KR100310787B1 - 렌즈어레이사진석판노출장치와그방법 - Google Patents

렌즈어레이사진석판노출장치와그방법 Download PDF

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Publication number
KR100310787B1
KR100310787B1 KR1019950701990A KR19950701990A KR100310787B1 KR 100310787 B1 KR100310787 B1 KR 100310787B1 KR 1019950701990 A KR1019950701990 A KR 1019950701990A KR 19950701990 A KR19950701990 A KR 19950701990A KR 100310787 B1 KR100310787 B1 KR 100310787B1
Authority
KR
South Korea
Prior art keywords
image
lens
array
photomask
field
Prior art date
Application number
KR1019950701990A
Other languages
English (en)
Korean (ko)
Other versions
KR950704720A (ko
Inventor
윌리암 벨 허글
레니 댄드리커
한스피터 허지그
Original Assignee
브룩존
페이지,요셉
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB929224080A external-priority patent/GB9224080D0/en
Priority claimed from US08/114,732 external-priority patent/US5517279A/en
Application filed by 브룩존, 페이지,요셉 filed Critical 브룩존
Publication of KR950704720A publication Critical patent/KR950704720A/ko
Application granted granted Critical
Publication of KR100310787B1 publication Critical patent/KR100310787B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/44—Projection printing apparatus, e.g. enlarger, copying camera for multiple copying of the same original at the same time
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G02B5/188—Plurality of such optical elements formed in or on a supporting substrate
    • G02B5/1885—Arranged as a periodic array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950701990A 1992-11-17 1993-11-15 렌즈어레이사진석판노출장치와그방법 KR100310787B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB9224080.3 1992-11-17
GB929224080A GB9224080D0 (en) 1992-11-17 1992-11-17 Imaging mask patterns
US08/114732 1993-08-30
US08/114,732 US5517279A (en) 1993-08-30 1993-08-30 Lens array photolithography
PCT/US1993/010945 WO1994011781A1 (en) 1992-11-17 1993-11-15 Lens array photolithography

Publications (2)

Publication Number Publication Date
KR950704720A KR950704720A (ko) 1995-11-20
KR100310787B1 true KR100310787B1 (ko) 2002-01-09

Family

ID=26301990

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950701990A KR100310787B1 (ko) 1992-11-17 1993-11-15 렌즈어레이사진석판노출장치와그방법

Country Status (5)

Country Link
EP (1) EP0670052A4 (ja)
JP (1) JP3443627B2 (ja)
KR (1) KR100310787B1 (ja)
AU (1) AU6013594A (ja)
WO (1) WO1994011781A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19520563A1 (de) * 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
US5684566A (en) * 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
WO2001071410A2 (en) * 2000-03-17 2001-09-27 Zograph, Llc High acuity lens system
ATE408850T1 (de) * 2001-04-10 2008-10-15 Harvard College Mikrolinse zur projektionslithographie und ihr herstellungsverfahren
USRE43515E1 (en) 2004-03-09 2012-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20050243295A1 (en) * 2004-04-30 2005-11-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing
LT5497B (lt) 2006-08-25 2008-05-26 Fizikos Institutas Gardelės formavimo būdas ir įrenginys
US8130364B2 (en) * 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP5190609B2 (ja) * 2008-08-21 2013-04-24 株式会社ブイ・テクノロジー 露光装置及びそれに使用するフォトマスク

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3605593A (en) * 1967-07-03 1971-09-20 Tektronix Inc Optical apparatus including a pair of mosaics of optical imaging elements

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3763372A (en) * 1967-07-13 1973-10-02 Inventors & Investors Inc Zone plate optics monolithically integrated with photoelectric elements
US3584950A (en) * 1967-11-17 1971-06-15 Xerox Corp Lens strip optical scanning system
US4474459A (en) * 1982-01-20 1984-10-02 Minolta Camera Kabushiki Kaisha Optical projection system
DE3583180D1 (de) * 1984-05-01 1991-07-18 Xerox Corp Lichtbalken.
JPS6127548A (ja) * 1984-07-17 1986-02-07 Nec Corp 非接触式露光装置
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
US4895790A (en) * 1987-09-21 1990-01-23 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3605593A (en) * 1967-07-03 1971-09-20 Tektronix Inc Optical apparatus including a pair of mosaics of optical imaging elements

Also Published As

Publication number Publication date
AU6013594A (en) 1994-06-08
EP0670052A4 (en) 1995-10-25
WO1994011781A1 (en) 1994-05-26
JPH08503560A (ja) 1996-04-16
JP3443627B2 (ja) 2003-09-08
KR950704720A (ko) 1995-11-20
EP0670052A1 (en) 1995-09-06

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