistance between adjacent circuits was measured by the constant current of 1 mA using the multimeter TR6848 made from Adoban Test. The connection resistance measured the initial stage after connection, and the value after 30 degreeC, 60% RH, and 100 hours standing. The results are shown in Table 2.

표 2TABLE 2

항목Item 접속저항 (Ω)Connection resistance (Ω) 초기Early 30℃, 60%RH, 100시간방치 후After 30 ℃, 60% RH, 100 hours 실시예 5Example 5 2.12.1 2.42.4 실시예 6Example 6 2.82.8 2.52.5 실시예 7Example 7 3.23.2 3.13.1 실시예 8Example 8 2.22.2 2.52.5 실시예 9Example 9 2.42.4 2.42.4 실시예 10Example 10 2.82.8 3.13.1 비교예 3Comparative Example 3 2.42.4 34.734.7

본 발명의 실시예 5~10에서는 접속저항이 방치 후에도 낮고 양호하지만, 표면처리입자를 사용하지 않은 비교예 3에서는 방치 후 접속저항이 크게 상승하고 있다. 또, 이방도전성 회로 접속용 접착제를 제조후, 25℃에 30일간 방치하고 나서 실시예와 동일하게 회로접속구조체를 제작한 결과, 염기성 화합물 또는 에폭시기를 가지는 화합물로 표면처리한 도전입자를 포함하는 이방도전성 회로 접속용 접착제는 실시예 5~10의 배합에서 접속저항(초기)이 2.1~3.8Ω으로 양호한 보존안정성을 나타내었다. 그러나, 비교예 3의 염기성 화합물 또는 에폭시기를 가지는 화합물로 처리하지 않은 도전입자를 사용한 접속구조체의 접속저항은 20~200Ω으로 보존안정성이 떨어지고 있다.In Examples 5 to 10 of the present invention, the connection resistance was low and good even after standing, but in Comparative Example 3 in which surface treated particles were not used, the connection resistance after standing was greatly increased. In addition, after the adhesive for anisotropic conductive circuit connection was prepared and left at 25 ° C. for 30 days, a circuit connection structure was produced in the same manner as in Example, and anisotropic containing conductive particles surface-treated with a compound having a basic compound or an epoxy group. The adhesive agent for conductive circuit connection showed good storage stability with the connection resistance (initial stage) of 2.1-3.8 ohm in the mixing | blending of Examples 5-10. However, the connection resistance of the connection structure using the conductive particles which were not treated with the basic compound or the compound having an epoxy group of Comparative Example 3 is inferior in storage stability to 20 to 200?.

본 발명에 의하면, 이방도전성 회로 접속용 접착제를 제작한 후 방치하여도 보존안정성(팟라이프)이 좋은 이방도전성 회로 접속용 접착제를 얻을 수 있고, 또, 열경화성의 이방도전성 회로 접속용 접착제의 접속온도 170℃에 대하여, 보다 저온의 150℃에서 접속할 수 있고, 접착제의 보존 후의 접속저항의 차이가 적고 양호한 접속구조체를 얻을 수 있다.According to the present invention, an adhesive for anisotropic conductive circuit connection with good storage stability (pot life) can be obtained even after the adhesive for anisotropic conductive circuit connection is produced, and the connection temperature of the thermosetting anisotropic conductive circuit connection adhesive can be obtained. With respect to 170 degreeC, it can connect at 150 degreeC of lower temperature, there is little difference of the connection resistance after storage of an adhesive agent, and can obtain a favorable connection structure.

Claims (13)

도전입자를 균일분산하여 이루어지는 수지필름상 형성물로서, 적어도 이하의 성분으로 이루어지는 것을 특징으로 하는 이방도전성 회로 접속용 접착제.An adhesive for anisotropic conductive circuit connection, comprising a resin film-form formed by uniformly dispersing conductive particles, and comprising at least the following components. (1) 표면에 Ag, Au, Pt 이외의 전이금속이 노출되어 있지 않은 도전입자,(1) conductive particles having no transition metal other than Ag, Au, or Pt exposed on their surface; (2) 라디칼 중합성 물질,(2) radically polymerizable materials, (3) 가열 또는 광에 의해 유리 라디칼을 발생하는 경화제.(3) A curing agent that generates free radicals by heating or light. 도전입자를 균일분산하여 이루어지는 수지필름상 형성물로서, 적어도 이하의 성분으로 이루어지는 것을 특징으로 하는 이방도전성 회로 접속용 접착제.An adhesive for anisotropic conductive circuit connection, comprising a resin film-form formed by uniformly dispersing conductive particles, and comprising at least the following components. (1) 표면에 Ag, Au, Pt 이외의 전이금속이 노출되어 있지 않은 도전입자,(1) conductive particles having no transition metal other than Ag, Au, or Pt exposed on their surface; (2) 라디칼 중합성 물질,(2) radically polymerizable materials, (3) 가열 또는 광에 의해 유리 라디칼을 발생하는 경화제 및(3) a curing agent that generates free radicals by heating or light, and (4) 인산에스테르화합물.(4) Phosphate ester compound. 제 1항 또는 제 2항에 따른 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 가지는 기판간에 개재시켜, 서로 대향하는 회로전극을 가지는 기판을 가압하여 가압방향의 전극간을 전기적으로 접속하는 회로판의 접속방법.A circuit board for electrically connecting the electrodes in the pressing direction by pressing an anisotropic conductive circuit connection adhesive according to claim 1 or 2 between substrates having circuit electrodes opposed to each other, and pressing the substrates having opposite circuit electrodes. How to connect 제 1항 또는 제 2항에 따른 이방도전성 회로 접속용 접착제를 서로 대향하는 회로 전극을 가지는 기판간에 개재시켜, 서로 대향하는 회로전극을 가지는 기판을 가압하여 가압방향의 전극간을 전기적으로 접속한 접속구조체.A connection in which the anisotropic conductive circuit connection adhesive according to claim 1 or 2 is interposed between substrates having circuit electrodes facing each other, and the substrates having circuit electrodes facing each other are pressed to electrically connect the electrodes in the pressing direction. Structure. 서로 대향하는 회로전극을 가지는 기판간에 개재시켜, 서로 대향하는 회로전극을 가지는 기판을 가압하여 가압방향의 전극간을 전기적으로 접속하는 이방도전성 회로 접속용 접착제로서, 상기 접착제에는 (1) 라디칼 중합성 화합물 및 (2) 염기성 화합물 및 적어도 1개의 에폭시기를 가지는 화합물로 이루어지는 군에서 선택되는 적어도 1종의 화합물로 표면처리를 한 도전입자를 포함하는 것을 특징으로 하는 회로접속용 접착제.An adhesive for anisotropic conductive circuit connection, which is interposed between substrates having opposite circuit electrodes and pressurizes substrates having opposite circuit electrodes to electrically connect the electrodes in the pressing direction, wherein the adhesive includes (1) radically polymerizable An adhesive for circuit connection comprising a conductive particle surface-treated with at least one compound selected from the group consisting of a compound and (2) a basic compound and a compound having at least one epoxy group. 제 5항에 있어서, 광 또는 가열에 의해 라디칼을 발생하는 화합물을 포함하는 것을 특징으로 하는 이방도전성 회로 접속용 접착제.The adhesive for anisotropic conductive circuit connection according to claim 5, comprising a compound which generates radicals by light or heating. 제 5항 또는 제 6항에 있어서, 인산에스테르화합물을 더 포함하는 것을 특징으로 하는 이방도전성 회로 접속용 접착제.The adhesive for anisotropic conductive circuit connection according to claim 5 or 6, further comprising a phosphate ester compound. 제 5항 또는 제 6항에 있어서, 염기성 화합물이 아미노계 화합물인 것을 특징으로 하는 이방도전성 회로 접속용 접착제.The adhesive for anisotropic conductive circuit connections according to claim 5 or 6, wherein the basic compound is an amino compound. 삭제delete 제 7항에 있어서, 염기성 화합물이 아미노계 화합물인 것을 특징으로 하는 이방도전성 회로 접속용 접착제.8. The adhesive for anisotropic conductive circuit connection according to claim 7, wherein the basic compound is an amino compound. 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 갖는 기판 사이에 개재시키고, 서로 대향하는 회로전극을 갖는 기판을 가압하여 가압방향의 전극 사이를 전기적으로 접속한 접속구조체로서, 상기 이방도전성 회로접속용 접착제가 제 5항 내지 제 6항 및 제 10항 중 어느 한 항에 따른 이방도전성 회로 접속용 접착제인 것을 특징으로 하는 회로접속 구조체.An anisotropic conductive circuit connection, wherein the anisotropic conductive circuit connection adhesive is interposed between substrates having circuit electrodes facing each other, and the substrates having circuit electrodes facing each other are pressed to electrically connect the electrodes in the pressing direction. The adhesive agent for a circuit is the adhesive agent for anisotropic conductive circuit connections as described in any one of Claims 5-6 and 10. The circuit connection structure characterized by the above-mentioned. 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 갖는 기판 사이에 개재시키고, 서로 대향하는 회로전극을 갖는 기판을 가압하여 가압방향의 전극 사이를 전기적으로 접속한 접속구조체로서, 상기 이방도전성 회로접속용 접착제가 제 7항에 따른 이방도전성 회로 접속용 접착제인 것을 특징으로 하는 회로접속 구조체.An anisotropic conductive circuit connection, wherein the anisotropic conductive circuit connection adhesive is interposed between substrates having circuit electrodes facing each other, and the substrates having circuit electrodes facing each other are pressed to electrically connect the electrodes in the pressing direction. The adhesive agent for an anisotropic conductive circuit connection adhesive agent of Claim 7, The circuit connection structure characterized by the above-mentioned. 이방도전성 회로 접속용 접착제를 서로 대향하는 회로전극을 갖는 기판 사이에 개재시키고, 서로 대향하는 회로전극을 갖는 기판을 가압하여 가압방향의 전극 사이를 전기적으로 접속한 접속구조체로서, 상기 이방도전성 회로접속용 접착제가 제 8항에 따른 이방도전성 회로 접속용 접착제인 것을 특징으로 하는 회로접속 구조체.An anisotropic conductive circuit connection, wherein the anisotropic conductive circuit connection adhesive is interposed between substrates having circuit electrodes facing each other, and the substrates having circuit electrodes facing each other are pressed to electrically connect the electrodes in the pressing direction. The adhesive agent for an anisotropic conductive circuit connection adhesive agent of Claim 8 is a circuit connection structure characterized by the above-mentioned.
KR10-2001-0085782A 2000-12-28 2001-12-27 Anisotropic conductive adhesives for connecting circuit, and connecting method of circuit board and circuit connected structure material using the same KR100484383B1 (en)

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