KR100471151B1 - 적층형 lc 필터 - Google Patents
적층형 lc 필터 Download PDFInfo
- Publication number
- KR100471151B1 KR100471151B1 KR10-2002-0057147A KR20020057147A KR100471151B1 KR 100471151 B1 KR100471151 B1 KR 100471151B1 KR 20020057147 A KR20020057147 A KR 20020057147A KR 100471151 B1 KR100471151 B1 KR 100471151B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- filter
- dielectric layer
- magnetic layer
- stacked
- Prior art date
Links
- 239000000463 material Substances 0.000 claims abstract description 64
- 239000011521 glass Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 23
- 229910017827 Cu—Fe Inorganic materials 0.000 claims abstract description 15
- 230000008569 process Effects 0.000 claims abstract description 15
- 239000003990 capacitor Substances 0.000 claims description 13
- 238000010344 co-firing Methods 0.000 abstract description 6
- 230000006866 deterioration Effects 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 3
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 137
- 230000000052 comparative effect Effects 0.000 description 9
- 239000000203 mixture Substances 0.000 description 6
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 238000010304 firing Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005662 electromechanics Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
- H01P1/201—Filters for transverse electromagnetic waves
- H01P1/203—Strip line filters
- H01P1/20327—Electromagnetic interstage coupling
- H01P1/20336—Comb or interdigital filters
- H01P1/20345—Multilayer filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/40—Structural combinations of fixed capacitors with other electric elements, the structure mainly consisting of a capacitor, e.g. RC combinations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
- H01P1/207—Hollow waveguide filters
- H01P1/208—Cascaded cavities; Cascaded resonators inside a hollow waveguide structure
- H01P1/2088—Integrated in a substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/01—Frequency selective two-port networks
- H03H7/17—Structural details of sub-circuits of frequency selective networks
- H03H7/1741—Comprising typical LC combinations, irrespective of presence and location of additional resistors
- H03H7/1775—Parallel LC in shunt or branch path
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Filters And Equalizers (AREA)
- Coils Or Transformers For Communication (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
버퍼층에 첨가된 글래스물질 | 캠버현상 | 박리현상 | |||
종류 | 첨가량(wt%) | ||||
비교예1 | 없음 | X | O | ||
비교예2 | Bi2O3 | 2 | X | O | |
실시예1 | Bi2O3 | 5 | X | X | |
실시예2 | Bi2O3 | 10 | X | X | |
비교예3 | Bi2O3 | 12 | X | X | |
비교예4 | Zn계 글래스 | 5 | X | O | |
비교예5 | Pb계 글래스 | 5 | X | O |
Claims (6)
- 적어도 하나의 유전체층과 자성체층으로 이루어진 적층체를 포함하며, 그 유전체층과 자성체층 각각에는 캐패시터요소와 인덕터요소를 구성하는 소정의 도전패턴이 형성된 적층형 LC 필터에 있어서,상기 유전체층은 Ba-Nd-Ti계 물질로 이루어지고, 상기 자성체층은 Ni-Zn-Cu-Fe계 물질로 이루어지며, 상기 유전체층과 상기 자성체층 사이에는, Ba-Nd-Ti계 물질과 Ni-Zn-Cu-Fe계 물질 및, 5∼10wt%의 Bi계 글래스물질을 포함하는 버퍼층을 포함하는 적층형 LC 필터.
- 제1항에 있어서,상기 버퍼층에 포함된 Ba-Nd-Ti계 물질과 Ni-Zn-Cu-Fe계 물질의 중량비는 3:7∼7:3범위임을 특징으로 하는 적층형 LC 필터.
- 제2항에 있어서,상기 버퍼층에 포함된 Ba-Nd-Ti계 물질과 Ni-Zn-Cu-Fe계 물질의 중량은 실질적으로 동일함을 특징으로 하는 적층형 LC 필터.
- 제1항에 있어서,상기 적층체는 제1 인덕터 패턴이 형성된 제1 자성체층과, 접지패턴이 형성된 제1 유전체층과, 캐패시터패턴이 형성된 제2 유전체층과 제2 인덕터 패턴이 형성된 제2 자성체층이 순차적으로 적층된 구조물로 이루어지며, 상기 버퍼층은 상기 제1 자성체층과 제1 유전체층 및 제2 자성체층과 제2 유전체층 사이에 각각 배치되는 적층형 LC 필터.
- 제1항 또는 제4항에 있어서,상기 유전체층과 자성체층의 적층체 측면에 형성되어, 서로 다른 층에 형성된 도전패턴을 연결하기 위한 적어도 하나 이상의 측면패턴을 더 포함함을 특징으로 하는 적층형 LC 필터.
- 제5항에 있어서,상기 측면패턴은 외부전극인쇄공정과 동시에 형성됨을 특징으로 적층형 LC 필터.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0057147A KR100471151B1 (ko) | 2002-09-19 | 2002-09-19 | 적층형 lc 필터 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0057147A KR100471151B1 (ko) | 2002-09-19 | 2002-09-19 | 적층형 lc 필터 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040025266A KR20040025266A (ko) | 2004-03-24 |
KR100471151B1 true KR100471151B1 (ko) | 2005-03-10 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0057147A KR100471151B1 (ko) | 2002-09-19 | 2002-09-19 | 적층형 lc 필터 |
Country Status (1)
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KR (1) | KR100471151B1 (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100614258B1 (ko) * | 2006-03-31 | 2006-08-22 | (주) 래트론 | Lc필터 |
US20080174936A1 (en) * | 2007-01-19 | 2008-07-24 | Western Lights Semiconductor Corp. | Apparatus and Method to Store Electrical Energy |
US20080174933A1 (en) * | 2007-01-19 | 2008-07-24 | Western Lights Semiconductor Corp. | Apparatus and Method to Store Electrical Energy |
KR100920026B1 (ko) * | 2007-10-16 | 2009-10-05 | 주식회사 쎄라텍 | 자성체 및 유전체 복합 전자 부품 |
US10483936B2 (en) | 2017-09-28 | 2019-11-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Band stop filter structures and methods of forming and operating same |
DE102018107014A1 (de) | 2017-09-28 | 2019-03-28 | Taiwan Semiconductor Manufacturing Co. Ltd. | Bandsperrfilterstrukturen und Verfahren zum Ausbilden und Betreiben derselben |
US11394359B2 (en) | 2017-09-28 | 2022-07-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Band stop filter structure and method of forming |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05267972A (ja) * | 1992-03-19 | 1993-10-15 | Murata Mfg Co Ltd | 積層t型lcフィルタ |
JPH06176967A (ja) * | 1992-12-10 | 1994-06-24 | Taiyo Yuden Co Ltd | 積層lcフィルタ部品 |
JPH07235852A (ja) * | 1994-02-23 | 1995-09-05 | Mitsubishi Materials Corp | パイ形フィルタ |
JPH08148382A (ja) * | 1994-11-22 | 1996-06-07 | Mitsubishi Materials Corp | Emiフィルタ |
JPH1155058A (ja) * | 1997-08-06 | 1999-02-26 | Murata Mfg Co Ltd | 積層セラミック複合部品 |
-
2002
- 2002-09-19 KR KR10-2002-0057147A patent/KR100471151B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05267972A (ja) * | 1992-03-19 | 1993-10-15 | Murata Mfg Co Ltd | 積層t型lcフィルタ |
JPH06176967A (ja) * | 1992-12-10 | 1994-06-24 | Taiyo Yuden Co Ltd | 積層lcフィルタ部品 |
JPH07235852A (ja) * | 1994-02-23 | 1995-09-05 | Mitsubishi Materials Corp | パイ形フィルタ |
JPH08148382A (ja) * | 1994-11-22 | 1996-06-07 | Mitsubishi Materials Corp | Emiフィルタ |
JPH1155058A (ja) * | 1997-08-06 | 1999-02-26 | Murata Mfg Co Ltd | 積層セラミック複合部品 |
Also Published As
Publication number | Publication date |
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KR20040025266A (ko) | 2004-03-24 |
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