EP0670052A4 - LENS ARRANGEMENT FOR PHOTOLITOGRAPHY. - Google Patents

LENS ARRANGEMENT FOR PHOTOLITOGRAPHY.

Info

Publication number
EP0670052A4
EP0670052A4 EP94906428A EP94906428A EP0670052A4 EP 0670052 A4 EP0670052 A4 EP 0670052A4 EP 94906428 A EP94906428 A EP 94906428A EP 94906428 A EP94906428 A EP 94906428A EP 0670052 A4 EP0670052 A4 EP 0670052A4
Authority
EP
European Patent Office
Prior art keywords
array
lens
image
field
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP94906428A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0670052A1 (en
Inventor
William Bell Hugle
Rene Dandliker
Hans Peter Herzig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HUGLE LITHOGRAPHY Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB929224080A external-priority patent/GB9224080D0/en
Priority claimed from US08/114,732 external-priority patent/US5517279A/en
Application filed by Individual filed Critical Individual
Publication of EP0670052A1 publication Critical patent/EP0670052A1/en
Publication of EP0670052A4 publication Critical patent/EP0670052A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/44—Projection printing apparatus, e.g. enlarger, copying camera for multiple copying of the same original at the same time
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G02B5/188—Plurality of such optical elements formed in or on a supporting substrate
    • G02B5/1885—Arranged as a periodic array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
EP94906428A 1992-11-17 1993-11-15 LENS ARRANGEMENT FOR PHOTOLITOGRAPHY. Withdrawn EP0670052A4 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB9224080 1992-11-17
GB929224080A GB9224080D0 (en) 1992-11-17 1992-11-17 Imaging mask patterns
US08/114,732 US5517279A (en) 1993-08-30 1993-08-30 Lens array photolithography
US114732 1993-08-30
PCT/US1993/010945 WO1994011781A1 (en) 1992-11-17 1993-11-15 Lens array photolithography

Publications (2)

Publication Number Publication Date
EP0670052A1 EP0670052A1 (en) 1995-09-06
EP0670052A4 true EP0670052A4 (en) 1995-10-25

Family

ID=26301990

Family Applications (1)

Application Number Title Priority Date Filing Date
EP94906428A Withdrawn EP0670052A4 (en) 1992-11-17 1993-11-15 LENS ARRANGEMENT FOR PHOTOLITOGRAPHY.

Country Status (5)

Country Link
EP (1) EP0670052A4 (ja)
JP (1) JP3443627B2 (ja)
KR (1) KR100310787B1 (ja)
AU (1) AU6013594A (ja)
WO (1) WO1994011781A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19520563A1 (de) * 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
US5684566A (en) * 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
JP4994556B2 (ja) 2000-03-17 2012-08-08 ストラテジック パテント アクイジションズ エルエルシー 高明瞭度レンズシステム
ATE408850T1 (de) * 2001-04-10 2008-10-15 Harvard College Mikrolinse zur projektionslithographie und ihr herstellungsverfahren
USRE43515E1 (en) 2004-03-09 2012-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20050243295A1 (en) * 2004-04-30 2005-11-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing
LT5497B (lt) 2006-08-25 2008-05-26 Fizikos Institutas Gardelės formavimo būdas ir įrenginys
US8130364B2 (en) * 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP5190609B2 (ja) * 2008-08-21 2013-04-24 株式会社ブイ・テクノロジー 露光装置及びそれに使用するフォトマスク

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3763372A (en) * 1967-07-13 1973-10-02 Inventors & Investors Inc Zone plate optics monolithically integrated with photoelectric elements
EP0160518A2 (en) * 1984-05-01 1985-11-06 Xerox Corporation Optical image bar
JPS6127548A (ja) * 1984-07-17 1986-02-07 Nec Corp 非接触式露光装置
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
US4895790A (en) * 1987-09-21 1990-01-23 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3605593A (en) * 1967-07-03 1971-09-20 Tektronix Inc Optical apparatus including a pair of mosaics of optical imaging elements
US3584950A (en) * 1967-11-17 1971-06-15 Xerox Corp Lens strip optical scanning system
US4474459A (en) * 1982-01-20 1984-10-02 Minolta Camera Kabushiki Kaisha Optical projection system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3763372A (en) * 1967-07-13 1973-10-02 Inventors & Investors Inc Zone plate optics monolithically integrated with photoelectric elements
EP0160518A2 (en) * 1984-05-01 1985-11-06 Xerox Corporation Optical image bar
JPS6127548A (ja) * 1984-07-17 1986-02-07 Nec Corp 非接触式露光装置
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
US4895790A (en) * 1987-09-21 1990-01-23 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
ANON: "ULTRA-RESOLUTION IMAGE TRANSFER", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 34, no. 10A, NEW YORK US, pages 158 - 162, XP000302260 *
H.R. ROTTMANN ET AL: "ZONE LENS ARRAY FOR FABRICATION OF MULTIPLE-IMAGE PATTERNS", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 9, no. 1, NEW YORK US, pages 48 *
PATENT ABSTRACTS OF JAPAN vol. 10, no. 180 (P - 471) 24 June 1986 (1986-06-24) *
See also references of WO9411781A1 *
VELDKAMP W B ET AL: "Binary optics", SCI. AM. (INT. ED.) (USA), SCIENTIFIC AMERICAN (INTERNATIONAL EDITION), MAY 1992, USA, vol. 266, no. 5, ISSN 0036-8733, pages 50 - 55 *

Also Published As

Publication number Publication date
EP0670052A1 (en) 1995-09-06
WO1994011781A1 (en) 1994-05-26
KR950704720A (ko) 1995-11-20
JPH08503560A (ja) 1996-04-16
JP3443627B2 (ja) 2003-09-08
AU6013594A (en) 1994-06-08
KR100310787B1 (ko) 2002-01-09

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Legal Events

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RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: HERZIG, HANS PETER

Owner name: DANDLIKER, RENE

Owner name: HUGLE, WILLIAM BELL

Owner name: PAGE, JOSEPH

Owner name: BROOK, JOHN

RIN1 Information on inventor provided before grant (corrected)

Inventor name: HERZIG, HANS PETER

Inventor name: DANDLIKER, RENE

Inventor name: HUGLE, WILLIAM BELL

Inventor name: PAGE, JOSEPH

Inventor name: BROOK, JOHN

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: HUGLE LITHOGRAPHY INC.

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Effective date: 19981026

RIN1 Information on inventor provided before grant (corrected)

Inventor name: PAGE, JOSEPH

Inventor name: BROOK, JOHN

Inventor name: HERZIG, HANS PETER

Inventor name: DANDLIKER, RENE

Inventor name: HUGLE, WILLIAM BELL

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