KR100382834B1 - 기판의폭에이르는상시야에따라임의의폭을갖는렌즈어레이 - Google Patents

기판의폭에이르는상시야에따라임의의폭을갖는렌즈어레이 Download PDF

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Publication number
KR100382834B1
KR100382834B1 KR1019970705654A KR19970705654A KR100382834B1 KR 100382834 B1 KR100382834 B1 KR 100382834B1 KR 1019970705654 A KR1019970705654 A KR 1019970705654A KR 19970705654 A KR19970705654 A KR 19970705654A KR 100382834 B1 KR100382834 B1 KR 100382834B1
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KR
South Korea
Prior art keywords
wine
lens
scanned pattern
pattern
fold mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019970705654A
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English (en)
Korean (ko)
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KR19980702257A (ko
Inventor
데이비드 에이 마클
Original Assignee
울트라테크 스테퍼 인코포레이티드
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Publication date
Application filed by 울트라테크 스테퍼 인코포레이티드 filed Critical 울트라테크 스테퍼 인코포레이티드
Publication of KR19980702257A publication Critical patent/KR19980702257A/ko
Application granted granted Critical
Publication of KR100382834B1 publication Critical patent/KR100382834B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/002—Arrays of reflective systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Facsimile Scanning Arrangements (AREA)
KR1019970705654A 1995-02-15 1996-02-12 기판의폭에이르는상시야에따라임의의폭을갖는렌즈어레이 Expired - Fee Related KR100382834B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/389035 1995-02-15
US8/389035 1995-02-15
US08/389,035 US5585972A (en) 1995-02-15 1995-02-15 Arbitrarily wide lens array with an image field to span the width of a substrate

Publications (2)

Publication Number Publication Date
KR19980702257A KR19980702257A (ko) 1998-07-15
KR100382834B1 true KR100382834B1 (ko) 2003-07-18

Family

ID=23536559

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970705654A Expired - Fee Related KR100382834B1 (ko) 1995-02-15 1996-02-12 기판의폭에이르는상시야에따라임의의폭을갖는렌즈어레이

Country Status (7)

Country Link
US (1) US5585972A (enExample)
EP (1) EP0809814B1 (enExample)
JP (1) JP3409855B2 (enExample)
KR (1) KR100382834B1 (enExample)
DE (1) DE69634075D1 (enExample)
TW (1) TW297203B (enExample)
WO (1) WO1996025681A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
JPH08211294A (ja) * 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
JPH09293676A (ja) * 1996-04-24 1997-11-11 Nikon Corp 投影光学系及び投影露光装置
JP4235778B2 (ja) * 1998-05-21 2009-03-11 株式会社ニコン 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法
US6381077B1 (en) 2000-04-05 2002-04-30 Ultratech Stepper, Inc. Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US20060158615A1 (en) * 2005-01-18 2006-07-20 Williamson David M Catadioptric 1x projection system and method
DE102007022895B9 (de) * 2007-05-14 2013-11-21 Erich Thallner Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat
JP5782336B2 (ja) * 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
US11243480B2 (en) * 2018-07-03 2022-02-08 Applied Materials, Inc. System for making accurate grating patterns using multiple writing columns each making multiple scans
WO2022245473A1 (en) * 2021-05-18 2022-11-24 Chan Zuckerberg Biohub, Inc. Low cost beam-expanding relay lens
CN119395866A (zh) * 2024-12-30 2025-02-07 青岛芯微半导体科技有限公司 一种基于反射对称结构的高像质紫外物镜

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4953960A (en) * 1988-07-15 1990-09-04 Williamson David M Optical reduction system
US5393371A (en) * 1989-12-18 1995-02-28 Litton Systems, Inc. Integrated optics chips and laser ablation methods for attachment of optical fibers thereto for LiNbO3 substrates
US5003345A (en) * 1989-12-27 1991-03-26 General Signal Corporation Apparatus and method for aligning and focusing an image of a reticle onto a semiconductor wafer
US5164794A (en) * 1991-07-15 1992-11-17 General Signal Corporation Optical reticle inspection system and method
US5298939A (en) 1991-11-04 1994-03-29 Swanson Paul A Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
US5303001A (en) * 1992-12-21 1994-04-12 Ultratech Stepper, Inc. Illumination system for half-field dyson stepper
US5402205A (en) * 1992-12-21 1995-03-28 Ultratech Stepper, Inc. Alignment system for a Half-Field Dyson projection system
US5401934A (en) * 1993-03-08 1995-03-28 International Business Machines Corporation Lens system for scanning laser apparatus
JP3348467B2 (ja) * 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
JP3385718B2 (ja) * 1994-05-30 2003-03-10 株式会社ニコン 露光装置及び方法
US5614988A (en) * 1993-12-06 1997-03-25 Nikon Corporation Projection exposure apparatus and method with a plurality of projection optical units
JPH08211294A (ja) * 1995-02-02 1996-08-20 Nikon Corp 投影露光装置

Also Published As

Publication number Publication date
JPH11500269A (ja) 1999-01-06
DE69634075D1 (de) 2005-01-27
WO1996025681A1 (en) 1996-08-22
US5585972A (en) 1996-12-17
JP3409855B2 (ja) 2003-05-26
EP0809814A4 (en) 1998-05-06
TW297203B (enExample) 1997-02-01
KR19980702257A (ko) 1998-07-15
EP0809814A1 (en) 1997-12-03
EP0809814B1 (en) 2004-12-22

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