KR100347136B1 - 배관막힘 방지장치 - Google Patents
배관막힘 방지장치 Download PDFInfo
- Publication number
- KR100347136B1 KR100347136B1 KR1019990062669A KR19990062669A KR100347136B1 KR 100347136 B1 KR100347136 B1 KR 100347136B1 KR 1019990062669 A KR1019990062669 A KR 1019990062669A KR 19990062669 A KR19990062669 A KR 19990062669A KR 100347136 B1 KR100347136 B1 KR 100347136B1
- Authority
- KR
- South Korea
- Prior art keywords
- exhaust pipe
- residual gas
- pressure
- pipe
- gas
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/04—Arrangement or mounting of valves
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (6)
- 챔버내부의 잔여가스를 외부로 배출토록 진공펌프와 연통된 배기관에 증착물이 발생되는 것을 방지하는 배관막힘 방지장치에 있어서,상기 배기관의 직경을 다수 변화시켜 상기 배기관을 흐르는 잔여가스의 압력을 변화시키는 압력변화수단이 포함되어 구성된 것을 특징으로 하는 배관막힘 방지장치.
- 삭제
- 제 2항에 있어서, 상기 각 배기관에 상기 잔여가스의 압력을 측정하는 압력계가 설치된 것을 특징으로 하는 배관막힘 방지장치.
- 챔버내부의 잔여가스를 외부로 배출토록 진공펌프와 연통된 배기관에 증착물이 발생되는 것을 방지하는 배관막힘 방지장치에 있어서,상기 배기관에 고온가스를 공급하여 상기 배기관을 흐르는 잔여가스를 기화시키는 증착물기화수단이 포함되어 구성된 것을 특징으로 하는 배관막힘 방지장치.
- 삭제
- 제 4항에 있어서, 상기 고온가스의 온도를 제어하는 히터 및/또는 압력을 제어하는 레귤레이터가 설치된 것을 특징으로 하는 배관막힘 방지장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990062669A KR100347136B1 (ko) | 1999-12-27 | 1999-12-27 | 배관막힘 방지장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990062669A KR100347136B1 (ko) | 1999-12-27 | 1999-12-27 | 배관막힘 방지장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010058396A KR20010058396A (ko) | 2001-07-05 |
KR100347136B1 true KR100347136B1 (ko) | 2002-07-31 |
Family
ID=19630177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019990062669A KR100347136B1 (ko) | 1999-12-27 | 1999-12-27 | 배관막힘 방지장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100347136B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101383985B1 (ko) * | 2013-11-05 | 2014-04-15 | (주) 일하하이텍 | 배기가스 배출 장치 |
US9233334B2 (en) | 2013-02-28 | 2016-01-12 | Samsung Electronics Co., Ltd. | Byproducts treating device and a facility for manufacturing semiconductor devices having the byproducts treating device |
CN105928033A (zh) * | 2016-04-09 | 2016-09-07 | 曲建霖 | 低温热水地板辐射采暖埋地管道的检测方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100475746B1 (ko) * | 2002-12-03 | 2005-03-10 | 삼성전자주식회사 | 반도체소자 제조설비의 배기 시스템 및 그 방법 |
KR101040540B1 (ko) * | 2010-03-31 | 2011-06-16 | (주)이노시티 | 웨이퍼 저장 장치 |
KR101594930B1 (ko) * | 2014-03-03 | 2016-02-17 | 피에스케이 주식회사 | 기판 처리 장치 및 배기관 클리닝 방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970030293A (ko) * | 1995-11-23 | 1997-06-26 | 김광호 | 반도체 확산 설비의 배기 압력 자동 조절장치 |
-
1999
- 1999-12-27 KR KR1019990062669A patent/KR100347136B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970030293A (ko) * | 1995-11-23 | 1997-06-26 | 김광호 | 반도체 확산 설비의 배기 압력 자동 조절장치 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9233334B2 (en) | 2013-02-28 | 2016-01-12 | Samsung Electronics Co., Ltd. | Byproducts treating device and a facility for manufacturing semiconductor devices having the byproducts treating device |
KR101383985B1 (ko) * | 2013-11-05 | 2014-04-15 | (주) 일하하이텍 | 배기가스 배출 장치 |
CN105928033A (zh) * | 2016-04-09 | 2016-09-07 | 曲建霖 | 低温热水地板辐射采暖埋地管道的检测方法 |
CN105928033B (zh) * | 2016-04-09 | 2019-01-01 | 曲建霖 | 低温热水地板辐射采暖埋地管道的检测方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20010058396A (ko) | 2001-07-05 |
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